EP3764389A4 - Plasmaätzverfahren unter verwendung eines faraday-käfigs - Google Patents
Plasmaätzverfahren unter verwendung eines faraday-käfigs Download PDFInfo
- Publication number
- EP3764389A4 EP3764389A4 EP19827477.1A EP19827477A EP3764389A4 EP 3764389 A4 EP3764389 A4 EP 3764389A4 EP 19827477 A EP19827477 A EP 19827477A EP 3764389 A4 EP3764389 A4 EP 3764389A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- plasma etching
- etching method
- faraday box
- faraday
- box
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title 1
- 238000001020 plasma etching Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
- H01J37/32651—Shields, e.g. dark space shields, Faraday shields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/757—Moulds, cores, dies
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Micromachines (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180075361A KR102273084B1 (ko) | 2018-06-29 | 2018-06-29 | 파라데이 상자를 이용한 플라즈마 식각 방법 |
PCT/KR2019/007321 WO2020004854A1 (ko) | 2018-06-29 | 2019-06-18 | 파라데이 상자를 이용한 플라즈마 식각 방법 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP3764389A1 EP3764389A1 (de) | 2021-01-13 |
EP3764389A4 true EP3764389A4 (de) | 2021-05-12 |
EP3764389B1 EP3764389B1 (de) | 2024-01-10 |
Family
ID=68985123
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19827477.1A Active EP3764389B1 (de) | 2018-06-29 | 2019-06-18 | Plasmaätzverfahren unter verwendung eines faraday-käfigs |
Country Status (6)
Country | Link |
---|---|
US (1) | US11276563B2 (de) |
EP (1) | EP3764389B1 (de) |
JP (1) | JP7086415B2 (de) |
KR (1) | KR102273084B1 (de) |
CN (1) | CN111868892B (de) |
WO (1) | WO2020004854A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102060551B1 (ko) * | 2017-08-16 | 2020-02-11 | 주식회사 엘지화학 | 회절 격자 도광판용 몰드 기재의 제조방법 및 회절 격자 도광판의 제조방법 |
KR102527761B1 (ko) * | 2018-11-07 | 2023-04-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 경사 격자들의 형성 |
EP4020024A1 (de) | 2020-12-22 | 2022-06-29 | Paul Scherrer Institut | Verfahren zur herstellung einer fächerförmigen optik mit hohem aspektverhältnis |
CN113371677A (zh) * | 2021-05-28 | 2021-09-10 | 杭州探真纳米科技有限公司 | 法拉第笼刻蚀法大批量制备倾角补偿afm探针的方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3712927A1 (de) * | 2017-12-26 | 2020-09-23 | Lg Chem, Ltd. | Plasmaätzverfahren unter verwendung eines faraday-käfigs |
EP3730271A1 (de) * | 2018-06-20 | 2020-10-28 | Lg Chem, Ltd. | Verfahren zur herstellung einer form für eine beugungsgitterlichtleitplatte und verfahren zur herstellung einer beugungsgitterlichtleitplatte |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
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US4309267A (en) * | 1980-07-21 | 1982-01-05 | Bell Telephone Laboratories, Incorporated | Reactive sputter etching apparatus |
JP3111643B2 (ja) | 1992-06-09 | 2000-11-27 | ソニー株式会社 | ドライエッチング方法 |
JP3231165B2 (ja) * | 1993-11-15 | 2001-11-19 | キヤノン株式会社 | 光学素子成形用型及びその製造方法 |
JP3486287B2 (ja) | 1996-02-05 | 2004-01-13 | スピードファム株式会社 | プラズマエッチング装置 |
US5761053A (en) * | 1996-05-08 | 1998-06-02 | W. L. Gore & Associates, Inc. | Faraday cage |
KR100281241B1 (ko) * | 1998-11-19 | 2001-06-01 | 하대규 | 파라데이 상자의 윗면의 격자면을 변화시켜 플라즈마 식각을하는 방법 |
JP2002313732A (ja) | 2001-04-11 | 2002-10-25 | Seiko Epson Corp | プラズマ装置 |
US6946054B2 (en) * | 2002-02-22 | 2005-09-20 | Tokyo Electron Limited | Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing |
US7879201B2 (en) * | 2003-08-11 | 2011-02-01 | Veeco Instruments Inc. | Method and apparatus for surface processing of a substrate |
