ES2136068T3 - Metodo para fabricar una guia de ondas optica con un sustrato esencialmente plano. - Google Patents
Metodo para fabricar una guia de ondas optica con un sustrato esencialmente plano.Info
- Publication number
- ES2136068T3 ES2136068T3 ES92115622T ES92115622T ES2136068T3 ES 2136068 T3 ES2136068 T3 ES 2136068T3 ES 92115622 T ES92115622 T ES 92115622T ES 92115622 T ES92115622 T ES 92115622T ES 2136068 T3 ES2136068 T3 ES 2136068T3
- Authority
- ES
- Spain
- Prior art keywords
- essentially flat
- substrate
- manufacture
- flat substrate
- wave guide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title abstract 5
- 230000003287 optical effect Effects 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000463 material Substances 0.000 abstract 2
- 229920002994 synthetic fiber Polymers 0.000 abstract 2
- 239000004020 conductor Substances 0.000 abstract 1
- 239000004033 plastic Substances 0.000 abstract 1
- 229920001169 thermoplastic Polymers 0.000 abstract 1
- 239000004416 thermosoftening plastic Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
SE DESCRIBE UN CONDUCTOR OPTICO CON UN SUBSTRATO ESENCIALMENTE PLANO Y UNA CAPA CONDUCTORA DE ONDAS DISPUESTA SOBRE EL SUBSTRATO. LA INVENCION CONSISTE EN QUE EL SUBSTRATO CONSTA DE MATERIAL SINTETICO O DE UN MATERIAL CON UNA PROPORCION ORGANICA ELEVADA. ESTO TIENE LA VENTAJA QUE EL INDICE DE REFRACCION DE LA CAPA CONDUCTORA DE ONDAS INORGANICA SE PUEDE COMBINAR CON LAS CARACTERISTICAS DE MATERIAL DEL SUBSTRATO DE MATERIAL SINTETICO, COMO P.EJ. RESISTENCIA A LA ROTURA, DEFORMABILIDAD PLASTICA Y TERMOPLASTICA, ESTRUCTURABILIDAD FOTOQUIMICA, ENTRE OTROS.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4130985 | 1991-09-18 | ||
DE4213454 | 1992-04-24 | ||
DE4228853A DE4228853C2 (de) | 1991-09-18 | 1992-08-29 | Optischer Wellenleiter mit einem planaren oder nur geringfügig gewölbten Substrat und Verfahren zu dessen Herstellung sowie Verwendung eines solchen |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2136068T3 true ES2136068T3 (es) | 1999-11-16 |
Family
ID=27202930
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES92115622T Expired - Lifetime ES2136068T3 (es) | 1991-09-18 | 1992-09-12 | Metodo para fabricar una guia de ondas optica con un sustrato esencialmente plano. |
Country Status (7)
Country | Link |
---|---|
US (2) | US5369722A (es) |
EP (2) | EP0622647B1 (es) |
JP (1) | JP2903033B2 (es) |
AT (2) | ATE344933T1 (es) |
CA (1) | CA2078612C (es) |
DE (3) | DE4228853C2 (es) |
ES (1) | ES2136068T3 (es) |
Families Citing this family (89)
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---|---|---|---|---|
DE59410197D1 (de) * | 1993-03-26 | 2002-11-21 | Hoffmann La Roche | Optisches Verfahren und Vorrichtung zur Analyse von Substanzen an Sensoroberflächen |
CH688165A5 (de) * | 1993-07-26 | 1997-05-30 | Balzers Hochvakuum | Verfahren zur Herstellung eines optischen Wellenleiters und darnach hergestellter optischer Wellenleiter |
CA2176724C (en) * | 1993-11-16 | 2003-05-13 | Ian Christison Sayers | Phase separation apparatus |
CN1149335A (zh) * | 1994-05-27 | 1997-05-07 | 希巴-盖吉股份公司 | 探测短暂受激发光的方法 |
CH693368A5 (de) * | 1994-12-09 | 2003-06-30 | Unaxis Balzers Ag | Verfahren zur Herstellung eines Beugungsgitters, Lichtleiterbauteil sowie deren Verwendungen. |
DE4445427C2 (de) * | 1994-12-20 | 1997-04-30 | Schott Glaswerke | Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht |
US5659640A (en) * | 1995-06-27 | 1997-08-19 | Lucent Technologies Inc. | Integrated waveguide having an internal optical grating |
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EP0792846B1 (de) * | 1996-02-28 | 2004-08-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Barriereschichten |
