EP3498366B1 - Resistivitätanpassungsvorrichtung und resistivitätanpassungsverfahren - Google Patents

Resistivitätanpassungsvorrichtung und resistivitätanpassungsverfahren Download PDF

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Publication number
EP3498366B1
EP3498366B1 EP17839589.3A EP17839589A EP3498366B1 EP 3498366 B1 EP3498366 B1 EP 3498366B1 EP 17839589 A EP17839589 A EP 17839589A EP 3498366 B1 EP3498366 B1 EP 3498366B1
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EP
European Patent Office
Prior art keywords
flow rate
liquid
hollow fiber
resistance value
fiber membrane
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EP17839589.3A
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English (en)
French (fr)
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EP3498366A4 (de
EP3498366A1 (de
Inventor
Masato Saito
Kazumi Oi
Naoki Hada
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DIC Corp
Original Assignee
DIC Corp
Dainippon Ink and Chemicals Co Ltd
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Publication of EP3498366A4 publication Critical patent/EP3498366A4/de
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
    • C02F1/685—Devices for dosing the additives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00—Dissolving
    • B01F21/30—Workflow diagrams or layout of plants, e.g. flow charts; Details of workflow diagrams or layout of plants, e.g. controlling means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/02—Hollow fibre modules
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00—Dissolving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23124—Diffusers consisting of flexible porous or perforated material, e.g. fabric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23124—Diffusers consisting of flexible porous or perforated material, e.g. fabric
    • B01F23/231244—Dissolving, hollow fiber membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/313—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
    • B01F25/3132—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices
    • B01F25/31322—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices used simultaneously
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/313—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
    • B01F25/3133—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit characterised by the specific design of the injector
    • B01F25/31331—Perforated, multi-opening, with a plurality of holes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/314—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit
    • B01F25/3142—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit the conduit having a plurality of openings in the axial direction or in the circumferential direction
    • B01F25/31421—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced at the circumference of the conduit the conduit having a plurality of openings in the axial direction or in the circumferential direction the conduit being porous
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/32—Injector mixers wherein the additional components are added in a by-pass of the main flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40—Static mixers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40—Static mixers
    • B01F25/45—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
    • B01F25/452—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
    • B01F25/4522—Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through porous bodies, e.g. flat plates, blocks or cylinders, which obstruct the whole diameter of the tube
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/211—Measuring of the operational parameters
    • B01F35/2111—Flow rate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B01F35/83—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
    • B01F35/833—Flow control by valves, e.g. opening intermittently
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B01F35/83—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
    • B01F35/833—Flow control by valves, e.g. opening intermittently
    • B01F35/8331—Flow control by valves, e.g. opening intermittently the flow of one component operating the actuator of the valve, e.g. by deforming a membrane which operates de valve actuator
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
    • B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00—General aspects of water treatment
    • C02F2301/04—Flow arrangements
    • C02F2301/043—Treatment of partial or bypass streams

Definitions

  • the invention relates to a specific resistance value adjustment apparatus and a specific resistance value adjustment method for adjusting a specific resistance value of a liquid, namely ultrapure water.
  • a substrate is cleaned by using ultrapure water.
  • ultrapure water when a specific resistance value of ultrapure water is high, static electricity is generated. Accordingly, dielectric breakdown or reattachment of fine particles causes a remarkable adverse effect on product yield.
  • a method using a hydrophobic hollow fiber membrane module has been proposed. In this method, a gas such as a carbonic acid gas or an ammonia gas is dissolved in ultrapure water by using a hollow fiber membrane module. Then, ions are generated by dissociation equilibrium and a specific resistance value of ultrapure water is lowered by the generated ions.
  • Patent Literatures 1 and 2 propose a technique of stabilizing a specific resistance value even when a flow rate changes.
  • a hollow fiber membrane module which produces a small flow rate of gas addition ultrapure water and a bypassing pipe through which a large flow rate of ultrapure water passes are provided. Then, the produced gas addition ultrapure water and ultrapure water passing through the bypassing pipe are joined. Accordingly, the specific resistance value of ultrapure water can be easily adjusted.
  • Patent Literature 1 there is a case in which the specific resistance value of ultrapure water increases since the flow rate of the ultrapure water supplied to the hollow fiber membrane module decreases with respect to the flow rate of the ultrapure water bypassing the hollow fiber membrane module when the flow rate of the ultrapure water is small. Therefore, in the technique described in Patent Literature 2, a plurality of bypassing pipes are provided and a shut valve is provided in one or a plurality of bypassing pipes. Then, when the flow rate of the ultrapure water decreases, the shut valve is partly or entirely opened.
  • WO 02/085790 A2 relates to the problem to provide a gas dissolved water producing apparatus which can produce a gas dissolved water having a concentration of a dissolved solution gas not greater than a saturated concentration rapidly and efficiently.
  • the apparatus described as solution to this problem comprises a gas dissolving section, a gas channel for guiding a gas into the dissolving section, a first water channel for guiding a water into the dissolving section, a gas dissolved water discharge channel, and a second water channel for guiding the water without passing through the dissolving section.
  • the second water channel joins the gas dissolved water discharge channel to control the solution gas dissolved in the gas dissolved water can be controlled to a prescribed level of concentration.
  • JP 2003 010660 A relates to the problem to provide a controlling-mechanism-free, simple, and compact apparatus for controlling the resistivity of ultra-pure water by solving the fluctuation of the resistivity of ultra-pure water due to the reverse diffusion of dissolved gas in raw water for ultra-pure water and related problems, and to provide a method for controlling the resistivity of ultra-pure water.
  • the document describes an apparatus for controlling the resistivity of ultra-pure water by passing a carbon dioxide or ammonia gas through a gas-permeable membrane to dissolve the gas in ultra-pure water.
  • the apparatus has the function of allowing a part of the fed carbon dioxide or ammonia gas to leak from a module for the purpose of purging the dissolved oxygen and the dissolved nitrogen reversely diffusing from the ultra-pure water into the side of the carbon dioxide or ammonia gas through the membrane to keep the gas constant and is capable of controlling the resistivity of ultra-pure water without being influenced by the fluctuation of the flow rate of the ultra-pure water.
  • a method for controlling the resistivity of ultra-pure water by using the apparatus is also described.
  • an object of the invention is to provide a specific resistance value adjustment apparatus and a specific resistance value adjustment method capable of suppressing an increase in specific resistance value of a liquid even when a flow rate of a liquid, namely ultrapure water, is small while suppressing an increase in scale.
  • the invention provides the specific resistance value adjustment apparatus according to claim 1.
