Classifications

• • G—PHYSICS
  • G05—CONTROLLING; REGULATING
  • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
  • G05B19/00—Programme-control systems
  • G05B19/02—Programme-control systems electric
  • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
  • G05B19/4155—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
  • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
  • C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
  • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
  • C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
  • C23C16/303—Nitrides
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
  • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
  • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
  • C23C16/45561—Gas plumbing upstream of the reaction chamber
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/52—Controlling or regulating the coating process
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/54—Apparatus specially adapted for continuous coating
• • G—PHYSICS
  • G05—CONTROLLING; REGULATING
  • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
  • G05B19/00—Programme-control systems
  • G05B19/02—Programme-control systems electric
  • G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
  • G05B19/042—Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/02104—Forming layers
  • H01L21/02365—Forming inorganic semiconducting materials on a substrate
  • H01L21/02367—Substrates
  • H01L21/0237—Materials
  • H01L21/02373—Group 14 semiconducting materials
  • H01L21/02381—Silicon, silicon germanium, germanium
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/02104—Forming layers
  • H01L21/02365—Forming inorganic semiconducting materials on a substrate
  • H01L21/02367—Substrates
  • H01L21/0237—Materials
  • H01L21/02387—Group 13/15 materials
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/02104—Forming layers
  • H01L21/02365—Forming inorganic semiconducting materials on a substrate
  • H01L21/02367—Substrates
  • H01L21/0237—Materials
  • H01L21/0242—Crystalline insulating materials
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/02104—Forming layers
  • H01L21/02365—Forming inorganic semiconducting materials on a substrate
  • H01L21/02518—Deposited layers
  • H01L21/02521—Materials
  • H01L21/02538—Group 13/15 materials
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/02104—Forming layers
  • H01L21/02365—Forming inorganic semiconducting materials on a substrate
  • H01L21/02612—Formation types
  • H01L21/02617—Deposition types
  • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
  • H01L21/67005—Apparatus not specifically provided for elsewhere
  • H01L21/67242—Apparatus for monitoring, sorting or marking
  • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
  • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
• • G—PHYSICS
  • G05—CONTROLLING; REGULATING
  • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
  • G05B2219/00—Program-control systems
  • G05B2219/30—Nc systems
  • G05B2219/45—Nc applications
  • G05B2219/45031—Manufacturing semiconductor wafers

