Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J35/00—X-ray tubes
  • H01J35/02—Details
  • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
  • H01J35/06—Cathodes
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J35/00—X-ray tubes
  • H01J35/02—Details
  • H01J35/16—Vessels; Containers; Shields associated therewith
  • H01J35/165—Vessels; Containers; Shields associated therewith joining connectors to the tube
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J35/00—X-ray tubes
  • H01J35/02—Details
  • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
  • H01J35/06—Cathodes
  • H01J35/066—Details of electron optical components, e.g. cathode cups
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
  • H01J5/46—Leading-in conductors
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J2235/00—X-ray tubes
  • H01J2235/02—Electrical arrangements
  • H01J2235/023—Connecting of signals or tensions to or through the vessel
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J35/00—X-ray tubes
  • H01J35/02—Details
  • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
  • H01J35/06—Cathodes
  • H01J35/064—Details of the emitter, e.g. material or structure
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J35/00—X-ray tubes
  • H01J35/02—Details
  • H01J35/16—Vessels; Containers; Shields associated therewith
  • H01J35/18—Windows
  • H01J35/186—Windows used as targets or X-ray converters

Definitions

• the invention relates to a source generating ionizing rays and in particular X-rays, an assembly comprising a plurality of sources and a method for producing the source.
• X-rays today have many uses, especially in imaging and radiotherapy. X-ray imaging is widely used especially in the medical field, in industry to perform non-destructive testing and in security to detect dangerous objects or materials.
• Linear accelerators and X-ray tubes use an accelerated electron beam bombarding a target.
• the braking of the beam due to the electric fields of the nuclei of the target makes it possible to generate X-ray radiation by braking.
• An X-ray tube generally consists of an envelope in which the vacuum is produced.
• the envelope is formed of a metal structure and an electrical insulator made of alumina or glass.
• two electrodes are arranged.
• a cathode electrode brought to a negative potential, is equipped with an electron emitter.
• a second anode electrode brought to a positive potential with respect to the first electrode, is associated with a target.
• the electrons accelerated by the potential difference between the two electrodes come to produce a continuous spectrum of ionizing radiation by braking (bremsstralung) when hit the target.
• Metal electrodes are necessarily large and have large radii of curvature to minimize electric fields on their surface.
• X-ray tubes Depending on the power of X-ray tubes, these can be equipped with either a fixed anode or a rotating anode for spreading thermal power.
• Fixed anode tubes have a power of a few kilowatts and are particularly used in industrial, safety and medical applications of low power.
• Rotating anode tubes can exceed 100 kilowatts and are mainly used in the medical field for imaging requiring significant X-ray fluxes to improve contrast.
• the diameter of an industrial tube is of the order of 150 mm at 450 kV, 100 mm at 220 kV and 80 mm at 1 60 kV.
• the indicated voltage corresponds to the potential difference applied between the two electrodes.
• the diameter varies from 150 to 300 mm depending on the power to be dissipated on the anode.
• Electrical insulators must be of sufficient size to ensure good electrical isolation from high voltages of 30 kV to 300 kV.
• Sintered alumina often used to produce these insulators, typically has a dielectric strength of the order of 18 MV / m.
• the radius of curvature of the metal electrodes should not be too low to maintain a static electric field applied to the surface below an acceptable limit, typically 25 MV / m. Beyond parasitic electron emissions by tunnel effect become difficult to control resulting in wall heating, unwanted X-ray emissions and micro discharges. Because of this, for As seen in X-ray tubes, the dimensions of the cathode electrodes are important in order to limit the parasitic emission of electrons.
• Thermoinic cathodes are often used in conventional tubes.
• the anode forming the target must dissipate a significant thermal power. This dissipation can be achieved by circulating a coolant or by producing a large rotating anode. The need for this dissipation also requires increasing the dimensions of the X-ray tubes.
• the invention aims to overcome all or part of the problems mentioned above by proposing a source of ionizing radiation, for example under as a diode or a high voltage triode whose dimensions are much smaller than those of conventional X-ray tubes.
• a source of ionizing radiation for example under as a diode or a high voltage triode whose dimensions are much smaller than those of conventional X-ray tubes.
• the principle of ionizing radiation generation remains similar to that implemented in the known tubes, namely an electron beam bombarding a target.
• the electron beam is accelerated between a cathode and an anode between which is applied a potential difference, for example greater than 100 kV.
• the invention makes it possible to significantly reduce the dimensions of the source according to the invention with respect to the known tubes.
• the invention proposes a source of ionizing radiation comprising a vacuum chamber in which a plug fulfills several functions.
• the subject of the invention is a source generating ionizing rays comprising:
• a cathode capable of emitting an electron beam into the chamber A cathode capable of emitting an electron beam into the chamber
• An anode receiving the electron beam and comprising a target capable of generating ionizing radiation from the energy received from the electron beam,
• An electrode disposed in the vicinity of the cathode and making it possible to focus the electron beam
• the plug is attached to the mechanical part by means of a conductive solder film used to electrically connect the electrode.
• the plug is made of the same dielectric material as the mechanical part.
• the solder film is advantageously of revolution about an axis of the electron beam and forms with the electrode an equipotential assembly.
• the plug advantageously comprises at least one electrical connection therethrough, for electrically connecting a control of the cathode and brought to a different potential of the solder film.
