EP4035903B1 - Élément anti-contrefaçon optique à corps multicouche et son procédé de fabrication - Google Patents

Élément anti-contrefaçon optique à corps multicouche et son procédé de fabrication Download PDF

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Publication number
EP4035903B1
EP4035903B1 EP20868863.0A EP20868863A EP4035903B1 EP 4035903 B1 EP4035903 B1 EP 4035903B1 EP 20868863 A EP20868863 A EP 20868863A EP 4035903 B1 EP4035903 B1 EP 4035903B1
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EP
European Patent Office
Prior art keywords
coating
microstructure
region
layer
optical anti
Prior art date
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EP20868863.0A
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German (de)
English (en)
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EP4035903A1 (fr
EP4035903A4 (fr
Inventor
Chunhua Hu
Kai Sun
Baoli ZHANG
Jun Zhu
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China Banknote Printing and Minting Corp
Zhongchao Special Security Technology Co Ltd
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China Banknote Printing and Minting Corp
Zhongchao Special Security Technology Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/351—Translucent or partly translucent parts, e.g. windows
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/425—Marking by deformation, e.g. embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/445—Marking by removal of material using chemical means, e.g. etching

Definitions

  • the disclosure relates to the technical field of optical anti-counterfeiting technology, and in particular to an optical anti-counterfeiting element and a manufacturing method for an optical anti-counterfeiting element.
  • the optical anti-counterfeiting technology is widely used in various high safety or high value-added printed materials such as banknotes, credit cards, passports, securities and product packaging, and has achieved extremely excellent effects.
  • optical effects forming by the microstructure include diffraction, non-diffraction, etc., which is widely used by high brightness and obvious dynamic effect.
  • the microstructure optical anti-counterfeiting technology generally uses a metal reflecting layer, for example aluminum, so as to increase the brightness of the image.
  • the holographic technology the most widely used optical anti-counterfeiting technology in optical films at present, is developed by utilizing the diffraction effect formed by the microstructure, and has been used in anti-counterfeiting lines of 5 yuan, 10 yuan, 20 yuan, 50 yuan and 100 yuan in the fifth set of 1999 edition of RMB.
  • the multilayer functional coating group technology has strong optical discoloration effect under different observation angles, or obvious discoloration effect under reflection and transmission observation, thereby drawing increasing attention from people, and is generally known as the multilayer interference optical variation technology.
  • the classical multilayer interference coating generally uses the sandwich type Fabry-Perot interference cavity structure formed by a reflecting layer, a dielectric layer and an absorbing layer.
  • the reflecting layer is generally made of high-brightness metal materials
  • the dielectric layer is generally made of transparent inorganic or organic materials
  • the absorbing layer also known as a semitransparent layer, is generally made of thin metal materials having excellent absorption.
  • the security line of 100 yuan in the fifth set of 2015 edition of RMB uses the multilayer interference optical variation technology, which is magenta under front observation and green under inclined observation.
  • Patent application CN 200980104829.3 provided the preparation of the optical anti-counterfeiting product integrating the multilayer interference optically variable coating and the high-brightness metal reflecting layer by means of a local printing and hollowing process, that is, some regions have multilayer interference optically variable characteristics, some regions have optical characteristics of the high-brightness metal reflecting layer, and further, the other regions have the perspective hollow effect.
  • the mutual alignment accuracy of the three regions in the patent application depends on the printing accuracy, which is generally above 100 ⁇ m, resulting in limitations on the application in high-end anti-counterfeiting optical products to a certain extent.
  • Document CN 106891637 A discloses an optical anti-counterfeiting element having a first microstructure and a second microstructure.
  • optical anti-counterfeiting elements having characteristics of high-brightness metal reflecting layer and multilayer interference optically variable characteristics and having zero positioning error between two characteristic regions. Further, if the optical anti-counterfeiting element further integrates the hollow characteristic, and the hollow region and the image region are also positioned with zero error, the anti-counterfeiting performance of the product will be further improved.
  • the objective of the disclosure is to provide a multilayer body optical anti-counterfeiting element and a manufacturing method therefor.
  • the optical anti-counterfeiting element During observation from a first side and/or a second side of the optical anti-counterfeiting element, the optical anti-counterfeiting element has a characteristic of a high-brightness metal reflecting layer and a characteristic of a multilayer functional coating group (especially an interference optically variable coating) at the same time, such that a product having the optical anti-counterfeiting element has excellent comprehensive integrated anti-counterfeiting performance.
  • the optical anti-counterfeiting element further integrates a hollow characteristic, and a hollow region and an image region are positioned with zero error, the anti-counterfeiting performance of the product may be further improved.
  • the present invention provides an optical anti-counterfeiting element as defined in claim 1.
  • the two image regions (the first region and the second region) presented by reflection observation are determined by the microstructure, thereby having a zero positioning error characteristic.
  • a specific volume of a relief structure mentioned herein refers to a ratio of an assumed liquid volume of just completely covering a surface of the relief structure to a projection area of the relief structure on the horizontal plane under the condition that the relief structure is placed in a horizontal state; the disclosure further relates to another important physical quantity, i.e.
