EP3849282A1 - Plasmaentladungssystem und verfahren zur verwendung davon - Google Patents

Plasmaentladungssystem und verfahren zur verwendung davon Download PDF

Info

Publication number
EP3849282A1
EP3849282A1 EP20150850.4A EP20150850A EP3849282A1 EP 3849282 A1 EP3849282 A1 EP 3849282A1 EP 20150850 A EP20150850 A EP 20150850A EP 3849282 A1 EP3849282 A1 EP 3849282A1
Authority
EP
European Patent Office
Prior art keywords
electrode structure
plasma discharge
conductive coil
discharge system
voltage source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP20150850.4A
Other languages
English (en)
French (fr)
Inventor
Gergor Morfill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Terraplasma Emission Control GmbH
Original Assignee
Terraplasma Emission Control GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Terraplasma Emission Control GmbH filed Critical Terraplasma Emission Control GmbH
Priority to EP20150850.4A priority Critical patent/EP3849282A1/de
Publication of EP3849282A1 publication Critical patent/EP3849282A1/de
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc

Definitions

  • the invention relates to a plasma discharge system and a method for operating the plasma discharge system.
  • An electrical discharge can form between two electrodes when the resistance of the air or other medium in between the electrodes is overcome by a great enough potential difference between the electrodes.
  • Said electrical discharge can be set into motion through the influence of a magnetic field and by repeatedly passing through a specific area can form a type of "plasma layer".
  • WO 2017/021194 A1 describes methods and devices for producing plasma.
  • the apparatus for producing plasma requires at least a first electrode and a second electrode with a potential difference existing between them.
  • the potential difference produces a discharge path between said electrodes in a discharge region between them.
  • a magnetic field device is arranged such that a magnetic field vector is oriented at an angle to the discharge path. The magnetic field sets the discharge path into motion within the discharge region.
  • plasma refers to an ionized gas comprising positive ions and free electrons.
  • a plasma apparatus is understood to be an apparatus capable of producing plasma.
  • plasma discharge and “electrical discharge” may be used interchangeably.
  • the invention relates to a plasma discharge system comprising a voltage source, a conductive coil electrically connected to the voltage source and being configured to generate a magnetic field when an electric current is flowed therethrough, a first electrode structure electrically connected to the voltage source, and a second electrode structure positioned apart from the first electrode structure, the second electrode structure being electrically connected to the voltage source so as to create a potential difference between the first and second electrode structures such that at least one electrical discharge occurs in between the first and the second electrode structures, wherein the conductive coil, the first electrode structure and the second electrode structure are positioned such that the magnetic field exerts a force on the electrical discharge, and wherein the conducive coil is electrically connected in series with the first and/or the second electrode structure.
  • the magnetic field exerts a force on the electrical discharge such that the discharge is set into motion, more preferably such that it rotates.
  • the conductive coil as provided in the present invention is a type of electromagnet, commonly known as a solenoid.
  • a magnetic field is generated in the vicinity of the conductive coil. This magnetic field can be used to propel the electrical discharge.
  • Connecting the conductive coil electrically to the first and/or the second electrode structures allows for the conductive coil and the electrical discharge to then be connected in series.
  • the speed with which the electrical discharge is propelled by the magnetic field is dependent on the strength of the current in the electrical discharge and the strength of the magnetic field as generated by the current in the conductive coil. As these features are arranged in series, the current flowing through both the electrical discharge and the conductive coil is the same. Thus by increasing the current through the electrical circuit, the speed of migration of the electrical discharge is duly increased.
  • the conductive coil has a coil resistance which limits the maximum current of the plasma discharge system. As the coil resistance tends to pose the greatest resistance in the series circuit, the coil resistance can be the dominant factor in determining current strength.
