EP3562620B1 - Polishing pad for a portable rotary electric machine - Google Patents

Polishing pad for a portable rotary electric machine Download PDF

Info

Publication number
EP3562620B1
EP3562620B1 EP17828987.2A EP17828987A EP3562620B1 EP 3562620 B1 EP3562620 B1 EP 3562620B1 EP 17828987 A EP17828987 A EP 17828987A EP 3562620 B1 EP3562620 B1 EP 3562620B1
Authority
EP
European Patent Office
Prior art keywords
buffing
valve
plate
foam body
disk pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP17828987.2A
Other languages
German (de)
French (fr)
Other versions
EP3562620A1 (en
Inventor
Libero MAZZONE
Michel BARBERIS
Antonio Greco
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to PL17828987T priority Critical patent/PL3562620T3/en
Publication of EP3562620A1 publication Critical patent/EP3562620A1/en
Application granted granted Critical
Publication of EP3562620B1 publication Critical patent/EP3562620B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L13/00—Implements for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L13/10—Scrubbing; Scouring; Cleaning; Polishing
    • A47L13/16—Cloths; Pads; Sponges
    • A47L13/17—Cloths; Pads; Sponges containing cleaning agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B23/00—Portable grinding machines, e.g. hand-guided; Accessories therefor
    • B24B23/02—Portable grinding machines, e.g. hand-guided; Accessories therefor with rotating grinding tools; Accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