  • a depth-to-width ratio of the relief structure which refers to a ratio of a depth of the relief structure to a width (or a period of a periodic structure) of the relief structure;
  • the depth-to-width ratio is a dimensionless physical quantity, and a dimension of the specific volume is ⁇ m 3 / ⁇ m 2 ;
  • a flat structure is regarded as the relief structure having zero depth-to-width ratio and zero specific volume;
  • the depth-to-width ratio and the specific volume are two physical quantities which have no direct relation in quantity; for example, if a structure A is a one-dimensional sawtooth grating having a depth of 1 ⁇ m and a period of 1 ⁇ m, a depth-to-width ratio of the structure A is 1, and a specific volume of the structure A is 0.5 ⁇ m 3 / ⁇ m 2 ; if a structure B is a one-dimensional sawtooth grating having a depth of 2 ⁇ m and a period of 4 ⁇ m,
  • the first microstructure or the second microstructure is a periodic structure or one structure or a combined structure in the periodic structure; and a cross-sectional structure of the first microstructure or the second microstructure is any one structure or a combined structure formed by at least any two structures of a sinusoidal structure, a rectangular grating structure, a trapezoidal grating structure, a blazed grating structure and an arc-shaped grating structure.
  • the specific volume of the first microstructure is greater than or equal to 0 ⁇ m 3 / ⁇ m 2 and less than 0.5 ⁇ m 3 / ⁇ m 2 ; and the specific volume of the second microstructure is greater than 0.4 ⁇ m 3 / ⁇ m 2 and less than 3 ⁇ m 3 / ⁇ m 2 .
  • the first coating is adjacently connected to the relief structure layer.
  • a material of the first coating or the second coating is any one metal or an alloy formed by combining at least any two metals of nickel, chromium, aluminum, silver, copper, tin and titanium; and a material of the dielectric layer is any one compound or a mixture formed by at least any two compounds of magnesium fluoride, silicon dioxide, zinc sulfide, titanium nitride, titanium dioxide, titanium monoxide, titanium sesquioxide, trititanium pentoxide, tantalum pentoxide, niobium pentoxide, cerium dioxide, bismuth trioxide, chromium oxide green, iron oxide, hafnium oxide and zinc oxide.
  • the functional coating group is a multilayer interference optically variable coating
  • the optical anti-counterfeiting element on any side of the multilayer interference optically variable coating has an interference optically variable characteristic
  • the relief structure layer further includes a third region having a third microstructure, a depth-to-width ratio of the third microstructure is greater than a depth-to-width ratio of the second microstructure, and a specific volume of the third microstructure is greater than a specific volume of the first microstructure; the first coating and the second coating are not located in the third region; and the optical anti-counterfeiting element has a hollow characteristic in the third region.
  • a difference of the specific volumes of the third microstructure and the first microstructure and a difference of a depth-to-width ratios of the third microstructure and the second microstructure are a basis for removing both of the first coating and the second coating in the third region.
  • the depth-to-width ratio of the third microstructure is greater than 0.2 and less than 1; the depth-to-width ratio of the second microstructure is greater than 0 and less than 0.3; and the specific volume of third microstructure is greater than 0.4 ⁇ m 3 / ⁇ m 2 and less than 3 ⁇ m 3 / ⁇ m 2 .
  • the invention further provides a manufacturing method for an optical anti-counterfeiting element as defined in claim 9.
  • the relief structure layer in S1) further includes a third region having a third microstructure, a depth-to-width ratio of the third microstructure is greater than a depth-to-width ratio of the second microstructure, and a specific volume of the third microstructure is greater than a specific volume of the first microstructure.
  • the manufacturing method further includes: S4) placing a semi-finished product in S3) into an atmosphere capable of reacting with the first coating until part or all of the first coating and the second coating which are located in the third region are removed.
  • the first coating or the second coating in S3) includes an aluminum layer, or the first coating and the second coating in S3) include an aluminum layer; and an acid liquor or an alkali liquor is selected as the atmosphere capable of reacting with the second coating in S3); an acid liquor or an alkali liquor is selected as the atmosphere capable of reacting with the first coating in S4).
  • the manufacturing method further includes: applying an inorganic or organic coating or a painting layer process to achieve other optical anti-counterfeiting functions or auxiliary functions.
  • a substrate 2. a relief structure layer 31. a first coating 32. a dielectric layer 33. a second coating 3. a functional coating group 4. a protective layer 5. an other functional coating
  • an optical anti-counterfeiting element includes a first region A and a second region B, wherein the first region A has a combined optical characteristic of a first optical microstructure and a functional coating group, and the second region B has a combined optical characteristic of a second optical microstructure and a first coating.
  • the two regions are strictly positioned to each other. Partial lines of an image may be very fine. For example, the partial lines are less than 50 ⁇ m.
  • the functional coating group is a multilayer interference optically variable coating
  • a first coating is a metal reflection coating (e.g. an aluminum layer), such that the first region A appears an interference optically variable characteristic and the second region B appears a characteristic of the common metal reflection coating.
  • the optical anti-counterfeiting element includes a substrate 1, a relief structure layer 2, a first coating 31, a dielectric layer 32, a second coating 33, a protective layer 4 and an other functional coating 5, wherein the first coating 31, the dielectric layer 32 and the second coating 33 form a functional coating group 3;
  • the substrate 1 and the relief structure layer 2 is usually composed of a transparent material;
  • the relief structure layer 2 includes the first region A composed of a first microstructure and the second region B composed of a second microstructure, a specific volume of the second microstructure is greater than a specific volume of the first microstructure;
  • the functional coating group 3 composed of the first coating 31, the dielectric layer 32 and the second coating 33 is arranged on the first region A, and the first coating 31 and the dielectric layer 32 are arranged on the second region B.