  • the serial connection of the coil with the first and/or the second electrode structure thus provides a simple and economical manner of adjusting the current strength via the coil.
  • the first electrode structure and/or the second electrode structure are positioned radially inside the conductive coil.
  • a conductive coil creates a magnetic field both within the coil and outside of the coil, the greatest magnetic flux and the magnetic field lines closest to parallel can be present through the center of the coil.
  • Such arrangement of the first electrode structure and/or the second electrode structure thus allows for an efficient use of the magnetic flux.
  • the first electrode structure and/or the second electrode structure are centered about a longitudinal axis, with the first electrode structure extending at least partially around the second electrode structure.
  • the first electrode structure comprises a cylinder electrode centered about the longitudinal axis and/or the second electrode structure comprises a wire or pin electrode aligned along the longitudinal axis.
  • the second electrode structure further comprises a cylinder electrode centered about the longitudinal axis and spaced apart from the first electrode structure.
  • Such electrode shapes conform to the geometry of the conductive coil and may provide the greatest utilization of the magnetic field within the center of the conductive coil.
  • the voltage source, the conductive coil, the first electrode structure, the electrical discharge, and the second electrode structure form a circuit. While this need not be the case, providing said elements within a single circuit can allow for the greatest degree of control over the current and may simplify the operation and construction of the plasma discharge apparatus.
  • the conductive coil may be formed by using one or more wires having any type of cross section, e.g. round, square, oval or rectangular. Without wanting to be bound by theory, it is believed that a flat wire, wherein the flat wire has a width to height ratio greater than 1, more preferably with a width to height ratio greater than 5, and even more preferably with a width to height ratio greater than 9 may provide advantages in the context of the invention. Such wire may have, for example, a rectangular or oval cross section.
  • the resistance of the conductive coil has an inverse relationship with the cross sectional area of the conductive wire forming the coil. Thus, by increasing the cross sectional area of the wires, lower resistance values for the conductive coil can be obtained.
  • the plasma discharge system can comprise low resistance conductive wires.
  • the low resistance conductive wires comprise copper and/or silver. Lowering resistance of the conductive wires aids in lowering the overall resistance of the conductive coil.
  • the magnetic field has a magnetic field strength of at least 0.1 Tesla, at least 0.2 Tesla or at least 0.3 Tesla. More preferably, the magnetic field has a magnetic field strength of between 0.1 Tesla and 10 Tesla, more preferably between 0.2 Tesla and 2 Tesla, and even more preferably between 0.3 Tesla and 1.0 Tesla. Such magnetic field strength values may be sufficient to propel the electrical discharge with sufficient speed within the discharge area.
  • the plasma discharge system further comprises a discharge gap between the first and second electrode structures.
  • the discharge gap can comprise a gap resistance that depends at least in part on a width of the discharge gap and/or the potential difference.
  • the gap resistance may be at least 1 kOhm, at least 10 kOhm or at least 15 kOhm.
  • the gap resistance may be 100 kOhm or less, more preferably 50 kOhm or less and even more preferably 25 kOhm or less.
  • the gap resistance is between 1 kOhm and 100 kOhm. More preferably the gap resistance is between 10 kOhm and 50 kOhm. Even more preferably the gap resistance is between 15 kOhm and 25 kOhm.
  • the plasma discharge system can further comprise a discharge gap with a gap resistance between the first and second electrode structures.
  • the gap resistance depends at least in part on a width of the discharge gap, the width may be 10 cm or less, preferably 8 cm or less, or more preferably 5 cm or less or 3 cm or less. Small gap widths reduce the resistance of the electrical discharge.
  • the electrical discharge comprises a current greater than 20 mA, more preferably greater than 50 mA, and even more preferably greater than 100 mA. Said current values may be helpful for achieving the desired magnetic field strength within the conductive coil.
  • the conductive coil has a resistance of at least 1 kOhm, at least 10 kOhm, or at least 15 kOhm.
  • the conductive coil has a resistance of 100 kOhm or less, more preferably 50 kOhm or less, and even more preferably 25 kOhm or less.