JPH1010348A (ja) * | 1996-06-26 | 1998-01-16 | Ngk Insulators Ltd | 光導波路デバイスの製造方法 |
US6083852A (en) * | 1997-05-07 | 2000-07-04 | Applied Materials, Inc. | Method for applying films using reduced deposition rates |
DE19634795C2 (de) * | 1996-08-29 | 1999-11-04 | Schott Glas | Plasma-CVD-Anlage mit einem Array von Mikrowellen-Plasmaelektroden und Plasma-CVD-Verfahren |
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US6144795A (en) * | 1996-12-13 | 2000-11-07 | Corning Incorporated | Hybrid organic-inorganic planar optical waveguide device |
US5991493A (en) * | 1996-12-13 | 1999-11-23 | Corning Incorporated | Optically transmissive bonding material |
JP2000162460A (ja) | 1998-11-27 | 2000-06-16 | Sharp Corp | 有機光導波路およびその製造方法並びにそれを用いた光学部品 |
US6704335B1 (en) | 1998-12-17 | 2004-03-09 | Seiko Epson Corporation | Light-emitting device |
AU3474900A (en) | 1999-02-05 | 2000-08-25 | Corning Incorporated | Optical fiber component with shaped optical element and method of making same |
JP2000277260A (ja) | 1999-03-23 | 2000-10-06 | Seiko Epson Corp | 発光装置 |
KR100390110B1 (ko) | 1999-06-10 | 2003-07-04 | 세이코 엡슨 가부시키가이샤 | 발광 장치 |
US6771376B2 (en) * | 1999-07-05 | 2004-08-03 | Novartis Ag | Sensor platform, apparatus incorporating the platform, and process using the platform |
EP1192448B1 (en) | 1999-07-05 | 2006-09-27 | Novartis AG | Process of using a sensor platform |
JP2001196162A (ja) | 1999-10-25 | 2001-07-19 | Seiko Epson Corp | 発光装置 |
US7167615B1 (en) | 1999-11-05 | 2007-01-23 | Board Of Regents, The University Of Texas System | Resonant waveguide-grating filters and sensors and methods for making and using same |
US6510263B1 (en) | 2000-01-27 | 2003-01-21 | Unaxis Balzers Aktiengesellschaft | Waveguide plate and process for its production and microtitre plate |
US6961490B2 (en) | 2000-01-27 | 2005-11-01 | Unaxis-Balzers Aktiengesellschaft | Waveguide plate and process for its production and microtitre plate |
JP2001244066A (ja) | 2000-03-01 | 2001-09-07 | Seiko Epson Corp | 発光装置 |
US7058245B2 (en) | 2000-04-04 | 2006-06-06 | Waveguide Solutions, Inc. | Integrated optical circuits |
US6629763B2 (en) * | 2000-06-17 | 2003-10-07 | Schott Glas | Object which has optical layers |
DE10029905A1 (de) * | 2000-06-17 | 2002-01-03 | Schott Auer Gmbh | Reflektor, insbesondere zur Anwendung bei einem Kraftfahrzeug |
US6785433B2 (en) | 2000-08-09 | 2004-08-31 | Artificial Sensing Instruments Asi Ag | Waveguide grid array and optical measurement arrangement |
JP2002056989A (ja) | 2000-08-11 | 2002-02-22 | Seiko Epson Corp | 発光装置 |
JP2004524785A (ja) | 2000-08-16 | 2004-08-12 | シーメンス アクチエンゲゼルシヤフト | 巻線本体および貫通もしくは挿入された光導体を有する巻線装置 |
JP2002139638A (ja) * | 2000-08-23 | 2002-05-17 | Matsushita Electric Ind Co Ltd | 光学素子及びその製造方法 |
DE60118474T2 (de) | 2000-08-23 | 2006-09-07 | Matsushita Electric Industrial Co., Ltd., Kadoma | Optisches Element und Verfahren zu seiner Herstellung |
DE10048243A1 (de) * | 2000-09-29 | 2002-04-18 | Bosch Gmbh Robert | Substrat mit geglätteter Oberfläche und Verfahren zu seiner Herstellung |
FR2815417B1 (fr) * | 2000-10-13 | 2003-10-31 | Shakticom | Filtre optique, son procede de fabrication et son utilisation pour un systeme multiplex |
FR2816062B1 (fr) * | 2000-10-27 | 2003-10-31 | Shakticom | Filtre optique, son procede de fabrication par dopage ionique et son utilisation pour un systeme multiplex |
EP1417521B1 (fr) * | 2000-10-13 | 2005-12-14 | Compagnie Industrielle des Lasers Cilas | Filtres optiques, leur procede de fabrication et leur utilisation pour un systeme multiplex |