  • the dielectric layer 32 is a colorless transparent material and does not provide special optical effects in the second region B.
  • the first region A appears a combined optical characteristic of the first microstructure and the functional coating group 3
  • the second region B appears a combined optical characteristic of the second microstructure and the first coating 31.
  • the functional coating group 3 is adjacently connected to a protective layer 4.
  • the protective layer 4 is a natural product in a manufacturing process and generally does not provide additional optical effects.
  • the first coating 31, the dielectric layer 32 and the second coating 33 are used as a reflecting layer, a dielectric layer and an absorbing layer respectively and are combined to form a multilayer interference optically variable coating, that is, the first region A has a combined anti-counterfeiting characteristic of the first microstructure and the multilayer interference optically variable coating; and the second region B has a combined anti-counterfeiting characteristic of the second microstructure and a traditional reflecting layer.
  • the other functional coating 5 may be provided as required, such as a bonding layer that has a function of bonding a protected main product.
  • a method for preparing an optical anti-counterfeiting element as shown in Fig. 2 according to the disclosure is described below in conjunction with Figs. 3-6 .
  • the method includes S1-S4.
  • a multilayer interference optically variable coating is selected as the functional coating group 3, and the first coating 31, the dielectric layer 32 and the second coating 33 are used as a reflecting layer, a dielectric layer and an absorbing layer respectively.
  • the substrate 1 may be at least locally transparent, or a colorless dielectric layer, or a transparent medium film having a functional coating layer on a surface, or a multilayer film formed through compounding.
  • the substrate 1 is generally formed by a film material having excellent physical and chemical resistance and high mechanical strength, for example, a plastic film of a polyethylene terephthalate (PET) film, a polyethylene terephthalate (PEN) film, a polypropylene (PP) film, etc. may be used to form the substrate 1.
  • PET polyethylene terephthalate
  • PEN polyethylene terephthalate
  • PP polypropylene
  • the substrate 1 is formed by the PET material.
  • a bonding enhancement layer may be included on the substrate 1 to enhance bonding of the substrate 1 to the relief structure layer 2.
  • a stripping layer may also be included on the substrate 1 to achieve separation of the substrate 1 in the final product from the relief structure layer 2.
  • the relief structure layer 2 may be formed by performing batch copying by means of processing manners of ultraviolet casting, mold pressing, nano-imprinting, etc.
  • the relief structure layer 2 may be formed by a thermoplastic resin by means of a mold pressing process, that is, the thermoplastic resin coating on the substrate 1 in advance is heated to be softened and deformed when passing through a high-temperature metal template, such that a specific relief structure is formed, and then is cooled and molded.
  • the relief structure layer 2 may also be formed by a radiation curing casting process, that is, the substrate 1 is coated with a radiation curing resin, irradiating the substrate 1 by radiation of ultraviolet light, an electron beam, etc. while pushing and pressing a master plate on the substrate 1, so as to cure the above materials, and then the master plate is removed, thereby forming the relief structure layer 2.
  • the specific volume of the second microstructure is greater than the specific volume of the first microstructure.
  • the specific volume of the first microstructure is greater than or equal to 0 ⁇ m 3 / ⁇ m 2 and less than 0.5 ⁇ m 3 / ⁇ m 2 ; and the specific volume of the second microstructure is greater than 0.4 ⁇ m 3 / ⁇ m 2 and less than 3 ⁇ m 3 / ⁇ m 2 .
  • the first microstructure or the second microstructure is one structure or a combined structure of a periodic structure and a non-periodic structure; and a cross-sectional structure of the first microstructure or the second microstructure is any one structure or a combined structure formed by at least any two structures of a sinusoidal structure, a rectangular grating structure, a trapezoidal grating structure, a blazed grating structure and an arc-shaped grating structure. Size and horizontal arrangement of the first microstructure and the second microstructure are determined by a required optical effect. A flat structure may be selected as the first microstructure.
  • the multilayer interference optically variable coating is selected as the functional coating group 3, the first coating 31, the dielectric layer 32 and the second coating 33 are used as the reflecting layer, the dielectric layer and the absorbing layer respectively, that is, the first coating 31 is non-transparent or basically non-transparent, and the second coating 33 is semitransparent.
  • the first coating 31 serves as the reflecting layer in the interference optically variable coating.
  • a material of the first coating 31 may be any one metal or a mixture or an alloy of at least any two metals of Al, Cu, Ni, Cr, Ag, Fe, Sn, Au and Pt.
  • a thickness of the first coating 31 is generally selected to be greater than 10nm and less than 80nm, more specifically, greater than 20nm and less than 50nm. If a metal reflection coating is too thin, brightness is not enough; and if the metal reflection coating is too thick, fastness of the metal reflection coating and the relief structure layer 2 is poor, and cost is increased.
  • the first coating 31 may generally be formed on the relief structure layer 2 by means of physical and/or chemical vapor deposition methods, such as, but not limited to, thermal evaporation, magnetron sputtering, metal organic chemical vapor deposition (MOCVD), etc.
