EP3562620A1 - Polishing pad for a portable rotary electric machine - Google Patents

Polishing pad for a portable rotary electric machine

Info

Publication number
EP3562620A1
EP3562620A1 EP17828987.2A EP17828987A EP3562620A1 EP 3562620 A1 EP3562620 A1 EP 3562620A1 EP 17828987 A EP17828987 A EP 17828987A EP 3562620 A1 EP3562620 A1 EP 3562620A1
Authority
EP
European Patent Office
Prior art keywords
polishing
valve
foam body
active surface
reservoir
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP17828987.2A
Other languages
German (de)
French (fr)
Other versions
EP3562620B1 (en
Inventor
Libero MAZZONE
Michel BARBERIS
Antonio Greco
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to PL17828987T priority Critical patent/PL3562620T3/en
Publication of EP3562620A1 publication Critical patent/EP3562620A1/en
Application granted granted Critical
Publication of EP3562620B1 publication Critical patent/EP3562620B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L13/00—Implements for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L13/10—Scrubbing; Scouring; Cleaning; Polishing
    • A47L13/16—Cloths; Pads; Sponges
    • A47L13/17—Cloths; Pads; Sponges containing cleaning agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B23/00—Portable grinding machines, e.g. hand-guided; Accessories therefor
    • B24B23/02—Portable grinding machines, e.g. hand-guided; Accessories therefor with rotating grinding tools; Accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

