EP3526810B1 - Sputterquelle - Google Patents

Sputterquelle Download PDF

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Publication number
EP3526810B1
EP3526810B1 EP17781065.2A EP17781065A EP3526810B1 EP 3526810 B1 EP3526810 B1 EP 3526810B1 EP 17781065 A EP17781065 A EP 17781065A EP 3526810 B1 EP3526810 B1 EP 3526810B1
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EP
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Prior art keywords
sputtering
sputtering source
targets
arrangement
plate
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EP17781065.2A
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English (en)
French (fr)
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EP3526810A1 (de
Inventor
Heinz Felzer
Dominik Jaeger
Michael CHESEAUX
Hartmut Rohrmann
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Evatec AG
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Evatec AG
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0068—Reactive sputtering characterised by means for confinement of gases or sputtered material, e.g. screens, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3417—Arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H01J37/3429—Plural materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3447—Collimators, shutters, apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3452—Magnet distribution
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3473—Composition uniformity or desired gradient

Definitions

  • TCO transparent conductive oxide
  • damage primarily any change in the atomic structure or ordering of the atoms and/or molecules within the overall substrate due to the deposition process of the oxide layer, more generically of the material layer. This includes changes in the atomic bonding and in the next-neighbor ordering of the atoms. Such damages can be e.g. the loss of the crystalline structure, threading dislocation or ion implementation in the structure.
  • US 2008/308417 A1 discloses a sputter apparatus with a plasma heated anode preventing electric-discharge abnormalities.
  • a sputtering source conceived to sputter-coat a substrate.
  • the sputtering source comprises: Two plate shaped targets extending along respective plate-planes whereby the sputtering surfaces of these targets face each other and thereby define, in between, a reaction space.
  • the plate-planes are mutually parallel or mutually inclined by at most 90°.In one embodiment the inclination is at most 5°.
  • the sputtering source further comprises an anode arrangement and a magnet arrangement along each of the targets and located opposite to the respective sputtering surfaces of the targets. Each magnet arrangement generates a magnetic field in the reaction space whereby the magnetic field impinges on and/or emanates form and is distributed along at least a predominant part of the respective sputtering surfaces.
  • An open coating outlet area from the reaction space is limited by respective areas of mutually facing rims of the two plate-shaped targets.
  • the sputtering surfaces of the targets transit into respective side surface areas of the targets along the addressed mutually facing rims by or via respective transition surface areas of the targets.
  • the transition surface areas have a smaller radius of curvature than the adjacent areas of the sputtering surfaces. Thereby, the radius of curvature as addressed is considered in planes perpendicular to the respective sputtering surface and perpendicular to the respective extended rim.
  • the transition areas may be formed e.g. as corners which are sharp or more steadily curved and are in fact surface areas along the addressed rims at which an electric field generated between the anode arrangement and the respective target has a local maximum of strength.
  • a catcher plate arrangement along each of the addressed rims and distant from the respective one of the targets.
  • Each catcher plate arrangement projects in direction from the addressed rim towards the other rim, into the open coating outlet area and thereby restricts the effective opening of the open coating outlet area, beneath that extent which is limited merely by the mutually facing rims of the two plate-shaped targets. It is this restricted open coating outlet area which is exploited as "source output" for coating material to be deposited on the substrate.
  • the inventors have recognized, that particles which originate from sputtering in the transition surface area as ions, or which pass as ions nearby the transition surface area impinge with substantially higher energies on the overall substrate, than other particles out of the reaction space. Some possible explanations of this phenomenon are given below.
  • the catcher plate arrangements do prevent at least a substantial part of such higher energy particles to impinge on the overall substrate.
  • the catcher plate arrangement projects in direction from one addressed target rim towards the other target rim, into the open coating outlet area and thereby restricts the effective opening of the open coating outlet area, it is substantially avoided, that surfaces of the catcher plate arrangement which are exposed to the space opposite the reaction space, with respect to the open coating outlet area or to the "source output", are spoiled by sputtered off and possibly reacted material deposition. Thereby it is substantially avoided that such material peeling or flaking off the catcher plate arrangement becomes deposited on a workpiece or substrate to be treated by the sputtering source.
  • the sputtering source according to the invention is constructed to sputter coat the substrate with a material at least one component thereof being present in the sputtering plasma as a ion.
  • the sputtering source according to the invention is constructed to sputter coat the substrate with a material at least one component thereof being present in the sputtering plasma as a negative ion.
  • the sputtering source according to the invention is constructed to sputter coat the substrate with an oxide.
  • the projecting catcher plate arrangement has thereby a surface.
  • This surface predominantly consists on one hand of a first surface area and of a second surface area.
  • the first surface area is exclusively exposed to the reaction space and thus not to the space opposite the reaction space with respect to the open coating outlet area or to the "source output".
  • the second surface area is exclusively exposed to the space opposite the reaction space with respect to the open coating outlet area or to the "source output” thus not to the reaction space.
  • the overall surface of the projecting catcher plate arrangement may comprise additional surface areas, which are neglectable, even if exposed to both spaces as addressed.
  • each catcher plate arrangement has a most projecting rim.
  • the plate-planes extend symmetrically to a central plane. This facilitates mutual positioning of the sputtering source with respect to a substrate to be coated as well as the overall construction of the sputtering source.
  • the plate-planes are parallel, which further simplifies overall construction of the sputtering source.
  • the two mutually facing rims of the two targets may extend along differently shaped curves or along equally shaped curves
  • the mutually facing rims extent along straight lines and are thus linear and are, additionally, parallel.
  • the open coating outlet area becomes a slit, which extends along a plane. This allows relatively simple and accurate positioning with respect to a substrate, especially if the substrate extends along a plane as well.
  • the plate-shaped targets are rectangular or square which again simplifies the overall construction of the sputtering source especially with a consideration on the magnet arrangements complexity.
  • the plate-planes are symmetrical to a central plane and the open coating outlet area extends along a plane which is perpendicular to the central plane.
  • both targets may be made of one equal material or each of the targets may be made, respectively, of one material but the materials being different materials, or at least one of the targets may comprise an area of one material and another area of a different material, in one embodiment of the sputtering source at least one of the targets is of a single material.
  • Sputter deposition of an oxide layer from the sputtering source according to the invention may be performed exclusively by reacting sputtered-off metal.
  • the component of the deposited layer material which is present in the sputtering plasma as a ion, namely as a negative ion, is oxygen.
  • the sputtered off metal may be deposited on the substrate and reacted there with oxygen, more generically with a gas at least one component thereof being present in the sputtering plasma as a negative ion, even more generically as a ion, or the sputtered off metal may be reacted with such gas in the reaction space and/or in a space between the restricted open coating outlet area and the substrate.
  • At least one of the targets comprises an oxide or consists of an oxide.
  • At least one of the targets comprises a material component which is present in the sputtering plasma as a ion.
  • At least one of the targets comprises a material component which is present in the sputtering plasma as a negative ion.
  • an oxygen gas feed arrangement which discharges into the reaction space and /or downstream the restricted open coating outlet area, restricted by the catcher plate arrangements.
  • One embodiment of the sputtering source according to the invention comprises a gas feed arrangement discharging into the reaction space and/or downstream the restricted open coating outlet area, restricted by said catcher plate arrangements.
  • a gas feed arrangement discharging into the reaction space and/or downstream the restricted open coating outlet area, restricted by said catcher plate arrangements.
  • the catcher plate arrangements comprise catcher plates of at least one of the following shapes: plane, bent towards the reaction space, bent away from the reaction space.
  • At least one of the catcher plate arrangements comprises at least one metal plate or consists of at least one metal plate.