  • the first coating 31 is formed on the relief structure layer 2 in a homomorphic coverage manner with a uniform surface density.
  • the dielectric layer 32 provides a function of a dielectric layer in a Fabry-Perot interference cavity.
  • the dielectric layer 32 is generally formed by means of a vapor deposition method, and a material of the dielectric layer may be selected from MgF 2 , Sn, Cr, ZnS, ZnO, TiO 2 , MgO, SiO 2 , or a mixture thereof.
  • a surface topography of the dielectric layer 32 and a topography of the first coating 31 are homomorphic or substantially homomorphic.
  • a thickness of the dielectric layer 32 is determined by an effect required by the final interference optically variable coating and is generally greater than 100nm and less than 600nm.
  • the second coating 33 serves as the absorbing layer in the interference optically variable coating.
  • the absorbing layer is generally made of a thin metal material, and appears a semitransparent characteristic in light transmission.
  • the second coating 33 may be composed of any one metal or an alloy of at least two metals of aluminum, silver, copper, tin, chromium, nickel and titanium.
  • aluminum is selected since aluminum has low cost and easy to remove by an acid liquor or an alkali liquor.
  • the second coating 33 is generally formed by means of a vapor deposition method. After vapor deposition, a surface topography of the second coating 33 and a topography of the first coating 31 and the dielectric layer 32 are homomorphic or substantially homomorphic.
  • a thickness of the second coating 33 is generally greater than 2nm and less than 10nm.
  • the protective layer 4 is generally formed by means of a printing process.
  • the specific volume of the first microstructure on the relief structure layer 2 is less than the specific volume of the second microstructure, and the functional coating group 3 is generally formed on the relief structure layer 2 in a homomorphic coverage manner, and therefore, a specific volume of a microstructure on a surface of the functional coating group 3 in the first region A is still less than a specific volume of a microstructure on a surface of the functional coating group 3 in the second region B.
  • a proper printing amount of the protective layer 4 may be selected, such that a minimum thickness of the protective layer 4 at the microstructure of the surface of the functional coating group 3 in the first region A is obviously greater than a minimum thickness of the protective layer 4 at the microstructure of the surface of the functional coating group 3 in the second region B.
  • a minimum thickness of the protective layer 4 at the microstructure is generally located at the topmost of the microstructure. Therefore, a protective function of the protective layer 4 for the functional coating group 3 in the first region A is obviously higher than a protective function of the protective layer 4 for the functional coating group 3 in the second region B.
  • Coating weight of the protective layer 4 per unit area is generally required to be greater than 0.1 g/m 2 and less than 1 g/m 2 .
  • a composition of the protective layer 4 may be any one of polyester, polyurethane and acrylic resin, or varnish or ink by combining at least any two thereof as a main resin.
  • the protective function of the protective layer 4 on the functional coating group 3 in the first region A is obviously higher than the protective function of the protective layer 4 on the functional coating group 3 in the second region B. Therefore, within a certain period of time, a corrosion atmosphere will reach and corrode the second coating 33 by means of a vulnerable point of the protective layer 4 in the second region B; and within the time, the protective layer 4 effectively protects the second coating 33 in the first region A.
  • the dielectric layer 32 does not act with the corrosion atmosphere, that is, the dielectric layer 32 may effectively protect the first coating 31.
  • the functional coating group 3 accurately located in the first region A and the first coating 31 accurately located in the second region B are acquired.
  • the corrosion atmosphere may be an acid liquor or an alkali liquor.
  • the protective layer on the coating floats along therewith.
  • the protective layer on the coating may partially or even completely remain on the multilayer body, which does not influence implementation of subsequent processes.
  • the method for manufacturing an optical anti-counterfeiting element shown in Fig. 2 generally further includes: after S4, applying the other functional coating 5, such as anti-aging glue, to protect an optical coating, and/or hot melt glue, to bond same to other substrates.
  • the other functional coating 5 such as anti-aging glue
  • an optical anti-counterfeiting element includes a first region A, a second region B and a third region C, wherein the first region A has a combined optical characteristic of a first optical microstructure and a functional coating group, the second region B has a combined optical characteristic of a second optical microstructure and a first coating, and the third region has a hollow characteristic under perspective observation.
  • the third regions are strictly positioned to each other.
  • the third region C shown in Fig. 7 is strictly located at a boundary of the second region B.
  • An image or hollow lines may be very fine frequently. For example, the image or the hollow lines are less than 50 ⁇ m.
  • the functional coating group is a multilayer interference optically variable coating
  • a first coating is a metal reflection coating (e.g. an aluminum layer), such that the first region A appears an interference optically variable characteristic and the second region B appears a characteristic of the common metal reflection coating.
  • the optical anti-counterfeiting element includes a substrate 1, a relief structure layer 2, a first coating 31, a dielectric layer 32, a second coating 33, a protective layer 4 and an other functional coating 5, wherein the first coating 31, the dielectric layer 32 and the second coating 33 form a functional coating group 3.
