EP4225961A1 - Procédé de fabrication d'un revêtement, et revêtement - Google Patents
Procédé de fabrication d'un revêtement, et revêtementInfo
- Publication number
- EP4225961A1 EP4225961A1 EP21769446.2A EP21769446A EP4225961A1 EP 4225961 A1 EP4225961 A1 EP 4225961A1 EP 21769446 A EP21769446 A EP 21769446A EP 4225961 A1 EP4225961 A1 EP 4225961A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- coating
- substrate
- range
- slpm
- micrometers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 100
- 239000011248 coating agent Substances 0.000 title claims abstract description 74
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 112
- 239000000758 substrate Substances 0.000 claims abstract description 86
- 239000000463 material Substances 0.000 claims abstract description 83
- 230000008569 process Effects 0.000 claims abstract description 66
- 238000007750 plasma spraying Methods 0.000 claims abstract description 16
- 238000005507 spraying Methods 0.000 claims abstract description 12
- 239000007921 spray Substances 0.000 claims description 77
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 33
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 31
- 239000002245 particle Substances 0.000 claims description 30
- -1 rare earth silicate Chemical class 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 17
- 229910052759 nickel Inorganic materials 0.000 claims description 16
- 150000002910 rare earth metals Chemical class 0.000 claims description 14
- 239000002131 composite material Substances 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 229910000601 superalloy Inorganic materials 0.000 claims description 5
- 150000004645 aluminates Chemical class 0.000 claims description 4
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- 230000007704 transition Effects 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 53
- 239000010410 layer Substances 0.000 description 36
- 239000000843 powder Substances 0.000 description 26
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- 229910052786 argon Inorganic materials 0.000 description 10
- 238000001000 micrograph Methods 0.000 description 10
- 239000000835 fiber Substances 0.000 description 8
- 239000012071 phase Substances 0.000 description 7
- 239000001307 helium Substances 0.000 description 6
- 229910052734 helium Inorganic materials 0.000 description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000003991 Rietveld refinement Methods 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 239000011253 protective coating Substances 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 238000010290 vacuum plasma spraying Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 239000012720 thermal barrier coating Substances 0.000 description 4
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000002318 adhesion promoter Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000005524 ceramic coating Methods 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910021523 barium zirconate Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000012432 intermediate storage Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910014031 strontium zirconium oxide Inorganic materials 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
- B05B7/22—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
- B05B7/222—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
- B05B7/226—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material being originally a particulate material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/40—Surface treatments
Definitions
- the invention relates to a method for producing a coating, in which a substrate is provided, the substrate is provided with a coating, in particular by atmospheric plasma spraying, a plasma torch with a torch nozzle being used, with which a plasma jet is generated from a supplied process gas, and wherein a supplied spray material is applied to the substrate with the plasma jet to obtain the coating.
- TBC Thermal Barrier Coatings
- EBC Environmental Barrier Coatings
- T/EBC Thermal/Environmental Barrier Coatings
- EP 1 142 850 A1 discloses a T/EBC for such. It is described that the coatings can be deposited, in other words deposited, using various previously known methods, with atmospheric plasma spraying and vacuum um plasma spraying (English: Atmospheric Plasma Spraying, APS, as well as Vacuum Plasma Spraying, VPS), Chemical Vapor Deposition (English: Chemical Vapor Deposition, CVD), High Velocity Oxy Fuel (HVOF) and Physical Vapor Phase Deposition ( English: Physical Vapor Deposition, PVD).
- atmospheric plasma spraying and vacuum um plasma spraying English: Atmospheric Plasma Spraying, APS, as well as Vacuum Plasma Spraying, VPS
- Chemical Vapor Deposition English: Chemical Vapor Deposition, CVD
- High Velocity Oxy Fuel HVOF
- Physical Vapor Phase Deposition English: Physical Vapor Deposition, PVD.
- WO 2006/029587 A discloses a method for producing thin, dense ceramic layers using APS.
- the layers In order to be able to guarantee the necessary protective performance in the long term, the layers should be created with as little stress as possible, without cracks and, depending on the application, as tightly as possible. Due to their high melting points, high process temperatures are required in order to apply ceramic materials in the molten state to the respective workpieces. Atmospheric Plasma Spraying (APS), Vacuum Plasma Spraying (VPS) and High Velocity Oxygen Spraying (HVOF) are the most commonly used thermal coating processes.
- APS Atmospheric Plasma Spraying
- VPS Vacuum Plasma Spraying
- HVOF High Velocity Oxygen Spraying
- a spray material in the form of particles or suspensions is applied to the substrate surface to be coated using a plasma jet.
- a plasma is a hot gas in which the neutral particles are dissociated and ionized.
- a so-called plasma torch which comprises a cathode and at least one anode, which are spaced apart from one another to form a narrow gap, is used to generate the plasma.
- An arc is generated between the electrodes by high-frequency ignition.
- a plasma jet in particular several centimeters long, is formed, which is bundled and exits the nozzle of the plasma torch at high speed.
- the spray material in powder form or as a suspension is injected into the plasma jet. Due to the high plasma temperatures, it is melted, entrained with the plasma jet and thrown onto the substrate to be coated.
- the setting of the process parameters of the spraying process is of crucial importance with regard to the quality and the efficiency of the coating produced.
- the burner nozzle is characterized by a nozzle diameter or a minimum nozzle diameter in the range from 4 mm to 8 mm, in particular 5 mm to 8 mm, preferably 5 mm to 7 mm, and that the process gas flow is at least 40 slpm.
