EP3879558A1 - Générateur de plasma, dispositif de traitement au plasma et procédé de fourniture pulsée de l'énergie électrique - Google Patents

Générateur de plasma, dispositif de traitement au plasma et procédé de fourniture pulsée de l'énergie électrique Download PDF

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Publication number
EP3879558A1
EP3879558A1 EP21171624.6A EP21171624A EP3879558A1 EP 3879558 A1 EP3879558 A1 EP 3879558A1 EP 21171624 A EP21171624 A EP 21171624A EP 3879558 A1 EP3879558 A1 EP 3879558A1
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EP
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Prior art keywords
pulse
switching unit
process chambers
pulses
output
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EP21171624.6A
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German (de)
English (en)
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EP3879558C0 (fr
EP3879558B1 (fr
Inventor
Sebastian Hubertus SCHULZ
Thomas Pernau
Florian NACHBAUER
Felix WALK
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Centrotherm International AG
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Centrotherm International AG
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32889—Connection or combination with other apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32899—Multiple chambers, e.g. cluster tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32944—Arc detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the present invention relates to a plasma generator for the pulsed supply of electrical power with a frequency of at least 40 kHz, a plasma treatment device and a method for the pulsed supply of electrical power with a frequency of at least 40 kHz.
  • a wide variety of fields of application are known in technology in which electrical power is provided with a frequency of at least 40 kHz in order to excite a plasma from a gas and to maintain it for certain processes.
  • An example of this is plasma-assisted vapor deposition in semiconductor technology or the photovoltaic industry.
  • wafers are loaded in so-called wafer boats, some of which consist of electrically conductive plates, and which are placed in corresponding process chambers. Electrical power with a frequency of at least 40 kHz is then applied to the wafer boats in order to generate a plasma from a suitable process gas between the plates and between wafers held on the plates.
  • An example of such a plasma treatment device is shown in FIG DE 10 2015 004 419 A1 shown by the applicant.
  • Such plasma treatment devices usually each consist of a single process chamber to which a single plasma generator is assigned. In the case of the adjacent arrangement of several process chambers, a shared use of gas cabinets and other peripheral devices was sometimes considered, but so far each process chamber has had a single plasma generator.
  • a plasma generator usually has a controllable power supply unit with an output which is suitable for outputting a direct current with a predetermined voltage and / or strength at its output, a converter which is suitable for converting a direct current at the input into an alternating current with a predetermined frequency of shape at least 40KHz as an output signal and apply the output signal to the connected process chamber.
  • the power supply unit and the converter are usually controlled via a controller that provides the required Determines power for the process chamber and generates corresponding control signals.
  • an arc suppression unit is also provided, which is suitable for receiving current process data about processes in the process chamber and current data from the power supply unit and / or the switch and evaluating it in real time in order to detect a rollover or an imminent rollover, the arc suppression unit is connected to the power supply unit and / or the switch in order to control them optionally in response to the detection of a rollover or an imminent rollover in order to avoid or quickly suppress flashovers in the process chamber.
  • the electrical power is usually provided periodically as a pulse by the respective plasma generator, with a duty cycle (quotient of pulse duration and period duration) of less than 0.1 being set here as a rule over long periods of time.
  • a duty cycle (quotient of pulse duration and period duration) of less than 0.1 being set here as a rule over long periods of time.
  • the present invention is therefore based on the object of making the provision of electrical power more efficient. According to the invention, this object is achieved by a plasma generator according to claim 1, a plasma treatment device according to claim 14 and a method according to claim 17. Further refinements of the invention emerge, inter alia, from the subclaims.
  • a plasma generator for the pulsed provision of electrical power at a frequency of at least 40KHz to at least two process chambers, the plasma generator having the following: a control unit which is suitable for receiving and evaluating process data about processes in the at least two process chambers; a controllable power supply with an output which is suitable in response to a control signal from the control unit at its output a direct current with a predetermined voltage and / or To spend strength; and a switching unit with a first input, which is connected to the output of the power supply unit, and with at least two switching unit outputs for the respective connection to one of the at least two process chambers; wherein the switching unit is suitable to form an alternating current with a predetermined frequency of at least 40KHz as an output signal from a direct current at the input and to output the output signal in response to a control signal from the control unit as a pulse selectively for a predetermined pulse duration to one of the switching unit outputs; wherein the control unit is suitable for coordinating the power requirements of the at least two process chamber
  • Such a plasma generator enables the coordinated provision of pulsed conduction to a large number of process chambers, whereby the efficiency of the plasma generator is increased. Acquisition costs for a multi-chamber plasma treatment unit can be reduced significantly, since the number of plasma generators required can be at least halved, if not further reduced. In particular, process chambers in which similar processes are carried out can be efficiently coordinated.
  • control unit has a number of controllers corresponding to the number of process units to be connected to the switching unit, each controller being suitable for receiving process data about processes in a respective one of the process chambers, each controller being connected to the power supply unit and / or the switch stands to control them in response to the received process data. In this way, a good and reliable regulation of the respective processes can be ensured.
  • the plasma generator preferably has at least one arc suppression unit which is suitable for receiving and evaluating current process data about processes in the at least two process chambers and current data of the power supply unit and / or the switch in real time in order to detect a rollover or an impending rollover , wherein the arc suppression unit is connected to the power supply unit and / or the switch in order to control them optionally in response to the detection of a rollover or an impending rollover.