  • the substrate 1 and the relief structure layer 2 is usually composed of a transparent material; the relief structure layer 2 includes a first region A composed of a first microstructure, a second region B composed of a second microstructure and a third region C composed of a third microstructure, a specific volume of the second microstructure is greater than a specific volume of the first microstructure, a specific volume of the third microstructure is greater than a specific volume of the first microstructure, and a depth-to-width ratio of the third microstructure is greater than a depth-to-width ratio of the second microstructure.
  • the functional coating group 3 composed of the first coating 31, the dielectric layer 32 and the second coating 33 is arranged on the first region A, the first coating 31 and the dielectric layer 32 are arranged on the second region B, and the first coating 31 and the second coating 33 are not arranged on the third region C.
  • the dielectric layer 32 is a colorless transparent material and does not provide special optical effects in the second region B.
  • the third region C has a hollow characteristic.
  • the functional coating group 3 is adjacently connected to a protective layer 4.
  • the protective layer 4 is a natural product in a manufacturing process and generally does not provide additional optical effects.
  • the first coating 31, the dielectric layer 32 and the second coating 33 are formed into a multilayer interference optically variable coating as a reflecting layer, a dielectric layer and an absorbing layer respectively, that is, the first region A has a combined anti-counterfeiting characteristic of the first microstructure and the multilayer interference optically variable coating; and the second region B has a combined anti-counterfeiting characteristic of the second microstructure and the common reflecting layer.
  • the other functional coating 5 may be provided as required, such as a bonding layer that has a function of bonding a protected main product.
  • a method for preparing an optical anti-counterfeiting element as shown in Fig. 7 according to the disclosure is described below in conjunction with Figs. 9-12 .
  • the method includes S1'-S4'.
  • a multilayer interference optically variable coating is selected as the functional coating group 3, and the first coating 31, the dielectric layer 32 and the second coating 33 are used as a reflecting layer, a dielectric layer and an absorbing layer respectively.
  • the relief structure layer 2 includes the first region A composed of the first microstructure, the second region B composed of the second microstructure and the third region C composed of the third microstructure, a specific volume of the second microstructure is greater than a specific volume of the first microstructure, a specific volume of the third microstructure is greater than a specific volume of the first microstructure, and a depth-to-width ratio of the third microstructure is greater than a depth-to-width ratio of the second microstructure, which is as shown in Fig. 9 .
  • the substrate 1 may be at least locally transparent, or a colorless dielectric layer, or a transparent medium film having a functional coating layer on a surface, or a multilayer film formed through compounding.
  • the substrate 1 is generally formed by a film material having excellent physical and chemical resistance and high mechanical strength, for example, a plastic film of a polyethylene terephthalate (PET) film, a polyethylene terephthalate (PEN) film, a polypropylene (PP) film, etc. may be used to form the substrate 1.
  • PET polyethylene terephthalate
  • PEN polyethylene terephthalate
  • PP polypropylene
  • the substrate 1 is formed by the PET material.
  • a bonding enhancement layer may be included on the substrate 1 to enhance bonding of the substrate 1 to the relief structure layer 2.
  • a stripping layer may also be included on the substrate 1 to achieve separation of the substrate 1 in the final product from the relief structure layer 2.
  • the relief structure layer 2 may be formed by performing batch copying by means of processing manners of ultraviolet casting, mold pressing, nano-imprinting, etc.
  • the relief structure layer 2 may be formed by a thermoplastic resin by means of a mold pressing process, that is, the thermoplastic resin coating on the substrate 1 in advance is heated to be softened and deformed when passing through a high-temperature metal template, such that a specific relief structure is formed, and then is cooled and molded.
  • the relief structure layer 2 may also be formed by a radiation curing casting process, that is, the substrate 1 is coated with a radiation curing resin, irradiating the substrate 1 by radiation of ultraviolet light, an electron beam, etc. while pushing and pressing a master plate on the substrate, so as to cure the above materials, and then the master plate is removed, thereby forming the relief structure layer 2.
  • the specific volume of the second microstructure is greater than the specific volume of the first microstructure
  • the specific volume of the third microstructure is greater than the specific volume of the first microstructure
  • the depth-to-width ratio of the third microstructure is greater than the depth-to-width ratio of the second microstructure.
  • the specific volume of the first microstructure is greater than or equal to 0 ⁇ m 3 / ⁇ m 2 and less than 0.5 ⁇ m 3 / ⁇ m 2
  • the specific volume of the second microstructure is greater than 0.4 ⁇ m 3 / ⁇ m 2 and less than 3 ⁇ m 3 / ⁇ m 2
  • the specific volume of third microstructure is greater than 0.4 ⁇ m 3 / ⁇ m 2 and less than 3 ⁇ m 3 / ⁇ m 2
  • the depth-to-width ratio of the second microstructure is greater than 0 and less than 0.3
  • the depth-to-width ratio of the third microstructure is greater than 0.2 and less than 1.
  • the depth-to-width ratio of the first microstructure is not limited, and may be configured according to a required optical effect.
  • the first microstructure, the second microstructure or the third microstructure is one structure or a combined structure of a periodic structure and a non-periodic structure; and a cross-sectional structure of the first microstructure, the second microstructure or the third microstructure is any one structure or a combined structure formed by at least any two structures of a sinusoidal structure, a rectangular grating structure, a trapezoidal grating structure, a blazed grating structure and an arc-shaped grating structure. Size and horizontal arrangement of the first microstructure and the second microstructure are determined by a required optical effect. A flat structure may be selected as the first microstructure.
