EP3958066A1 - Herstellungsverfahren einer thermokompensierten keramischen spiralfeder - Google Patents
Herstellungsverfahren einer thermokompensierten keramischen spiralfeder Download PDFInfo
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- EP3958066A1 EP3958066A1 EP21194853.4A EP21194853A EP3958066A1 EP 3958066 A1 EP3958066 A1 EP 3958066A1 EP 21194853 A EP21194853 A EP 21194853A EP 3958066 A1 EP3958066 A1 EP 3958066A1
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- European Patent Office
- Prior art keywords
- stiffness
- core
- coating
- spiral spring
- coefficient
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 239000000919 ceramic Substances 0.000 title description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 83
- 238000000576 coating method Methods 0.000 claims abstract description 83
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 67
- 238000000034 method Methods 0.000 claims abstract description 47
- 229910010293 ceramic material Inorganic materials 0.000 claims abstract description 39
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 30
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 27
- 239000010703 silicon Substances 0.000 claims abstract description 27
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 20
- 238000007254 oxidation reaction Methods 0.000 claims description 16
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 230000003647 oxidation Effects 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000007800 oxidant agent Substances 0.000 claims description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 3
- 238000004088 simulation Methods 0.000 claims description 3
- 230000001419 dependent effect Effects 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 17
- 239000010410 layer Substances 0.000 description 14
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 14
- 239000000203 mixture Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- 239000002131 composite material Substances 0.000 description 9
- 229910052581 Si3N4 Inorganic materials 0.000 description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000001000 micrograph Methods 0.000 description 6
- 229910003564 SiAlON Inorganic materials 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000007792 addition Methods 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 238000004626 scanning electron microscopy Methods 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
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- 239000000835 fiber Substances 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910003465 moissanite Inorganic materials 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 229910000942 Elinvar Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910003849 O-Si Inorganic materials 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910003872 O—Si Inorganic materials 0.000 description 1
- 229910018543 Si 3 N 4 Si 2 N 2 O Inorganic materials 0.000 description 1
- KFVPJMZRRXCXAO-UHFFFAOYSA-N [He].[O] Chemical compound [He].[O] KFVPJMZRRXCXAO-UHFFFAOYSA-N 0.000 description 1
- OLBVUFHMDRJKTK-UHFFFAOYSA-N [N].[O] Chemical compound [N].[O] OLBVUFHMDRJKTK-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
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- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- -1 aluminum nitrides Chemical class 0.000 description 1
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
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- 238000000227 grinding Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/20—Compensation of mechanisms for stabilising frequency
- G04B17/22—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
- G04B17/066—Manufacture of the spiral spring
Definitions
- the present invention relates to a heat-compensated spiral spring intended to equip a balance-spring resonator of a clock movement or other precision instrument.
- the invention also relates to a balance-hairspring resonator comprising the hairspring and a balance wheel and a method for adjusting the hairspring.
- the regulating organ of mechanical watches is conventionally composed of an inertia flywheel, called a balance wheel, and a spiral-shaped spring, called a hairspring or spiral spring, fixed by one end to the axis of the balance wheel and by the other end on a bridge, called cock, in which pivots the axis of the pendulum.
- a spiral-shaped spring called a hairspring or spiral spring
- the movements of mechanical watches is an elastic metallic blade of rectangular section wound on itself in the shape of an Archimedean spiral and comprising 12 to 15 turns.
- the balance-spring oscillates around its equilibrium position (or dead point). When the balance wheel leaves this position, it winds the hairspring. This creates a restoring torque which, when the pendulum is released, causes it to return to its equilibrium position. As it has acquired a certain speed, therefore a kinetic energy, it exceeds its dead point until the opposing torque of the hairspring stops it and forces it to turn in the other direction. Thus, the hairspring regulates the period of oscillation of the balance wheel.
- the precision of mechanical watches therefore depends on the stability of the fundamental natural frequency f o of the resonator formed by the balance-spring.
- ⁇ k S / ks is the variation of the stiffness of the spiral spring with respect to its nominal stiffness
- ⁇ J B / J B is the variation of the inertia of the balance with respect to its nominal inertia, which makes it possible to introduce for the thermal disturbances
- ⁇ s the linear thermoelastic coefficient of the spiral spring ⁇ S the linear expansion coefficient of the spiral spring
- ⁇ B the linear expansion coefficient of the balance wheel.
