EP3994225B1 - Composition adhésive sensible à la pression à base de silicone contenant un additif de fluorosilicone et ses procédés de préparation et d'utilisation - Google Patents
Composition adhésive sensible à la pression à base de silicone contenant un additif de fluorosilicone et ses procédés de préparation et d'utilisation Download PDFInfo
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- EP3994225B1 EP3994225B1 EP19935967.0A EP19935967A EP3994225B1 EP 3994225 B1 EP3994225 B1 EP 3994225B1 EP 19935967 A EP19935967 A EP 19935967A EP 3994225 B1 EP3994225 B1 EP 3994225B1
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- 239000000203 mixture Substances 0.000 title claims description 134
- 239000004820 Pressure-sensitive adhesive Substances 0.000 title claims description 29
- 239000000654 additive Substances 0.000 title claims description 28
- 229920001296 polysiloxane Polymers 0.000 title claims description 28
- 238000000034 method Methods 0.000 title claims description 25
- 230000000996 additive effect Effects 0.000 title claims description 24
- 238000002360 preparation method Methods 0.000 title description 8
- 239000007858 starting material Substances 0.000 claims description 98
- 239000011347 resin Substances 0.000 claims description 62
- 229920005989 resin Polymers 0.000 claims description 62
- 239000000758 substrate Substances 0.000 claims description 59
- 239000002904 solvent Substances 0.000 claims description 48
- 125000000217 alkyl group Chemical group 0.000 claims description 42
- 239000011521 glass Substances 0.000 claims description 38
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 35
- -1 polydimethylsiloxane Polymers 0.000 claims description 35
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 33
- 125000004432 carbon atom Chemical group C* 0.000 claims description 27
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 27
- 230000001681 protective effect Effects 0.000 claims description 22
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 21
- 239000007809 chemical reaction catalyst Substances 0.000 claims description 19
- 229920000642 polymer Polymers 0.000 claims description 19
- 150000002430 hydrocarbons Chemical group 0.000 claims description 17
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 16
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 14
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 13
- 229920006294 polydialkylsiloxane Polymers 0.000 claims description 13
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 12
- 229910020388 SiO1/2 Inorganic materials 0.000 claims description 11
- 239000006116 anti-fingerprint coating Substances 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 11
- 229910020447 SiO2/2 Inorganic materials 0.000 claims description 10
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 10
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 10
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 9
- 229920002554 vinyl polymer Polymers 0.000 claims description 9
- 239000002683 reaction inhibitor Substances 0.000 claims description 7
- 229910020485 SiO4/2 Inorganic materials 0.000 claims description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 5
- 239000008096 xylene Substances 0.000 claims description 5
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 claims description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- 125000006038 hexenyl group Chemical group 0.000 claims description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 4
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 claims description 3
- JQZGUQIEPRIDMR-UHFFFAOYSA-N 3-methylbut-1-yn-1-ol Chemical compound CC(C)C#CO JQZGUQIEPRIDMR-UHFFFAOYSA-N 0.000 claims description 2
- ZPOLOEWJWXZUSP-WAYWQWQTSA-N bis(prop-2-enyl) (z)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C/C(=O)OCC=C ZPOLOEWJWXZUSP-WAYWQWQTSA-N 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 description 21
- 229910001220 stainless steel Inorganic materials 0.000 description 21
- 239000003054 catalyst Substances 0.000 description 19
- 239000003112 inhibitor Substances 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 11
- 230000003666 anti-fingerprint Effects 0.000 description 9
- 229920000139 polyethylene terephthalate Polymers 0.000 description 9
- 239000005020 polyethylene terephthalate Substances 0.000 description 9
- 239000004971 Cross linker Substances 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 6
- 125000004122 cyclic group Chemical group 0.000 description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- 150000004756 silanes Chemical class 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- 239000004433 Thermoplastic polyurethane Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000006059 cover glass Substances 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000000962 organic group Chemical group 0.000 description 4
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- 239000013523 DOWSIL™ Substances 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical group 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- CRJSCSRODDRNDN-UHFFFAOYSA-N methyl-tris(2-methylbut-3-yn-2-yloxy)silane Chemical compound C#CC(C)(C)O[Si](C)(OC(C)(C)C#C)OC(C)(C)C#C CRJSCSRODDRNDN-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- JNRUXZIXAXHXTN-UHFFFAOYSA-N trimethyl(2-methylbut-3-yn-2-yloxy)silane Chemical compound C#CC(C)(C)O[Si](C)(C)C JNRUXZIXAXHXTN-UHFFFAOYSA-N 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical group [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- RQCQBDUYEHRNPP-UHFFFAOYSA-N dimethyl-bis(2-methylbut-3-yn-2-yloxy)silane Chemical compound C#CC(C)(C)O[Si](C)(C)OC(C)(C)C#C RQCQBDUYEHRNPP-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-L fumarate(2-) Chemical class [O-]C(=O)\C=C\C([O-])=O VZCYOOQTPOCHFL-OWOJBTEDSA-L 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 1
- HMVBQEAJQVQOTI-SOFGYWHQSA-N (e)-3,5-dimethylhex-3-en-1-yne Chemical compound CC(C)\C=C(/C)C#C HMVBQEAJQVQOTI-SOFGYWHQSA-N 0.000 description 1
- GRGVQLWQXHFRHO-AATRIKPKSA-N (e)-3-methylpent-3-en-1-yne Chemical compound C\C=C(/C)C#C GRGVQLWQXHFRHO-AATRIKPKSA-N 0.000 description 1
- QFMZQPDHXULLKC-UHFFFAOYSA-N 1,2-bis(diphenylphosphino)ethane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCP(C=1C=CC=CC=1)C1=CC=CC=C1 QFMZQPDHXULLKC-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N 1-Heptene Chemical group CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- GDKOYYDQISQOMH-UHFFFAOYSA-N 1-ethynylcyclohexan-1-amine Chemical compound C#CC1(N)CCCCC1 GDKOYYDQISQOMH-UHFFFAOYSA-N 0.000 description 1
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 description 1
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical compound COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 description 1
- GHUKNXGEAKLBCF-UHFFFAOYSA-N 2-cyclohexylethynoxy(2-methylprop-1-enyl)silane Chemical compound CC(C)=C[SiH2]OC#CC1CCCCC1 GHUKNXGEAKLBCF-UHFFFAOYSA-N 0.000 description 1
- CKGFUKMCQWCVTF-UHFFFAOYSA-N 2-cyclohexylethynoxy(trimethyl)silane Chemical compound C[Si](C)(C)OC#CC1CCCCC1 CKGFUKMCQWCVTF-UHFFFAOYSA-N 0.000 description 1
- IHZPGDZOQYVHPH-UHFFFAOYSA-N 2-cyclohexylethynoxy-hex-1-enyl-dimethylsilane Chemical compound CCCCC=C[Si](C)(C)OC#CC1CCCCC1 IHZPGDZOQYVHPH-UHFFFAOYSA-N 0.000 description 1
- OWTWEGLUXPGBQL-UHFFFAOYSA-N 2-methyl-2-(3,3,3-trifluoropropyl)-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound FC(F)(F)CC[Si]1(C)O[SiH2]O[SiH2]O[SiH2]O1 OWTWEGLUXPGBQL-UHFFFAOYSA-N 0.000 description 1
- XJXLITUVRZECSK-UHFFFAOYSA-N 2-methylprop-1-enyl(2-phenylbut-3-yn-2-yloxy)silane Chemical compound CC(C)=C[SiH2]OC(C)(C#C)C1=CC=CC=C1 XJXLITUVRZECSK-UHFFFAOYSA-N 0.000 description 1
- KSLSOBUAIFEGLT-UHFFFAOYSA-N 2-phenylbut-3-yn-2-ol Chemical compound C#CC(O)(C)C1=CC=CC=C1 KSLSOBUAIFEGLT-UHFFFAOYSA-N 0.000 description 1
- 238000005133 29Si NMR spectroscopy Methods 0.000 description 1
- ZCTILCZSUSTVHT-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-yloxy(trimethyl)silane Chemical compound CC(C)CC(C)(C#C)O[Si](C)(C)C ZCTILCZSUSTVHT-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- CUUQUEAUUPYEKK-UHFFFAOYSA-N 4-ethyloct-1-yn-3-ol Chemical compound CCCCC(CC)C(O)C#C CUUQUEAUUPYEKK-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- GXWXVPLULLDSQD-UHFFFAOYSA-N benzhydryl(2-cyclohexylethynoxy)silane Chemical compound C1CCCCC1C#CO[SiH2]C(C=1C=CC=CC=1)C1=CC=CC=C1 GXWXVPLULLDSQD-UHFFFAOYSA-N 0.000 description 1