Definitions

• the invention relates to methods for obtaining information about a process consisting of a plurality of successive steps for depositing at least one layer on a substrate, in particular a semiconductor layer, in a process chamber of a reactor using raw data that at least the Timing sequence of actuator data for actuators included.
• the invention further relates to a device which is set up so that the method according to the invention is carried out with an electronic control device, in particular a control computer.
• US 2008/0275586 A1 describes a method for the production of coated wafers in which the data are evaluated such that predictions can be made about the result of a coating process.
• US 2009/0276077 A1 describes a method for obtaining information about a CVD process, wherein measured data are processed with the aid of a digital model.
• the invention relates to a method for determining information about a process comprising a plurality of successive steps for depositing, in particular, a semiconductor layer, wherein the semiconductor layer is in particular a layer of a layer sequence.
• the invention also relates to a device for carrying out the method.
• the device has a process chamber, which is arranged within a reactor housing, which is gas-tightly shielded from the environment. Inside the reactor housing there is a susceptor, which can be heated to a process temperature by means of a heating device. With the susceptor at least one substrate is heated to a process temperature. One or more substrates may rest on a broad side surface of the susceptor facing a process chamber.
• This broad side surface of the susceptor is located opposite a ceiling of the process chamber.
• the process chamber ceiling can be heated or cooled.
• sensors provided to a variety of To determine measured values, in particular to measure the temperature of the process chamber ceiling and to determine the temperature of the surface of the susceptor and a pressure within the process chamber.
• optical measuring devices for example IR or UV pyrometers, may be provided in order to determine properties of the surface of the substrate or properties of the layers deposited on the surface of the substrate. From the measured values of the optical sensors, the temperatures of the substrate surface or the current layer thickness and thus a growth rate can be determined.
• sensors are provided to determine pressure values or mass flow values in a gas mixing system. Further sensors determine the temperatures of tempering baths or cooling water circuits.
• a gas inlet element is provided, through which the one or more process gases are fed into the process chamber.
• a gas mixing system has a large number of actuators and sensors. With the actuators, gas flows can be adjusted, whereby the process gases in the gas mixing system are mixed together by means of valves and back and forth between a run line which opens into the gas inlet element and a vent line which opens directly into an exhaust pipe be switched.
• the actuators can be mass flow controllers with which a mass flow can be set.
• the actuators may also be temperature controllers of heaters or coolers to maintain liquid or solid sources at a source temperature.
• the liquid or solid sources are sources of organometallic starting materials, such as trimethylgallium or trimethylindium or trimethylaluminum, which are heated to a source temperature.
• the solid or liquid organometallic starting materials are stored in source containers, for example bubblers, through which a carrier gas flows.
• the mass flow of the carrier gas is adjusted by an actuator, for example a valve or a mass flow controller.
• pressure sensors or pressure actuators are provided with which the pressure in the organometallic source can be measured or adjusted. that can.
• the fiction, contemporary device on gaseous sources, such as hydride sources By means of actuators and / or sensors, the mass flow of the hydride, which may be NH 3 , AsHi, PHi or SiH 4 , can be adjusted into the valve or run line.
• additional actuators are provided in the gas mixing system in order to dilute and / or divert the flows.
• actuators can be mass flow controllers (MFC), pressure regulators and multi-way valves.
• the gas mixing system has a large number of sensors with which process-relevant measured values can be determined on the one hand.
• sensors are also provided which provide measurement values which are not relevant for the respective process step.
• such sensors are provided with which a temperature, a pressure or a mass flow is measured.
• a total pressure sensor With a total pressure sensor, the total pressure within the process chamber can be determined.
• a process is carried out according to a prespecified recipe stored in a recipe file and generally consists of a plurality of recipe steps which follow one after the other, these steps at least rinsing steps, heating steps, annealing steps, cooling steps and / or growth steps could be.
• the process chamber is purged with an inert gas.
• an inert gas there will be no output SUBSTANCES, that in particular no III precursor (particularly gaseous chemical compound containing an element of V main group), IV precursor (particularly gaseous chemical compound with an element of I V main group) or V-Precursor (In particular gaseous chemical compound with an element of the V main group) fed into the process chamber.
• the process chamber can be heated to a setpoint temperature.
• an IV precursor or a V precursor can be fed into the process chamber.
• Tempering steps are provided in which the substrate is tempered to an annealing temperature and, in particular, kept at this temperature for a certain time.
• Temper S chrittes can merely an inert gas, or in addition one of the Precursor be fed into the process chamber.
• the starting materials precursors
• the precursors can be fed into the process chamber at different growth temperatures and different process chamber pressures.
• the recipe is usually written in a suitable programming language that is human readable as a high level language. It can be provided that the recipe is compiled into machine instructions. The recipe or the data compiled from it can form a raw data pool.
• a device can have a communication computer via which a recipe can be entered via an interface, for example a keyboard, a screen, or a data transmission device.
• the recipe is stored in a data memory, which can be assigned to the communication computer.
• the data of the recipe are transmitted via the communication interface bidding communication computer to a control computer, which controls the actuators of the coating system, that makes a setpoint specification.