Definitions

  • the present invention relates to a polishing plate formed of a foam body, provided with a fixing surface to be fixed to the rotary plate of a polishing machine and having an active surface wetted by the polishing liquid and coming from in contact with the surface to be polished.
  • polishing not only is a surface that is rubbed on the surface to be polished but also use a liquid that is driven by the active surface of the tool for polishing the surface.
  • This liquid contains a load of finely divided material and is the active ingredient of polishing.
  • it is necessary to have a polishing liquid with special characteristics and also a polishing plate adapted to this polishing liquid.
  • the buffing liquids are distributed in relatively large volumes to the professionals so that often a portion of these large volumes are leftovers from one or more buffing operations that become unusable due to the degradation of the liquid.
  • the present invention aims to develop a polishing tray, convenient, simplifying the preparatory operations and reducing losses of buffing liquid, both during polishing and in the form of leftovers of polishing liquids not consumed.
  • the subject of the present invention is a polishing plate of the type defined above, characterized in that the polishing plate comprises:
  • the reservoir having an axial distribution valve communicating with the active surface of the foam body
  • valve having a valve seat closed by a closure member biased in the closed position and provided with a control member opening the valve by forcing the foam body by its active surface against the surface to be polished.
  • the integration of the tank containing the polishing liquid in the polishing plate makes it possible to simplify considerably the polishing work and the management of the stocks of material. Indeed, the operator chooses the buffing disc according to each application and he then has an average dose of buffing liquid for such an operation.
  • the distribution of the liquid is done directly on the active surface, during work since it is sufficient for the operator to press the buffing disc against the worked surface so that a dose of polishing liquid is distributed from the reservoir and the valve and get to the active surface.
  • this dose is easily managed by the duration of the mechanical contact opening of the valve, the user can very easily and with his usual, manage the distribution of polishing liquid.
  • the liquid arriving on the shining surface in the center of the plate the ejections of product are almost non-existent. It also means that all the product distributed will be used for polishing.
  • control member of the valve is a rod connected to the closure member and which is pushed in the direction of opening by compression of the foam body by its active surface bearing against the surface to work.
  • This control member is a very simple means for controlling the opening of the valve and the metering distribution of polishing liquid.
  • the valve comprises a return spring.
  • the valve is kept closed by the return spring and it is only when the control member, the rod in this case, is pushed back by its support against the surface to be polished or an intermediate surface that the valve order. Then as soon as the compression disappears, the return spring closes the valve.
  • the valve is held in the closed position by a magnetic connection applying the closure member against the valve seat, this connection being constituted for example by a magnetic element such as a magnet integrated in the valve and the valve seat has a ferromagnetic portion such as a ring, so as to draw the closure member against the valve seat and close the valve.
  • the reservoir is recharged by a filling orifice opening into the axis of the fastening surface.
  • the entire shining plate including the reservoir and the elements or accessories of the reservoir such as the dispensing valve, are elements centered around the axis of rotation which is at the same time the axis of rotation. symmetry of the polishing plate so as to avoid any unbalance and have a regular rotation of the polishing plate, essential for the quality of the polishing work.
  • FIG. 1 is a view in axial section of a first embodiment of a polishing plate
  • FIG. 2 shows an axial sectional view of a second embodiment of a polishing plate
  • FIG. 3 shows an example of an active polishing liquid distribution position in the case of the plate of FIG. 2,
  • FIG. 4 is a very simplified diagram of a polishing machine equipped with a polishing plate according to the invention.
  • the object of the invention is a polishing plate 1 which is fixed to the rotary tool-holder plate 103 of a rotary electric machine 100 rotating the polishing plate 1 according to a simple rotational movement or a movement orbital on a surface to be polished (worked surface) (S) using a polishing liquid.
  • a simple rotational movement or a movement orbital on a surface to be polished (worked surface) (S) using a polishing liquid Such a machine is shown in FIG.
  • the polishing plate 1 consists of a body 2 in the form of a circular disk, of foam, one face of which has a fastening surface 21 to the plate 103 of the rotary machine 100 and the other face constitutes the active surface 22 used for polishing.
  • the foam body 2 includes a reservoir of polishing liquid 3.
  • the reservoir 3 is provided with a dispensing valve 4 in its bottom wall at its center (in the H / B orientation, up / down of FIG. 1) .
  • the valve 4 comprises a valve seat 41 opening into a duct 42 made in the foam or constituted by a flexible sleeve, at least on the portion of height H1 from the active surface 22, under the seat 41.
  • An organ of cone-shaped closure 43 complementary to the shape of the seat 41, is applied elastically against it, for example by a spring 46 supported on the one hand against the top of the closure member 43 and other on the other hand, against a support 44 secured to the reservoir or the valve seat 41, for example in the form of a bow or strainer over the seat 41.
  • the closure member 43 is extended in the conduit 42 by a rod 44 arriving above the active surface 22 uncompressed at the height H2 so that if the foam is compressed by a height H1, at the end of the rod 44 which will be touched and pushed back, opening the valve 4 and releasing the polishing liquid.
  • the top of the tank 3 is directly below the fastening surface 21 and is surrounded by a foam only laterally and on the underside.
  • the valve 4 with its closure member 43, its spring 46 and its support 44 is a separately manufactured part and then integrated in the reservoir 3.
  • the filling will be done at the end of manufacture the tray through the valve 4 which will then be protected to prevent it from being activated unexpectedly during packaging and transport operations.
  • the reservoir 3 has a filling orifice 31, on the attachment surface side 21, closed by a stopper 32.
  • the fastening surface 21 of the plate is preferably a fibrous surface for hooking onto the surface of the plate 103 of the machine 100 which, in turn, is generally equipped with micro-claws allowing a quick and yet very effective fixing without hindering then , after use, replacement of the shine 1.
  • the active surface 22 of the tray 1 is the lower surface of the foam body 2 or a particular surface, reported.
  • the active surface 22 has a roughness and more generally a surface state depending on the work to be performed and the nature of the surface to be worked / polished. It is the same with the quality of the polishing liquid.
  • the control rod 43 stops clearly above the active surface 22 at rest, when the foam body 2 is not compressed, so as not to systematically open the dispensing valve 4 during the polishing work and so that the liquid distribution is done only by the intentional control resulting from a pronounced support of the polishing plate 1 on the worked surface (S).
  • valve 4 In the case of a valve 4 incorporating a duct 42, it is flexible and slightly set back from the active surface 22 so as not to interfere in the polishing and nevertheless allow the compression of the foam body 2.
  • valve 4 remains tight and can not be opened by an accidental thrust exerted on the control rod 44 during the packaging operations, handling and placing the tray 1 on the machine 100.
  • control rod of the valve is reported to be installed at the time of use of the plate, by screwing or clipping.
  • the return spring 45 of the closure member 43 is replaced by a magnetic connection constituted by a small magnet integrated in the closure member and a ferromagnetic ring, integrated in the valve seat 41.
  • the whole of the polishing plate must have rotation symmetry with a precise distribution of weight around the axis YY which is the axis of rotation of the machine, to avoid unbalance. For this reason, the entire structure of the shine 1 has a rotational symmetry.
  • FIG. 2 shows another embodiment of the polishing plate 1a and in which the elements identical to those of the embodiment of FIG. 1 bear the same references.
  • This embodiment differs from the previous one in that the tank 3 is integrated deeper into the foam body 2 of the glazing plate 1a with an intermediate portion of foam 2a between the top of the tank 3 and the fastening surface 21 to the deck. 100.
  • the characteristics of this polishing plate are the same as those of the previous plate.
  • Figure 3 shows the polishing plate la of Figure 2 in the polishing liquid distribution position.
  • the polishing plate is inclined for example and the bottom at the active surface 22 is compressed so that the closure member 43 is lifted from the valve seat 41 and the polishing liquid is thus distributed through the conduit 42 on the active surface 21, interface between the polishing plate la and the surface to be polished (S).
  • This inclined position of actuation of the shutter member 43 is only one example; it is also possible to compress the foam body 2 by crushing it perpendicular to the worked surface (S).
  • the distribution of polishing liquid is in the same conditions, that the plate 1, the inclined or parallel to the surface to be polished (S).
  • the surface to be polished (S) is not necessarily flat or horizontal.
  • FIG. 4 schematically shows a power-operated machine 100 equipped with a tool-carrying plate 103 and a polishing plate 1, according to the invention.
  • the machine consists of a handle forming a handle 101 enclosing the electric motor.
  • the output of the motor drives, via an angle gear 102, through example at 90 °, the output shaft carrying the plate 103 receiving the polishing plate 1, the.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Containers And Packaging Bodies Having A Special Means To Remove Contents (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