- UGCRVOQFQNFERL-UHFFFAOYSA-N benzhydryl(2-phenylbut-3-yn-2-yloxy)silane Chemical compound C=1C=CC=CC=1C(C)(C#C)O[SiH2]C(C=1C=CC=CC=1)C1=CC=CC=C1 UGCRVOQFQNFERL-UHFFFAOYSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- AIRJPWNMEDFXOF-UHFFFAOYSA-N bis(2-methylbut-3-yn-2-yloxy)methyl-(3,3,3-trifluoropropyl)silane Chemical compound C#CC(C)(C)OC(OC(C)(C)C#C)[SiH2]CCC(F)(F)F AIRJPWNMEDFXOF-UHFFFAOYSA-N 0.000 description 1
- FSIJKGMIQTVTNP-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C=C)C=C FSIJKGMIQTVTNP-UHFFFAOYSA-N 0.000 description 1
- ZPOLOEWJWXZUSP-AATRIKPKSA-N bis(prop-2-enyl) (e)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C\C(=O)OCC=C ZPOLOEWJWXZUSP-AATRIKPKSA-N 0.000 description 1
- GKPOMITUDGXOSB-UHFFFAOYSA-N but-3-yn-2-ol Chemical compound CC(O)C#C GKPOMITUDGXOSB-UHFFFAOYSA-N 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- HEKCLFBKPBNPEA-UHFFFAOYSA-N dimethyl-(2-methylbut-3-yn-2-yloxy)-phenylsilane Chemical compound C#CC(C)(C)O[Si](C)(C)C1=CC=CC=C1 HEKCLFBKPBNPEA-UHFFFAOYSA-N 0.000 description 1
- PUMXRKCXGXELTP-UHFFFAOYSA-N dimethyl-phenyl-(2-phenylbut-3-yn-2-yloxy)silane Chemical compound C=1C=CC=CC=1C(C)(C#C)O[Si](C)(C)C1=CC=CC=C1 PUMXRKCXGXELTP-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical class C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 1
- NFDITRFZTVIWOM-UHFFFAOYSA-N ethenylsilyl acetate Chemical compound CC(=O)O[SiH2]C=C NFDITRFZTVIWOM-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- OEAGVCHVQWNBCD-UHFFFAOYSA-N hex-1-enyl-dimethyl-(2-methylbut-3-yn-2-yloxy)silane Chemical compound CCCCC=C[Si](C)(C)OC(C)(C)C#C OEAGVCHVQWNBCD-UHFFFAOYSA-N 0.000 description 1
- JWFPHSIMAILTFM-UHFFFAOYSA-N hex-1-enyl-dimethyl-(2-phenylbut-3-yn-2-yloxy)silane Chemical compound CCCCC=C[Si](C)(C)OC(C)(C#C)C1=CC=CC=C1 JWFPHSIMAILTFM-UHFFFAOYSA-N 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QXLPXWSKPNOQLE-UHFFFAOYSA-N methylpentynol Chemical compound CCC(C)(O)C#C QXLPXWSKPNOQLE-UHFFFAOYSA-N 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- ILBIXZPOMJFOJP-UHFFFAOYSA-N n,n-dimethylprop-2-yn-1-amine Chemical compound CN(C)CC#C ILBIXZPOMJFOJP-UHFFFAOYSA-N 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- HQFYIDOMCULPIW-UHFFFAOYSA-N n-methylprop-2-yn-1-amine Chemical compound CNCC#C HQFYIDOMCULPIW-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- CHOLPKIHPFNIPE-UHFFFAOYSA-N phosphanylphosphane rhodium Chemical compound [Rh].PP CHOLPKIHPFNIPE-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- JKANAVGODYYCQF-UHFFFAOYSA-N prop-2-yn-1-amine Chemical compound NCC#C JKANAVGODYYCQF-UHFFFAOYSA-N 0.000 description 1
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- IENQTDRUPBYCHN-UHFFFAOYSA-N tetrakis(2-methylprop-1-enylsilyl) silicate Chemical compound CC(=C[SiH2]O[Si](O[SiH2]C=C(C)C)(O[SiH2]C=C(C)C)O[SiH2]C=C(C)C)C IENQTDRUPBYCHN-UHFFFAOYSA-N 0.000 description 1
- VNRWTCZXQWOWIG-UHFFFAOYSA-N tetrakis(trimethylsilyl) silicate Chemical compound C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C VNRWTCZXQWOWIG-UHFFFAOYSA-N 0.000 description 1
- JMTMWSZLPHDWBQ-UHFFFAOYSA-N tetrakis[ethenyl(dimethyl)silyl] silicate Chemical compound C=C[Si](C)(C)O[Si](O[Si](C)(C)C=C)(O[Si](C)(C)C=C)O[Si](C)(C)C=C JMTMWSZLPHDWBQ-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- RSNQKPMXXVDJFG-UHFFFAOYSA-N tetrasiloxane Chemical group [SiH3]O[SiH2]O[SiH2]O[SiH3] RSNQKPMXXVDJFG-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- CAAPVQVUCVXKKS-UHFFFAOYSA-N triethyl(2-methylbut-3-yn-2-yloxy)silane Chemical compound CC[Si](CC)(CC)OC(C)(C)C#C CAAPVQVUCVXKKS-UHFFFAOYSA-N 0.000 description 1
- WGUISIBZFQKBPC-UHFFFAOYSA-N trimethoxy(1-trimethoxysilylpropyl)silane Chemical compound CO[Si](OC)(OC)C(CC)[Si](OC)(OC)OC WGUISIBZFQKBPC-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 238000000196 viscometry Methods 0.000 description 1
- 239000011995 wilkinson's catalyst Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5425—Silicon-containing compounds containing oxygen containing at least one C=C bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/56—Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/318—Applications of adhesives in processes or use of adhesives in the form of films or foils for the production of liquid crystal displays
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2483/00—Presence of polysiloxane
Definitions
- a silicone pressure sensitive adhesive composition can be cured on a substrate to form a protective film.
- the protective film is useful in electronics applications for protection of display glass having an anti-fingerprint coating on its surface (AF glass).
- silicone pressure sensitive adhesives may lack sufficient adhesion on AF glass. If an adhesion promoting additive is included in the silicone pressure sensitive adhesive composition, the resulting silicone pressure sensitive adhesive may then have adhesion that is too high on certain substrates to allow effective processing to fabricate the display device.
- US2015/240141 A1 discloses a composition based on a polyorganosiloxane with at least two alkenyl groups per molecule, a polyorganosiloxane with M and Q units, a polyorganohydrogensiloxane with at least three SiH groups per molecule, and an oligomer comprising aryl and tetrasiloxane units. The composition can be deployed in anti-fingerprint applications.
- Si-PSA silicone pressure sensitive adhesive
- the Si-PSA composition is curable to form a Si-PSA suitable for use in protective films for display devices.
- a protective film comprising the Si-PSA on a surface of a substrate may be used on AF glass.
- Figure 1 shows a partial cross section of a protective film 100.
- protective film 103a surface of anti-fingerprint hard coating 103 101 polymeric substrate 101b surface of polymeric substrate 101 103b opposing surface of anti-fingerprint hard coating 103 102 second Si-PSA 102a surface of second Si-PSA 102 104 substrate 102b opposing surface of Si-PSA 102 104a surface of substrate 104 103 anti-fingerprint hard coating 104b opposing surface of substrate 104 105 Si-PSA 106b opposing surface of anti-fingerprint coating 106 105a surface of Si-PSA 105 105b opposing surface of Si-PSA 105 107 display cover glass 106 anti-fingerprint coating 107a surface of display cover glass 107 106a surface of anti-fingerprint coating 106
- the Si-PSA composition comprises: (A) a polydialkylsiloxane terminated with an aliphatically unsaturated group; (B) a polyalkylhydrogensiloxane; (C) a hydrosilylation reaction catalyst; (D) a siloxane selected from the group consisting of (D-1) a polyorganosilicate resin, (D-2) a branched polyorganosiloxane polymer, and (D-3) a combination of both (D-1) and (D-2); (E) a poly(dialkyl/alkyl,fluoroalkyl)siloxane; (F) an anchorage additive; optionally (G) a hydrosilylation reaction inhibitor; and optionally (H) a solvent.
- Starting material (A) in the Si-PSA composition is a polydialkylsiloxane terminated with an aliphatically unsaturated group.
- the polydialkylsiloxane may have unit formula (A-1): (R M 2 R U SiO 1/2 ) 2 (R M 2 SiO 2/2 ) a , where each R M is an independently selected alkyl group of 1 to 30 carbon atoms that is free of aliphatic unsaturation; each R U is an independently selected monovalent aliphatically unsaturated hydrocarbon group of 2 to 30 carbon atoms; and subscript a has a value of 4 to 10,000, alternatively the average value of subscript a may be 600 to 10,000.
- Each R M is an independently selected alkyl group of 1 to 30 carbon atoms. Alternatively, each R M may have 1 to 12 carbon atoms, and alternatively 1 to 6 carbon atoms. "Alkyl” means a cyclic, branched, or unbranched, saturated monovalent hydrocarbon group.
- Suitable alkyl groups for R M are exemplified by linear and branched alkyl groups such as methyl, ethyl, propyl (e.g., iso-propyl and/or n-propyl), butyl (e.g., isobutyl, n-butyl, tert-butyl, and/or sec-butyl), pentyl (e.g., isopentyl, neopentyl, and/or tert-pentyl), hexyl, heptyl, octyl, nonyl, and decyl, and branched alkyl groups of 6 or more carbon atoms; or cyclic alkyl groups such as cyclopentyl and cyclohexyl.
- each R M may be independently selected from the group consisting of linear alkyl and branched alkyl.
- each R M may be linear alkyl.