• the control computer is also able to receive actual values from the actuators or sensors. He controls the process in real time. It can forward the actual values of actuators or sensors to the communication computer.
• the device according to the invention has a log file, which is assigned, for example, to the communication computer, with which the data of at least some, preferably all sensors, are used as measurement during a process at defined time intervals, for example at intervals of one second. Values are saved together with a timestamp. In addition, at least some, preferably all actuator values of the actuators are stored as control data in the log file. The measured values and the setting data can thus also form a raw data pool. With the method according to the invention or the device according to the invention, these, the recipe file and / or the log file are created from these. raw data form a condensed table, for example with mean values of only the relevant parameters and steps.
• Condensed data are thus generated which facilitate the user's interpretation of the process, in particular for depositing one or more semiconductor layers and their successive steps.
• the determination of the time transient required for this can be determined either from the recipe, in particular the compiled recipe, or from the log file.
• the raw data can not only contain the actuating data for the actuators. You can also include the measurement values of sensors. The latter are taken from the log file.
• the compressed data can be obtained, for example, from the communication computer by evaluating the recipe, by the control computer by evaluating the recipe and / or the actual values or by evaluating the log file.
• a characteristic control value can be, for example, a setpoint temperature which has to be reached by a heating device for heating the process chamber ceiling or for heating the susceptor.
• the characteristic values can also change during a step; For example, if multiple redundant sources are provided, it is possible to switch from one source to one redundant second source during a step.
• the fiction, contemporary device may also have solid or liquid sources.
• a source has, for example, a source container in which a solid or liquid starting material is stored. Through this container, a carrier gas is passed. This is done by a Immersion tube, which dips into the solid or liquid starting material.
• the solid starting material is usually a powder.
• the carrier gas then flows through the solid or liquid starting material in the manner of a bubbler (wash bottle). With the aid of a thermodynamic linkage, it is possible to determine the vapor pressure of the liquid or solid starting material in the knowledge of the temperature in the source vessel.
• the delivery rate of the source can be determined, taking into account, in addition to the source temperature, the gas pressure of the source as well as the mass flow of the carrier gas flowing through the source.
• the delivery rate of the source ie the mass flow of the source material out of the source, can be calculated using the relevant physical laws.
• the control data are content of the recipe.
• the sequence of steps and their type can first be determined during the running process or following a process carried out to the end. This is not done using recipe commands for statistics data acquisition, but only by using the raw data, in particular excluding the setting data.
• the steps can also be obtained by a kind of simulation or compilation from the recipe. This is preferably always done automatically, so that it is not necessary for certain process steps for data acquisition to be defined by a process engineer.
• the log data are used and, in particular, that measurement values are used to determine the process steps.
• process parameters are obtained from the raw data and in particular from the setting data.
• the process parameters are from the raw data, in particular the control data calculated parameters.
• the raw data are set by means of a computing device in relation to each other.
• a plurality of redundant sources of the starting materials can be provided.
• the starting material can then optionally be fed into the process chamber from one of the several identical starting material sources.
• the mass flow of the output S Toffs from its source in the process chamber is determined by the position of mass flow controllers and a plurality of valves. To characterize a process step, it is not necessary to know in detail which valves are open and / or which flows are set. Rather, it is the result of setting the relevant valves or mass flow controllers of relevance, namely the mass flow of one or more starting materials flowing into the process chamber.
• Another value relevant for characterizing a process step may be a temperature within the process chamber and / or a pressure within the process chamber. These values are process step characteristic.
• the control data are processed in such a way that, for example, the mass flow of a hydride or a metal-organic compound into the process chamber is determined from the control data.
• the process parameters are thus, for example, mass flow values of the precursors, which are fed into the process chamber at the same time.
• the process parameters are also temperature setting values for the susceptor, the process chamber ceiling and the substrate surface. These process parameters are analyzed in a further step to determine the process steps.
• the temperatures of the liquid or solid sources, the mass flows of the carrier gases flowing through the source, and the gas pressure in the source are determined using the thermodynamic relationships as well as the position of the source assigned valves mass flows of the organometallic precursor determined. It does not matter from which physical source the mass flows come. What is essential is the mass flow into the process chamber resulting from the control data.
• Other process parameters can be the temperature setpoints and the pressure setpoints in the process chamber. By means of these obtained from the raw data process parameters then the beginning and the end of process steps are determined. For this purpose, the time course of the process parameters is observed.
• a process step can be defined, for example, in that the process parameters do not change for a certain time.
• the computing device identifies this as an individual process step.