  • the liquid namely ultrapure water (hereinafter simply referred to as "liquid"
  • liquid supplied to the liquid supply pipe
  • the branch portion to the liquid supplied to the hollow fiber membrane module and the liquid bypassing the hollow fiber membrane module.
  • the adjustment gas permeating the hollow fiber membrane is dissolved in the liquid so as to produce the adjustment gas addition liquid in which the adjustment gas is dissolved in the liquid.
  • the adjustment gas addition liquid produced by the hollow fiber membrane module and the liquid bypassing the hollow fiber membrane module are joined to each other at the joint portion to become the specific resistance value adjustment liquid and are discharged to the liquid discharge pipe.
  • the opening degree of the control valve opening and closing the module passing pipe is set in response to the first flow rate of the liquid. For this reason, it is possible to increase the flow rate of the liquid supplied to the hollow fiber membrane module by increasing the opening degree of the control valve when the flow rate of the liquid supplied to the liquid supply pipe is small. That is, it is possible to suppress a change of a distribution ratio of the flow rate of the liquid supplied to the hollow fiber membrane module and the flow rate of the liquid bypassing the hollow fiber membrane module even when the flow rate of the liquid is small. Accordingly, it is possible to suppress an increase in specific resistance value of the liquid even when the flow rate of the liquid is small while suppressing an increase in scale.
  • the opening degree of the control valve is set in response to the changed first flow rate when the first flow rate of the liquid is changed, it is possible to suppress a change in specific resistance value of the liquid in accordance with a change of the first flow rate.
  • the first flow rate of the liquid is changed to a small flow rate, it is difficult to supply the liquid to the hollow fiber membrane module.
  • the module passing pipe includes a supply side module passing pipe which is disposed at an upstream side of the hollow fiber membrane module and supplies the liquid to the hollow fiber membrane module and a discharge side module passing pipe which is disposed at a downstream side of the hollow fiber membrane module and discharges the adjustment gas addition liquid from the hollow fiber membrane module and the control unit is attached to the discharge side module passing pipe and open and close the discharge side module passing pipe.
  • a supply side module passing pipe which is disposed at an upstream side of the hollow fiber membrane module and supplies the liquid to the hollow fiber membrane module
  • a discharge side module passing pipe which is disposed at a downstream side of the hollow fiber membrane module and discharges the adjustment gas addition liquid from the hollow fiber membrane module and the control unit is attached to the discharge side module passing pipe and open and close the discharge side module passing pipe.
  • the first flow rate detection unit detects the flow rate of the liquid flowing through the liquid discharge pipe. Since the flow rate of the liquid supplied to the liquid supply pipe is the same as the flow rate of the specific resistance value adjustment liquid flowing through the liquid discharge pipe, the first flow rate detection unit could, in principle, detect any one of the flow rate of the liquid flowing through the liquid supply pipe and the flow rate of the specific resistance value adjustment liquid flowing through the liquid discharge pipe as the first flow rate (only the latter option is according to the invention). However, the discharge side module passing pipe to which the control valve is attached is disposed at a position close to the liquid discharge pipe in relation to the liquid supply pipe.
  • the first flow rate detection unit detects the flow rate of the liquid flowing through the liquid discharge pipe as the first flow rate, it is possible to decrease the scale of the wiring connecting the first flow rate detection unit and the control valve to each other.
  • the specific resistance value adjustment apparatus may further include a second flow rate detection unit which detects a second flow rate of the liquid flowing through the module passing pipe and the control unit may correct the opening degree in response to the second flow rate detected by the second flow rate detection unit.
  • the control unit since the second flow rate detection unit detects the second flow rate of the liquid flowing through the module passing pipe and the control unit corrects the opening degree in response to the second flow rate detected by the second flow rate detection unit, it is possible to further suppress a change of a distribution ratio of the flow rate of the liquid supplied to the hollow fiber membrane module and the flow rate of the liquid bypassing the hollow fiber membrane module even when the flow rate of the liquid is small.
  • the control unit may increase the opening degree as compared with a case in which the first flow rate is larger than the set flow rate.
  • the opening degree of the control valve is increased and the flow rate of the liquid supplied to the hollow fiber membrane module is increased as compared with a case in which the first flow rate is larger than the set flow rate. Accordingly, even when the first flow rate is equal to or smaller than the set flow rate, it is possible to prevent a change of a distribution ratio of the flow rate of the liquid supplied to the hollow fiber membrane module and the flow rate of the liquid bypassing the hollow fiber membrane module.
  • the control unit may increase the opening degree as the first flow rate decreases.
  • the opening degree of the control valve is increased and the flow rate of the liquid supplied to the hollow fiber membrane module is increased as the first flow rate decreases. Accordingly, even when the first flow rate is equal to or smaller than the set flow rate, it is possible to further suppress a change of a distribution ratio of the flow rate of the liquid supplied to the hollow fiber membrane module and the flow rate of the liquid bypassing the hollow fiber membrane module.
  • the control unit may increase the opening degree as the first flow rate decreases. Even when the first flow rate is larger than the set flow rate, there is a tendency that the liquid is not easily supplied to the hollow fiber membrane module as the first flow rate decreases. Therefore, in the specific resistance value adjustment apparatus, when the first flow rate is larger than the set flow rate, the opening degree of the control valve is increased and the flow rate of the liquid supplied to the hollow fiber membrane module is increased as the first flow rate decreases. Accordingly, even when the first flow rate is larger than the set flow rate, it is possible to prevent a change of a distribution ratio of the flow rate of the liquid supplied to the hollow fiber membrane module and the flow rate of the liquid bypassing the hollow fiber membrane module.
  • the control unit may increase a ratio of a change rate of the opening degree with respect to a change rate of the first flow rate as compared with a case in which the first flow rate is larger than the set flow rate.
  • a tendency that the liquid is not easily supplied to the hollow fiber membrane module as the first flow rate decreases is larger as the first flow rate is equal to or smaller than the set flow rate. Therefore, in the specific resistance value adjustment apparatus, when the first flow rate is equal to or smaller than the set flow rate, a ratio of the change rate of the opening degree of the control valve with respect to the change rate of the first flow rate is increased as compared with a case in which the first flow rate is larger than the set flow rate. Accordingly, it is possible to further suppress a change of a distribution ratio of the flow rate of the liquid supplied to the hollow fiber membrane module and the flow rate of the liquid bypassing the hollow fiber membrane module.
  • the adjustment gas addition liquid may be an adjustment gas saturation liquid in which the adjustment gas is dissolved in the liquid in a saturated state.