  • a selected electrical potential distribution may be realized along the catcher plate arrangement.
  • At least one of the catcher plate arrangements comprises at least one ceramic material plate or consists of at least one ceramic material plate.
  • Such an embodiment may be advantageous if the coating material, as an oxide material, is an electrically isolating material.
  • the anode arrangement comprises a lateral anode plate, which complements the two-side delimitation of the cross section through the reaction space, by the two targets, to a three-side delimitated cross section of the reaction space.
  • the anode arrangement comprises two of the just addressed lateral anode plates thereby complementing the two-side delimitation of the cross section through the reaction space, by the two targets, to a four-side delimitated cross section of the reaction space.
  • the anode arrangement comprises a lateral anode plate, complementing the two-side delimitation of the open coating outlet area, by the two targets, to a three-side delimitation of the open coating outlet area.
  • the lateral anode plate extends down to or just adjacent to the open coating outlet opening area.
  • the anode arrangement comprises two of the just addressed lateral anode plates, complementing the two-side delimitation of the open coating outlet area, by the two targets, to a four-side delimitation of the open coating outlet area.
  • the anode arrangement comprises an anode plate, opposite to the open coating outlet area with respect to the reaction space.
  • the anode arrangement comprise an anode frame around the open coating outlet area.
  • the overall anode arrangement becomes similar to an anode box opened along the open coating outlet opening area.
  • the overall anode arrangement becomes an L profile.
  • the overall anode arrangement comprises an arrangement of anode strips along the border of the targets and exclusively along the mutually facing rims. Thus no anode strips are provided along the remaining border of the targets in opposition to customary anode arrangements which form a frame around the targets.
  • the overall anode arrangement comprises an arrangement of anode strips along the mutually facing rims
  • the catcher plate arrangements comprises projecting metal plates electrically and mechanically connected to the anode strips.
  • the catcher plate arrangements comprises projecting metal plates electrically connected to the overall anode arrangement.
  • the catcher plate arrangements are two legs of a frame limiting the and around the open coating outlet area.
  • the magnetic field is generated uni-directionally from one sputtering surface to the other sputtering surface of the respective targets.
  • the addressed magnetic field may also be tailored as a at least partly unbalanced field from one or from both of the targets or as a bi- directional field between respective sputtering surfaces or even comprising magnetron-type magnetic field.
  • One embodiment of the sputtering source according to the invention comprises a third target covering the reaction space opposite the open coating outlet area.
  • the third target is associated with a magnet arrangement generating along the sputter surface of the third target a magnetron-type magnetic field.
  • At least one of the targets comprises or consists of at least one of the metals In, Sn, Zn, Ga, Al.
  • At least one of said targets comprises a material component which is present in the sputtering plasma as a ion.
  • At least one of said targets comprises a material component which is present in the sputtering plasma as a negative ion.
  • At least one of said targets comprises or consists of an oxide.
  • the plate-planes are mutually inclined by at most 5°.
  • Every embodiment of the sputtering source as addressed above may be combined with one or more than one of the other addressed embodiments unless such combinations are in contradiction.
  • the present invention is further directed to a sputter coating chamber which comprises at least one sputtering source according to the invention or according to at least one of its embodiments.
  • the sputter coating chamber further comprises a substrate holder, which is constructed to hold a substrate with one of its extended surfaces exposed to the surrounding gaseous environment.
  • the substrate holder is mounted in the sputter chamber in a position in which the extended surface of the substrate faces the restricted open coating outlet area of the sputtering source. Visibility of the transition surface areas from at least a predominant part, i.e. from more than 50% of the extended surface, is bared or blocked by the catcher plate arrangements of the sputtering source.
  • the substrate holder is constructed to hold a substrate along a holding-plane.
  • the mutually facing rims of the sputtering source are parallel and linear and the holding-plane is parallel to or inclined with respect to a plane defined by the parallel and linear rims.
  • the holding-plane and the plane defined by the two rims of the targets are inclined by at most 45°.
  • a substrate on the substrate holder may be operated at any desired electric bias potential
  • the substrate on the substrate holder is operated in electrically floating manner or is connected to a DC-reference potential, thereby, in a further embodiment, to ground potential.
  • the substrate holder is constructed to hold a circular substrate and is operationally connected to rotary drive. By this rotary drive the holder and thus the substrate is rotated about a central axis. Thereby, homogeneity of coating deposition on the substrate is improved.
  • a substrate holder carrier with at least two of the addressed substrate holders.
  • the number of the sputtering sources provided at the sputter coating chamber is thereby equal or is different from the number of the at least two substrate holders of the substrate holder carrier.
  • the sputter coating chamber may be conceived as an inline sputter chamber or as a batch sputter chamber.
  • Each embodiment of the sputter coating chamber as addressed above may be combined with one or more than one of the other embodiments of the chamber unless such combination being in contradiction.
  • the present invention is further directed to a sputtering system which comprises at least one sputter source according to the invention, possibly according to one or more than one of the respectively addressed source-embodiments or which comprises at least one sputter chamber according to the invention, possibly according to one or more than one of the chamber embodiments.
  • the system further comprises a gas feed arrangement which delivers a gas into the reaction space of the at least one sputtering source and/or between the open coating material outlet area of the sputtering source and the substrate holder.
  • the gas feed arrangement is in operational flow connection with a gas reservoir arrangement containing a gas, the gas or at least one component thereof being present in the sputtering plasma as a ion.
  • the gas feed arrangement is in operational flow connection with a gas reservoir arrangement containing a gas, the gas or at least one component thereof being oxygen.
  • At least one of the targets is electrically supplied by at least one supply source generating at least one of a DC-, a pulsed DC-, a RF-supply. Both targets may be electrically supplied commonly by one supply source or each of the targets may be separately electrically supplied, equally or differently.
  • the present invention is further directed to a method according to claim 49, the method involving sputter coating a substrate with a material, at least one component thereof being present in the sputtering plasma as a ion, and/or to a method of manufacturing a substrate coated with the addressed material.
  • the methods comprise applying the coating by means of at least one sputtering source according to the invention, possibly according to one or more than one of the source-embodiments or by means of a sputter chamber according to invention, possibly according to one or more than one of the chamber- embodiments or by a system according to the invention, possibly according to one or more than one of the system-embodiments, all addressed above.
  • One variant of the methods according to the invention comprises coating the substrate with a material, at least one component thereof being present in the sputtering plasma as a negative ion.
  • the substrate is coated with an oxide.
  • ions having an energy of at least 0.5 U AC ⁇ e - are blocked from impinging on the substrate by the catcher arrangements of the sputtering source.
  • the U AC is the time average of the absolute value of the anode/target (cathode) voltage applied to the respective target, as both targets need not necessarily be operated at the same U AC voltage.
  • the addressed energy limit shall prevail separately for both targets.
  • e- is the electric charge of an electron.
  • oxygen as an example of a component of sputter-deposited material, which component is present in the sputtering plasma as a ion, more specifically as a negative ion. Accordingly we refer to oxide layers.
  • the sputtering source 1 in the addressed embodiment comprises, within a vacuum tight enclosure 3, a first target 5 and a second target 7.
  • Each of the targets is plate shaped and extends along a respective plate-plane E 5 , E 7 .
  • the sputtering surfaces S 5 and S 7 face each other.
  • the plate-planes E 5 , E 7 are mutually inclined whereby the angle ⁇ of mutual inclination is at most 90°.
  • the plate-planes E 5 and E 7 are parallel.
  • the sputtering surfaces S 5 and S 7 delimit, in between, two sides of a reaction space R.