  • the arc suppression unit can form part of the control unit.
  • the controller and / or the at least one arc suppression unit can be designed as separate software modules that can be executed on a common processor or on separate processors of the plasma generator.
  • the switching unit has at least one third switching unit output which is suitable for connection to at least one further process chamber or an absorber, and wherein the switching unit is suitable, in response to an incoming control signal from the control unit, the output signal as a pulse selectively for a predetermined pulse duration to apply a respective one of the switching unit outputs in order to enable an even more efficient use of the plasma generator.
  • the switching unit can have at least one switching unit output which is suitable for connection to an absorber, the switching unit being suitable to apply the output signal as a pulse selectively for a predetermined pulse duration to the switching unit output for the absorber in response to an incoming control signal in order to prevent overload or flashover to avoid or prevent a process chamber.
  • control unit can be designed in such a way that it coordinates the sum of the pulse duration and a corresponding pulse pause at the respective switching unit outputs so that the sum is the same in each case or at one of the switching unit outputs is a multiple of the sum at the other switching unit output.
  • the control unit is preferably designed in such a way that it shifts pulses in time with respect to the power requirements if the power requirements would lead to an overlapping of pulses at different outputs, a corresponding time shift being selected so that the energy output via the respective outputs over time essentially corresponds to the performance requirement.
  • the control unit can be designed in such a way that that it divides individual pulses with regard to the power requirements into two separate pulses and shifts them in time if the power requirements would lead to an overlapping of pulses at different outputs, with a corresponding division and time shift being selected so that the energy output via the respective outputs via the Time essentially corresponds to the performance requirement.
  • control unit it is also additionally or alternatively possible for the control unit to be designed in such a way that it shifts individual pulses in time with respect to the power requirements if the power requirements would lead to an overlap of pulses at different outputs, a corresponding time shift being selected so that the Energy output via the respective outputs over time essentially corresponds to the power requirement.
  • control unit is designed so that it can change at least one of the following parameters of a pulse: a position of a pulse in a pulse train, a division of a pulse into partial pulses, a pulse duration and an amplitude of a pulse, if specific power requirements apply an overlapping of pulses at different outputs.
  • the plasma generator is designed for the pulsed provision of electrical power at a frequency of at least 40 kHz to at least three process chambers and furthermore has the following: a control unit which is suitable for receiving and evaluating process data about processes in the at least three process chambers; a further controllable power supply unit with an output which is suitable for outputting a direct current with a predetermined voltage and / or strength at its output in response to a control signal from the control unit; and a further switching unit with a power input, which is connected to the output of the power supply unit, and with at least three switching unit outputs for the respective connection to one of the at least three process chambers; wherein the switching unit is suitable to form an alternating current with a predetermined frequency of at least 40KHz as an output signal from a direct current at the input and to output the output signal in response to a control signal from the control unit as a pulse selectively for predetermined pulse durations to one of the switching unit outputs; wherein the control unit is suitable for coordinating the performance requirements of
  • the invention also relates to a plasma treatment device with at least two separate process chambers, in each of which a plasma can be generated, and a plasma generator of the type described above, with process chambers each being connected to one of the switching unit outputs of the switching unit.
  • such a plasma treatment device has at least three separate process chambers, the switching unit of the plasma generator having at least three switching unit outputs, and the process chambers each being connected to one of the switching unit outputs.
  • it can also have an absorber, the switching unit of the plasma generator having at least three switching unit outputs, and the absorber being connected to one of the switching unit outputs.
  • the invention also relates to a method for the pulsed provision of electrical power with a predetermined frequency of at least 40KHz to at least two separate process chambers, with the following steps: Provision of a direct current with a predetermined voltage and / or strength at an input of a switching unit, in response to a control signal from a control unit; Forming, from the direct current, an alternating current output signal with a predetermined frequency of at least 40KHz in the switching unit and, in response to a control signal from the control unit, selectively outputting the alternating current output signal as a pulse with a predetermined pulse duration at one of at least two switching unit outputs of the switching unit, each of which is connected to one of the at least two separate process chambers; wherein the control unit, in response to performance requirements of the at least two process chambers and in response to process data about processes in the at least two process chambers, control signals for providing the direct current and control signals for selectively outputting the alternating current output signal, which are coordinated to the respective of the process chambers in connection standing switching unit output
  • the control unit preferably changes at least one of the following parameters of a pulse: a position of a pulse in a pulse train, a division of a pulse into partial pulses, a pulse duration and an amplitude of a pulse if specific power requirements would lead to an overlap of pulses at different outputs.
  • the process is so flexible and can adapt to a wide variety of requirements.
  • the control unit can carry out an adaptation according to predetermined fixed rules or rules that can be set by an operator.
  • the control unit can compare the output per process chamber in pulses over a period of time with the output requested over the period and automatically adjust at least one parameter of a pulse on the basis of the comparison.
