EP4367282A1 - Procédé et dispositif de production de structures de nanocarbone en couches - Google Patents

Procédé et dispositif de production de structures de nanocarbone en couches

Info

Publication number
EP4367282A1
EP4367282A1 EP22747643.9A EP22747643A EP4367282A1 EP 4367282 A1 EP4367282 A1 EP 4367282A1 EP 22747643 A EP22747643 A EP 22747643A EP 4367282 A1 EP4367282 A1 EP 4367282A1
Authority
EP
European Patent Office
Prior art keywords
carbon
carbon coating
coating layer
workpiece surface
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP22747643.9A
Other languages
German (de)
English (en)
Inventor
Kostas LIAPIS
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lion Alternative Energy Plc
Original Assignee
Lion Alternative Energy Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US17/854,612 external-priority patent/US20230009488A1/en
Application filed by Lion Alternative Energy Plc filed Critical Lion Alternative Energy Plc
Publication of EP4367282A1 publication Critical patent/EP4367282A1/fr
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025Metallic sublayers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605Carbon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221Ion beam deposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation

Definitions

  • the present application relates to the field of vacuum deposition of layered nanocarbon structures, including diamond-like carbon coatings on a surface.
  • Diamond-like carbon coatings may be applied to various surfaces and products such as cutting, molding, and measuring tools, friction units and machine components, and video and audio heads in electronics to protect and increase service life. Diamond-like carbon coatings may also be applied to surfaces and products to improve the biological compatibility of medical implants and instruments.
  • Conventional diamond-like coating devices may include a pulsed carbon plasma source having electrodes connected to a voltage source, a storage, and a deflection coil (see, e.g., U.S. Patent No.
  • One embodiment of the present disclosure is a method for producing layered nanocarbon structures.
  • the method includes placing a workpiece in a working chamber, applying a vacuum to the working chamber, processing the workpiece surface with gas ions, and applying a material sublayer on the workpiece surface.
  • the method includes depositing carbon ions from a carbon plasma on the workpiece surface. The deposited carbon ions apply a carbon coating on the workpiece surface.
  • the method includes irradiating the growing carbon coating with accelerated ions of an inert gas at a first energy range to apply a linear chain and polymer spl carbon coating layer on the sp3 carbon coating layer.
  • the method includes irradiating the growing carbon coating with accelerated ions of the inert gas at a second energy range, different from the first energy range, to apply a graphite sp2 carbon coating layer on the sp 1 carbon coating layer.
  • the method further includes generating at least one cathode spot on an end face of a graphite cathode and generates the carbon plasma and the at least one cathode spot moves with a speed of about 10 - 30 m/s and generates carbon plasma with ion energy of 40 - 100 eV and an ion concentration between about 10 12 - 10 14 cm 3 .
  • the inert gas is argon, and the first energy range is about 50 to about 100 eV.
  • the inert gas is argon, and the second energy range is above 150 eV.
  • a thickness of each amorphous diamond-like sp3 carbon coating layer, graphite sp2 carbon coating layer, and linear chain and polymer spl carbon coating layer is within the range of about 20 to 100 nm.
  • the material sublayer is applied to the workpiece surface by a magnetron sputtering device or a stationary electric arc cathode vacuum.
  • the material sublayer is a metal film with a thickness of about 10 to 50 nm.
  • the metal is one of titanium, chromium, or molybdenum.
  • the method further includes, prior to placing the workpiece in the working chamber, performing a preliminary preparation of a workpiece surface.
  • the preliminary preparation of the workpiece surface is a chemical treatment.
  • the method further includes applying additional amorphous diamond-like sp3 carbon coating layers, graphite sp2 carbon coating layers, and linear chain and polymer spl carbon coating layers to the workpiece to produce a multi-layer coating including of a plurality of layered nanocarbon structures with a plurality of nanocarbon layers in each structure and each layered nanocarbon structure includes at least an amorphous diamond-like sp3 layer, a graphite sp2 layer, and a linear chain and polymer spl carbon layer.