- each R M may be linear
- each R U is an independently selected monovalent aliphatically unsaturated hydrocarbon group of 2 to 30 carbon atoms. Alternatively, each R U may have 2 to 12 carbon atoms, and alternatively 2 to 6 carbon atoms. Suitable monovalent aliphatically unsaturated hydrocarbon groups include alkenyl groups and alkynyl groups. "Alkenyl” means a cyclic, branched or unbranched, monovalent hydrocarbon group having one or more carbon-carbon double bonds.
- alkenyl groups are exemplified by vinyl; allyl; propenyl (e.g., isopropenyl, and/or n-propenyl); and butenyl, pentenyl, hexenyl, and heptenyl, (including branched and linear isomers of 4 to 7 carbon atoms); and cyclohexenyl.
- Alkynyl means a cyclic, branched or unbranched, monovalent hydrocarbon group having one or more carbon-carbon triple bonds.
- Suitable alkynyl groups are exemplified by ethynyl, propynyl, and butynyl (including branched and linear isomers of 2 to 4 carbon atoms).
- each R U may be linear alkenyl, such as vinyl, allyl, or hexenyl.
- Starting material (A) may comprise a polydialkylsiloxane such as
- the amount of polydialkylsiloxane in the Si-PSA composition is 10% to 60%, based on combined weights of starting materials (A) to (G) (e.g., based on combined weights of all starting materials in the Si-PSA composition excluding solvent).
- the amount of polydialkylsiloxane in the Si-PSA composition may be 20% to 35%, and alternatively 25% to 30%, on the same basis.
- Starting material (B) in the Si-PSA composition is a polyalkylhydrogensiloxane that may act as a crosslinker.
- Suitable polyalkylhydrogensiloxanes are exemplified by:
- the amount of polyalkylhydrogensiloxane in the Si-PSA composition is 0.1% to 5%, based on combined weights of starting materials (A) to (G) (e.g., based on combined weights of all starting materials in the Si-PSA composition excluding solvent).
- the amount of polyalkylhydrogensiloxane in the Si-PSA composition may be 0.5% to 2.5%, and alternatively 1% to 2%, on the same basis.
- Hydrosilylation reaction catalysts are known in the art and are commercially available. Hydrosilylation reaction catalysts include platinum group metal catalysts. Such hydrosilylation reaction catalysts can be (C-1) a metal selected from platinum, rhodium, ruthenium, palladium, osmium, and iridium.
- the hydrosilylation reaction catalyst may be (C-2) a compound of such a metal, for example, chloridotris(triphenylphosphane)rhodium(I) (Wilkinson's Catalyst), a rhodium diphosphine chelate such as [1,2-bis(diphenylphosphino)ethane]dichlorodirhodium or [1,2-bis(diethylphospino)ethane]dichlorodirhodium, chloroplatinic acid (Speier's Catalyst), chloroplatinic acid hexahydrate, platinum dichloride.
- C-2 chloridotris(triphenylphosphane)rhodium(I)
- a rhodium diphosphine chelate such as [1,2-bis(diphenylphosphino)ethane]dichlorodirhodium or [1,2-bis(diethylphospino)ethan
- the hydrosilylation reaction catalyst may be (C-3) a complex of the platinum group metal compound with a low molecular weight organopolysiloxane, or (C-4) the platinum group metal compound microencapsulated in a matrix or coreshell type structure.
- Complexes of platinum with low molecular weight organopolysiloxanes include 1,3-diethenyl-1,1,3,3-tetramethyldisiloxane complexes with platinum (Karstedt's Catalyst).
- the hydrosilylation catalyst may comprise (C-5) the complex microencapsulated in a resin matrix. Exemplary hydrosilylation reaction catalysts are described in U.S.
- Microencapsulated hydrosilylation reaction catalysts and methods of preparing them are known in the art, as exemplified in U.S. Patents 4,766,176 and 5,017,654 .
- Hydrosilylation reaction catalysts are commercially available, for example, SYL-OFF TM 4000 Catalyst and SYL-OFF TM 2700 are available from Dow Silicones Corporation of Midland, Michigan, USA.
- the amount of hydrosilylation reaction catalyst used herein will depend on various factors including the selection of starting materials (B) and (A), and their respective contents of silicon bonded hydrogen atoms (SiH) and aliphatically unsaturated groups and the content of the platinum group metal in the catalyst selected, however, the amount of hydrosilylation reaction catalyst is sufficient to catalyze hydrosilylation reaction of SiH and aliphatically unsaturated groups, alternatively the amount of catalyst is sufficient to provide 1 ppm to 6,000 ppm of the platinum group metal based on combined weights of starting materials containing silicon bonded hydrogen atoms and aliphatically unsaturated hydrocarbon groups; alternatively 1 ppm to 1,000 ppm, and alternatively 1 ppm to 100 ppm, on the same basis.
- the amount of catalyst may be 0.01% to 5% based on combined weights of starting materials (A) to (G), (e.g., based on combined weights of all starting materials in the Si-PSA composition, excluding solvent).
- the hydrosilylation reaction catalyst comprises a platinum - organosiloxane complex
- the amount of catalyst may be 1% to 5%, alternatively 2% to 4%, based on combined weights of starting materials (A) to (G) (e.g., based on combined weights of all starting materials in the Si-PSA composition excluding solvent).
- the Si-PSA composition described herein further comprises starting material (D), a siloxane selected from the group consisting of (D-1) a polyorganosilicate resin, (D-2) a branched polyorganosiloxane polymer, and (D-3) a combination of both (D-1) and (D-2).
- D starting material
- D-1 a siloxane selected from the group consisting of (D-1) a polyorganosilicate resin, (D-2) a branched polyorganosiloxane polymer, and (D-3) a combination of both (D-1) and (D-2).
- the polyorganosilicate resin comprises monofunctional units ("M" units) of formula R P 3 SiO 1/2 and tetrafunctional silicate units ("Q" units) of formula SiO 4/2 , where R P is selected from the group consisting of R M and R U , each of which are described above.
- R P is selected from the group consisting of R M and R U , each of which are described above.
- each R P may be R M , alternatively each R P may be alkyl, and alternatively methyl.
- each R P may be selected from linear alkyl and linear alkenyl, alternatively methyl and vinyl.
- at least one-third, alternatively at least two thirds of the R P groups are methyl groups.
- the M units may be exemplified by (Me 3 SiO 1/2 ) and (Me 2 ViSiO 1/2 ).
- the polyorganosilicate resin is soluble in solvents such as those described below, exemplified by liquid hydrocarbons, such as benzene, toluene, xylene, and heptane, or in liquid organosilicon compounds such as low viscosity linear and cyclic polydiorganosiloxanes.
- the polyorganosilicate resin comprises the M and Q units described above, and the polyorganosiloxane further comprises units with silicon bonded hydroxyl groups and may comprise neopentamer of formula Si(OSiR P 3 ) 4 , where R P is as described above, e.g., the neopentamer may be tetrakis(trimethylsiloxy)silane.
- 29 Si NMR spectroscopy may be used to measure hydroxyl content and molar ratio of M and Q units, where said ratio is expressed as ⁇ M(resin) ⁇ / ⁇ Q(resin) ⁇ , excluding M and Q units from the neopentamer.
- M:Q ratio represents the molar ratio of the total number of triorganosiloxy groups (M units) of the resinous portion of the polyorganosilicate resin to the total number of silicate groups (Q units) in the resinous portion.
- M:Q ratio may be 0.5:1 to 1.5:1.
- the Mn of the polyorganosilicate resin depends on various factors including the types of hydrocarbon groups represented by R M that are present.
- the Mn of the polyorganosilicate resin refers to the number average molecular weight measured using GPC, when the peak representing the neopentamer is excluded from the measurement.
- the Mn of the polyorganosilicate resin may be greater than 3,000 g/mol, alternatively > 3,000 g/mol to 8,000 g/mol. Alternatively, Mn of the polyorganosilicate resin may be 3,500 g/mol to 8,000 g/mol.
- MQ resins which are suitable polyorganosilicate resins for use in the pressure sensitive adhesive composition described herein.
- the polyorganosilicate resin can be prepared by any suitable method, such as cohydrolysis of the corresponding silanes or by silica hydrosol capping methods.
- the polyorganosilicate resin may be prepared by silica hydrosol capping processes such as those disclosed in U.S. Patent 2,676,182 to Daudt, et al. ; U.S.
- the method of Daudt, et al. described above involves reacting a silica hydrosol under acidic conditions with a hydrolyzable triorganosilane such as trimethylchlorosilane, a siloxane such as hexamethyldisiloxane, or mixtures thereof, and recovering a copolymer having M units and Q units.
- the resulting copolymers generally contain from 2 to 5 percent by weight of hydroxyl groups.
- the intermediates used to prepare the polyorganosilicate resin may be triorganosilanes and silanes with four hydrolyzable substituents or alkali metal silicates.
- the triorganosilanes may have formula R P 3 SiX 1 , where R M is as described above and X 1 represents a hydrolyzable substituent such as halogen, alkoxy, acyloxy, hydroxyl, oximo, or ketoximo; alternatively, halogen, alkoxy or hydroxyl.
- Silanes with four hydrolyzable substituents may have formula SiX 2 4 , where each X 2 is halogen, alkoxy or hydroxyl.