  • the electrical power is provided to at least three separate process chambers, the switching unit having at least three switching unit outputs, each of which is connected to one of the at least three separate process chambers; wherein the control unit, in response to performance requirements of the at least two process chambers and in response to process data about processes in the at least three process chambers, generates control signals for providing the direct current and control signals for selectively outputting the alternating current output signal, which are coordinated to the respective of the
  • the switching unit outputs connected to the process chambers are essentially the ones corresponding to the performance requirements Power is made available as pulses over time, the pulses for the process chambers being offset in time to one another, but the process chambers being operated at the same time.
  • the switching unit can have at least three switching unit outputs, one of which is connected to an absorber which is suitable for receiving and absorbing electrical power, and wherein the control unit is able to monitor the processes in the respective process chambers and the occurrence or to recognize the risk of a rollover in one of the process chambers and, in response, to divert the output signal into the absorber over a pulse duration or at least a part thereof instead of into a corresponding one of the process chambers.
  • control unit coordinates the sum of the pulse duration and a corresponding pulse pause at the respective switching unit outputs so that the sum is the same in each case or at one switching unit output is a multiple of the sum at another switching unit output.
  • the method is for the pulsed provision of electrical power with a predetermined frequency of at least 40 kHz to at least three separate process chambers, and has the following further steps: Provision of a direct current with a predetermined voltage and / or strength at an input of another Switching unit in response to a control signal from the control unit; Forming, from the direct current, an alternating current output signal with a predetermined frequency of at least 40KHz in the further switching unit and, in response to a control signal from the control unit, selectively outputting the alternating current output signal as a pulse with a predetermined pulse duration at one of at least three switching unit outputs of the further Switching units, each of which is connected to one of the at least three separate process chambers; wherein the control unit, in response to performance requirements of the at least three process chambers and in response to process data about processes in the at least three process chambers, control signals for providing the direct current and control signals for selective output of the alternating current output signal, which are coordinated in such a way that at each of the switching unit
  • the term is intended to essentially encompass deviations of +/- 5%, preferably +/- 2%, from the stated value.
  • Fig. 1 shows a schematic representation of a first embodiment of a plasma treatment device 1 with two process units 3a, 3b and a plasma generator 5.
  • the process units 3a and 3b can each have the same structure and each have a process chamber for receiving one or more substrates, in particular semiconductor wafers or PV -Substrates.
  • the process chambers can be tightly closed and the process units 3a and 3b have different means, not shown, for setting a desired gas atmosphere within the respective process chambers, such as pumps and a gas cabinet. While each process chamber is usually assigned its own pump, a gas cabinet can supply several process chambers if necessary.
  • Means for generating a plasma are also provided in the process chambers, it being possible for these to be formed in part by a wafer boat which, for example, is introduced into the process chamber together with the substrates and there electrical contact is made, for example, in the above DE 10 2015 004 419 A1 is described, which to this extent is made the subject of the present disclosure.
  • the process units 3a, 3b are connected to the plasma generator 5 via power lines 7a and 7b and data connections 8a and 8b, respectively.
  • the plasma generator 5 supplies electrical power at a frequency greater than 40 kHz to the respective process units 3a and 3b via the power lines 7a, 7b.
  • Data can be exchanged between the process units 3a, 3b and the plasma generator 5 via the data connections 8a and 8b.
  • the data connections 8a and 8b can be wired or wireless.
  • the process units 3a, 3b can supply the plasma generator 5 with different process data about processes in the respective process chambers.
  • actual data with regard to the actually incoming electrical power, the presence of a plasma, etc. can be transmitted, but also corresponding target data, as is the case with already known plasma treatment devices with a single process unit and a single plasma generator.
  • the plasma generator 5 has a controllable power supply unit 10, a switching unit 12 and a control unit 14.
  • the power supply unit has an input (not shown) and an output which is connected to an input of the switching unit 12 via a power line 15.
  • the power supply unit 10 is suitable for outputting a direct current having a predetermined voltage and / or strength at its output in response to a control signal from the control unit 14, as is known in the art.
  • the switching unit 12 has the input already mentioned, which is connected to the power line 15 for receiving direct current from the power supply unit 10, as well as two separate outputs, one output being connected to the power line 7a and the other output being connected to the power lines 7b.
  • the switching unit 12 has a converter circuit which can form an alternating current with a predetermined frequency of at least 40 kHz as an output signal from a direct current at the input.
  • the converter circuit can have a bipolar transistor, for example, which is derived from the direct current provided by the power supply unit 10 forms a quasi sinusoidal signal (stepped signal).
  • the switching unit 12 has a switching part which applies the output signal thus formed in response to a control signal from the control unit 14 to one or the other output, thus to the process unit 3a or the process unit 3b.
  • the control unit 14 in turn has two separate controllers 16a, 16b and an arc suppression unit 18.
  • the controllers 16a, 16b are connected to the process units 3a and 3b via the data connections 8a and 8b, respectively.
  • the controllers 16a, 16b are each designed in a known manner to determine performance requirements for the process units 3a, 3b on the basis of actual data and target data about the respective processes in the process units 3a, 3b. From these, the controllers 16a, 16b (or a downstream unit) then create control data for the power supply unit 10 and the switching unit 12.
  • the controllers 16a, 16b are shown as separate units, they can also be designed as a single unit, which is an im Enables essentially parallel processing of data from the process units 3a and 3b.
  • the controllers 16a, 16b can be designed as separate software routines that can be executed essentially in parallel and that are executed on a processor.
