EP4051829A1 - Verfahren zur dekorativen plattierung mit sulfatbasiertem, ammoniumfreiem trivalentem chrom - Google Patents
Verfahren zur dekorativen plattierung mit sulfatbasiertem, ammoniumfreiem trivalentem chromInfo
- Publication number
- EP4051829A1 EP4051829A1 EP20796851.2A EP20796851A EP4051829A1 EP 4051829 A1 EP4051829 A1 EP 4051829A1 EP 20796851 A EP20796851 A EP 20796851A EP 4051829 A1 EP4051829 A1 EP 4051829A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- bath
- ions
- acid
- chromium
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 42
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 28
- 239000011651 chromium Substances 0.000 title claims abstract description 28
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 15
- 238000007747 plating Methods 0.000 title description 23
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 title description 2
- 238000009713 electroplating Methods 0.000 claims abstract description 22
- 229910001430 chromium ion Inorganic materials 0.000 claims abstract description 14
- 150000003464 sulfur compounds Chemical class 0.000 claims abstract description 12
- 229910000599 Cr alloy Inorganic materials 0.000 claims abstract description 8
- 239000000788 chromium alloy Substances 0.000 claims abstract description 8
- 239000004327 boric acid Substances 0.000 claims abstract description 5
- 150000002500 ions Chemical class 0.000 claims abstract description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 16
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 15
- 229910052717 sulfur Inorganic materials 0.000 claims description 15
- 239000011593 sulfur Substances 0.000 claims description 15
- 229910045601 alloy Inorganic materials 0.000 claims description 13
- 239000000956 alloy Substances 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 12
- 229920001515 polyalkylene glycol Polymers 0.000 claims description 12
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 11
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 claims description 11
- 229910001447 ferric ion Inorganic materials 0.000 claims description 11
- 229910001448 ferrous ion Inorganic materials 0.000 claims description 11
- 239000006174 pH buffer Substances 0.000 claims description 11
- -1 ammonium ions Chemical class 0.000 claims description 10
- 150000007524 organic acids Chemical class 0.000 claims description 10
- 229910003455 mixed metal oxide Inorganic materials 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- 229910052742 iron Inorganic materials 0.000 claims description 8
- 150000001450 anions Chemical class 0.000 claims description 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 6
- 239000008139 complexing agent Substances 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 6
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 6
- BWYYYTVSBPRQCN-UHFFFAOYSA-M sodium;ethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=C BWYYYTVSBPRQCN-UHFFFAOYSA-M 0.000 claims description 6
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 5
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 5
- 239000001630 malic acid Substances 0.000 claims description 5
- 235000011090 malic acid Nutrition 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 239000002202 Polyethylene glycol Substances 0.000 claims description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 claims description 4
- WBZKQQHYRPRKNJ-UHFFFAOYSA-L disulfite Chemical compound [O-]S(=O)S([O-])(=O)=O WBZKQQHYRPRKNJ-UHFFFAOYSA-L 0.000 claims description 4
- GRWZHXKQBITJKP-UHFFFAOYSA-L dithionite(2-) Chemical compound [O-]S(=O)S([O-])=O GRWZHXKQBITJKP-UHFFFAOYSA-L 0.000 claims description 4
- 229910052741 iridium Inorganic materials 0.000 claims description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 229920001223 polyethylene glycol Polymers 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 claims description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- 239000001361 adipic acid Substances 0.000 claims description 2
- 235000011037 adipic acid Nutrition 0.000 claims description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 claims description 2
- 229940117927 ethylene oxide Drugs 0.000 claims description 2
- 235000006408 oxalic acid Nutrition 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims description 2
- 125000005619 boric acid group Chemical group 0.000 claims 1
- 229940000425 combination drug Drugs 0.000 claims 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract description 5
- 239000011734 sodium Substances 0.000 abstract description 5
- 229910052708 sodium Inorganic materials 0.000 abstract description 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000654 additive Substances 0.000 abstract description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 229940107218 chromium Drugs 0.000 description 24
- 235000012721 chromium Nutrition 0.000 description 24
- 229960005349 sulfur Drugs 0.000 description 13
- 235000001508 sulfur Nutrition 0.000 description 13
- 239000000243 solution Substances 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 229940065278 sulfur compound Drugs 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 150000002894 organic compounds Chemical class 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000005864 Sulphur Substances 0.000 description 2
- 238000001636 atomic emission spectroscopy Methods 0.000 description 2
- 239000001110 calcium chloride Substances 0.000 description 2
- 229910001628 calcium chloride Inorganic materials 0.000 description 2
- 150000001845 chromium compounds Chemical class 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000007857 degradation product Substances 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- JVBXVOWTABLYPX-UHFFFAOYSA-L sodium dithionite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])=O JVBXVOWTABLYPX-UHFFFAOYSA-L 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 238000013475 authorization Methods 0.000 description 1
- 235000010338 boric acid Nutrition 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
- C25D9/04—Electrolytic coating other than with metals with inorganic materials
- C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
Definitions
- the present invention refers to an electroplating bath for electroplating a chro- mium or chromium alloy layer, the bath comprising trivalent chromium ions, organic carboxylic acid, sulfate ions, sodium conductive ions, and additives in the form of inorganic sulfur compound and boric acid as well as a process using such an electroplating bath.