Definitions

  • the present invention relates to a polishing plate formed of a foam body, provided with a fixing surface for being fixed to the turntable of a polishing machine and having an active surface wetted by the polishing liquid and coming from in contact with the surface to be polished.
  • polishing not only is a surface that is rubbed on the surface to be polished, but also a liquid which is entrained by the active surface of the tool for polishing the surface is required.
  • This liquid contains a charge of finely divided material which constitutes the active principle of polishing.
  • you need a buffing liquid with particular characteristics and also a buffing tray suitable for this buffing liquid such as with a tray having a tank of buffing liquid integrated into the foam body. , as known for example from the document DE 24 09 732 A1 .
  • the polishing liquids are distributed in relatively large volumes to professionals so that often a part of these large volumes constitutes the remains of one or more polishing operations which become unusable due to the degradation of the liquid.
  • the object of the present invention is to develop a practical polishing plate, simplifying the preparatory operations and reducing the losses of polishing liquid, both during polishing and in the form of remains of non-consumed polishing liquids.
  • the integration of the tank containing the buffing liquid in the buffing plate considerably simplifies the buffing work and the management of material stocks.
  • the operator chooses the buffing disc according to each application and he then has an average dose of buffing liquid for such an operation.
  • the liquid is dispensed directly on the active surface, during work since the operator only needs to press the buffing disc against the worked surface for a dose of buffing liquid to be distributed from the tank and the valve and reach the active surface.
  • this dose is easily managed by the duration of the mechanical opening contact of the valve, the user can very easily and with his habit, manage the distribution of polishing liquid.
  • the liquid arriving on the polishing surface in the center of the plate, the product ejections are almost nonexistent. It also means that all product distributed will be used for buffing.
  • control member of the valve is a rod connected to the closure member and which is pushed back in the direction of the opening by the compression of the foam body by its active surface bearing against the surface to be worked.
  • This control member constitutes a very simple means of controlling the opening of the valve and the metered distribution of polishing liquid.
  • the valve comprises a return spring.
  • the valve is kept closed by the return spring and it is only when the control member, the rod in this case, is pushed back by its coming to bear against the surface to be polished or an intermediate surface that the valve can be ordered. Then as soon as the compression disappears, the return spring closes the valve.
  • the valve is held in the closed position by a magnetic connection applying the closure member against the valve seat, this connection being for example constituted by a magnetic element such as a magnet integrated in the valve and the valve seat has a ferromagnetic part such as a ring, so as to attract the closure member against the valve seat and close the valve.
  • the reservoir is recharged by a filling orifice opening out in the axis of the fixing surface.
  • the entire buffing plate including the tank and the elements or accessories of the tank such as the distribution valve, are elements centered around the axis of rotation which is at the same time the axis of symmetry of the polishing plate so as to avoid any imbalance and to have a regular rotation of the polishing plate, essential for the quality of the polishing work.
  • the invention relates to a buffing plate 1 which is fixed to the rotating tool-holder plate 103 of a portable electric rotary machine 100 rotating the polishing plate 1 in a simple rotational movement or a movement orbital on a surface to be polished (worked surface) (S) using a liquid polish.
  • a buffing plate 1 which is fixed to the rotating tool-holder plate 103 of a portable electric rotary machine 100 rotating the polishing plate 1 in a simple rotational movement or a movement orbital on a surface to be polished (worked surface) (S) using a liquid polish.
  • S worked surface
  • the buffing plate 1 consists of a body 2 in the form of a circular disc, made of foam, one side of which has an attachment surface 21 to the plate 103 of the rotary machine 100 and the other side constitutes the active surface 22 used for polishing.
  • the foam body 2 incorporates a tank for buffing liquid 3.
  • the tank 3 is provided with a distribution valve 4 in its lower wall at its center (according to the orientation H / B, top / bottom of the figure 1 ).
  • the valve 4 comprises a valve seat 41 opening into a duct 42 made in the foam or constituted by a flexible sleeve, at least on the height portion H1 from the active surface 22, under the seat 41.
  • a member of shutter 43 in the shape of a cone complementary to the shape of the seat 41, is applied elastically against the latter, for example by a spring 46 pressed on the one hand against the top of the shutter member 43 and on the other hand, against a support 44 integral with the reservoir or the valve seat 41, for example in the form of an arch or a strainer above the seat 41.
  • the closure member 43 is extended into the duct 42 by a rod 44 arriving at the -above the active surface 22 not compressed to the height H2 so that if the foam is compressed from a height H1, at the level of the end of the rod 44 which will be touched and pushed back, opening the valve 4 and releasing the buffing liquid.
  • the top of the reservoir 3 is directly under the fixing surface 21 and is surrounded by a foam only laterally and on the underside.
  • valve 4 with its closure member 43, its spring 46 and its support 44 is a part manufactured separately and then integrated into the tank 3. In the case of a disposable polishing plate, filling will be done at the end of manufacture. from the tray passing through the valve 4 which will then be protected to prevent it from being actuated inadvertently during packaging and transport operations.
  • the reservoir 3 has a filling orifice 31, on the fixing surface side 21, closed by a plug 32.
  • the fixing surface 21 of the plate is preferably a fibrous surface for hanging onto the surface of the plate 103 of the machine 100 which, for its part, is generally equipped with micro-claws allowing rapid and nevertheless very effective attachment without hindering thereafter. , after use, replacing the buffing plate 1.
  • the active surface 22 of the plate 1 is the lower surface of the foam body 2 or a particular attached surface.
  • the active surface 22 has a roughness and more generally a surface condition depending on the work to be done and the nature of the surface to be worked / polished. The same is true of the quality of the polishing liquid.
  • the control rod 43 stops clearly above the active surface 22 at rest, when the foam body 2 is not compressed, so as not to systematically open the distributor valve 4 during the polishing work and so that the Liquid is dispensed only by the intentional command resulting from a pronounced pressing of the buffing plate 1 on the worked surface (S).
  • valve 4 incorporating a duct 42
  • the latter is flexible and slightly set back from the active surface 22 so as not to intervene in the polishing and nevertheless allow the compression of the foam body 2.
  • valve 4 remains sealed and does not risk being opened by an accidental thrust exerted on the control rod 44 during the packing, handling and positioning operations of the plate 1 on the machine 100.
  • control rod of the valve is attached to be installed when the plate is used, by screwing or clipping.
  • the return spring 45 of the closure member 43 is replaced by a magnetic connection consisting of a small magnet integrated in the closure member and a ferromagnetic ring, integrated in the valve seat 41.
  • the entire buffing plate must have rotational symmetry with a precise distribution of weight around the YY axis which is the axis of rotation of the machine, to avoid any unbalance. For this reason, the entire structure of the buffing plate 1 has rotational symmetry.
  • the figure 2 shows another embodiment of the buffing plate 1a and in which the elements identical to those of the embodiment of the figure 1 bear the same references.
  • This embodiment differs from the previous one in that the tank 3 is integrated more deeply into the foam body 2 of the buffing plate 1a with an intermediate foam part 2a between the top of the tank 3 and the fixing surface 21 to the plate d. machine drive 100. For the rest, the characteristics of this polishing plate are the same as those of the previous plate.
  • the figure 3 shows the buffing plate of the figure 2 in the polishing liquid dispensing position.
  • the buffing plate 1a is for example inclined and the underside at the level of the active surface 22 is compressed so that the closure member 43 is lifted from the valve seat 41 and the buffing liquid is thus distributed through the duct 42 on the active surface 21, the interface between the buffing plate 1a and the surface to be polished (S).
  • This inclined actuation position of the closure member 43 is only one example; it is also possible to compress the foam body 2 by crushing it perpendicular to the worked surface (S).
  • the polishing liquid is dispensed under the same conditions, whether the plate 1 is inclined or parallel to the surface to be polished (S).
  • the surface to be polished (S) is not necessarily flat, nor horizontal.
  • the figure 4 schematically shows a portable power machine 100 equipped with a tool holder plate 103 and a polishing plate 1, 1a according to the invention.
  • the machine consists of a handle forming a handle 101 enclosing the electric motor.
  • the output of the motor drives, via an angle transmission 102, by example at 90 °, the output shaft carrying the plate 103 receiving the buffing plate 1, 1a.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Containers And Packaging Bodies Having A Special Means To Remove Contents (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Description

Domaine de l'inventionField of the invention

La présente invention se rapporte à un plateau de lustrage formé d'un corps en mousse, muni d'une surface de fixation pour être fixé au plateau rotatif d'une machine de lustrage et ayant une surface active mouillée par le liquide de lustrage et venant en contact avec la surface à lustrer.The present invention relates to a polishing plate formed of a foam body, provided with a fixing surface for being fixed to the turntable of a polishing machine and having an active surface wetted by the polishing liquid and coming from in contact with the surface to be polished.