  • corresponding outputs of the controller are connected to corresponding inputs of the arc suppression unit 18.
  • the arc suppression unit 18 can thus receive the performance requirements of the individual process units from the controllers 16a, 16b, or the control data for the power supply unit 10 and the switching unit 12 generated therefrom directly the respective process units 3a, 3b received.
  • Such data are, in particular, those which make it possible to evaluate in real time whether a rollover has occurred in one of the process units 3a and 3b or whether one is imminent.
  • the data required for this are known to the person skilled in the art, as are the corresponding detection algorithms, which are therefore not explained in more detail here.
  • the arc suppression unit 18 can adapt the control signals to the power supply unit 10 and the switching unit 12 and the provision of the power to the respective one Process unit 3a, 3b in which the flashover occurs or there is a corresponding risk of brief interruption.
  • the arc suppression unit 18 can furthermore be designed in such a way that it creates control data for the power supply unit 10 and the switching unit 12 therefrom when it receives power requirement data from the individual process units. This is of course not necessary if these control data have already been created by the controllers 16a, 16b.
  • the arc suppression unit 18 is designed in such a way that it coordinates its own control data or the control data created by the controllers 16a, 16b for the power supply unit 10 and the switching unit 12.
  • the control data for the power supply unit 10 and the switching unit 12 are to be coordinated in such a way that the respective process units 3a, 3b are provided with power in accordance with their performance requirements.
  • control data for the power supply unit 10 and the switching unit 12 must also be coordinated in terms of time, since power can only be made available at one of the outputs of the switching unit at any point in time.
  • the power is provided to the respective process units 3a, 3b as a pulse with a predetermined pulse duration.
  • the respective pulses are therefore to be coordinated via the control data for the power supply unit 10 and the switching unit 12 in such a way that the pulses do not overlap, but the process chambers can still be operated at the same time.
  • Fig. 2 shows a schematic representation of an alternative embodiment of a plasma treatment device 1, which in this embodiment has three process units 3a, 3b, 3c, an absorber 20 and a plasma generator 5. If the same or similar elements are present in the different embodiments, the same reference symbols are used.
  • the process units 3a, 3b and 3c can be identical to those described above and are connected to the plasma generator 5 via power lines 7a, 7b and 7c and data connections 8a, 8b and 8c, respectively.
  • the power lines 7a, 7b, and 7c are again used to supply electrical power with a frequency greater than 40KHz from the plasma generator 5 to the respective process units 3a, 3b and 3c.
  • Data can again be exchanged between the process units 3a, 3b, 3c and the plasma generator 5 via the data connections 8a, 8b and 8c.
  • the plasma generator 5 again has a controllable power supply unit 10, a switching unit 12 and a control unit 14.
  • the power supply unit 10 can be identical to that described above.
  • the switching unit 12 again has an input via the power line 15 which is connected to the output of the power supply unit. In this embodiment, however, the switching unit has four separate outputs, three of the outputs being connected to the power lines 7a, 7b and 7c and the fourth output being connected to the absorber via a power line 21.
  • the switching unit 12 again has a converter circuit, as described above, and a switching part which selectively applies an output signal formed by the converter circuit in response to a control signal from the control unit 14 to one of the outputs.
  • the output signal can therefore be selectively applied to one of the process units 3 a to 3 c or to the absorber 20.
  • the control unit 14 in turn has three separate controllers 16a, 16b and 16c, as well as an arc suppression unit 18 in this embodiment 3c in connection.
  • the regulators 16a, 16b and 16c can in turn be of the type described above, which is designed to determine performance requirements for the respective process unit 3a, 3b or 3c and possibly also control data for the power supply unit 10 and / or the switching unit 12.
  • Arc suppression unit 18 can also essentially be of the type described above, in which case it monitors three process units 3a, 3b and 3c with regard to the risk of flashovers in this embodiment. It also coordinates the pulses provided by the switching unit 12 for three process units 3a, 3b and 3c.
  • the arc suppression unit 18 can furthermore be designed in such a way that, when power requirement data of the individual process units are received therefrom, it supplies control data for the power supply unit 10 and the switching unit 12 created. This is of course not necessary if these control data have already been created by the controllers 16a, 16b.
  • the arc suppression unit 18 is designed in such a way that it coordinates its own control data or the control data for the power supply unit 10 and the switching unit 12 created by the controllers 16a, 16b, 16c.
  • the control data for the power supply unit 10 and the switching unit 12 are to be coordinated in such a way that the respective process units 3a, 3b and 3c are provided with power in accordance with their performance requirements.
  • the control data for the power supply unit 10 and the switching unit 12 must also be coordinated in terms of time, since power can only be made available at one of the outputs of the switching unit at any point in time.
  • the power is provided to the respective process units 3a, 3b and 3c as a pulse with a predetermined pulse duration.
  • the respective pulses are therefore to be coordinated via the control data for the power supply unit 10 and the switching unit 12 in such a way that the pulses do not overlap, but the process chambers can still be operated at the same time.
  • the arc suppression unit 18 is shown as a single unit that performs both the arc suppression function and the pulse coordination function, these functions can also be performed in separate units.
  • the process data and the control data could be evaluated separately for each of the process chambers and accordingly three units could be provided (again, for example, as separate software routines running in parallel).
