EP3792625A1 - Appareil sous vide, équipement et procédé de surveillance d'un dépôt de sous-produits - Google Patents

Appareil sous vide, équipement et procédé de surveillance d'un dépôt de sous-produits Download PDF

Info

Publication number
EP3792625A1
EP3792625A1 EP20195655.4A EP20195655A EP3792625A1 EP 3792625 A1 EP3792625 A1 EP 3792625A1 EP 20195655 A EP20195655 A EP 20195655A EP 3792625 A1 EP3792625 A1 EP 3792625A1
Authority
EP
European Patent Office
Prior art keywords
vacuum
surface acoustic
piezo
circumferential surface
acoustic waves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20195655.4A
Other languages
German (de)
English (en)
Inventor
Hisanori Kambara
Pascal Wielsch
Maximilian Birkenfeld
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pfeiffer Vacuum GmbH
Pfeiffer Vacuum SAS
Original Assignee
Pfeiffer Vacuum GmbH
Pfeiffer Vacuum SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pfeiffer Vacuum GmbH, Pfeiffer Vacuum SAS filed Critical Pfeiffer Vacuum GmbH
Publication of EP3792625A1 publication Critical patent/EP3792625A1/fr
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/04—Analysing solids
    • G01N29/07—Analysing solids by measuring propagation velocity or propagation time of acoustic waves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
    • F04D27/001—Testing thereof; Determination or simulation of flow characteristics; Stall or surge detection, e.g. condition monitoring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/04—Analysing solids
    • G01N29/11—Analysing solids by measuring attenuation of acoustic waves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2260/00—Function
    • F05D2260/60—Fluid transfer
    • F05D2260/607—Preventing clogging or obstruction of flow paths by dirt, dust, or foreign particles
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/02—Indexing codes associated with the analysed material
    • G01N2291/025—Change of phase or condition
    • G01N2291/0255—(Bio)chemical reactions, e.g. on biosensors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/02—Indexing codes associated with the analysed material
    • G01N2291/025—Change of phase or condition
    • G01N2291/0256—Adsorption, desorption, surface mass change, e.g. on biosensors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/04—Wave modes and trajectories
    • G01N2291/042—Wave modes
    • G01N2291/0423—Surface waves, e.g. Rayleigh waves, Love waves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/04—Wave modes and trajectories
    • G01N2291/042—Wave modes
    • G01N2291/0425—Parallel to the surface, e.g. creep waves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/04—Wave modes and trajectories
    • G01N2291/042—Wave modes
    • G01N2291/0427—Flexural waves, plate waves, e.g. Lamb waves, tuning fork, cantilever
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/26—Scanned objects
    • G01N2291/263—Surfaces
    • G01N2291/2634—Surfaces cylindrical from outside