- the stiffness ks of a spiral spring must be as constant as possible, whatever, in particular, the temperature and the magnetic field.
- the thermal compensation of the mechanical oscillator is obtained by adjusting the thermoelastic coefficient ⁇ s of the hairspring as a function of the coefficients of thermal expansion of the hairspring ⁇ S and of the balance wheel ⁇ B , according to equation 5.
- the document EP1422436 describes a spiral spring cut from a ⁇ 001 ⁇ monocrystalline silicon wafer.
- the hairspring comprises a layer of SiO 2 , having a thermoelastic coefficient opposite to that of silicon and formed around the external surface of the hairspring, in order to minimize the thermal drift of the balance-hairspring assembly.
- the layer of silicon dioxide also allows an improvement in the mechanical properties of the silicon substrate.
- thermoelastic coefficient of silicon is strongly influenced by temperature and compensation for this effect is necessary for its use in watchmaking applications. Indeed, the thermoelastic coefficient of silicon is of the order of -60 ⁇ 10 -6 /°C and the thermal drift of a silicon spiral spring is thus about 2 minutes/day, for a temperature variation of 23°C +/-15°C. It makes it incompatible with watchmaking requirements which are of the order of 0.6 seconds/day/°C in the temperature range between 8°C and 38°C.
- the document EP2590325 describes a spiral spring whose ceramic body of the borosilicate glass or silicon carbide type is coated with a layer of SiO 2 , so that the resonator thus formed has an almost zero frequency variation as a function of temperature.
- the SiO 2 coating ensures quasi independence of the temperature on the Young's modulus of the material of the body of the resonator.
- the invention relates to the selection of ceramic materials comprising the element silicon in their formulation for horological applications.
- the invention relates to a spiral spring intended to equip a balance-spring resonator of a watch movement or other precision instrument, the spiral spring comprising a core made of a ceramic material containing the element silicon in its formulation and comprising a section, the web having a first stiffness and a first thermoelastic coefficient; and a coating of silicon dioxide of thickness and at least partially covering the core, the coating having a second stiffness and a second thermoelastic coefficient of opposite sign to the first thermoelastic coefficient; the section of the core and the thickness of the coating being independently adjustable so as to obtain (i) a thermoelastic coefficient of the spiral spring as a function of the first thermoelastic coefficient and of the second thermoelastic coefficient, and (ii) a stiffness of the spiral spring in function of the first stiffness and the second stiffness.
- the invention also relates to a balance-spring oscillator comprising the balance spring having a linear expansion coefficient of the balance spring, and a balance having a linear expansion coefficient of the balance; the section of the core and the thickness of the coating being adjusted so that the combination of the second thermoelastic coefficient and from the first thermoelastic coefficient results in a thermoelastic coefficient of the spiral spring compensating for a value corresponding to the difference between three times the linear expansion coefficient of the spiral spring and twice the linear expansion coefficient of the balance wheel; the cross-section of the core and the thickness of the coating also being adjusted so that the combination of the first stiffness and the second stiffness gives a stiffness of the spiral spring making it possible to obtain the fundamental natural setpoint frequency of the balance resonator- spiral.
- the spiral spring as well as the balance-spring resonator of the invention exhibit an invariance of the expansion and elasticity properties in a defined range of temperatures comprised, according to the COSC (Swiss Official Chronometer Testing Institute), between 8°C and 38°C. Such a resonator is also insensitive to external magnetic fields.
- the adjustment method makes it possible to adjust the section of the core and the thickness of the coating independently so as to obtain a desired value of the thermoelastic coefficient of the spiral spring and a desired value of the stiffness of the spiral spring.
- the ceramic material containing the silicon element in its formulation is advantageous in horological applications due to its mechanical properties of use and, in particular, to its toughness which is much greater than that of silicon. All of the expected properties being supported by prior performance of aging tests under controlled temperature and atmosphere.
- the figure 1 shows a top view of a spiral spring 1 and the figures 2a and 2b show a view in longitudinal and transverse section of the spiral spring 1 according to the invention.
- the spiral spring 1 comprises a core 2 formed in a ceramic material containing the element silicon in its composition (hereafter ceramic material) and a coating 4 of silicon dioxide covering at least partially the outer surface 3 of core 2.
