EP4624914A1 - Electrode and electrochemical measurement system - Google Patents

Electrode and electrochemical measurement system

Info

Publication number
EP4624914A1
EP4624914A1 EP23894464.9A EP23894464A EP4624914A1 EP 4624914 A1 EP4624914 A1 EP 4624914A1 EP 23894464 A EP23894464 A EP 23894464A EP 4624914 A1 EP4624914 A1 EP 4624914A1
Authority
EP
European Patent Office
Prior art keywords
electrode
layer
thickness
niobium
niobium layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP23894464.9A
Other languages
German (de)
English (en)
French (fr)
Inventor
Masayoshi Katagiri
Ayaka TOSHIMA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of EP4624914A1 publication Critical patent/EP4624914A1/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/28Electrolytic cell components
    • G01N27/30Electrodes, e.g. test electrodes; Half-cells
    • G01N27/308Electrodes, e.g. test electrodes; Half-cells at least partially made of carbon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material

Definitions

  • the present invention relates to an electrode and an electrochemical measurement system.
  • the electrode is used as an electrode for electrochemical measurement, and is required to have excellent activity responsive to a ferricyan compound.
  • the present invention provides an electrode and an electrochemical measurement system that have excellent activity responsive to a ferricyan compound and can suppress the change in surface resistance after a long time.
  • the present invention [2] includes the electrode described in the above-described [1], wherein the thickness of the niobium layer is 10 nm or more.
  • the present invention [3] includes the electrode described in the above-described [1], wherein the thickness of the niobium layer is 20 nm or more.
  • the present invention [4] includes the electrode described in the above-described in any one of the above-described [1] to [3], wherein with respect to a surface resistance R0 of a one-side surface of the electrode in the thickness direction, a ratio ([R1-R0]/R0) of a value obtained by subtracting the surface resistance R0 from a surface resistance R1 of the one-side surface after the electrode is left to stand at 40°C and 92%RH for 240 hours is 0.10 or less.
  • the present invention [5] includes the electrode described in any one of the above-described [1] to [4], wherein the substrate is a resin film.
  • the present invention [6] includes the electrode described in the above-described [5], being an electrode for an electrochemical measurement.
  • the present invention [7] includes an electrochemical measurement system including: the electrode described in the above-described [6].
  • the electrode of the present invention includes a niobium layer between a substrate and a conductive carbon layer, and thus has excellent activity responsive to a ferricyan compound.
  • the niobium layer has a thickness of 5 nm or more, and thus the change in surface resistance after a long time can be suppressed.
  • the electrochemical measurement system has excellent sensitivity to a ferricyan compound and excellent reliability of the sensitivity for a long period of time.
  • FIG. 1 With reference to FIG. 1 , one embodiment of an electrode of the present invention is described.
  • an electrode 1 has a thickness.
  • the electrode 1 extends in a plane direction.
  • the plane direction is perpendicular to the thickness direction.
  • the electrode 1 has a film shape or a sheet shape. The film and sheet are not distinguished.
  • the electrode 1 has a thickness of, for example, 2 ⁇ m or more, preferably 10 ⁇ m or more, and is, for example, 1000 ⁇ m or less, preferably 500 ⁇ m or less.
  • the electrode 1 includes a substrate 2, a niobium layer 3, and a conductive carbon layer 4 in this order toward one side in the thickness direction.
  • the resin examples include polyester resin, acetate resin, polyether sulfone resin, polycarbonate resin, polyamide resin, polyimide resin, polyolefin resin, (meth)acrylic resin, polyvinyl chloride resin, polyvinylidene chloride resin, polystyrene resin, polyvinyl alcohol resin, polyarylate resin, and polyphenylene sulfide resin.
  • the resins can be used alone or in combination of two or more.
  • polyester resin is used, and preferably polyethylene terephthalate is used.
  • the substrate 2 has a thickness of, for example, 1.9 ⁇ m or more, preferably 9 ⁇ m or more, and is, for example, 999 ⁇ m or less, preferably 499 ⁇ m or less.
  • the niobium layer 3 is disposed on a one-side surface of the substrate 2 in the thickness direction.
  • the niobium layer 3 is in contact with the one-side surface of the substrate 2 in the thickness direction.
  • the niobium layer 3 extends in the plane direction.
  • the niobium layer 3 is an underlying layer. The underlying layer assists the electrical conductivity of the conductive carbon layer 4.
  • the niobium layer 3 has a thickness of 5 nm or more. When the thickness of the niobium layer 3 is less than 5 nm, the activity responsive to a ferricyan compound decreases.
  • the conductive carbon layer 4 is disposed at one end portion of the electrode 1 in the thickness direction.
  • the conductive carbon layer 4 is disposed on a one-side surface of the niobium layer 3 in the thickness direction.
  • the conductive carbon layer 4 is in contact with the one-side surface of the niobium layer 3 in the thickness direction.
  • the conductive carbon layer 4 is disposed on the opposite side to the substrate 2 with respect to the niobium layer 3 in the thickness direction.
  • the conductive carbon layer 4 has a thickness of, for example, 0.1 nm or more, preferably 0.2 nm or more, and 100 nm or less, preferably 50 nm or less.
  • the ratio ([R1-R0]/R0) of the value obtained by subtracting the surface resistance R0 from a surface resistance R1 of the one-side surface after the electrode 1 is left to stand at 40°C and 92%RH for 240 hours is, for example, 2.00 or less, preferably 1.0 or less, more preferably 0.50 or less, even more preferably 0.20 or less, even more preferably 0.10 or less, 0.04 or less, 0.02 or less, 0.01 or less, less than 0.01, and is, for example, -0.10 or more, preferably -0.05 or more.
  • the above-described ratio ([R1-R0]/R0) is the above-described upper limit or less, the reliability of the sensitivity is excellent for a long period of time.
  • the surface resistances R0 and R1 are determined as follows.
  • a substrate 2 is prepared.
  • a niobium layer 3 is formed on a one-side surface of the substrate 2 in the thickness direction.
  • the method of forming a niobium layer 3 is not particularly limited. Examples of the method of forming the niobium layer 3 include a dry method and a wet method. As the method of forming the niobium layer 3, preferably a dry method is used. Examples of the dry method include a PVD method (physical vapor deposition method) and a CVD method (chemical vapor deposition method). Preferably, a PVD method is used. Examples of the PVD method include sputtering, vacuum deposition, laser deposition, and ion plating. As PVD, preferably, sputtering is used.
  • the target in sputtering is, for example, niobium. Electricity can be applied to the target.
  • the target has, for example, a plate shape.
  • the electricity is appropriately set, corresponding to the thickness of the niobium layer 3.
  • the sputtering gas include an inert gas.
  • the inert gas include Ar.
  • the pressure in the sputtering is, for example, 0.01 Pa or more and 5 Pa or less.
  • the film forming temperature is, for example, -10°C or more, preferably 20°C or more, and, for example, 200°C or less, preferably 150°C or less.
  • a conductive carbon layer 4 is formed on a one-side surface of the niobium layer 3 in the thickness direction.
  • the method of forming the conductive carbon layer 4 is not particularly limited.
  • the conductive carbon layer 4 may be formed by the same method as the method of forming the niobium layer 3, and is preferably formed by sputtering.
  • the target in the sputtering is, for example, sintered carbon.
  • the application of the electrode 1 is not limited.
  • the electrode 1 can preferably be used as an electrode for electrochemical measurement for carrying out an electrochemical measurement, in particular as a working electrode (working pole) for carrying out cyclic voltammetry (CV).
  • a working electrode working pole
  • CV cyclic voltammetry
  • Examples of the object of the electrochemical measurement include a ferricyan compound.
  • Examples of the ferricyan compound include potassium ferricyanide and sodium ferricyanide.
  • An electrochemical measurement system 10 includes a working electrode 11, a reference electrode 12, a counter electrode 13, a potentiostat 14, and an ammeter (not shown).
  • the working electrode 11 includes the electrode 1 described above.
  • the electrochemical measurement system 10 includes the electrode 1 described above. That is, the electrode 1 is used for electrochemical measurements.
  • Examples of the reference electrode 12 include a silver/silver chloride electrode, a saturated calomel electrode, and a standard hydrogen electrode.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Battery Electrode And Active Subsutance (AREA)
EP23894464.9A 2022-11-21 2023-11-13 Electrode and electrochemical measurement system Pending EP4624914A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022185810 2022-11-21
PCT/JP2023/040725 WO2024111455A1 (ja) 2022-11-21 2023-11-13 電極および電気化学測定システム