A polishing pad (1) formed from a foam body (2), provided with an attachment surface (21) for being attached to the rotary plate of a polishing machine and having an active surface (22) wet by the polishing liquid and coming into contact with the surface to be polished. The polishing pad (1) comprises a reservoir of polishing liquid (3) incorporated into the foam body (2). The reservoir (3) has a distribution valve (4) in the axial position communicating with the active surface (22). The valve (4) has a valve seat (41) closed by a closure member (43) that is returned to the closed position and provided with a control member (44) that opens the valve (4) when the active surface (22) of the foam body (2) is pressed against the surface to be polished.

Description

«PLATEAU DE LUSTRAGE POUR UNE MACHINE ELECTROPORTATIVE  "SHELVING TRAY FOR AN ELECTROPORTATIVE MACHINE
ROTATIVE»  ROTARY "
Domaine de l'invention  Field of the invention
La présente invention se rapporte à un plateau de lustrage formé d'un corps en mousse, muni d'une surface de fixation pour être fixé au plateau rotatif d'une machine de lustrage et ayant une surface active mouillée par le liquide de lustrage et venant en contact avec la surface à lustrer.  The present invention relates to a polishing plate formed of a foam body, provided with a fixing surface to be fixed to the rotary plate of a polishing machine and having an active surface wetted by the polishing liquid and coming from in contact with the surface to be polished.
Etat de la technique State of the art
On connaît déjà de tels plateaux de lustrage.  Such glossing trays are already known.
Comme pour lustrer, il faut non seulement une surface que l'on frotte sur la surface à lustrer mais également utiliser un liquide qui est entraîné par la surface active de l'outil pour le lustrage de la surface. Ce liquide contient une charge de matière finement divisée et qui constitue le principe actif du lustrage. En fonction de la surface à travailler, il faut un liquide de lustrage ayant des caractéristiques particulières et aussi un plateau de lustrage adapté à ce liquide de lustrage.  As for polishing, not only is a surface that is rubbed on the surface to be polished but also use a liquid that is driven by the active surface of the tool for polishing the surface. This liquid contains a load of finely divided material and is the active ingredient of polishing. Depending on the surface to be worked, it is necessary to have a polishing liquid with special characteristics and also a polishing plate adapted to this polishing liquid.
Les liquides de lustrage sont diffusés en des volumes relativement importants aux professionnels de sorte que souvent une partie de ces volumes importants constitue des restes d'une ou plusieurs opérations de lustrage qui deviennent inutilisables à cause de la dégradation du liquide.  The buffing liquids are distributed in relatively large volumes to the professionals so that often a portion of these large volumes are leftovers from one or more buffing operations that become unusable due to the degradation of the liquid.
Cela représente un gâchis important et coûteux de liquide de lustrage.  This represents a significant and expensive waste of buffing liquid.
But de l'invention Purpose of the invention
La présente invention a pour but de développer un plateau de lustrage, pratique, simplifiant les opérations préparatoires et réduisant les pertes de liquide de lustrage, tant pendant le lustrage que sous la forme de restes de liquides de lustrage non consommés.  The present invention aims to develop a polishing tray, convenient, simplifying the preparatory operations and reducing losses of buffing liquid, both during polishing and in the form of leftovers of polishing liquids not consumed.
Exposé et avantages de l'invention Description and advantages of the invention
A cet effet, la présente invention a pour objet un plateau de lustrage du type défini ci-dessus caractérisé en ce que le plateau de lustrage comporte :  For this purpose, the subject of the present invention is a polishing plate of the type defined above, characterized in that the polishing plate comprises:
- un réservoir de liquide de lustrage intégré dans le corps en mousse, - le réservoir ayant une soupape de distribution en position axiale communiquant avec la surface active du corps en mousse, a tank of polishing liquid integrated in the foam body, the reservoir having an axial distribution valve communicating with the active surface of the foam body,
- la soupape ayant un siège de soupape fermé par un organe d'obturation rappelé en position de fermeture et muni d'un organe de commande ouvrant la soupape par appui forcé du corps en mousse par sa surface active contre la surface à lustrer.  - The valve having a valve seat closed by a closure member biased in the closed position and provided with a control member opening the valve by forcing the foam body by its active surface against the surface to be polished.