Definitions

  • the present invention relates to a vacuum apparatus to be placed under vacuum.
  • the invention also relates to a vacuum pump and to an equipment for semiconductor or thin film deposition processes.
  • the invention also relates to a method for monitoring a deposition of by-products.
  • the process gases comprise aggressive substances which may react with the metallic parts of the vacuum pump, especially at the exhaust.
  • the reactive halogens like SF 6 , Cl 2 or HBr
  • acid gases used in said applications might cause corrosion inside the vacuum pump and might have a very negative influence on the performance of the vacuum system.
  • This deposition may occur in all parts in contact with process gas.
  • the high pressure section of the turbomolecular pump has more favorable condition to accumulate undesired deposition. This could also be found in other parts of the vacuum system like in the roughing vacuum pump or in the vacuum piping line.
  • the deposition involves a reduction of the size of the pathway and thus, an increase in pressure which can cause, in a cascade effect, even more by-product deposition.
  • a first known method consists in monitoring the motor current of the vacuum pump in order to determine a possible presence of by-product affecting the pumping performance.
  • the evolution of the motor current or magnetically levitated rotor positions may provide information on the amount of deposits in the vacuum pumps.
  • this strategy might be not accurate enough to determine the amount or the nature of the deposited materials.
  • One of the objectives of the present invention is therefore to propose a device or a method for monitoring the deposition of by-products that solve at least partially one of the previous above mentioned disadvantages.
  • the subject of the invention is a vacuum apparatus comprising a vacuum enclosure having a circumferential surface and an inner volume to be placed under vacuum characterized in that it further comprises:
  • the conductance of the vacuum enclosure is not affected by the guided surface acoustic waves device as it is arranged outside of the vacuum enclosure. It is a non-invasive measurement technology which therefore has no impact in terms of functionality and performance. Moreover, it can thus be possible to determine information of the by-products deposition without necessarily knowing in advance the composition of the deposit.
  • the signal received by the piezo electric transducer receiver only contains surface acoustic wave that propagate through the circumferential surface of the vacuum enclosure. Any wave transmission through the inner volume of the vacuum apparatus can be completely neglected throughout the whole measurement procedure, because no signal transmission might occur due to the low pressure inside the vacuum enclosure.
  • the vacuum apparatus is miniaturized so that it may be implemented everywhere in the vacuum line and separated from its electronics which might be connected via appropriate cables. The vacuum apparatus is thus highly flexible in its application and place of operation.
  • the vacuum apparatus can also have one or more of the features described below, taken individually or in combination.
  • the at least one piezo-electric transducer might be made of piezoceramic material. It is therefore made of high temperature resistant material. Thereby the guided surface acoustic waves device, mounted for example directly on the exhaust pipe of a vacuum pump can be operated at high temperatures.
  • the vacuum enclosure might be of tubular shape.
  • the piezo-electric transducers might be positioned on opposite locations on the outer diameter of the tube.
  • the piezo-electric transducer emitter might be configured to excite circumferential surface acoustic waves in opposite directions around the tube that arrive at piezo-electric transducer receiver.
  • a parameter of a surface acoustic wave propagating between said piezo-electric transducers might be the transmission time.
  • At least one additional parameter of the surface acoustic wave might be chosen among the wave transmission velocity and/or the amplitude and/or the pattern of a surface acoustic wave.
  • Said piezo-electric transducers might be configured to excite circumferential surface acoustic waves with a wavelength corresponding to a Lamb wave type.
  • the Lamb-type wave is mainly the antisymmetric type which might be the most suitable mode to be used here for the vacuum apparatus.
  • the control unit might be configured to also receive information of the temperature of the vacuum enclosure.
  • Another object of the invention is a vacuum pump, such as a turbomolecular pump or a rough vacuum pump characterized in that it comprises at least one vacuum apparatus as previously described.
  • the at least one vacuum apparatus might be arranged at the exhaust of the vacuum pump.
  • Another object of the invention is a vacuum line characterized in that it comprises at least one vacuum apparatus as previously described.
  • the vacuum line might comprises :
  • Another object of the present invention is an equipment for semiconductor or coating processes, comprising a process chamber configured to receive and process at least one substrate, wherein the process chamber is connected to a vacuum line as previously described.