- Slpm stands here in a manner known per se for standard liters per minute.
- the high kinetic energy of the particles means that the impacting particles create a compacted layer.
- the torch nozzle forms that final area, in other words the end area of the plasma torch, from which the plasma jet emerges during operation and which accordingly faces or faces the substrate to be coated. It can be formed by the anode of the plasma torch or, in the case of several anodes, by the anodes of the plasma torch or a section thereof, in particular on the outlet side.
- the nozzle can also be a separate component or element from the anode(s), which is then expediently arranged (immediately) following the anode(s).
- the nozzle is preferably at least essentially ring-shaped and defines a flow channel or flow channel section.
- the nozzle generally defines an outlet-side end section of a flow channel defined overall by the plasma torch.
- the nozzle diameter means the inner diameter of the nozzle.
- the diameter of the flow channel or flow channel section defined by the nozzle is the diameter of the flow channel or flow channel section defined by the nozzle.
- the burner nozzle is characterized by a nozzle diameter that remains the same over its expansion in the direction of the gas or plasma flow (flow direction). It can be, for example, a cylindrical nozzle or a nozzle with a cylindrical flow channel (section). The nozzle diameter is then the same everywhere over the nozzle extension and the constant nozzle diameter, which is the same everywhere, lies according to the invention in the aforementioned ranges.
- the nozzle diameter can also change.
- the minimum nozzle diameter is to be taken into account, which according to the invention is then in the stated range.
- the nozzle diameter can increase, for example, in the direction of the exit end of the nozzle.
- the minimum nozzle diameter would then be present at the nozzle inlet and the maximum nozzle diameter at the nozzle outlet.
- the diameter can also first decrease over the nozzle extension and then increase again, so that the minimum nozzle diameter would be given at a position between the nozzle inlet and the nozzle outlet.
- a conical taper in the direction of the nozzle outlet would also be conceivable. Then the nozzle would have its maximum diameter at the entrance and its minimum diameter at the exit.
- crystalline or partially crystalline or largely crystalline coatings When carrying out the method according to the invention, preference is given to producing crystalline or partially crystalline or largely crystalline coatings.
- Largely crystalline is to be understood in particular as meaning that coatings are produced which are at least 50%, preferably at least 60%, particularly preferably at least 80% crystalline.
- the percentage values relate in particular to the mass fraction.
- particularly dense and/or partially crystalline silicon, silicate, aluminate, hafnate layers or perovskite layers or mixtures thereof can be produced as the coating or as part of the coating.
- Layers obtained in the manner according to the invention have improved microstructures which ensure an improved protective effect and a longer service life of the layers compared to layers sprayed with conventional PS, in particular APS.
- the implementation of the method according to the invention is very economical, in particular significantly more profitable than methods that use the HVOF process.
- Particularly dense is to be understood in particular as meaning layers which are distinguished by a porosity of at most 15%, preferably at most 10%, particularly preferably at most 5%.
- the method according to the invention has also proven to be particularly advantageous for obtaining coatings which, when produced by means of plasma spraying under conventional process parameters, tend to be deposited amorphously and which should or must be particularly dense for a given application, in particular a porosity of should or must have a maximum of 15%, preferably a maximum of 10%, particularly preferably a maximum of 5%. This is possible with the procedure according to the invention.
- the process gas flow is expediently that through the burner nozzle.
- a preferred embodiment of the method according to the invention is characterized in that the process gas stream is at least 50 slpm, in particular at least 60 slpm, preferably at least 70 slpm, particularly preferably at least 100 slpm, very particularly preferably at least 150 slpm.
- a process gas flow of a level in the range mentioned is set.
- An upper limit of the process gas stream can be 400 slpm or 500 slpm, for example. It has proven to be particularly economical if the process gas flow is a maximum of 200 slpm. Values from this range have proven to be particularly suitable in the context of the method according to the invention.
- a particularly high gas velocity and a particularly short dwell time in the plasma torch are achieved. As a result, particularly dense coatings can be obtained which are characterized by a high degree of crystallinity.
- the nozzle diameter and the process gas flow are preferably selected in such a way that a gas velocity of at least 1250 m/s, in particular in the range from 1250 m/s to 2500 m/s, is obtained in the burner nozzle. In this case, it applies in particular that such a speed is achieved at least in the area of the minimum nozzle diameter. In particular in the event that the nozzle diameter remains the same, this can of course also apply over the entire extent of the nozzle.
- At least one compressed gas tank can be used in combination with a mass flow controller.
- Argon, helium, hydrogen or nitrogen in particular have proven to be suitable process gases.
- a mixture of two or more of these gases can also be used as the process gas.
- the process gas flow is to be understood as meaning the total flow of process gas, even if several process gases are used in a mixture.
- both single-layer and multi-layer coatings can be produced with the method according to the invention.
- Several layers can be deposited one on top of the other, as is already well known from the conventional production methods.
- the method according to the invention also makes it possible to produce particularly thick layers, in particular those of at least 100 micrometers, in just one coating pass. Comparatively thick layers can thus be obtained with only one pass over the area to be coated and thus a combination of particularly good protective effect with particularly little effort.
- rare earth silicate for example Yb2Si2O7.