- Chrome deposits from trivalent chrome electrolytes are widely used in the in- dustry due to their unique properties they allow substrates to work longer and under tougher conditions that they would normally survive in.
- Decorative chrome plating is designed to be aesthetically pleasing and durable. Thicknesses range from 0.05 to 0.5 ⁇ m, however they are usually between 0.13 and 0.25 ⁇ m. Decorative chrome plating is also very corrosion resistant and is often used on car parts, tools and kitchen utensils.
- hexavalent chrome deposits were featuring a blue-white appearance that is distinguishing from the trivalent chrome deposits. This colour is still very appreciated by customers that are used to hexavalent chrome products.
- JP2009035806 describes a trivalent chromium plating bath and a method for producing a chromium plating.
- This plating bath contains (1) complex solution of trivalent chromium obtained by maintaining under heating at least 1 type of component chosen from group which consists of aqueous solution aliphatic car- boxylic acid and its salt, and aqueous solution containing trivalent chrome com- pound, (2) conductive salt (3) buffer for pH, and (4) at least 1 type of sulfur- containing compound chosen from the group having an S02 group.
- the draw- back of such a plating solution is the use of a sulfur-containing organic com- pound instead of inorganic one and they do not use iron in the plating bath.
- JP2010189673 describes novel trivalent chromium plating bath capable of forming a trivalent chromium plating film having better corrosion resistance as compared with the prior art.
- a trivalent chromium plating bath comprising an aqueous solution containing a water-soluble trivalent chromium compound, a conductive salt, a pH buffer, a sulfur-containing compound and an aminocar- boxylic acid.
- the drawback of such a plating bath is the lack of sodium and iron ions in the plating bath which will not get the desired color.
- WO2019117178 describes a trivalent chromium plating solution containing: a trivalent chromium compound; a complexing agent; potassium sulfate and am- monium sulfate as conductive salts; a pH buffer; and a sulfur-containing organic compound.
- the trivalent chromium plating solution is practical and has a high plating deposition rate.
- the drawback of such a plating solution is the use of a sulfur-containing organic compound instead of inorganic one and they do not use iron in the plating bath.
- EP2411567 describes a chromium electroplating solution comprising a chro- mium electroplating solution comprising: (1) a water soluble trivalent chro- mium salt; (2) at least one complexant for trivalent chromium ions; (3) a source of hydrogen ions sufficient to create a pH of from 2.8-4.2; (4) a pH buffering compound; and (5) a sulfur-containing organic compound.
- the chromium elec- troplating solution is usable in a method for producing an adherent metallic coating on a decorative article, such coating having enhanced resistance to cor- rosion in environments containing calcium chloride.
- the drawback of such a solution is the use of a sulfur-containing organic compound instead of inorganic one and the absence of iron ions in the solution.
- an electroplating bath for depositing a chromium or chromium alloy layer which comprises a) at least one source of trivalent chromium ions, b) at least one source of sulfate ions, c) at least one organic acid as a complexing agent, d) sodium saccharin, e) at least one polyalkylene glycol, f) sodium vinyl sulfonate, g) at least one inorganic sulfur compound, h) at least one pH buffer, and, optionally, i) at least one source of ferric or ferrous ions.
- the sulfate based trivalent chromium ions bath allows to obtain a whiter colour of the plating opposed to chloride based bath that get a darker plating with a higher carbon percentage.
- the choice of the sodium is preferred to increase the whiteness of the plat- ing.