  • the adjustment gas saturation liquid in which the adjustment gas is dissolved in the liquid in a saturated state is produced as the adjustment gas addition liquid by the hollow fiber membrane module. Accordingly, it is possible to highly accurately adjust the specific resistance value of the liquid just by adjusting a distribution ratio of the flow rate of the liquid supplied to the hollow fiber membrane module and the flow rate of the liquid bypassing the hollow fiber membrane module.
  • the invention also provides the specific resistance value adjustment method according to claim 7.
  • the adjustment gas addition liquid in which the adjustment gas is dissolved in the liquid in a saturated state is produced and the adjustment gas addition liquid produced by the hollow fiber membrane module is joined to the liquid bypassing the hollow fiber membrane module, it is possible to easily adjust the specific resistance value of the liquid.
  • the opening degree of the control valve is set in response to the first flow rate of the liquid, it is possible to increase the opening degree of the control valve and to increase the flow rate of the liquid supplied to the hollow fiber membrane module when the flow rate of the liquid supplied to the liquid supply pipe is small. That is, even when the first flow rate of the liquid is small, it is possible to prevent a change of a distribution ratio of the flow rate of the liquid supplied to the hollow fiber membrane module and the flow rate of the liquid bypassing the hollow fiber membrane module. Accordingly, it is possible to suppress an increase in specific resistance value of the liquid even when the flow rate of the liquid supplied to the liquid supply pipe is small while suppressing an increase in scale.
  • the opening degree of the control valve is set in response to the changed first flow rate when the first flow rate of the liquid is changed, it is possible to suppress a change in specific resistance value of the liquid in accordance with a change of the first flow rate.
  • the first flow rate of the liquid is changed to a small flow rate, it is difficult to supply the liquid to the hollow fiber membrane module.
  • the opening degree when the first flow rate is equal to or smaller than the set flow rate, the opening degree may be increased as compared with a case in which the first flow rate is larger than the set flow rate.
  • the first flow rate of the liquid is small and the first flow rate is equal to or smaller than the set flow rate, it is difficult to supply the liquid to the hollow fiber membrane module as compared with a case in which the first flow rate is larger than the set flow rate. Therefore, in the specific resistance value adjustment method, when the first flow rate is equal to or smaller than the set flow rate, the opening degree of the control valve is increased and the flow rate of the liquid supplied to the hollow fiber membrane module is increased as compared with a case in which the first flow rate is larger than the set flow rate. Accordingly, even when the first flow rate is equal to or smaller than the set flow rate, it is possible to prevent a change of a distribution ratio of the flow rate of the liquid supplied to the hollow fiber membrane module and the flow rate of the liquid bypassing the hollow fiber membrane module.
  • FIG. 1 is a schematic diagram of a specific resistance value adjustment apparatus of a first embodiment.
  • a specific resistance value adjustment apparatus 1 of the embodiment includes a hollow fiber membrane module 2, a gas supply pipe 3, a liquid supply pipe 4, a module passing pipe 5, a bypassing pipe 6, a liquid discharge pipe 7, a first flow rate detection unit 8, a control valve 9, and a control unit 10.
  • the hollow fiber membrane module 2 dissolves an adjustment gas G for adjusting a specific resistance value of a liquid L in the liquid L to be subjected to the adjustment of the specific resistance value.
  • the liquid used as the liquid L is ultrapure water, for example for cleaning a semiconductor.
  • the specific resistance value of ultrapure water is in the range equal to or larger than 17.5 [M ⁇ cm] and equal to or smaller than 18.2 [M ⁇ cm].
  • a gas used as the adjustment gas G is not particularly limited, but, for example, a carbonic acid gas or an ammonia gas can be used.
  • the hollow fiber membrane module 2 includes a plurality of hollow fiber membranes 21 and a housing 22 which accommodates these hollow fiber membranes 21.
  • the hollow fiber membrane 21 is a hollow fiber-shaped membrane which permeates a gas but does not transmit a liquid.
  • the material, film shape, film form, and the like of the hollow fiber membrane 21 are not particularly limited.
  • the housing 22 is a hermetic container which accommodates the hollow fiber membrane 21.
  • An area inside the housing 22 of the hollow fiber membrane module 2 is divided into a liquid phase side area and a gas phase side area by the hollow fiber membrane 21.
  • the liquid phase side area is an area to which the liquid L is supplied in the area inside the housing 22 of the hollow fiber membrane module 2.
  • the gas phase side area is an area to which the adjustment gas G is supplied in the area inside the housing 22 of the hollow fiber membrane module 2.
  • an internal perfusion type and an external perfusion type exist. In the embodiment, any one of the internal perfusion type and the external perfusion type may be used.
  • the inside (the inner surface side) of the hollow fiber membrane 21 becomes the gas phase side area and the outside (the outer surface side) of the hollow fiber membrane 21 becomes the liquid phase side area.
  • the inside (the inner surface side) of the hollow fiber membrane 21 becomes the liquid phase side area and the outside (the outer surface side) of the hollow fiber membrane 21 becomes the gas phase side area.
  • the hollow fiber membrane module 2 dissolves the adjustment gas G permeating the hollow fiber membrane 21 in the liquid L to produce an adjustment gas addition liquid L1 in which the adjustment gas G is dissolved in the liquid L.
  • an adjustment gas saturation liquid in which the adjustment gas G is dissolved in a saturated state in the liquid L as the adjustment gas addition liquid L1 by, for example, uniformly setting a gas pressure of the adjustment gas G supplied to the hollow fiber membrane module 2 and adjusting the flow rate of the liquid L supplied to the hollow fiber membrane module 2. Furthermore, the flow rate of the liquid L supplied to the hollow fiber membrane module 2 can be adjusted by the control valve 9.
  • the housing 22 is provided with a gas supply port 23, a liquid supply port 24, and a liquid discharge port 25.
  • the gas supply port 23 is an opening which is formed in the housing 22 to supply the adjustment gas G to the gas phase side area.
  • the liquid supply port 24 is an opening which is formed in the housing 22 to supply the liquid L to the liquid phase side area.
  • the liquid discharge port 25 is an opening which is formed in the housing 22 to discharge the adjustment gas addition liquid L1 from the liquid phase side area. For this reason, the gas supply port 23 communicates with the gas phase side area and the liquid supply port 24 and the liquid discharge port 25 communicate with the liquid phase side area.
  • the positions of the gas supply port 23, the liquid supply port 24, and the liquid discharge port 25 are not particularly limited.
  • the gas supply pipe 3 is a tubular member having a flow passage formed at the inner peripheral side.
  • the gas supply pipe 3 is connected to the gas supply port 23.
  • the gas supply pipe 3 communicates with the gas phase side area of the hollow fiber membrane module 2 and supplies the adjustment gas G to the gas phase side area of the hollow fiber membrane module 2.