• the plug preferably forms a coaxial type transmission line whose electrical connection therethrough forms a central conductor of the coaxial line and whose solder film forms a shielding of the coaxial line.
• the plug advantageously comprises an outer surface to the vacuum chamber.
• the outer surface then comprises several separate zones metallized separately. At least one of these areas is in electrical contact with the at least one electrical connection and another of these areas is in electrical contact with the solder film to provide electrical connection of the cathode and the electrode via via the at least one electrical connection and the solder film.
• the source comprises a coaxial connector connected to the solder film and to the at least one electrical connection, and a cavity located between the coaxial connector and the plug, the cavity being shielded from a main electric field of the source.
• the mechanical part comprises an outer surface to the vacuum chamber having an internal frustoconical shape flaring from the outer surface of the plug.
• the source further comprises a support having a complementary surface to the frustoconical inner shape of the mechanical part.
• the complementary surface and the internal frustoconical shape are then configured to convey trapped air between the complementary surface and the internal frustoconical shape during assembly of the mechanical part in the support towards the cavity.
• the cathode emits the electron beam by field effect and the control of the cathode comprises an optoelectronic component electrically connected by the electrical connection through the plug.
• the mechanical part comprises a cavity in which the cathode is disposed.
• a sorbeur is disposed in the cavity, between the cathode and the cap.
• Figure 1 shows schematically the main elements of an X-ray generating source according to the invention
• FIG. 2 represents a variant of the source of FIG. 1 allowing other modes of electrical connection;
• Figure 3 is a partial and enlarged view of the source of Figure 1 around its cathode
• Figures 4a and 4b are partial and enlarged views of the source of Figure 1 around its anode according to two variants;
• FIG. 5 represents in section an integration mode comprising several sources in accordance with the invention
• FIGS. 6a, 6b, 6c, 6d and 6e show variants of an assembly comprising several sources in the same vacuum enclosure
• Figures 7a and 7b show several electrical connection modes of a set comprising several sources.
• FIGS. 8a, 8b and 8c show three examples of assemblies comprising several sources in accordance with the invention and which can be made according to the variants proposed in FIG. 5 or 6.
• FIG. 1 is a sectional view of an X-ray generating source 10.
• the source 10 comprises a vacuum chamber 12 in which a cathode 14 and anode 1 6 are disposed.
• the cathode 14 is intended to emit an electron beam 18 into the chamber 12 towards the anode 1 6.
• the anode 16 comprises a target 20 bombarded by the beam 18 and emitting X-radiation 22 depending on the energy of the electron beam 18.
• the beam 18 is developing around an axis 19 passing through the cathode 14 and the anode 1 6.
• X-ray generating tubes conventionally implement a thermionic cathode operating at high temperature, typically around 1000 ° C.
• This type of cathode is commonly called hot cathode.
• This type of cathode composed of a metal matrix or metal oxides emits a flow of electrons caused by the vibrations of atoms due to thermal energy.
• hot cathodes suffer from several disadvantages, as a weak temporal dynamics of current control related to the time constants of thermal processes, the need to use grids located between the cathode and the anode and polarized at high voltages in order to control the current.
• the grids are therefore located in an area of very high electric fields, they are subjected to high operating temperatures around 1000 ° C. All of these constraints greatly limit the possibilities of integration and lead to significant dimensions of the electron gun.
• cathodes operating on the principle of field emission have been developed. These cathodes operate at room temperature and are commonly referred to as cold cathodes. Most of them consist of a conductive flat surface with relief structures, on which an electric field is concentrated. These relief structures are emitters of electrons when the field at the top is sufficiently high. The emitters in relief can be formed of carbon nanotubes. Such embodiments are for example described in the patent application published under No. WO 2006/063982 A1 and filed in the name of the applicant. Cold cathodes do not have the disadvantages of hot cathodes and are especially much more compact. In the example shown, the cathode 14 is a cold cathode and thus emits the electron beam 18 by field effect. The control of the cathode 14 is not shown in FIG. This control can be performed electrically or optically as also described in WO 2006/063982 A1.
• the electron beam 18 is accelerated and strikes the target 20 comprising for example a membrane 20a for example made of diamond or beryllium coated with a thin layer 20b made of an alloy based on high atomic number material such as in particular tungsten or molybdenum.
• the layer 20b may have a variable thickness, for example between 1 and 12 ⁇ depending on the energy of the electrons of the beam 18.
• the interaction between the electrons of the electron beam 18 accelerated at high speed and the material of the thin layer 20b allows the production of X-rays 22.
• the target 20 forms a window of the vacuum chamber 12.
• the target 20 forms a portion of the wall of the vacuum chamber 12.
• the membrane 20a is formed of a low atomic number material, such as diamond or beryllium for its X-ray transparency 22.
• the membrane 20a is configured to ensure with the anode 1 6, the seal at empty of the enclosure 12.
• the target 20, or at least the layer made of an alloy with a high atomic number can be placed completely inside the vacuum chamber 12 and the X radiation emerges from the chamber 12 while passing through a window forming part of the wall of the vacuum chamber 12.
• This provision is particularly implemented for a target operating in reflection.
• the target is then distinct from the window.
• the layer in which X-radiation is produced can be thick.
• the target may be fixed or rotating allowing a spread of the thermal power generated during the interaction with the electrons of the beam 18.