  • the arc suppression function detects a rollover or the risk of such a flashover, it can redirect the pulse actually prepared for one of the respective process units 3a, 3b and 3c to the absorber 20 instead of to the respective process unit 3a, 3b and 3c the power impulse is to be absorbed and converted into heat, for example.
  • Such a switchover can take place for a whole pulse or also for a partial pulse, as will be explained in more detail below.
  • the data in particular the power requirement data of the individual process units or the desired control data for the power supply unit 10 and the switching unit 12, must be in a coordination routine converge. As mentioned, this can take place in the arc suppression unit 18 or also in a separate pulse coordination unit.
  • the coordination routine the power requirement data of the individual process units determined by the controller or the control data for the power supply unit 10 and the switching unit 12 generated therefrom are combined and a check is made to determine whether there are any conflicts. In this check, data about the power supply unit 10 and the switching unit 12, such as switching times, maximum power, maximum pulse duration (if limited), are also taken into account. Further data about the respective process units 3a, 3b and 3c and the processes running can also be taken into account.
  • Such data can contain, for example, temporal tolerances in the pulse feed, tolerances with regard to the pulse amplitude, the minimum required and / or the maximum permitted energy input into the process, and possibly other parameters.
  • This data can be constant over a process or change. For example, there are processes in which precise pulse sequences with a fixed period length and with certain pulse amplitudes have to be adhered to at certain times, while at other times of the process the period length and also the pulse amplitude are quite flexible, but the energy input over time within narrow tolerances lies.
  • the coordination unit can then coordinate the output pulses at the outputs of the control unit.
  • Processes are preferably carried out in the respective process units 3a, 3b and 3c which allow the setting of a period length (sum of pulse duration and pulse pause) that is the same or an integral multiple of the period length of the other processes for one of the processes. This considerably simplifies the coordination, as will be explained in more detail below with the aid of the pulse diagrams, but is also not necessary. Different coordination options are explained in more detail below with the aid of the pulse diagrams.
  • Fig. 3 shows a schematic representation of a further alternative embodiment of a plasma treatment device 1.
  • five process units 3a to 3e, an absorber 20 and a plasma generator 5 are provided. If the same or similar elements are present in the different embodiments, the same reference symbols are used again.
  • the process units 3a to 3e can be identical to those described above and are connected to the plasma generator 5 via power lines 7a to 7e and data connections 8a to 8e.
  • the power lines 7a to 7e are again used to supply electrical power at a frequency greater than 40 kHz from the plasma generator 5 to the respective process units 3a to 3e.
  • Data can again be exchanged between the process units 3a, 3b, 3c and the plasma generator 5 via the data connections 8a, 8b and 8c.
  • the plasma generator 5 has two controllable power supply units 10a, 10b, two switching units 12a, 12b and a control unit 14.
  • the power supply units 10a, 10b can be identical to the power supply unit described above.
  • the power supply units 10a, 10b can be the same or different with regard to the rated power.
  • the switching units 12a, 12b each have an input which is connected to the output of one of the power supplies via a power line 15a or 15b.
  • the switching units 12a, 12b each have six separate outputs, five of the outputs being connected to the power lines 7a to 7e and thus the plasma units 3a to 3e and the sixth output being connected to the absorber 20 via a power line 21.
  • the switching units 12a, 12b each have a converter circuit, as described above, and a switching part which selectively applies an output signal formed by the converter circuit in response to a control signal from the control unit 14 to one of the outputs.
  • the output signal of each switching unit 12a, 12b can therefore be selectively applied to one of the process units 3a to 3e or to the absorber 20.
  • control unit 14 in turn has five separate controllers 16a to 16e and an arc suppression unit 18.
  • controllers 16a to 16e are connected to the process units 3a to 3e via respective data connections 8a to 8e.
  • the regulators 16a to 16e can in turn be of the type described above, which is designed for the respective performance requirements To determine process unit 3a to 3e and, if necessary, also control data for the power supply unit 10 and / or the switching unit 12.
  • the arc suppression unit 18 is configured to monitor the five process units 3a to 3e with regard to the risk of arcing. Furthermore, it is configured in such a way that it distributes and coordinates the required pulses for the plasma units 3a to 3e via both power supply units 10a, 10b and both switching units 12a, 12b.
  • the arc suppression unit 18 can distribute the required pulses to two power supplies (combination of power supply unit and switching unit) results in significantly greater flexibility with regard to the distribution of the pulses.
  • pulses that overlap in time can now also be made available if this is necessary due to the performance requirements, as will be explained in more detail below.
  • Corresponding coordination requires that the pulses are made available sequentially at a switching unit 12a or 12b, but the switching units 12a, 12b can be controlled in such a way that they deliver pulses at the same time. With a simultaneous delivery of the pulses via the separate switching units 12a, 12b, however, these are then to be applied to separate plasma units 3a to 3e.
  • the arc suppression unit 18 is shown as a single unit that performs both the arc suppression function and the pulse coordination function, these functions can also be performed in separate units. In particular, if the coordination becomes more complex and possibly impairs the arc suppression function, the pulse coordination function could take place in a separate unit.