  • the material, characteristics (hardness, elasticity, and the like), shape, size, and the like of the gas supply pipe 3 are not particularly limited.
  • a pressure adjustment valve 11 and a pressure gauge 12 are connected to the gas supply pipe 3.
  • the pressure adjustment valve 11 adjusts the gas pressure of the adjustment gas G flowing through the gas supply pipe 3. That is, the gas pressure of the adjustment gas G in the gas phase side area is adjusted by the pressure adjustment valve 11.
  • various known pressure adjustment valves can be employed.
  • the pressure gauge 12 measures the gas pressure of the adjustment gas G flowing through the gas supply pipe 3.
  • the pressure gauge 12 is connected to the downstream side of the pressure gauge 12 in the gas supply pipe 3, that is, the gas phase side area of the pressure gauge 12 in the gas supply pipe 3.
  • various known pressure gauges can be employed and, for example, a diaphragm valve can be used.
  • a control unit which controls the specific resistance value adjustment apparatus 1 controls the pressure adjustment valve 11 on the basis of the gas pressure of the adjustment gas G measured by the pressure gauge 12 so that the gas pressure of the adjustment gas G flowing through the gas supply pipe 3, that is, the gas pressure of the adjustment gas G in the gas phase side area falls within a predetermined value (or a predetermined range).
  • the adjustment gas G may be discharged from the gas phase side area of the hollow fiber membrane module 2.
  • the housing 22 of the hollow fiber membrane module 2 is provided with a gas discharge port (not illustrated) which is an opening for discharging the adjustment gas G from the gas phase side area.
  • a gas discharge pipe (not illustrated) to which the adjustment gas G is discharged from the gas phase side area of the hollow fiber membrane module 2 is connected to the gas discharge port.
  • the gas discharge pipe is a tubular member having a flow passage formed at the inner peripheral side.
  • the liquid supply pipe 4 is a tubular member having a flow passage formed at the inner peripheral side. All of the liquid L supplied to the specific resistance value adjustment apparatus 1 is supplied to the liquid supply pipe 4.
  • the liquid supply pipe 4 is branched to the module passing pipe 5 and the bypassing pipe 6 by a branch portion 13. That is, the liquid supply pipe 4 is connected to the upstream side of the branch portion 13 and the module passing pipe 5 and the bypassing pipe 6 are connected to the downstream side of the branch portion 13. Then, the branch portion 13 branches and discharges the liquid L flowing through the liquid supply pipe 4 to the module passing pipe 5 and the bypassing pipe 6.
  • the module passing pipe 5 is a tubular member having a flow passage formed at the inner peripheral side.
  • the module passing pipe 5 communicates with the liquid supply pipe 4 through the branch portion 13.
  • the module passing pipe 5 passes through the hollow fiber membrane module 2. That is, the hollow fiber membrane module 2 is connected to the middle of the module passing pipe 5.
  • the module passing pipe 5 includes a supply side module passing pipe 5A which supplies the liquid L to the hollow fiber membrane module 2 and a discharge side module passing pipe 5B which discharges the adjustment gas addition liquid L1 from the hollow fiber membrane module 2.
  • the supply side module passing pipe 5A is disposed at the upstream side of the hollow fiber membrane module 2 and is connected to the liquid supply port 24 of the hollow fiber membrane module 2.
  • the supply side module passing pipe 5A communicates with the liquid phase side area of the hollow fiber membrane module 2 and supplies the liquid L to the liquid phase side area of the hollow fiber membrane module 2.
  • the material, characteristics (hardness, elasticity, and the like), shape, size, and the like of the supply side module passing pipe 5A are not particularly limited.
  • the discharge side module passing pipe 5B is disposed at the downstream side of the hollow fiber membrane module 2 and is connected to the liquid discharge port 25 of the hollow fiber membrane module 2.
  • the discharge side module passing pipe 5B communicates with the liquid phase side area of the hollow fiber membrane module 2 and discharges the adjustment gas addition liquid L1 from the liquid phase side area of the hollow fiber membrane module 2.
  • the material, characteristics (hardness, elasticity, and the like), shape, size, and the like of the discharge side module passing pipe 5B are not particularly limited.
  • the bypassing pipe 6 is a tubular member having a flow passage formed at the inner peripheral side.
  • the bypassing pipe 6 communicates with the liquid supply pipe 4 through the branch portion 13.
  • the bypassing pipe 6 bypasses the hollow fiber membrane module 2. For this reason, the liquid L flowing through the bypassing pipe 6 is not supplied to the hollow fiber membrane module 2 and bypasses the hollow fiber membrane module 2.
  • the bypassing pipe 6 is joined to the discharge side module passing pipe 5B of the module passing pipe 5 by a joint portion 14.
  • the discharge side module passing pipe 5B and the bypassing pipe 6 are connected to the upstream side of the joint portion 14 and the liquid discharge pipe 7 is connected to the downstream side of the joint portion 14. Then, the joint portion 14 joins the adjustment gas addition liquid L1 flowing through the discharge side module passing pipe 5B to the liquid L flowing through the bypassing pipe 6 at the downstream side of the hollow fiber membrane module 2. Then, the joint portion 14 discharges a specific resistance value adjustment liquid L2 obtained by joining the liquid L to the adjustment gas addition liquid L1 to the liquid discharge pipe 7.
  • the liquid discharge pipe 7 is a tubular member having a flow passage formed at the inner peripheral side.
  • the liquid discharge pipe 7 is connected to the joint portion 14 and the liquid discharge pipe 7 communicates with the discharge side module passing pipe 5B and the bypassing pipe 6 through the joint portion 14 and discharges the specific resistance value adjustment liquid L2 from the joint portion 14.
  • the material, characteristics (hardness, elasticity, and the like), shape, size, and the like of the liquid discharge pipe 7 are not particularly limited.
  • the first flow rate detection unit 8 detects the flow rate of the liquid L supplied to the liquid supply pipe 4 as a first flow rate.
  • the liquid L supplied to the liquid supply pipe 4 is branched to the supply side module passing pipe 5A and the bypassing pipe 6 at the branch portion 13 and is further joined at the joint portion 14.
  • the flow rate of the specific resistance value adjustment liquid L2 flowing through the liquid discharge pipe 7 becomes the same as that of the liquid L supplied to the liquid supply pipe 4. Therefore, in the apparatus according to the invention, the first flow rate detection unit 8 is connected to the liquid discharge pipe 7 and the flow rate of the specific resistance value adjustment liquid L2 flowing through the liquid discharge pipe 7 is detected as the first flow rate.
  • the first flow rate detection unit 8 transmits the first flow rate information to the control unit 10.
  • various known flowmeters can be employed.
