ES2131568T3 - Titanocenos no fluorados y su utilizacion. - Google Patents

Titanocenos no fluorados y su utilizacion.

Info

Publication number
ES2131568T3
ES2131568T3 ES93810229T ES93810229T ES2131568T3 ES 2131568 T3 ES2131568 T3 ES 2131568T3 ES 93810229 T ES93810229 T ES 93810229T ES 93810229 T ES93810229 T ES 93810229T ES 2131568 T3 ES2131568 T3 ES 2131568T3
Authority
ES
Spain
Prior art keywords
alkyl
rest
formula
yes
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES93810229T
Other languages
English (en)
Inventor
Vincent Desobry
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Ciba SC Holding AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Application granted granted Critical
Publication of ES2131568T3 publication Critical patent/ES2131568T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/28Titanium compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F17/00Metallocenes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148Light sensitive titanium compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerization Catalysts (AREA)
  • Paints Or Removers (AREA)

Abstract

COMPUESTOS TITANOCENOS QUE ESTAN LIBRES DE FLUORO Y DE FORMULA I Y FORMULA II Y SE EMPLEAN COMO FOTOINICIADORES PARA LA FOTOPOLIMERIZACION DE COMPUESTOS CON DOBLES ENLACES INSATURADOS ETILENICAMENTE. SIENDO: A, ALQUILENO DE C 1 A 12; R1 Y R10, INDEPENDIENTES ENTRE SI, CICLOPENTADIENILO MENOS SUSTITUIDO POR ALQUILO, ALCOXI O SI(R2)3; R2 Y R2 ALQUILO; R3, R4, R5 INDEPENDIENTES ENTRE SI, H, CL, ALQUILO, CICLOALQUILO, ADAMANTILO, FENILO, PIRILO O BIFENILO QUE PUEDE ESTAR SUSTITUIDO O NO POR ALQUILO, CL, ALQUILTIO, 1 A 10 O EL GRUPO ALQUENILO, ALCOXI, CICLOALCOXI, FENOXI, BENCILOXI, TETRAHIDROFORFURILOXI, ALQUILOTIO, CICLOALQUILTIO, BENCILTIO O FENILTIO; R6 Y R6 INDEPENDIENTES ENTRE SI, ALQUILO O ALQUENILO O JUNTAMENTE CON UN NITROGENO UN RESTO MORFOLINO; R7 ALQUILO, CICLOALQUILO O FENILO; R8 FENILO O ALQUILO DE C 4 A 6 TERCIARIO EN POSICION A; RQ HIDROGENO, ALQUILO, CICLOALQUILO O UN RESTO DE FORMULA V; RQ Y RQ EN -N(RQ)2 IGUALES O DIFERENTES Y CON UN ATOMO ELEGIDO ENTRE N, S Y O FORMAN UN HETEROCICLICO DE 5 O 6 MIEMBROS; R10 RQ O FENILO NO SUSTITUIDO O SUSTITUIDO CON CLORO, ALQUILO DE C 1 A 12, ALCOXI DE C 1 A 10, ALQUILTIO DE C 1 A 8, FENOLOTIO, MORFOLINO O -N(ALQUILO DE C 1 A 4)2; X -O, -S O UN RESTO DE FORMULA CLORO, BROMO, IODO, CN, SCN O DO Q UN RESTO PIRIMIDILO Y EL RESTO R3 Y R4 ALCOXI, CICLOALQUILO, FENOXI, BENCILOXI, TETRAHIDROFURFORILOXI, O ALQUENILOXI Y SI Z - NR10 -; R3 Y R4 BROMO, IODO O CLORO.
ES93810229T 1992-04-09 1993-03-30 Titanocenos no fluorados y su utilizacion. Expired - Lifetime ES2131568T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH115592 1992-04-09

Publications (1)

Publication Number Publication Date
ES2131568T3 true ES2131568T3 (es) 1999-08-01

Family

ID=4203769

Family Applications (1)

Application Number Title Priority Date Filing Date
ES93810229T Expired - Lifetime ES2131568T3 (es) 1992-04-09 1993-03-30 Titanocenos no fluorados y su utilizacion.

Country Status (8)

Country Link
US (1) US5340701A (es)
EP (1) EP0565488B1 (es)
JP (1) JP3341032B2 (es)
KR (1) KR100265063B1 (es)
CA (1) CA2093611A1 (es)
DE (1) DE59309521D1 (es)
ES (1) ES2131568T3 (es)
TW (1) TW237456B (es)