Etat de la techniqueState of the art

On connaît déjà de tels plateaux de lustrage.Such buffing trays are already known.

Comme pour lustrer, il faut non seulement une surface que l'on frotte sur la surface à lustrer mais également utiliser un liquide qui est entraîné par la surface active de l'outil pour le lustrage de la surface. Ce liquide contient une charge de matière finement divisée et qui constitue le principe actif du lustrage. En fonction de la surface à travailler, il faut un liquide de lustrage ayant des caractéristiques particulières et aussi un plateau de lustrage adapté à ce liquide de lustrage, tel qu'avec un plateau ayant un réservoir de liquide de lustrage intégré dans le corps en mousse, tel que connu par exemple du document DE 24 09 732 A1 .As for polishing, not only is a surface that is rubbed on the surface to be polished, but also a liquid which is entrained by the active surface of the tool for polishing the surface is required. This liquid contains a charge of finely divided material which constitutes the active principle of polishing. Depending on the surface to be worked, you need a buffing liquid with particular characteristics and also a buffing tray suitable for this buffing liquid, such as with a tray having a tank of buffing liquid integrated into the foam body. , as known for example from the document DE 24 09 732 A1 .

Les liquides de lustrage sont diffusés en des volumes relativement importants aux professionnels de sorte que souvent une partie de ces volumes importants constitue des restes d'une ou plusieurs opérations de lustrage qui deviennent inutilisables à cause de la dégradation du liquide.The polishing liquids are distributed in relatively large volumes to professionals so that often a part of these large volumes constitutes the remains of one or more polishing operations which become unusable due to the degradation of the liquid.

Cela représente un gâchis important et coûteux de liquide de lustrage.This represents a large and costly waste of buffing fluid.

But de l'inventionAim of the invention

La présente invention a pour but de développer un plateau de lustrage, pratique, simplifiant les opérations préparatoires et réduisant les pertes de liquide de lustrage, tant pendant le lustrage que sous la forme de restes de liquides de lustrage non consommés.The object of the present invention is to develop a practical polishing plate, simplifying the preparatory operations and reducing the losses of polishing liquid, both during polishing and in the form of remains of non-consumed polishing liquids.

Exposé et avantages de l'inventionPresentation and advantages of the invention

A cet effet, la présente invention a pour objet un plateau de lustrage du type défini ci-dessus caractérisé en ce que le plateau de lustrage comporte :

  • le réservoir ayant une soupape de distribution en position axiale communiquant avec la surface active du corps en mousse,
  • la soupape ayant un siège de soupape fermé par un organe d'obturation rappelé en position de fermeture et muni d'un organe de commande ouvrant la soupape par appui forcé du corps en mousse par sa surface active contre la surface à lustrer.
To this end, the present invention relates to a buffing plate of the type defined above characterized in that the buffing plate comprises:
  • the reservoir having a distribution valve in an axial position communicating with the active surface of the foam body,
  • the valve having a valve seat closed by a shutter member returned to the closed position and provided with a control member opening the valve by forced support of the foam body by its active surface against the surface to be polished.

En général, l'intégration du réservoir contenant du liquide de lustrage dans le plateau de lustrage permet de simplifier considérablement le travail de lustrage et la gestion des stocks de matériel. En effet, l'opérateur choisit le disque de lustrage en fonction de chaque application et il dispose alors d'une dose moyenne de liquide de lustrage pour une telle opération. La distribution du liquide se fait directement sur la surface active, en cours de travail puisqu'il suffit à l'opérateur d'appuyer le disque de lustrage contre la surface travaillée pour qu'une dose de liquide de lustrage soit distribuée à partir du réservoir et de la soupape et arriver jusqu'à la surface active. Suivant l'invention, cette dose se gère facilement par la durée du contact mécanique d'ouverture de la soupape, l'utilisateur pourra très facilement et avec son habitude, gérer la distribution de liquide de lustrage. Le liquide arrivant sur la surface de lustrage au centre du plateau, les éjections de produit sont quasi inexistantes. Cela signifie aussi que tout le produit distribué sera utilisé pour le lustrage.In general, the integration of the tank containing the buffing liquid in the buffing plate considerably simplifies the buffing work and the management of material stocks. Indeed, the operator chooses the buffing disc according to each application and he then has an average dose of buffing liquid for such an operation. The liquid is dispensed directly on the active surface, during work since the operator only needs to press the buffing disc against the worked surface for a dose of buffing liquid to be distributed from the tank and the valve and reach the active surface. According to the invention, this dose is easily managed by the duration of the mechanical opening contact of the valve, the user can very easily and with his habit, manage the distribution of polishing liquid. The liquid arriving on the polishing surface in the center of the plate, the product ejections are almost nonexistent. It also means that all product distributed will be used for buffing.

Suivant une autre caractéristique avantageuse, l'organe de commande de la soupape est une tige reliée à l'organe d'obturation et qui est repoussée dans le sens de l'ouverture par la compression du corps en mousse par sa surface active en appui contre la surface à travailler.According to another advantageous characteristic, the control member of the valve is a rod connected to the closure member and which is pushed back in the direction of the opening by the compression of the foam body by its active surface bearing against the surface to be worked.