  • the conductive coil may have a resistance of between 1 kOhm and 100 kOhm, more preferably between 10 kOhm and 50 kOhm, and even more preferably between 15 kOhm and 25 kOhm.
  • Resistance values within the conductive coil may be the dominant resistance present within the plasma discharge apparatus. Resistance values within these ranges can ensure that large enough current values are reached both within the electrical discharge and through the conductive coil.
  • the conductive coil may have a number of turns, wherein the magnetic field strength of the magnetic field and a coil resistance of the conductive coil partially depend on the number of turns. Reducing the number of turns may decrease resistance within the coil, but also may decrease the strength of the magnetic field within the conductive coil.
  • the coil comprises at least 1x10 4 turns, more preferably at least 1x10 5 turns, even more preferably at least 2x10 5 turns.
  • the coil comprises less than 1x10 7 turns, more preferably less than 1x10 6 turns, even more preferably less than 5x10 5 turns.
  • the coil may have at least 1x10 5 turns/m, more preferably at least 1x10 6 turns/m, even more preferably at least 5x10 6 turns/m.
  • the voltage source is configured to supply a voltage of at least 1 kV, more preferably at least 2 kV, and even more preferably at least 4 kV. Said voltage (potential difference) values may be sufficient to drive a large enough current through the plasma discharge apparatus such that an electrical discharge is initiated and the magnetic field strength drives the electrical discharge at sufficient speed within the discharge area.
  • the plasma discharge system is suitable for operations at a temperature of 350 °C or higher, more preferably at a temperature of 900 °C or higher, and even more preferably at a temperature of 1500 °C or higher.
  • a plasma discharge system suited for higher operation temperatures allows for contact with heated gases or exhaust without detriment to the plasma discharge system.
  • the coil may have an inner diameter of at least 2 cm, preferably at least 3 cm. Furthermore, the coil may have an inner diameter of less than 30 cm, preferably less than 15 cm, more preferably less than 10 cm, even more preferably less than 7 cm.
  • the plasma discharge system may be configured to receive a flow of exhaust particles between the first and second electrode structures such that a portion of the exhaust particles is excited, disassociated, and/or ionized through contact with the electrical discharge. By contacting these particles with the electrical discharge (plasma discharge) the exhaust particles can be reduced to less harmful components and thereby rendered less environmentally damaging and/or toxic.
  • the invention relates to a method for operating a plasma discharge system, wherein the method comprises at least the following steps: providing a voltage source, a conductive coil, a first electrode structure, and a second electrode structure; electrically connecting the voltage source to the conductive coil, the first electrode structure, and the second electrode structure, wherein the conductive coil is connected in series with the first and/or the second electrode structure; operating the voltage source to generate an electrical discharge between the first and the second electrode structures to induce a magnetic field around the conductive coil, wherein the magnetic field is oriented so as to exert a force on the electrical discharge.
  • the plasma discharge system may comprise any of the features described for the plasma discharge system according to the first aspect of the invention above.
  • the method further comprises the steps of positioning the first and/or second electrode structure radially inside of the conductive coil.
  • the method further comprises the step of flowing exhaust particles between the first and second electrode structures such that a portion of the exhaust particles is excited, disassociated, and /or ionized through contact with the electrical discharge.
  • the voltage source may be configured to provide a pulsed electrical current.
  • the pulsed electrical current may have a period between 10 and 1000 milliseconds, preferably between 100 and 500 milliseconds, and/or a period of at least 10 milliseconds, at least 50 milliseconds, or at least 100 milliseconds.
  • the voltage source may provide a pulsed electrical current having a duty cycle of at most 0.7 or at most 0.5.
  • the duty cycle may be between 0.7 and 0.05, preferably between 0.5 and 0.1.
  • Fig. 1 depicts a plasma discharge system 100 according to the present invention.
  • the plasma discharge system 100 includes a voltage source 110, a conductive coil 120, a first electrode structure 130, and a second electrode structure 140.
  • the voltage source 110 may be any type of voltage source, such as a battery or an electrical outlet.