  • the third microstructure is only used for hollowing and generally does not provide additional optical effects, and therefore, may be simplified, such as a blazed grating which is arranged in one dimension and has a cross-sectional of an isosceles triangle having a bottom edge width of 10 ⁇ m and a height of 5 ⁇ m (i.e., a depth-to-width ratio of 0.5 and a specific volume of 2.5 ⁇ m 3 / ⁇ m 2 ).
  • the multilayer interference optically variable coating is selected as the functional coating group 3, the first coating 31, the dielectric layer 32 and the second coating 33 are used as the reflecting layer, the dielectric layer and the absorbing layer respectively, that is, the first coating 31 is non-transparent or basically non-transparent, and the second coating 33 is semitransparent.
  • the first coating 31 serves as the reflecting layer in the interference optically variable coating.
  • a material of the first coating 31 may be any one metal or a mixture or an alloy of at least any two metals of Al, Cu, Ni, Cr, Ag, Fe, Sn, Au and Pt.
  • aluminum is selected since aluminum has low cost and easy to remove by an acid liquor or an alkali liquor.
  • a thickness of the first coating 31 is generally selected to be greater than 10nm and less than 80nm, more specifically, greater than 20nm and less than 50nm. If the metal reflection coating is too thin, brightness is not enough; and if the metal reflection coating is too thick, fastness of the metal reflection coating and the relief structure layer 2 is poor, and cost is increased.
  • the first coating 31 may generally be formed on the relief structure layer 2 by means of physical and/or chemical vapor deposition methods, such as, but not limited to, thermal evaporation, magnetron sputtering, MOCVD, etc. In an embodiment, the first coating 31 is formed on the relief structure layer 2 in a homomorphic coverage manner with a uniform surface density.
  • the dielectric layer 32 provides a function of a dielectric layer in a Fabry-Perot interference cavity.
  • the dielectric layer 32 is generally formed by means of a vapor deposition method, and a material of the dielectric layer may be selected from MgF 2 , Sn, Cr, ZnS, ZnO, TiO 2 , MgO, SiO 2 , or a mixture thereof.
  • a surface topography of the dielectric layer 32 and a topography of the first coating 31 are homomorphic or substantially homomorphic.
  • a thickness of the dielectric layer 32 is determined by an effect required by the final interference optically variable coating and is generally greater than 100nm and less than 600nm.
  • the second coating 33 serves as the absorbing layer in the interference optically variable coating.
  • the absorbing layer is generally made of a thin metal material, and appears a semitransparent characteristic in light transmission.
  • the second coating 33 may be composed of any one metal or an alloy of at least two metals of aluminum, silver, copper, tin, chromium, nickel and titanium.
  • aluminum is selected since aluminum has low cost and easy to remove by an acid liquor or an alkali liquor.
  • the second coating 33 is generally formed by means of a vapor deposition method. After vapor deposition, a surface topography of the second coating 33 and a topography of the first coating 31 and the dielectric layer 32 are homomorphic or substantially homomorphic.
  • a thickness of the second coating 33 is generally greater than 2nm and less than 10nm.
  • the protective layer 4 is generally formed by means of a printing process.
  • the specific volume of the first microstructure on the relief structure layer 2 is less than the specific volumes of the second microstructure and the third microstructure, and the functional coating group 3 is generally formed on the relief structure layer 2 in a homomorphic coverage manner, and therefore, a specific volume of a microstructure on a surface of the functional coating group 3 in the first region A is still less than specific volumes of microstructures on a surface of the functional coating group 3 in the second region B and the third region C.
  • a proper printing amount of the protective layer 4 may be selected, such that a minimum thickness of the protective layer 4 at the microstructure of the surface of the functional coating group 3 of the protective layer 4 in the first region A is obviously greater than a minimum thickness of the protective layer 4 at the microstructure of the surface of the functional coating group 3 in the second region B and the third region C.
  • a minimum thickness of the protective layer 4 at the microstructure is generally located at the topmost of the microstructure.
  • a protective function of the protective layer 4 for the functional coating group 3 in the first region A is obviously higher than a protective function of the protective layer 4 for the functional coating group 3 in the second region B and the third region C.
  • Coating weight of the protective layer 4 per unit area is generally required to be greater than 0.1 g/m 2 and less than 1g/m 2 .
  • the smaller viscosity before coating of the protective layer 4, the more beneficial leveling is, and therefore, viscosity of a protective glue solution is generally less than 100cP, more specifically, less than 50cP.
  • a composition of the protective layer 4 may be any one of polyester, polyurethane and acrylic resin, or varnish or ink by combining at least any two thereof as a main resin.
  • the protective function of the protective layer 4 on the functional coating group 3 in the first region A is obviously higher than the protective function of the protective layer 4 on the functional coating group 3 in the second region B and the third region C. Therefore, within a certain period of time, a corrosion atmosphere will reach and corrode the second coating 33 by means of a vulnerable point of the protective layer 4 in the second region B and the third region C; and since the depth-to-width ratio of the third microstructure is greater than the depth-to-width ratio of the second microstructure, more cracks are formed in the dielectric layer 32 in the third region C than the dielectric layer 32 in the second region B, and therefore, a protective function of the dielectric layer 32 in the third region C on the first coating beneath it is worse than a protective function of the dielectric layer 32 in the second region B on the first coating beneath it.