- Suitable alkali metal silicates include sodium silicate.
- the polyorganosilicate resin prepared as described above typically contains silicon bonded hydroxyl groups, i.e., of formulae, HOSi 3/2 and/or HOR P 2 SiO 1/2 .
- the polyorganosilicate resin may comprise up to 2% of silicon bonded hydroxyl groups, as measured by FTIR spectroscopy. For certain applications, it may desirable for the amount of silicon bonded hydroxyl groups to be below 0.7%, alternatively below 0.3%, alternatively less than 1%, and alternatively 0.3% to 0.8%.
- Silicon bonded hydroxyl groups formed during preparation of the polyorganosilicate resin can be converted to trihydrocarbon siloxane groups or to a different hydrolyzable group by reacting the silicone resin with a silane, disiloxane, or disilazane containing the appropriate terminal group.
- Silanes containing hydrolyzable groups may be added in molar excess of the quantity required to react with the silicon bonded hydroxyl groups on the polyorganosilicate resin.
- the polyorganosilicate resin may further comprise 2% or less, alternatively 0.7% or less, and alternatively 0.3% or less, and alternatively 0.3% to 0.8% of units represented by formula XSiO 3/2 and/or XR P 2 SiO 1/2 where R P is as described above, and X represents a hydrolyzable substituent, as described above for X 1 .
- the polyorganosilicate resin may have terminal aliphatically unsaturated groups.
- the polyorganosilicate resin having terminal aliphatically unsaturated groups may be prepared by reacting the product of Daudt, et al. with an unsaturated organic group-containing endblocking agent and an endblocking agent free of aliphatic unsaturation, in an amount sufficient to provide from 3 to 30 mole percent of unsaturated organic groups in the final product.
- endblocking agents include, but are not limited to, silazanes, siloxanes, and silanes. Suitable endblocking agents are known in the art and exemplified in U.S. Patents 4,584,355 ; 4,591,622 ; and 4,585,836. A single endblocking agent or a mixture of such agents may be used to prepare such resin.
- the polyorganosilicate resin may comprise unit formula (D-1-1): (R M 3 SiO- 1/2 ) m (R M 2 R U SiO- 1/2 ) n (SiO 4/2 ) o , where R M and R U are as described above and subscripts m, n and o have average values such that m ⁇ 0, n ⁇ 0, o > 1, and (m + n) > 4.
- the polyorganosilicate resin may comprise unit formula (D-1-2): (R M 3 SiO- 1/2 ) z (SiO 4/2 ) o , where R M is as described above, subscript o is as described above, and subscript z > 4.
- starting materials (A) and (D) may be present in amounts sufficient to provide a weight ratio of amount of starting material (D) to starting materials (A) (Resin/Polymer), or (D)/(A) ratio) of ⁇ 2/1, alternatively ⁇ 2/1 to 3.5/1; alternatively ⁇ 2/1 to 3/1, alternatively ⁇ 2/1 to 2.5/1, and alternatively 2.3/1.
- the polyorganosilicate resin may be present in an amount of 4% to 74%, alternatively 50% to 70%, alternatively 55% to 65%, based on combined weights of starting materials (A) to (G) in the Si-PSA composition (e.g., based on combined weights of all starting materials in the Si-PSA composition excluding solvent).
- the Si-PSA composition described herein may further comprise starting material (D2), a branched polyorganosiloxane in addition to, or instead of, the polyorganosilicate resin.
- the branched polyorganosiloxane may comprise a Q branched polyorganosiloxane of unit formula (D-2-1): (R M 3 SiO 1/2 ) b (R M 2 R U SiO 1/2 ) c (R M 2 SiO 2/2 ) d (SiO 4/2 ) e , where R M and R U are as described above, and subscripts b, c, d, and e have the following values b ⁇ 0, c ⁇ 0, a quantity (b + c) ⁇ 4, d is 0 to 995, and e ⁇ 1.
- viscosity may be > 170 mPa s to 1,000 mPa s, alternatively > 170 to 500 mPa s, alternatively 180 mPa s to 450 mPa s, and alternatively 190 mPa s to 420 mPa s.
- Suitable branched siloxanes for starting material (D-2) are exemplified by those disclosed in U.S. Patent 6,806,339 and U.S. Patent Publication 2007/0289495 .
- each R M is methyl
- each R U is independently selected from the group consisting of vinyl, allyl, and hexenyl.
- Branched polyorganosiloxane suitable for use in the Si-PSA composition may be prepared by known methods such as heating a mixture comprising a polyorganosilicate resin, and a cyclic polydiorganosiloxane or a linear polydiorganosiloxane, in the presence of a catalyst, such as an acid or phosphazene base, and thereafter neutralizing the catalyst.
- the amount of starting material (D2) depends on various factors including the type and amount of other starting materials in the Si-PSA composition, the concentration of aliphatically unsaturated groups and silicon bonded hydrogen atoms of the starting materials in the Si-PSA composition, and whether an inhibitor is present.
- the amount of branched polyorganosiloxane may be 0% to 10%, alternatively 1% to 10%, alternatively 2% to 5%, and alternatively 3% to 4%, based on combined weights of starting materials (A) to (G) in the Si-PSA composition (e.g., based on combined weights of all starting materials in the Si-PSA composition excluding solvent).
- the Si-PSA composition further comprises starting material (E), a poly(dialkyl/alkyl,fluoroalkyl)siloxane.
- the poly(dialkyl/alkyl,fluoroalkyl)siloxane may have 15 mol % to 29 mol% fluoroalkyl groups, and alternatively at least 16 mol %, alternatively at least 17 mol %, alternatively at least 18 mol %, and alternatively at least 19 mol %, of fluoroalkyl groups.
- poly(dialkyl/alkyl,fluoroalkyl)siloxane may contain up to 28 mol % of fluoroalkyl groups, and alternatively up to 27 mol % of fluoroalkyl groups.
- the poly(dialkyl/alkyl,fluoroalkyl)siloxane is free of organic groups capable of undergoing hydrosilylation reaction under the conditions described herein, such as aliphatically unsaturated hydrocarbon groups.
- the fluoroalkyl groups may be have formula C n F (2n+1) -R D - where subscript n is 1 to 20, and R D is an alkylene group of 2 to 30 carbon atoms, alternatively 2 to 10 carbon atoms, alternatively 2 to 6 carbon atoms.
- alkylene groups include ethylene, propylene, butylene, hexylene, and heptylene; alternatively ethylene, propylene, or butylene.
- the poly(dialkyl/alkyl,fluoroalkyl)siloxane may have unit formula (E-1): (R M 3 SiO- 1/2 ) 2 (R M R F SiO 2/2 ) f (R M 2 SiO 2/2 ) g , where each R M is an independently selected alkyl group of 1 to 30 carbon atoms; each R F is an independently selected monovalent fluorinated alkyl group of 1 to 30 carbon atoms; subscript f > 0, subscript g > 0, with the proviso that a quantity (f + g) is 100 to 10,000.
- poly(dialkyl/alkyl,fluoroalkyl)siloxanes suitable for use in the Si-PSA composition described herein include:
- the amount of poly(dialkyl/alkyl,fluoroalkyl)siloxane in the Si-PSA composition depends on various factors including the type and amount of other starting materials in the composition and the fluorine content of the poly(dialkyl/alkyl,fluoroalkyl)siloxane, however, the amount of poly(dialkyl/alkyl,fluoroalkyl)siloxane in the Si-PSA composition is 0.01% to ⁇ 3%, alternatively 0.5% to 2%, and alternatively 0.9% to 1.6%; based on combined weights of starting materials (A) to (G) in the Si-PSA composition (e.g., based on combined weights of all starting materials in the Si-PSA composition excluding solvent).
- Starting material (F) is an anchorage additive that may optionally be included in the Si-PSA composition.
- the anchorage additive will facilitate bonding to a substrate by a Si-PSA prepared by curing the Si-PSA composition described herein.
- the presence of the anchorage additive will not detrimentally affect the desired peel adhesion, thereby allowing the Si-PSA to be removed from an electronic device without damaging the device or leaving significant residue.
- Suitable anchorage additives include silane coupling agents such as methyltrimethoxysilane, vinyltrimethoxysilane, allyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, bis(trimethoxysilyl)propane, and bis(trimethoxysilylhexane; and mixtures or reaction mixtures of said silane coupling agents.
- silane coupling agents such as methyltrimethoxysilane, vinyltrimethoxysilane, allyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, bis(trimethoxysilyl
- the anchorage additive may be tetramethoxysilane, tetraethoxysilane, dimethyldimethoxysilane, methylphenyldimethoxysilane, methylphenyldiethoxysilane, phenyltrimethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, vinyltriethoxysilane, allyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, or 3-methacryloxypropyl trimethoxysilane.
- the anchorage additive may be exemplified by a reaction product of a vinyl alkoxysilane and an epoxy-functional alkoxysilane; a reaction product of a vinyl acetoxysilane and epoxy-functional alkoxysilane; and a combination (e.g., physical blend and/or a reaction product) of a polyorganosiloxane having at least one aliphatically unsaturated hydrocarbon group and at least one hydrolyzable group per molecule and an epoxy-functional alkoxysilane (e.g., a combination of a hydroxy-terminated, vinyl functional polydimethylsiloxane with glycidoxypropyltrimethoxysilane).