GB2369820B (en) * | 2000-12-08 | 2003-04-23 | Univ Southampton | Fabrication of substrates for planar waveguide devices and planar waveguide devices |
US6875379B2 (en) * | 2000-12-29 | 2005-04-05 | Amkor Technology, Inc. | Tool and method for forming an integrated optical circuit |
US6980710B2 (en) * | 2001-03-09 | 2005-12-27 | Waveguide Solutions Inc | Process for efficient light extraction from light emitting chips |
GB0106050D0 (en) * | 2001-03-12 | 2001-05-02 | Suisse Electronique Microtech | Polarisers and mass-production method and apparatus for polarisers |
US20040101636A1 (en) * | 2001-03-29 | 2004-05-27 | Markus Kuhr | Method for producing a coated synthetic body |
US6792303B2 (en) * | 2001-05-11 | 2004-09-14 | Scimed Life Systems, Inc. | Apparatus for improved sensor accuracy |
US20020191916A1 (en) * | 2001-06-15 | 2002-12-19 | Confluent Photonics, Corporation | Vertical waveguide tapers for optical coupling between optical fibers and thin silicon waveguides |
ATE528117T1 (de) | 2001-08-30 | 2011-10-15 | Bayer Technology Services Gmbh | Verfahren zur herstellung von abformkörpern, insbesondere optischen strukturen, und deren verwendung |
DE10152002A1 (de) * | 2001-10-22 | 2003-05-08 | Infineon Technologies Ag | Halbleitervorrichtung mit mehrschichtigem Aufbau sowie Verfahren zu dessen Herstellung |
US20030110808A1 (en) * | 2001-12-14 | 2003-06-19 | Applied Materials Inc., A Delaware Corporation | Method of manufacturing an optical core |
US20030113085A1 (en) * | 2001-12-14 | 2003-06-19 | Applied Materials, Inc., A Delaware Corporation | HDP-CVD film for uppercladding application in optical waveguides |
KR100418908B1 (ko) * | 2001-12-21 | 2004-02-14 | 엘지전자 주식회사 | 광도파로용 실리카막 제조방법 |
US6728286B2 (en) | 2002-08-07 | 2004-04-27 | Honeywell International Inc. | Method of joining mirrors to ring laser gyro block assemblies |
US6936194B2 (en) * | 2002-09-05 | 2005-08-30 | Molecular Imprints, Inc. | Functional patterning material for imprint lithography processes |
US6902871B2 (en) * | 2002-10-03 | 2005-06-07 | Lumera Corporation | Method for manufacturing polymer microstructures and polymer waveguides |
US6905773B2 (en) * | 2002-10-22 | 2005-06-14 | Schlage Lock Company | Corrosion-resistant coatings and methods of manufacturing the same |
US7080528B2 (en) * | 2002-10-23 | 2006-07-25 | Applied Materials, Inc. | Method of forming a phosphorus doped optical core using a PECVD process |
US6937811B2 (en) * | 2002-11-19 | 2005-08-30 | Lumera Corporation | Polymer waveguide devices incorporating electro-optically active polymer clads |
KR100895148B1 (ko) * | 2002-11-20 | 2009-05-04 | 엘지전자 주식회사 | 고분자 광도파관 그레이팅 제조방법 |
US20040112862A1 (en) * | 2002-12-12 | 2004-06-17 | Molecular Imprints, Inc. | Planarization composition and method of patterning a substrate using the same |
US20040191639A1 (en) * | 2003-03-26 | 2004-09-30 | Danliang Jin | Micro-imprinting method and template for use in same |
US7307118B2 (en) | 2004-11-24 | 2007-12-11 | Molecular Imprints, Inc. | Composition to reduce adhesion between a conformable region and a mold |
US20060108710A1 (en) * | 2004-11-24 | 2006-05-25 | Molecular Imprints, Inc. | Method to reduce adhesion between a conformable region and a mold |
US6985664B2 (en) * | 2003-08-01 | 2006-01-10 | Corning Incorporated | Substrate index modification for increasing the sensitivity of grating-coupled waveguides |
JP4453335B2 (ja) * | 2003-10-22 | 2010-04-21 | 富士ゼロックス株式会社 | 光回路パターン及び高分子光導波路の製造方法 |
US7122482B2 (en) | 2003-10-27 | 2006-10-17 | Molecular Imprints, Inc. | Methods for fabricating patterned features utilizing imprint lithography |