  • the targets 5 and 7 have each a rim portion 9 and 10, which are neighboring each other and face towards each other. These two rim portions 9 and 10 two-side delimit an open coating-material outlet area 12 represented in Fig. 1 by hatched line.
  • the respective sputtering surfaces S 5 and S 7 transit into side surfaces L 5 and L 7 by respective transition surface areas T 5 and T 7 , highlighted in fig.1 by dashed circles.
  • the transition areas T 5 and T 7 may exhibit different radii r of curvature. Nevertheless, such radii r are always smaller than the radius of curvature of the adjacent areas of the respective sputtering surfaces S 5 and S 7 which is, if this adjacent area is plane, infinite.
  • the radii r of curvature are considered in a cross sectional view perpendicularly through the respective elongated rim portions 9 and 10 of the targets 5 and 7 and perpendicularly to the sputtering surfaces S 5 and S 7 .
  • Figs. 2a to 2e show different examples of rim portions 9, 10 of the targets 5, 7.
  • the sputtering surface S 5,7 transits in the side surface L 5,7 which extends perpendicularly to the sputtering surface S 5,7 via the transition surface area T 5,7 realized as an edge with a radius of curvature r a .
  • the sputtering surface S 5,7 transits in the side surface L 5,7 , which is inclined to the sputtering surface by an angle ⁇ smaller than 90° via the transition surface area T 5,7 realized as gently bent surface area with a radius of curvature r b .
  • the sputtering surface S 5,7 transits in the side surface L 5,7 , which is rolling from the sputtering surface S 5,7 via the transit surface area T 5,7 realized as gently bent surface area with a radius of curvature r c .
  • the sputtering surface S 5,7 transits in the side surface L 5,7 , which has a polygonal profile form via multiple transit surface area T 1,5,7 to T 3,5,7 realized by edges of respective small radii of curvature r 1,2,3 .
  • the sputtering surface S 5,7 transits in the side surface L 5,7 , which is shaped as an arc of a circle from the sputtering surface.
  • the transit surface and the side surface L 5,7 are identical, realized with one radius of curvature r e .
  • delimiting the open coating material outlet area 12 at least one transition surface area T which has a radius of curvature as defined above which is smaller than the radius of curvature of the sputtering surfaces adjacent and along the rim portions 9,10.
  • the plate shaped targets 5,7 need not be of equal plate shape.
  • One thereof may e.g. be circular, the other elliptical.
  • both plate-shaped targets are of equal shape, namely of rectangular or square shape.
  • the plate-shaped targets 5,7 are of different shape, in one embodiment, in fact also realized at the today practiced embodiment with rectangular or square targets, at least the rim portions 9 and 10 extend linearly in the y direction shown in Fig. 1 and are, in a further embodiment, parallel.
  • the rim 9 portion of the one target 5 may be shaped differently from the rim portion 10 of the target 7, considered in cross sectional representation as e.g. shown in Fig. 2 .
  • the sputtering source 1 further comprises respective anode arrangements 14 5 and 14 7 , which may be combined to one single anode arrangement 14, operative for both targets 5 and 7.
  • anode blocks shown in Fig. 1 do not represent the locations and shapes of anodically operated members in the sputtering source 1 but do merely address presence of respective anodes.
  • the anode arrangement 14 5 and 14 7 or 14 may be electrically supplied via feed-troughs 16 5,7 as shown in fig 1 .
  • the enclosure 3 may act as an anode with respect to the targets, operated as cathodes.
  • the inventors have recognized, that particles which originate from sputtering in the transition surface area as ions, or which pass as ions nearby the transition surface area impinge with substantially higher energies on the overall substrate, than other particles out of the reaction space.
  • this electric field EF is more closely to be considered along the rim portions 9 and 10.
  • the strength of electric field EF which impinges perpendicularly on the sputtering surfaces S 5,7 and which is customarily represented by the density of field lines , has a local maximum along the transition surface areas T 5,7 due to their reduced radius r of curvature.
  • this local maximum EF T of the strength of the electric field EF becomes the more pronounced the smaller that the radius r of curvature at the transition surface area is selected, relative to the radius of curvature of the area of the sputtering surface just adjacent the transition surface area. This radius is in fact infinite if the addressed sputtering surface is plane.
  • Another or an additional reason may be that the energetic ions are accelerated in the reaction space.
  • the strongest electric field is found in the vicinity of the targets. There the electric field is perpendicular to the target. Therefore, the majority of those energetic ions potentially reaching the substrate start their trajectories perpendicularly to the target surface in the vicinity of which they were first accelerated.
  • These ions can have their trajectory deflected and be repelled by negative potentials, as for example by another target. Thus most of those ions could bounce between both targets multiple time until leaving the reaction area.
  • the targets 5, 7 are operatively linked to respective magnet arrangements 18 5 and 18 7 which generate through the reaction space R a magnetic field B along at least a predominant part of the sputtering surfaces S 5 and S 7 .
  • this magnetic field B may be unbalanced B ub with respect one or to each target 5,7, may be bidirectional at each of the targets , may extend bidirectionally from one target to the other target or may extend uni-directionally from one target to the other target. Latter is realized in the today practiced embodiment.
  • the sputtering source substrates 104 shall be coated with an oxide layer.
  • at least one of the targets 5,7 is of a metal-oxide and /or there is provided a gas feed arrangement (not shown in Fig. 1 ) feeding oxygen gas into the reaction space R and/or downstream the open coating-material outlet area 12 along the substrate 104 to be coated in the sputtering chamber 100.
  • the sputtering source 1 according to the invention is mounted, as schematically shown in Fig. 1 at 102, to the sputtering chamber 100.
  • the sputtering source 1 further comprises a catcher plate arrangement 20 7 and 20 5 along each of and distant from the rim portions 10 and 9 of the respective targets 7,5.
  • the catcher plate arrangements 20 5 and 20 7 extend all along the rim portions 9 and 10 respectively and project from the respective targets or their plate-planes E 5,7 towards each other. With respect to the reaction space R they are positioned opposite the open coating material outlet area 12 and thus in fact restrict or downsize the open area of the open coating-material outlet area 12 which is open towards the substrate 104.
  • a substrate holder 106 which is constructed to hold and position the substrate 104, at least during sputter-coating operation by the sputtering source 1, in coating position.
  • This coating position is distant from and opposite the restricted open coating material outlet area 12, restricted by the catcher plate arrangements 20 5,7 .
  • the catcher plate arrangements 20 5,7 , the substrate holder 106 are mutually positioned so, that the transition surface areas T 5,7 are invisible from any point of or at least the predominant part of the exposed surface 108 of the substrate 104.
  • the catcher plate arrangements block all lines of sight from any point or at least of the addressed predominant part of the surface 108 to the transition surface areas T 5,7 .
  • Fig. 1 the space blocked by the respective catcher plate arrangements is schematically shown by dash-dotted lines at C.
  • local damages to the substrate 104 and/or to the oxide layer on surface 108 may also be caused by flaking off of particles from sputter coated members of the sputtering source 1, the thickness thereof increasing during maintenance intervals.
  • the plate shape of the one target may be different from the plate shape of the other target.
  • a circular target 5 may cooperate witch an elliptical target 7.
  • both targets have a linear extended rim portion 9, 10.
  • Such linearly extended rim portions may be provided irrespective of the overall plate shapes of the respective targets, as shown in Fig. 3 or Fig. 4 showing the targets 5 and 7 of different shapes with linearly extended rim portions 9, 10 schematically and in a perspective view.
  • linearly extended rim portions 9 and 10 are additionally parallel. Such parallelism may also be practiced irrespective of the plate shape of the plate-shaped targets 5, 7 as schematically shown in Fig. 4 .