- ceramic material containing the element silicon in its composition
- coating 4 of silicon dioxide covering at least partially the outer surface 3 of core 2.
- the coating 4 corresponds to a layer deposited superficially on the core, or body.
- the core has a helical shape and comprises at least one turn of rectangular section of thickness w and height h.
- the geometry of the core can be other than that illustrated in this example, for example, the core can have a circular cross section, or polygonal, or other.
- the spiral spring 1 can be seen as being formed of a composite structure of the "sandwich" type consisting of a central part, the core 2, and the coating 4 (see figure 2b ).
- Core 2 made of ceramic material has a first thermoelastic coefficient ⁇ A and a first stiffness k A .
- the SiO 2 coating has a second thermoelastic coefficient ⁇ R of opposite sign to the first thermoelastic coefficient ⁇ A , and a second stiffness k R .
- the most common ceramic materials with dielectric properties include aluminas (Al 2 O 3 ), aluminum nitrides (AIN), beryllium oxide (BeO), quartz, silicon nitride (Si 3 N 4 ), silicon aluminum oxynitride (SiAlON).
- the ceramic material comprises silicon nitride, silicon carbide, or silicon oxynitride. More particularly, the ceramic material may comprise one or a combination of the compounds: silicon nitride (Si 3 N 4 ), SiC or silicon and aluminum oxynitride (SiAlON), which comprise the element silicon in their composition.
- the ceramic material comprises at least one of the following composite structures: Si 3 N 4 -SiC, Si 3 N 4 -TiCN, Si 3 N 4 -SiAlON, Si 3 N 4 -AlN, Si 3 N 4 -Al 2 O 3 , Si 3 N 4 -ZrO 2 , SiC-SiAlON, Si-SiC, SiC-Si 3 N 4 -Si 2 N 2 O or SiAlON-TiN, or a composite comprising at least one of these compounds.
- the ceramic material can also comprise a composite of fiber type such as SiC fibers dispersed in a ceramic matrix (SiC for example) of SiC (composite SiC - SiC), or even a composite of acicular structure (example ⁇ Si 3 N 4 ) in a matrix of equiaxed structure (for example ⁇ Si 3 N 4 ) (composite Si 3 N 4 - Si 3 N 4 ).
- the ceramic material comprises at least one of the following composite structures: Si 3 N 4 -SiAlON or ⁇ -Si 3 N 4 - ⁇ -Si 3 N 4 .
- Table I reports values of density, open porosity, Young's modulus, maximum bending stress, Weibull's modulus, toughness and thermal conductivity for Si3N4, SiC and SiAlON. Table I - Characteristics If 3 N 4 SiC SiAlON Density 3.2 3.10 3.25 Open porosity (%) 0 ⁇ 3 0 to 5 Young's modulus (GPa) 300 410 300 Maximum bending stress (MPa) 750 (3 point tests) 410 (4 point tests) 450 Weibull modulus 15 10 ⁇ 10 Tenacity (MPa ⁇ m ) 6.5 3.2 ⁇ 4 Thermal conductivity (W/mK) at 20°C 22 110 20
- Examples of the ceramic material in the bulk state include Si 3 N 4 , supplied by the company HC STARCK CERAMICS under the reference SSN Star Ceram TM N700, or by the company UMICORE under the reference FRIALIT HP79; the SiC supplied by the company ESK CERAMICS for the SiC, under the reference EKASIC TM F SiC 100; and SiAlON by the company KENNAMETAL for SiAlON under the reference TK4. Table I compares the properties of these materials in the bulk state.
- the ceramic material has good properties both at room temperature and at high temperature. Such ceramic materials are conventionally used as constituent materials of motors, bearings, gas turbine elements, in particular because of their good thermal resistance, their low thermal expansion, their good mechanical properties and their good resistance to heat. the corrosion. Mention may also be made of their use in the semiconductor industry, for example for silicon nitride masks.
- the ceramic material is advantageous for horological applications since it has a low density and a linear expansion coefficient of the same order of magnitude as that of silicon. It also has a Young's modulus which is double or even triple that of silicon, a resistance to bending, a toughness much greater than that of silicon, as well as insensitivity to magnetic fields.
- the monolithic ceramic material is also advantageous due to its refractory properties and its good resistance to dry and wet corrosion.