US6852563B1 (en) | 2004-01-21 | 2005-02-08 | Lumera Corporation | Process of fabricating electro-optic polymer devices with polymer sustained microelectrodes |
US7241394B2 (en) * | 2004-01-21 | 2007-07-10 | Lumera Corporation | Process of fabricating polymer sustained microelectrodes |
US7250712B2 (en) * | 2004-01-21 | 2007-07-31 | Lumera Corporation | Polymer sustained microelectrodes |
US7125949B2 (en) * | 2004-01-21 | 2006-10-24 | Lumera Corporation | Fluorinated sol-gel electro-optic materials, process for producing same, and devices therefrom |
US8076386B2 (en) | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
US7939131B2 (en) | 2004-08-16 | 2011-05-10 | Molecular Imprints, Inc. | Method to provide a layer with uniform etch characteristics |
US20060062922A1 (en) | 2004-09-23 | 2006-03-23 | Molecular Imprints, Inc. | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
US20060081557A1 (en) * | 2004-10-18 | 2006-04-20 | Molecular Imprints, Inc. | Low-k dielectric functional imprinting materials |
US7759407B2 (en) | 2005-07-22 | 2010-07-20 | Molecular Imprints, Inc. | Composition for adhering materials together |
US8557351B2 (en) * | 2005-07-22 | 2013-10-15 | Molecular Imprints, Inc. | Method for adhering materials together |
US8808808B2 (en) | 2005-07-22 | 2014-08-19 | Molecular Imprints, Inc. | Method for imprint lithography utilizing an adhesion primer layer |
US8142703B2 (en) * | 2005-10-05 | 2012-03-27 | Molecular Imprints, Inc. | Imprint lithography method |
US7218802B1 (en) | 2005-11-30 | 2007-05-15 | Corning Incorporated | Low drift planar waveguide grating sensor and method for manufacturing same |
US7505651B2 (en) * | 2006-10-06 | 2009-03-17 | Motorola, Inc. | Optical planar wavelength selective filter and method of manufacture |
DE102006054310A1 (de) * | 2006-11-17 | 2008-05-29 | Siemens Ag | Vermessen eines Hohlraums mittels zylindersymmetrischer Triangulation |
JP5101345B2 (ja) * | 2008-03-04 | 2012-12-19 | 日東電工株式会社 | 光導波路装置の製造方法 |
EP2110694B1 (en) | 2008-04-18 | 2013-08-14 | Sony DADC Austria AG | Method for manufacturing an optical waveguide, optical waveguide, and sensor arrangement |
DE102008046579A1 (de) * | 2008-09-10 | 2010-03-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer optischen Wellenleiterschicht |
US8442360B2 (en) * | 2008-11-05 | 2013-05-14 | Gigoptix, Inc. | Intrinsically low resistivity hybrid sol-gel polymer clads and electro-optic devices made therefrom |
KR20110100618A (ko) * | 2008-12-05 | 2011-09-14 | 로터스 어플라이드 테크놀로지, 엘엘씨 | 향상된 장벽 층 특성을 갖는 얇은 막의 고속 증착 |
DE102010063704A1 (de) * | 2010-12-21 | 2012-06-21 | Elgan-Diamantwerkzeuge Gmbh & Co. Kg | Bearbeitungsverfahren und Bearbeitungswerkzeug zum Bearbeiten einer gekrümmten Werkstückoberfläche |
DE102012214440B3 (de) | 2012-08-14 | 2013-10-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Planaroptisches Element, Sensorelement und Verfahren zu deren Herstellung |
US9018108B2 (en) | 2013-01-25 | 2015-04-28 | Applied Materials, Inc. | Low shrinkage dielectric films |
DE102016015587B4 (de) | 2016-12-31 | 2019-11-21 | Technische Universität Braunschweig | Substrat und dessen Herstellung |
Family Cites Families (21)
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---|---|---|---|---|
US3674336A (en) * | 1970-08-28 | 1972-07-04 | Bell Telephone Labor Inc | Light wave coupling into thin film light guides with bragg type gratings |
US3822928A (en) * | 1971-08-02 | 1974-07-09 | Bell Telephone Labor Inc | Thin film light guide |
US4579750A (en) * | 1980-07-07 | 1986-04-01 | Massachusetts Institute Of Technology | Laser heated CVD process |