- a reaction product of a vinyl alkoxysilane and an epoxy-functional alkoxysilane e.g., physical blend and/or a reaction product
- a polyorganosiloxane having at least one aliphatically unsaturated hydrocarbon group and at least one hydroly
- Suitable anchorage additives and methods for their preparation are disclosed, for example, in U.S. Patent Application Publication Numbers 2003/0088042 , 2004/0254274 , 2005/0038188 , and 2012/0328863 at paragraph [0091], and U.S. Patent Publication 2017/0233612 at paragraph [0041]; and EP 0 556 023 .
- Anchorage additives are commercially available.
- SYL-OFF TM 297 and SYL-OFF TM 397 are available from Dow Silicones Corporation of Midland, Michigan, USA.
- Other exemplary anchorage additives include (F-1) vinyltriacetoxysilane, (F-2) glycidoxypropyltrimethoxysilane, (F-3) a combination of (F-1) and (F-2), and (F-4) a combination of (F-3) and a polydimethylsiloxane terminated with hydroxyl groups, methoxy groups, or terminated with both a hydroxy group and a methoxy group.
- the combinations (F-3) and (F-4) may be physical blends and/or reaction products.
- the amount of anchorage additive depends on various factors including the type of substrate to which the Si-PSA composition will be applied and whether a primer or other surface treatment will be used before application of the Si-PSA composition. However, the amount of anchorage additive may be 0 to 5%, alternatively 1% to 5%, alternatively 1% to 3%, and alternatively 1.9% to 2.1%, based on the combined weights of starting materials (A) to (G) in the Si-PSA composition (e.g., based on combined weights of all starting materials in the Si-PSA composition excluding solvent).
- Starting material (G) is a hydrosilylation reaction inhibitor (inhibitor) that may optionally be used for altering rate of reaction of the silicon bonded hydrogen atoms and the aliphatically unsaturated hydrocarbon groups of other starting materials in the Si-PSA composition, as compared to reaction rate of the same starting materials but with the inhibitor omitted.
- inhibitor hydrosilylation reaction inhibitor
- Inhibitors are exemplified by acetylenic alcohols such as methyl butynol, ethynyl cyclohexanol, dimethyl hexynol, and 3,5-dimethyl-1-hexyn-3-ol, 1-butyn-3-ol, 1-propyn-3-ol, 2-methyl-3-butyn-2-ol, 3-methyl-1-butyn-3-ol, 3-methyl-1-pentyn-3-ol, 3-phenyl-1-butyn-3-ol, 4-ethyl-1-octyn-3-ol, 3,5-dimethyl-1-hexyn-3-ol, and 1-ethynyl-1-cyclohexanol, and a combination thereof; cycloalkenylsiloxanes such as methylvinylcyclosiloxanes exemplified by 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclote
- the inhibitor may be a silylated acetylenic compound.
- a silylated acetylenic compound reduces yellowing of the reaction product prepared from hydrosilylation reaction as compared to a reaction product from hydrosilylation of starting materials that do not include a silylated acetylenic compound or that include an organic acetylenic alcohol inhibitor, such as those described above.
- the silylated acetylenic compound is exemplified by (3-methyl-1-butyn-3-oxy)trimethylsilane, ((1,1-dimethyl-2-propynyl)oxy)trimethylsilane, bis(3-methyl-1-butyn-3-oxy)dimethylsilane, bis(3-methyl-1-butyn-3-oxy)silanemethylvinylsilane, bis((1,1-dimethyl-2-propynyl)oxy)dimethylsilane, methyl(tris(1,1-dimethyl-2-propynyloxy))silane, methyl(tris(3-methyl-1-butyn-3-oxy))silane, (3-methyl-1-butyn-3-oxy)dimethylphenylsilane, (3-methyl-1-butyn-3-oxy)dimethylhexenylsilane, (3-methyl-1-butyn-3-oxy)triethylsilane, bis(3-methyl
- the silylated acetylenic compound is exemplified by methyl(tris(1,1-dimethyl-2-propynyloxy))silane, ((1,1-dimethyl-2-propynyl)oxy)trimethylsilane, or a combination thereof.
- the silylated acetylenic compound useful as the inhibitor herein may be prepared by methods known in the art, for example, U.S. Patent 6,677,740 discloses silylating an acetylenic alcohol described above by reacting it with a chlorosilane in the presence of an acid receptor.
- the amount of inhibitor added herein will depend on various factors including the desired reaction rate, the particular inhibitor used, and the selection and amount of starting materials (A) and (B). However, when present, the amount of inhibitor may range from > 0% to 1%, alternatively > 0% to 5%, alternatively 0.001% to 1%, alternatively 0.01% to 0.5%, and alternatively 0.002% to 0.25%, based on the combined weights of starting materials (A) to (G) in the Si-PSA composition (e.g., based on combined weights of all starting materials in the Si-PSA composition excluding solvent).
- the Si-PSA composition may further comprise starting material (H), a solvent.
- the solvent may be an organic solvent such as a hydrocarbon, a ketone, an ester acetate, an ether, and/or a cyclic siloxane having an average degree of polymerization from 3 to 10.
- Suitable hydrocarbons for the solvent can be (H-1) an aromatic hydrocarbon such as benzene, toluene, or xylene; (H-2) an aliphatic hydrocarbon such as hexane, heptane, octane, or iso-paraffin; or (H-3) a combination thereof.
- the solvent may be a glycol ether such as propylene glycol methyl ether, dipropylene glycol methyl ether, propylene glycol n-butyl ether.
- Suitable ketones include acetone, methyl ethyl ketone, or methyl isobutyl ketone.
- Suitable ester acetates include ethyl acetate or isobutyl acetate.
- Suitable ethers include diisopropyl ether or 1,4-dioxane.
- Suitable cyclic siloxanes having a degree of polymerization from 3 to 10, alternatively 3 to 6, include hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, and/or decamethylcyclopentasiloxane.
- the solvent may be selected from the group consisting of toluene, xylene, heptane, ethyl acetate, and a combination of two or more thereof.
- the amount of solvent will depend on various factors including the type of solvent selected and the amount and type of other starting materials selected for the Si-PSA composition. However, the amount of solvent may range from 0% to 90%, alternatively 0% to 60%, alternatively 20 to 50%, alternatively 0 to 50%, and alternatively 20% to 60%, based on combined weights of all starting materials in the Si-PSA composition.
- the solvent can be added during preparation of the Si-PSA composition, for example, to aid mixing and delivery. All or a portion of the solvent may be added with one of the other starting materials.
- the polyorganosilicate resin, the branched polyorganosiloxane polymer, and/or the catalyst may be dissolved in a solvent before combination with the other starting materials in the Si-PSA composition. All or a portion of the solvent may optionally be removed after the Si-PSA composition is prepared.
- the Si-PSA composition can be prepared by a method comprising combining all starting materials as described above by any convenient means such as mixing at ambient or elevated temperature.
- the hydrosilylation reaction inhibitor may be added before the hydrosilylation reaction catalyst, for example, when the Si-PSA composition will be prepared at elevated temperature and/or the Si-PSA composition will be prepared as a one part composition.
- the method may further comprise delivering one or more starting materials in a solvent (e.g., the hydrosilylation reaction catalyst, the polyorganosilicate resin, and/or the branched polyorganosiloxane polymer) may be dissolved in a solvent when combined with one or more of the other starting materials in the Si-PSA composition.
- a solvent e.g., the hydrosilylation reaction catalyst, the polyorganosilicate resin, and/or the branched polyorganosiloxane polymer
- the resulting Si-PSA composition will be solventless (i.e., will contain no solvent or may contain trace amounts of residual solvent from delivery of a starting material, however, a solvent e.g., organic solvent such as toluene or non-functional polydiorganosiloxane), then solvent may be removed after mixing two or more of the starting materials, and in this embodiment solvent is not intentionally added to the Si-PSA composition.
- solvent e.g., organic solvent such as toluene or non-functional polydiorganosiloxane
- the Si-PSA composition may be prepared as a multiple part composition, for example, when the Si-PSA composition will be stored for a long period of time before use, e.g., up to 6 hours before coating the Si-PSA composition on a substrate.
- the hydrosilylation reaction catalyst is stored in a separate part from any starting material having a silicon bonded hydrogen atom, for example the polyorganohydrogensiloxane, and the parts are combined shortly before use of the Si-PSA composition.
- a multiple part composition may be prepared by combining starting materials comprising at least some of the polydialkylsiloxane terminated with an aliphatically unsaturated group, the polyalkylhydrogensiloxane, and optionally one or more other additional starting materials described above to form a base part, by any convenient means such as mixing.
- a curing agent may be prepared by combining starting materials comprising at least some of the polydialkylsiloxane terminated with an aliphatically unsaturated group, the hydrosilylation reaction catalyst, and optionally one or more other additional starting materials described above by any convenient means such as mixing.
- the starting materials may be combined at ambient or elevated temperature.
- the hydrosilylation reaction inhibitor may be included in one or more of the base part, the curing agent part, or a separate additional part.
- the anchorage additive may be added to the base part, or may be added as a separate additional part.