L'intégration du réservoir contenant du liquide de lustrage dans le plateau de lustrage permet de simplifier considérablement le travail de lustrage et la gestion des stocks de matériel. En effet, l'opérateur choisit le disque de lustrage en fonction de chaque application et il dispose alors d'une dose moyenne de liquide de lustrage pour une telle opération. La distribution du liquide se fait directement sur la surface active, en cours de travail puisqu'il suffit à l'opérateur d'appuyer le disque de lustrage contre la surface travaillée pour qu'une dose de liquide de lustrage soit distribuée à partir du réservoir et de la soupape et arriver jusqu'à la surface active. Comme cette dose se gère facilement par la durée du contact mécanique d'ouverture de la soupape, l'utilisateur pourra très facilement et avec son habitude, gérer la distribution de liquide de lustrage. Le liquide arrivant sur la surface de lustrage au centre du plateau, les éjections de produit sont quasi inexistantes. Cela signifie aussi que tout le produit distribué sera utilisé pour le lustrage.  The integration of the tank containing the polishing liquid in the polishing plate makes it possible to simplify considerably the polishing work and the management of the stocks of material. Indeed, the operator chooses the buffing disc according to each application and he then has an average dose of buffing liquid for such an operation. The distribution of the liquid is done directly on the active surface, during work since it is sufficient for the operator to press the buffing disc against the worked surface so that a dose of polishing liquid is distributed from the reservoir and the valve and get to the active surface. As this dose is easily managed by the duration of the mechanical contact opening of the valve, the user can very easily and with his usual, manage the distribution of polishing liquid. The liquid arriving on the shining surface in the center of the plate, the ejections of product are almost non-existent. It also means that all the product distributed will be used for polishing.
Suivant une autre caractéristique avantageuse, l'organe de commande de la soupape est une tige reliée à l'organe d'obturation et qui est repoussée dans le sens de l'ouverture par la compression du corps en mousse par sa surface active en appui contre la surface à travailler.  According to another advantageous characteristic, the control member of the valve is a rod connected to the closure member and which is pushed in the direction of opening by compression of the foam body by its active surface bearing against the surface to work.
Cet organe de commande constitue un moyen très simple pour commander l'ouverture de la soupape et la distribution dosée de liquide de lustrage.  This control member is a very simple means for controlling the opening of the valve and the metering distribution of polishing liquid.
Suivant une autre caractéristique avantageuse, la soupape comporte un ressort de rappel. La soupape est maintenue fermée par le ressort de rappel et ce n'est que lorsque l'organe de commande, la tige en l'occurrence, est repoussé par sa venue en appui contre la surface à lustrer ou une surface intermédiaire que la soupape se commande. Puis dès que la compression disparaît, le ressort de rappel referme la soupape. According to another advantageous characteristic, the valve comprises a return spring. The valve is kept closed by the return spring and it is only when the control member, the rod in this case, is pushed back by its support against the surface to be polished or an intermediate surface that the valve order. Then as soon as the compression disappears, the return spring closes the valve.
Suivant une autre caractéristique avantageuse, la soupape est maintenue en position fermée par une liaison magnétique appliquant l'organe d'obturation contre le siège de soupape, cette liaison étant par exemple constituée par un élément magnétique tel qu'un aimant intégré dans la soupape et le siège de soupape comporte une partie ferromagnétique telle qu'un anneau, de manière à attirer l'organe d'obturation contre le siège de soupape et fermer la soupape.  According to another advantageous characteristic, the valve is held in the closed position by a magnetic connection applying the closure member against the valve seat, this connection being constituted for example by a magnetic element such as a magnet integrated in the valve and the valve seat has a ferromagnetic portion such as a ring, so as to draw the closure member against the valve seat and close the valve.
Suivant une autre caractéristique, le réservoir se recharge par un orifice de remplissage débouchant dans l'axe de la surface de fixation.  According to another characteristic, the reservoir is recharged by a filling orifice opening into the axis of the fastening surface.
De façon globale, l'ensemble du plateau de lustrage, y compris le réservoir et les éléments ou accessoires du réservoir tels que la soupape de distribution, sont des éléments centrés autour de l'axe de rotation qui est en même temps l'axe de symétrie du plateau de lustrage de manière à éviter tout balourd et avoir une rotation régulière du plateau de lustrage, indispensable pour la qualité du travail de lustrage.  Overall, the entire shining plate, including the reservoir and the elements or accessories of the reservoir such as the dispensing valve, are elements centered around the axis of rotation which is at the same time the axis of rotation. symmetry of the polishing plate so as to avoid any unbalance and have a regular rotation of the polishing plate, essential for the quality of the polishing work.