• This dielectric / vacuum interface can for example be obtained by replacing the metal electrode whose external surface is subjected to the electric field by an electrode made of a dielectric material whose external surface is subjected to the electric field and whose internal surface is coated. perfectly adherent conductive deposit ensuring the function of electrostatic wehnelt. It is also possible to cover the outer surface of a metal electrode subjected to the electric field by a dielectric material to replace the metal / vacuum interface of the known electrodes by a dielectric / vacuum interface where the electric field is important. This arrangement makes it possible to significantly increase the maximum electric field below which the parasitic emission of electrons does not occur.
• the increase of the admissible electric fields allows a miniaturization of the X-ray sources and more generally the sources of ionizing radiations.
• the source 10 comprises an electrode 24 disposed in the vicinity of the cathode 14 and for focusing the electron beam 18.
• the electrode 24 forms a wehnelt.
• the electrode 24 is disposed in contact with the cathode.
• a cold cathode emits an electron beam by field effect.
• This type of cathode is for example described in WO 2006/063982 A1 filed in the name of the applicant.
• the electrode 24 is disposed in contact with the cathode 14.
• the mechanical part 28 advantageously forms a support for the cathode 14.
• the electrode 24 has a shape essentially convex. The outside of the concavity of the face 26 is oriented towards the anode 1 6. Locally at the contact between the cathode 14 and the electrode, the convexity of the electrode 24 may be zero or slightly reversed.
• the electrode 24 is formed of a continuous conductive surface disposed on a concave face 26 of a dielectric material.
• the concave face 26 of the dielectric material forms a convex face of the electrode 24 facing the anode 1 6. It is from this convex face of the electrode 24 that large electric fields develop.
• a metal / vacuum interface exists on this convex face of the electrode. As a result, this interface can be the seat of electron emission under the effect of the electric field inside the vacuum chamber.
• This interface of the electrode with the vacuum of the enclosure is removed by replacing it with a dielectric / vacuum interface. A dielectric material, having no free charge, can therefore be seat of a sustained electron emission.
• the source 10 comprises a mechanical part 28 formed in the dielectric material.
• One of the faces of the mechanical part 28 is the concave face 26.
• the electrode 24 is, in this case, constituted by a deposit of a conductive material perfectly adherent to the concave face 26.
• Various techniques can be implemented to achieve this deposit, such as in particular the physical vapor deposition (known in the English literature by the acronym PVD for Physical Vapor Deposition) or chemical phase (CVD) possibly assisted by plasma (PECVD).
• dielectric material it is possible to perform a deposition of dielectric material on the surface of a massive metal electrode.
• This deposition of dielectric material is chosen to withstand high electric fields, typically greater than 30 MV / m, and to have a sufficient flexibility compatible with any thermal expansion of the massive metal electrode.
• the opposite arrangement implementing the deposition of a conductive material on the internal face of a solid piece of dielectric material has other advantages, in particular that of allowing the use of the mechanical part 28 to fulfill other functions. .
• the mechanical part 28 can form a part of the vacuum chamber 12. This part of the vacuum chamber can even be a preponderant part of the vacuum chamber 12.
• the mechanical part 28 on the one hand forms a support for the cathode 14 and on the other hand a support for the anode 16.
• the part 28 provides the electrical isolation between the anode 1 6 and the cathode electrode 24.
• the use of conventional dielectric materials such as, for example, sintered alumina already makes it possible to avoid any metal / vacuum interface.
• the dielectric strength of this type of material of the order of 18 MV / m, further limits the miniaturization of the source 10.
• a dielectric material having a dielectric strength greater than 20MV / m and advantageously greater than 30 MV / m is for example maintained above 30 MV / m in a temperature range between 20 and 200 ° C.
• Composite ceramics of the nitride type make it possible to fulfill this criterion. In-house tests have shown that a ceramic of this nature even allowed to exceed 60 MV / m.
• the inner face 30 has a surface resistivity measured at room temperature of between 1 .10 9 ⁇ . square and 1 .10 13 ⁇ . square and typically close to 1 .10 11 ⁇ . square.
• a resistivity can be obtained by the addition on the surface of a conductive or semiconductive material compatible with the dielectric material.
• a semiconductor material it is for example possible to deposit silicon on the inner face 30.
• the source 10 comprises a plug 32 sealing the vacuum chamber 12.
• the mechanical part 28 comprises a cavity 34 in which is disposed the cathode 14.
• the cavity 34 is delimited by the concave face 26.
• the cap 32 closes the cavity 34.
• the electrode 24 comprises two ends 36 and 38 spaced along the axis 19. The first end 36 is in contact with the cathode 14 and in electrical continuity therewith. The second end 38 is opposite to the first.
• the mechanical part 28 comprises an inner cone trunk 40 with circular section disposed around the axis 19 of the beam 18.
• the truncated cone 40 is located at the second end 38 of the electrode 24.
• the truncated cone 40 s opens in away from the cathode 14.
• the cap 32 comprises a shape complementary to the truncated cone 40 to be disposed there.
• the truncated cone 40 ensures the positioning of the plug 32 in the mechanical part 28.
• the plug 32 can be implemented independently of the embodiment of the electrode 24 in the form of a
• the plug 32 is made of the same dielectric material as the mechanical part 28. This makes it possible to limit any differential thermal expansion phenomena between the mechanical part 28 and the plug 32 when using the source 10.
• the plug 32 is for example fixed to the mechanical part 28 by means of a solder film 42 made in the truncated cone 40 and more generally in an interface zone between the plug 32 and the mechanical part 28. It is possible to metallizing the surfaces to be brazed of the plug 32 and the mechanical part 28 and then to achieve the solder by means of a metal alloy whose melting point is greater than the maximum temperature of use of the source 10.
• the metallization and the solder film 42 are electrically continuous with the end 38 of the electrode 24.