• the duration of the process step and its type which is determined, for example, by the respective precursor or pressure or temperature flowing into the process chamber, are stored, the type being defined by an individual combination of process parameters.
• Process steps of the same kind thus contain process parameters which are identical or at least similar. If the type is defined by several different process parameters, the type of two process steps can then be considered to be consistent if the process parameters lie in a limited hyperspace of a multi-dimensional coordinate system spanned by the individual process parameters.
• the measured values are also processed.
• the preparation of the measured values preferably takes place in each process step. However, the preparation can also be carried out only in individual process steps.
• characteristic process step quantities are determined.
• the process step variables can be, for example, the actual temperature in the process chamber, the actual pressure in the process chamber, the actual surface temperature of the susceptor, the actual surface temperature of the substrate, an optical property of the substrate, or the growth rate of a layer and another response of the deposition system measured by sensors to the process parameters, such as a control valve position, a heating or cooling capacity, etc.
• any physical quantity which describes a state of an aggregate, in particular of a peripheral aggregate of the device comes into consideration as the process step size.
• a subset of the measured values can be used as the process variable during the preparation of the measured values.
• start-up effects can be hidden at the beginning of a process step. This is done by the fact that the use of the measured values for obtaining the process step sizes only begins when a transient process has ended, ie the measured values have stabilized.
• the measured values are then determined for a predefined, in particular process step-individual time. From a large number of measured values obtained in chronological order, an average value and an average deviation from the mean value can be formed. These and / or further process step sizes are stored.
• the quality of the deposited layer or sequence of layers is analyzed following the process. If the quality of the layer or layer sequences corresponds to a specification, the process parameters and the process steps analyzed therefrom as well as the process step-specific process variables are stored in a process data memory.
• the process parameters are calculated with the aid of a mathematical / physical model, whereby the model digitally reflects the structural design of a gas mixing system or a reactor.
• the model contains the physical relationships of the control data in order to link device-specific characteristic control values together.
• the process data memory thus contains a pool of process data which belong to processes with which a layer or a sequence of layers has been assigned which meet the quality specification.
• comparisons are made.
• the comparisons are thus large historical process step sizes, which in particular include a mean value and a scatter value. Is used after this initial data collection to create the historical process step sizes, ie the comparison size of a process already stored in the process data memory If this process is found in the manner described above by identifying its process steps, then the process variables of the individual process steps obtained in the current process can be compared with the historical comparison variables from the process data memory. If the process data lie within a range of values defined by the scattering range around the mean value, then the process step is regarded as qualitatively in order.
• a process will only be considered as overall if the process step variables of all process steps of the process correspond to the historical comparison variables such that the process step variables are within the range determined by the process variables Scatter range predetermined range lie. It is particularly advantageous if only control data are used in determining the process parameters, the process parameters being obtained in particular only from the control data of such actuators which influence the characteristic measurement values during a process step by changing their setting value can.
• the process data are obtained only from the control data of such actuators whose set values include a temperature in the process chamber, a mass flow of a source containing a liquid or a solid containing a carrier gas into the organometallic starting material transported into the process chamber , influence a hydride, in particular transported with a carrier gas into the process chamber, and / or a total pressure in the process chamber.
• the setting data are in particular valve positions of 2- / 2-way valves, 5- / 2-way valves, 4- / 2-way valves and setpoint values of pressure or heating regulators.
• the measurement values used to form the process variables may also relate to parameters of cooling water flows of peripheral aggregates of the device.
• the measured values for forming the process variables can then be characteristic measured values of a cooling circuit.
• process parameters from the raw data, in particular the control data, by relating the raw data.
• This is preferably done by means of a mathematical model, for example a digital image of the device, in particular the gas mixing system and the reactor.
• the mathematical model includes the physical relationships between the actuators.
• the process steps determined during data preparation do not have to be identical to the steps stored in the recipe. During the preparation of the raw data for the determination of the process parameters, a first data condensation takes place.
• the gigabyte-sized log file From the several hundred megabytes, in some cases also the gigabyte-sized log file, a few kilobytes of data are extracted, which are represented by the process parameters. With the help of a data analysis, which includes an observation of the temporal course of the process parameters, the beginning and the end of the process steps are identified. In addition, by virtue of the setting data indicating which precursor or combination of precursors flow into the process chamber, not only the beginning and the end of each process step can be determined by analyzing the time profile of the process parameters.
• the process parameter combination may include a pressure value. It can be the total pressure within a process chamber. But it can also be a pressure in a peripheral aggregate.