  • the voltage source 110 may comprise further electrical components (not shown), for example components to regulate the voltage and/or current output by the voltage source 110.
  • the voltage source 110 drives a current through the system 100 and is electrically connected with the conductive coil 120, the first electrode structure 130, and the second electrode structure 140. Specifically, the conductive coil 120 is connected in series with the first and/or second electrode structures 130, 140.
  • FIG. 1 One example of this system 100 is illustrated in Fig. 1 , wherein the direction of flow of the current originating at the voltage source 110 is indicated by the white arrows.
  • the current may first flow into the first end 122 of the conductive coil 120.
  • the current travels the length of the coil 120 and then emerges from the second end 124 of the conductive coil 120, the current may then flow into the first electrode structure 130 which is placed radially within the conductive coil 120.
  • the potential difference between the first electrode structure 130 and the second electrode structure 140 is great enough to overcome the resistance of the medium in between.
  • the medium between the first and second electrode structures 130, 140 experiences dielectric breakdown and an electrical discharge 135 bridges the gap between the first electrode structure 130 and the second electrode structure 140.
  • the electrical current After passing through the second electrode structure 140, the electrical current travels along the electrical connection back to the voltage source 110, thereby forming a closed current loop.
  • the voltage source 110, the conductive coil 120, the first electrode structure 130, and the second electrode structure 140 may form a circuit.
  • the direction of the current may also be reversed and still achieve the same functioning principles.
  • the invention is not limited to this particular serial connection, but the order of the above-mentioned elements in the circuit may be changed.
  • the coil 120 is electrically conductive and can also be referred to as a solenoid.
  • the conductive coil 120 defines a longitudinal axis A of the plasma discharge system 100 through the center of the coil 120. Due to the shape, the conductive coil 120 creates a magnetic field 125 extending around the coil 120 and through the center of the coil 120 when an electrical current is flowed therethrough.
  • the magnetic field 125 may be substantially parallel to the longitudinal axis A in the center of the coil 120 and is directional.
  • the magnetic north pole of the magnetic field 125 would be proximal to the first end 122 of the conductive coil 120. If the conductive coil 120 were wound in a clockwise direction (when viewed from the first end 122 side), then the magnetic north pole N would be on the second end side 124. If the direction of the electrical current were reversed, the magnetic poles of the magnetic field 125 would be similarly reversed.
  • the conductive coil 120 has an electrical resistance. This coil resistance may, in many cases, be the greatest resistance within the plasma discharge system 100. As such, the coil resistance may operate as a type of regulator of the maximum current flowing through the plasma discharge system 100. The coil resistance may be within the range of 1 kOhm and 100 kOhm, preferably between 10 kOhm and 50 kOhm, and more preferably between 15 kOhm and 25 kOhm.
  • the conductive coil 120 comprises a number of turns N. Generally, the strength of the magnetic field 125 and the coil resistance are dependent on the number of turns N.
  • the first electrode structure 130 and the second electrode structure 140 may be placed anywhere within the magnetic field 125, however, they are preferably provided in an area of the magnetic field wherein the magnetic field lines are substantially parallel, which may be proximate the outer surface of the coil 120 or more preferably within the coil 120.
  • the first electrode structure 130 may be elongated parallel to the longitudinal axis A of the conductive coil 120.
  • Fig. 1 illustrates one example configuration of the first and second electrode structures 130, 140.
  • the first electrode structure 130 may be a hollow conductive cylinder or ring positioned within at least a portion of the conductive coil 120. It may be advantageous in some circumstances to center the first electrode structure 130 longitudinally within the conductive coil 120 without extending all of the way to the first end 122 or the second end 124 of the coil 120. In this way, edge effects of the magnetic field 125 may affect the first electrode structure 130 less.
  • the second electrode structure 140 may be a pin electrode elongated parallel to the longitudinal axis A of the conductive coil.