KR100532968B1 (ko) | 2004-04-22 | 2005-12-01 | 주식회사 하이닉스반도체 | 반도체 장치의 패턴 형성 방법 |
KR100792383B1 (ko) * | 2005-08-10 | 2008-01-09 | 주식회사 하이닉스반도체 | 반도체 소자 제조 방법 |
KR100844029B1 (ko) | 2006-12-15 | 2008-07-04 | 에이피티씨 주식회사 | 플라즈마 식각방법 |
KR101576205B1 (ko) | 2008-12-11 | 2015-12-10 | 삼성전자주식회사 | 극자외선 포토마스크, 이를 제조하기 위한 방법 및 장치 |
WO2013147966A2 (en) | 2012-01-06 | 2013-10-03 | President And Fellows Of Harvard College | Small-scale fabrication systems and methods |
JP6115300B2 (ja) * | 2012-08-23 | 2017-04-19 | 凸版印刷株式会社 | インプリント用モールド、インプリント方法、パターン形成体 |
JP6051788B2 (ja) * | 2012-11-05 | 2016-12-27 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ発生装置 |
KR101409387B1 (ko) | 2013-01-16 | 2014-06-20 | 아주대학교산학협력단 | 경사 형태의 구리 나노 로드 제작방법 |
US9017526B2 (en) * | 2013-07-08 | 2015-04-28 | Lam Research Corporation | Ion beam etching system |
US9147581B2 (en) | 2013-07-11 | 2015-09-29 | Lam Research Corporation | Dual chamber plasma etcher with ion accelerator |
US9885493B2 (en) | 2013-07-17 | 2018-02-06 | Lam Research Corporation | Air cooled faraday shield and methods for using the same |
KR101509529B1 (ko) | 2013-07-31 | 2015-04-07 | 아주대학교산학협력단 | 3차원 형태의 구리 나노구조물 및 그 형성 방법 |
JP2015090916A (ja) * | 2013-11-06 | 2015-05-11 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
US20160035539A1 (en) | 2014-07-30 | 2016-02-04 | Lauri SAINIEMI | Microfabrication |
US9659797B1 (en) | 2014-09-17 | 2017-05-23 | Sandia Corporation | Wafer scale oblique angle plasma etching |
US10727072B2 (en) | 2015-05-15 | 2020-07-28 | President And Fellows Of Harvard College | System and method for wafer-scale fabrication of free standing mechanical and photonic structures by ion beam etching |
WO2017004042A1 (en) | 2015-06-29 | 2017-01-05 | Applied Materials, Inc. | Temperature controlled additive manufacturing |
WO2017004050A1 (en) | 2015-06-29 | 2017-01-05 | Applied Materials, Inc. | Temperature controlled substrate processing |
US9864208B2 (en) | 2015-07-30 | 2018-01-09 | Microsoft Technology Licensing, Llc | Diffractive optical elements with varying direction for depth modulation |
KR20180075361A (ko) | 2016-12-26 | 2018-07-04 | 이창훈 | 칫솔자세 판단방법 및 이를 위한 감지장치 |
KR101919067B1 (ko) | 2017-04-27 | 2018-11-19 | 세종공업 주식회사 | 저수차 렌즈 제조방법 |
-
2018
- 2018-06-29 KR KR1020180075361A patent/KR102273084B1/ko active IP Right Grant
-
2019
- 2019-06-18 EP EP19827477.1A patent/EP3764389B1/de active Active
- 2019-06-18 JP JP2020550093A patent/JP7086415B2/ja active Active
- 2019-06-18 CN CN201980019945.9A patent/CN111868892B/zh active Active
- 2019-06-18 US US16/982,191 patent/US11276563B2/en active Active
- 2019-06-18 WO PCT/KR2019/007321 patent/WO2020004854A1/ko active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3712927A1 (de) * | 2017-12-26 | 2020-09-23 | Lg Chem, Ltd. | Plasmaätzverfahren unter verwendung eines faraday-käfigs |
EP3730271A1 (de) * | 2018-06-20 | 2020-10-28 | Lg Chem, Ltd. | Verfahren zur herstellung einer form für eine beugungsgitterlichtleitplatte und verfahren zur herstellung einer beugungsgitterlichtleitplatte |
Also Published As
Publication number | Publication date |
---|---|
EP3764389A1 (de) | 2021-01-13 |
JP7086415B2 (ja) | 2022-06-20 |
KR20200002161A (ko) | 2020-01-08 |
US20210027996A1 (en) | 2021-01-28 |
CN111868892A (zh) | 2020-10-30 |
US11276563B2 (en) | 2022-03-15 |
EP3764389B1 (de) | 2024-01-10 |
KR102273084B1 (ko) | 2021-07-06 |
CN111868892B (zh) | 2024-05-07 |
WO2020004854A1 (ko) | 2020-01-02 |
JP2021516788A (ja) | 2021-07-08 |
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