  • the corrosion atmosphere continues corroding the first coating 31 by means of the vulnerable point of the dielectric layer 32; and in the second region B, the first coating 31 is effectively protected by the dielectric layer 32 to be reserved.
  • the functional coating group 3 accurately located in the first region A and the first coating 31 accurately located in the second region B are acquired; and the second coating located in the second region B and the functional coating group 3 located in the third region C are accurately removed.
  • the corrosion atmosphere may be an acid liquor or an alkali liquor.
  • the protective layer on the coating floats along therewith.
  • the protective layer on the coating may partially or even completely remain on a multilayer body, which does not influence implementation of subsequent working procedures.
  • the method for preparing an optical anti-counterfeiting element shown in Fig. 7 generally further includes: after S4', applying the other functional coating 5, such as anti-aging glue, to protect an optical coating, and/or hot melt glue, to bond same to other substrates.
  • the other functional coating 5 such as anti-aging glue
  • the method for preparing an optical anti-counterfeiting element according to the disclosure is suitable for manufacturing windowing security lines, labels, marks, wide strips, transparent windows, coating films, etc.
  • Anti-counterfeiting paper having a windowing security line is used for anti-counterfeiting of various high-safety products of banknotes, passports and securities.
  • the foregoing storage medium includes a universal serial bus (USB), a mobile hard disk, a read-only memory (ROM), a random access memory (RAM), a diskette or an optical disk, etc., which may store program codes.
  • USB universal serial bus
  • ROM read-only memory
  • RAM random access memory

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  • Credit Cards Or The Like (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Claims (13)

  1. Élément anti-contrefaçon optique, comprenant :
    une couche à structure en relief (2) ;
    la couche à structure en relief (2) comprend une première région (A) ayant une première microstructure et une deuxième région (B) ayant une deuxième microstructure, un volume spécifique de la deuxième microstructure est supérieur à un volume spécifique de la première microstructure ;
    un premier revêtement (31), une couche diélectrique (32), un deuxième revêtement (33) et une couche protectrice (4) empilés en séquence sont disposés sur un côté de la couche à structure en relief (2) ;
    le premier revêtement (31) et la couche diélectrique (32) sont situés dans la première région (A) et la deuxième région (B), et le deuxième revêtement (33) et la couche protectrice (4) sont situés dans la première région (A), mais ne sont pas situés dans la deuxième région (B) ; et
    dans lequel le premier revêtement (31), la couche diélectrique (32) et le deuxième revêtement (33) forment un groupe de revêtement fonctionnel (3), le groupe de revêtement fonctionnel (3) et la première microstructure ont une caractéristique optique combinée dans la première région (A), et le premier revêtement (31) et la deuxième microstructure ont une caractéristique optique combinée dans la deuxième région (B).
  2. Élément anti-contrefaçon optique selon la revendication 1, dans lequel
    la première microstructure ou la deuxième microstructure est une seule structure ou une structure combinée d'une structure périodique et d'une structure apériodique ; et
    une structure en coupe transversale de la première microstructure ou de la deuxième microstructure est n'importe quelle structure ou une structure combinée formée par au moins deux structures quelles qu'elles soient parmi une structure sinusoïdale, une structure de réseau rectangulaire, une structure de réseau trapézoïdal, une structure de réseau blazé et une structure de réseau en forme d'arc.
  3. Élément anti-contrefaçon optique selon la revendication 1, dans lequel
    le volume spécifique de la première microstructure est supérieur ou égal à 0 µm3/µm2 et inférieur à 0,5 µm3/µm2 ; et
    le volume spécifique de la deuxième microstructure est supérieur à 0,4 µm3/µm2 et inférieur à 3 µm3/µm2.
  4. Élément anti-contrefaçon optique selon la revendication 1, dans lequel
    le premier revêtement (31) est relié de façon adjacente à la couche à structure en relief (2).
  5. Élément anti-contrefaçon optique selon la revendication 1, dans lequel
    un matériau du premier revêtement (31) ou du deuxième revêtement (33) est n'importe quel métal ou un alliage formé par combinaison d'au moins deux métaux quels qu'ils soient parmi le nickel, le chrome, l'aluminium, l'argent, le cuivre, l'étain et le titane ; et
    un matériau de la couche diélectrique (32) est n'importe quel composé ou un mélange formé par au moins deux composés quels qu'ils soient parmi le fluorure de magnésium, le dioxyde de silicium, le sulfure de zinc, le nitrure de titane, le dioxyde de titane, le monoxyde de titane, le sesquioxyde de titane, le pentoxyde de trititane, le pentoxyde de tantale, le pentoxyde de niobium, le dioxyde de cérium, le trioxyde de bismuth, le vert d'oxyde de chrome, l'oxyde de fer, l'oxyde d'hafnium et l'oxyde de zinc.
  6. Élément anti-contrefaçon optique selon la revendication 1, dans lequel
    le groupe de revêtement fonctionnel (3) est un revêtement interférentiel multicouche optiquement variable, et l'élément anti-contrefaçon optique, sur n'importe quel côté du revêtement interférentiel multicouche optiquement variable, a une caractéristique d'interférence optiquement variable.