  • both targets are rectangular plates, and are, additionally, of equal extent, as shown in the embodiment of Fig. 5 .
  • the plate-planes E 5,7 of the mutually facing targets 5,7 may be mutually inclined by an angle ⁇ .
  • This inclination angle ⁇ is at most 90°.
  • the reaction space R becomes in such embodiment narrower towards the open coating material outlet area 12.
  • the plate-planes E 5,7 are parallel, parallel to a central plane Ez , which accords with the embodiment as practiced today.
  • the plate-planes E 5,7 are parallel, parallel to a central plane Ez and the rim portions 9,10 extend in a plane E 9,10 which is perpendicular to the central plane Ez.
  • the first one is to exploit targets of different or equal oxide material.
  • the second one is to exploit both targets of same or different metals and to react the respectively sputtered off metals in an oxygen containing atmosphere in the reaction space R and/ or in the space S (see fig.1 ) of the sputtering chamber 100 between the open coating-material outlet area 12 and the substrate holder 106. Both possibilities may be combined e.g. by exploiting one target of an oxide material, the second of a metal and reacting the sputtered off materials in the reaction space R and/or in the space S between the open coating-material outlet area 12 and the substrate 104 on the substrate holder 106 of the sputtering chamber 100.
  • one target considered may be of different materials, e.g. one section of a metal, a second section of an oxide. This is schematically shown in fig. 5 by the dash-dotted sections M 1 and M 2 at target 5.
  • Deposition of oxide layers with as few as possible damages is particularly important in depositing TCO, Transparent, Conductive Oxide layers, as e.g. used in context with manufacturing of opto-electric devices as of LED devices or photovoltaic devices.
  • the targets 5,7 comprise or consist of at least one of the metals In, Sn, Zn, Ga, Al and/or of at least one oxide of at least one of these metals. If purely reactive sputter coating is applied from sputtered metal, oxygen gas or an oxygen containing gas is fed to at least one on the reaction space R and of the chamber space S.
  • one target may be of the one metal, as of In or Ga the other of the second metal as of Sn or Zn and/or of an oxide.
  • a mixed target type may be applied where e.g. the inner section M 1 of the target is e.g. Sn and the outer section M 2 is e.g. of Zn or of SnO.
  • the catcher plate arrangements 20 5,7 extend each all along and distant from the rim portions 9 and 10 of the targets 5,7. Each may be of a single plate member or of more than one plate member mounted one subsequent the other along and distant from the respective rim portion 9,10. To fulfill the object of catching high energy particles originating from sputtering of or bypassing nearby the transition surface areas T 5,7 of the targets 5,7 the catcher plate arrangements 20 5,7 may be of any desired material which withstands thermal loading by the sputtering process. Especially if the oxide coating material is an electrically insulating material, ceramic material may be used for at least a part of the catcher plate arrangements 20 5,7 . Nevertheless, in one embodiment, at least the predominant part of the catcher plate arrangements 20 5,7 is of metal.
  • the catcher plate arrangements 20 5,7 may be operated on respectively desired electric potential e.g. on DC-, pulsed DC- or AC -as of RF- potential.
  • the electric potentials applied to the catcher plate arrangements 20 5,7 may be equal for both arrangements 20 5 and 20 7 , or may be different. If at least one of the catcher plate arrangements 20 5,7 is built from separate metal plates, a desired electric potential distribution may be applied along such catcher plate arrangement. Nevertheless, and as often most high energy particles from the transition surface areas T 5,7 are still negative ions when they arrive at the catcher plate arrangements, in one embodiment both catcher plate arrangements 20 5,7 of metal are operated on a positive- i.e. an anodic- electric DC potential with respect to the targets 5,7.
  • both catcher plate arrangements 20 5,7 are operated on the common anode potential of the common anode arrangement 14.
  • one catcher plate arrangement 20 5 is operated on the potential of the associated anode arrangement 14 5 and/or the second catcher plate arrangement 20 7 is operated on the potential of the associated anode arrangement 14 7 .
  • the catcher plate arrangements 20 5,7 are plane plates or sets of plane plates or of plates bent towards the reaction space R as shown in Fig. 1 at catcher plate arrangement 20 7 and/or of plates bent - as shown in Fig. 10 - from the reaction space R away towards the chamber space S.
  • the catcher plate arrangements 20 5,7 project towards each other, and thus restrict the area of the open coating-material outlet area 12 remaining open towards the space S and thus towards the substrate 104 on the substrate holder 106.
  • the catcher plate arrangements 20 5,7 restrict the open coating-material outlet area 12 just by a degree high enough to bar or block the addressed visibility between the transition surface areas T 5,7 and the predominant part of the extended surface 108 of a the substrate 104 on the substrate holder 106, even to the entire extended surface 108.
  • Each of the catcher plate arrangements 20 7 has an extended most projecting rim or border 20mp.
  • a distance of this most projecting rim 20 mp to the respective side surface 9,10 of the respective target is shown by d. This distance is measured parallel to the respective plate plane E 5 or E 7 respectively and perpendicularly to the extent of the most projecting rim 20 mp which extents substantially in a direction perpendicular to the plane of fig.10 .
  • a further distance of the most projecting rim 20 mp to the respective target 7,5 is shown by D. This distance is measured in a plane perpendicular to the respective plate plane E 5 ,E 7 and again, as was defined, perpendicular to the extent of the most projecting rom.
  • the catcher plate arrangements 20 5,7 which are exposed to both, the reaction space R and the extended surface 108 should be kept minimal or even vanishing. This because, as was addressed above, the surfaces of the catcher plate arrangements exposed to the reaction space R will become coated with a coating thickness increasing with operation time of the sputtering source. If these surfaces are also exposed to the extended surface 108 of the substrate 104, flaking off may result in damaging the overall substrate.
  • the catcher plate arrangements 20 5,7 are constructed and mounted as maintenance exchange parts.
  • Fig. 11 shows, schematically and simplified, a top view of one embodiment of the sputtering source 1.
  • the anode arrangement 14 comprises at least one, in the embodiment of fig 11 two anode lateral plates 14 a and 14 b , which complement the delimitation of the reaction space R, two side delimitated by the targets 5 and 7, to a four side delimitation. If, considered in z direction, the two anode lateral or side plates 14 a and 14 b extend down to or are located just adjacent the rim portions 9 and 10, they complement the delimitation of the open coating material outlet area 12, two side delimitated by the rim portions 9 and 10, to a four side delimitation. Only one lateral plate e.g. plate 14 a may be provided e.g. if the wall of the sputtering source is operated as anode and is located laterally nearby the targets, at the location and instead of lateral plate 14 b of fig.11 .
  • Fig. 12 shows, schematically and simplified, a side view in analogy to that of Fig. 1 , on an embodiment of the sputtering source 1.
  • the anode arrangement 14 comprises a top anode plate 14 c opposite to the open coating-material outlet area 12, with respect to the reaction space R. If such a top plate 14 c is combined with a single lateral plate e.g. 14 a then the anode arrangement becomes L-profiled, combined with two lateral plates 14 a and 14 b , U-profiled.
  • the anode arrangement comprises, similar to a one side open box, the side plates 14 a and 14 b , the top plate 14 c , and further plates 14 d5 and 14 d7 extending behind the targets 5 and 7 and behind the respective magnet arrangements 18 5,7 .
  • the catcher plate arrangements 20 5,7 are not shown in fig. 13 , for clearness sake.
  • the anode arrangement comprises respective anode strips 14 e7 and 14 e5 which run exclusively along and distant from the rim portions 9 and 10.