NL8302461A (nl) * | 1983-07-11 | 1985-02-01 | Philips Nv | Geodetisch optisch element. |
NL8303905A (nl) * | 1983-11-15 | 1985-06-03 | Philips Nv | Werkwijze voor het vervaardigen van een geodetische component en geintegreerde optische inrichting die deze component bevat. |
US4749245A (en) * | 1985-03-11 | 1988-06-07 | Kuraray Co., Ltd. | Thin film waveguide device and manufacturing method for making same |
CA1268618A (en) * | 1986-11-05 | 1990-05-08 | William P. Trumble | Method for making an optical waveguide element |
JP2539406B2 (ja) * | 1987-02-04 | 1996-10-02 | 株式会社日立製作所 | 固体光ピツクアツプ |
US4827870A (en) * | 1987-10-05 | 1989-05-09 | Honeywell Inc. | Apparatus for applying multilayer optical interference coating on complex curved substrates |
JPH01131031A (ja) * | 1987-11-16 | 1989-05-23 | Seiko Epson Corp | ガラス転写体の製造方法 |
JPH01169203U (es) * | 1988-05-20 | 1989-11-29 | ||
JPH0258284A (ja) * | 1988-08-24 | 1990-02-27 | Nec Corp | 回折格子の製造方法 |
FR2646930B1 (fr) * | 1989-05-12 | 1993-04-09 | Essilor Int | Procede de realisation d'un element diffractif, utilisable notamment dans la fabrication de lentilles optiques artificielles, et lentilles ainsi obtenues |
US5138687A (en) * | 1989-09-26 | 1992-08-11 | Omron Corporation | Rib optical waveguide and method of manufacturing the same |
US4955977A (en) * | 1989-10-11 | 1990-09-11 | Eastman Kodak Company | Nonlinear optical article with improved buffer layer |
FR2658307A1 (fr) * | 1990-02-13 | 1991-08-16 | Thomson Csf | Guide d'onde optique integre et procede de realisation. |
DE4008405C1 (es) | 1990-03-16 | 1991-07-11 | Schott Glaswerke, 6500 Mainz, De | |
US5009920A (en) * | 1990-03-30 | 1991-04-23 | Honeywell Inc. | Method for applying optical interference coating |
US5026135A (en) * | 1990-04-20 | 1991-06-25 | E. I. Du Pont De Nemours And Company | Moisture sealing of optical waveguide devices with doped silicon dioxide |
DE59109246D1 (de) | 1990-05-03 | 2003-04-03 | Hoffmann La Roche | Mikrooptischer Sensor |
DE4137606C1 (es) * | 1991-11-15 | 1992-07-30 | Schott Glaswerke, 6500 Mainz, De |
-
1992
- 1992-08-29 DE DE4228853A patent/DE4228853C2/de not_active Expired - Fee Related
- 1992-09-12 AT AT94109950T patent/ATE344933T1/de not_active IP Right Cessation
- 1992-09-12 EP EP94109950A patent/EP0622647B1/de not_active Expired - Lifetime
- 1992-09-12 DE DE59209662T patent/DE59209662D1/de not_active Expired - Fee Related
- 1992-09-12 DE DE59210005T patent/DE59210005D1/de not_active Expired - Fee Related
- 1992-09-12 AT AT92115622T patent/ATE178144T1/de not_active IP Right Cessation
- 1992-09-12 ES ES92115622T patent/ES2136068T3/es not_active Expired - Lifetime
- 1992-09-12 EP EP92115622A patent/EP0533074B1/de not_active Expired - Lifetime
- 1992-09-18 CA CA002078612A patent/CA2078612C/en not_active Expired - Fee Related
- 1992-09-18 US US07/946,072 patent/US5369722A/en not_active Expired - Lifetime
- 1992-09-18 JP JP4273410A patent/JP2903033B2/ja not_active Expired - Fee Related
-
1995
- 1995-04-07 US US08/418,895 patent/US5480687A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2903033B2 (ja) | 1999-06-07 |
ATE344933T1 (de) | 2006-11-15 |
EP0533074B1 (de) | 1999-03-24 |
EP0622647A3 (en) | 1994-12-07 |
DE4228853C2 (de) | 1993-10-21 |
DE4228853A1 (de) | 1993-03-25 |
EP0622647A2 (de) | 1994-11-02 |
US5480687A (en) | 1996-01-02 |
EP0533074A1 (de) | 1993-03-24 |
ATE178144T1 (de) | 1999-04-15 |
CA2078612C (en) | 1999-08-24 |
CA2078612A1 (en) | 1993-03-19 |
DE59209662D1 (de) | 1999-04-29 |
EP0622647B1 (de) | 2006-11-08 |
US5369722A (en) | 1994-11-29 |
DE59210005D1 (de) | 2006-12-21 |
JPH05273427A (ja) | 1993-10-22 |
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