  • the plasma generator 5 is also shown as a single plasma generator with two separate power supplies. Of course, two separate plasma generators 5 could also be provided here, which are respectively connected to the plasma units 3a to 3e and the absorber, and which are coordinated accordingly via a common control unit. However, a single unit is preferred as communication between arc suppression units 18 and the power supply unit (s) 10a, 10b and the switching unit (s) 12a, 12b runs via real-time data connections that are mechanically sensitive and should therefore not be relocated outside of the respective unit, if possible.
  • the number of plasma units to be supplied and the structure of a plasma generator are not limited to the specifically illustrated embodiments. Rather, even more plasma units could be equipped with a plasma generator, as it is for example in Fig. 3 shown is to be supplied. With a larger number of plasma units in the plasma generator, it is also possible, for example, to provide three power supplies, the complexity of the pulse coordination also increasing as the number of process chambers and power supplies increases. According to the invention, however, the number of plasma units should be higher than the number of available power supplies and, in particular, at least twice as high.
  • a plasma treatment device for example, with eight plasma units (+ 1 optional absorber) and a plasma generator with two separate power supplies, as in FIG Fig. 3 shown, or considered with two separate plasma generators and a common control unit.
  • FIGS. 4 to 7b show different exemplary pulse sequences that can be provided via a plasma generator 5 according to the invention.
  • FIG. 4A a classic pulse sequence, as it was previously provided by plasma generators.
  • An alternating current pulse 30 with a frequency of at least 40 kHz and a predetermined power (P) is output for a predetermined time period t on of, for example, 5 ms.
  • P predetermined power
  • t on a predetermined time period
  • P predetermined power
  • This is followed by a pulse pause t off of, for example, 45 ms, followed by a renewed pulse with a duration t on of, for example, 5 ms.
  • This is a typical sequence of power pulses as it is provided for plasma treatment in a plasma unit. This results in a period of 50 ms and a duty cycle of 0.1. So stay here for example 90% of the available continuous power of the plasma generator used unused.
  • FIG. 11 shows an alternative pulse train as produced by a plasma generator according to the invention, for example as shown in FIG Fig. 1 shown can be made available.
  • the exemplary pulse sequence consists of pulses 30 and pulses 40, the pulses 30 being made available, for example, to the process unit 3a and the pulses 40 to the process unit 3b.
  • the pulses 30 and 40 each have the same power and the same pulse duration t on of, for example, 5 ms.
  • FIG. 4C shows a further exemplary pulse sequence as produced by a plasma generator according to the invention, as it is for example in FIG Fig. 1 shown can be made available.
  • the exemplary pulse sequence again consists of pulses 30 and pulses 40, the pulses 30 being made available, for example, to the process unit 3a and the pulses 40 to the process unit 3b.
  • the pulses 30 and 40 each have a different power but again the same pulse duration t on of, for example, 5 ms and also the same pulse pauses as in FIG Figure 4B .
  • the aim here is to show that the plasma generator is not only able to interleave the same pulses but also to provide pulses with different power levels, which is possible, for example, via a corresponding control of the power supply unit 10.
  • Figure 4D shows a further exemplary pulse sequence as produced by a plasma generator according to the invention, as it is for example in FIG Fig. 1 shown can be made available.
  • the exemplary pulse sequence again consists of pulses 30 and pulses 40, the pulses 30 being made available to the plasma unit 3a and the pulses 40 being made available to the process unit 3b, for example.
  • the pulses have 30 and 40 as with Figure 4C each different performance and this time also different pulse duration t on of, for example, 15 ms for the pulses 30 and 5 ms for the pulses 40.
  • the pulse pauses between the pulses 30-40 are each, for example, 10ms and between the pulses 40-30 each, for example, 20ms.
  • the pulses for plasma processes which are each pulsed with the same period length (or with period lengths that are a multiple of each other), can be easily interleaved and provided with a single plasma generator.
  • a corresponding control unit for controlling a power supply (combination of power supply unit and switching unit) can evaluate corresponding data and, if necessary, also look one or more cycles ahead in order to recognize when conflicts between pulses are to be expected in order to prepare shifts if necessary. If, for example, a maximum pulse pause t off in a process - with a normal pulse pause of 45ms - 50ms, but a shift of + 10ms is required in two cycles, then a + 5ms shift can take place in two successive cycles, so that in two successive cycles a 50ms pulse pause occurs.
  • shifts should preferably be selected in such a way that energy input into the process corresponds to the performance requirements over longer periods of time, for example 50 cycles, or remains unchanged over time.
  • the Figures 5A to 5D show different exemplary pulse sequences, for example via a plasma generator 5 according to FIG Fig. 2 to be provided.
  • a plasma generator 5 according to FIG Fig. 2 to be provided.
  • three different pulses 30, 40, 50 are provided for different process units 3a to 3c.
  • Figure 5A shows a pulse train with pulses 30, 40, 50, each of which has the same pulse duration t on of, for example, 5 ms and the same line.
  • a pulse pause t off of 45 ms, for example.
  • Pulse pauses t off of, for example, 10ms-15ms-10ms result between the pulses 30-40-50-30. While each individual process unit 3a, 3b is operated with a duty cycle of 0.1, the plasma generator is now operated with a duty cycle of 0.3.
  • the Figure 5B shows a pulse sequence with pulses 30, 40, 50, which, however, differ with regard to their pulse durations t on and also with regard to their power.