Cet organe de commande constitue un moyen très simple pour commander l'ouverture de la soupape et la distribution dosée de liquide de lustrage.This control member constitutes a very simple means of controlling the opening of the valve and the metered distribution of polishing liquid.

Suivant une autre caractéristique avantageuse, la soupape comporte un ressort de rappel. La soupape est maintenue fermée par le ressort de rappel et ce n'est que lorsque l'organe de commande, la tige en l'occurrence, est repoussé par sa venue en appui contre la surface à lustrer ou une surface intermédiaire que la soupape se commande. Puis dès que la compression disparaît, le ressort de rappel referme la soupape.According to another advantageous characteristic, the valve comprises a return spring. The valve is kept closed by the return spring and it is only when the control member, the rod in this case, is pushed back by its coming to bear against the surface to be polished or an intermediate surface that the valve can be ordered. Then as soon as the compression disappears, the return spring closes the valve.

Suivant une autre caractéristique avantageuse, la soupape est maintenue en position fermée par une liaison magnétique appliquant l'organe d'obturation contre le siège de soupape, cette liaison étant par exemple constituée par un élément magnétique tel qu'un aimant intégré dans la soupape et le siège de soupape comporte une partie ferromagnétique telle qu'un anneau, de manière à attirer l'organe d'obturation contre le siège de soupape et fermer la soupape.According to another advantageous characteristic, the valve is held in the closed position by a magnetic connection applying the closure member against the valve seat, this connection being for example constituted by a magnetic element such as a magnet integrated in the valve and the valve seat has a ferromagnetic part such as a ring, so as to attract the closure member against the valve seat and close the valve.

Suivant une autre caractéristique, le réservoir se recharge par un orifice de remplissage débouchant dans l'axe de la surface de fixation.According to another characteristic, the reservoir is recharged by a filling orifice opening out in the axis of the fixing surface.

De façon globale, l'ensemble du plateau de lustrage, y compris le réservoir et les éléments ou accessoires du réservoir tels que la soupape de distribution, sont des éléments centrés autour de l'axe de rotation qui est en même temps l'axe de symétrie du plateau de lustrage de manière à éviter tout balourd et avoir une rotation régulière du plateau de lustrage, indispensable pour la qualité du travail de lustrage.Overall, the entire buffing plate, including the tank and the elements or accessories of the tank such as the distribution valve, are elements centered around the axis of rotation which is at the same time the axis of symmetry of the polishing plate so as to avoid any imbalance and to have a regular rotation of the polishing plate, essential for the quality of the polishing work.

DessinsDrawings

La présente invention sera décrite ci-après de manière plus détaillée à l'aide de deux modes de réalisation d'un plateau de lustrage représentés dans les dessins annexés dans lesquels :

  • la figure 1 est une vue en coupe axiale d'un premier mode de réalisation d'un plateau de lustrage,
  • la figure 2 montre une vue en coupe axiale d'un second mode de réalisation d'un plateau de lustrage,
  • la figure 3 montre un exemple de position active de distribution de liquide de lustrage dans le cas du plateau de la figure 2,
  • la figure 4 est un schéma très simplifié d'une machine de lustrage équipée d'un plateau de lustrage selon l'invention.
The present invention will be described below in more detail with the aid of two embodiments of a buffing plate shown in the accompanying drawings in which:
  • the figure 1 is an axial sectional view of a first embodiment of a buffing plate,
  • the figure 2 shows an axial sectional view of a second embodiment of a buffing plate,
  • the figure 3 shows an example of an active polishing liquid dispensing position in the case of the figure 2 ,
  • the figure 4 is a very simplified diagram of a buffing machine equipped with a buffing plate according to the invention.

Description de modes de réalisation de l'inventionDescription of embodiments of the invention

Selon la figure 1, l'invention a pour objet un plateau de lustrage 1 qui se fixe au plateau rotatif porte-outil 103 d'une machine rotative électroportative 100 entraînant en rotation le plateau de lustrage 1 suivant un mouvement de rotation simple ou un mouvement orbital sur une surface à lustrer (surface travaillée) (S) en utilisant un liquide de lustrage. Une telle machine est représentée à la figure 4.According to figure 1 , the invention relates to a buffing plate 1 which is fixed to the rotating tool-holder plate 103 of a portable electric rotary machine 100 rotating the polishing plate 1 in a simple rotational movement or a movement orbital on a surface to be polished (worked surface) (S) using a liquid polish. Such a machine is shown in the figure 4 .

Le plateau de lustrage 1 se compose d'un corps 2 en forme de disque circulaire, en mousse, dont une face comporte une surface de fixation 21 au plateau 103 de la machine rotative 100 et l'autre face constitue la surface active 22 servant au lustrage. Le corps en mousse 2 intègre un réservoir de liquide de lustrage 3. Le réservoir 3 est muni d'une soupape de distribution 4 dans sa paroi inférieure en son centre (selon l'orientation H/B, haut/bas de la figure 1).The buffing plate 1 consists of a body 2 in the form of a circular disc, made of foam, one side of which has an attachment surface 21 to the plate 103 of the rotary machine 100 and the other side constitutes the active surface 22 used for polishing. The foam body 2 incorporates a tank for buffing liquid 3. The tank 3 is provided with a distribution valve 4 in its lower wall at its center (according to the orientation H / B, top / bottom of the figure 1 ).