  • the control valve 9 is a valve which opens and closes a flow passage of the module passing pipe 5.
  • the control valve 9 is controlled by the control unit 10 to be opened and closed and to open the flow passage of the module passing pipe 5 at an opening degree set by the control unit 10.
  • various known electromagnetic valves such as a proportional control valve can be employed.
  • the control unit 10 is electrically connected to the control valve 9. Then, the control unit 10 sets an opening degree for opening the module passing pipe 5 and opens and closes the control valve 9 so that the opening degree of the control valve 9 becomes a set opening degree. For this reason, when the control unit 10 sets the opening degree of the control valve 9, it is possible to adjust the flow rate of the liquid L flowing through the module passing pipe 5, that is, the flow rate of the liquid L supplied to the hollow fiber membrane module 2.
  • the control unit 10 sets the opening degree of the control valve 9 so that the adjustment gas addition liquid L1 (the adjustment gas saturation liquid) produced by the hollow fiber membrane module 2 is joined to the liquid L having passed through the bypassing pipe 6 to become the specific resistance value adjustment liquid L2.
  • the saturated state includes not only a completely saturated state, but a substantially saturated state.
  • the substantially saturated state means a state in which the adjustment gas G is dissolved in the liquid L to a degree that the specific resistance value of the liquid L can be adjusted only according to the distribution ratio between the flow rate of the liquid L supplied to the hollow fiber membrane module 2 and the flow rate of the liquid L bypassing the hollow fiber membrane module 2.
  • control unit 10 is also electrically connected to the first flow rate detection unit 8. Then, the control unit 10 sets the opening degree of the control valve 9 in response to the information of the first flow rate transmitted from the first flow rate detection unit 8 (the first flow rate detected by the first flow rate detection unit 8).
  • the control unit 10 sets the opening degree of the control valve 9 to be larger than a case in which the first flow rate is larger than the set flow rate.
  • the set flow rate an arbitrary flow rate can be used. For example, if the distribution ratio between the flow rate of the liquid L supplied to the hollow fiber membrane module 2 and the flow rate of the liquid L bypassing the hollow fiber membrane module 2 is changed when the opening degree of the control valve 9 if fixed, it is possible to set a flow rate at which the specific resistance value of the liquid L starts to largely increase.
  • the control unit 10 may uniformly set the opening degree of the control valve 9. However, it is desirable to increase the opening degree of the control valve 9 as the first flow rate decreases. Further, when the first flow rate is larger than the set flow rate, the control unit 10 may uniformly set the opening degree of the control valve 9. However, it is desirable to increase the opening degree of the control valve 9 as the first flow rate decreases. Furthermore, there is a case in which the opening degree of the control valve 9 is increased as the first flow rate decreases in both cases in which the first flow rate is equal to or smaller than the set flow rate and the first flow rate is larger than the set flow rate.
  • the control unit 10 sets the change rate of the opening degree of the control valve 9 with respect to the change rate of the first flow rate to be larger than a case in which the first flow rate is larger than the set flow rate.
  • control unit 10 sets the opening degree of the control valve 9
  • the control unit 10 may obtain the opening degree of the control valve 9 by a calculation instead of obtaining the opening degree of the control valve 9 from such a table.
  • the flow rate range of the first flow rate is divided into three ranges including a first flow rate range A1, a second flow rate range A2, and a third flow rate range A3.
  • the first flow rate range A1 is a flow rate range which is larger than the set flow rate.
  • the second flow rate range A2 is a flow rate range which is equal to or larger than the minimum flow rate that can be detected (guaranteed) by the first flow rate detection unit 8 and which is equal to or smaller than the set flow rate.
  • the third flow rate range A3 is a flow rate range which is smaller than the minimum flow rate that can be detected by the first flow rate detection unit 8.
  • first flow rate range A1 a relationship between the first flow rate and the opening degree of the control valve 9 is indicated by a line S1.
  • second flow rate range A2 a relationship between the first flow rate and the opening degree of the control valve 9 is indicated by a line S2.
  • third flow rate range A3 a relationship between the first flow rate and the opening degree of the control valve 9 is indicated by a line S3.
  • the line S1 is a line which is expressed by the following equation (1).
  • V ⁇ HB ⁇ x + HG
  • x indicates the first flow rate [L/min]
  • V indicates, the opening degree [%] of the control valve 9
  • HB (hereinafter, referred to as a "bias HB”) indicates a ratio of the change rate of the opening degree of the control valve 9 with respect to the change rate of the first flow rate
  • HG hereinafter, referred to as a "gain HG" indicates the opening degree of the control valve 9 when the first flow rate is set to 0 [L/min].
  • the bias HB is expressed by, for example, a ratio (Hb/Ha) of the change rate Hb of the opening degree of the control valve 9 in the entire range of the first flow rate range A1 with respect to the change rate Ha of the first flow rate in the entire range of the first flow rate range A1.
  • the bias HB and the gain HG are set as below.
  • the bias HB is set so that the opening degree of the control valve 9 increases as the first flow rate decreases.
  • the adjustment gas saturation liquid in which the adjustment gas G is dissolved in the liquid L in a saturated state as the adjustment gas addition liquid L1. Meanwhile, since the gas pressure of the adjustment gas G is uniformly kept in the hollow fiber membrane module 2, the dissolving ratio of the adjustment gas G with respect to the liquid L changes in response to the flow rate of the liquid L supplied to the hollow fiber membrane module 2.
  • the bias HB and the gain HG are set so that the adjustment gas saturation liquid is produced by the hollow fiber membrane module 2 in the entire range or the substantially entire range of the first flow rate range A1.
  • the opening degree of the control valve 9 at the time of producing the adjustment gas saturation liquid in the hollow fiber membrane module 2 is measured by a previous experiment while changing the first flow rate of the first flow rate range A1. Then, it is desirable to set the bias HB and the gain HG on the basis of the measurement result.
  • the line S2 is a line which is expressed by the following equation (2).
  • V ⁇ MB ⁇ x + MG
  • x indicates the first flow rate [L/min]
  • V indicates the opening degree [%] of the control valve 9
  • MB indicates a ratio (hereinafter, referred to as a "bias MB”) of the change rate of the opening degree of the control valve 9 with respect to the change rate of the first flow rate
  • MG hereinafter, referred to as a "gain MG" indicates the opening degree of the control valve 9 when the first flow rate is set to 0 [L/min].
  • the bias MB is expressed by, for example, a ratio (Mb/Ma) of the change rate Mb of the opening degree of the control valve 9 in the entire range of the second flow rate range A2 with respect to the change rate of the first flow rate Ma in the entire range of the second flow rate range A2.
  • the bias HB and the gain HG are set as below.