  • Another object of the present invention is a method for monitoring a deposition of by-products using a vacuum apparatus as previously described, wherein a variation of at least one parameter of a surface acoustic wave of a guided surface acoustic waves device propagating along the circumferential surface of the vacuum enclosure is monitored to detect a by-products deposition on the inner surface of the circumferential surface and/or to determine the properties of the by-product deposition.
  • the variation of at least one parameter of a surface acoustic wave propagating along the circumferential surface of the vacuum enclosure might be monitored for only one passage of the surface acoustic waves in front of the piezo-electric transducer receiver.
  • the variation of at least one parameter of a surface acoustic wave propagating along the circumferential surface of the vacuum enclosure might be monitored for at least two successive passages of the surface acoustic waves in front of the piezo-electric transducer receiver.
  • the different signal transmission times for various layer thicknesses can be summed up after each passage in order to help detecting layer thicknesses down to smaller values.
  • the presence and thickness of the by-product deposition can be better determined based on the varying transmission times of the circumferential surface acoustic waves in more than one passage.
  • by-product material characteristics like Young's modulus can also be determined.
  • the range of by-products can vary from polymer like materials to salt like materials and therefore the transmission time and attenuation of the signal - received by the piezo-electric transducer - may also vary in a wide range.
  • the layer thickness and the material properties can thus be known with help of this non-invasive sensor technology.
  • the method might comprises a preliminary step of calibration in which the propagation of two surface acoustic waves is first analyzed on a clean vacuum enclosure.
  • Figure 1 shows an embodiment of an equipment 1 for semiconductor or coating processes.
  • the equipment 1 comprises a process chamber 2 configured to receive and process at least one substrate 3, such as a wafer in a semiconductor process or such as a flat panel display in a coating process.
  • the process chamber 2 is connected to a vacuum line 4 comprising at least one vacuum apparatus 5.
  • the by-product deposition reaction rate is related to the phase transition characteristic curve of the gas, where solidification rate is higher at higher pressure and lower temperature. This risk is higher at exhaust of the pump where the gas pressure is highest after the pump compression stage.
  • the vacuum apparatus 5 is preferably suitable for an use in high temperature application (more than 100 °C) and therefore, as it will be described later, the piezo-electric transducers themselves 20, 21 might be made up of high temperature resistant components.
  • the vacuum line 4 comprises a turbomolecular pump 6 whose inlet 7 is connected to the process chamber 2, and a rough-vacuum pump 8, whose inlet 9 is connected via a pipe 10 to the outlet 11 of the turbomolecular pump 6.
  • the turbomolecular pump 6 is mounted upstream and in series connection with the rough-vacuum pump 8. "Upstream" has to be understood according to the direction of the pumped gases (see arrows in figure 1 ).
  • the vacuum apparatus 5 may be arranged inside the turbomolecular pump 6, for example at the exhaust 12 of the turbomolecular pump 6, or on a pipe 10, arranged downstream of the outlet 11, between the turbomolecular pump 6 and the rough-vacuum pump 8.
  • the vacuum apparatus 5 can be connected to a dead-end pipe 13 arranged in front of a sensor 14 of the vacuum line 8, such as a pressure sensor.
  • the vacuum apparatus 5 can be connected at the inlet 9 or at the exhaust 15 of the rough-vacuum pump 8, inside the rough-vacuum pump 8 or outside, for example on a pipe of the vacuum line 4 downstream of an outlet 16 of the rough-vacuum pump 8.
  • the vacuum apparatus 5 comprises a vacuum enclosure 17 having a circumferential surface, such as for example a metallic wall, such as stainless steel, and an inner volume to be placed under vacuum, that is to say under a pressure below the atmospheric pressure.
  • a circumferential surface such as for example a metallic wall, such as stainless steel
  • the vacuum apparatus 5 further comprises at least one guided surface acoustic waves device 18 and a control unit 19.
  • the guided surface acoustic waves device 18 comprises at least a piezo-electric transducer 20, 21 for coupling surface acoustic waves on the circumferential surface and for detecting surface acoustic waves propagating along the circumferential surface.
  • the guided surface waves device 18 might comprises at least a piezo-electric transducer emitter 20 for coupling surface acoustic waves on the circumferential surface and at least a piezo-electric transducer receiver 21 for detecting surface acoustic waves propagating along the circumferential surface.
  • the surface acoustic waves emitted by the piezo-electric transducer emitter 20 can thus be detected by the piezo-electric transducer receiver 21.
  • the piezo-electric transducer emitter 20 and the piezo-electric receiver 21 are formed by only one piezo-electric transducer 20, 21 which is configured to be operated alternately as emitter or receiver.
  • the at least one piezo-electric transducer 20, 21 might be made of high temperature resistant material, such as a piezoceramic material as PIC 255.