Dessins drawings
La présente invention sera décrite ci-après de manière plus détaillée à l'aide de deux modes de réalisation d'un plateau de lustrage représentés dans les dessins annexés dans lesquels :  The present invention will be described in more detail below with the aid of two embodiments of a polishing plate shown in the accompanying drawings in which:
- la figure 1 est une vue en coupe axiale d'un premier mode de réalisation d'un plateau de lustrage,  FIG. 1 is a view in axial section of a first embodiment of a polishing plate,
- la figure 2 montre une vue en coupe axiale d'un second mode de réalisation d'un plateau de lustrage,  FIG. 2 shows an axial sectional view of a second embodiment of a polishing plate,
- la figure 3 montre un exemple de position active de distribution de liquide de lustrage dans le cas du plateau de la figure 2,  FIG. 3 shows an example of an active polishing liquid distribution position in the case of the plate of FIG. 2,
- la figure 4 est un schéma très simplifié d'une machine de lustrage équipée d'un plateau de lustrage selon l'invention.  - Figure 4 is a very simplified diagram of a polishing machine equipped with a polishing plate according to the invention.
Description de modes de réalisation de l'invention  Description of Embodiments of the Invention
Selon la figure 1 , l'invention a pour objet un plateau de lustrage 1 qui se fixe au plateau rotatif porte-outil 103 d'une machine rotative électroportative 100 entraînant en rotation le plateau de lustrage 1 suivant un mouvement de rotation simple ou un mouvement orbital sur une surface à lustrer (surface travaillée) (S) en utilisant un liquide de lustrage. Une telle machine est représentée à la figure 4. According to FIG. 1, the object of the invention is a polishing plate 1 which is fixed to the rotary tool-holder plate 103 of a rotary electric machine 100 rotating the polishing plate 1 according to a simple rotational movement or a movement orbital on a surface to be polished (worked surface) (S) using a polishing liquid. Such a machine is shown in FIG.
Le plateau de lustrage 1 se compose d'un corps 2 en forme de disque circulaire, en mousse, dont une face comporte une sur- face de fixation 21 au plateau 103 de la machine rotative 100 et l'autre face constitue la surface active 22 servant au lustrage. Le corps en mousse 2 intègre un réservoir de liquide de lustrage 3. Le réservoir 3 est muni d'une soupape de distribution 4 dans sa paroi inférieure en son centre (selon l'orientation H/B, haut/bas de la figure 1).  The polishing plate 1 consists of a body 2 in the form of a circular disk, of foam, one face of which has a fastening surface 21 to the plate 103 of the rotary machine 100 and the other face constitutes the active surface 22 used for polishing. The foam body 2 includes a reservoir of polishing liquid 3. The reservoir 3 is provided with a dispensing valve 4 in its bottom wall at its center (in the H / B orientation, up / down of FIG. 1) .
La soupape 4 comporte un siège de soupape 41 débouchant dans un conduit 42 réalisé dans la mousse ou constitué par un manchon souple, au moins sur la partie de hauteur Hl à partir de la surface active 22, sous le siège 41. Un organe d'obturation 43 en forme de cône complémentaire de la forme du siège 41 , est appliqué élasti- quement contre celui-ci, par exemple par un ressort 46 appuyé d'une part contre le dessus de l'organe d'obturation 43 et d'autre part, contre un appui 44 solidaire du réservoir ou du siège de soupape 41 , par exemple en forme d'arceau ou de crépine au-dessus du siège 41. L'organe d'obturation 43 est prolongé dans le conduit 42 par une tige 44 arrivant au-dessus de la surface active 22 non comprimée à la hauteur H2 de sorte que si l'on comprime la mousse d'une hauteur Hl , au niveau de l'extrémité de la tige 44 qui sera touchée et repoussée, ouvrant la soupape 4 et libérant le liquide de lustrage.  The valve 4 comprises a valve seat 41 opening into a duct 42 made in the foam or constituted by a flexible sleeve, at least on the portion of height H1 from the active surface 22, under the seat 41. An organ of cone-shaped closure 43 complementary to the shape of the seat 41, is applied elastically against it, for example by a spring 46 supported on the one hand against the top of the closure member 43 and other on the other hand, against a support 44 secured to the reservoir or the valve seat 41, for example in the form of a bow or strainer over the seat 41. The closure member 43 is extended in the conduit 42 by a rod 44 arriving above the active surface 22 uncompressed at the height H2 so that if the foam is compressed by a height H1, at the end of the rod 44 which will be touched and pushed back, opening the valve 4 and releasing the polishing liquid.
Selon le mode de réalisation de la figure 1 , le dessus du réservoir 3 est directement sous la surface de fixation 21 et n'est entouré d'une mousse que latéralement et sur le dessous.  According to the embodiment of Figure 1, the top of the tank 3 is directly below the fastening surface 21 and is surrounded by a foam only laterally and on the underside.