- the production of the ceramic material can be carried out using a sintering process or any other suitable process. Unlike the manufacture of a spiral spring in silicon which requires its production from a machined plate of the "wafer" type, the core 2 in the ceramic material can be machined from any block in the ceramic material. so as to obtain a thickness (for example 150 ⁇ m) corresponding substantially to the desired height of the spiral spring 1.
- Preliminary machining of plates from industrial blocks can be carried out by cutting, grinding, lapping and then mechanical or chemical polishing. The machining itself can be done using a wet or dry etching process. For example, the machining can be carried out using a reactive ion etching process such as the DRIE (Deep Reaction Ion Etching) process.
- the DRIE process promotes deep engraving and good precision on the engraved shapes. It also promotes the formation of vertical walls on the core 2 thus etched.
- a pulsed laser beam with a diameter between 10 microns and 30 microns can be used.
- the thickness t R of the coating 4 can be adjusted so as to obtain a desired value of the thermoelastic coefficient of the spiral spring ⁇ s. Indeed, the thermoelastic coefficient of the spiral spring ⁇ s depends on the combination of the first thermoelastic coefficient ⁇ A and the second thermoelastic coefficient ⁇ R and can therefore be modified by modifying the thickness t R of the coating 4.
- the section of the core 2 can be adjusted so as to obtain a desired value for the stiffness of the spiral spring ks.
- the stiffness of the spiral spring ks is determined by a combination of the stiffness of the web k A and the stiffness of the coating k R .
- the section of the core 2 as well as the thickness t R of the coating 4 can be adjusted independently in order to modify independently the value of the stiffness of the spiral spring ks and the value of the thermoelastic coefficient of the spiral spring ⁇ s.
- the thickness of coating 4 will be between 0.1 ⁇ m and 10 ⁇ m, and preferably between 1 ⁇ m and 6 ⁇ m, or even more preferably between 2 ⁇ m and 5 ⁇ m.
- the invention also relates to the adjustment of the spiral spring 1 so as to adjust the stiffness ks of the spiral spring 1 and the minimization of the variations of the properties of expansion and elasticity of the spiral spring 1 so as to minimize the thermal variations of the spiral spring 1 .
- the adjustment of the section of the core 2 is carried out before the step of forming a coating of silicon dioxide.
- the section of the core 2 can be adjusted by removing material from the periphery of the core.
- the removal of the material on the core 2 formed of the ceramic material is carried out by means of an isotropic chemical attack of the core 2.
- the removal of the material can be carried out by an attack in a hot solution of phosphoric acid with or without nitric acid and water, to adjust the thickness of the silicon nitride core.
- the predetermined value of the first stiffness k A corresponds to the value that the first stiffness k A of the core 2 (without the coating) must have allowing the spiral spring 1 (the core with the coating) to have a desired value for the stiffness ks of the spiral spring 1.
- the stiffness ks of the spiral spring 1 corresponds to a combination of the first stiffness k A and the second stiffness k R .
- the predetermined value of the first stiffness k A can be calculated as a function of the second stiffness k R , which depends on the thickness t R of the coating 4 and on the desired value of the stiffness ks of the spiral spring 1.
- the calculation of the predetermined value of the first stiffness k A can be achieved using numerical simulations using finite elements depending on the desired stiffness of the spiral spring ks.
- the method comprises a step of measuring a first measured stiffness k Am , and a step of comparing the first measured stiffness k Am with a predetermined (desired) value of the first stiffness k A .
- the quantity of material to be removed for the adjustment of the section of the core 2 so as to obtain the predetermined value of the first stiffness k A can then be determined from the difference between the first measured stiffness k Am and the predetermined value of the first stiffness k A .
- Equation 4 The relationship between the first stiffness k A and the quantity of material to be removed is given by equation 4 in which the stiffness of the spiral spring ks is replaced by the first stiffness k A of the core 2 and where E is the Young's modulus of the core, w, h and L respectively the thickness, the height and the length of the soul 2.
- the measurement of the first stiffness k A can be carried out alternately with the step of adjusting the section of the web 2.
- the measurement of the first stiffness k Am can be carried out simultaneously with the step of adjusting of web section 2.
- the adjustment of the section of the core 2 includes a removal of material corresponding to a thickness of approximately 0.1 ⁇ m to 3 ⁇ m at the periphery of the core 2.
