ES2902045T3 - Sistema de impresión y módulo de escritura del mismo - Google Patents

Sistema de impresión y módulo de escritura del mismo Download PDF

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Publication number
ES2902045T3
ES2902045T3 ES18762930T ES18762930T ES2902045T3 ES 2902045 T3 ES2902045 T3 ES 2902045T3 ES 18762930 T ES18762930 T ES 18762930T ES 18762930 T ES18762930 T ES 18762930T ES 2902045 T3 ES2902045 T3 ES 2902045T3
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ES
Spain
Prior art keywords
imaging surface
light
polymer
printing system
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES18762930T
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English (en)
Spanish (es)
Inventor
Ben Haim Nir Rubin
Michael Nagler
Abraham Keren
Ofer Aknin
Benzion Landa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Landa Labs 2012 Ltd
Original Assignee
Landa Labs 2012 Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Landa Labs 2012 Ltd filed Critical Landa Labs 2012 Ltd
Application granted granted Critical
Publication of ES2902045T3 publication Critical patent/ES2902045T3/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B29C64/264—Arrangements for irradiation
    • B29C64/268—Arrangements for irradiation using laser beams; using electron beams [EB]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/0057—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material where an intermediate transfer member receives the ink before transferring it on the printing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B41J2/45—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using light-emitting diode [LED] or laser arrays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B41J2/455—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using laser arrays, the laser array being smaller than the medium to be recorded
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • B41M5/0256—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet the transferable ink pattern being obtained by means of a computer driven printer, e.g. an ink jet or laser printer, or by electrographic means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • B41M5/03—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet by pressure
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0087—Simple or compound lenses with index gradient
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/01—Apparatus for electrographic processes using a charge pattern for producing multicoloured copies
    • G03G15/0142—Structure of complete machines
    • G03G15/0178—Structure of complete machines using more than one reusable electrographic recording member, e.g. one for every monocolour image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
    • G03G15/04036—Details of illuminating systems, e.g. lamps, reflectors
    • G03G15/04045—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers
    • G03G15/04072—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers by laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/06—Apparatus for electrographic processes using a charge pattern for developing
    • G03G15/10—Apparatus for electrographic processes using a charge pattern for developing using a liquid developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/34—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the powder image is formed directly on the recording material, e.g. by using a liquid toner
    • G03G15/342—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the powder image is formed directly on the recording material, e.g. by using a liquid toner by forming a uniform powder layer and then removing the non-image areas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/024—Arrangements for thermal management
    • H01S5/02469—Passive cooling, e.g. where heat is removed by the housing as a whole or by a heat pipe without any active cooling element like a TEC
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H01S5/423—Arrays of surface emitting lasers having a vertical cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H01S5/423—Arrays of surface emitting lasers having a vertical cavity
    • H01S5/426—Vertically stacked cavities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18322—Position of the structure
    • H01S5/1833—Position of the structure with more than one structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18383—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with periodic active regions at nodes or maxima of light intensity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18397—Plurality of active layers vertically stacked in a cavity for multi-wavelength emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4018—Lasers electrically in series

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Electronic Switches (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Printing Methods (AREA)
  • Semiconductor Lasers (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
ES18762930T 2017-08-08 2018-08-08 Sistema de impresión y módulo de escritura del mismo Active ES2902045T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB1712726.7A GB201712726D0 (en) 2017-08-08 2017-08-08 Electric current and heat mitigation in a printing machine writing module
PCT/IB2018/055971 WO2019030694A1 (en) 2017-08-08 2018-08-08 PRINTING SYSTEM AND WRITING MODULE

Publications (1)

Publication Number Publication Date
ES2902045T3 true ES2902045T3 (es) 2022-03-24

Family

ID=59894977

Family Applications (1)

Application Number Title Priority Date Filing Date
ES18762930T Active ES2902045T3 (es) 2017-08-08 2018-08-08 Sistema de impresión y módulo de escritura del mismo

Country Status (7)