La soupape 4 avec son organe d'obturation 43, son ressort 46 et son appui 44 est une pièce fabriquée séparément et intégrée ensuite dans le réservoir 3. Dans le cas d'un plateau de lustrage jetable, le remplissage se fera en fin de fabrication du plateau en passant par la soupape 4 qui sera ensuite protégée pour éviter qu'elle ne soit actionnée intempestivement pendant les opérations de conditionnement et de transport. Dans le mode de réalisation de la figure 1 , le réservoir 3 a un orifice de remplissage 31 , côté surface de fixation 21 , fermé par un bouchon 32. The valve 4 with its closure member 43, its spring 46 and its support 44 is a separately manufactured part and then integrated in the reservoir 3. In the case of a disposable polishing plate, the filling will be done at the end of manufacture the tray through the valve 4 which will then be protected to prevent it from being activated unexpectedly during packaging and transport operations. In the embodiment of FIG. 1, the reservoir 3 has a filling orifice 31, on the attachment surface side 21, closed by a stopper 32.
La surface de fixation 21 du plateau est de préférence une surface fibreuse pour s'accrocher à la surface du plateau 103 de la machine 100 qui, lui, est en général équipé de micro-griffes permettant une fixation rapide et néanmoins très efficace sans gêner ensuite, après usage, le remplacement du plateau de lustrage 1.  The fastening surface 21 of the plate is preferably a fibrous surface for hooking onto the surface of the plate 103 of the machine 100 which, in turn, is generally equipped with micro-claws allowing a quick and yet very effective fixing without hindering then , after use, replacement of the shine 1.
La surface active 22 du plateau 1 est la surface inférieure du corps en mousse 2 ou une surface particulière, rapportée. La surface active 22 a une rugosité et plus généralement un état de surface dépendant du travail à effectuer et de la nature de la surface à travailler/lustrer. Il en est de même de la qualité du liquide de lustrage.  The active surface 22 of the tray 1 is the lower surface of the foam body 2 or a particular surface, reported. The active surface 22 has a roughness and more generally a surface state depending on the work to be performed and the nature of the surface to be worked / polished. It is the same with the quality of the polishing liquid.
La tige de commande 43 s'arrête nettement au-dessus de la surface active 22 au repos, lorsque le corps en mousse 2 n'est pas comprimé, pour ne pas ouvrir systématiquement la soupape distributrice 4 pendant le travail de lustrage et pour que la distribution de liquide ne se fasse que par la commande intentionnelle résultant d'un appui prononcé du plateau de lustrage 1 sur la surface travaillée (S).  The control rod 43 stops clearly above the active surface 22 at rest, when the foam body 2 is not compressed, so as not to systematically open the dispensing valve 4 during the polishing work and so that the liquid distribution is done only by the intentional control resulting from a pronounced support of the polishing plate 1 on the worked surface (S).
Dans le cas d'une soupape 4 intégrant un conduit 42, celui-ci est souple et légèrement en retrait de la surface active 22 pour ne pas intervenir dans le lustrage et néanmoins permettre la compression du corps en mousse 2.  In the case of a valve 4 incorporating a duct 42, it is flexible and slightly set back from the active surface 22 so as not to interfere in the polishing and nevertheless allow the compression of the foam body 2.
Il faut aussi que la soupape 4 reste étanche et ne risque pas d'être ouverte par une poussée accidentelle exercée sur la tige de commande 44 pendant les opérations d'emballage, de manutention et de mise en place du plateau 1 sur la machine 100.  It is also necessary that the valve 4 remains tight and can not be opened by an accidental thrust exerted on the control rod 44 during the packaging operations, handling and placing the tray 1 on the machine 100.
Selon une variante non représentée, la tige de commande de la soupape est rapportée pour être installée au moment de l'utilisation du plateau, par vissage ou clipsage.  According to a variant not shown, the control rod of the valve is reported to be installed at the time of use of the plate, by screwing or clipping.
Selon une autre variante, le ressort de rappel 45 de l'organe d'obturation 43 est remplacé par une liaison magnétique constituée par un petit aimant intégré dans l'organe d'obturation et un anneau ferromagnétique, intégré dans le siège de soupape 41. Il convient également de remarquer que l'ensemble du plateau de lustrage doit avoir une symétrie de rotation avec une répartition précise du poids autour de l'axe YY qui est l'axe de rotation de la machine, pour éviter tout balourd. Pour cette raison, l'ensemble de la structure du plateau de lustrage 1 présente une symétrie de rotation. According to another variant, the return spring 45 of the closure member 43 is replaced by a magnetic connection constituted by a small magnet integrated in the closure member and a ferromagnetic ring, integrated in the valve seat 41. It should also be noted that the whole of the polishing plate must have rotation symmetry with a precise distribution of weight around the axis YY which is the axis of rotation of the machine, to avoid unbalance. For this reason, the entire structure of the shine 1 has a rotational symmetry.