- the formation of the silicon dioxide coating 4 is carried out at least on a portion of the core 2.
- the coating 4 can cover all the faces 3 of the core 2, or only certain faces 3 of the core 2
- the coating 4 may cover only the three free faces of the core 2 but not the face integral with the substrate.
- the thickness t R of the coating 4 is determined so as to obtain a predetermined value of the second thermoelastic coefficient ⁇ R of the coating 4.
- the growth of the coating 4 in silicon dioxide can be carried out by thermo-oxidation in the presence of oxidizing agents or by rapid thermo-oxidation at temperatures between 800° C. and 1600° C., and preferably at temperatures between 1000°C and 1200°C.
- Oxidizing agents can include oxygen and/or water vapor (wet thermo-oxidation). Oxidizing agents may also include, for example and without being exhaustive, ozone, oxygen-nitrogen mixtures, or oxygen-helium.
- the growth of the silicon oxide layer can also be carried out by plasma oxidation at low temperature (between 300° C. and 600° C. and preferably between 400° C. and 500° C.) using an oxygen plasma.
- the core 2 can be placed in the anodic position so as to avoid sputtering effects in the oxide layer.
- the core 2 can be brought into contact with an oxygen plasma generated by a radiofrequency source, or by a microwave source, both positioned a few centimeters from the core 2.
- the surface of the soul 2 is mainly subjected to ionized species of the plasma (ions, electrons).
- a cathode is located several tens of centimeters from the core to be oxidized. It is also possible to produce the silicon oxide layer by plasma-enhanced chemical vapor deposition (PECVD) with a thickness varying between 0.2 and 10 micrometers and, preferably, between 2 and 5 micrometers. .
- PECVD plasma-enhanced chemical vapor deposition
- the partially covalent chemical bonds of the silicon-based ceramics comprising a silicon nitride, carbide or oxynitride promote the continuity of the structures at the interface between the ceramic material and the SiO 2 layer.
- the composition and the structure of the coating 4 of silicon dioxide depend on the production method of the monolithic ceramic material.
- the ceramic material comprises silicon nitride produced by solid phase sintering under hot isostatic pressure (HIP SN) or by chemical vapor deposition (CVD) technology, the two processes being carried out without adding material , the coating 4 essentially contains amorphous SiO 2 without disturbing the texture of the ceramic material.
- the coating 4 comprises compounds dispersed in the silica coating and the compound Si 2 N 2 O at the interface between the ceramic and the silica coating (for example the compound Y 2 Si 2 O 7 in the case of addition of Y 2 O 3 ).
- the oxidation reaction forming coating 4 can be expressed by equations 6 and 7: Yes 3 NOT 4 + 3 / 4 O 2 ⁇ 3 / 2 Yes 2 NOT 2 O + 1 / 2 NOT 2 Yes 3 NOT 4 + SiO 2 ⁇ 2 Yes 2 NOT 2 O + NOT 2
- the gaseous products of these reactions cause the formation of porosities (bubbles) in the coating 4.
- composition of the surface layer of the ceramic core 2 is also modified by different mechanisms of cationic diffusion of the elements of the additions.
- the presence of the silicon element in the substrate of ceramic material constituting the core 2 of the spiral spring 1 allows good adhesion of the coating 4 to the ceramic substrate. This good adhesion is due to a continuity on the atomic scale between the substrate and the coating 4 in an accommodation zone (also known according to the English expression "terrace region") of a few atomic distances from the surface of the substrate.
- the ceramic material containing the silicon element in its composition preferably has a resistivity which is typically very high (>10 12 ⁇ .m) and therefore can be considered as a dielectric material.
- a resistivity typically very high (>10 12 ⁇ .m) and therefore can be considered as a dielectric material.
- the figure 4a and 4b relate to micrographs obtained by scanning electron microscopy, showing a sectional view of the spiral spring 1 comprising the core 2 in the ceramic material and the coating 4 in silicon dioxide formed by the thermal oxidation process in air at 1200°C during two hours ( figure 4a ), and by the low temperature plasma oxidation process using an oxygen plasma ( figure 4b ), under conditions favoring the passive oxidation of the ceramic material.
- a coating protecting the coating 4 during the metallographic cutting operation is also visible to the figure 4a and 4b .