La soupape 4 comporte un siège de soupape 41 débouchant dans un conduit 42 réalisé dans la mousse ou constitué par un manchon souple, au moins sur la partie de hauteur H1 à partir de la surface active 22, sous le siège 41. Un organe d'obturation 43 en forme de cône complémentaire de la forme du siège 41, est appliqué élastiquement contre celui-ci, par exemple par un ressort 46 appuyé d'une part contre le dessus de l'organe d'obturation 43 et d'autre part, contre un appui 44 solidaire du réservoir ou du siège de soupape 41, par exemple en forme d'arceau ou de crépine au-dessus du siège 41. L'organe d'obturation 43 est prolongé dans le conduit 42 par une tige 44 arrivant au-dessus de la surface active 22 non comprimée à la hauteur H2 de sorte que si l'on comprime la mousse d'une hauteur H1, au niveau de l'extrémité de la tige 44 qui sera touchée et repoussée, ouvrant la soupape 4 et libérant le liquide de lustrage.The valve 4 comprises a valve seat 41 opening into a duct 42 made in the foam or constituted by a flexible sleeve, at least on the height portion H1 from the active surface 22, under the seat 41. A member of shutter 43 in the shape of a cone complementary to the shape of the seat 41, is applied elastically against the latter, for example by a spring 46 pressed on the one hand against the top of the shutter member 43 and on the other hand, against a support 44 integral with the reservoir or the valve seat 41, for example in the form of an arch or a strainer above the seat 41. The closure member 43 is extended into the duct 42 by a rod 44 arriving at the -above the active surface 22 not compressed to the height H2 so that if the foam is compressed from a height H1, at the level of the end of the rod 44 which will be touched and pushed back, opening the valve 4 and releasing the buffing liquid.

Selon le mode de réalisation de la figure 1, le dessus du réservoir 3 est directement sous la surface de fixation 21 et n'est entouré d'une mousse que latéralement et sur le dessous.Depending on the embodiment of the figure 1 , the top of the reservoir 3 is directly under the fixing surface 21 and is surrounded by a foam only laterally and on the underside.

La soupape 4 avec son organe d'obturation 43, son ressort 46 et son appui 44 est une pièce fabriquée séparément et intégrée ensuite dans le réservoir 3. Dans le cas d'un plateau de lustrage jetable, le remplissage se fera en fin de fabrication du plateau en passant par la soupape 4 qui sera ensuite protégée pour éviter qu'elle ne soit actionnée intempestivement pendant les opérations de conditionnement et de transport.The valve 4 with its closure member 43, its spring 46 and its support 44 is a part manufactured separately and then integrated into the tank 3. In the case of a disposable polishing plate, filling will be done at the end of manufacture. from the tray passing through the valve 4 which will then be protected to prevent it from being actuated inadvertently during packaging and transport operations.

Dans le mode de réalisation de la figure 1, le réservoir 3 a un orifice de remplissage 31, côté surface de fixation 21, fermé par un bouchon 32.In the embodiment of the figure 1 , the reservoir 3 has a filling orifice 31, on the fixing surface side 21, closed by a plug 32.

La surface de fixation 21 du plateau est de préférence une surface fibreuse pour s'accrocher à la surface du plateau 103 de la machine 100 qui, lui, est en général équipé de micro-griffes permettant une fixation rapide et néanmoins très efficace sans gêner ensuite, après usage, le remplacement du plateau de lustrage 1.The fixing surface 21 of the plate is preferably a fibrous surface for hanging onto the surface of the plate 103 of the machine 100 which, for its part, is generally equipped with micro-claws allowing rapid and nevertheless very effective attachment without hindering thereafter. , after use, replacing the buffing plate 1.

La surface active 22 du plateau 1 est la surface inférieure du corps en mousse 2 ou une surface particulière, rapportée. La surface active 22 a une rugosité et plus généralement un état de surface dépendant du travail à effectuer et de la nature de la surface à travailler/lustrer. Il en est de même de la qualité du liquide de lustrage.The active surface 22 of the plate 1 is the lower surface of the foam body 2 or a particular attached surface. The active surface 22 has a roughness and more generally a surface condition depending on the work to be done and the nature of the surface to be worked / polished. The same is true of the quality of the polishing liquid.

La tige de commande 43 s'arrête nettement au-dessus de la surface active 22 au repos, lorsque le corps en mousse 2 n'est pas comprimé, pour ne pas ouvrir systématiquement la soupape distributrice 4 pendant le travail de lustrage et pour que la distribution de liquide ne se fasse que par la commande intentionnelle résultant d'un appui prononcé du plateau de lustrage 1 sur la surface travaillée (S).The control rod 43 stops clearly above the active surface 22 at rest, when the foam body 2 is not compressed, so as not to systematically open the distributor valve 4 during the polishing work and so that the Liquid is dispensed only by the intentional command resulting from a pronounced pressing of the buffing plate 1 on the worked surface (S).