• a process parameter of the process parameter combination can also be at least one temperature-determining parameter. For example, the temperature of a substrate is determined not only by the temperature of the susceptor carrying the substrate. Rather, the temperature of the substrate is also affected by the temperature of the reactor lid, a purge flow which can set a substrate carrier in rotation and influence the type of purge flow.
• Hydrogen has different heat transfer properties than nitrogen.
• process step determination in particular those process parameters are selected which give the process step a clear fingerprint. This determination can be made immediately after the completion of the process.
• the data analysis can also be carried out during the process.
• a second compression of the data is done by the preparation of the measured values.
• the measured values are subject to a temporal fluctuation since they are actual values recorded by the sensors. These are, for example, temperature readings.
• the temperature readings can not be just the above-mentioned temperature readings of areas within the process chamber. It may also be the temperatures of baths in which the source containers of organometallic sources are tempered. In addition, these may also be cooling water temperatures. From these measured values, process step-specific or very general process step variables are determined.
• the process step size determination preferably only one datum per measuring step is stored for each sensor value. However, it is also possible to store two data, for example an average and a scatter. But it may also be sufficient to save only an average value.
• the averaging is preferably not carried out over the entire length of the process step, but - as stated above - only over a time-limited range, namely after the termination of a transient process until, for example, the end of a process step.
• the process step sizes characterize actual values of process-relevant parameters. By comparing the process step variables, for example the actual temperatures or the actual pressures or the actual growth rates of the deposited layers with historical data, a statement can be made after completion of a process that includes an expectation of the shift quality.
• the process step sizes are in the range of the historical comparison variables, then this is an indication that the deposited layer or layer sequence is perfectly correct. is free, so that they can be further processed in a subsequent manufacturing process by semiconductor components are produced from the coated wafer. If the process step sizes in at least one process step deviate significantly from the comparison of the same process step of a historical process, this can be an indication that the quality of the deposited layer or layer sequence is insufficient for certain applications.
• the coated wafer thus produced in the process can thus be classified as waste or of inferior quality. It is thus possible to decide immediately after the process which wafers manufactured in the process are further processed or which are to be regarded as rejects.
• the extraction of the process parameters and the subsequent analysis for identifying process steps can be carried out before the execution of the process when using recipe data or data compiled therefrom. If additional measurement values from sensors are used, the acquisition of the parameters or the analysis of the time profile of the process parameters during the process or after the process can take place. The formation of the characteristic process step sizes can likewise take place during the process or after the process. Likewise, the comparison of the process step sizes with comparison variables stored in a process data memory can already be carried out during the process or after the process.
• the process steps indicated by process steps which are also uniquely identifiable by the determined process parameters, indicate the process step - Sizes that already take into account the physical contexts in the plant, an ideal starting point for external data analysis "big data”.
• the condensed data set can thus form a basis for the external determination of correlations, if an external evaluation of the
• a layer thickness measuring device can be switched on and switched off again at the end of the process step. If a reflectance measuring device, for example an interferometer, is used as the layer thickness measuring device, then, for example, the periods of the interference measured values can be counted. It can further be provided that information about the chemical and / or physical properties of the layer to be deposited in the respective process step is transmitted to the measuring device so that the measuring device automatically selects a measuring range in an automated manner.
• FIG. 1 shows schematically an embodiment of a gas mixing system of a device according to the Invention
• FIG. 7 is a schematic block diagram of elements of the method according to the invention.
• FIG. 6 shows a CVD reactor.
• the reactor has a gas-tight reactor housing 14, which can be evacuated by a vacuum pump, not shown.
• a heater 22 which may be an infrared or an RF heater, with which a susceptor 17, for example made of graphite, arranged above the heater, can be heated to a process temperature.
• the control of the heater 22 by means of the heater S teuerung 23.
• the temperature of the susceptor 17 is determined by a temperature sensor 24, such as a thermocouple.
• the thermocouple 24 can also be used for control.
• a pressure sensor 3 is provided with which the total pressure in the reactor housing or the process chamber is determined.
• the pressure is controlled by a "butterfly valve", which is arranged in a suction line, not shown, to which the reactor housing is connected to a vacuum pump
• a "butterfly valve” which is arranged in a suction line, not shown, to which the reactor housing is connected to a vacuum pump
• substrates 18 which are coated with one or more layers in a coating process and may be silicon substrates, III-V substrates, sapphire substrates or other substrates
• Substrates can be deposited a III-V layer sequence, for example, for light-emitting diodes.
• the process chamber ceiling 15' can be used as gas inlet. Lassorgan be formed, for example, when the gas inlet member is a show-erhead.
• the gas inlet member but has a central position above the susceptor 17 and two separate lines to 16, 16 ', which open separately from each other in the process chamber 15. Through the supply lines 16 ', 16 "different process gases can be fed into the process chamber 15.
• the reference numeral 25 denotes a temperature sensor.