  • the guided surface acoustic waves device 18, mounted for example directly on the exhaust pipe of a vacuum pump 6, 8, can be operated at high temperatures (> 100 °C).
  • the piezo-electric transducers 20, 21 are arranged outside of the vacuum enclosure 17, on the circumferential of the vacuum enclosure 17. Therefore, the method is non-invasive and do not create pressure or tightness losses.
  • the pumping capacity is not affected by the guided surface acoustic waves device 18.
  • the vacuum enclosure 17 may be of tubular shape.
  • the circumferential surface of the vacuum enclosure 17 might thus be cylindrical.
  • the vacuum enclosure 17 has for example a flange 22 that can be joined to another flange by a centering ring and an elastomeric O-ring gasket.
  • This vacuum flange standard can be the one used for forming the exhaust 12 of the turbomolecular pump 6, the opposite part 24 of the flange 22 being connected to a housing 25 of the turbomolecular pump 6.
  • the vacuum enclosure 17 is formed by the tube of the exhaust of the turbomolecular pump 6, without changing existing housings 25.
  • the control unit 19 is configured to control the at least one piezo-electric transducer 20, 21 to monitor a variation of at least one parameter of a surface acoustic wave propagating along the circumferential surface of the vacuum enclosure 17, between said piezo-electric transducers emitter 20 and receiver 21 to detect a by-products deposition 23 on the inner surface of the circumferential surface and/or to determine the properties of the by-product deposition 23 ( Figure 3B ).
  • the control unit 19 comprises one or more controllers or processors and a memory. It can be common to several pairs of piezo-electric transducer receiver 21 and emitter 20.
  • the at least one parameter of a surface acoustic wave propagating between said piezo-electric transducers 20, 21 can be chosen among the wave transmission velocity and/or the transmission time and/or the amplitude and/or the pattern of a surface acoustic wave.
  • the parameter used a main indicator is for example the time transmission.
  • Time shifts and possible amplitude changes can be observed due to the presence of a deposition of by-products 23 on the inner surface of the vacuum enclosure 17 with respect to a clean tube.
  • the thickness of the by-product deposition can be determined based on the varying transmission times of the circumferential surface acoustic wave.
  • the decreasing of the transmission time can be due to the increasing thickness of a deposition of by-products 23 for example.
  • the piezo-electric transducers 20, 21 When the vacuum enclosure 17 is of tubular shape and when there is two piezo-electric transducers 20, 21, the piezo-electric transducers 20, 21 might be positioned on opposite locations on the outer diameter of the tube (diametrically arranged) as it is shown in Figure 2 .
  • the piezo-electric transducer emitter 20 and the piezo-electric transducer receiver 21 are then positioned in circumferential direction around the vacuum enclosure 17, 180° opposite to each other.
  • the piezo-electric transducer emitter 20 might be configured to excite circumferential surface acoustic waves in opposite directions around the tube that arrive at piezo-electric transducer receiver 21 ( Figures 3A, 3B ).
  • the wavelength corresponds for example to a Lamb-type wave. Both surface acoustic waves should arrive at the piezo-electric transducer receiver 21 at the same time when the vacuum enclosure 17 is clean.
  • the Lamb-type wave is mainly the antisymmetric type which might be the most suitable mode to be used here for the vacuum apparatus 5.
  • the piezo-electric transducer 20 excites the surface acoustic waves for example with a frequency between 100 and 800 kHz. This value depends on the geometric configuration of the vacuum enclosure 17 and the characteristics of the by-products deposition 23. In addition, this excitation frequency and a tubular shape of the vacuum enclosure 17, favor the formation of Lamb-waves in circumferential directions. With help of these adjustments, the measurement accuracy down to several tenth of a Millimeter by-product layer thickness can be achieved.
  • the variation of at least one parameter of a surface acoustic wave propagating along the circumferential surface of the vacuum enclosure 17, between the piezo-electric transducer emitter 20 and the piezo-electric transducer receiver 21 can be monitored for just one passage C1 of the surface acoustic waves in front of the piezo-electric transducer receiver 21.
  • the variation of at least one parameter of a surface acoustic wave propagating along the circumferential surface of the vacuum enclosure 17, between the piezo-electric transducer emitter 20 and the piezo-electric transducer receiver 21 can be monitored for at least two passages C1, C2, C3 of the surface acoustic waves in front of the piezo-electric transducer receiver 21.
  • Multiple passages C1, C2, C3 of the guided surface acoustic waves can thus be taken into account, such as more than two passages.
  • the different signal transmission times for various layer thicknesses can be summed up after each passage in order to help detecting layer thicknesses down to smaller values.
  • This method is particularly effective with the configuration of two piezo-electric transducers 20, 21 positioned on opposite locations on the outer diameter of the tube.