- These materials have proven particularly useful for EBCs. They are characterized, for example, by an adapted thermal expansion coefficient and high chemical compatibility with SiC-based substrates. They are stable at high temperatures and offer increased corrosion resistance to water.
- a spray material which comprises or is provided by at least one rare earth aluminate, preferably Y3Al5O12 and/or YAIO3 and/or LaMgAl11O19.
- rare earth aluminate preferably Y3Al5O12 and/or YAIO3 and/or LaMgAl11O19.
- Si with doping and/or
- a spray material which comprises or is provided by at least one rare earth hexaaluminate, in particular LaMgAl11O19.
- the spray material can include only one material or a mixture of materials. Purely by way of example, it should be mentioned that it comprises a mixture of two or more different rare earth silicates and/or two or more different rare earth hexaaluminates or is provided by such a mixture. For example, a mixture of one or more rare earth silicates and one or more rare earth hexaaluminates is also conceivable. Spray materials with or made of rare earth silicates have proven to be particularly suitable, for example, when coatings are to be produced on substrates made of fiber composite materials, as is often the case in the space sector, for example.
- Spray materials with or made of rare earth aluminates have proven to be particularly suitable, for example, when coatings on substrates with or made of nickel, for example with or made of nickel-based superalloys, and/or with or made of (fully oxidic) ceramic fiber composite materials based on aluminum oxide/aluminum silicate/zirconium dioxide, as is often the case in the field of turbine technology. In particular, they have a suitably adapted thermal expansion coefficient for these materials.
- a spray material with an average particle diameter of at most 80 micrometers, in particular at most 50 micrometers, preferably at most 40 micrometers, particularly preferably at most 30 or at most 25 micrometers, is used.
- the spray material is characterized by an average particle diameter of at least 15 micrometers or at least 10 micrometers or at least 5 micrometers.
- An average particle diameter can be determined, for example, in a manner known per se by laser diffractometry, in particular with Horiba LA-950 V2.
- a spray material with an average particle diameter of less than 30 micrometers is used.
- a preferred production method for a spray material, in particular in powder form is agglomerated and sintered.
- the method according to the invention can correspondingly include that first of all the spray material, in particular in powder form, is produced, preferably by agglomeration and sintering taking place. Also melted or sintered and broken powder (English: fused and crushed) can be used.
- the method according to the invention can correspondingly include that first of all the spray material, in particular in powder form, is produced by melting and/or sintering and breaking.
- Layers obtained according to the invention can form a complete protective coating, such as EBC, or, for example, also only a part of such.
- the substrate provided can be uncoated or already have a (partial) coating.
- a cover layer for example a Yb2Si2O7 cover layer for an EBC system
- the coating produced according to the invention then forms part of an EBC layer system.
- the spraying distance between the burner nozzle and the substrate As far as the spraying distance between the burner nozzle and the substrate is concerned, it has proven to be particularly suitable if this is in the range from 60 mm to 200 mm, in particular 70 mm to 180 mm, preferably 80 mm to 140 mm. It can particularly preferably be 100 mm or 120 mm. Another example of a suitable spray distance is 80 mm.
- the current can be, for example, in the range from 300 A to 550 A, in particular in the range from 300 A to 400 A or 400 A to 500 A, preferably 375 A or 450 A or 470 A.
- the unit symbol A is there in a well-known manner for amperes.
- the current is expediently the working current that is used to at least partially ionize the process gas between the cathode and anode(s) of the plasma torch and thus to generate a plasma.
- the burner speed is a maximum of 2000 mm/s. It is in particular in the range from 100 mm/s to 1500 mm/s, preferably from 400 mm/s to 600 mm/s. It is particularly preferably 250 mm/s or 500 mm/s.
- the torch speed is in particular the relative speed between the plasma torch and the substrate to be coated during the coating process. This is expediently in the lateral direction parallel to the surface of the substrate to be coated. The movement is usually realized by moving the plasma torch relative to the substrate, for example by means of a robot on which the plasma torch is mounted. The plasma torch is then moved at a speed in the aforementioned ranges during the coating process.
- the delivery rate of the spray material in particular in powder form, if it is at least 5 g/min, in particular at least 10 g/min, in other words is selected or set accordingly.
- it can be 10 g/min or 30 g/min or 90 g/min, which has proven to be very suitable. It may also be the case that the delivery rate of the spray material is a maximum of 150 g/min.
- the substrate Before and/or during the application of the coating, the substrate is expediently heated. Provision can be made, for example, for the substrate to be preheated at least in sections to a temperature of at least 200° C. before the coating is applied.
- the substrate can be heated at least in sections to a temperature of at least 250° C., preferably at least 300° C., during the application of the coating.
- heating to a temperature in the range from 200° C. to 700° C., preferably 300° C. to 500° C. can take place.
- the substrate has a temperature in the range from 200° C. to 700° C., preferably 300° C. to 500° C., at least in sections during the application of the coating.
- the substrate can be heated to 270°C, 400°C or 500°C or even 600°C, for example.
- the substrate has a temperature in the range from 200° C. to 700° C., preferably 300° C. to 500° C., at least in sections during the application of the coating.
- the process according to the invention has proved to be particularly suitable for obtaining coatings on substrates which comprise or consist of silicon, such as silicon carbide and/or silicon nitride.
- substrates which comprise or consist of silicon, such as silicon carbide and/or silicon nitride.
- silicon such as silicon carbide and/or silicon nitride.
- a substrate made of a fiber composite material is coated with a silicon bond coat.