Country Link
US (1) US11865782B2 (https=)
EP (1) EP3665015B1 (https=)
JP (2) JP2020529940A (https=)
CN (1) CN110997330B (https=)
ES (1) ES2902045T3 (https=)
GB (1) GB201712726D0 (https=)
WO (1) WO2019030694A1 (https=)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3842864B1 (en) * 2019-12-23 2022-08-03 Cubicure GmbH Systems and methods for lithography-based additive manufacturing three-dimensional (3d) structures
CN112531461A (zh) * 2020-12-30 2021-03-19 江西铭德半导体科技有限公司 一种可控横向光场的多结型半导体激光器及其制造方法
JP7475501B2 (ja) * 2021-01-20 2024-04-26 ソニーグループ株式会社 面発光レーザ、電子機器及び面発光レーザの製造方法
FR3124030A1 (fr) * 2021-06-09 2022-12-16 Sidel Participations Emetteur laser pour station de chauffage
CN113591300B (zh) * 2021-07-29 2024-03-15 深圳市创想三维科技股份有限公司 3d打印文件的生成方法、装置、计算机设备和存储介质
US11827037B2 (en) * 2021-08-23 2023-11-28 Xerox Corporation Semiconductor array imager for printing systems
US11984701B2 (en) * 2021-08-23 2024-05-14 Xerox Corporation System for electronically controlling and driving independently addressable semiconductor lasers
US12366815B2 (en) * 2021-08-23 2025-07-22 Xerox Corporation Focusing optics for use with semiconductor lasers for imaging applications
US12562552B2 (en) * 2021-08-23 2026-02-24 Genesee Valley Innovations, LLC Independently-addressable high power surface-emitting laser array with tight-pitch packing
US20230054034A1 (en) * 2021-08-23 2023-02-23 Palo Alto Research Center Incorporated 3d package for semiconductor thermal management
TWI785780B (zh) 2021-09-06 2022-12-01 虹光精密工業股份有限公司 發光晶片打件偏差之調節方法及列印頭
CN113733546A (zh) * 2021-09-13 2021-12-03 数造科技(湖南)有限公司 一种3d发光字打印的自动化一体成型设备及方法
CN116277938A (zh) * 2023-02-09 2023-06-23 京东方科技集团股份有限公司 一种光固化3d打印机及打印方法
FR3149229B1 (fr) * 2023-05-31 2025-04-25 Sidel Participations Unité de traitement thermique de préformes comprenant des éléments de chauffage connectés en série
GB2633405A (en) * 2023-09-11 2025-03-12 Landa Labs 2012 Ltd Method an apparatus for 3D printing
WO2025057054A1 (en) 2023-09-11 2025-03-20 Landa Labs (2012) Ltd Method and apparatus for 3d printing
JP2025173883A (ja) * 2024-05-15 2025-11-28 キヤノン株式会社 発光装置及び測距装置