  • Another embodiment of the present disclosure includes a device for producing layered nanocarbon structures in vacuum.
  • the device includes a vacuum chamber, a carbon plasma generator, and an accelerated gas ion source.
  • the carbon plasma generator is configured to deposit carbon ions from a generated carbon plasma on a workpiece surface.
  • the deposited carbon ions apply an amorphous diamond-like sp3 carbon coating layer on the workpiece surface.
  • the accelerated gas ion source is configured to irradiate the growing carbon coating with accelerated ions of an inert gas at a first energy range to apply a graphite sp2 carbon coating layer on the sp3 carbon coating layer and irradiate the growing carbon coating with accelerated ions of the inert gas at a second energy range, different from the first energy range, to apply a linear chain and polymer spl carbon coating layer on the sp2 carbon coating layer.
  • the carbon plasma generator includes a housing.
  • the housing includes an anode connected to the vacuum chamber and electrically connected to a solenoid, a replaceable graphite cathode within the housing and positioned out of center relative to the solenoid axis and in the direction of a workpiece, an ignition unit, and an ignition electrode coaxially located relative to the cathode.
  • the carbon plasma generator generates at least one cathode spot on an end face of the graphite cathode to generate the carbon plasma.
  • a longitudinal axis of the accelerated gas ion source is directed to the workpiece at an angle of about 30 to 60 degrees relative to a longitudinal axis of the replaceable graphite cathode.
  • the device further includes a magnetron sputtering device configured to applying a material sublayer on the workpiece surface.
  • Another embodiment of the present disclosure is a workpiece having layered nanocarbon structures.
  • the layered nanocarbon structures produced by a method including placing the workpiece in a working chamber.
  • the method includes applying a vacuum to the working chamber.
  • the method includes processing the workpiece surface with gas ions.
  • the method includes applying a metal material sublayer on the workpiece surface.
  • the method includes depositing carbon ions from a carbon plasma on the workpiece surface.
  • the deposited carbon ions apply an amorphous diamond-like sp3 carbon coating layer on the workpiece surface.
  • the method includes irradiating the growing carbon coating with accelerated ions of an inert gas at a first energy range to apply a graphite sp2 carbon coating layer on the sp3 carbon coating layer.
  • the method includes irradiating the growing carbon coating with accelerated ions of the inert gas at a second energy range, different from the first energy range, to apply a linear chain and polymer spl carbon coating layer on the s
  • the layered nanocarbon structures include a plurality of layered nanocarbon structures with a plurality of nanocarbon layers in each structure and each layered nanocarbon structure includes at least an amorphous diamond-like sp3 layer, a graphite sp2 layer, and a linear chain and polymer spl carbon layer.
  • FIG. 1 is a side view of a vacuum plasma carbon disposition systemin accordance with the present disclosure.
  • FIG. 2 is a flow diagram for an exemplary process to produce layered nanocarbon structures in vacuum in accordance with the present disclosure.
  • Fig. 1 depicts a vacuum plasma carbon disposition system, arranged in accordance with at least some of the embodiments described herein.
  • System 10 may include an ion source 20, a drift chamber 30, a magnetic system 40, an arc -driven accelerator 50, a table 70, a magnetron sputtering device 80, a processor 110, and a memory 115.
  • Memory 115 may include instructions 120.
  • Processor 110 may be in communication with ion source 20, drift chamber 30, magnetic system 40, and arc-driven accelerator 50.
  • a substrate 60 to be processed may be placed on table 70.
  • Ion source 20 may include a source of inert gas from which ion source 20 may generate working gas ions 25.
  • Inert gas may be argon or nitrogen-containing argon.
  • Ion source 20 may include a gas injector in the form of a ring-shaped toroid and may include an opening for cyclic injection of working gas ions into drift chamber 30.