• the frustoconical shape of the metallized interface between the plug 32 and the mechanical part 28 makes it possible to avoid angular shapes too pronounced for the electrode 24 and for the conductive areas extending the electrode 24 to limit possible peak effects of the electric field.
• the solder alloy an active element that reacts with the material of the plug 32 and that of the mechanical part 28.
• the titanium is embedded in the solder alloy. Titanium is a metal reactive with nitrogen and can create a strong chemical bond with the ceramic. Other reactive metals may be used such as vanadium, niobium or zirconium.
• the solder film 42 is conductive and is used to electrically connect the electrode 24 to a supply of the source 10.
• the electrical connection of the electrode 24 by means of the solder film 42 may be used for other types of electrodes, in particular metal electrodes covered with a deposit of material dielectric.
• the electrical connection of the electrode 24 is provided by this electrical contact.
• the metallization of the surface 43 is in electrical contact with the solder film 42. It is it is possible to braze the surface metallization 43 with a contact that can be electrically connected to a supply of the source 10.
• the solder film 42 extends the revolution form of the electrode 24 and contributes to the main function of the electrode 24. This is particularly advantageous when the electrode 24 is formed of a conductive surface disposed on the concave face 26.
• the solder film 42 extends the conductive surface forming the electrode 24 directly and without discontinuity or angular point away from the axis 19.
• the electrode 24, associated with the solder film 42 when it is conductive, form an equipotential surface that contributes to the focusing of the electron beam 18 and to the potential of the cathode 14. This minimizes the local electric fields to reduce the compactness of the source 10.
• the face 26 may have locally convex zones, such as for example at its junction with the truncated cone 40. In practice, the face 26 is at least partially concave. The face 26 is generally concave.
• the source 10 is biased by means of a high voltage source 50, a negative terminal of which is connected to the electrode 24, for example through the metallization of the solder film 42 and of which a positive terminal is connected. at the anode 1 6.
• This type of connection is characteristic of a monopolar operation of the source 10 in which the potential of the anode 1 6 is grounded 52.
• the high voltage source may comprise an output transformer driven in half bridge H.
• the bipolar operation can be done by connecting the common point of the generators 56 and 58 to the earth 52.
• Bipolar operation of a source as described in Figure 1 is made by keeping floating the common point of two high voltage sources connected in series.
• this common point can be used to bias another electrode of the source 10 as shown in Figure 2.
• the source 10 comprises an intermediate electrode 54 splitting into two parts 28a and 28b the mechanical part 28.
• the intermediate electrode 54 extends perpendicular to the axis 19 of the beam 18 and is traversed by the beam 18.
• the presence of the electrode 54 allows bipolar operation by connecting the electrode 54 to the common point of the two high voltage sources 56 and 58 connected in series.
• the assembly formed by the two high-voltage sources 56 and 58 is floating relative to earth 52. As shown in FIG. 1, it is also possible to connect one of the electrodes to earth 52.
• FIG. 3 is a partial and enlarged view of the source 10 around the cathode 14.
• the cathode 14 is disposed in the cavity 34 bearing against the end 36 of the 24.
• a support 60 makes it possible to center the cathode 14 with respect to the electrode 24.
• the electrode 24 being of revolution about the axis 19, the cathode 14 is thus centered on the axis 19 allowing it to emitting the electron beam 18 along the axis 19.
• the support 60 comprises a countersink 61 centered on the axis 19 and in which is disposed the cathode 14. In its periphery, the support 60 comprises an annular zone 63 centered in the 24.
• a spring 64 presses the support 60 so as to maintain the cathode 1 4 against the electrode 24.
• the support 60 is made of insulating material.
• the spring 64 can have an electrical function for conveying a control signal to the cathode 14. More specifically, the cathode 14 emits the electron beam 18 by a face 65, said front face and oriented towards the anode 1 6.
• the electrical control of the cathode 14 is made by its rear face 66 opposite the front face 65.
• the support 60 may comprise an opening 67 of circular section centered on the axis 19. The opening 67 may be metallized so as to electrically connect the spring 64 and the rear face 66 of the cathode 14.
• the plug 32 can provide the electrical connection of the control of the cathode 14 by means of a metallized via 68 therethrough and a contact 69 integral with the plug 32.
• the contact 69 presses the spring 64 along the axis 19 to maintain the cathode 14 bearing against the electrode 24.
• the contact 69 provides electrical continuity between the via 68 and the spring 64.
• the surface 43 of the plug 32 can be metallized into two distinct zones: a zone 43a centered on the axis 19 and a peripheral annular zone 43b around the axis 19.
• the metallized zone 43a is in electrical continuity with the metallic via 68.
• the metallized zone 43b is in electrical continuity with the solder film 42.
• a central contact 70 bears against the zone 43a and a peripheral contact 71 bears against the area 43b.
• the two contacts 70 and 71 form a coaxial connector ensuring the electrical connection of the cathode 14 and the electrode 24 via the metallized zones 43a and 43b and via the metallized via 68 and the solder film 42.
• the cathode 14 may comprise several separately addressable transmitting zones.
• the rear face 66 then has several separate electrical contact zones.
• the support 60 and the spring 64 are adapted accordingly.
• Several contacts similar to the contact 69 and several metallic vias similar to via 68 make it possible to connect the different zones of the rear face 66.
• the surface 43 of the plug 32, the contact 69 and the spring 64 are sectored accordingly to provide for several zones. similar to the zone 43a and electrical continuity with each metallized vias.
• At least one sorbiner 35 may be placed in the cavity 34, between the cathode 14 and the stopper 32, in order to trap any particle that may alter the quality of the void of the enclosure 12.