- the siloxane selected from the group consisting of the polyorganosilicate resin, the branched polyorganosiloxane polymer, and a combination thereof may be added to the base part, the curing agent part, or a separate additional part.
- the branched polyorganosiloxane and/or the polyorganosilicate resin may be added to the base part.
- the solvent may be added to the base part.
- starting materials comprising the polyorganosilicate resin and/or the branched polyorganosiloxane, and some or all of the solvent may be added in a separate additional part.
- the weight ratio of amounts of base part to curing agent part may range from 1:1 to 10:1.
- the Si-PSA composition will cure via hydrosilylation reaction to form a Si-PSA.
- the method described above may further comprise one or more additional steps.
- the Si-PSA composition prepared as described above may be used to form an adhesive article, e.g., a Si-PSA (prepared by curing the Si-PSA composition described above) on a substrate.
- the method may, therefore, further comprise comprises applying the Si-PSA composition to a substrate.
- Applying the Si-PSA composition to the substrate can be performed by any convenient means.
- the Si-PSA composition may be applied onto a substrate by gravure coater, comma coater, offset coater, offset-gravure coater, roller coater, reverse-roller coater, air-knife coater, or curtain coater.
- the substrate can be any material that can withstand the curing conditions (described below) used to cure the pressure sensitive adhesive composition to form the pressure sensitive adhesive on the substrate.
- any substrate that can withstand heat treatment at a temperature equal to or greater than 120°C, alternatively 150°C is suitable.
- materials suitable for such substrates including polymeric films such as polyimide (PI), polyetheretherketone (PEEK), polyethylene naphthalate (PEN), liquid-crystal polyarylate, polyamideimide (PAI), polyether sulfide (PES), polyethylene terephthalate (PET), polycarbonate (PC), thermoplastic polyurethane (TPU), polyethylene (PE), or polypropylene (PP).
- the substrate may be glass.
- the thickness of the substrate is not critical, however, the thickness may be 5 ⁇ m to 300 ⁇ m, alternatively 50 ⁇ m to 250 ⁇ m, and alternatively 50 ⁇ m.
- the substrate may be selected from the group consisting of PET, TPU, PC, and glass.
- the substrate may be a polymeric substrate, such as PET.
- the method for forming the adhesive article may optionally further comprise treating the substrate before applying the Si-PSA composition. Treating the substrate may be performed by any convenient means, such as applying a primer, or subjecting the substrate to corona-discharge treatment, etching, or plasma treatment before applying the Si-PSA composition to the substrate.
- An adhesive article such as a film or tape may be prepared by applying the Si-PSA composition described above onto the substrate described above.
- the method may further comprise removing the all, or a portion, of the solvent before and/or during curing.
- Removing solvent may be performed by any convenient means, such as heating at a temperature that vaporizes the solvent without fully curing the Si-PSA composition, e.g., heating at a temperature of 70°C to 120°C, alternatively 50°C to 100°C, and alternatively 70°C to 80°C for a time sufficient to remove all or a portion of the solvent (e.g., 30 seconds to 1 hour, alternatively 1 minute to 5 minutes).
- Curing the Si-PSA composition may be performed by heating at a temperature of 80°C to 200°C, alternatively 90°C to 180°C, alternatively 100°C to 160°C, and alternatively 110°C to 150°C for a time sufficient to cure the Si-PSA composition (e.g., for 30 seconds to an hour, alternatively 1 to 5 minutes). If cure speed needs to be increased or the process oven temperatures lowered, the catalyst level can be increased. This forms a pressure sensitive adhesive on the substrate. Curing may be performed by placing the substrate in an oven.
- the amount of the Si-PSA composition to be applied to the substrate depends on the specific application, however, the amount may be sufficient such that after curing thickness of the pressure sensitive adhesive may be 5 ⁇ m to 100 ⁇ m, and for protective film the thickness may be 5 ⁇ m to 50 ⁇ m, alternatively 10 ⁇ m to 40 ⁇ m, and alternatively 15 ⁇ m to 40 ⁇ m.
- the method described herein may optionally further comprise applying a removable release liner to the Si-PSA opposite the substrate, e.g., to protect the Si-PSA before use of the adhesive article.
- the release liner may be applied before, during or after curing the Si-PSA composition; alternatively after curing.
- the adhesive article may be a protective film for use in a display device.
- Figure 1 shows a partial cross section of a protective film (100) overlying a surface (106a) of an anti-fingerprint coating (106) overlying a surface (107a) of a display cover glass (107) such that the opposing surface (106b) of the anti-fingerprint coating (106) contacts the surface (107a) of the cover glass (107).
- the protective film (100) includes a Si-PSA (105) having a surface (105a) and an opposing surface (105b).
- the opposing surface (105b) of the Si-PSA (105) adheres to the surface (106a) of the AF coating with a peel adhesion of > 30 g/in, as measured according to Reference Example C, below.
- the Si-PSA may have a thickness of 15 ⁇ m to 40 ⁇ m.
- the Si-PSA (105) is carried on a substrate (104) having a surface (104a) and an opposing surface (104b).
- the surface (105a) of the Si-PSA (105) contacts the opposing surface (104b) of the substrate (104).
- the substrate (104) may be selected from the group consisting of PET, TPU, PC, and glass and may have a thickness of 50 ⁇ m to 250 ⁇ m.
- the protective film (100) may further comprise an anti-fingerprint hard coating (103) having a surface (103a) and an opposing surface (103b) overlying the substrate (104) such that the opposing surface (103b) of the anti-fingerprint hard coating (103) contacts the surface (104a) of the substrate (104).
- an anti-fingerprint hard coating (103) having a surface (103a) and an opposing surface (103b) overlying the substrate (104) such that the opposing surface (103b) of the anti-fingerprint hard coating (103) contacts the surface (104a) of the substrate (104).
- the protective film (100) may further comprise a second Si-PSA (102) having a surface (102a) and an opposing surface (102b) and a polymeric substrate (101) having a surface (101b).
- the second Si-PSA (102) is coated on the polymeric substrate (101) such that the surface (102a) of the second Si-PSA (102) contacts the surface (101b) of the polymeric substrate (101).
- the opposing surface (102b) of the second Si-PSA (102) contacts the surface (103a) of the anti-fingerprint hard coating (103).
- the second Si-PSA (102) may have a thickness of 10 ⁇ m, and the polymeric substrate (101) may have a thickness of 50 ⁇ m.
- the second substrate (101) may be PET.
- the Si-PSA composition and method described above may be used in fabrication of the protective film (100).
- the Si-PSA composition may be applied to the opposing surface (104b) of the substrate (104) and cured to form the Si-PSA (105).
- the Si-PSA composition described herein may be applied to the surface (101b) of the polymeric substrate (101) and cured to form the second Si-PSA (102).
- adhesion on the surface (106a) of the anti-fingerprint coating (106) of > 30 g/in and adhesion on stainless steel ⁇ 800 g/in, as measured by the method described below in Reference Example C.
- Samples of Si-PSA compositions were prepared by combining the starting materials in the amounts (in weight parts) shown below in Table 2. First, a mixture and Resin 1 were blended. Then, a Crosslinker, an Anchorage Additive, a Fluorosilicone, a Solvent, and a Catalyst were mixed therewith. All the starting materials were mixed at room temperature.
- Each Si-PSA composition prepared as described above in Reference Example A was applied on PET film with a thickness of 100 ⁇ m and heating in an oven at 150°C for 2 minutes.
- the Si-PSA had a thickness of 30 ⁇ m to 35 ⁇ m after heating.
- the resulting tape samples were applied to substrates such that the Si-PSA contacted the substrate.
- the substrates were AF glass (glass with anti-fingerprint coating) and SUS (stainless steel), and samples kept at RT for 30 minutes after contacting the Si-PSA with the substrate before testing.
- Each tape sample prepared as described above was tested for adhesion to the AF glass and SUS substrates by peeling the tape from the substrate, and checking if there was any Si-PSA transferred onto the AF glass and SUS from the PET film.
- An Adhesion/Release Tester AR-1500 was used for this test.
- Table 3 Shows Weight % of Each Starting Material, Excluding Solvent, in the Samples shown in Table 2 Table3 Starting Material C1 W1 C2 W2 W3 C3 C4 C5 C6 C7 C8 Polymer 1A 24.8% 24.4% 24.6% 24.4% 24.2% 23.9% 24.3% 24.2% 24.2% 21.3% 27.8% Polymer 2A 4.0% 4.0% 4.0% 4.0% 3.9% 3.9% 3.9% 3.9% 0 0 Polymer 3A 0 0 0 0 0 0 0 0 0 10.5% 0 Crosslinker 1B 1.6% 1.5% 1.5% 1.5% 1.5% 1.5% 1.5% 1.6% 2.1% Crosslinker 2B 0 0 0 0 0 0 0.7% 0.9% Catalyst 1C 2.8% 2.8% 2.8% 2.7% 2.7% 2.7% 2.7% 2.7% 2.9% 3.8% Resin 1D 52.5% 51.7% 52.1% 51.6% 51.3% 50.5% 51.4% 51.3% 51.
- Conventional silicone pressure sensitive adhesives lack the combination of properties desired for protective films used on AF glass in display devices, such as high adhesion to anti-fingerprint coatings on glass and low adhesion to stainless steel.