  • the pulses 30-30 / 40-40 / 50-50 each again have the same period length of 50 ms, for example, so that the pulses can easily be interleaved.
  • Figure 5C shows another exemplary pulse train similarly Figure 5B with pulses 30, 40, 50, which differ in terms of their pulse durations t on and also in terms of their power.
  • the pulses 30-30 / 40-40 each have the same period length, for example 50 ms, while the pulses 50-50 have a period length that is twice as long, for example 100 ms.
  • Figure 5D shows another exemplary pulse train similarly Figure 5B with pulses 30, 40, 50 which differ in terms of their pulse durations t on and also in terms of their power, but the pulses 30-30 / 40-40 / 50-50 each have the same period length.
  • this pulse sequence shows, by way of example, the intervention of the arc suppression unit 18 in the regular pulse sequence.
  • a flashover was detected in the plasma unit 3c, whereupon the arc suppression unit 18 activated the switching unit 12 in real time in order to divert the second half of the pulse 50 into the absorber. This can be done quickly and no power fluctuations are generated in the subsequent pulses, which could occur with a simple separation of the plasma unit 3c from the plasma generator 5, since the power is already provided in the switching unit.
  • the Figure 6 shows at (A) an exemplary pulse train requirement (power requirement) from three process chambers, for example, from the arc suppression unit 18 according to FIG Fig. 2 is to be processed and coordinated and at (B) an exemplary pulse train that is responsive to the pulse train request from the plasma generator according to Fig. 2 is delivered.
  • pulses 30, 40, 50 with different pulse durations and different powers are requested, with a corresponding requirement profile being created, for example, by the controllers 16a to 16c.
  • the pulses 30 - 30/40 - 40/50 - 50 also have different period lengths, so that the pulse train request requests pulses partly overlapping or in direct succession.
  • the arc suppression unit 18 or another control unit must now coordinate the pulses to be output in such a way that they are output in a suitable manner, the needs of the plasma units being taken into account as far as possible.
  • the pulses 30 must not experience any change, since the corresponding plasma unit does not allow any deviations, at least during the current phase of the process.
  • the output pulses 30 (see Figure 6B ) exactly match the requested pulses.
  • the processes in the plasma units 3b and 3c allow deviations in the pulses within predetermined limits as long as the total energy input remains constant over time.
  • the first pulse becomes 50 in Figure 6B compared to its request (which is directly adjacent to a pulse request for a pulse 30) shifted slightly forward in time, in order to take into account the switching time of the control unit 12 of 1 ms, for example.
  • the second pulse 50 which would completely overlap with a pulse 30 according to the pulse request, was divided into two parts 50-1, 50-2, with part 50-1 before the corresponding pulse 30 and part 50-2 behind Pulse 30 was shifted.
  • the sum of the duration of the partial pulses 50-1, 50-2 corresponds to the duration of a normal pulse 50.
  • the third and fourth pulses 40 were also timed postponed to allow proper pulse rate. If neither of the overlapping pulses has to occur at a specific point in time, both can be shifted in the case of overlapping pulses, the shift then usually being in opposite directions. While one moves forward, the other moves backward. In this way, any required pulse pauses between identical pulses in a chamber can be better maintained.
  • the start of the pulse corresponds to the requirement.
  • the pulse was shortened, but increased.
  • a higher power was provided during the short period of time, so that the total power of the pulse is equal to or approximately equal to the requested power.
  • the second pulse 50 was not divided but shifted behind the overlapping pulse 30 requested.
  • the pulse was shortened in time and the power increased, as in the case of the first pulse 50. This can be advantageous over a division, for example, in order to maintain minimal pulse pauses between successive pulses in a chamber.
  • the third pulse 40 was treated similarly to the first pulse 50, that is to say the requested start time was retained, while the pulse duration was shortened and the pulse height was increased.
  • Fig. 8 (B) an alternative heart rate management, which with the same starting position as with Fig. 6 (A) completely without a pulse shift.
  • a shift in both the start time and the end time with respect to the request is regarded as a pulse shift here. If at least one of the times occurs according to the request, this is not regarded as a shift.
  • the energy input should not be significantly influenced over time.
  • the term over time can be relatively brief, depending on the process, if, for example, a minimum energy input per time unit (e.g. millisecond) must not be undercut, since the corresponding time unit must be taken into account here.
  • the term can also encompass the entire process itself, for example if it essentially depends on the total amount of energy introduced into the process. In the case of short periods of time, for example in the event of a total or partial failure of a pulse, the preceding and / or following pulse could then possibly be increased or lengthened accordingly.
  • pulses can possibly also be delivered much later, for example after a process has ended on schedule.
  • the pulse management is configured in such a way that, taking into account the capabilities of the components used, such as power supply unit 10 and / or switch 12, it selects the optimal configuration of pulse duration, pulse shift, pulse power level and / or pulse division for a wide variety of requirements of the chambers. As little process influence as possible is considered optimal here. To improve a constant energy input, it can also be useful to change not only temporally overlapping or adjacent pulses.
  • the pulse management can, for example, be implemented as separate hardware or integrated into the control unit, in particular the regulator.
  • Fig. 7 now shows exemplary pulse sequences, as they are via the switching units 12a, 12b from a plasma generator according to FIG Fig. 3
  • the two representations arranged one above the other show the output at different switching units 12a, 12b of the plasma generator.