- substrates with or made of other materials can also be provided and coated in the manner according to the invention.
- Substrates with or made of nickel, in particular with or made of a nickel-based superalloy, and/or substrates with or made of aluminum oxide-based composite materials are also suitable, for example.
- the process gas flow is at least 100 slpm, preferably in the range from 100 slpm to 500 slpm, particularly preferably in the range from 100 slpm to 400 slpm
- the burner nozzle is characterized by a nozzle diameter or a minimum nozzle diameter in the range from 5 mm to 8 mm, preferably 5 mm to 7 mm, particularly preferably 6 to 7 mm, and that a spray material with an average particle diameter of at most 40 micrometers is used, in particular a spray material with an average particle diameter in the range from 5 micrometers to 40 micrometers, preferably in the range from 10 micrometers to 40 micrometers, particularly preferably in the range from 15 micrometers to 40 micrometers, and that the substrate is heated at least in sections to a temperature of at least 300°C during the application of the coating, in particular to a temperature in the region of 300° C to 700°C, preferably in the range of 300°C to 500°C.
- the temperature of at least 300°C during the application of
- the spraying distance between the burner nozzle and the substrate is at least 100 mm, preferably in the range from 100 mm to 200 mm, and that the current is at least 400 A, preferably in the range from 400 A to 550 A located. It has proven to be particularly advantageous if these values for spray distance and current are combined with the values for process gas flow, nozzle diameter, particle size and substrate temperature(s) mentioned in the previous paragraph.
- a spray material with an average particle diameter of less than 30 micrometers is particularly preferably used in combination with the above parameters, in particular a spray material with an average particle diameter in the range from 15 micrometers to 29 micrometers, preferably 10 micrometers to 29 micrometers, particularly preferably 15 micrometers to 29 microns.
- Burner nozzle diameter 4 mm to 8 mm, in particular 5 mm to 8 mm, preferably 5 mm to 7 mm, particularly preferably 5 mm or 6.5 mm
- Average particle diameter at most 50 microns, of the spray material preferably at most 30 microns or less than 30 microns
- Spray distance 70 mm to 180 mm, preferably 80 mm to 120 mm, particularly preferably 100 mm
- Process gas flow at least 40 slpm, preferably at least
- Torch speed maximum 2000 mm/s, preferably 100 mm/s to 1500 mm/s, particularly preferably 500 mm/s
- Spray material delivery rate at least 10 g/min, preferably 30 g/min
- Substrate temperature at least 200°C during preheating, at least 250°C, preferably 270°C during coating
- this combination of process parameters can be used, for example, to obtain protective layers, in particular with or made of at least one rare earth silicate, preferably Yb2Si2O7, and/or with or made of at least one rare earth hexaaluminate, in particular LaMgAl11O19, with a low crack density and increased crystallinity.
- at least one rare earth silicate preferably Yb2Si2O7
- at least one rare earth hexaaluminate in particular LaMgAl11O19
- Burner nozzle diameter 4 mm to 8 mm, in particular 5 mm to 8 mm, preferably 5 mm to 7 mm, particularly preferably 5 mm or 6.5 mm
- Mean particle diameter maximum 50 microns, of the spray material preferably a maximum of 40 microns or less than 40 microns 70 mm to 180 mm, preferably 100 mm to 150 mm, particularly preferably 120 mm
- Process gas flow at least 80 slpm, preferably at least
- Torch speed maximum 2000 mm/s, preferably 200 mm/s to 1000 mm/s, particularly preferably 500 mm/s
- Spray material delivery rate at least 10 g/min, preferably 30 g/min
- Substrate temperature at least 200°C during preheating, at least 300°C, preferably 400°C during coating
- this combination of process parameters is very suitable, for example, for the production of protective layers, in particular with or from at least one rare earth silicate, preferably Yb2Si2O7, and/or with or from at least one rare earth hexaaluminate, in particular LaMgAl11O19, with high crystallinity and a particularly low proportion of foreign phases .
- Yb2Si2O7 preferably Yb2Si2O7
- rare earth hexaaluminate in particular LaMgAl11O19
- Burner nozzle diameter 4 mm to 8 mm, in particular 5 mm to 8 mm, preferably 5 mm to 7 mm, particularly preferably 5 mm or 6.5 mm
- Mean particle diameter at most 50 micrometers, of the spray material preferably at most 30 micrometers or below 30 micrometers
- Spray distance 70 mm to 180 mm, preferably 100 mm to 150 mm, particularly preferably 120 mm
- Process gas flow at least 80 slpm, preferably at least
- Torch speed maximum 2000 mm/s, preferably 200 mm/s to 1000 mm/s, particularly preferably 500 mm/s
- Spray material delivery rate at least 10 g/min, preferably 30 g/min
- Substrate temperature at least 200°C during preheating at least 300°C, preferably 500°C
- this combination is particularly suitable, for example, for the production of protective layers with low porosity, in particular from a mixture of rare earth silicates, and/or with or from at least one rare earth hexaaluminate, in particular LaMgAl11O19, for example RE disilicates and - Monosilicates, in particular Yb2Si2O7 and Yb2SiO5.
- Burner nozzle diameter 4 mm to 8 mm, in particular 5 mm to 8 mm, preferably 5 mm to 7 mm, particularly preferably 5 mm or 6.5 mm
- Average particle diameter at most 50 microns, of the spray material preferably at most 40 microns or less than 40 microns
- Spray distance 80 mm to 140 mm, preferably 100 mm to 130 mm, particularly preferably 120 mm
- Process gas stream at least 100 slpm, preferably at least 150 slpm, particularly preferably 170 to 180 slpm
- Current 400 A to 500 A, preferably 420 A to 470 A, particularly preferably 450 A
- Torch speed maximum 500 mm/s, preferably 150 mm/s to 350 mm/s, particularly preferably 250 mm/s
- Spray material delivery rate at least 50 g/min, preferably 90 g/min
- Substrate temperature at least 200°C during preheating, preferably 300°C, at least 300°C, preferably 420°C during coating
- This combination has proven itself, for example, for the production of protective layers, in particular with or from at least one rare earth silicate, preferably Yb2Si2O7, and/or with or from at least one rare earth hexaaluminate, in particular LaMgAl11O19, and in particular with a thickness of at least 100 micrometers using just one individual coating process proved to be particularly suitable.
- at least one rare earth silicate preferably Yb2Si2O7
- at least one rare earth hexaaluminate in particular LaMgAl11O19
- Burner nozzle diameter 4 mm to 8 mm, in particular 5 mm to 8 mm, preferably 5 mm to 7 mm, particularly preferably 5 mm or 6.5 mm
- Mean particle diameter maximum 80 microns, of the spray material preferably a maximum of 30 microns or less than 30 microns
- Spray distance 70 mm to 150 mm, preferably 80 mm
- Process gas flow at least 40 slpm, preferably at least 50 slpm, particularly preferably 50 slpm AR and 6 slpm He
- Torch speed maximum 2000 mm/s, preferably 150 mm/s to 350 mm/s, particularly preferably 250 mm/s
- Spray material delivery rate at least 5 g/min, preferably 10 g/min
- Substrate temperature at least 200°C for preheating, at least 300°C for coating, preferably 600°C for coating
- This combination has proven to be particularly useful for the production of dense, crystalline Y3Al5O12 coatings or coatings with or made of at least one rare earth hexaaluminate, in particular LaMgAl11O19, on substrates with or made of nickel, in particular with or made of nickel-based superalloys proven suitable.
- the combination of process parameters can be used, for example, to obtain a Y3Al5O12 top layer of a TBC system to protect a corresponding substrate.
- a further object of the invention is a component comprising a substrate and a coating which was obtained by carrying out the method according to the invention.
- FIG. 1 shows a purely schematic block diagram with the steps of five exemplary embodiments of the method according to the invention
- FIG. 2 shows a purely schematic, highly simplified sectional view of a plasma torch with a torch nozzle, which is used within the scope of the exemplary embodiments with the steps according to FIG. 1;
- FIG. 3 shows a micrograph of a coating obtained according to a first exemplary embodiment of the method according to the invention
- FIG. 4 shows an X-ray diffractogram associated with the coating according to FIG. 3;
- FIG. 5 shows a micrograph of a coating obtained with a nozzle diameter of 9 mm
- FIG. 6 shows an X-ray diffractogram associated with the coating according to FIG. 5;
- FIG. 7 shows a micrograph of a coating obtained according to a second exemplary embodiment of the method according to the invention.
- FIG. 8 shows an X-ray diffractogram associated with the coating according to FIG. 7;
- FIG. 9 shows a micrograph of a coating obtained according to a third exemplary embodiment of the method according to the invention.
- FIG. 10 shows an X-ray diffractogram associated with the coating according to FIG. 9;
- FIG. 11 shows a micrograph of a coating obtained according to a fourth exemplary embodiment of the method according to the invention.
- FIG. 12 shows an X-ray diffractogram associated with the coating according to FIG. 11;
- FIG. 13 shows a micrograph of a coating obtained according to a fourth exemplary embodiment of the method according to the invention.
- FIG. 14 shows an X-ray diffractogram associated with the coating according to FIG.
- a substrate 1 is provided in a first step S1 (cf. FIG. 1).
- the first to fourth exemplary embodiments involve a substrate 1 with silicon, specifically a substrate 1 made of a fiber composite material with a silicon adhesion promoter layer (English: bond coat), on which the coating is produced in each case.
- a substrate made of a nickel-based material is provided in step S1, in particular a substrate 1 made of a nickel-based superalloy.
- the substrate 1 can only be seen in the purely schematic, highly simplified FIG.
- a step S2 the substrate 1 is preheated in each case.
- the substrate 1 is coated by atmospheric plasma spraying (APS).
- APS atmospheric plasma spraying
- a plasma torch 2 (see FIG. 2) with a torch nozzle 3 is used in a manner known per se for plasma generation, with which a plasma jet 4 is generated from a supplied process gas, into which a spray material 5, which is in powder form here, is injected.
- the plasma torch 2 has a housing 6 in which a cathode 7 and at least one anode 8 are arranged, which are spaced apart from one another to form a narrow gap. In the examples described here, the plasma torch 2 has three anodes 8 . All five exemplary embodiments are the TriplexPro-210 model from Oerlikon Metco, which is to be understood purely as an example.
- An arc is generated between the electrodes 7, 8 by high-frequency ignition.
- a process gas 10 flows between the electrodes 7, 8, which is indicated in simplified form by arrows in FIG is, and there is a gas discharge 9.
- the plasma jet 4 is formed, which emerges from the nozzle 3 of the plasma torch 2 in a bundled manner and at high speed.
- the powdered spray material 5 is injected from the side into the plasma jet 4 via the spray material feeds 11 oriented orthogonally to the plasma jet 4. It should be noted that the orthogonal spray material feed is to be understood as an example.
- the powder feed is also indicated in FIG. 2 by arrows.
- the spray material 5 in powder form is melted due to the high plasma temperatures, is entrained with the plasma jet 4 and spun onto the substrate 1 to be coated. As a result, a coating 12 is obtained (step S3).
- suitable means 13 are provided for the process gas supply, which are indicated by arrows in the purely schematic FIG. In the example described here, these include at least one compressed gas bottle and a mass flow controller.
- the torch nozzle 3 forms that final area, in other words the end area of the plasma torch 2, from which the plasma jet 4 emerges during operation and which accordingly faces the substrate 12 to be coated or faces during operation.
- the nozzle 3 can be formed by the anode 8 of the plasma torch 2 or, in the case of several anodes 8, by the anodes 8 of the plasma torch 2 or a section thereof, in particular on the outlet side.
- the nozzle 3 can also be a separate element from the anode(s) 8, which is arranged (immediately) following the anodes. This is the case in the example shown in FIG.
- the nozzle 3 is given here by an annular element which defines a flow channel 14 .
- the flow channel 14 defined by the nozzle 3 forms the outlet-side end section 14 of the burner flow channel 15 defined overall by the plasma torch 2.
- the burner nozzle 3 is characterized by a nozzle diameter D in the range from 4 mm to 8 mm, in particular 5 mm to 8 mm, preferably 5 mm to 7 mm.
- the nozzle diameter D of the burner nozzle 3 is 6.5 mm in all four examples.
- the nozzle diameter D is the diameter of the flow channel 14 defined by the nozzle 3.
- the nozzle 3 in the present case defines a cylindrical flow channel 14 and thus has an inner diameter D that is constant over its entire extent in the gas/plasma flow direction .
- the nozzle diameter D is 6.5 mm everywhere. This is not necessarily the case. Rather, as an alternative to this, nozzles with a variable nozzle diameter can also be used. Then it applies that the minimum nozzle diameter is in the specified ranges.
- a process gas flow of at least 40 slpm is also set according to the invention.
- a protective coating 12 with a low crack density and increased crystallinity is produced.
- a rare earth silicate, in this case Yb2Si2O7, in powder form is used as spray material 5 .
- a spray material 5 can also be used that contains at least one rare earth hexaaluminate, in particular which includes or is provided by LaMgAI11019.
- a preferred manufacturing method used here for the powder 5 is agglomerated and sintered.
- the powder 5 has an average particle diameter of less than 50 microns, less than 30 microns has proven to be particularly suitable. In the present case, this is 20 micrometers.
- a spray distance Ds (cf. FIG. 2) in the range from 70 mm to 180 mm is selected, in this case 100 mm.
- a total flow of at least 40 slpm, in particular at least 50 slpm, is set as the process gas flow. In the present case, this is chosen to be 50 slpm.
- Argon is used as the process gas 10 in this example.
- the current is in the range from 300 A to 400 A, in this case it is 375 A.
- the burner speed is selected at a maximum of 2000 mm/s, here it is 500 mm/s.
- the delivery rate of the spray material 5 is chosen to be at least 10 g/min, specifically 30 g/min here.
- the substrate 1 is brought to a temperature of at least 200°C, in the present case to approximately 300°C.
- the substrate 1 is heated to at least 250° C., to approximately 270° C. in the exemplary embodiment described here.
- the figure 3 shows a micrograph of the resulting coating 12 made of Yb2Si2O7 on the by a fiber composite material with the Silicon bond coat given substrate 1.
- the coating has a homogeneous microstructure with high density and very fine pores. Only short, unconnected cracks appear.
- An X-ray diffractogram measurement (XRD measurement, cf. FIG. 4) shows an increased degree of crystallinity of 10% after a Rietveld refinement. The degree of crystallinity is abbreviated crys in the figures.
- the 2Theta angle is plotted on the X-axis and the intensity, specifically the root of the counts, is plotted on the Y-axis.
- FIG. 5 shows the microstructure of a coating with a coarse crack produced by means of APS and a nozzle diameter of 9 mm, also in a micrograph.
- FIG. 6 shows an associated X-ray diffractogram with a predominantly amorphous component that can be seen.
- the current was 450 A
- the process gas flow was 50 slpm argon
- the spray distance Ds was 80 mm
- the torch speed was 500 mm/s.
- a protective coating 12 with high crystallinity and a particularly low proportion of foreign phases is produced.
- a rare earth silicate, in this case Yb2Si2O7, in powder form is used as spray material 5 .
- a spray material 5 can also be used which comprises or is provided by at least one rare earth hexaaluminate, in particular LaMgAl11O19.
- the manufacturing method used here for the powder 5 is agglomerated and sintered.
- the powder 5 has an average particle diameter of less than 50 microns, less than 40 microns has proven to be particularly suitable. In the present case, this is 30 micrometers.
- a spraying distance Ds in the range of 70 mm to 180 mm is selected, in this case 120 mm.
- a total flow of at least 80 slpm, in particular at least 100 slpm, is set as the process gas flow. In the present case, this is chosen to be 110 slpm.
- Argon is used as the process gas 10 .
- the current is in the range of 400 A to 500 A, in this case it is 450 A.
- the burner speed is selected at a maximum of 2000 mm/s, here it is 500 mm/s.
- the delivery rate of the spray material 5 is chosen to be at least 10 g/min, specifically 30 g/min here.
- the substrate 1 is brought to a temperature of at least 200°C, in the present case to approximately 300°C.
- the substrate 1 is heated to at least 300° C., to approximately 400° C. in the exemplary embodiment described here.
- this layer 12 can be produced with a particularly small proportion of the secondary phase Yb2Si2O7.
- FIG. 7 shows the resulting coating made from Yb2Si2O7 on the substrate 1 provided by a fiber composite material with the silicon bond coat. The coating has a homogeneous microstructure with high density and very fine pores. Only short, unconnected cracks appear.
- An XRD measurement (cf. FIG. 8) shows an increased degree of crystallinity of 92% after a Rietveld refinement. 98% Yb2Si2O7 and 2% Yb2SiO5 were determined as crystalline phases.
- a low porosity protective coating 12 is made of a mixture of fine Yb silicate powders.
- a mixture of rare earth silicates preferably of RE disilicates and monosilicates in powder form, is used as the spray material 5 .
- a mixture of Yb2Si2O7 and Yb2SiO5 is used here.
- a mixture of 75% Yb2Si2O7 and 25% Yb2SiO5 is used here, whereby this is to be understood as an example.
- a spray material 5 can also be used which comprises or is provided by at least one rare earth hexaaluminate, in particular LaMgAl11O19.
- the powder 5 has an average particle diameter of less than 50 microns, less than 30 microns has proven to be particularly suitable. In the present case, this is 20 micrometers.
- a preferred manufacturing method used here for the powder 5 is agglomerated and sintered. Furthermore, a spraying distance Ds in the range of 70 mm to 180 mm is selected, in this case 120 mm.
- a total flow of at least 80 slpm, in particular at least 100 slpm, is set as the process gas flow. In the present case, this is chosen to be 110 slpm.
- Argon is used as the process gas 10 .
- the current is in the range of 400 A to 500 A, in this case it is 450 A.
- the burner speed is selected at a maximum of 2000 mm/s, here it is 500 mm/s.
- the delivery rate of the spray material 5 is chosen to be at least 10 g/min, specifically 30 g/min here.
- the substrate 1 is brought to a temperature of at least 200°C, in the present case to approximately 300°C.
- the substrate 1 is heated to at least 300° C., to approximately 500° C. in the exemplary embodiment described here.
- a special feature of this example is that a coating 12 with a particularly low porosity can be produced.
- FIG. 9 shows the resulting coating 12 made from 75% Yb2Si2O7 and 25% Yb2SiO5 on the substrate 1 provided by a fiber composite material with the silicon bond coat.
- the coating 12 has a homogeneous microstructure with high density and low porosity. Only short, unconnected cracks and isolated coarse pores appear.
- An XRD measurement (cf. FIG. 10) gives a degree of crystallinity of 96% after Rietveld refinement. 75% Yb2Si2O7 and 25% Yb2SiO5 were determined as crystalline phases.
- a comparatively thick protective coating 12 of at least 100 micrometers is produced by means of a single coating pass.
- a rare earth silicate, in this case Yb2Si2O7, in powder form is used as spray material 5 .
- a spray material 5 can also be used which comprises or is provided by at least one rare earth hexaaluminate, in particular LaMgAl11O19.
- the powder 5 has an average particle diameter of less than 50 microns, less than 40 microns has proven to be particularly suitable. In the present case, this is 30 microns.
- a preferred manufacturing method used here for the powder 5 is agglomerated and sintered.
- a spraying distance Ds in the range of 80 mm to 140 mm is selected, in this case 120 mm.
- a total flow of at least 100 slpm, in particular at least 150 slpm, is set as the process gas flow. In the present case, this is chosen to be 174 slpm.
- a mixture of argon and helium is used as the process gas 10 . 170 slpm argon and 4 slpm helium are used.
- the current is in the range of 400 A to 500 A, in this case it is 450 A.
- the burner speed is selected at a maximum of 500 mm/s, here it is 250 mm/s.
- the delivery rate of the spray material 5 is chosen to be at least 50 g/min, specifically 90 g/min here.
- the substrate 1 is brought to a temperature of at least 200°C, in the present case to approximately 300°C.
- the substrate 1 is heated to at least 300° C., to approximately 420° C. in the exemplary embodiment described here.
- a special feature of this example is that a comparatively thick layer 12 of, for example, 150 microns can be produced with a transition.
- FIG. 11 shows a micrograph of the resulting coating 12 made from Yb2Si2O7 on the substrate 1 provided by a fiber composite material with the silicon bond coat.
- the coating 12 has a homogeneous microstructure with high density and very fine pores. No cracks appear.
- An XRD measurement (cf. FIG. 12) gives a degree of crystallinity of 96% after a Rietveld refinement. 95% Yb2Si2O7 and 5% Yb2SiO5 were determined as crystalline phases.
- a dense, crystalline Y3AI5O12 top layer for a TBC system for protecting a substrate 1 made of a nickel-based material, in particular a nickel-based su- pearl alloy, manufactured with a MCrAIY bond coat (M Ni, Co).
- a different substrate 1 of a corresponding configuration is provided in step S1.
- the spray material 5 used is not a rare earth silicate but a rare earth aluminate in powder form, specifically Y3AL5O12 in the example described here.