- the use of ferric or ferrous ions also increase the corrosion resistance per- mitting to pass the PV1073 A test.
- the combination of ferric, sodium and sulfate ions permit to obtain a blue and white colour close to those from hexavalent chrome deposits.
- an inorganic sulfur such as an oxyacid anion containing sulfur having the valence lower than 6 is preferred.
- the at least one organic acid is selected from the group of dicarboxylic acids, preferably selected from the group consisting of malic acid, oxalic acid, succinic acid, glutaric acid, adipic acid, and mixtures thereof.
- malic acid preferably selected from the group consisting of malic acid, oxalic acid, succinic acid, glutaric acid, adipic acid, and mixtures thereof.
- succinic acid preferably selected from the group consisting of malic acid, oxalic acid, succinic acid, glutaric acid, adipic acid, and mixtures thereof.
- succinic acid preferably selected from the group consisting of malic acid, oxalic acid, succinic acid, glutaric acid, adipic acid, and mixtures thereof.
- adipic acid preferably selected from the group consisting of malic acid, oxalic acid, succinic acid, glutaric acid, adipic acid, and mixtures thereof.
- malic acid
- the concentration of the at least one organic acid is from 5 to 40 g/L, preferably from 10 to 30 g/L, more preferably from 15 to 25 g/L.
- the concentration of the at least one trivalent chro- mium ion is from 5 to 25 g/L, preferably from 8 to 20 g/L.
- the concentration of the sulfate ions from at least one source of sulfate ions is from 150 to 300 g/L, preferably from 180 to 280 g/L, more preferably from 200 to 250 g/L.
- the source of trivalent chromium ions is chro- mium(lll) sulphate in acidic or basic form.
- the at least one inorganic sulfur compound is selected from the group of oxyacid anions comprising sulfur having a valence lower than 6, preferably selected from the group consisting of:
- the concentration of the at least one inorganic sul- fur compound is from 5 to 500 mg/L, preferably from 10 to 200 mg/L.
- the electroplating bath can comprise at least one source of ferric or ferrous ions.
- concentration of the ferric or ferrous ions from at least one source of ferric or ferrous ions is preferably from 20 to 200 mg/L, more preferably from 30 to 150 mg/L, and even more preferably from 40 to 100 mg/L.
- the concentration of the at least one pH buffer is in a range from 50 to 120 g/L, preferably from 60 to 110 g/L, more preferably from 80 to 100 g/L.
- a pH buffer it is preferred to use at least one of the group boric acid, citric acid, succinic acid, lactic acid, tartaric acid, and mixtures thereof. Particular pre- ferred is the use of boric acid as pH buffer.
- the pH of the bath is preferably in the range from 1 to 5, more preferably from 2 to 4, and even more preferably from 3.1 to 3.9.
- the concentration of the sodium vinyl sulfonate is preferably from 0.1 to 5 g/L, more preferably from 0.2 to 3 g/L.
- the bath is (substantially) free of at least one of chloride ions, ammonium ions, amino carboxylic acid ions and hexavalent chromium ions. In particular, it is preferred that some or all of these ions are absent.
- the concentration of sodium saccharin is from 0.1 to 10 g/L, and more preferably from 1 to 5 g/L.
- the at least one polyalkylene glycol has a molecular weight of lower than 2000 g/mol and is preferably selected from the group consisting of:
- the advantage of having at least one polyalkylene glycol, especially at least one polyalkylene glycol with a molecular weight of lower than 2000 g/mol, in the bath is that thicknesses of the deposits which are obtainable with the bath are higher than with baths that do not contain said polyalkylene glycol.
- the concentration of the at least one polyalkylene glycol is from 1 to 15 g/L, preferably from 5 to 10 g/L.
- a preferred embodiment of the electroplating bath for depositing a chromium or chromium alloy layer comprises: a) 5 to 25 g/L of trivalent chromium ions from at least one source of chro- mium ions, b) 150 to 300 g/L of sulfate ions from at least one source of sulfate ions, c) 5 to 40 g/L of at least one organic acid as a complexing agent, d) 0.1 to 10 g/L of sodium saccharin, e) 1 to 15 g/L of at least one polyalkylene glycol, f) 0.1 to 5 g/L of sodium vinyl sulfonate, g) 5 to 500 mg/L of at least one inorganic sulfur compound, h) 50 to 120 g/L of at least one pH buffer, and, optionally, i) 20 to 200 mg/L of ferric or ferrous ions from at least one source of fer- ric or ferrous ions.