  • the second electrode structure 140 may also be a cylinder electrode, but preferably with a smaller radius than the first electrode structure 130.
  • the second electrode 140 may be a hollow cylinder, similar to the first electrode structure 130, or it may be a solid cylinder electrode.
  • the second electrode structure 140 is positioned radially inside of the first electrode structure 130, preferably aligned along the longitudinal axis A.
  • Fig. 2 shows a schematic cross-section of one configuration of the plasma discharge system 100.
  • the conductive coil 120 is centered about the longitudinal axis A and may be positioned radially outside of the first and second electrode structures 130, 140.
  • the magnetic field 125 generated by the conductive coil 120 may be substantially parallel to the longitudinal axis A in the longitudinal center of the conductive coil 120, and, as shown in Fig. 2 , may extend into the page.
  • the first electrode structure 130 is preferably positioned radially inside of the conductive coil 120 and, more preferably, centered about the longitudinal axis A.
  • electrical insulation is provided in the space between the conductive coil 120 and the first electrodes structure 130.
  • the second electrode structure 140 is preferably positioned radially inside of the first electrode structure 130 and may be aligned along the longitudinal axis A. As shown in Fig. 2 , during operation of the plasma discharge system 100 an electrical discharge 135 is initiated between the first electrode structure 130 and the second electrode structure 140. It may also be possible or even preferable to have more than one electrical discharge 135 operating simultaneously between the first electrode structure 130 and the second electrode structure 140. As the electrical discharge 135 is positioned within the magnetic field 125 and the magnetic field lines form an angle with regards to the electrical discharge 135, i.e. the magnetic field lines and the electrical discharge 135 are not parallel, the magnetic field 125 exerts a Lorentz force on the electrical discharge 135.
  • Said Lorentz force is oriented in a direction perpendicular to the magnetic field 125 and roughly perpendicular to the electrical discharge 135, consequently setting the electrical discharge 135 into motion within the space between the first electrode structure 130 and the second electrode structure 140.
  • the electrical discharge 135 will migrate around the longitudinal axis A either in a clockwise direction or counter-clockwise direction depending on the orientation of the magnetic field 125, as indicated by the white arrow. More specifically, the electrical discharge 135 will rotate.
  • the one or more electrical discharges 135 will travel clockwise around the longitudinal axis A of the plasma discharge system 100.
  • the area between the first electrode structure 130 and the second electrode structure 140 through which the electrical discharge 135 repeatedly passes can be referred to as the discharge area.
  • the electrical discharge 135 may also be referred to as a plasma discharge.
  • the electrical discharge 135 can be thought of as creating a plasma layer within the conductive coil 120.
  • the distance between the first electrode structure 130 and the second electrode structure 140 is referred to herein as a discharge gap G.
  • the size of the discharge gap G affects the amount of resistance posed by the material between the first electrode structure 130 and the second electrode structure 140. Consequently, it is preferred that the gap distance G is 5 cm or less, more preferably that the gap distance is 4 cm or less, and even more preferably that the gap distance is 3 cm or less. Reducing the gap distance G reduces the resistance experienced by the electrical discharge 135, but may also effectively reduce the discharge area and the area of the plasma layer.
  • the gap resistance be between 1 kOhm and 100 kOhm, more preferably between 10 kOhm and 50 kOhm, and even more preferably between 15 kOhm and 25 kOhm, wherein said gap resistance is determined by the medium in between the first and second electrode structures 130, 140 as well as the gap distance G.
  • an electrical discharge 135 which comprises a current greater than 20 mA, more preferably a current greater than 50 mA, and even more preferably greater than 100 mA.
  • the voltage source may be configured to provide a voltage of at least 1 kV, preferably at least 2 kV, more preferably at least 4 kV. Said potential difference may be sufficient to overcome the gap resistance.
  • the voltage source may be configured to provide a pulsed or intermittent potential difference.
  • the plasma discharge may continue to provide an ionizing/dissociating effect within the discharge region for a time after being terminated.