Dans le cas d'une soupape 4 intégrant un conduit 42, celui-ci est souple et légèrement en retrait de la surface active 22 pour ne pas intervenir dans le lustrage et néanmoins permettre la compression du corps en mousse 2.In the case of a valve 4 incorporating a duct 42, the latter is flexible and slightly set back from the active surface 22 so as not to intervene in the polishing and nevertheless allow the compression of the foam body 2.

Il faut aussi que la soupape 4 reste étanche et ne risque pas d'être ouverte par une poussée accidentelle exercée sur la tige de commande 44 pendant les opérations d'emballage, de manutention et de mise en place du plateau 1 sur la machine 100.It is also necessary that the valve 4 remains sealed and does not risk being opened by an accidental thrust exerted on the control rod 44 during the packing, handling and positioning operations of the plate 1 on the machine 100.

Selon une variante non représentée, la tige de commande de la soupape est rapportée pour être installée au moment de l'utilisation du plateau, par vissage ou clipsage.According to a variant not shown, the control rod of the valve is attached to be installed when the plate is used, by screwing or clipping.

Selon une autre variante, le ressort de rappel 45 de l'organe d'obturation 43 est remplacé par une liaison magnétique constituée par un petit aimant intégré dans l'organe d'obturation et un anneau ferromagnétique, intégré dans le siège de soupape 41.According to another variant, the return spring 45 of the closure member 43 is replaced by a magnetic connection consisting of a small magnet integrated in the closure member and a ferromagnetic ring, integrated in the valve seat 41.

Il convient également de remarquer que l'ensemble du plateau de lustrage doit avoir une symétrie de rotation avec une répartition précise du poids autour de l'axe YY qui est l'axe de rotation de la machine, pour éviter tout balourd. Pour cette raison, l'ensemble de la structure du plateau de lustrage 1 présente une symétrie de rotation.It should also be noted that the entire buffing plate must have rotational symmetry with a precise distribution of weight around the YY axis which is the axis of rotation of the machine, to avoid any unbalance. For this reason, the entire structure of the buffing plate 1 has rotational symmetry.

La figure 2 montre un autre mode de réalisation du plateau de lustrage la et dans lequel les éléments identiques à ceux du mode de réalisation de la figure 1 portent les mêmes références. Ce mode de réalisation diffère du précédent en ce que le réservoir 3 est intégré plus profondément dans le corps en mousse 2 du plateau de lustrage la avec une partie intermédiaire de mousse 2a entre le dessus du réservoir 3 et la surface de fixation 21 au plateau d'entraînement de la machine 100. Pour le reste, les caractéristiques de ce plateau de lustrage sont les mêmes que celles du plateau précédent.The figure 2 shows another embodiment of the buffing plate 1a and in which the elements identical to those of the embodiment of the figure 1 bear the same references. This embodiment differs from the previous one in that the tank 3 is integrated more deeply into the foam body 2 of the buffing plate 1a with an intermediate foam part 2a between the top of the tank 3 and the fixing surface 21 to the plate d. machine drive 100. For the rest, the characteristics of this polishing plate are the same as those of the previous plate.

La figure 3 montre le plateau de lustrage la de la figure 2 en position de distribution de liquide de lustrage. Dans la position représentée, le plateau de lustrage la est par exemple incliné et le dessous au niveau de la surface active 22 est comprimé de sorte que l'organe d'obturation 43 est soulevé du siège de soupape 41 et du liquide de lustrage est ainsi distribué à travers le conduit 42 sur la surface active 21, interface entre le plateau de lustrage la et la surface à lustrer (S). Cette position inclinée d'actionnement de l'organe d'obturation 43 n'est qu'un exemple ; il est tout aussi possible de comprimer le corps en mousse 2 en l'écrasant perpendiculairement à la surface travaillée (S).The figure 3 shows the buffing plate of the figure 2 in the polishing liquid dispensing position. In the position shown, the buffing plate 1a is for example inclined and the underside at the level of the active surface 22 is compressed so that the closure member 43 is lifted from the valve seat 41 and the buffing liquid is thus distributed through the duct 42 on the active surface 21, the interface between the buffing plate 1a and the surface to be polished (S). This inclined actuation position of the closure member 43 is only one example; it is also possible to compress the foam body 2 by crushing it perpendicular to the worked surface (S).

Dans le cas du mode de réalisation de la figure 1, la distribution de liquide de lustrage se fait dans les mêmes conditions, que le plateau 1, la soit incliné ou parallèle à la surface à lustrer (S). De plus, il est à remarquer que la surface à lustrer (S) n'est pas nécessairement plane, ni horizontale.In the case of the embodiment of the figure 1 , the polishing liquid is dispensed under the same conditions, whether the plate 1 is inclined or parallel to the surface to be polished (S). In addition, it should be noted that the surface to be polished (S) is not necessarily flat, nor horizontal.