La figure 2 montre un autre mode de réalisation du plateau de lustrage la et dans lequel les éléments identiques à ceux du mode de réalisation de la figure 1 portent les mêmes références. Ce mode de réalisation diffère du précédent en ce que le réservoir 3 est intégré plus profondément dans le corps en mousse 2 du plateau de lustrage la avec une partie intermédiaire de mousse 2a entre le dessus du réservoir 3 et la surface de fixation 21 au plateau d'entraînement de la machine 100. Pour le reste, les caractéristiques de ce plateau de lustrage sont les mêmes que celles du plateau précédent.  FIG. 2 shows another embodiment of the polishing plate 1a and in which the elements identical to those of the embodiment of FIG. 1 bear the same references. This embodiment differs from the previous one in that the tank 3 is integrated deeper into the foam body 2 of the glazing plate 1a with an intermediate portion of foam 2a between the top of the tank 3 and the fastening surface 21 to the deck. 100. For the rest, the characteristics of this polishing plate are the same as those of the previous plate.
La figure 3 montre le plateau de lustrage la de la figure 2 en position de distribution de liquide de lustrage. Dans la position représentée, le plateau de lustrage la est par exemple incliné et le dessous au niveau de la surface active 22 est comprimé de sorte que l'organe d'obturation 43 est soulevé du siège de soupape 41 et du liquide de lustrage est ainsi distribué à travers le conduit 42 sur la surface active 21 , interface entre le plateau de lustrage la et la surface à lustrer (S). Cette position inclinée d'actionnement de l'organe d'obturation 43 n'est qu'un exemple ; il est tout aussi possible de comprimer le corps en mousse 2 en l'écrasant perpendiculairement à la sur- face travaillée (S).  Figure 3 shows the polishing plate la of Figure 2 in the polishing liquid distribution position. In the position shown, the polishing plate is inclined for example and the bottom at the active surface 22 is compressed so that the closure member 43 is lifted from the valve seat 41 and the polishing liquid is thus distributed through the conduit 42 on the active surface 21, interface between the polishing plate la and the surface to be polished (S). This inclined position of actuation of the shutter member 43 is only one example; it is also possible to compress the foam body 2 by crushing it perpendicular to the worked surface (S).
Dans le cas du mode de réalisation de la figure 1 , la distribution de liquide de lustrage se fait dans les mêmes conditions, que le plateau 1 , la soit incliné ou parallèle à la surface à lustrer (S). De plus, il est à remarquer que la surface à lustrer (S) n'est pas nécessai- rement plane, ni horizontale.  In the case of the embodiment of Figure 1, the distribution of polishing liquid is in the same conditions, that the plate 1, the inclined or parallel to the surface to be polished (S). In addition, it should be noted that the surface to be polished (S) is not necessarily flat or horizontal.
La figure 4 montre schématiquement une machine électroportative 100 équipée d'un plateau porte-outil 103 et d'un plateau de lustrage 1 , la selon l'invention. La machine se compose d'un manche formant une poignée 101 renfermant le moteur électrique. La sortie du moteur attaque, par l'intermédiaire d'un renvoi d'angle 102, par exemple à 90°, l'arbre de sortie portant le plateau 103 recevant le plateau de lustrage 1 , la. FIG. 4 schematically shows a power-operated machine 100 equipped with a tool-carrying plate 103 and a polishing plate 1, according to the invention. The machine consists of a handle forming a handle 101 enclosing the electric motor. The output of the motor drives, via an angle gear 102, through example at 90 °, the output shaft carrying the plate 103 receiving the polishing plate 1, the.
N O M E N C L A T U R E 1 , 1a Plateau de lustrage N O M E N C L A T U R E 1, 1a Polishing Tray
Corps en mousse Foam body
21 Surface de fixation  21 Fixing surface
22 Surface active  22 Active surface
2 a Partie intermédiaire  2 a Intermediate part
Réservoir  Tank
31 Orifice de remplissage  31 Filling hole
32 Bouchon  32 Stopper
Soupape de distribution  Distribution valve
41 Siège de soupape  41 Valve seat
42 Conduit  42 Conduit
43 Organe d'obturation  43 Shut-off device
44 Tige de commande de l'organe d'obturation 44 Shutter control rod
45 Appui, arceau/ crépine 45 Support, hoop / strainer
46 Ressort  46 Spring
100 Machine électroportative 100 Power tool
101 Poignée logeant le moteur électrique  101 Handle housing the electric motor
102 Renvoi d'angle  102 Angle Return
103 Plateau porte-outil  103 Tool tray
104 Manette de commande  104 Control lever
S Surface à travailler/ lustrer S Surface to work / polish
YY Axe de rotation et de symétrie du plateau  YY Axis of rotation and symmetry of the plateau
H 1 Hauteur de la partie déformable du canal  H 1 Height of the deformable part of the canal
H2 Hauteur de l'extrémité de la tige de commande par rapport à la surface active  H2 Height of the end of the control rod relative to the active surface