  • pulses 30, 40, 50 with the same pulse duration, period length between the same pulses and the same power should be supplied, which for example go to the three plasma units 3a to 3c in which the same processes take place at the same time.
  • pulses 60 and 70 should also be generated for plasma units 3d and 3e with different pulse durations, pulse periods and powers, with each pulse 70 temporally overlapping one of the pulses 60. The requirements of the plasma units 3d and 3e do not allow any shifts.
  • the control unit has now found a division of the pulses in which the switching unit 12a primarily outputs the pulses 30, 40, 50, while the switching unit 12b primarily outputs the pulses 60 and 70.
  • the switching unit 12b since the switching unit 12b is not allowed to shift the pulses 60 and 70, but there is an overlap with regard to the requirement every time the pulse 70 is to be output, the required pulse 60 is transmitted via the switching unit at the time of the output of the pulse 70 via the switching unit 12b 12a issued.
  • this is possible without shifting the pulses 30, 40 and 50.
  • space can also be created between the pulses 30, 40 and / or 50 in order to record the pulse 60, provided that the requirements of the plasma units 3a to 3c do not conflict with this.
  • the plasma generator 5 according to FIG Fig. 3 great flexibility with regard to the creation of pulse trains in order to meet the performance requirements of a large number of plasma units, taking into account the respective requirements. Further special pulse management variants are now explained in more detail below.
  • FIG. 9 (A) and (B) show this concept using a system with two chambers (channels), where Fig. 9 (A) a pulse request and Fig. 9 (B) represents a corresponding pulse output.
  • Fig. 9 (A) a pulse request
  • Fig. 9 (B) represents a corresponding pulse output.
  • each of the third and fourth requested pulses 30 and 40 overlap, with the third pulses the pulse 30 should begin before the pulse 40 and the fourth pulses the pulse 40 should begin before the pulse 30.
  • pulse 30 is therefore output first, followed by pulse 40.
  • pulse 40 is then output first, followed by pulse 30.
  • the fourth pulse 40 is output at the same time compared to its requirement profile pushed backwards like the third pulse shifted backwards so that the pause time between the third and fourth pulse does not fall below the requested pause time (minimum pause time).
  • the shift in one pulse therefore results in a shift in subsequent pulses.
  • Pulse - the end - Time Pulse X set pulse - the end - Time Pulse X - Correction value
  • the correction value can be set accordingly.
  • 2% for example, with a set pulse-off time of 50 ⁇ s, a correction value of 1 ⁇ s can be entered. This is then used permanently during the process.
  • X is a random value in% between 0% and the set correction value. This is permanently set and used during the process.
  • a correction value is determined based on a determined pulse-off time extension.
  • the pulse-off time extension is multiplied by a proportional factor K for this purpose.
  • Each pulse - unless there is an overlap with a pulse from another channel - is output at the time of the request. Shifting a pulse does not result in any shifting of subsequent pulses in the same channel.
  • FIG. 10 (A) and (B) show this concept using a system with two chambers (channels), where Fig. 10 (A) a pulse request and Fig. 10 (B) one represents corresponding pulse output.
  • Fig. 10 (A) a pulse request
  • Fig. 10 (B) one represents corresponding pulse output.
  • the third and fourth requested pulses 30 and 40 overlap.
  • the pulse 30 has the higher priority so that it is always output as requested, as in FIG Fig. 10 (B) can be seen.
  • the third and fourth pulses 40 are output in abbreviated form.
  • the pulse 40 begins as requested, but ends earlier, in particular before the request time (and the output) of the overlapping requested pulse 30.
  • shifting the start / end of the pulse can be given priority over an increase in pulse, so that an attempt is first made to compensate for the missing portion of the pulse by shifting and only then is the remaining portion (if fully possible) compensated by increasing the pulse.
  • the priority can also be set the other way around or a weighting can be set.
  • the plasma generators can be used for a wide variety of plasma units and the number of plasma units to be supplied by a plasma generator can also differ from the number shown.
  • the switching units 12a, 12b are each connected to all plasma units 3a to 3e.
  • only plasma units 3a to 3c are connected to the switching unit 12a and the plasma units 3c to 3e are connected to the switching unit 12b, so that only the plasma units 3c can be controlled by both. This would reduce the flexibility, but would still allow at least one of the plasma units to be supplied via two switching units in order to resolve possible conflicts when generating a pulse train.

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PL3602601T3 (pl) 2021-10-25
DE102018204585A1 (de) 2018-10-04
CN114709126A (zh) 2022-07-05
US20220254609A1 (en) 2022-08-11
PL3879558T3 (pl) 2024-03-25
CN110494949A (zh) 2019-11-22
TWI762613B (zh) 2022-05-01
US20210111001A1 (en) 2021-04-15
KR20190130019A (ko) 2019-11-20
KR102588542B1 (ko) 2023-10-11
CN110494949B (zh) 2022-04-29
EP3602601A1 (fr) 2020-02-05
EP3879558C0 (fr) 2023-11-22
EP3879558B1 (fr) 2023-11-22
TW201904358A (zh) 2019-01-16
US11355316B2 (en) 2022-06-07
EP3602601B1 (fr) 2021-05-05
KR20230142821A (ko) 2023-10-11

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