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61118273A (ja) 1984-11-15 1986-06-05 Erumu:Kk レ−ザ−式インクジエツトプリンタ
US5600363A (en) 1988-12-28 1997-02-04 Kyocera Corporation Image forming apparatus having driving means at each end of array and power feeding substrate outside head housing
JPH03114341U (https=) * 1990-03-12 1991-11-25
US5572540A (en) * 1992-08-11 1996-11-05 University Of New Mexico Two-dimensional opto-electronic switching arrays
AUPO799197A0 (en) 1997-07-15 1997-08-07 Silverbrook Research Pty Ltd Image processing method and apparatus (ART01)
FR2761537B1 (fr) 1997-04-01 1999-06-11 Thomson Csf Laser comprenant un empilement de diodes laser epitaxiees compris entre deux miroirs de bragg
US6493371B1 (en) * 1998-04-14 2002-12-10 Bandwidth9, Inc. Vertical cavity apparatus with tunnel junction
US6487230B1 (en) * 1998-04-14 2002-11-26 Bandwidth 9, Inc Vertical cavity apparatus with tunnel junction
US6635861B1 (en) * 1998-10-22 2003-10-21 Wavefront Research, Inc. Relaxed tolerance optical interconnect system having a GRIN rod lens
US20030057363A1 (en) * 2000-12-26 2003-03-27 Anderson Gene R. Optical power control system
US6863444B2 (en) * 2000-12-26 2005-03-08 Emcore Corporation Housing and mounting structure
US6799902B2 (en) * 2000-12-26 2004-10-05 Emcore Corporation Optoelectronic mounting structure
GB0121308D0 (en) * 2001-09-03 2001-10-24 Thomas Swan & Company Ltd Optical processing
JP2003080761A (ja) * 2001-09-12 2003-03-19 Fuji Xerox Co Ltd 画像形成方法及び装置
US7002613B2 (en) * 2002-09-06 2006-02-21 Heidelberger Druckmaschinen Ag Method for printing an image on a printing substrate and device for inputting energy to a printing-ink carrier
JP2004122512A (ja) * 2002-10-01 2004-04-22 Sanyo Electric Co Ltd プリントヘッド
US6771680B2 (en) * 2002-10-22 2004-08-03 Agilent Technologies, Inc Electrically-pumped, multiple active region vertical-cavity surface-emitting laser (VCSEL)
US7796885B2 (en) * 2002-11-05 2010-09-14 Lightfleet Corporation Distribution optical elements and compound collecting lenses for broadcast optical interconnect
US6936486B2 (en) 2002-11-19 2005-08-30 Jdsu Uniphase Corporation Low voltage multi-junction vertical cavity surface emitting laser
JP5017804B2 (ja) 2005-06-15 2012-09-05 富士ゼロックス株式会社 トンネル接合型面発光半導体レーザ装置およびその製造方法
WO2007010184A1 (en) * 2005-07-15 2007-01-25 Xyratex Technology Limited Optical printed circuit board and manufacturing method
DE102006010728A1 (de) * 2005-12-05 2007-06-06 Osram Opto Semiconductors Gmbh Halbleiterbauelement und Laservorrichtung
JP4884810B2 (ja) * 2006-03-17 2012-02-29 古河電気工業株式会社 半導体発光素子及びその製造方法
JP4697077B2 (ja) * 2006-07-12 2011-06-08 日立電線株式会社 光モジュール
JP5144243B2 (ja) * 2006-12-28 2013-02-13 富士フイルム株式会社 画像形成方法及び画像形成装置
US8535474B2 (en) * 2007-08-06 2013-09-17 Kao Corporation Liquid applicator
DE602007011610D1 (de) * 2007-09-14 2011-02-10 Punch Graphix Int Nv Lichtemittierendes Array zum Drucken oder Kopieren
JP2009260205A (ja) * 2008-03-17 2009-11-05 Ricoh Co Ltd 光源装置、光走査装置及び画像形成装置
DE102008030818B4 (de) * 2008-06-30 2022-03-03 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Oberflächenemittierender Halbleiterlaser mit mehreren aktiven Zonen
WO2010130051A1 (en) 2009-05-14 2010-11-18 4233999 Canada, Inc. System for and method of providing high resolution images using monolithic arrays of light emitting diodes
US9160450B2 (en) * 2011-09-23 2015-10-13 Te Connectivity Nederland B.V. Multi-channel transceiver
JP2013165188A (ja) 2012-02-10 2013-08-22 Oki Data Corp 半導体発光装置、光源装置、画像形成装置及び画像表示装置
CN104661825A (zh) * 2012-06-15 2015-05-27 海德堡印刷机械股份公司 用于将印刷液体间接施加到承印材料上的方法
US9573360B2 (en) * 2013-09-09 2017-02-21 Xerox Corporation Thermally conductive aqueous transfix blanket
ES2799123T3 (es) * 2013-12-17 2020-12-14 Eos Gmbh Electro Optical Systems Sistema de impresión láser
CN106457298A (zh) * 2014-05-17 2017-02-22 善持乐株式会社 热熔粘接剂的辊转印涂敷方法以及涂敷装置
US20160072258A1 (en) 2014-09-10 2016-03-10 Princeton Optronics Inc. High Resolution Structured Light Source
JP2016078238A (ja) 2014-10-09 2016-05-16 株式会社リコー プリントヘッド及び画像形成装置
MX372575B (es) * 2015-05-27 2020-04-16 Landa Labs 2012 Ltd Metodo y aparato de impresion para el recubrimiento de regiones seleccionadas de un sustrato con una pelicula
GB201509080D0 (en) * 2015-05-27 2015-07-08 Landa Labs 2012 Ltd Coating apparatus
PT3302985T (pt) * 2015-05-27 2021-01-13 Landa Labs 2012 Ltd Dispositivo de formação de imagens
CN110023092B (zh) * 2016-11-30 2021-08-20 兰达实验室（2012）有限公司 热转印打印的改进
US11125664B2 (en) 2017-12-04 2021-09-21 Montana Instruments Corporation Analytical instruments, methods, and components
US10509128B1 (en) * 2019-04-12 2019-12-17 K Laser Technology, Inc. Programmable pattern optical projector for depth detection

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US20200406544A1 (en) 2020-12-31
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