• This temperature sensor 25 may be an optical temperature sensor, for example an IR pyrometer or a UV pyrometer. With this temperature sensor 25, the surface temperature of the substrates 18 can be measured. In addition, the layer thickness, or the growth rate of a layer on the substrate 18 or its layer composition can also be determined with the optical sensor 25.
• the starting materials fed into the supply lines 16 ', 16 "of the gas inlet element 16 are mixed together in a gas mixing system, as shown in Figures 1 to 4.
• the elements are gas selector switch 1
• hydride source 5 and MO source 10 are shown as blocks only and are shown in more detail in Figures 2 to 4.
• the gas mixing system includes two gas supply lines 19, 195 through which N 2 or H 2 is fed
• a plurality of gas selection scarf diesters 1 can be selected between nitrogen and hydrogen.
• the gas selector switch 1 has two actuators, each of which is formed by a 2-way valve 2.
• the gas selection switch 1 also has a mass flow controller / sensor 4, which may also have the function of an actuator.
• pressure sensors may be provided, each provide a pressure reading in this section of the piping system.
• the mass flow controller 4 may also provide a mass flow measurement.
• There are several, especially redundant hydride sources 5 are provided.
• the hydride used is in particular NH 3 , AsH, PH or SiH 4 .
• the hydride source 5 shown in FIG. 3 has a 3/2-way valve, a plurality of mass flow controllers 4 and a gas tank 7 containing the respective hydride.
• the gas tank 7 is shown only symbolically. As a rule, it is trained by a central gas supply.
• FIG. 5 shows the source of an organometallic starting material.
• two source containers bubblers 12, each containing the same organometallic starting material
• the source 10 has a plurality of mass flow controllers 4 and a 4/2-way controller.
• Valve 11 A concentration measuring device 47 can be provided as the sensor, with which the concentration of the organometallic compound in the gas flow can be determined The concentration can be predetermined via the two mass flow controllers 4.
• the temperature of the source vessels 12 is controlled to a desired temperature by a temperature controller 26.
• Figure 1 shows two sources of TMGa and two sources of TM Al.
• the starting materials provided by the hydride source 5 and the Mo source 10 can be fed by means of the run / vent switch 8 shown in Figure 4 either in a vent line 21 which leads directly into the exhaust and the to stabilize the rivers.
• the run line or the run line RUN I and RUN II are connected to the supply lines 165 16 "
• the run / vent switch 8 has a five / two-way valve.
• control values that provided, for example, valve positions or setpoint specifications for temperatures or pressures.
• a process is carried out in which one or more layers are deposited on one or more substrates arranged in the process chamber 15.
• a process involves a variety of steps. The steps are performed in chronological order and have individual properties.
• Essential actuators ie valves or mass flow controllers, can receive a constant setpoint for a certain time.
• the key actuators are those whose operational status has an influence on the quality of the process step.
• All valve positions, temperature specifications, pressure specifications, mass flow specifications, etc. are stored as control values SD in a log file 40 as raw data RD.
• all measured values MW of the sensors that is to say in particular temperature sensors, pressure sensors or mass flow sensors, are stored in the log file 40.
• a process lasting several hours and a data acquisition clock of one second results in a very large amount of data.
• process parameters PP are first obtained from the raw data RD and, in particular, the setting data SD for the actuators 2, 4, 6, 9, 11, 23.
• the process parameters PP are data obtained from the raw data RD by means of a computing device, which provide process step-specific information.
• the raw data RD in particular only the setting data SD are mathematically linked together, wherein a process parameter calculation 41 is performed with the mathematical combination.
• a process parameter PP1 can be obtained for example from a mathematical combination of the control data SD1 and SD2.
• a second process parameter PP2 can be obtained from a combination of the setting data SD2 and SD4.
• the mathematical links for determining the process parameters PP from the setting data SD can be predetermined in the computing device by a program. These are therefore predetermined mathematical links of the setting data SD, by means of which the process parameters PP are determined.
• the process parameter PP2 may be the mass flow of a metal-organic starting material, wherein the manipulated value SD6 is a temperature of the source container 12.
• the mass flow from the source 10 can thus be calculated from the temperature setpoint and a mass flow of a carrier gas (control value SD5) through the source container 12.
• process parameter calculation 41 (FIG. 7) taking into account the setting data SD among one another, it is possible, for example, to take into account a redundant arrangement of a plurality of hydride sources 5 or more MOs -Quellen 10 are determined only from the valve positions and the pressures, temperatures in the source container 12 of the mass flow of an organometallic compound or a hydride through the Run line 20, 20 'or through the vent line 21.
• the physical relationships between a source temperature and a mass flow of a carrier gas through a source container 12 of an MO source 10 are taken into account in order to determine the mass flow of the MO precursor, which represents a process parameter.
• process parameter PP is a first data compression of the raw data RD.
• each of the several successive process steps PI to Pn is identified in a process step determination 42.
• the process steps PI to Pn identified in the process step determination 42 do not have to match the steps of the recipe.
• the process step limits can be completely different here. They depend essentially on the selection of the mathematical links of the control data SD. As a result, as it relates to the process step
• Determination 42 is shown on the right in FIG. 7, which observes the time profiles of the process parameters PP1 to PP3.
• a predetermined time for example at least 5 seconds
• the entire process can be broken down into a number of process steps, which can be different from the steps specified in the recipe.
• the process steps PI to Pn can be identified reproducibly in a process with the same recipe.