- the figure 5 and 6 show micrographs, obtained by scanning electron microscopy, of a section of the spiral spring comprising the coating 4 of silicon dioxide according to a view at an enlargement of ⁇ 5000 ( figure 5 ), at ⁇ 18000 magnification ( figure 6 ). Coating 4 is formed by a low temperature plasma oxidation process.
- the figure 7 shows another micrograph, also obtained by scanning electron microscopy, of a section of the spiral spring in which good adhesion between the core and the silicon dioxide coating can be seen, even in the areas with granular tearing (a such an area is represented on the figure 7 by number 8).
- the thickness of the silicon oxide layer can be estimated using parameters such as oxidation time; the degree of humidity and the temperature. Indeed, the kinetic laws of growth of the layers of oxides are known (parabolic laws, arctangent laws, or linear functions).
- the method comprises a step of reducing the thickness of the coating 4.
- This step in which a fraction of the thickness of the coating 4 is removed by chemical attack, makes it possible to adjust the stiffness ks more finely. of the spiral spring 1.
- This step which is carried out after the step of forming the silicon dioxide coating 4 on the core 2, also makes it possible to make a fine adjustment of the predetermined value of the second thermoelastic coefficient ⁇ R .
- An important aspect of the method of the invention is that the obtaining of the predetermined value of the first stiffness k A can be carried out in a single step.
- the adjustment of the section of the core by the removal of the material is typically carried out using a first step of growth of an oxide layer on the core and a second step of etching the oxide layer.
- the growth of the oxide layer takes place largely at the detriment of the silicon substrate, typically in a portion corresponding to approximately 44% of the total thickness of the layer.
- This two-step adjustment process is necessary to control the silicon removal with sufficient precision.
- the removal of the material from the core 2 of the invention in ceramic material can be carried out by chemical attack in an isotropic and controlled manner. Therefore, the adjustment of the section of the core 2 can be carried out before the step of forming a coating of silicon dioxide 4.
- the invention also relates to a balance-spring resonator (not shown) for a clockwork movement or other precision instrument comprising the spiral spring 1 cooperating with a balance.
- the value of the stiffness ks of the spiral spring 1 is determined so as to obtain a reference value within its tolerance for the fundamental natural frequency f o of the balance-spring resonator (see Equation 2).
- the value of the stiffness ks of the hairspring 1 is determined by the section of the core 2 and the thickness t R of the coating 4.
- the fundamental natural frequency f o of the balance wheel-hairspring resonator is typically comprised between 2 Hz and 20 Hz, or even between 2 Hz and 5 Hz.
- thermoelastic coefficient of the spiral spring ⁇ S can also be adjusted so as to compensate for the term (3 ⁇ S ⁇ 2 ⁇ B ) of equation 5.
- the core 2 of ceramic material containing the silicon element typically has a first negative thermoelastic coefficient ⁇ A which must be partially compensated by the silica coating 4 having a second positive thermoelastic coefficient ⁇ R of approximately 140 ⁇ 10 -6 / °C.
- the combination of the first thermoelastic coefficient ⁇ A and the second thermoelastic coefficient ⁇ R should result in a predetermined value of the thermoelastic coefficient ⁇ S of the spiral spring 1 around +18 ⁇ 10 -6 /°C.
- the predetermined value of the coefficient thermoelastic ⁇ S of the spiral spring 1 can be obtained by adjusting the section of the core 2 and the thickness t R of the coating 4.
- the balance-hairspring resonator may exhibit an invariance of the properties of expansion and elasticity of the hairspring 1 in a defined range of temperatures comprised, according to the COSC, between 8° C. and 38° C. Such a resonator is also insensitive to external magnetic fields.
- the picture 3 shows an example of a heat-compensated ceramic spiral spring 1 produced according to the method of the invention with a ferrule 5 and a stud 6 (the ferrule and the stud are produced concomitantly with the spiral spring 1).
- the present invention is also applicable to other types of resonators capable of regulating a mechanical watch movement, such as in particular a resonator in the form of a tuning fork.
- the thickness of the coating (4) is between 0.1 ⁇ m and 10 ⁇ m, and preferably between 1 ⁇ m and 3 ⁇ m.
- the ceramic material comprises a silicon nitride, carbide or oxynitride.
- the ceramic material comprises at least one of the following compounds: Si 3 N 4 or SiAlON.