- a method for preparing an electroplated product by electroplating a substrate comprising the following steps:
- A) providing an electroplating bath comprising : a) at least one source of trivalent chromium ions, b) at least one source of sulfate ions, c) at least one organic acid as a complexing agent, d) sodium saccharin, e) at least one polyalkylene glycol, f) sodium vinyl sulfonate, g) at least one inorganic sulfur compound, h) at least one pH buffer, and, optionally, i) at least one source of ferric or ferrous ions;
- the cathode current density is in a range from B to 14 A/dm 2 , preferably from 5 to 10, and/or the anode current density is in a range from 4 to 12 A/dm 2 , preferably from 5 to 10 A/dm 2 .
- the anodes consist of a mixed metal oxide, preferably a mixed metal oxide selected from the group consisting of mixed metal oxides of at least two of platinum, ruthenium, iridium and tantalum, more preferably mixed metal oxides of iridium and tantalum.
- the deposition rate during step C) is from 0.01 to 0.5 ⁇ m/min, preferably from 0.02 to 0.3 ⁇ m/min, and more preferably from 0.03 to 0.2 ⁇ m/min.
- step C) is conducted at a temperature from 35 to 60°C, pref- erably from 40 to 58°C, more preferably from 45 to 55°C.
- the alloy obtainable from this method com- prises or consists of carbon, sulphur, oxygen, chrome and, optionally, iron.
- the alloy has a colour measured by L, a, b values from 80 to 86, -0.8 to 0, -1.5 to 1.0.
- the L, a, b values are from 80 to 86, -0.8 to 0, -0.8 to 1.
- the L, a, b values are from 83 to 85, -0.7 to -0.4, -0.5 to 0.2.
- the percentage of carbon in the alloy is preferably from 1 to 5 atomic % (at%), more preferably from 2 to 4 at%.
- the alloy preferably comprises from 0,5 to 4 at%, more preferably from 1 to 3 at% sulfur.
- the alloy preferably comprises from 1 to 5 at%, preferably from 2 to 4 at% of oxygen.
- the alloy preferably comprises from 0 to 12 at% of iron.
- the percentage of iron in the alloy is from 3 to 12 at%, preferably from 5 to 10 at%.
- the alloy preferably com- prises from 74 to 94.5 at%, more preferably from 79 to 90 at%, chrome.
- the atomic % (at%) of the alloy can be determined by optical emission spectroscopy (OES).
- Fig.l shows the chromium coverage on a Hull cell panel with the three points (HCD, MCD, LCD) used for the examples.
- the panels were evaluated: the thickness of Chromium using the X-Ray method EN ISO 3497 in three points 1cm from the left edge define as HCD (High Current Density), 5 cm from the left edge define as MCD (Medium Current Density), 7 cm from the left edge defined as LCD (Low Current Density).
- the colour at the point defined as MCD was measured by a Colorimeter KONICA MINOLTA CM2600 defining the colour as CIELAB (L, a, b).
- Chromium deposit coverage measuring the mm from the left edge to the maximum coverage of the deposit to the right.
- Chromium deposit was tested to the PV1073 A that is an auto- motive standard used to evaluate the corrosion performance of Chromium de- posit to the Calcium Chloride.
- the present invention refers to the alloy carried out with the example n°6 char- acterized in that the alloy composition contains 5-10 at % of Fe, 1-3 at % of S, 2-4 at % of C, 2-4 at % of O, remaining at % Cr (up to 100 at %) and reaching a comparable color to the reference example and a good deposition rate, with the features of claim 1 and the method for preparing an electroplated product by using the electroplating bath with the features of claim 10.
- the bath did not contain Methyl Polyethylen Glycol (Mw 500).
- Mw 500 Methyl Polyethylen Glycol
- the disadvantage of omitting said compound in the bath is that the ob- tained thickness at HCD is much lower than with the bath according to the in- vention (bath n°6).
- the oxyacid sul- phuranion anion of sodium dithionite
- alone is not able to increase the com- pliance regarding the color, the coverage and the PV 1073A.
- the bath did not contain an oxyacid sulphur anion, i.e. did not contain sodium dithionite in the present case.