Claims

R E V E N D I C A T I O N S  R E V E N D I C A T IO N S
1°) Plateau de lustrage formé d'un corps en mousse, muni d'une surface de fixation pour être fixé au plateau rotatif d'une machine de lustrage et ayant une surface active mouillée par le liquide de lustrage et venant en contact avec la surface à lustrer (S), 1) Polishing plate formed of a foam body, provided with a fixing surface to be fixed to the turntable of a polishing machine and having an active surface wetted by the polishing liquid and coming into contact with the surface to be polished (S),
plateau de lustrage caractérisé en ce qu'il comporte : polishing tray characterized in that it comprises:
- un réservoir de liquide de lustrage (3) intégré dans le corps en mousse (2),  a reservoir of polishing liquid (3) integrated into the foam body (2),
- le réservoir (3) ayant une soupape de distribution (4) en position axiale communiquant avec la surface active (22) du corps en mousse (2),  the reservoir (3) having a distribution valve (4) in axial position communicating with the active surface (22) of the foam body (2),
- la soupape (4) ayant un siège de soupape (41 ) fermé par un organe d'obturation (43) rappelé en position de fermeture et muni d'un organe de commande (44) ouvrant la soupape (4) par appui forcé du corps en mousse (2) par sa surface active (22) contre la surface à lustrer (S).  - the valve (4) having a valve seat (41) closed by a closure member (43) biased in the closed position and provided with a control member (44) opening the valve (4) by forced support of the foam body (2) by its active surface (22) against the surface to be polished (S).
2°) Plateau de lustrage selon la revendication 1 , 2) polishing plate according to claim 1,
caractérisé en ce que characterized in that
l'organe de commande de la soupape (4) est une tige (44) reliée à l'organe d'obturation (43) et qui est repoussée dans le sens de l'ouverture par la compression du corps en mousse (2) par sa surface active (22). 3°) Plateau de lustrage selon la revendication 1 , the control member of the valve (4) is a rod (44) connected to the closure member (43) and which is pushed in the opening direction by compression of the foam body (2) by its active surface (22). 3 °) polishing plate according to claim 1,
caractérisé en ce que characterized in that
la soupape (4) comporte un ressort de rappel (46) appliqué contre l'organe d'obturation (43), poussé contre le siège (41). 4°) Plateau de lustrage selon la revendication 1 , the valve (4) has a return spring (46) against the closure member (43) pushed against the seat (41). 4 °) polishing plate according to claim 1,
caractérisé en ce que characterized in that
l'organe d'obturation (43) est rappelé contre le siège de soupape (41) par une liaison magnétique. 5°) Plateau de lustrage selon la revendication 1 , caractérisé en ce que the closure member (43) is biased against the valve seat (41) by a magnetic connection. 5 °) polishing plate according to claim 1, characterized in that
le réservoir (3) a un orifice de remplissage (31) débouchant dans l'axe (YY) de la surface de fixation (21) pour permettre de le recharger. the reservoir (3) has a filling orifice (31) opening into the axis (YY) of the fastening surface (21) to allow it to be recharged.
EP17828987.2A 2016-12-30 2017-12-20 Polishing pad for a portable rotary electric machine Active EP3562620B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL17828987T PL3562620T3 (en) 2016-12-30 2017-12-20 Polishing pad for a portable rotary electric machine

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1663550A FR3061443B1 (en) 2016-12-30 2016-12-30 GLAZING TRAY FOR A ROTARY ELECTROPORTATIVE MACHINE
PCT/FR2017/053750 WO2018122500A1 (en) 2016-12-30 2017-12-20 Polishing pad for a portable rotary electric machine

Publications (2)

Publication Number Publication Date
EP3562620A1 true EP3562620A1 (en) 2019-11-06
EP3562620B1 EP3562620B1 (en) 2021-01-27

Family

ID=58162907

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17828987.2A Active EP3562620B1 (en) 2016-12-30 2017-12-20 Polishing pad for a portable rotary electric machine

Country Status (6)

Country Link
US (1) US10702118B2 (en)
EP (1) EP3562620B1 (en)
ES (1) ES2865850T3 (en)
FR (1) FR3061443B1 (en)
PL (1) PL3562620T3 (en)
WO (1) WO2018122500A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2849498A1 (en) * 2020-02-18 2021-08-18 Asensio Antoni Josep Soriano FLUID DOSING DEVICE WITH COUPLING TO MOTORIZED TURNING TOOLS AND TOOL THAT INCLUDES IT (Machine-translation by Google Translate, not legally binding)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2409732A1 (en) * 1974-03-01 1975-09-04 Schuetze Karl Heinz DEVICE FOR CLEANING SURFACES
US4102084A (en) * 1977-08-12 1978-07-25 Bloomquist Thomas N Wet sanding device
US4383345A (en) * 1980-11-03 1983-05-17 Alexander John D Hand-held buffing-polishing machine
US4484419A (en) * 1981-10-07 1984-11-27 Minnesota Mining And Manufacturing Company Block for wet abrading
US4796321A (en) * 1985-08-12 1989-01-10 Lee Fu Kuei Portable electrical brush
DE202004008100U1 (en) * 2004-05-22 2004-08-12 Fuchs, Walter Electric-powered industrial injection polishing tool has thumb lever controlled discharge regulation valve for polishing agent

Also Published As

Publication number Publication date
WO2018122500A1 (en) 2018-07-05
FR3061443B1 (en) 2019-05-24
ES2865850T3 (en) 2021-10-18
EP3562620B1 (en) 2021-01-27
US10702118B2 (en) 2020-07-07
PL3562620T3 (en) 2021-12-06
FR3061443A1 (en) 2018-07-06
US20200146526A1 (en) 2020-05-14

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