  • the catcher plate arrangements 20 5,7 may be directly mounted to the anode strips 14 e5 and 14 e7 and are thereby, if made of metal, operated on the electric anode potential. Please note that anode strips frame like all around the borders of the targets are not provided.
  • the embodiment of fig. 13 is combined with the embodiment of fig. 14 .
  • the catcher plate arrangements 20 5,7 of metal are directly mounted to the anode strips 14 e5 and 14 e7 . They may be of one piece with the anode strips.
  • the strip shaped catcher plate arrangements 20 5,7 may be the legs of a catcher plate arrangement frame 20 a .
  • a catcher plate arrangement frame 20 a may be applied in all embodiments of the sputtering source 1. Thereby the four legs of such frame may be of equal or different materials.
  • Each leg may comprise or consist of at least one metal plate, comprise or consist at least one ceramic material plate.
  • Different patterns of magnetic field B may be established in the reaction space R.
  • the magnetic field pattern has at least a part of the magnetic field unbalanced, impinging on or emanating from only one respective sputtering surface S 5 and/or S 7 .
  • Such unbalanced field components are addressed schematically in Fig. 1 at B ub .
  • the magnetic field pattern may instead or additionally to unbalanced components, comprise components emanating at one sputtering surface and impinging at the second sputtering surface and also vice versa, thus being bi-directionally directed between the sputtering surfaces S 5,7 as schematically shown in Fig. 1 at B- and B+.
  • the magnetic field may comprise or consist of uni-directional field components, the magnetic field being exclusively directed from one specific sputtering surface e.g. from S 5 to the second sputtering surface, as of S 7 .
  • the magnetic field pattern may even be tailored along at least one of the sputtering surfaces as a magnetron magnetic field, as perfectly known to the skilled artisan, such at least one target being then operated as a magnetron target (not shown).
  • the magnetic field pattern may be swept or wobbled in the reaction space R by providing at least one of the magnet arrangements 18 5,7 controllably moved with respect to the sputtering surfaces e.g. behind and along the sputtering surfaces S 5,7 , as schematically shown in fig.1 by the double arrows P.
  • Such an embodiment has revealed, with respect to the pattern of magnetic field B in the reaction space R, as highly effective and of relatively simple realization.
  • each of the targets 5,7 a two dimensional pattern of permanent magnets 19 5 and 19 7 is mounted.
  • the magnet dipoles D (from N to S) are directed perpendicular to the respective plate-planes E 5 and E 7 and point at one target towards, at the other target from the sputtering surface S 5,7 .
  • a magnet joke 21 of ferromagnetic material interconnects the two patterns 19 5,7 along which additional permanent magnets may be provided as shown in dash line at 19 21 .
  • the magnet joke may additionally be exploited to electrically supply the two targets 5 and 7 e.g. from a supply connection S.
  • Fig. 17 there is shown, schematically and simplified, a cross section through a sputtering source 1 as realized today.
  • the same reference numbers are used for parts which have already been addressed.
  • the two plate-shaped targets 5 and 7 are equally shaped. They are square and parallel and the rim portions 9 and 10 are positioned in a plane. Opposite the sputtering surfaces S 5,7 each target 5,7 is in thermal contact with a respective cooling plate 23 5,7 with cooling-medium lines 25 5,7 for a liquid or gaseous cooling medium.
  • the patterns of permanent magnets 19 5,7 are provided with dipole directions as indicated at D.
  • the patterns 19 5,7 of permanent magnets are magnetically linked by the magnet joke 21. Additional permanent magnets 19 21 may be provides along the magnet joke 21, as shown in dashed line in fig. 17 .
  • the targets 5,7 ,the cooling plates and the magnet joke are surrounded by the anode arrangement 14 with the anode plates 14 d5 ,14 d7 , the top plate 14 c , the lateral plates 14 b , and 14 a , as well as the anode strips 14es and 14 e7 .
  • the catcher plate arrangements 20 5,7 are mechanically and electrically connected to the anode strips 14es and 14e 7 .
  • Electric supply feed-troughs 30 5 , 30 7 are provided through the magnet joke 21 and the anode plate 14c for electrically supplying the targets 5 and 7.
  • both targets 5,7 may be electrically supplied independently from one another.
  • both targets are to be equally electrically supplied, one single feed trough suffices and the magnetic joke may additionally be exploited as electrical feed line towards the targets. Further a gas feed line 24 for a working gas and /or oxygen discharges in the reaction space R.
  • the catcher plate arrangements 20 5,7 may form the two legs of a frame 20 as has already been addressed in context with fig.15 and shown in fig.17 in dash line.
  • a third target 8 may be provided opposite the open coating-material outlet area 12. Providing such "cover” target 8 may be realized in all embodiments of the sputtering source 1.
  • a three-target embodiment of a sputtering source 1 according to the invention.
  • the same reference numbers are used for same elements as up to now.
  • the third target 8 may be conceived as a magnetron with magnetron magnetic field B mag .
  • Figs. 19 and 20 show a single sputtering source 1/single substrate 104 sputtering chamber 100. Thereby, only the mutual arrangement of the targets 5 and 7, of the catcher plate arrangement 20 5 and 20 7 and of the substrate 104 are shown. As shown in fig. 19 , at least the predominant part of the extended surface 108 of the circular substrate 104 is bared with respect to visibility to the respective transition surface areas T 5,7 . This predominant part may be the complete extended surface area 108 of the substrate 104. Nevertheless it may be that some boarder areas 105, as shown in figs. 19 and 20 in dashed lines, may still be exposed to the addressed transition surface areas, under the consideration of low probability that high energy particles will impinge on such outermost peripheral areas 105 of the substrate 104.
  • the sputtering source 1 is exemplified having equally shaped, rectangular targets 5 and 7.
  • the open coating-material outlet area 12 extends along a plane parallel to the holder plane along which the substrate 104 is held on the substrate holder 106.
  • the open coating -material outlet area 12 is centralized with respect to the central axis A of the substrate 104 and of the substrate holder 106 and faces the extended surface 108 of the substrate 104 and thus the substrate holder 106.
  • the substrate 104 is rotated by a drive (not shown in figs. 19, 20 ) rotating the substrate holder 106 about the central axis A.
  • the targets 5 and 7 are stationary as schematically shown at Q.
  • Both figs. 21 and 22 show schematically and most simplified a side-view and a top-view on a four-source 1, single substrate 104 sputtering chamber 100.
  • the open coating-material outlet areas 12 of the sputtering sources 1 are inclined by an angle ⁇ with respect to the plane along which the substrate 104 is supported on the substrate holder 106.
  • the substrate holder 106 may be rotated about its central axis A and therewith the substrate 104.
  • less than four or more than four sources 1 may be provided to commonly sputter-coat the surface 108 of the one substrate 104 with one or more than one oxide layers.
  • Figs. 23 and 24 show in a representation in analogy to those of the figs. 21 and 22 a four-sputtering source 1/four-substrate 104 batch sputtering chamber 100.
  • the four substrates 104 are first loaded on a multiple substrate holder carrier 106 a in a loading/unloading positon I, as shown by the load/unload double-arrow U/L. Together with the multiple-substrate holder carrier 106 a the batch of substrates 104 is lifted in coating position II within sputtering chamber 100.
  • different possibilities are operational:
  • the respective sputtering chamber of this embodiment is a batch sputtering chamber.
  • the embodiment according to figs. 23 and 24 may be realized in variants for batches of less or of more than four substrates 104 and with more or less than four sputtering sources 1.