  7. Élément anti-contrefaçon optique selon la revendication 1, dans lequel
    la couche à structure en relief (2) comprend en outre une troisième région (C) ayant une troisième microstructure, un rapport profondeur/largeur de la troisième microstructure est supérieur à un rapport profondeur/largeur de la deuxième microstructure, et un volume spécifique de la troisième microstructure est supérieur à un volume spécifique de la première microstructure ;
    le premier revêtement (31) et le deuxième revêtement (33) ne sont pas situés dans la troisième région (C) ; et l'élément anti-contrefaçon optique a une caractéristique creuse dans la troisième région (C).
  8. Élément anti-contrefaçon optique selon la revendication 7, dans lequel
    le rapport profondeur/largeur de la troisième microstructure est supérieur à 0,2 et inférieur à 1 ;
    un rapport profondeur/largeur de la deuxième microstructure est supérieur à 0 et inférieur à 0,3 ; et
    le volume spécifique de la troisième microstructure est supérieur à 0,4 µm3/µm2 et inférieur à 3 µm3/µm2.
  9. Procédé de fabrication pour un élément anti-contrefaçon optique, comprenant :
    51) la formation d'une couche à structure en relief (2), la couche à structure en relief (2) comprend une première région (A) ayant une première microstructure et une deuxième région (B) ayant une deuxième microstructure, un volume spécifique de la deuxième microstructure est supérieur à un volume spécifique de la première microstructure ;
    S2) la formation d'un premier revêtement, d'une couche diélectrique, d'un deuxième revêtement et d'une couche protectrice empilés en séquence sur un côté de la couche à structure en relief (2) ; et
    S3) la mise en place d'un produit semi-fini en S2) dans une atmosphère pouvant réagir avec le deuxième revêtement jusqu'à ce que tout ou partie du deuxième revêtement situé dans la deuxième région (B) soit retiré, et la conservation au moins d'un premier revêtement (31) et d'un deuxième revêtement (33) empilés uniquement dans la première région (A), dans lequel le premier revêtement (31) et le deuxième revêtement (33) sont des parties non retirées du premier revêtement et du deuxième revêtement qui sont situés dans la première région (A), respectivement.
  10. Procédé de fabrication pour un élément anti-contrefaçon optique selon la revendication 9, dans lequel
    la couche à structure en relief (2) en S1) comprend en outre une troisième région (C) ayant une troisième microstructure, un rapport profondeur/largeur de la troisième microstructure est supérieur à un rapport profondeur/largeur de la deuxième microstructure, et un volume spécifique de la troisième microstructure est supérieur à un volume spécifique de la première microstructure.
  11. Procédé de fabrication pour un élément anti-contrefaçon optique selon la revendication 10, comprenant en outre :
    S4) la mise en place d'un produit semi-fini en S3) dans une atmosphère pouvant réagir avec le premier revêtement et le deuxième revêtement jusqu'à ce que tout ou partie du premier revêtement et du deuxième revêtement qui sont situés dans la troisième région (C) soit retiré.
  12. Procédé de fabrication pour un élément anti-contrefaçon optique selon la revendication 11, dans lequel
    le premier revêtement (31) ou le deuxième revêtement (33) en S3) comprend une couche d'aluminium, ou le premier revêtement (31) et le deuxième revêtement (33) en S3) comprennent une couche d'aluminium ; et
    une liqueur acide ou une liqueur alcaline est sélectionnée comme l'atmosphère pouvant réagir avec le premier revêtement et/ou le deuxième revêtement en S4).
  13. Procédé de fabrication pour un élément anti-contrefaçon optique selon l'une quelconque des revendications 9 à 12, comprenant en outre :
    l'application d'un revêtement inorganique ou organique ou d'un traitement par couche de peinture.
EP20868863.0A 2019-09-29 2020-09-16 Élément anti-contrefaçon optique à corps multicouche et son procédé de fabrication Active EP4035903B1 (fr)

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ES2171747T3 (es) * 1995-11-28 2002-09-16 Ovd Kinegram Ag Soporte de informacion optica.
US6060143A (en) * 1996-11-14 2000-05-09 Ovd Kinegram Ag Optical information carrier
DE10251781A1 (de) * 2002-11-05 2004-05-19 Giesecke & Devrient Gmbh Sicherheitselement und Verfahren zu seiner Herstellung
DE102007034716A1 (de) 2007-07-23 2009-01-29 Giesecke & Devrient Gmbh Sicherheitselement
JP5545289B2 (ja) 2009-06-18 2014-07-09 凸版印刷株式会社 光学素子の製造方法
JP5929013B2 (ja) 2011-05-25 2016-06-01 凸版印刷株式会社 着色偽造防止構造体および着色偽造防止媒体
CN103963510B (zh) * 2013-01-29 2015-12-23 中钞特种防伪科技有限公司 一种制备光学防伪元件的方法
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JP2016097617A (ja) 2014-11-25 2016-05-30 凸版印刷株式会社 表示体および表示体付き物品
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EP4035903A4 (fr) 2023-01-04
CN112572018B (zh) 2022-06-14
CN112572018A (zh) 2021-03-30
WO2021057574A1 (fr) 2021-04-01
JP2022551240A (ja) 2022-12-08
JP7307853B2 (ja) 2023-07-12

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