• the sorber 35 generally acts by chemisorption. Alloys based on zirconium or titanium can be used to trap any particles emitted by the various components of the source 10 surrounding the cavity 34.
• the sorber 35 is, in the example shown, fixed to the plug 32.
• the sorber 35 is made from stacked annular discs surrounding the contact 69.
• FIG. 4a represents a variant of ionizing radiation source 75 in which an anode 76 replaces the anode 16 described above.
• FIG. 4a is a partial and enlarged view of the source 75 around the anode 76.
• the anode 76 comprises a target 20 bombarded by the beam 18 and emitting X-ray radiation 22.
• the anode 76 comprises a cavity 80 in which the electron beam 18 penetrates to reach the target 20. More precisely, the electron beam 18 strikes the target 20 by its internal face 84 carrying the thin layer 20b and emits X-radiation 22 by its outer face 86.
• the walls of the cavity 80 have a cylindrical portion 88 about the axis 19 extending between two ends 88a and 88b.
• the end 88a is in contact with the target 20 and the end 88b is close to the cathode 14.
• the walls of the cavity 80 also have a portion 90 in the form of a washer having a hole 89 and closing the cylindrical portion at the level of the end 88b.
• the electron beam 18 enters the cavity 80 through the hole 89 of the portion 90.
• the temperature rise of the target 20 may result in molecular outgassing of the target 20 which, under the effect of X-radiation 22, is ionized.
• Ions 91 appearing on the inner face 84 of the target 20 can damage the cathode if they return to the accelerating electric field between the anode and the cathode.
• the walls of the cavity 80 can be used to trap the ions 91.
• the walls 88 and 90 of the cavity 80 are electrical conductors and form a faraday cage vis-à-vis parasitic ions that can be emitted by the target 20 inside the vacuum chamber 12
• the ions 91 possibly emitted by the target 20 towards the interior of the vacuum chamber 12 are largely trapped in the cavity 80. Only the hole 89 of the part 90 allows the ions to leave the cavity 80 and could be accelerated to the cathode 14.
• at least one sorber 92 is disposed in the The sorbeur 92 is distinct from the walls 88 and 90 of the cavity 80.
• the sorbeur 92 is a specific component disposed in the cavity 80. Like the sorbeur 35, the sorbeur 92 generally acts by chemisorption. Alloys based on zirconium or titanium can be used to trap the emitted 91 ions.
• the walls of the cavity 80 may form a shielding shield with respect to parasitic ionizing radiation 82 generated inside the vacuum enclosure 12 and possibly electrostatic shielding of the electric field. generated between the cathode 14 and the anode 76.
• the X-radiation 22 forms the useful radiation emitted by the source 75.
• a parasitic X-ray can emerge from the target 20 via the internal face 84. This parasitic radiation is unnecessary and undesirable. .
• shielding screens opposing this type of unwanted radiation are arranged around the X-ray generators. This type of embodiment, however, has a disadvantage.
• the anode 76 and in particular the walls of the cavity 80 are advantageously made of a material with a high atomic number such as, for example, in a tungsten or molybdenum-based alloy in order to stop the parasitic radiation 82. Tungsten or molybdenum have virtually no effect of trapping parasitic ions.
• the separator 92 By making the separator 92 distinctly from the walls of the cavity 80, this makes it possible to free the choice of materials in order to best ensure the parasitic ion trapping functions for the sorbeur 92 and the vis-à-vis screen parasitic radiation 92 for the walls of the cavity 80 without compromise between the two functions.
• the sorbeur 92 and the walls of the cavity 80 are made of different materials each adapted to the function assigned to it. It is the same for the sorbeur 35 vis-à-vis the walls of the cavity 34.
• the walls of the cavity 80 surround the electron beam 18 in the vicinity of the target 20.
• the walls of the cavity 80 form part of the vacuum enclosure 12.
• the walls of the cavity 80 are arranged coaxially with the axis 19 so as to be located radially around the axis 19 at a constant distance and therefore closer to the parasitic radiation.
• the cylindrical portion 88 may partially or completely surround the target 20, thus preventing any parasitic radiation X from escaping from the target 20 radially with respect to the axis 19.
• the anode 76 performs several functions, its electrical function of course, in addition, a faraday cage function surrounding parasitic ions that can be emitted by the target 20 inside the vacuum chamber 12, a function of shielding against the parasitic X-radiation and, moreover, a wall of the vacuum chamber 12.
• the source 75 becomes more compact and by weight.
• the disposition of the magnet or electromagnet 94 may be also defined so as to deflect the parasitic ions 91 to the or the sorbeurs 92 in order to prevent the parasitic ions can not leave the cavity through the hole 89 of the part 90 or at least be deflected with respect to the axis 19 passing through the cathode 14.
• the magnet or the electromagnet 94 generates a magnetic field B oriented along the axis 19. In FIG. 4a, the ions 91 deflected towards the sorber 92 follow a trajectory 91 a and the ions leaving the cavity 80 follow a trajectory 91 b.
• the means for trapping the parasitic ions 91 that can be emitted by the target 20, are multiple: faraday cage formed by the walls of the cavity 80, presence of sorbers 92 in the cavity 80 and presence of a magnet or electromagnet 94 for divert the parasitic ions. These means can be implemented independently or in addition to the parasitic X-ray shielding function and the wall function of the vacuum enclosure 12.
• the anode 76 is advantageously made in the form of a one-piece mechanical piece of revolution about the axis 19.
• the cavity 80 forms a central tubular portion of the anode 76.
• the magnet or electromagnet 94 is disposed around the cavity 80 in an annular space 95 advantageously located outside the vacuum chamber 12.
• the walls of the cavity 80 are made of non-magnetic material. More generally, the entire anode 76 is made of the same material, for example by machining.
• the sorbeur 92 is located in the cavity 80 and the magnet or the electromagnet 94 is located outside the cavity.
• a mechanical support 97 of the sorbeur 92 ensures the maintenance of the sorbeur 92 and is made of magnetic material.
• the support 97 is disposed in the cavity so as to guide the magnetic flux coming from the magnet or the electromagnet 94.
• it can be formed around a magnetic circuit 99.