- the ceramic material comprises at least one of the following composite structures: Si 3 N 4 -SiAlON, or ⁇ -Si 3 N 4 -O-Si 3 N 4 .
- Balance-spring resonator in which the set fundamental natural frequency (f o ) of the balance-spring resonator is between 2 Hz and 20 Hz and preferably between 2 Hz and 5 Hz.
- the method further comprising a step of measuring a first measured stiffness (k Am ) and comparing the first measured stiffness (k Am ) with the predetermined value of the first stiffness (k A ).
- the process in which the adjustment of the section of the core (2) comprises a removal of material corresponding to a thickness of about 0.1 ⁇ m to 3 ⁇ m at the periphery of the core (2).
- the method further comprising reducing the thickness of the coating (4) so as to adjust the stiffness (ks) of the spiral spring (1) and/or the predetermined value of the second thermoelastic coefficient ( ⁇ R ).
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Metallurgy (AREA)
- Springs (AREA)
- Micromachines (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1192014 | 2014-01-29 | ||
EP15701046.3A EP3100120A1 (de) | 2014-01-29 | 2015-01-27 | Wärmekompensierte spiralfeder aus keramik mit silicium in der zusammensetzung davon und verfahren zu anpassung davon |
PCT/EP2015/051618 WO2015113973A1 (fr) | 2014-01-29 | 2015-01-27 | Ressort spiral thermocompensé en céramique comprenant l' élément silicium dans sa composition et son procédé de réglage |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP15701046.3A Division EP3100120A1 (de) | 2014-01-29 | 2015-01-27 | Wärmekompensierte spiralfeder aus keramik mit silicium in der zusammensetzung davon und verfahren zu anpassung davon |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3958066A1 true EP3958066A1 (de) | 2022-02-23 |
EP3958066B1 EP3958066B1 (de) | 2024-07-24 |
Family
ID=50156511
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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EP15701046.3A Withdrawn EP3100120A1 (de) | 2014-01-29 | 2015-01-27 | Wärmekompensierte spiralfeder aus keramik mit silicium in der zusammensetzung davon und verfahren zu anpassung davon |
EP21194853.4A Active EP3958066B1 (de) | 2014-01-29 | 2015-01-27 | Herstellungsverfahren eines thermokompensierten spiralfeders |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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EP15701046.3A Withdrawn EP3100120A1 (de) | 2014-01-29 | 2015-01-27 | Wärmekompensierte spiralfeder aus keramik mit silicium in der zusammensetzung davon und verfahren zu anpassung davon |
Country Status (3)
Country | Link |
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EP (2) | EP3100120A1 (de) |
CN (1) | CN106104393A (de) |
WO (1) | WO2015113973A1 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3181938B1 (de) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Herstellungsverfahren einer spiralfeder mit einer vorbestimmten steifigkeit durch wegnahme von material |
EP3181939B1 (de) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Herstellungsverfahren einer spiralfeder mit einer vorbestimmten steifigkeit durch zugabe von material |
EP3181940B2 (de) | 2015-12-18 | 2023-07-05 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Herstellungsverfahren einer spiralfeder mit einer vorbestimmten steifigkeit durch lokalisierte wegnahme von material |
TWI796444B (zh) * | 2018-03-20 | 2023-03-21 | 瑞士商百達翡麗日內瓦股份有限公司 | 用於製造精確剛度之時計熱補償游絲的方法 |
EP3543795A1 (de) | 2018-03-20 | 2019-09-25 | Patek Philippe SA Genève | Herstellungsverfahren von uhrkomponenten aus silizium |
EP3629103B1 (de) * | 2018-09-28 | 2021-05-12 | The Swatch Group Research and Development Ltd | Uhr, die ein mechanisches uhrwerk umfasst, dessen ganggenauigkeit durch eine elektronische vorrichtung reguliert wird |