La figure 4 montre schématiquement une machine électroportative 100 équipée d'un plateau porte-outil 103 et d'un plateau de lustrage 1, la selon l'invention. La machine se compose d'un manche formant une poignée 101 renfermant le moteur électrique. La sortie du moteur attaque, par l'intermédiaire d'un renvoi d'angle 102, par exemple à 90°, l'arbre de sortie portant le plateau 103 recevant le plateau de lustrage 1, 1a.The figure 4 schematically shows a portable power machine 100 equipped with a tool holder plate 103 and a polishing plate 1, 1a according to the invention. The machine consists of a handle forming a handle 101 enclosing the electric motor. The output of the motor drives, via an angle transmission 102, by example at 90 °, the output shaft carrying the plate 103 receiving the buffing plate 1, 1a.

NOMENCLATURENOMENCLATURE

1, 1a1, 1a
Plateau de lustrageBuffing tray
22
Corps en mousseFoam body
2121
Surface de fixationFixing surface
2222
Surface activeActive area
2a2a
Partie intermédiaireMiddle part
33
RéservoirTank
3131
Orifice de remplissageFilling port
3232
BouchonPlug
44
Soupape de distributionDistribution valve
4141
Siège de soupapeValve seat
4242
ConduitLed
4343
Organe d'obturationShutter
4444
Tige de commande de l'organe d'obturationShutter member control rod
4545
Appui, arceau/crépineSupport, arch / strainer
4646
RessortSpring
100100
Machine électroportativePortable machine
101101
Poignée logeant le moteur électriqueHandle housing the electric motor
102102
Renvoi d'angleCorner transmission
103103
Plateau porte-outilTool tray
104104
Manette de commandeControl lever
SS
Surface à travailler/lustrerWork surface / polish
YYYY
Axe de rotation et de symétrie du plateauPlate rotation and symmetry axis
H1H1
Hauteur de la partie déformable du canalHeight of the deformable part of the channel
H2H2
Hauteur de l'extrémité de la tige de commande par rapport à la surface activeHeight of the end of the control rod in relation to the active surface

Claims (5)

  1. A buffing disk pad comprising a foam body, provided with an attachment surface for fastening to the rotary disk pad of a buffing machine and having an active surface wetted by the buffing liquid and brought into contact with the surface to be polished (S), having a buffing liquid tank (3) incorporated in the foam body (2), the buffing disk pad being
    characterized in that it comprises:
    - the tank (3) having a dispensing valve (4) in an axial position connecting to the active surface (22) of the foam body (2),
    - the valve (4) having a valve seat (41) which is closed by a closing device (43) returning to the closed position and provided with a control device (44) which opens the valve (4) by forcibly pressing the active surface (22) of the foam body (2) against the surface to be polished (S).
  2. A buffing disk pad according to claim 1,
    characterized in that
    the valve operating device (4) is a rod (44) connected to the closing device (43) and which is pushed in the opening direction by the compression of the foam body (2) by its active surface (22).
  3. A buffing disk pad according to claim 1,
    characterized in that
    the valve (4) has a return spring (46) which is pressed against the closing device (43), pushing against the valve seat (41).
  4. A buffing disk pad according to claim 1,
    characterized in that
    the closing device (43) is pressed against the valve seat (41) by a magnetic connection.
  5. A buffing disk pad according to claim 1,
    characterized in that
    the tank (3) has a filling opening (31) leading into the axis (YY) of the attachment surface (21) to allow it to be refilled.
EP17828987.2A 2016-12-30 2017-12-20 Polishing pad for a portable rotary electric machine Active EP3562620B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL17828987T PL3562620T3 (en) 2016-12-30 2017-12-20 Polishing pad for a portable rotary electric machine

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1663550A FR3061443B1 (en) 2016-12-30 2016-12-30 GLAZING TRAY FOR A ROTARY ELECTROPORTATIVE MACHINE
PCT/FR2017/053750 WO2018122500A1 (en) 2016-12-30 2017-12-20 Polishing pad for a portable rotary electric machine

Publications (2)

Publication Number Publication Date
EP3562620A1 EP3562620A1 (en) 2019-11-06
EP3562620B1 true EP3562620B1 (en) 2021-01-27

Family

ID=58162907

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17828987.2A Active EP3562620B1 (en) 2016-12-30 2017-12-20 Polishing pad for a portable rotary electric machine

Country Status (6)

Country Link
US (1) US10702118B2 (en)
EP (1) EP3562620B1 (en)
ES (1) ES2865850T3 (en)
FR (1) FR3061443B1 (en)
PL (1) PL3562620T3 (en)
WO (1) WO2018122500A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2849498A1 (en) * 2020-02-18 2021-08-18 Asensio Antoni Josep Soriano FLUID DOSING DEVICE WITH COUPLING TO MOTORIZED TURNING TOOLS AND TOOL THAT INCLUDES IT (Machine-translation by Google Translate, not legally binding)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2409732A1 (en) * 1974-03-01 1975-09-04 Schuetze Karl Heinz DEVICE FOR CLEANING SURFACES
US4102084A (en) * 1977-08-12 1978-07-25 Bloomquist Thomas N Wet sanding device
US4383345A (en) * 1980-11-03 1983-05-17 Alexander John D Hand-held buffing-polishing machine
US4484419A (en) * 1981-10-07 1984-11-27 Minnesota Mining And Manufacturing Company Block for wet abrading
US4796321A (en) * 1985-08-12 1989-01-10 Lee Fu Kuei Portable electrical brush
DE202004008100U1 (en) * 2004-05-22 2004-08-12 Fuchs, Walter Electric-powered industrial injection polishing tool has thumb lever controlled discharge regulation valve for polishing agent