  • this plasma "afterglow" can potentially be utilized to reduce overall power requirements of the plasma apparatus and the temperature of gases flowing through the plasma apparatus could potentially be lowered.
  • the voltage source may then be configured to provide a pulsed electrical current having a period between 10 and 1000 milliseconds, or preferably between 100 and 500 milliseconds.
  • the voltage source may also be configured to provide a pulsed electrical current having a duty cycle between 0.7 and 0.05, preferably between 0.5 and 0.1.
  • the plasma discharge system 100 can be configured to allow for a flow of gas containing unwanted particles therethrough, such that the particles pass through the plasma layer.
  • the conductive coil 120 and/or the first electrode structure 130 may act as a type of tube or passageway through which the flow of particles can be guided.
  • the passageway may have an outer diameter of at least 2 cm, preferably at least 3 cm and/or less than 30 cm, preferably less than 15 cm.
  • the unwanted particles may be the result of combustion processes.
  • the gas passing through the plasma discharge system 100 may be at high temperatures due to the combustion process.
  • the plasma discharge system 100 may be suitable for operating at temperatures of 350 °C or higher, preferably 900 °C or higher, or more preferably at a temperature of 1500 °C or higher. Suitability for use at said temperatures may be influenced by the type of materials used including the material specifically used for the conductive coil 120.
  • the plasma discharge system 100 preferably produces a plasma layer created by the repeated passage of the electrical discharge 135.
  • the conductive coil 120 has a resistance of between 1 kOhm and 100 kOhm, more preferably between 10 kOhm and 50 kOhm, and even more preferably between 15 kOhm and 25 kOhm.
  • L inductance measured in Henries
  • ⁇ 0 is the permeability of free space
  • N is the number of turns
  • A is the discharge area in m 2
  • l is the longitudinal length of the conductive coil.
  • the coil 120 is configured to supply a magnetic field 125 comprising a magnetic field strength of between 0.1 Tesla and 10 Tesla, more preferably between 0.2 Tesla and 2.0 Tesla, and even more preferably between 0.3 Tesla and 1.0 Tesla.
  • One advantageous configuration of the conductive coil 120 is to form the conductive coil 120 using flat wires, i.e. wires which do not have a circular cross-section, but instead have a certain width to height ratio. This width/height ratio is preferably greater than 1, more preferably greater than 5, and even more preferably greater than 9. Such a flat wire may provide a increased cross-sectional wire area while avoiding or reducing an increase in the mean winding radius of the coil.
  • Another way to lower the resistance of the conductive coil 120 is by using a low resistance material.
  • One possible low resistance material is silver, which has a resistivity of ⁇ ⁇ 1.55 ⁇ 10 -8 ohm-meters.
  • One preferred configuration of the plasma discharge system 100 is to provide a magnetic field in the range of 0.1 to 0.5 Tesla, more preferably 0.2 to 0.4 Tesla. Given the above equations, this would yield a resistance of around 23.6 kOhm.
  • the method includes providing a voltage source 110, a conductive coil 120, a first electrode structure 130, and a second electrode structure 140.
  • the voltage source would be connected to the conductive coil 120, the first electrode structure 130, and the second electrode structure 140, while connecting them in a way so that conductive coil is arranged in series with the first and/or second electrode structure.
  • the voltage source 110 can be operated to generate an electrical discharge 135 and to simultaneously induce a magnetic field proximate the conductive coil 120.
  • the magnetic field 125 will then exert forces on the electrical discharge 135.
  • the first and/or second electrodes are positioned within the magnetic field 125 created by the conductive coil 120, in a location where the magnetic field lines are substantially parallel.
  • particles may then be flowed through the apparatus 100 in the discharge region in between the first electrode structure 130 and the second electrode structure 140. Said particles, upon passing through the plasma layer, may become excited, disassociated and/or ionized.
EP20150850.4A 2020-01-09 2020-01-09 Plasmaentladungssystem und verfahren zur verwendung davon Withdrawn EP3849282A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP20150850.4A EP3849282A1 (de) 2020-01-09 2020-01-09 Plasmaentladungssystem und verfahren zur verwendung davon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20150850.4A EP3849282A1 (de) 2020-01-09 2020-01-09 Plasmaentladungssystem und verfahren zur verwendung davon