  • Figs. 25 and 26 show in a representation in analogy to those of the figs. 23 and 24 a sputtering chamber 100 conceived as an inline sputtering chamber.
  • the multiple substrate holder carrier 106 a is constructed to hold eight circular substrates 104 on respective substrate holders evenly distributed along its periphery.
  • substrates are unloaded and loaded from / to one of the substrate holders 106 on the carrier 106 a . Loading and unloading operation lasting 0.5 ⁇ each. If ⁇ is the in-line clock period, in one clock period one substrate holder 106 is unloaded and reloaded.
  • each substrate 104 once loaded in position (a), is stepped seven times to sputter coating subsequently by the seven sputtering sources 1.
  • a substrate Once a substrate has passed the seven sputtering sources 1 it is unloaded in position (a) and an uncoated substrate is loaded.
  • the substrates are finally coated with an oxide layer of 7x the thickness deposited by each of the sputtering sources 1.
  • the throughput has nevertheless the rate 1/ ⁇ .
  • Sputter coating one substrate by one sputtering source with same thickness would necessitate a sputtering time of 7 ⁇ .
  • the throughput rate would be 1/7 ⁇ .
  • the time duration of the overall sputter coating process may be tailored largely independently from the step- rate of the inlying machine.
  • rotation ⁇ of the substrate may be avoided by replacing the single sputtering sources 1 at the coating positions of the substrates 104 by multiple sputtering sources commonly coating a respective substrate.
  • Fig. 27 there is most schematically shown the two targets 5 and 7 of the sputtering source 1, the substrate holder 104 of the sputter chamber 100 with substrate 106, the catcher plate arrangements 20 5 and 20 7 and the target-specific anode arrangements 14 7 and 14 5 .
  • the different possibilities of electrically supplying the target 7 with respect to the specific anode arrangement 14 7 is schematically represented by the possibility selecting switches W which represents the possibilities to supply the target 7 with respect to the anode arrangement 14 7 in at least one of the manners (a), (b), (c).
  • the target 7 /anode arrangement 14 7 is electrically supplied by a DC supply source 122 a .
  • the target 7 is operated with respect to the anode arrangement 14 7 by a pulsed DC source 122 b .
  • the target 7 is operated with respect to the anode arrangement 14 7 by a RF supply source 122 c .
  • Two or three of the supplies may be combined, e.g. DC with pulsed DC, Pulsed DC with RF etc.
  • the addressed supply sources 122 a to 122 c may be operated in a floating manner or with respect to a reference potential, e.g. the anode potential being ground potential.
  • the second target 5 may be electrically supplied with respect to the anode arrangement 14 5 with the same possibilities or options as just addressed for electrically supplying the target 7 with respect to the anode arrangement 14 7 .
  • Target 5 may also be directly connected over the joke or an electrical connection with the target 7. Therefore, in Fig. 27 , the respective possibilities for electrically supplying target 5 with respect to anode arrangement 14 5 are not shown.
  • the two targets 5 and 7 may be electrically supplied separately by different supply possibilities (a) to (c) and in a floating manner or referred to a reference potential or the two targets/anodes may be electrically supplied equally, i.e. according to option (a) and/or (b) and/or (c) floatingly or referred to a reference potential. Then the two anode arrangements 14 5 and 14 7 may be combined to one anode arrangement 14 and the two targets 5 and 7 may both be operated by a common electric supply.
  • the two targets 5 and 7 are both operated by a common DC and RF supply source with respect to a common anode arrangement 14. Thereby the anode is operated at ground reference potential.
  • Fig. 27 shows further in block 126 and in a representation in analogy to that which was used to explain the possibilities of electrically supplying the targets 5 and 7 with respect to the anode arrangement, four options (a) to (d) for operating the substrate holder 104 and the substrate 106 deposited and held on the support 106.
  • the substrate holder 104 and thus the substrate 106 are biased by a DC-bias source 126 a .
  • the substrate 106 and thus the substrate holder 104 is operated on electric ground potential.
  • the substrate 106 is operated in an electrically floating manner.
  • the substrate 104 is either held on the substrate support 106 in an electrically isolated manner or at least the directly supporting part of support 104 is operated in a floated manner, i.e. is electrically isolated from other parts of the sputtering chamber 100 which are on electric potentials.
  • the substrate holder 104 and thus the substrate 106 is biased by means of a RF-biasing source 126 d .
  • the substrate 106 is operated in an electrically floating manner or on ground potential.
  • the options (a), (b), (c), (d) are addressed for electrically supplying those parts of the catcher plate arrangements 20 5,7 which are of metal.
  • these parts of the catcher plate arrangements may be electrically supplied by a DC supply source 128 a .
  • the addressed metal parts of the catcher plate arrangements 20 5,7 are electrically supplied by an RF supply source 128 b .
  • the addressed parts are operated at ground potential and according to option (d) they are operated in an electrically floating manner.
  • each catcher plate arrangement 20 5,7 is made of a metal plate and electrically operated on anode potential.

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Claims (52)

  1. Sputterquelle (1), die zur Sputterbeschichtung eines Substrats (104) konzipiert ist, umfassend:
    • zwei plattenförmige Targets (5, 7), die sich entlang jeweiliger Plattenebenen (E5, E7) erstrecken, wobei die Sputterflächen (S5, S7) der Targets (5, 7) einander zugewandt sind, wodurch dazwischen ein Reaktionsraum (R) definiert wird, wobei die Plattenebenen (E5, E7) zueinander parallel oder zueinander um höchstens 90° geneigt sind;
    • eine Anodenanordnung (14, 145, 147);
    • eine Magnetanordnung (185, 187) entlang von jedem der Targets (5, 7) und gegenüber den jeweiligen Sputterflächen (S5, S7), wobei jede Magnetanordnung (185, 187) ein Magnetfeld in dem Reaktionsraum (R) generiert, das auf der jeweiligen Sputterflächen (S5, S7) auftrifft und/oder davon ausgeht und entlang mindestens eines überwiegenden Teils der jeweiligen Sputterflächen (S5, S7) verteilt ist;
    • einen offenen Beschichtungsauslassbereich (12) von dem Reaktionsraum (R) zu einem Beschichtungsraum (S), der durch jeweilige Bereiche voneinander zugewandten Kanten (9, 10) der zwei plattenförmigen Targets (5, 7) begrenzt ist;
    • die Sputterflächen (S5, S7) der Targets (5, 7), die in jeweilige Seitenflächenbereiche (L5, L7) der Targets (5, 7) entlang der einander zugewandten Kanten (9, 10) durch jeweilige Bereiche einer Übergangsfläche (T5, T7) der Targets (5, 7) übergehen, wobei die Bereiche der Übergangsfläche (T5, T7) einen kleineren Krümmungsradius aufweisen als die angrenzenden Bereiche der jeweiligen Sputterfläche (S5, S7);
    • eine herausragende Fangplattenanordnung (205, 207) entlang jeder der Kanten (9, 10) und entfernt von dem jeweils einen der Targets (5, 7) und jeweils in einer Richtung von den Kanten (9, 10) weg und zueinander hin in den offenen Beschichtungsauslassbereich (12) herausragend, wodurch der offene Beschichtungsauslassbereich (12) eingeschränkt wird, der durch die einander zugewandten Kanten (9, 10) der zwei plattenförmigen Targets (5, 7) begrenzt wird, , gekennzeichnet durch die Tatsache, dass:
    • die herausragende Fangplattenanordnung (205, 207) eine Gesamtfläche aufweist, die überwiegend aus einer ersten erweiterten Oberfläche und aus einer gegenüberliegenden zweiten erweiterten Oberfläche besteht, wobei die erste erweiterte Oberfläche ausschließlich zum Reaktionsraum (R) hin exponiert ist, wohingegen die zweite erweiterte Oberfläche ausschließlich zum Beschichtungsraum (S) hin exponiert ist.