• a measured value evaluation 43 is then carried out with the aid of the measured values MW, the measured values MW and in particular the measurement values relevant for the respective process step being analyzed with regard to an average value and a scattering from the mean value.
• inertia processes are taken into account.
• the acquisition of the measured values MW to form a process step size PG takes place only after a defined time after the beginning of the respective process step Pi. From this point in time until, for example, the end of the process step, a measurement value is obtained or, with the aid of suitable mathematical links, which take into account the conditions of the installation, mean values of several measured values MW are formed, which are used as process step size PG in the further method and which can also be stored in the process data memory 44.
• more complex analyzes can also be performed or triggered for in-situ measurement systems for the identified growth steps whose results serve as process step variables, such as those from analysis the periodicity of reflectance signals derived growth rate.
• process step variables such as those from analysis the periodicity of reflectance signals derived growth rate.
• interferometers can be used which give periodically changing measuring values. From the periodicity, the layer thickness or the growth rate can be determined. According to the invention, it is proposed that these measuring devices be triggered by means of the information obtained by the method according to the invention, ie switched on or off.
• process parameters PP which can be assigned to a process step in which a layer is deposited
• a measuring device can be switched on at the beginning of the process step and switched off again at the end of the process step.
• Coating thickness gauges for example interferometers, require information on the optical properties of the layer to be deposited in the process step in order to quantify the growth rate or the layer thickness. These properties can be determined from the process parameters PP.
• the process steps PI to Pn and the process step sizes PG obtained therein are stored in the process data memory 44 as comparison variables VG.
• this only takes place if a quality analysis on the deposited layer or the deposited layers has the result that the layers meet a quality requirement. If the layers do not meet the quality requirements set for them, the calculated values are worfen.
• a historical data pool is generated at the beginning with a plurality of identical processes, having one or more comparison variables VG for each process step PI to Pn, each comparison variable VG being a process step size PG, for example a temperature or a total. pressure, at which it can be expected that the process step has been successful.
• a data comparison 45 the process variables PG of the process steps PI to Pn of the current process are compared with the comparison variables VG in the process data memory 44. If all process variables PG are in a good range, which is defined by an average value and a scattering range of the comparison variables VG, then the layer or layer sequence deposited on the substrate is considered to be in order.
• the data comparison 45 leads to the delivery of a response signal A, which makes a statement as to whether the layer or layer sequence can be further observed in a promising manner. In the case of a layer sequence rated as not correct, a first indication of which sub-layer and which measured values are affected can make the error search extremely easy.
• the reference numeral 46 indicates a data update.
• the process variables PG of processes which provide qualitatively sufficient layers can be stored in the process data memory 44 in addition to the already stored historical data in order to update the data stock there. As a result, long-term drift effects can be intercepted.
• the above explanations serve to explain the inventions as a whole, which at least individually further develop the state of the art by at least the following combinations of features, wherein two, several or all of these feature combinations can also be combined, namely:
• a method which is characterized in that from measured values MW of sensors 3, 4, 4 ', 24, 25, 47 corresponding characteristic process step sizes PG are formed for at least some of the process steps PI to Pn of their respective type ,
• a method which is characterized in that an automatically more complex analysis of other in-situ measurement systems, in particular reflectance measurements, is triggered for the identified process step and with the analysis result a corresponding process step size, for example a growth rate is formed.
• a method which is characterized in that the process step sizes PG thus obtained are stored in a process data memory 44. cherten, at least one similar process step associated comparison variables VG be compared 45.
• comparison quantities VG are formed from measured values MW, which have been determined in one or more previously performed processes.
• comparison quantities VG each include a mean time-averaged over the measured values MW of a plurality of earlier processes and a value for a scattering range, wherein the process variable PG is shown as having the Comparison variable VG is considered within predetermined limits consistent, if the process step size PG is in the scattering range around the mean of the comparison variable VG and as not with the comparison size within predetermined limits is considered to be coincidental if the process step size PG lies outside of the scattering range.
• a method which is characterized in that the process parameters PP by the control values SD of selected valves 6, 9, mass flow controller 4, pressure regulator 4 'and possibly temperature controller 26 are calculated mass flows of gaseous starting materials into the process chamber 15.
• a device which is characterized in that the computing device is programmed and set up in such a way that process parameters PP are obtained from the raw data RD, that the process parameters are analyzed by an analysis 42 of the time profile PP the beginning and the end of process steps PI to Pn and / or their nature are identified.
• a device which is characterized in that from the measured values MW for at least some of the process steps PI to Pn of their respective type corresponding characteristic process step sizes PG are formed and that the process step variables PG thus obtained are compared 45 with comparison variables VG stored in a process data memory 44 and associated with an at least similar process step.