• support 97 is advantageously arranged in the extension of the magnetic circuit 99.
• the anode comprises a bearing zone 96 on the mechanical part 28.
• the bearing zone 96 has for example the shape of a flat washer extending perpendicularly to the axis 19 .
• an orthogonal coordinate system X, Y, Z is defined.
• Z is a direction carried by the axis 19.
• the field Bz carried by the Z axis makes it possible to focus the electron beam 18 on the target 20
• the size of the electronic spot 18a on the target 20 is shown near the target 20 in the XY plane.
• the electronic spot 18a is circular.
• the size of the X-ray spot 22a emitted by the target 20 is also shown near the target 20 in the XY plane. Since the target 20 is perpendicular to the axis 19, the X-ray spot 22a is also circular.
• FIG. 4b represents a variant of the anode 76 in which a target 21 is inclined with respect to the XY plane perpendicular to the axis 19. This inclination makes it possible to enlarge the surface of the target 20 bombarded by the beam of 18. By enlarging this area, the increase in The temperature of the target 20 due to the interaction with the electrons is better distributed.
• the source 75 is implemented for imaging, it is useful to keep an X-ray spot 22a as punctual as possible or at least circular as in the variant of Figure 4a. To keep this spot 22a, with an inclined target 21, it is useful to modify the shape of the electronic spot in the XY plane.
• the electronic spot is marked 18b and is shown near the target 21 in its XY mark.
• the spot is advantageously of elliptical shape.
• Such a spot shape can be obtained from cathode emitting zones distributed in the cathode plane in a shape similar to the desired shape for spot 18b.
• the quadrupole forms an active magnetic system generating a magnetic field transverse to the axis 19 to obtain the expected shape for the electronic spot 18b.
• the electron beam 18 is spread in the X direction and is concentrated in the Y direction to maintain a circular X-ray spot 22a.
• the active magnetic system can also be controlled to obtain other forms of electronic spot and possibly other forms of X-ray spot.
• the active magnetic system is of particular interest when the target 21 is inclined.
• the active magnetic system may also be employed with a target perpendicular to the axis 19.
• the anodes 1 6 and 76 in all their variants can be implemented independently of the embodiment of the electrode 24 in the form of a conductive surface disposed on the concave face 26 of the dielectric material and independently of the implementation of the plug 32.
• the mechanical part 28 made of dielectric material and on which different metallizations have been made, in particular the metallization forming the electrode 24, forms a monolithic support. It is possible to assemble on one side of this support, the cathode 14 and the plug 32. On the other side of this support, it is possible to assemble the anode 1 6 or 76.
• the attachment of the anode 1 6 or 76 and the plug 32 on the mechanical part 28 can be performed by ultra-vacuum brazing.
• the target 20 or 21 can also be assembled by translation along the axis 19 on the anode 76.
• Figure 5 shows two identical sources 75 mounted in the same support 100.
• This mounting example can be used for mounting more than two sources.
• This example also applies to the sources 10.
• the sources 10 as represented in FIGS. 1 and 2 can also be mounted in the support 100.
• the description of the support 100 and the complementary parts can be applied regardless of the number of sources .
• the mechanical part 28 advantageously has an outer surface to the vacuum chamber 12 having two frustoconical shapes 102 and 104 extending around the axis 19.
• the form 102 is an outer truncated cone flaring towards the anode 1 6.
• the shape 104 is an inner truncated cone flaring from the cathode 14 and more precisely from the outer face 43 of the plug 32.
• the two truncated cones 102 and 104 meet on a ring 106 also centered on the axis 19.
• the ring 106 forms the smallest diameter of the truncated cone 102 and the largest diameter of the truncated cone 104.
• the ring 106 has for example a shape of a torus portion allowing a connection without sharp angle of two truncated cones 102 and 104.
• the shape of the outer surface of the mechanical part 28 facilitates the establishment of the source 75 in the support 100 which has a complementary surface also having two frustoconical shapes 108 and 1 10.
• the tr onc cone 108 of the support 100 is complementary to the truncated cone 102 of the mechanical part 28.
• the truncated cone 1 10 of the support 100 is complementary to the truncated cone 104 of the mechanical part 28.
• the support 100 has a crown 1 12 complementary to the ring 106 of the mechanical part 28.
• a flexible seal 1 14, for example based on silicone is arranged between the support 100 and the mechanical part 28 and more precisely between the trunks of cones and complementary crowns.
• the truncated cone 108 of the support 100 has a more open apex angle than that of the truncated cone 102 of the mechanical part 28.
• the truncated cone 1 10 of the support 100 has a more open aperture angle than the the truncated cone 104 of the mechanical part 28.
• the difference in the angle value at the apex between the truncated cones may be less than 1 degree, for example of the order of 0.5 degree.
• the source 75 and its support 100 are configured so that the air situated between two truncated cones 104 and 110 s escapes inside the coaxial connection formed by the two contacts 70 and 71 and feeding the cathode 14
• the external contact 71 providing power to the electrode 24 comes into contact with the metallized zone 43b by means of a spring 1 1 6 allowing a functional clearance between the contact 71 and the plug 32.
• the plug 32 may comprise an annular groove 1 18 separating the two metallized zones 43a and 43b.
• a closure plate 130 can ensure the maintenance of the mechanical part 28, equipped with its cathode 14 and its anode 76, in the support 100.
• the plate 130 may be made of conductive material or comprise a metallized face to ensure the electrical connection of the anode 76.
• the plate 130 may allow the cooling of the anode 76.
• the cooling may be provided for conduction by means of a contact between the anode 76 and for example the cylindrical portion 88 of the cavity 80 of the anode 76.
• FIG. 6a represents a variant of a multi-source assembly 150 in which a mechanical part 152 common to several sources 75, four in the example represented, fulfills all the functions of the mechanical part 28.