  2. Sputterquelle nach Anspruch 1, die konstruiert ist, um eine Sputterbeschichtung des Substrats (104) mit einem Material durchzuführen, wobei mindestens eine Komponente davon in dem Sputterplasma als ein Ion vorliegt.
  3. Sputterquelle nach einem der Ansprüche 1 oder 2, die konstruiert ist, um eine Sputterbeschichtung des Substrats (104) mit einem Material durchzuführen, wobei mindestens eine Komponente davon in dem Sputterplasma als ein negatives Ion vorliegt.
  4. Sputterquelle nach einem der Ansprüche 1 bis 3, die konstruiert ist, um eine Sputterbeschichtung des Substrats (104) mit einem Oxid durchzuführen.
  5. Sputterquelle nach mindestens einem der Ansprüche 1 oder 4, wobei jede Fangplattenanordnung (205, 207) eine am stärksten herausragende Kante aufweist und ein Abstand von der am stärksten herausragenden Kante zu einer Seitenfläche des jeweiligen Targets (5, 7), gemessen in einer Ebene parallel zu der jeweiligen Plattenebene und senkrecht zu der Längenausdehnung der am stärksten herausragenden Kante, kleiner ist als ein Abstand zwischen der am stärksten herausragenden Kante und einer Fläche des jeweiligen Targets (5, 7), gemessen in einer Ebene senkrecht zu der jeweiligen Plattenebene und senkrecht zu der Längenausdehnung der am stärksten herausragenden Kante.
  6. Sputterquelle nach mindestens einem der Ansprüche 1 bis 5, wobei die Plattenebenen (E5, E7) zu einer mittleren Ebene symmetrisch sind.
  7. Sputterquelle nach mindestens einem der Ansprüche 1 bis 6, wobei die Plattenebenen (E5, E7) parallel sind.
  8. Sputterquelle nach mindestens einem der Ansprüche 1 bis 7, wobei die einander zugewandten Kanten (9, 10) linear und parallel sind.
  9. Sputterquelle nach mindestens einem der Ansprüche 1 bis 8, wobei die plattenförmigen Targets (5, 7) rechteckig oder quadratisch sind.
  10. Sputterquelle nach mindestens einem der Ansprüche 1 bis 9, wobei die Plattenebenen (E5, E7) zu einer mittleren Ebene symmetrisch sind, wobei sich der offene Beschichtungsauslassbereich (12) entlang einer Ebene senkrecht zu der mittleren Ebene erstreckt.
  11. Sputterquelle nach mindestens einem der Ansprüche 1 bis 10, wobei mindestens eines der Targets (5, 7) aus einem einzigen Material besteht.
  12. Sputterquelle nach mindestens einem der Ansprüche 1 bis 11, wobei mindestens eines der Targets (5, 7) ein Oxid umfasst oder aus einem Oxid besteht.
  13. Sputterquelle nach mindestens einem der Ansprüche 1 bis 12, wobei mindestens eines der Targets (5, 7) eine Materialkomponente umfasst, die in dem Sputterplasma als ein Ion vorliegt.
  14. Sputterquelle nach mindestens einem der Ansprüche 1 bis 13, wobei mindestens eines der Targets (5, 7) eine Materialkomponente umfasst, die in dem Sputterplasma als ein negatives Ion vorliegt.
  15. Sputterquelle nach mindestens einem der Ansprüche 1 bis 14, umfassend eine Sauerstoffgaszufuhranordnung (102), die sich in den Reaktionsraum und/oder nach dem eingeschränkten offenen Beschichtungsauslassbereich entlädt, der durch die Fangplattenanordnung (205, 207) eingeschränkt ist.
  16. Sputterquelle nach mindestens einem der Ansprüche 1 bis 15, umfassend eine Gaszufuhranordnung (102), die sich in den Reaktionsraum (R) und/oder nach dem eingeschränkten offenen Beschichtungsauslassbereich (12) entlädt, der durch die Fangplattenanordnung (205, 207) eingeschränkt ist.
  17. Sputterquelle nach mindestens einem der Ansprüche 1 bis 16, wobei die Fangplattenanordnung (205, 207) Fangplatten (205, 207) mit mindestens einer der folgenden Formen umfasst: eben, zu dem Reaktionsraum gebogen, von dem Reaktionsraum (R) weggebogen.
  18. Sputterquelle nach mindestens einem der Ansprüche 1 bis 17, wobei mindestens eine der Fangplattenanordnung (205, 207) mindestens eine Metallplatte umfasst oder aus mindestens einer Metallplatte besteht.
  19. Sputterquelle nach mindestens einem der Ansprüche 1 bis 18, wobei mindestens eine der Fangplattenanordnung (205, 207) mindestens eine Keramikmaterialplatte umfasst oder aus mindestens einer Keramikmaterialplatte besteht.
  20. Sputterquelle nach mindestens einem der Ansprüche 1 bis 19, wobei die Anodenanordnung (14) eine seitliche Anodenplatte umfasst, welche die zweiseitige Begrenzung des Reaktionsraums (R) durch die zwei Targets (5, 7) zu einer dreiseitigen Begrenzung des Reaktionsraums (R) ergänzt.
  21. Sputterquelle nach Anspruch 20, umfassend zwei der seitlichen Anodenplatten, welche die zweiseitige Begrenzung des Reaktionsraums durch die zwei Targets (5, 7) zu einer vierseitigen Begrenzung des Reaktionsraums ergänzen.
  22. Sputterquelle nach mindestens einem der Ansprüche 1 bis 21, wobei die Anodenanordnung (14) eine seitliche Anodenplatte umfasst, welche die zweiseitige Begrenzung des offenen Beschichtungsauslassbereichs (12) durch die zwei Targets (5, 7) zu einer dreiseitigen Begrenzung des offenen Beschichtungsauslassbereichs (12) ergänzt.
  23. Sputterquelle nach Anspruch 22, wobei die Anodenanordnung (14) zwei der seitlichen Anodenplatten umfasst, welche die zweiseitige Begrenzung des offenen Beschichtungsauslassbereichs (12) durch die zwei Targets (5, 7) zu einer vierseitigen Begrenzung des offenen Beschichtungsauslassbereichs (12) ergänzen.
  24. Sputterquelle nach mindestens einem der Ansprüche 1 bis 23, wobei die Anodenanordnung (14) eine Anodenplatte gegenüber dem offenen Beschichtungsauslassbereich (12) in Bezug auf den Reaktionsraum (R) umfasst.
  25. Sputterquelle nach mindestens einem der Ansprüche 1 bis 24, wobei die Anodenanordnung (14) einen Anodenrahmen um den offenen Beschichtungsauslassbereich (12) umfasst.
  26. Sputterquelle nach mindestens einem der Ansprüche 1 bis 25, wobei die Anodenanordnung (14) eine Anordnung von Anodenstreifen entlang der Grenze der Targets (5, 7) und ausschließlich entlang der einander zugewandten Kanten (9, 10) umfasst.
  27. Sputterquelle nach mindestens einem der Ansprüche 1 bis 26, wobei die Anodenanordnung (14) eine Anordnung von Anodenstreifen entlang der einander zugewandten Kanten (9, 10) umfasst, wobei die Fangplattenanordnung (205, 207) herausragende Metallplatten umfasst, die elektrisch und mechanisch mit den Anodenstreifen verbunden sind.