- the disadvantage of omitting said compound in the bath is that the thicknesses at HCD, MCD and LCD are much lower than with the bath according to the invention (bath n°6). Color, coverage and PV 1073A are complying.
- the example n°6b shows a similar results to the n°6 but with the better colour performance. In particular the b value reaches a very close value to the refer- ence CrVI, wherein the efficiency is just a little bit, i.e. not significantly, reduced.
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- Electrochemistry (AREA)
- Materials Engineering (AREA)
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- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
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Applications Claiming Priority (3)
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EP19206651 | 2019-10-31 | ||
EP20154909.4A EP3859053A1 (de) | 2020-01-31 | 2020-01-31 | Verfahren zur dekorativen plattierung mit sulfatbasiertem, ammoniumfreiem trivalentem chrom |
PCT/EP2020/080584 WO2021084103A1 (en) | 2019-10-31 | 2020-10-30 | Sulfate based, ammonium free trivalent chromium decorative plating process |
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EP4051829A1 true EP4051829A1 (de) | 2022-09-07 |
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US (1) | US20220403538A1 (de) |
EP (1) | EP4051829A1 (de) |
JP (1) | JP7342253B2 (de) |
KR (1) | KR20220119012A (de) |
CN (1) | CN114729463A (de) |
CA (1) | CA3155524C (de) |
MX (1) | MX2022004290A (de) |
WO (1) | WO2021084103A1 (de) |
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GB2109817B (en) * | 1981-11-18 | 1985-07-03 | Ibm | Electrodeposition of chromium |
GB8503019D0 (en) * | 1985-02-06 | 1985-03-06 | Canning W Materials Ltd | Electroplating |
US5196109A (en) * | 1991-08-01 | 1993-03-23 | Geoffrey Scott | Trivalent chromium electrolytes and plating processes employing same |
KR100572486B1 (ko) * | 2003-11-29 | 2006-04-19 | 테크앤라이프 주식회사 | 3가 크롬도금액 조성물과 그 제조방법 |
WO2006043507A1 (ja) * | 2004-10-18 | 2006-04-27 | Yamaha Hatsudoki Kabushiki Kaisha | エンジン用部品 |
KR100858711B1 (ko) * | 2007-03-30 | 2008-09-17 | 한국기계연구원 | 3가크롬 도금액 |
JP5322083B2 (ja) | 2007-07-12 | 2013-10-23 | 奥野製薬工業株式会社 | 3価クロムめっき浴及びその製造方法 |
JP5652585B2 (ja) | 2009-02-16 | 2015-01-14 | 奥野製薬工業株式会社 | 3価クロムめっき浴 |
US9765437B2 (en) | 2009-03-24 | 2017-09-19 | Roderick D. Herdman | Chromium alloy coating with enhanced resistance to corrosion in calcium chloride environments |
CN105671599A (zh) * | 2016-04-11 | 2016-06-15 | 济南德锡科技有限公司 | 一种硫酸盐三价铬电镀液及其制备方法 |
CN106086949B (zh) * | 2016-08-26 | 2019-01-18 | 武汉迪赛环保新材料股份有限公司 | 一种三价铬电镀液及电镀方法 |
EP3299497A1 (de) * | 2016-09-27 | 2018-03-28 | ATOTECH Deutschland GmbH | Verfahren zur behandlung einer chromoberfläche |
JP6951465B2 (ja) | 2017-12-13 | 2021-10-20 | 株式会社Jcu | 3価クロムメッキ液およびこれを用いたクロムメッキ方法 |
WO2020009096A1 (ja) * | 2018-07-03 | 2020-01-09 | 株式会社Jcu | 3価クロムメッキ液およびこれを用いたクロムメッキ方法 |
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- 2020-10-30 US US17/755,503 patent/US20220403538A1/en active Pending
- 2020-10-30 CN CN202080070306.8A patent/CN114729463A/zh active Pending
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- 2020-10-30 CA CA3155524A patent/CA3155524C/en active Active
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JP7342253B2 (ja) | 2023-09-11 |
WO2021084103A1 (en) | 2021-05-06 |
CA3155524A1 (en) | 2021-05-06 |
MX2022004290A (es) | 2022-05-10 |
CN114729463A (zh) | 2022-07-08 |
JP2022551461A (ja) | 2022-12-09 |
CA3155524C (en) | 2024-02-27 |
US20220403538A1 (en) | 2022-12-22 |
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