Publications (1)

Publication Number Publication Date
EP4624914A1 true EP4624914A1 (en) 2025-10-01

Family

ID=91195595

Family Applications (1)

Application Number Title Priority Date Filing Date
EP23894464.9A Pending EP4624914A1 (en) 2022-11-21 2023-11-13 Electrode and electrochemical measurement system

Country Status (5)

Country Link
EP (1) EP4624914A1 (cg-RX-API-DMAC7.html)
JP (1) JPWO2024111455A1 (cg-RX-API-DMAC7.html)
CN (1) CN120188035A (cg-RX-API-DMAC7.html)
TW (1) TW202441030A (cg-RX-API-DMAC7.html)
WO (1) WO2024111455A1 (cg-RX-API-DMAC7.html)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021193631A1 (ja) 2020-03-26 2021-09-30 日東電工株式会社 電極

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3647309B2 (ja) * 1999-04-30 2005-05-11 キヤノン株式会社 電極及びその製造方法及び該電極を用いた電気化学センサー
JP4245438B2 (ja) * 2003-08-08 2009-03-25 シャープ株式会社 炭素薄膜ならびにそれを用いた電界放出電子源および作用電極
WO2021192248A1 (ja) * 2020-03-27 2021-09-30 子誠 朱 電極及び電極チップ
WO2023190657A1 (ja) * 2022-03-31 2023-10-05 日東電工株式会社 電極および電気化学測定システム

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021193631A1 (ja) 2020-03-26 2021-09-30 日東電工株式会社 電極

Also Published As

Publication number Publication date
JPWO2024111455A1 (cg-RX-API-DMAC7.html) 2024-05-30
WO2024111455A1 (ja) 2024-05-30
CN120188035A (zh) 2025-06-20
TW202441030A (zh) 2024-10-16

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