  • Figure 4 shows an example of signals of the piezo-electric transducer receiver for three passages C1, C2, C3 of the guided surface acoustic waves without deposition (curve A) and with deposition (curve B).
  • This "multiple detection” may help to achieve a higher measurement accuracy in case of small by-product deposition (thickness ⁇ 0,3 mm). But when it comes to larger by-product deposition (thickness > 0,3 mm), only one signal circulation might be enough to measure a sufficient time shift of the received signal.
  • the transmission time is quite constant or slightly decreasing as the number of the passages C1-C3 increases for the clean vacuum enclosure 17 (curve A) while it increases with the number of passages C1-C3 for the vacuum enclosure 17 with by-product deposition 23 (curve B).
  • the presence and thickness of the by-product deposition 23 can be better determined based on the varying transmission times of the circumferential surface acoustic waves in more than one passage.
  • by-product material characteristics like Young's modulus can also be determined. Due to this, it will not be mandatory to know the precise material properties before the actual measurement and the guided surface acoustic waves device 18 is capable to determine the material with a sufficient accuracy.
  • the range of by-products can vary from polymer like materials to salt like materials and therefore the transmission time and attenuation of the signal - received by the piezo-electric transducer 21 - may also vary in a wide range. The layer thickness and the material properties can thus be known with help of this non-invasive sensor technology.
  • said piezo-electric transducers 20, 21 are configured to excite plane surface acoustic waves.
  • the piezo-electric transducers 20, 21 have a two-finger electrode structure to excite plane surface acoustic waves perpendicular to the electrode fingers.
  • the orientation of the piezo-electric transducers 20, 21 may be chosen such that they excite plane surface acoustic waves predominantly travelling circumferentially in both directions around the tube.
  • control unit 19 is configured to also receive information of the temperature of the vacuum enclosure 17. It is therefore possible to compensate the influence of temperature on the measurements to determine features of the deposition of by-products 23 deposited on the inner surface of the vacuum enclosure 17, independently of the temperature of the vacuum enclosure 17.
  • the method can comprise a preliminary step of calibration wherein the propagation of the two surface acoustic waves is first analyzed on a clean vacuum enclosure 17 ( Figure 3A ).
  • the piezo-electric transducers 20, 21 excite plane surface acoustic waves predominantly travelling circumferentially in both directions around the tube. Both surface acoustic waves should arrive at the piezo-electric transducer receiver 6 at the same time. At least one parameter of a surface acoustic wave propagating between said piezo-electric transducers 20, 21 chosen among the wave transmission velocity and/or the transmission time and/or the amplitude and/or the pattern of a surface acoustic wave, is recorded.
  • the piezo-electric transducers 20, 21 are controlled to monitor a variation of said at least one parameter of a surface acoustic wave propagating between said piezo-electric transducers 20, 21, to detect a by-products deposition on the inner surface of the vacuum enclosure 17 or to determine the properties of the by-product deposition.
  • the variation of the at least one parameter of a surface acoustic wave propagating along the circumferential surface of the vacuum enclosure 17 may be monitored for at least two successive passages of the surface acoustic waves in front of the piezo-electric transducer receiver 21.
  • the conductance of the vacuum enclosure 17 is not affected by the guided surface acoustic waves device 18 as it is arranged outside of the vacuum enclosure 17. It is a non-invasive measurement technology which therefore has no impact in terms of functionality and performance. Moreover, it can thus be possible to determine information of the by-products deposition 23 without necessarily knowing in advance the composition of the deposit.
  • the signal received by the piezo electric transducer receiver 21 only contains surface acoustic wave that propagate through the circumferential surface of the vacuum enclosure 17. Any wave transmission through the inner volume of the vacuum apparatus 5 can be completely neglected throughout the whole measurement procedure, because no signal transmission might occur due to the low pressure inside the vacuum enclosure 5.
  • the vacuum apparatus 5 is miniaturized so that it may be implemented everywhere in the vacuum line 4 and separated from its electronics which might be connected via appropriate cables. The vacuum apparatus 5 is thus highly flexible in its application and place of operation.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Acoustics & Sound (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Non-Positive Displacement Air Blowers (AREA)
EP20195655.4A 2019-09-16 2020-09-11 Appareil sous vide, équipement et procédé de surveillance d'un dépôt de sous-produits Pending EP3792625A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1910187A FR3100847B1 (fr) 2019-09-16 2019-09-16 Dispositif à vide et procédé de surveillance d’un dépôt de sous-produits de réaction