  • the bias MB and the gain MG are set so that the line S 1 is continuous to the line S2.
  • the bias MB and the gain MG are set so that the first flow rate of the second flow rate range A2 is larger than that of the first flow rate range A1, the opening degree of the control valve 9 increases as the first flow rate decreases, and the bias MB (a ratio of the change rate Mb of the opening degree of the control valve 9 with respect to the change rate of the first flow rate Ma of the second flow rate range A2) is larger than the bias HB (a ratio of the change rate Hb of the opening degree of the control valve 9 with respect to the change rate of the first flow rate Ha).
  • the opening degree of the control valve 9 at the time of producing the adjustment gas saturation liquid in the hollow fiber membrane module 2 is measured by a previous experiment while changing the first flow rate of the second flow rate range A2. Then, it is desirable to set the bias MB and the gain MG on the basis of the measurement result.
  • the line S3 is a line which is expressed by the following equation (3).
  • V LG
  • V indicates the opening degree [%] of the control valve 9 and LG indicates a value which is larger than the maximum opening degree of the control valve 9 in the second flow rate range A2. That is, in the third flow rate range A3, the first flow rate cannot be accurately detected by the first flow rate detection unit 8. Therefore, in the third flow rate range A3, from the viewpoint of preventing an error, the opening degree of the control valve 9 is fixed to an opening degree which is larger than the maximum opening degree of the control valve 9 in the second flow rate range A2.
  • the liquid L supplied to the liquid supply pipe 4 is distributed by the branch portion 13 to the liquid L supplied to the hollow fiber membrane module 2 and the liquid L bypassing the hollow fiber membrane module 2.
  • the adjustment gas G permeating the hollow fiber membrane 21 is dissolved in the liquid L so as to produce the adjustment gas addition liquid L1 in which the adjustment gas G is dissolved in the liquid L.
  • the adjustment gas addition liquid produced by the hollow fiber membrane module 2 and the liquid L bypassing the hollow fiber membrane module 2 are joined to each other at the joint portion 14 to become the specific resistance value adjustment liquid L2 and are discharged to the liquid discharge pipe 7.
  • the opening degree of the control valve 9 opening and closing the module passing pipe 5 is set in response to the first flow rate of the liquid L supplied to the liquid supply pipe 4. For this reason, it is possible to increase the flow rate of the liquid L supplied to the hollow fiber membrane module 2 by increasing the opening degree of the control valve 9 when the flow rate of the liquid L supplied to the liquid supply pipe 4 is small. That is, it is possible to suppress a change of the distribution ratio of the flow rate of the liquid L supplied to the hollow fiber membrane module 2 and the flow rate of the liquid L bypassing the hollow fiber membrane module 2 even when the flow rate of the liquid L is small. Accordingly, it is possible to suppress an increase in specific resistance value of the liquid L even when the flow rate of the liquid L is small while suppressing an increase in scale.
  • the first flow rate detection unit 8 could, in principle, detect any one of the flow rate of the liquid L flowing through the liquid supply pipe 4 and the flow rate of the specific resistance value adjustment liquid L2 flowing through the liquid discharge pipe 7 as the first flow rate (only the latter option is according to the invention).
  • the discharge side module passing pipe 5B to which the control valve 9 is attached is disposed at a position close to the liquid discharge pipe 7 in relation to the liquid supply pipe 4.
  • the first flow rate detection unit 8 detects the flow rate of the specific resistance value adjustment liquid L2 flowing through the liquid discharge pipe 7 as the first flow rate, it is possible to decrease the scale of the wiring connecting the first flow rate detection unit 8 and the control valve 9 to each other.
  • the opening degree of the control valve 9 is increased and the flow rate of the liquid L supplied to the hollow fiber membrane module 2 is increased as compared with a case in which the first flow rate is larger than the set flow rate.
  • the opening degree of the control valve 9 is increased and the flow rate of the liquid L supplied to the hollow fiber membrane module 2 is increased as the first flow rate decreases. Accordingly, even when the first flow rate is equal to or smaller than the set flow rate, it is possible to further suppress a change of a distribution ratio of the flow rate of the liquid L supplied to the hollow fiber membrane module 2 and the flow rate of the liquid L bypassing the hollow fiber membrane module 2.
  • the opening degree of the control valve 9 is increased and the flow rate of the liquid L supplied to the hollow fiber membrane module 2 is increased as the first flow rate decreases. Accordingly, even when the first flow rate is larger than the set flow rate, it is possible to suppress a change of a distribution ratio of the flow rate of the liquid L supplied to the hollow fiber membrane module 2 and the flow rate of the liquid L bypassing the hollow fiber membrane module 2.
  • a tendency that the liquid L is not easily supplied to the hollow fiber membrane module 2 as the first flow rate decreases increases as the first flow rate is equal to or smaller than the set flow rate. Therefore, when the first flow rate is equal to or smaller than the set flow rate, a ratio of the change rate of the opening degree of the control valve 9 with respect to the change rate of the first flow rate is increased as compared with a case in which the first flow rate is larger than the set flow rate. Accordingly, it is possible to further suppress a change of a distribution ratio of the flow rate of the liquid L supplied to the hollow fiber membrane module 2 and the flow rate of the liquid L bypassing the hollow fiber membrane module 2.
  • the adjustment gas saturation liquid in which the adjustment gas G is dissolved in the liquid L in a saturated state is produced as the adjustment gas addition liquid L1 by the hollow fiber membrane module 2. Accordingly, it is possible to highly accurately adjust the specific resistance value of the liquid L just by adjusting a distribution ratio of the flow rate of the liquid L supplied to the hollow fiber membrane module 2 and the flow rate of the liquid L bypassing the hollow fiber membrane module 2.
  • the second embodiment is basically the same as the first embodiment and is different from the first embodiment only in that a second flow rate detection unit is newly provided in a specific resistance value adjustment apparatus. For this reason, hereinafter, only points different from the first embodiment will be described and the same points as those of the first embodiment will not be described.
  • FIG. 3 is a schematic diagram of a specific resistance value adjustment apparatus of a second embodiment.
  • a specific resistance value adjustment apparatus 1A of the embodiment includes a hollow fiber membrane module 2, a gas supply pipe 3, a liquid supply pipe 4, a module passing pipe 5, a bypassing pipe 6, a liquid discharge pipe 7, a first flow rate detection unit 8, a control valve 9, a control unit 10, and a second flow rate detection unit 8A.
  • the second flow rate detection unit 8A detects a flow rate of a liquid flowing through the module passing pipe 5 as a second flow rate.
  • the flow rate of the liquid L flowing through the supply side module passing pipe 5A is the same as the flow rate of the adjustment gas addition liquid L1 flowing through the discharge side module passing pipe 5B.