- the peel adhesion should be > 30g/in on AF glass and ⁇ 700g/in on SUS. Selective adhesion to different substrates is a challenge for the Si-PSA industry. Conventional Si-PSAs may be able to meet one, but not both, of these peel adhesion criteria.
- the working examples above showed that Si-PSA compositions that cure to form Si-PSAs with > 30 g/in on AF glass and ⁇ 700 g/in on SUS were prepared.
- the working examples W1, W2, and W3 had peel adhesion on AF glass of 44 g/in, 33.7 g/in, and 35.6 g/in, respectively.
- the Si-PSA compositions described herein may cure to form Si-PSAs with peel adhesion on AF glass of > 30 g/in to 45 g/in.
- the working examples above further showed that Si-PSA compositions that cure to form Si-PSAs with ⁇ 700 g/in peel adhesion on SUS were prepared.
- working examples W1, W2, and W3 had peel adhesion on SUS of 570, 644, and 457, respectively.
- Si-PSA compositions described herein may cure to form Si-PSAs with peel adhesion on SUS of 450 g/in to ⁇ 700 g/in, alternatively 450 g/in to 650 g/in.
- Working Example 1 showed that when a poly(dialkyl/alkyl,fluoroalkyl)siloxane was added to a pressure sensitive adhesive composition (of C1), which did not contain a poly(dialkyl/alkyl,fluoroalkyl)siloxane), adhesion to stainless steel was reduced from 970 g/in to 570 g/in without significant decrease of peel adhesion on AF glass.
- Comparative Example 2 and Working Examples 2 and 3 also showed that when different amounts of a poly(dialkyl/alkyl,fluoroalkyl)siloxane was added to a pressure sensitive adhesive composition (of C2), adhesion to stainless steel was reduced from 889 g/inch to ⁇ 700 g/inch without a significant detrimental impact on adhesion to anti-fingerprint coated glass.
- Comparative Example 3 (C3) showed that when the content of the poly(dialkyl/alkyl,fluoroalkyl)siloxane was too high, then the Si-PSA had insufficient adhesion to AF glass for some applications.
- Comparative Examples 4 and 5 did not show the same benefit with different fluorosilicones (i.e., the fluorosilicones having aliphatically unsaturated groups tested in the compositions described above).
- Comparative Example 6 showed that the benefit of selective adhesion to AF glass and SUS was not achieved using a conventional release modifier, i.e., bis-trimethylsiloxy-terminated poly(dimethyl/methylphenyl)siloxane.
- Comparative Example 7 (C7) showed that when Resin/Polymer ratio was low, i.e., 1.9/1, adhesion to AF glass was too low for some applications.
- Comparative Example 8 (C8) showed that when the content of poly(dialkyl/alkyl,fluoroalkyl)siloxane was too low, then adhesion to SUS was not reduced sufficiently for some applications.
- the Si-PSA prepared by curing the Si-PSA composition described herein may find use in fabrication of various display devices such as mobile telephones, mobile television receivers, wireless devices, smartphones, personal data assistants, wireless electronic mail receivers, hand - held or portable computers, netbooks, notebooks, smartbooks, tablets, global positioning system receivers / navigators, cameras, digital media players, camcorders, game consoles, and electronic reading devices.
- the protective film comprising the Si-PSA on a surface of a substrate may be used on AF glass for the display devices described above.
- the selective adhesion to AF glass and SUS properties of the Si-PSA prepared from the Si-PSA composition described herein make the protective film suitable for use on 2.5D AF glass and 3D AF glass, which can be used in the display devices described above.
- DP degree of polymerization FTIR Fourier Transform Infra Red The concentration of silanol groups present in the polyorganosilicate resin may be determined using FTIR spectroscopy according to ASTM Standard E-168-16. g grams g/in grams per inch g/mol grams per mol GPC qel permeation chromatography kg kiloqram m meters Me methyl min minutes mm millimeters Mn number average molecular weight measured by GPC as disclosed in U.S. Patent 9,593,209 , Reference Example 1 at col. 31 mPa ⁇ s megaPascal seconds
- NMR Nuclear Magnetic Resonance the 29 Si NMR technique described in US Patent 9,509,209 , Reference Example 2 at col.
- PET polyethylene terephthalate Ph phenyl PSA pressure sensitive adhesive including but not limited to acrylic, rubber, and/or silicone pressure sensitive adhesives Si-PSA silicone pressure sensitive adhesive SUS stainless steel ⁇ m micrometers Vi vinyl
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Claims (15)
- Composition d'adhésif sensible à la pression à base de silicone comprenant :10 % en poids à 60 % en poids, en fonction des poids combinés de matériaux de départ (A) à (G), de (A) un polydialkylsiloxane se terminant par un groupe à insaturation aliphatique ;0,1 % en poids à 5 % en poids, en fonction des poids combinés de matériaux de départ (A) à (G), de (B) un polyalkylhydrogénosiloxane ;0,01 % en poids à 5 % en poids, en fonction des poids combinés de matériaux de départ (A) à (G), de (C) un catalyseur de réaction d'hydrosilylation ;5 % en poids à 75 % en poids, en fonction des poids combinés de matériaux de départ (A) à (G), de (D) un siloxane choisi dans le groupe constitué de(D-1) une résine polyorganosilicate,(D-2) un polymère polyorganosiloxane ramifié, et(D-3) une combinaison à la fois de (D-1) et de (D-2) ;à condition que les matériaux de départ (A) et (D) soient présents en des quantités suffisantes pour fournir un rapport (D)/(A) ≥ 2/1 ;≥ 0,65 % en poids à < 3 % en poids, en fonction des poids combinés de matériaux de départ (A) à (G), de (E) un poly(dialkyl/alkyl,fluoroalkyl)siloxane ;0,1 % en poids à 5 % en poids, en fonction des poids combinés des matériaux de départ (A) à (G), de (F) un additif d'ancrage ;0 % en poids à 5 % en poids, en fonction des poids combinés des matériaux de départ (A) à (G), de (G) un inhibiteur de réaction d'hydrosilylation ; et0 % en poids à 60 % en poids, en fonction des poids combinés de tous les matériaux de départ dans la composition, de (H) un solvant.
- Composition selon la revendication 1, où le matériau de départ (A), le polydialkylsiloxane se terminant par un groupe à insaturation aliphatique, a la formule unitaire (A-1) : (RM 2RUSiO1/2)2(RM 2SiO2/2)a où chaque RM est un groupe alkyle indépendamment choisi de 1 à 30 atomes de carbone ; chaque RU est un groupe hydrocarboné monovalent à insaturation aliphatique indépendamment choisi de 2 à 30 atomes de carbone ; et l'indice a a une valeur de 4 à 10 000.
- Composition selon la revendication 1 ou la revendication 2, où le matériau de départ (B), le polyalkylhydrogénosiloxane, a la formule unitaire (B-1) :
(RM 3SiO1/2)r(RM 2HSiO1/2)s(RM 2SiO2/2)t(RMHSiO2/2)u, où chaque RM est un groupe alkyle indépendamment choisi de 1 à 30 atomes de carbone ; l'indice r vaut 0, 1 ou 2 ; l'indice s vaut 0, 1 ou 2, à condition qu'une quantité (r + s) = 2 ; l'indice t ≥ 0, l'indice u > 0, à condition qu'une quantité (s + u) > 2, et qu'une quantité (r + s + t +u) vaille de 4 à 500. - Composition selon l'une quelconque des revendications 1 à 3, où le matériau de départ (C), le catalyseur de réaction d'hydrosilylation, comprend un complexe platine-organosiloxane.
- Composition selon l'une quelconque des revendications 1 à 4, où le matériau de départ (D-1), la résine polyorganosilicate, est présent à 4 % en poids jusqu'à 74 % en poids en fonction des poids combinés des matériaux de départ (A) à (G), et le matériau de départ (D-1) comprend la formule unitaire (D-1-1) :
(RM 3SiO1/2)m(RM 2RMSiO1/2)n(SiO4/2)o, où chaque RM est un groupe alkyle indépendamment choisi de 1 à 30 atomes de carbone ; chaque RU est un groupe hydrocarboné monovalent à insaturation aliphatique indépendamment choisi de 2 à 30 atomes de carbone ; et les indices m, n et o ont des valeurs de telle sorte que m > 0, n ≥ 0, o > 1, à condition qu'une quantité (m + n + o) ait une valeur suffisante pour fournir à la résine polyorganosilicate une masse moléculaire moyenne en nombre de 1000 g/mol à 30 000 g/mol. - Composition selon l'une quelconque des revendications 1 à 5, où le matériau de départ (D-2), le polymère polyorganosiloxane ramifié, est présent à 1 % en poids jusqu'à 10 % en poids, en fonction des poids combinés des matériaux de départ (A) à (G), et le matériau de départ (D-2) comprend la formule unitaire (D-2-1) : (RM 3SiO1/2)b(RM 2RUSiO1/2)c(RM 2SiO2/2)d(SiO4/2)e, où chaque RM est un groupe alkyle indépendamment choisi de 1 à 30 atomes de carbone ; chaque RU est un groupe hydrocarboné monovalent à insaturation aliphatique indépendamment choisi de 2 à 30 atomes de carbone ; et les indices b, c, d et e ont les valeurs suivantes b ≥ 0, c ≥ 0, une quantité (b + c) ≥ 4, d vaut de 0 à 995, et e ≥ 1.