Publications (1)

Publication Number Publication Date
EP3792625A1 true EP3792625A1 (fr) 2021-03-17

Family

ID=68281743

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20195655.4A Pending EP3792625A1 (fr) 2019-09-16 2020-09-11 Appareil sous vide, équipement et procédé de surveillance d'un dépôt de sous-produits

Country Status (3)

Country Link
EP (1) EP3792625A1 (fr)
JP (1) JP2021075780A (fr)
FR (1) FR3100847B1 (fr)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06283449A (ja) * 1993-03-24 1994-10-07 Tokyo Electron Ltd 真空排気方法及び真空装置
US20030033870A1 (en) * 2001-05-08 2003-02-20 Shah Vimal V. Guided acoustic wave sensor for pipeline build-up monitoring and characterization
WO2018164013A1 (fr) * 2017-03-10 2018-09-13 エドワーズ株式会社 Système d'échappement de pompe à vide, pompe à vide devant être fournie à un système d'échappement de pompe à vide, dispositif d'alimentation en gaz de purge, unité de capteur de température et procédé d'échappement de pompe à vide

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06283449A (ja) * 1993-03-24 1994-10-07 Tokyo Electron Ltd 真空排気方法及び真空装置
US20030033870A1 (en) * 2001-05-08 2003-02-20 Shah Vimal V. Guided acoustic wave sensor for pipeline build-up monitoring and characterization
WO2018164013A1 (fr) * 2017-03-10 2018-09-13 エドワーズ株式会社 Système d'échappement de pompe à vide, pompe à vide devant être fournie à un système d'échappement de pompe à vide, dispositif d'alimentation en gaz de purge, unité de capteur de température et procédé d'échappement de pompe à vide

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
EL MOUSSAOUI M ET AL: "Guided wave attenuation due to deposits on the pipe wall", ULTRASONICS SYMPOSIUM, 2005 IEEE ROTTERDAM, THE NETHERLANDS 18-21 SEPT. 2005, PISCATAWAY, NJ, USA,IEEE, vol. 2, 18 September 2005 (2005-09-18), pages 1007 - 1010, XP010898978, ISBN: 978-0-7803-9382-0 *

Also Published As

Publication number Publication date
FR3100847B1 (fr) 2021-09-10
FR3100847A1 (fr) 2021-03-19
JP2021075780A (ja) 2021-05-20

Similar Documents

Publication Publication Date Title
US5625140A (en) Acoustic analysis of gas mixtures
JP5477051B2 (ja) 超音波流量計
CN1164912C (zh) 具有温度测量特征的过程流量板
US20150082912A1 (en) Ultrasonic flow meter
US8931520B2 (en) Pipe with integrated process monitoring
JPH07209264A (ja) 混合ガスの音響分析装置と方法
EP2920556A1 (fr) Système et procédé de comptage à ultrasons faisant appel à un raccord de compteur à orifice
US6899766B2 (en) Diagnosis method for semiconductor processing apparatus
JP2002520584A (ja) 誘導モードによる流量測定システム
JP2007010543A (ja) 酸化膜厚さ測定方法および装置
JP2007292762A (ja) トランスデューサアセンブリ
JP6502821B2 (ja) 弁シートリーク検査装置および弁シートリーク検査方法
US20170248487A1 (en) Pressure sensor state detection method and system
EP3792625A1 (fr) Appareil sous vide, équipement et procédé de surveillance d'un dépôt de sous-produits
JP3109161U (ja) ポンプ装置
AU2010258804A1 (en) Ultrasonic fluid flow meter housing with acoustically matched base
JP5083956B2 (ja) 詰まり検出システム
KR101956955B1 (ko) 기체 조성을 결정하기 위한 다중-챔버 음향 센서
CN111457257B (zh) 一种定位管路泄漏位置的检测方法及系统
US20190072087A1 (en) Gear pump and method for monitoring a gear pump
JP2005527985A (ja) プロセスチャンバ内の膜堆積をモニタするための方法と装置
JP3653668B2 (ja) 超音波センサの接触状態の確認方法、超音波センサの接触状態の確認機能を備えたプラズマ異常放電監視装置、及び、プラズマ処理装置
JP3646875B2 (ja) 超音波流量計
CN110553156A (zh) 管道超声导波压缩感知健康监测方法
JP2016015457A (ja) 基板処理装置及び基板処理方法

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20210831

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20221114

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20240704

RAP3 Party data changed (applicant data changed or rights of an application transferred)

Owner name: PFEIFFER VACUUM GMBH

Owner name: PFEIFFER VACUUM

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED