EP4110968A4 - ORGANOAMINO-FUNCTIONALIZED CYCLIC OLIGOSILOXANES FOR THE DEPOSITION OF SILICON-CONTAINING FILM - Google Patents

ORGANOAMINO-FUNCTIONALIZED CYCLIC OLIGOSILOXANES FOR THE DEPOSITION OF SILICON-CONTAINING FILM Download PDF

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Publication number
EP4110968A4
EP4110968A4 EP20928695.4A EP20928695A EP4110968A4 EP 4110968 A4 EP4110968 A4 EP 4110968A4 EP 20928695 A EP20928695 A EP 20928695A EP 4110968 A4 EP4110968 A4 EP 4110968A4
Authority
EP
European Patent Office
Prior art keywords
organoamino
deposition
silicon
containing films
functionalized cyclic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20928695.4A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP4110968A1 (en
Inventor
Matthew R. Macdonald
John J. LEHMANN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Versum Materials US LLC
Original Assignee
Versum Materials US LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US16/838,997 external-priority patent/US20200317702A1/en
Priority claimed from US17/030,187 external-priority patent/US20210017198A1/en
Application filed by Versum Materials US LLC filed Critical Versum Materials US LLC
Publication of EP4110968A1 publication Critical patent/EP4110968A1/en
Publication of EP4110968A4 publication Critical patent/EP4110968A4/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
EP20928695.4A 2020-04-02 2020-09-25 ORGANOAMINO-FUNCTIONALIZED CYCLIC OLIGOSILOXANES FOR THE DEPOSITION OF SILICON-CONTAINING FILM Pending EP4110968A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/838,997 US20200317702A1 (en) 2019-04-05 2020-04-02 Organoamino Functionalized Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films
US17/030,187 US20210017198A1 (en) 2019-04-05 2020-09-23 Organoamino-Functionalized Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films
PCT/US2020/052635 WO2021201910A1 (en) 2020-04-02 2020-09-25 Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

Publications (2)

Publication Number Publication Date
EP4110968A1 EP4110968A1 (en) 2023-01-04
EP4110968A4 true EP4110968A4 (en) 2023-09-13

Family

ID=77928485

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20928695.4A Pending EP4110968A4 (en) 2020-04-02 2020-09-25 ORGANOAMINO-FUNCTIONALIZED CYCLIC OLIGOSILOXANES FOR THE DEPOSITION OF SILICON-CONTAINING FILM

Country Status (5)

Country Link
EP (1) EP4110968A4 (zh)
JP (1) JP2023520226A (zh)
KR (1) KR20220163999A (zh)
CN (1) CN115443347A (zh)
WO (1) WO2021201910A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230265562A1 (en) * 2022-02-22 2023-08-24 Applied Materials, Inc. Stable silicon oxynitride layers and processes of making them

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020206295A1 (en) * 2019-04-05 2020-10-08 Versum Materials Us, Llc Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

Family Cites Families (21)

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JP2614338B2 (ja) 1990-01-11 1997-05-28 株式会社東芝 液体ソース容器
JPH05279856A (ja) * 1992-03-31 1993-10-26 Nec Corp 気相成長方法
US5465766A (en) 1993-04-28 1995-11-14 Advanced Delivery & Chemical Systems, Inc. Chemical refill system for high purity chemicals
DE69738136T2 (de) 1996-12-17 2008-06-12 Advanced Technology Materials, Inc., Danbury Reagenzzuführbehälter für cvd
US6953047B2 (en) 2002-01-14 2005-10-11 Air Products And Chemicals, Inc. Cabinet for chemical delivery with solvent purging
US7084076B2 (en) 2003-02-27 2006-08-01 Samsung Electronics, Co., Ltd. Method for forming silicon dioxide film using siloxane
US8530361B2 (en) 2006-05-23 2013-09-10 Air Products And Chemicals, Inc. Process for producing silicon and oxide films from organoaminosilane precursors
KR101593352B1 (ko) 2007-06-28 2016-02-15 인티그리스, 인코포레이티드 이산화규소 간극 충전용 전구체
US8912353B2 (en) 2010-06-02 2014-12-16 Air Products And Chemicals, Inc. Organoaminosilane precursors and methods for depositing films comprising same
US8771807B2 (en) 2011-05-24 2014-07-08 Air Products And Chemicals, Inc. Organoaminosilane precursors and methods for making and using same
US9337018B2 (en) 2012-06-01 2016-05-10 Air Products And Chemicals, Inc. Methods for depositing films with organoaminodisilane precursors
US9245740B2 (en) 2013-06-07 2016-01-26 Dnf Co., Ltd. Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same
US10453675B2 (en) 2013-09-20 2019-10-22 Versum Materials Us, Llc Organoaminosilane precursors and methods for depositing films comprising same
WO2015105337A1 (en) 2014-01-08 2015-07-16 Dnf Co.,Ltd. Novel trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the same
WO2015105350A1 (en) 2014-01-08 2015-07-16 Dnf Co.,Ltd. Novel cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same
US9233990B2 (en) * 2014-02-28 2016-01-12 Air Products And Chemicals, Inc. Organoaminosilanes and methods for making same
US20150275355A1 (en) 2014-03-26 2015-10-01 Air Products And Chemicals, Inc. Compositions and methods for the deposition of silicon oxide films
US9777025B2 (en) 2015-03-30 2017-10-03 L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude Si-containing film forming precursors and methods of using the same
US20160314962A1 (en) * 2016-06-30 2016-10-27 American Air Liquide, Inc. Cyclic organoaminosilane precursors for forming silicon-containing films and methods of using the same
US10822458B2 (en) 2017-02-08 2020-11-03 Versum Materials Us, Llc Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films
US11098069B2 (en) 2018-01-30 2021-08-24 Versum Materials Us, Llc Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020206295A1 (en) * 2019-04-05 2020-10-08 Versum Materials Us, Llc Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

Also Published As

Publication number Publication date
CN115443347A (zh) 2022-12-06
WO2021201910A1 (en) 2021-10-07
JP2023520226A (ja) 2023-05-16
EP4110968A1 (en) 2023-01-04
KR20220163999A (ko) 2022-12-12

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