  28. Sputterquelle nach mindestens einem der Ansprüche 1 bis 27, wobei die Fangplattenanordnung (205, 207) herausragende Metallplatten umfasst, die elektrisch mit der Anodenanordnung (14) verbunden sind.
  29. Sputterquelle nach mindestens einem der Ansprüche 1 bis 28, wobei die Fangplattenanordnung (205, 207) zwei Schenkeln eines Rahmens entspricht, der den offenen Beschichtungsauslassbereich (12) begrenzt und sich um diesen herum befindet.
  30. Sputterquelle nach mindestens einem der Ansprüche 1 bis 29, wobei das Magnetfeld unidirektional von einer Sputterfläche (S5) zu der anderen Sputterfläche (S7) generiert wird.
  31. Sputterquelle nach mindestens einem der Ansprüche 1 bis 30, umfassend ein drittes Target (8), das den Reaktionsraum (r) gegenüber dem offenen Beschichtungsauslassbereich (12) bedeckt.
  32. Sputterquelle nach Anspruch 31, wobei das dritte Target (8) mit einer Magnetanordnung (19s) verknüpft ist, die entlang der Sputterfläche des dritten Targets (8) ein Magnetron-Magnetfeld generiert.
  33. Sputterquelle nach mindestens einem der Ansprüche 1 bis 32, wobei mindestens eines der Targets (5, 7, 8) mindestens eines der Metalle In, Sn, Zn, Ga, Al umfasst oder daraus besteht.
  34. Sputterquelle nach mindestens einem der Ansprüche 1 bis 33, wobei mindestens eines der Targets (5, 7, 8) eine Materialkomponente umfasst, die in dem Sputterplasma als ein Ion vorliegt.
  35. Sputterquelle nach mindestens einem der Ansprüche 1 bis 34, wobei mindestens eines der Targets (5, 7, 8) eine Materialkomponente umfasst, die in dem Sputterplasma als ein negatives Ion vorliegt.
  36. Sputterquelle nach mindestens einem der Ansprüche 1 bis 35, wobei mindestens eines der Targets (5, 7, 8) ein Oxid umfasst oder daraus besteht.
  37. Sputterquelle nach mindestens einem der Ansprüche 1 bis 36, wobei die Plattenebenen (E5, E7) zueinander um höchstens 5° geneigt sind.
  38. Sputterbeschichtungskammer (100), umfassend mindestens eine Sputterquelle (1) nach mindestens einem der Ansprüche 1 bis 37 und ferner umfassend einen Substrathalter (106), der konstruiert ist, um ein Substrat (104) mit einer seiner erweiterten Flächen zu halten, die gegenüber dem Beschichtungsraum (S)exponiert sind, wobei der Substrathalter (106) in der Sputterbeschichtungskammer (100) in einer Position montiert ist, in der die erweiterte Fläche dem eingeschränkten offenen Beschichtungsauslassbereich (12) zugewandt ist und die Sichtbarkeit der Übergangsoberflächen von mindestens einem überwiegenden Teil der erweiterten Fläche durch die Fangplattenanordnung (205, 207) versperrt wird.
  39. Sputterbeschichtungskammer nach Anspruch 38, wobei der Substrathalter (106) konstruiert ist, um ein Substrat (104) entlang einer Halteebene zu halten, wobei die einander zugewandten Kanten (9, 10) parallel und linear sind und die Halteebene parallel oder geneigt zu einer Ebene ist, die durch die parallelen und linearen Kanten (9, 10) definiert ist.
  40. Sputterbeschichtungskammer nach Anspruch 39, wobei die Halteebene und die Ebene, die durch die Kanten (9, 10) definiert ist, um höchstens 45° geneigt sind.
  41. Sputterbeschichtungskammer nach mindestens einem der Ansprüche 38 bis 40, wobei das Substrat (104) auf dem Substrathalter (106) elektrisch schwebend betrieben wird oder mit einem DC-Referenzpotenzial, vorzugsweise dem Erdpotenzial, verbunden werden kann.
  42. Sputterbeschichtungskammer nach mindestens einem der Ansprüche 38 bis 41, wobei der Substrathalter (106) konstruiert ist, um ein kreisförmiges Substrat (104) zu halten und mit einem Drehantrieb wirkverbunden ist, der den Substrathalter (106) um eine Mittelachse dreht.
  43. Sputterbeschichtungskammer nach mindestens einem der Ansprüche 38 bis 42, umfassend einen Substrathalterträger mit mindestens zwei der Substrathalter, wobei die Anzahl der bereitgestellten Sputterquellen der Anzahl der mindestens zwei Substrathalter an dem Träger entspricht oder sich davon unterscheidet.
  44. Sputtersystem, umfassend mindestens eine Sputterquelle nach mindestens einem der Ansprüche 1 bis 37 oder mindestens eine Sputterkammer nach mindestens einem der Ansprüche 38 bis 43, ferner umfassend eine Gaszufuhranordnung (102), die ein Gas in den Reaktionsraum der mindestens einen Sputterquelle und/oder zwischen dem offenen Beschichtungsmaterialauslassbereich der Sputterquelle und dem Substrathalter abgibt.
  45. System nach Anspruch 44, wobei die Gaszufuhranordnung (102) in einer operativen Strömungsverbindung mit einer Gasreservoiranordnung steht, die ein Gas enthält, wobei das Gas oder mindestens eine Komponente davon in dem Sputterplasma als ein Ion vorliegt.
  46. System nach mindestens einem der Ansprüche 44 oder 45, wobei die Gaszufuhranordnung (102) in einer operativen Strömungsverbindung mit einer Gasreservoiranordnung steht, die ein Gas enthält, wobei das Gas oder mindestens eine Komponente davon in dem Sputterplasma als ein negatives Ion vorliegt.
  47. System nach mindestens einem der Ansprüche 44 bis 46, wobei die Gaszufuhranordnung (102) in einer operativen Strömungsverbindung mit einer Gasreservoiranordnung steht, die ein Gas enthält, wobei das Gas oder mindestens eine Komponente davon Sauerstoff ist.
  48. Sputtersystem nach mindestens einem der Ansprüche 44 bis 47, wobei mindestens eines der Targets (5, 7, 8) elektrisch durch mindestens eine Versorgungsquelle versorgt wird, die mindestens eines von DC, gepulstem DC, RF erzeugt.
  49. Verfahren zur Sputterbeschichtung eines Substrats mit einem Material, wobei mindestens eine Komponente davon in dem Sputterplasma als ein Ion vorliegt, oder zum Herstellen eines Substrats, das mit dem Material beschichtet ist, wobei die Verfahren das Aufbringen der Beschichtung mithilfe von mindestens einer Sputterquelle nach mindestens einem der Ansprüche 1 bis 37 oder mithilfe einer Sputterkammer nach mindestens einem der Ansprüche 38 bis 43 oder mithilfe eines Systems nach mindestens einem der Ansprüche 44 bis 48 umfassen.
  50. Verfahren nach Anspruch 49, wodurch das Substrat mit einem Material beschichtet wird, wobei mindestens eine Komponente davon in dem Sputterplasma als ein negatives Ion vorliegt.
  51. Verfahren nach mindestens einem der Ansprüche 49 oder 50, indem das Substrat mit einem Oxid beschichtet wird.
  52. Verfahren nach mindestens einem der Ansprüche 49 bis 51, umfassend das Verhindern, dass die Ionen der Sputterquelle, die eine Energie von mindestens 0,5 UAC × e- aufweisen, auf das Substrat auftreffen, durch die Fangplattenanordnung (205, 207), wobei UAC der Zeitmittelwert des absoluten Werts der Anode/Targetspannung ist.
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