  • the second flow rate detection unit 8A may detect any one of the flow rate of the liquid L flowing through the supply side module passing pipe 5A and the flow rate of the adjustment gas addition liquid L1 flowing through the discharge side module passing pipe 5B as the second flow rate.
  • the second flow rate detection unit 8A to the discharge side module passing pipe 5B to detect the flow rate of the adjustment gas addition liquid L1 flowing through the discharge side module passing pipe 5B.
  • the second flow rate detection unit 8A transmits the information of the detected second flow rate to the control unit 10.
  • various known flowmeters can be employed as the second flow rate detection unit 8A.
  • the control unit 10 is electrically connected to the second flow rate detection unit 8A. Then, the control unit 10 corrects the set opening degree of the control valve 9 in response to the information of the second flow rate transmitted from the second flow rate detection unit 8A (the second flow rate detected by the second flow rate detection unit 8A). That is, when the control unit 10 sets the opening degree of the control valve 9 in response to the first flow rate, a specific flow rate of the liquid L corresponding to the opening degree of the control valve 9 flows through the module passing pipe 5. However, actually, there is a case in which the flow rate of the liquid L flowing through the module passing pipe 5 deviates from the specific flow rate corresponding to the opening degree of the control valve 9 due to a change in time or the like of the hollow fiber membrane module 2.
  • control unit 10 first sets the opening degree of the control valve 9 in response to the first flow rate. Then, the control unit 10 corrects the opening degree of the control valve 9 in response to the second flow rate so that the flow rate of the liquid L flowing through the module passing pipe 5 does not deviate from the specific flow rate corresponding to the opening degree of the control valve 9.
  • the opening degree of the control valve 9 is set in response to the first flow rate of the liquid L supplied to the liquid supply pipe 4 and the opening degree of the control valve 9 is corrected in response to the second flow rate of the liquid flowing through the module passing pipe 5, it is possible to further suppress a change of a distribution ratio of the flow rate of the liquid L supplied to the hollow fiber membrane module 2 and the flow rate of the liquid L bypassing the hollow fiber membrane module 2 even when the flow rate of the liquid L supplied to the liquid supply pipe 4 is small.
  • Example 1 the specific resistance value adjustment apparatus 1 of the first embodiment illustrated in FIG. 1 was used.
  • ultrapure water having a specific resistance value of 18.2 [M ⁇ cm] at 25 [°C] was used as the liquid L supplied to the liquid supply pipe 4.
  • the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed from 1 to 15 [L/min].
  • a flow rate maintaining time for maintaining a constant flow rate was set to 30 seconds and the flow rate was changed gradually.
  • the water pressure of the ultrapure water supplied to the liquid supply pipe 4 was set to 0.2 [MPa].
  • a carbonic acid gas was used as the adjustment gas G supplied to the gas supply pipe 3.
  • a carbonic acid gas supply source a carbonic acid gas cylinder of 7 [m 3 ] was used.
  • a pressure adjustment valve 11 a two-stage pressure regulator and a pressure regulating valve were used and a gas pressure of a carbonic acid gas supplied to the gas phase side area of the hollow fiber membrane module 2 was set to 0.1 [MPa].
  • the hollow fiber membranes 21 formed of poly-4-methylpentene-1 and having an inner diameter of 200 [ ⁇ m] and an outer diameter of 250 [ ⁇ m] were bundled and both ends of the bundle of the hollow fiber membranes 21 were consolidated with resin inside the housing 22 formed of PP resin, thereby obtaining an external perfusion type hollow fiber module (SEPAREL PF-001L manufactured by DIC Corporation) for supplying a gas having a membrane area of 0.5 [m 2 ].
  • a carbonic acid gas permeation speed of the hollow fiber membrane 21 was 3.5 ⁇ 10 -5 [cm 3 /cm 2 ⁇ sec ⁇ cmHg].
  • ultrapure water was supplied to the liquid supply pipe 4 and a carbonic acid gas was supplied to the gas supply pipe 3.
  • the ultrapure water supplied to the liquid supply pipe 4 was distributed by the branch portion 13 to a relatively small flow rate of flow supplied from the supply side module passing pipe 5A to the liquid phase side area of the hollow fiber membrane module 2 and a relatively large flow rate of flow bypassing the hollow fiber membrane module 2 and supplied to the bypassing pipe 6.
  • the carbonic acid gas supplied to the gas supply pipe 3 was adjusted to 0.1 [MPa] by the pressure adjustment valve 11 and was supplied to the gas phase side area of the hollow fiber membrane module 2.
  • the carbonic acid gas addition ultrapure water discharged from the hollow fiber membrane module 2 to the discharge side module passing pipe 5B and the ultrapure water flowing through the bypassing pipe 6 were joined to each other by the joint portion 14 to become a specific resistance value adjustment ultrapure water as a target. Then, the specific resistance value adjustment ultrapure water was discharged to the liquid discharge pipe 7.
  • the opening degree of the control valve 9 was set by the control unit 10 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.7 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] and the flow rate of the carbonic acid gas addition ultrapure water flowing through the discharge side module passing pipe 5B was adjusted. Then, the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was gradually decreased, the opening degree of the control valve 9 was adjusted in response to the first flow rate, and the specific resistance value of the specific resistance value adjustment ultrapure water at each flow rate was measured.
  • Example 2 the specific resistance value adjustment apparatus 1 of the first embodiment illustrated in FIG. 1 was used similarly to Example 1.
  • the opening degree of the control valve 9 was set by the control unit 10 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.5 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] and the flow rate of the carbonic acid gas addition ultrapure water flowing through the discharge side module passing pipe 5B was adjusted.
  • the other conditions were the same as those of Example 1. Then, the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was gradually decreased, the opening degree of the control valve 9 was adjusted in response to the first flow rate, and the specific resistance value of the specific resistance value adjustment ultrapure water at each flow rate was measured.
  • Example 3 the specific resistance value adjustment apparatus 1 of the first embodiment illustrated in FIG. 1 was used similarly to Example 1.
  • the opening degree of the control valve 9 was set by the control unit 10 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.3 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] and the flow rate of the carbonic acid gas addition ultrapure water flowing through the discharge side module passing pipe 5B was adjusted.
  • the other conditions were the same as those of Example 1. Then, the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was gradually decreased, the opening degree of the control valve 9 was adjusted in response to the first flow rate, and the specific resistance value of the specific resistance value adjustment ultrapure water at each flow rate was measured.
  • Comparative Example 1 the specific resistance value adjustment apparatus 31 illustrated in FIG. 4 was used.