Publications (1)

Publication Number Publication Date
EP3849282A1 true EP3849282A1 (de) 2021-07-14

Family

ID=69156265

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20150850.4A Withdrawn EP3849282A1 (de) 2020-01-09 2020-01-09 Plasmaentladungssystem und verfahren zur verwendung davon

Country Status (1)

Country Link
EP (1) EP3849282A1 (de)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3361927A (en) * 1963-04-22 1968-01-02 Giannini Scient Corp Plasma generating apparatus having an arc restricting region
US4626648A (en) * 1985-07-03 1986-12-02 Browning James A Hybrid non-transferred-arc plasma torch system and method of operating same
US5949193A (en) * 1995-10-11 1999-09-07 Valtion Teknillinen Tutkimuskeskus Plasma device with resonator circuit providing spark discharge and magnetic field
DE102006019664A1 (de) * 2006-04-27 2007-10-31 Institut für Niedertemperatur-Plasmaphysik e.V. an der Ernst-Moritz-Arndt-Universität Greifswald Kaltplasma-Handgerät zur Plasma-Behandlung von Oberflächen
DE102006027853A1 (de) * 2006-06-16 2007-12-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines Plasmas sowie Verwendung derselben
EP2639330A1 (de) * 2010-11-08 2013-09-18 National Science Center Kharkov Institute Of Physics and Technology (NSC KIPT) Verfahren und vorrichtung zum transport von vakuumbogenplasma
WO2017021194A1 (de) 2015-08-06 2017-02-09 Terraplasma Gmbh Vorrichtung und verfahren zum erzeugen eines plasmas, sowie verwendung einer solchen vorrichtung
CN109640503A (zh) * 2018-12-21 2019-04-16 西安航天动力研究所 一种高效长寿命宽功率范围的直流电弧等离子体炬

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3361927A (en) * 1963-04-22 1968-01-02 Giannini Scient Corp Plasma generating apparatus having an arc restricting region
US4626648A (en) * 1985-07-03 1986-12-02 Browning James A Hybrid non-transferred-arc plasma torch system and method of operating same
US5949193A (en) * 1995-10-11 1999-09-07 Valtion Teknillinen Tutkimuskeskus Plasma device with resonator circuit providing spark discharge and magnetic field
DE102006019664A1 (de) * 2006-04-27 2007-10-31 Institut für Niedertemperatur-Plasmaphysik e.V. an der Ernst-Moritz-Arndt-Universität Greifswald Kaltplasma-Handgerät zur Plasma-Behandlung von Oberflächen
DE102006027853A1 (de) * 2006-06-16 2007-12-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines Plasmas sowie Verwendung derselben
EP2639330A1 (de) * 2010-11-08 2013-09-18 National Science Center Kharkov Institute Of Physics and Technology (NSC KIPT) Verfahren und vorrichtung zum transport von vakuumbogenplasma
WO2017021194A1 (de) 2015-08-06 2017-02-09 Terraplasma Gmbh Vorrichtung und verfahren zum erzeugen eines plasmas, sowie verwendung einer solchen vorrichtung
CN109640503A (zh) * 2018-12-21 2019-04-16 西安航天动力研究所 一种高效长寿命宽功率范围的直流电弧等离子体炬

Similar Documents

Publication Publication Date Title
US8188401B2 (en) Wire electric discharge machining apparatus
JP5025797B2 (ja) 誘導加熱方法
US9820369B2 (en) Method and apparatus for providing high control authority atmospheric plasma
JP2003511640A (ja) 静電的流体加速装置
US20130026917A1 (en) Ion focusing in a hall effect thruster
EP1833766A1 (de) Verfahren und vorrichtung zur behandlung von fluiden
EP3018981B1 (de) Magnetisierte koaxiale plasmaerzeugungsvorrichtung
JPH04254580A (ja) マグネトロン陰極を用いた基板のコーティング法および装置
CN110486243A (zh) 一种微阴极电弧推进系统
NL2008208C2 (en) Spark ablation device.
JP5899205B2 (ja) 高効率な磁気走査システム
EP3849282A1 (de) Plasmaentladungssystem und verfahren zur verwendung davon
EP1662848B1 (de) Elektromagnetisch induzierter Beschleuniger auf der Basis einer Spulenmodulation
US9415127B2 (en) Plasma treatment method
KR20090107548A (ko) 정전기 가스 펌프용 윤곽을 갖는 전극
CN101952931B (zh) 丝极放电离子源
RU143138U1 (ru) Управляемый вакуумный разрядник
EP3849284A1 (de) Plasmaentladungsvorrichtung und verfahren zur verwendung davon
Wenzheng et al. Study of ionic wind based on dielectric barrier discharge of carbon fiber spiral electrode
CN114023527B (zh) 一种基于磁化线圈的多极磁化方法
JP2001284100A (ja) 交流電磁石
EP3768048B1 (de) Plasmareaktor mit dielektrischer barriereentladung und verfahren zur plasmaverstärkten dampfabscheidung
JP4182541B2 (ja) 発電装置
JPH0729681A (ja) アーク加熱器
CN114540903A (zh) 一种热电化学氧化的调控方法

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20220115