• the vacuum enclosure 153 is common
• the support 152 is advantageously formed of dielectric material in which, for each of the sources 75, a concave face 26 is formed.
• an electrode 24 (not shown) is disposed on the corresponding concave face 26.
• the cathodes 14 of the different sources 75 are not represented.
• the anodes comprise a plate 156 in contact with the mechanical part 152 and pierced with 4 holes 158 each allowing the passage of an electron beam 18 from each 75.
• the plate 156 fills, for each of the sources 75, the function of the portion 90 described above.
• each orifice 158 are disposed a cavity 80 bounded by its wall 88 and a target 20. Alternatively, it is possible to keep separate anodes, which makes it possible to separate their electrical connection.
• FIG. 6b represents another variant of a multi-source assembly 1 60 in which a mechanical part 1 62 is also common to several sources whose respective cathodes 14 are aligned on an axis 1 64 passing through each of the cathodes 14.
• the axis 1 64 is perpendicular to the axis 19 of each of the sources.
• An electrode 1 66 for focusing the electron beams emitted by the different cathodes 14 is common to all the cathodes 14.
• the variant of Figure 6b further reduces the distance between two neighboring sources.
• the mechanical part 1 62 is made of dielectric material and comprises a concave face 1 68 disposed in the vicinity of the different cathodes 14.
• the electrode 166 is formed of a conductive surface disposed on the concave face 1 68.
• the electrode 1 66 fulfills all the functions of the electrode 24 described above.
• the cathodes may be thermo-nic.
• the common metal electrode forms the support for the different cathodes of the different sources. Since this electrode is of large size, it is advantageous to connect it to the generator ground of the multi-source assembly. The anode (s) are then connected to one or more positive potentials of the generator.
• the multi-source set 1 60 may comprise a plug 170 common to all sources.
• the plug 170 can fulfill all the functions of the cap 32 described above.
• the plug 170 may in particular be fixed to the mechanical part 1 62 by means of a conductive solder film 172 used to electrically connect the electrode 1 66.
• the multi-source set 160 may comprise an anode 174 common to the different sources.
• the anode 174 is similar to the anode 154 of the variant of Figure 6a.
• the anode 174 comprises a plate 176 fulfilling all the functions of the plate 156 described with reference to FIG. 6a. To avoid overloading Figure 6b, for the anode 174, only the plate 176 is shown.
• the axis 1 64 is rectilinear. It is also possible to arrange the cathodes on a curved axis, such as for example an arc of circle as shown in Figure 6c for focusing X-rays 22 from all sources at a point in the center of the arc. Other forms of curved axis, in particular a parabolic curve, also make it possible to focus the X-rays at a point.
• the curved axis remains locally perpendicular to each of the axes 19 around which develops the electron beam of each source.
• the arrangement of the cathodes 14 on an axis makes it possible to obtain sources distributed in one direction. It is also possible to make a multi-source assembly in which the cathodes are distributed along several intersecting axes. It is for example possible to arrange the sources according to several curved axes, each realized in a plane and the planes being secant. By way of example, as shown in FIG. 6d, it is possible, for example, to have several axes 180 and 182 distributed over a parabolic surface of revolution 184. This makes it possible to focus the X-rays 22 from all sources to the focus of the parabolic surface.
• Figure 6e the various axes 190, 192 and 194 on which are distributed the different cathodes 14 of the multi-source assembly are parallel to each other.
• Figures 7a and 7b show two embodiments of the power supply of the assembly shown in Figure 6a.
• Figures 7a and 7b are shown in section in a plane passing through several axes 19 of different sources 75. Two sources appear in Figure 7a, and three sources in Figure 7b. It is understood that the description of the multi-source set 150 can be implemented regardless of the number of sources 75 or possibly 10.
• the anodes 114 are common to all the sources 75 of the assembly 150 and their potential is the same, for example that of the earth 52.
• the control of each of the sources 10 can be distinct in the two embodiments.
• two high voltage sources V1 and V2 supply the electrodes 24 of each of the sources 10 separately.
• the insulating nature of the mechanical part 152 makes it possible to separate the two high voltage sources V1 and V2, which can for example be pulsed with two energy sources. different.
• separate current sources 11 and 12 each provide control of the different cathodes 14.
• the electrodes 24 of all the sources 75 are interconnected for example by means of a metallization carried out on the mechanical part 152.
• a high voltage source V Co mmun supplies all the electrodes 24. control of the different cathodes 14 remains assured by separate current sources 11 and 12.
• the power supply of the multi-source assembly described with reference to FIG. 7b is well adapted to the variant described with reference to FIGS. 6b, 6d and 6e.
• FIGS. 8a, 8b and 8c represent several examples of sets of ionizing radiation generators each comprising several sources 10 or 75.
• the support as described using FIG. 5, is common to all Sources 10.
• a high voltage connector 140 allows the supply of the different sources 10.
• a control connector 142 makes it possible to connect each of the sets to a control module that is not shown and configured to switch each of the sources 10 in a predetermined sequence.
• the support 144 has an arcuate shape and the various sources 10 are aligned with the arcuate shape.
• This type of arrangement is for example useful in a medical scanner to avoid moving the X-ray source around the patient.
• the different sources 10 each emit an X-ray radiation.
• the scanner also comprises a radiation detector and a module making it possible to reconstitute a 3-dimensional image on the basis of the information captured by the detector. In order not to overload the figure, the detector and the reconstitution module are not represented.
• the support 146 and the sources 10 follow a line segment.
• the support 148 has a plate shape and the sources are distributed in two directions on the support 148.
• the variant of FIG. 6b is particularly interesting. This variant makes it possible to reduce the pitch between the different sources.