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US5648308A (en) * 1995-08-10 1997-07-15 Albemarle Corporation Process for upgrading metallocene catalysts
US5679814A (en) * 1995-12-11 1997-10-21 Albemarle Corporation Purification of metallocenes
US6867888B2 (en) * 1996-07-12 2005-03-15 Science Applications International Corporation Switchable polymer-dispersed liquid crystal optical elements
US7312906B2 (en) * 1996-07-12 2007-12-25 Science Applications International Corporation Switchable polymer-dispersed liquid crystal optical elements
JP3770436B2 (ja) * 1997-12-15 2006-04-26 富士写真フイルム株式会社 光重合性組成物
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
DE19961355A1 (de) * 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiatorsystem mit Titanocen-Initiatoren
AR029489A1 (es) * 2000-03-10 2003-07-02 Euro Celtique Sa Piridinas, pirimidinas, pirazinas, triazinas sustituidas por arilo, composiciones farmaceuticas y el uso de las mismas para la manufactura de un medicamento
AR037233A1 (es) * 2001-09-07 2004-11-03 Euro Celtique Sa Piridinas aril sustituidas, composiciones farmaceuticas y el uso de dichos compuestos para la elaboracion de un medicamento
AR036873A1 (es) * 2001-09-07 2004-10-13 Euro Celtique Sa Piridinas aril sustituidas a, composiciones farmaceuticas y el uso de las mismas para la preparacion de un medicamento
US7270528B2 (en) * 2002-05-07 2007-09-18 3D Systems, Inc. Flash curing in selective deposition modeling
ITMI20022072A1 (it) * 2002-10-01 2004-04-02 Lafabrica S R L Metodo per la decorazione di un substrato ceramico poroso ed in particolare del gres porcellanato levigato.
EA011009B1 (ru) 2003-01-14 2008-12-30 Арена Фармасьютикалз Инк. 1,2,3-тризамещённые арильные и гетероарильные производные в качестве модуляторов метаболизма и профилактика и лечение расстройств, связанных с ним, таких как диабет и гипергликемия
AR045047A1 (es) 2003-07-11 2005-10-12 Arena Pharm Inc Derivados arilo y heteroarilo trisustituidos como moduladores del metabolismo y de la profilaxis y tratamiento de desordenes relacionados con los mismos
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
DOP2006000010A (es) 2005-01-10 2006-07-31 Arena Pharm Inc Procedimiento para preparar eteres aromáticos
MY148521A (en) 2005-01-10 2013-04-30 Arena Pharm Inc Substituted pyridinyl and pyrimidinyl derivatives as modulators of metabolism and the treatment of disorders related thereto
US9207373B2 (en) 2007-04-10 2015-12-08 Stoncor Group, Inc. Methods for fabrication and highway marking usage of agglomerated retroreflective beads
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
US8876513B2 (en) * 2008-04-25 2014-11-04 3D Systems, Inc. Selective deposition modeling using CW UV LED curing
WO2010060702A1 (en) 2008-11-03 2010-06-03 Basf Se Photoinitiator mixtures
JP5374403B2 (ja) 2009-02-13 2013-12-25 三菱製紙株式会社 感光性平版印刷版材料
EP2497768B1 (en) * 2009-11-02 2016-04-20 SNU R & DB Foundation Novel 2, 4-pyrimidine derivatives and use thereof
WO2012040279A1 (en) 2010-09-22 2012-03-29 Arena Pharmaceuticals, Inc. Modulators of the gpr119 receptor and the treatment of disorders related thereto
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
CN104854684B (zh) * 2012-11-14 2017-10-10 太阳化学公司 用于制造背面钝化太阳能电池的组合物和方法
MX2021011472A (es) 2015-01-06 2022-08-17 Arena Pharm Inc Metodos de condiciones de tratamiento relacionadas con el receptor s1p1.
US10301262B2 (en) 2015-06-22 2019-05-28 Arena Pharmaceuticals, Inc. Crystalline L-arginine salt of (R)-2-(7-(4-cyclopentyl-3-(trifluoromethyl)benzyloxy)-1,2,3,4-tetrahydrocyclo-penta [b]indol-3-yl)acetic acid(Compund1) for use in SIPI receptor-associated disorders
CN108884196B (zh) * 2016-03-31 2021-06-18 陶氏环球技术有限责任公司 烯烃聚合催化剂体系及其使用方法
MX2019009841A (es) 2017-02-16 2020-01-30 Arena Pharm Inc Compuestos y metodos para el tratamiento de la colangitis biliar primaria.
US10465029B2 (en) * 2018-02-02 2019-11-05 Pacific Light & Hologram, Inc. Photosensitive resin and manufacturing method thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548891A (en) * 1983-02-11 1985-10-22 Ciba Geigy Corporation Photopolymerizable compositions containing prepolymers with olefin double bonds and titanium metallocene photoinitiators
US4590287A (en) * 1983-02-11 1986-05-20 Ciba-Geigy Corporation Fluorinated titanocenes and photopolymerizable composition containing same
US4713401A (en) * 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
EP0256981B1 (de) * 1986-08-01 1993-02-17 Ciba-Geigy Ag Titanocene und deren Verwendung
EP0270490B1 (de) * 1986-11-10 1990-10-10 Ciba-Geigy Ag Verbessertes Verfahren zur Herstellung von metallorganischen Verbindungen
US5008302A (en) * 1987-12-01 1991-04-16 Ciba-Geigy Corporation Titanocenes, the use thereof, and N-substituted pyrroles
US5026625A (en) * 1987-12-01 1991-06-25 Ciba-Geigy Corporation Titanocenes, the use thereof, and n-substituted fluoroanilines
DE59007807D1 (de) * 1989-06-01 1995-01-12 Ciba Geigy Ag Neue sauerstoffhaltige Titanocene und deren Verwendung.
US5068371A (en) * 1989-06-01 1991-11-26 Ciba-Geigy Corporation Novel nitrogen-containing titanocenes, and the use thereof

Also Published As

Publication number Publication date
KR100265063B1 (ko) 2000-09-01
JPH0641170A (ja) 1994-02-15
DE59309521D1 (de) 1999-05-27
EP0565488A1 (de) 1993-10-13
US5340701A (en) 1994-08-23
TW237456B (es) 1995-01-01
EP0565488B1 (de) 1999-04-21
CA2093611A1 (en) 1993-10-10
KR930021649A (ko) 1993-11-22
JP3341032B2 (ja) 2002-11-05

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