  • Ion source 20 may generate an ion beam current of about 0.2 mA to 1 A, an ion energy of about 50 eV to 1.5 keV, and an ion beam output with a diameter of about 10 cm.
  • Arc-driven accelerator 50 may be a sputtering source and may include a housing for a carbon plasma source.
  • the housing may include an anode.
  • the anode may be connected to vacuum drift chamber 30 and may be electrically connected to a solenoid.
  • the arc-driven accelerator may include a replaceable metal cathode.
  • the replaceable metal cathode may be within the housing and may be positioned out of center relative to the solenoid axis and in the direction of a workpiece or a processed product, such as substrate 60, which may be outside the cathode visibility area.
  • a workpiece or a processed product may be any item or material to be coated with nanocarbon structures.
  • Arc-driven accelerator may further include an ignitor with an ignition device and an ignition electrode which may be ring-shaped and may be coaxially located relative to the cathode.
  • Arc-driven accelerator 50 may further include a cylindrical or circular inductor.
  • Magnetic system 40 may be proximate to arc-driven accelerator 50 and may include a coil under drift chamber 30 which may create a longitudinal magnetic field within drift chamber 30.
  • Arc-driven accelerator 50 may be configured to apply a carbon coating to substrate 60 by pulsed electric arc cathode vacuum deposition.
  • Arc-driven accelerator 50 may apply a carbon coating to substrate 60 by generating at least one cathode spot on the end surface of the graphite cathode to generate a carbon plasma 55.
  • the at least one cathode spot may move at a speed of 10 to 30 m/s and may generate carbon plasma 55 with ion energy of about 40 to 100 eV and an ion concentration in generated carbon plasma 55 is about 10 12 to 10 14 cm 3 .
  • vacuum plasma carbon disposition system 10 may include an anode of a pulsed carbon plasma source combined with a gas injector in a single structure.
  • Magnetron sputtering device 80 may be configured to apply a metal film 85 with a thickness of 10 to 50 nm as a sublayer material to substrate 60.
  • Metal film 85 may include titanium, chromium, or molybdenum.
  • metal film 85 may be applied by a stationary electric arc cathode vacuum with a thickness of 10 to 50 nm as a sublayer material to substrate 60.
  • Vacuum plasma carbon disposition system 10 may perform a sequential series of process operations to deposit nanocarbon structures on substrate 60 without depressurization of drift chamber 30.
  • Processor 110 may execute instructions 120 in memory 115 to control ion source 20 to direct accelerated gas ions 25 towards substrate 60.
  • Ion source 20 may direct gas ions 25 towards substrate 60 to clean a surface of substrate 60.
  • processor 110 may execute instructions 120 in memory 115 to control magnetron sputtering device 80 to apply a titanium adhesive layer metal film 85 to substrate 60.
  • Processor 110 may execute instructions 120 in memory 115 to control ion source 20 to subsequently direct gas ions 25 towards substrate 60 to repeat ion cleaning process of substrate 60. Parameters of gas ions 25 such as ion beam current and ion energy may be stored in memory 120 and selected specifically for substrate 60 by processor 110.
  • vacuum plasma carbon disposition system 10 may be configured to apply layered nanocarbon structures to substrate 60 with the layers including an amorphous diamond-like sp3 film, a graphite sp2 film, and a spl linear chain and polymer carbon film with a thickness of each layer within the range of about 20 to 100 nm.
  • Vacuum plasma carbon disposition system 10 may apply a sp3 carbon barrier layer to substrate 60.
  • Vacuum plasma carbon disposition system 10 may, by processor 110 executing instructions 120 in memory 115, apply a vacuum to chamber 30 to a residual pressure of 10 2 to 10 3 Pa.
  • Processor 110 may execute instructions 120 in memory 115 to control arc-driven accelerator 50, to supply carbon plasma 55 towards substrate 60 by pulsed electric arc cathode vacuum deposition.
  • Processor 110 may execute instructions 120 in memory 115 to control magnetic system 40 to direct carbon plasma 55 toward substrate 60.
  • Vacuum plasma carbon disposition system 10 may apply a sp3 carbon coating 94 to substrate 60 based on arc-driven accelerator 50 generating carbon plasma 55 directed towards substrate 60 and ion source 20 generating gas ions 25 directed towards substrate 60.