- a spray material 5 can also be used which comprises or is provided by at least one rare earth hexaaluminate, in particular LaMgAl11O19.
- the powder 5 has an average particle diameter of no more than 80 microns, and no more than 30 microns has proven to be particularly suitable. In the present case, this is 30 microns.
- a preferred manufacturing method used here for the powder 5 is agglomerated and sintered.
- a spraying distance Ds in the range of 70 mm to 150 mm is selected, in this case 80 mm.
- a total flow of at least 40 slpm, in particular at least 50 slpm, is set as the process gas flow. In the present case, this is chosen to be 56 slpm.
- a mixture of argon and helium is used as the process gas 10 . 50 slpm argon and 6 slpm helium are used.
- the current is in the range from 350 A to 550 A, in this case it is 470 A.
- the burner speed is selected at a maximum of 2000 mm/s, here it is 250 mm/s.
- the delivery rate of the spray material 5 is chosen to be at least 5 g/min, specifically 10 g/min here.
- the substrate 1 is brought to a temperature of at least 200°C, in the present case to approximately 300°C.
- the substrate 1 is heated to at least 300° C., to approximately 600° C. in the exemplary embodiment described here.
- the coating 12 has a homogeneous microstructure with a high density and very fine pores. Only short, unconnected cracks appear.
- An XRD measurement (cf. FIG. 14) shows a degree of crystallinity of more than 60% after a Rietveld refinement.
- coatings 12 obtained according to all five exemplary embodiments of the method according to the invention are examples of coatings 12 according to the invention.
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Abstract
La présente invention concerne un procédé de fabrication d'un revêtement (12) dans lequel : - un substrat (1) est fourni ; et - le substrat (1) est pourvu d'un revêtement (12), en particulier au moyen d'une pulvérisation par plasma atmosphérique, avec une torche à plasma (2) comportant une buse de torche (3) étant utilisée, au moyen de laquelle un jet de plasma de torche (4) est généré à partir d'un gaz de traitement distribué (10), et d'un matériau de pulvérisation distribué (5) étant appliqué sur le substrat (1) au moyen du jet de plasma (4) afin d'obtenir le revêtement (12), la buse de torche (3) est caractérisé par un diamètre de buse (D) ou un diamètre de buse minimal (D) dans la plage de 4 mm à 8 mm, en particulier de 5 mm à 8 mm, de préférence de 5 mm à 7 mm, et le courant de gaz de traitement étant d'au moins 40 slpm. L'invention concerne en outre un composant comprenant un substrat (1) et un revêtement (12).
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DE102020126082.2A DE102020126082A1 (de) | 2020-10-06 | 2020-10-06 | Verfahren zur Herstellung einer Beschichtung sowie Beschichtung |
PCT/EP2021/074036 WO2022073697A1 (fr) | 2020-10-06 | 2021-08-31 | Procédé de fabrication d'un revêtement, et revêtement |
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US (1) | US20230328870A1 (fr) |
EP (1) | EP4225961A1 (fr) |
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WO2023212814A1 (fr) * | 2022-05-03 | 2023-11-09 | Valorbec, Société en commandite | Revêtement comprenant un monosilicate de terres rares et un disilicate de terres rares et son procédé de fabrication |
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US3958097A (en) | 1974-05-30 | 1976-05-18 | Metco, Inc. | Plasma flame-spraying process employing supersonic gaseous streams |
US6444335B1 (en) | 2000-04-06 | 2002-09-03 | General Electric Company | Thermal/environmental barrier coating for silicon-containing materials |
DE102004044597B3 (de) | 2004-09-13 | 2006-02-02 | Forschungszentrum Jülich GmbH | Verfahren zur Herstellung dünner, dichter Keramikschichten |
US10196728B2 (en) * | 2014-05-16 | 2019-02-05 | Applied Materials, Inc. | Plasma spray coating design using phase and stress control |
WO2016176777A1 (fr) * | 2015-05-07 | 2016-11-10 | The Governing Council Of The University Of Toronto | Revêtements superhydrophobes en céramique obtenue par projection plasma de précurseur en solution (« spps »), procédés d'application desdits revêtements et articles revêtus de ceux-ci |
US20180030586A1 (en) | 2016-07-29 | 2018-02-01 | United Technologies Corporation | Outer Airseal Abradable Rub Strip Manufacture Methods and Apparatus |
CN109252126A (zh) | 2017-07-14 | 2019-01-22 | 佛山市顺德区美的电热电器制造有限公司 | 不粘涂层及其制备方法以及锅具和煮食设备 |
CN109023203B (zh) * | 2018-08-16 | 2020-11-13 | 暨南大学 | 稳定结晶态六铝酸盐热障涂层的制备方法 |
CN109161837A (zh) * | 2018-11-12 | 2019-01-08 | 舟山腾宇航天新材料有限公司 | 一种高寿命ysz热障涂层的制备方法 |
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2020
- 2020-10-06 DE DE102020126082.2A patent/DE102020126082A1/de active Pending
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2021
- 2021-08-31 US US18/024,220 patent/US20230328870A1/en active Pending
- 2021-08-31 EP EP21769446.2A patent/EP4225961A1/fr active Pending
- 2021-08-31 WO PCT/EP2021/074036 patent/WO2022073697A1/fr unknown
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WO2022073697A1 (fr) | 2022-04-14 |
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