EP3667433B1 (de) * | 2018-12-12 | 2023-02-01 | Nivarox-FAR S.A. | Spiralfeder und ihr herstellungsverfahren |
EP3671361A1 (de) * | 2018-12-18 | 2020-06-24 | Rolex Sa | Verstärkte uhrenkomponente |
CH716603A1 (fr) | 2019-09-16 | 2021-03-31 | Sigatec Sa | Procédé de fabrication de spiraux horlogers. |
CH716605A1 (fr) | 2019-09-16 | 2021-03-31 | Richemont Int Sa | Procédé de fabrication d'une pluralité de résonateurs sur une plaquette. |
EP4030241A1 (de) | 2021-01-18 | 2022-07-20 | Richemont International S.A. | Verfahren zur herstellung von uhrwerk-spiralfedern |
EP4030243B1 (de) | 2021-01-18 | 2024-09-25 | Richemont International S.A. | Verfahren zur kontrolle und zur herstellung von uhrwerk-spiralfedern |
WO2023117350A1 (fr) | 2021-12-22 | 2023-06-29 | Richemont International Sa | Procédé de controle et de fabrication de ressorts spiraux d'horlogerie |
EP4202576A1 (de) | 2021-12-22 | 2023-06-28 | Richemont International S.A. | Verfahren zur kontrolle und herstellung von uhrwerk-spiralfedern |
EP4310598A1 (de) | 2022-07-18 | 2024-01-24 | Richemont International S.A. | Verfahren zur kontrolle und herstellung von uhrwerk-spiralfedern |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1422436A1 (de) | 2002-11-25 | 2004-05-26 | CSEM Centre Suisse d'Electronique et de Microtechnique SA | Spiraluhrwerkfeder und Verfahren zu deren Herstellung |
WO2007000271A1 (fr) * | 2005-06-28 | 2007-01-04 | Eta Sa Manufacture Horlogere Suisse | Piece de micro-mecanique renforcee |
WO2009068091A1 (fr) * | 2007-11-28 | 2009-06-04 | Manufacture Et Fabrique De Montres Et Chronomètres Ulysse Nardin Le Locle S.A. | Oscillateur mécanique présentant un coefficient thermoélastique optimisé |
CH699780A2 (fr) * | 2008-10-22 | 2010-04-30 | Richemont Int Sa | Ressort spiral de montre autocompensé. |
EP2590325A1 (de) | 2011-11-04 | 2013-05-08 | The Swatch Group Research and Development Ltd. | Thermokompensierter Resonator aus Keramik |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1791039A1 (de) * | 2005-11-25 | 2007-05-30 | The Swatch Group Research and Development Ltd. | Spiralfeder aus athermisches Glas für ein Uhrwerk und Herstellungsverfahren dafür |
DE202010018420U1 (de) * | 2009-02-06 | 2016-06-22 | Damasko Gmbh | Mechanisches Schwingsystem für eine Uhr und Unruhfeder für eine Uhr |
EP2264553B1 (de) * | 2009-06-19 | 2016-10-26 | Nivarox-FAR S.A. | Thermokompensierte Feder und ihr Herstellungsverfahren |
-
2015
- 2015-01-27 EP EP15701046.3A patent/EP3100120A1/de not_active Withdrawn
- 2015-01-27 WO PCT/EP2015/051618 patent/WO2015113973A1/fr active Application Filing
- 2015-01-27 EP EP21194853.4A patent/EP3958066B1/de active Active
- 2015-01-27 CN CN201580006293.7A patent/CN106104393A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1422436A1 (de) | 2002-11-25 | 2004-05-26 | CSEM Centre Suisse d'Electronique et de Microtechnique SA | Spiraluhrwerkfeder und Verfahren zu deren Herstellung |
WO2007000271A1 (fr) * | 2005-06-28 | 2007-01-04 | Eta Sa Manufacture Horlogere Suisse | Piece de micro-mecanique renforcee |
WO2009068091A1 (fr) * | 2007-11-28 | 2009-06-04 | Manufacture Et Fabrique De Montres Et Chronomètres Ulysse Nardin Le Locle S.A. | Oscillateur mécanique présentant un coefficient thermoélastique optimisé |
CH699780A2 (fr) * | 2008-10-22 | 2010-04-30 | Richemont Int Sa | Ressort spiral de montre autocompensé. |
EP2590325A1 (de) | 2011-11-04 | 2013-05-08 | The Swatch Group Research and Development Ltd. | Thermokompensierter Resonator aus Keramik |
Also Published As
Publication number | Publication date |
---|---|
EP3958066B1 (de) | 2024-07-24 |
EP3100120A1 (de) | 2016-12-07 |
CN106104393A (zh) | 2016-11-09 |
WO2015113973A1 (fr) | 2015-08-06 |
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