  • Processor 110 may execute instructions 120 in memory 115 to control parameters of ion source 20 in order to apply sp3 carbon coating 94 to substrate 60 and metal film 85 by arc- driven accelerator 50.
  • Ion source 20 may direct gas ions 25 towards substrate 60 at an angle of 30 to 60 degrees relative to the cathode longitudinal axis of arc-driven accelerator 50.
  • Processor 110 may execute instructions 120 in memory 115 to control ion source 20 to generate gas ions 25 with irradiated energies of inert argon ions in a narrow energy range of about 120 eV to apply sp3 carbon coating 94 to substrate 60 by arc-driven accelerator 50.
  • processor 110 may execute instructions 120 in memory 115 to control ion source 20 to not generate gas ions 25 to apply sp3 carbon coating 94 to substrate 60 previous sp3 carbon coating layer 94 by arc-driven accelerator 50.
  • Vacuum plasma carbon disposition system 10 may control parameters of ion source 20 in order to apply a spl carbon coating 90 to substrate 60 and previous sp3 carbon coating layer 94 by arc-driven accelerator 50.
  • Processor 110 may execute instructions 120 in memory 115 to control ion source 20 to generate gas ions 25 with irradiated energies of inert argon ions in an energy range of about 50 to 100 eV to apply spl carbon coating 90 to substrate 60 by arc- driven accelerator 50.
  • Vacuum plasma carbon disposition system 10 may control parameters of ion source 20 in order to apply a sp2 carbon coating 92 to substrate 60 and previous spl carbon coating layer 90 by arc-driven accelerator 50.
  • Processor 110 may execute instructions 120 in memory 115 to control ion source 20 to generate gas ions 25 with irradiated energies of inert argon ions in an energy range of above 150 eV to apply sp2 carbon coating 92 to substrate 60 and previous spl carbon coating layer 90 by arc-driven accelerator 50.
  • processor 110 may execute instructions 120 in memory 115 for a preset program to control ion source 20 to apply a sp3 carbon coating 94 to substrate 60 and metal film 85 by arc-driven accelerator 50.
  • Processor 110 may execute instructions 120 in memory 115 for the preset program to control ion source 20 to apply a biocompatible spl carbon coating 90 over sp3 carbon coating 94 using arc-driven accelerator 50 and ion source 20.
  • Processor 110 may execute instructions 120 in memory 115 to apply a sp2 carbon coating 92 over spl carbon coating 90 based on the preset program in instructions 120 in memory 115 to control ion source 20 operating with a predetermined set of energy characteristics. The cycle may be repeated several times, with alternating spl, sp2, and sp3 layers in any order or combination until a desired result is achieved in terms of the coating quality.
  • a method for producing layered nanocarbon structures in vacuum may include preliminary preparation of substrate 60 surface by a chemical treatment of substrate 60 surface, placing substrate 60 in working chamber 30, applying a vacuum to chamber 30 to a residual pressure of about 10 2 to 10 3 Pa, and processing substrate 60 surface with gas ions at an accelerating voltage of about 2 keV and a current of about 3 A.
  • a method for producing layered nanocarbon structures in vacuum may include applying sub-layer of material metal film 85, for example titanium, on the treated surface of substrate 60 and applying a carbon coating using pulsed electric arc cathode vacuum deposition with a graphite cathode to the sub-layer of material by generating at least one cathode spot on the end surface of the graphite cathode.
  • the at least one cathode spot may move at a speed of about 10 to 30 m/s and generate carbon plasma with ion energy of about 40 to 100 eV and an ion concentration in the generated carbon plasma may be about 10 12 to 10 14 cm 3 .
  • a method for producing layered nanocarbon structures in vacuum may include depositing the resulting carbon plasma on substrate 60 surface, resulting in the production of carbon diamond-like sp3 coating 94 on substrate 60 surface, and periodically irradiating the growing carbon film with accelerated ions of an inert gas with ion energy of about 20 to 150 eV and cyclically injecting hydrocarbon and/or monomer gas into working chamber 30 up to a pressure of 0.1 to 1.0 Pa to obtain a coating of 2 to 10 sandwich structures with four layers per structure, each structure including amorphous diamond-like sp3 film 94, graphite sp2 film 92, and spl linear chain and polymer carbon film 90 with a thickness of each layer within the range of about 20 to 100 nm.