- Composition selon l'une quelconque des revendications 1 à 6, où le matériau de départ (E), le poly (dialkyl/alkyl,fluoroalkyl)siloxane, a la formule unitaire (E-1) :
(RM 3SiO1/2)2(RMRFSiO2/2)f(RM 2SiO2/2)g, où chaque RM est un groupe alkyle indépendamment choisi de 1 à 30 atomes de carbone ; chaque RF est un groupe alkyle fluoré monovalent indépendamment choisi de 1 à 30 atomes de carbone ; l'indice f > 0, l'indice g > 0, à condition qu'une quantité (f + g) soit de 100 à 10 000. - Composition selon l'une quelconque des revendications 1 à 7, où chaque RM est méthyle et chaque RU est indépendamment choisi dans le groupe constitué de vinyle, allyle et hexényle.
- Composition selon l'une quelconque des revendications 1 à 8, où le matériau de départ (F), l'additif d'ancrage, est choisi dans le groupe constitué de (F-1) vinyltriacétoxysilane, (F-2) glycidoxypropyltriméthoxysilane, (F-3) une combinaison de (F-1) et de (F-2), et (F-4) une combinaison de (F-3) et d'un polydiméthylsiloxane se terminant par des groupes hydroxyle, des groupes méthoxy, ou se terminant à la fois par un groupe hydroxy et par un groupe méthoxy.
- Composition selon l'une quelconque des revendications 1 à 9, où le matériau de départ (G), l'inhibiteur de réaction d'hydrosilylation, est présent et est choisi dans le groupe constitué de 1-éthynyl-1-cyclohexanol, méthylbutynol, et maléate de diallyle.
- Composition selon l'une quelconque des revendications 1 à 10, où le matériau de départ (H), le solvant, est présent et est choisi dans le groupe constitué de toluène, xylène, heptane, éthylacétate, et une combinaison de deux de ceux-ci ou plus.
- Adhésif sensible à la pression à base de silicone préparé par durcissement de la composition selon l'une quelconque des revendications précédentes.
- Film protecteur comprenant :1) l'adhésif sensible à la pression à base de silicone selon la revendication 12,2) un substrat ayant une surface, où l'adhésif sensible à la pression à base de silicone est revêtu sur la surface du substrat.
- Procédé permettant de préparer un film protecteur comprenant :facultativement 1) le traitement d'une surface d'un substrat,2) le revêtement de la composition d'adhésif sensible à la pression à base de silicone selon l'une quelconque des revendications 1 à 11 sur la surface du substrat,facultativement 3) l'élimination d'une partie ou de la totalité du solvant, lorsqu'il est présent, et4) le durcissement de la composition d'adhésif sensible à la pression.
- Utilisation du film protecteur selon la revendication 13 ou du film protecteur préparé par le procédé selon la revendication 14 sur un revêtement anti-traces de doigts pour un verre d'affichage.
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JP7343721B2 (ja) | 2021-04-27 | 2023-09-12 | ダウ シリコーンズ コーポレーション | ラジカル硬化シリコーン感圧接着剤及び組成物、並びにその調製方法及びフレキシブルディスプレイデバイスにおける使用方法 |
US20240228848A9 (en) * | 2021-05-26 | 2024-07-11 | Dow Silicones Corporation | Silicone pressure sensitive adhesive composition containing a fluorosilicone additive and methods for the preparation and use thereof |
WO2022261858A1 (fr) * | 2021-06-16 | 2022-12-22 | Dow Silicones Corporation | Composition adhésive sensible à la pression à base de silicone contenant un agent de réticulation polyorganohydrogénosiloxane fluoré et procédés de préparation et d'utilisation de ladite composition |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4889753A (en) * | 1986-06-04 | 1989-12-26 | Dow Corning Corporation | Pressure sensitive adhesive release liner and fluorosilicone compounds, compositions and method therefor |
US4736048A (en) * | 1986-06-04 | 1988-04-05 | Dow Corning Corporation | Pressure sensitive adhesive release liner and fluorosilicone compounds, compositions and method therefor |
TW203094B (fr) * | 1992-01-21 | 1993-04-01 | Gen Electric | |
US6545086B1 (en) * | 2001-10-01 | 2003-04-08 | Dow Corning Corporation | Silicone pressure sensitive adhesive compositions |
US20050038188A1 (en) * | 2003-08-14 | 2005-02-17 | Dongchan Ahn | Silicones having improved chemical resistance and curable silicone compositions having improved migration resistance |
US20050113513A1 (en) * | 2003-11-25 | 2005-05-26 | Grisworld Roy M. | Curable silicone pressure adhesive coating compositions |
CN101177595A (zh) * | 2007-12-13 | 2008-05-14 | 同济大学 | 纳米mq硅树脂增强的湿固化有机硅压敏胶及其制备方法 |
JP2011012092A (ja) | 2009-06-30 | 2011-01-20 | Dow Corning Toray Co Ltd | 付加反応硬化型シリコーン感圧接着剤組成物、それを用いた感圧接着フィルムおよび感圧接着フィルムの製造方法 |
JP5343911B2 (ja) * | 2010-04-09 | 2013-11-13 | 信越化学工業株式会社 | 無溶剤型シリコーン粘着剤用離型剤組成物及び剥離シート |
EP2588550A1 (fr) * | 2010-06-30 | 2013-05-08 | 3M Innovative Properties Company | Composition de revêtement de polysiloxane durcissable |
JP5925201B2 (ja) * | 2010-06-30 | 2016-05-25 | スリーエム イノベイティブ プロパティズ カンパニー | 二重反応性シラン官能基を含むオンデマンド型硬化性組成物 |
JP5234064B2 (ja) | 2010-08-23 | 2013-07-10 | 信越化学工業株式会社 | 無溶剤型付加型シリコーン粘着剤組成物及び粘着性物品 |
WO2012166870A1 (fr) | 2011-06-02 | 2012-12-06 | Dow Corning Corporation | Adhésif sensible à la pression en film épais et structure stratifiée faite de celui-ci |
JP2014077117A (ja) * | 2012-09-21 | 2014-05-01 | Dow Corning Toray Co Ltd | 高屈折性表面処理剤、それを用いて表面処理された微細部材および光学材料 |
JP6275945B2 (ja) * | 2012-12-10 | 2018-02-07 | 日東電工株式会社 | 両面粘着剤付き光学フィルム、およびそれを用いた画像表示装置の製造方法 |
JP6168002B2 (ja) * | 2014-02-27 | 2017-07-26 | 信越化学工業株式会社 | 基材密着性に優れるシリコーン粘着剤組成物及び粘着性物品 |
JP6569105B2 (ja) | 2014-07-10 | 2019-09-04 | ダウ・東レ株式会社 | 剥離コントロール剤、それを含むシリコーン剥離剤組成物、剥離シート、及び積層体 |
TWI663236B (zh) * | 2014-10-16 | 2019-06-21 | Dow Silicones Corporation | 聚矽氧組合物及具有由該組合物製得之壓敏性黏著層的壓敏性黏著膜 |
US20160329562A1 (en) | 2014-12-16 | 2016-11-10 | Sanyo Electric Co., Ltd. | Negative electrode active material for nonaqueous electrolyte secondary batteries and nonaqueous electrolyte secondary battery containing negative electrode active material |
JP6440851B2 (ja) * | 2015-01-20 | 2018-12-19 | ダウ シリコーンズ コーポレーション | シリコーン感圧接着剤 |
KR102209169B1 (ko) | 2017-01-17 | 2021-02-02 | 다우 (상하이) 홀딩 캄파니, 리미티드 | 실리콘 감압 접착제를 제조하기 위한 방법 |
WO2019009175A1 (fr) | 2017-07-07 | 2019-01-10 | 東レ・ダウコーニング株式会社 | Composition d'organopolysiloxane pour former une couche auto-adhésive et son utilisation |
-
2019
- 2019-07-03 EP EP19935967.0A patent/EP3994225B1/fr active Active
- 2019-07-03 US US17/604,563 patent/US20220177755A1/en active Pending
- 2019-07-03 JP JP2021577523A patent/JP7323653B2/ja active Active
- 2019-07-03 KR KR1020227003477A patent/KR102669320B1/ko active IP Right Grant
- 2019-07-03 WO PCT/CN2019/094506 patent/WO2021000280A1/fr unknown
- 2019-07-03 CN CN201980098014.2A patent/CN114026193B/zh active Active
Also Published As
Publication number | Publication date |
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EP3994225A4 (fr) | 2023-04-05 |
CN114026193B (zh) | 2023-03-28 |
EP3994225A1 (fr) | 2022-05-11 |
CN114026193A (zh) | 2022-02-08 |
JP2022544897A (ja) | 2022-10-24 |
WO2021000280A1 (fr) | 2021-01-07 |
US20220177755A1 (en) | 2022-06-09 |
JP7323653B2 (ja) | 2023-08-08 |
KR102669320B1 (ko) | 2024-05-28 |
KR20220031653A (ko) | 2022-03-11 |
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