Landscapes

• X-Ray Techniques (AREA)
• Radiation-Therapy Devices (AREA)

Applications Claiming Priority (2)

Publications (2)

Family

ID=61258270

Family Applications (1)

Country Status (11)

Families Citing this family (2)

Family Cites Families (14)

• 2017
  • 2017-07-11 FR FR1700742A patent/FR3069100B1/fr active Active
• 2018
  • 2018-07-10 TW TW107123871A patent/TW201909227A/zh unknown
  • 2018-07-11 US US16/610,879 patent/US11101097B2/en active Active
  • 2018-07-11 EP EP18736947.5A patent/EP3652772B1/de active Active
  • 2018-07-11 IL IL271797A patent/IL271797B2/en unknown
  • 2018-07-11 CN CN201880045830.2A patent/CN110870035B/zh active Active
  • 2018-07-11 AU AU2018298822A patent/AU2018298822B2/en active Active
  • 2018-07-11 WO PCT/EP2018/068811 patent/WO2019011993A1/fr unknown
  • 2018-07-11 JP JP2019561229A patent/JP7073406B2/ja active Active
  • 2018-07-11 KR KR1020207000374A patent/KR102584668B1/ko active IP Right Grant
  • 2018-07-11 SG SG11201912213QA patent/SG11201912213QA/en unknown

Also Published As

Similar Documents

Legal Events