  • the inert gas may be argon and nitrogen-containing argon.
  • the energy of irradiating inert argon ions may control the production of films with a predominant content of each carbon phase. For example, at certain configurations of plasma sources and at energies of inert argon ions of about 50 to 100 eV, a coating of linear chain carbon of the spl phase 90 may be produced; at energies of inert argon ions above 150 eV, a coating of sp2 graphite phase 92 may be produced; and at irradiated energies of inert argon ions in a narrow energy range of about 120 eV, a coating of sp3 phase 94 may be produced.
  • a workpiece, such as substrate 60 may include a sublayer material, which may be metal film 85 with a thickness of 10 to 50 nm and may include titanium, chromium, or molybdenum.
  • Metal film 85 may be obtained by a stationary electric arc cathode vacuum or a magnetron sputtering source as detailed above.
  • processor 110 may execute instructions 120 in memory 115 to applying a negative bias voltage of about 100 to 600 V to metal film 85 of substrate 60 and synchronize the negative bias voltage with pulses from the carbon plasma source while applying carbon nanostructures to substrate 60.
  • processor 110 may execute instmctions 120 in memory 115 to select an energy of the gas ions 25 based on the type of carbon phase to be deposited during the layered structure growth and adjusting the energy of ion source 20 by a programmable ion source power supply.
  • acetylene and/or nitrogen may be the hydrocarbon and/or monomer gas.
  • a device in accordance with the present disclosure may allow a diamond-like sp3 coating to be applied to elongated products.
  • a device in accordance with the present disclosure may provide a reliable ignition system for a diamond-like sp3 coating system.
  • a device in accordance with the present disclosure may provide uniform coating thickness to a product.
  • a device in accordance with the present disclosure may provide a diamondlike sp3 coating without contamination of the carbon plasma.
  • a device in accordance with the present disclosure may provide a diamondlike sp3 coating without degradation of diamond properties due to condensate precipitation.
  • a device in accordance with the present disclosure may provide a diamondlike sp3 coating without degradation of diamond properties due to interweaving of spl and sp2 layers.
  • a device in accordance with the present disclosure may apply layered nanocarbon structures to a workpiece with the layers including an amorphous diamond-like sp3 film 94, a graphite sp2 film 92, and a spl linear chain and polymer carbon film 90 with a thickness of each layer within the range of 20 to 100 nm.
  • a device in accordance with the present disclosure may provide a diamondlike sp3 coating without degradation of diamond properties which may provide a protective coating that is corrosive resistant under moisture and atmospheric oxygen.
  • a device in accordance with the present disclosure may provide a diamondlike sp3 coating which may provide fire and explosion resistance. [00049] Fig.
  • An exemplary process may include one or more operations, actions, or functions as illustrated by one or more of blocks S2, S4, S6, S8, S10, S12 and/or S14. Although illustrated as discrete blocks, various blocks may be divided into additional blocks, combined into fewer blocks, or eliminated, depending on the desired implementation.
  • Processing may begin at block S2, "Place a workpiece in a working chamber.”
  • a workpiece may be placed into a chamber.
  • the workpiece may be a substrate and the working chamber may be a vacuum chamber.
  • Processing may continue from block S2 to block S4, “Apply a vacuum to the working chamber.”
  • a vacuum may be applied to the working chamber.
  • the vacuum may be applied to a residual pressure of about 10 2 to 10 3 Pa.
  • Processing may continue from block S4 to block S6, "Process the workpiece surface with gas ions.”
  • the workpiece surface may be processed with gas ions to clean the workpiece surface.
  • the gas ions may have an accelerating voltage of about 2 keV and a current of 3 A.
  • Processing may continue from block S6 to block S8, "Apply a material sublayer on the workpiece surface.”
  • a material sublayer may be applied on the workpiece surface.