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
None *

Also Published As

Publication number Publication date
EP3562620A1 (en) 2019-11-06
US20200146526A1 (en) 2020-05-14
FR3061443B1 (en) 2019-05-24
WO2018122500A1 (en) 2018-07-05
PL3562620T3 (en) 2021-12-06
ES2865850T3 (en) 2021-10-18
US10702118B2 (en) 2020-07-07
FR3061443A1 (en) 2018-07-06

Similar Documents

Publication Publication Date Title
EP1228716B1 (en) Device for storing and applying a product
EP1925275A2 (en) Massage and/or distribution head for a product and device equipped with such head
EP1935505B1 (en) Piezoelectric spraying system and corresponding refill
FR2952911A1 (en) PRODUCT APPLICATOR DEVICE, RECHARGED FOR SUCH APPLICATOR DEVICE, AND KIT COMPRISING SUCH APPLICATOR DEVICE.
EP2506737A1 (en) Fluid application device
EP3562620B1 (en) Polishing pad for a portable rotary electric machine
WO2006008383A1 (en) Improved box, in particular for make-up product
CH685323A5 (en) Coffee grinder.
EP3203871B1 (en) Makeup article comprising an applicator and a makeup product distributor
EP1193188B1 (en) Device for packaging and applying a product comprising a pivotable applicator
FR2871712A1 (en) Container and casing assembly for dispensing a cosmetic, hygiene or pharmaceutical product comprises a casing open at both ends and fitted with pusher base and head
EP3393298B1 (en) Cosmetic pot comprising a system for pressurising a product supply container
WO2018233967A1 (en) Device for packaging and dispensing a product, notably a pharmaceutical or cosmetic product
EP3355036B1 (en) Device for dispensing a powdered food product.
FR2968279A1 (en) Distribution box i.e. powder compact, for distribution of product i.e. make-up powder, has reservoir, where passage of reservoir from deployed to retracted position and vice versa causes opening and closing of diffuser, respectively
FR3074655A1 (en) ORGAN FOR THE RETENTION AND DISTRIBUTION OF A PRODUCT, PARTICULARLY COSMETIC, IN THE FORM OF A POWDER, AND A CONDITION SET AND A PRODUCT DISTRIBUTION CONTAINING THE SAME
FR3114715A1 (en) Protective case against shocks for mobile phone equipped with a device for storing and dispensing a disinfectant product
EP2732742A1 (en) Rotating head for the cleaning of a receptacle
WO2020187834A1 (en) Packaging for a stick of cosmetic product
FR2974352A1 (en) Box for dispensing e.g. foundation powder, to applicator, has concealing unit and container forming space, where space is configured such that material diffused into space is directed to sampling wall of bottom wall of container
FR3095928A1 (en) Double compartment cosmetic product packaging device
FR3110854A1 (en) Micro-needle applicator
WO2010086532A1 (en) Device for applying, spreading and polishing with shoe polish or wax
CH716917A2 (en) Tools and method for removing a watch glass.
WO2003025309A1 (en) Coating material sprayer

Legal Events

Date Code Title Description
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: UNKNOWN

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE

PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20190628

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

DAV Request for validation of the european patent (deleted)
DAX Request for extension of the european patent (deleted)
GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20200707

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 1357908

Country of ref document: AT

Kind code of ref document: T

Effective date: 20210215

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: FRENCH

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602017032239

Country of ref document: DE

REG Reference to a national code

Ref country code: CH

Ref legal event code: NV

Representative=s name: SCHMAUDER AND PARTNER AG PATENT- UND MARKENANW, CH

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20210127

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG9D

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1357908

Country of ref document: AT

Kind code of ref document: T

Effective date: 20210127

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210428

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210427

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210527

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210427

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210527

REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2865850

Country of ref document: ES

Kind code of ref document: T3

Effective date: 20211018

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602017032239

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20211028

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210527

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20211220

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20211220

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20211231

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20211231

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20221223

Year of fee payment: 6

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 20221219

Year of fee payment: 6

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: ES

Payment date: 20230118

Year of fee payment: 6

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20221228

Year of fee payment: 6

Ref country code: GB

Payment date: 20230123

Year of fee payment: 6

Ref country code: DE

Payment date: 20230112

Year of fee payment: 6

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230516

P02 Opt-out of the competence of the unified patent court (upc) changed

Effective date: 20230517

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210127

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20171220

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20211220

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 602017032239

Country of ref document: DE

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20231220

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20231231

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210127

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20240702

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20231220

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20231231

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20231231