Landscapes

• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Materials Engineering (AREA)
• General Chemical & Material Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Mechanical Engineering (AREA)
• Metallurgy (AREA)
• Organic Chemistry (AREA)
• General Physics & Mathematics (AREA)
• Physics & Mathematics (AREA)
• Manufacturing & Machinery (AREA)
• Power Engineering (AREA)
• Computer Hardware Design (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• Automation & Control Theory (AREA)
• Inorganic Chemistry (AREA)
• Crystallography & Structural Chemistry (AREA)
• Human Computer Interaction (AREA)
• Chemical Vapour Deposition (AREA)

Applications Claiming Priority (2)

Publications (1)

Family

ID=64899274

Family Applications (1)

Country Status (8)

Families Citing this family (4)

Family Cites Families (32)

• 2017
  • 2017-12-19 DE DE102017130551.3A patent/DE102017130551A1/de active Pending
• 2018
  • 2018-12-12 TW TW107144814A patent/TWI812662B/zh active
  • 2018-12-13 CN CN201880088514.3A patent/CN111684104A/zh active Pending
  • 2018-12-13 EP EP18826237.2A patent/EP3728690A1/de active Pending
  • 2018-12-13 US US16/955,667 patent/US11669072B2/en active Active
  • 2018-12-13 CN CN202311430530.5A patent/CN117660934A/zh active Pending
  • 2018-12-13 JP JP2020532734A patent/JP7394055B2/ja active Active
  • 2018-12-13 WO PCT/EP2018/084732 patent/WO2019121313A1/de unknown
  • 2018-12-13 KR KR1020207019938A patent/KR20200100105A/ko not_active Application Discontinuation

Also Published As

Similar Documents

Legal Events