  • the material sublayer may be applied to the workpiece surface by a magnetron sputtering device or a stationary electric arc cathode vacuum.
  • the material sublayer may be a metal film with a thickness of about 10 to 50 nm and the metal may be is one of titanium, chromium, or molybdenum.
  • Processing may continue from block S8 to block S10, "Deposit carbon ions from a carbon plasma on the workpiece surface, wherein the deposited carbon ions apply an amorphous diamond-like sp3 carbon coating layer on the workpiece surface.”
  • carbon ions from a carbon plasma may be deposited on the workpiece surface.
  • the deposited carbon ions may apply an amorphous diamond-like sp3 carbon coating layer on the workpiece surface.
  • Processing may continue from block S 10 to block S 12, "Irradiate the growing carbon coating with accelerated ions of an inert gas at a first energy range to apply a linear chain and polymer spl carbon coating layer on the sp3 carbon coating layer.”
  • accelerated ions of the inert gas at a second energy range may irradiate the growing carbon coating.
  • the accelerated ions of the inert gas at the second energy range may apply a linear chain and polymer sp 1 carbon coating layer on the sp3 carbon coating layer.
  • the inert gas may be argon and the second energy range may be about 50 to 100 eV.
  • Processing may continue from block S 12 to block S 14, "Irradiate the growing carbon coating with accelerated ions of the inert gas at a second energy range, different from the first energy range, to apply a graphite sp2 carbon coating layer on the spl carbon coating layer.”
  • accelerated ions of an inert gas may irradiate the growing carbon coating.
  • the accelerated ions of the inert gas may have a first energy range and may apply a graphite sp2 carbon coating layer on the spl carbon coating layer.
  • the inert gas may be argon and the first energy range may be above 150 eV.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Procédés de production de structures de nanocarbone en couches, les procédés consistant à placer une pièce à usiner dans une chambre de travail ; à faire le vide dans la chambre ; à traiter la surface de la pièce à usiner à l'aide d'ions gazeux ; à appliquer une sous-couche de matériau sur la surface de la pièce à usiner ; à déposer des ions carbone à partir d'un plasma au carbone sur la surface de la pièce à usiner afin d'appliquer une couche de revêtement de carbone sp3 du type diamant amorphe sur la surface de la pièce à usiner. Les procédés consistent à irradier le revêtement de carbone en croissance à l'aide d'ions accélérés d'un gaz inerte à une première plage d'énergie, afin d'appliquer une couche de revêtement de carbone sp2 de graphite sur la couche de revêtement de carbone sp3 ; et à irradier le revêtement de carbone en croissance à l'aide d'ions accélérés du gaz inerte à une seconde plage d'énergie, différente de la première plage d'énergie, afin d'appliquer une couche de revêtement de carbone sp1 à chaîne linéaire et polymère sur la couche de revêtement de carbone sp2.
EP22747643.9A 2021-07-07 2022-07-06 Procédé et dispositif de production de structures de nanocarbone en couches Pending EP4367282A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163219131P 2021-07-07 2021-07-07
US17/854,612 US20230009488A1 (en) 2021-07-07 2022-06-30 Method and device for producing layered nanocarbon structures
PCT/EP2022/068804 WO2023280951A1 (fr) 2021-07-07 2022-07-06 Procédé et dispositif de production de structures de nanocarbone en couches

Publications (1)

Publication Number Publication Date
EP4367282A1 true EP4367282A1 (fr) 2024-05-15

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP22747643.9A Pending EP4367282A1 (fr) 2021-07-07 2022-07-06 Procédé et dispositif de production de structures de nanocarbone en couches

Country Status (2)

Country Link
EP (1) EP4367282A1 (fr)
WO (1) WO2023280951A1 (fr)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI79351C (fi) 1988-01-18 1989-12-11 Asko Anttila Foerfarande och anordning foer ytbelaeggning av material.
RU2095464C1 (ru) * 1996-01-12 1997-11-10 Акционерное общество закрытого типа "Тетра" Биокарбон, способ его получения и устройство для его осуществления
JP5852619B2 (ja) * 2013-09-24 2016-02-03 ユニオンツール株式会社 非晶質炭素含有皮膜
RU2564288C2 (ru) * 2013-11-05 2015-09-27 Андрей Федорович Александров Плёнка двумерно упорядоченного линейно-цепочечного углерода и способ её получения

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WO2023280951A1 (fr) 2023-01-12

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