  • the specific resistance value adjustment apparatus 31 is basically the same as the specific resistance value adjustment apparatus 1 (see FIG. 1 ) and is different from the specific resistance value adjustment apparatus 1 only in that a flow rate adjustment valve 32 is provided instead of the first flow rate detection unit 8, the control valve 9, and the control unit 10.
  • the flow rate adjustment valve 32 is a flow rate adjustment valve which opens and closes the flow passage of the supply side module passing pipe 5A and manually adjusts the opening degree. For this reason, the flow rate adjustment valve 32 manually adjusts the flow rate of the liquid L flowing through the supply side module passing pipe 5A.
  • the flow rate of the ultrapure water flowing through the supply side module passing pipe 5A was adjusted by the flow rate adjustment valve 32 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.7 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] similarly to Example 1.
  • the other conditions were the same as those of Example 1.
  • the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was gradually decreased and the specific resistance value of the specific resistance value adjustment ultrapure water at each flow rate was measured.
  • Comparative Example 2 the specific resistance value adjustment apparatus 31 illustrated in FIG. 4 was used similarly to Comparative Example 1.
  • the flow rate of the ultrapure water flowing through the supply side module passing pipe 5A was adjusted by the flow rate adjustment valve 32 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.5 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min].
  • the other conditions were the same as those of Example 1. Then, the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was gradually decreased and the specific resistance value of the specific resistance value adjustment ultrapure water at each flow rate was measured.
  • Comparative Example 3 the specific resistance value adjustment apparatus 31 illustrated in FIG. 4 was used similarly to Comparative Example 1.
  • the flow rate of the ultrapure water flowing through the supply side module passing pipe 5A was adjusted by the flow rate adjustment valve 32 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.3 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min].
  • the other conditions were the same as those of Example 1. Then, the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was gradually decreased and the specific resistance value of the specific resistance value adjustment ultrapure water at each flow rate was measured.
  • FIG. 5 shows measurement results of Example 1 and Comparative Example 1
  • FIG. 6 shows measurement results of Example 2 and Comparative Example 2
  • FIG. 7 shows measurement results of Example 3 and Comparative Example 3.
  • a horizontal axis indicates the flow rate of the ultrapure water supplied to the liquid supply pipe 4 and a vertical axis indicates the specific resistance value of the specific resistance value adjustment ultrapure water.
  • Example 4 the specific resistance value adjustment apparatus 1 of the first embodiment illustrated in FIG. 1 was used similarly to Example 1.
  • the opening degree of the control valve 9 was set by the control unit 10 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.7 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] and hence the flow rate of the carbonic acid gas addition ultrapure water flowing through the discharge side module passing pipe 5B was adjusted.
  • the other conditions were the same as those of Example 1.
  • the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed between 15 [L/min] and 1 [L/min] at the interval of 3 minutes and a change in specific resistance value of the specific resistance value adjustment ultrapure water with time was measured.
  • Example 5 the specific resistance value adjustment apparatus 1 of the first embodiment illustrated in FIG. 1 was used similarly to Example 1.
  • the opening degree of the control valve 9 was set by the control unit 10 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.5 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] and hence the flow rate of the carbonic acid gas addition ultrapure water flowing through the discharge side module passing pipe 5B was adjusted.
  • the other conditions were the same as those of Example 1.
  • the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed between 15 [L/min] and 1 [L/min] at the interval of 3 minutes and a change in specific resistance value of the specific resistance value adjustment ultrapure water with time was measured.
  • Example 6 the specific resistance value adjustment apparatus 1 of the first embodiment illustrated in FIG. 1 was used similarly to Example 1.
  • the opening degree of the control valve 9 was set by the control unit 10 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.3 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] and hence the flow rate of the carbonic acid gas addition ultrapure water flowing through the discharge side module passing pipe 5B was adjusted.
  • the other conditions were the same as those of Example 1.
  • the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed between 15 [L/min] and 1 [L/min] at the interval of 3 minutes and a change in specific resistance value of the specific resistance value adjustment ultrapure water with time was measured.
  • Comparative Example 4 the specific resistance value adjustment apparatus 31 illustrated in FIG. 4 was used similarly to Comparative Example 1.
  • the flow rate of the ultrapure water flowing through the supply side module passing pipe 5A was adjusted by the flow rate adjustment valve 32 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.7 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] similarly to Example 4.
  • the other conditions were the same as those of Example 1.
  • the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed between 15 [L/min] and 1 [L/min] at the interval of 3 minutes and a change in specific resistance value of the specific resistance value adjustment ultrapure water with time was measured.
  • Comparative Example 5 the specific resistance value adjustment apparatus 31 illustrated in FIG. 4 was used similarly to Comparative Example 1.
  • the flow rate of the ultrapure water flowing through the supply side module passing pipe 5A was adjusted by the flow rate adjustment valve 32 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.5 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] similarly to Example 5.
  • the other conditions were the same as those of Example 1.
  • the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed between 15 [L/min] and 1 [L/min] at the interval of 3 minutes and a change in specific resistance value of the specific resistance value adjustment ultrapure water with time was measured.
  • Comparative Example 6 the specific resistance value adjustment apparatus 31 illustrated in FIG. 4 was used similarly to Comparative Example 1.
  • the flow rate of the ultrapure water flowing through the supply side module passing pipe 5A was adjusted by the flow rate adjustment valve 32 so that the specific resistance value of the specific resistance value adjustment ultrapure water became 0.3 [M ⁇ cm] when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was 15 [L/min] similarly to Example 6.
  • the other conditions were the same as those of Example 1.
  • the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed between 15 [L/min] and 1 [L/min] at the interval of 3 minutes and a change in specific resistance value of the specific resistance value adjustment ultrapure water with time was measured.
  • FIG. 8 shows a measurement result of Example 4
  • FIG. 9 shows a measurement result of Comparative Example 4
  • FIG. 10 shows a measurement result of Example 5
  • FIG. 11 shows a measurement result of Comparative Example 5
  • FIG. 12 shows a measurement result of Example 6,
  • FIG. 13 shows a measurement result of Comparative Example 6.
  • FIGS. 8(a) , 9(a) , 10(a) , 11(a) , 12(a) , and 13(a) show a relationship between an elapse time and a specific resistance value.
  • FIGS. 8(b) , 9(b) , 10(a) , 11(a) , 12(a) , and 13(a) show a relationship between an elapse time and a flow rate.
  • a horizontal axis indicates the elapse time from the start of the measurement and a vertical axis indicates the flow rate of the ultrapure water supplied to the liquid supply pipe 4.
  • the specific resistance value substantially did not increase even when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed from 15 [L/min] to 1 [L/min]. Meanwhile, when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed from 1 [L/min] to 15 [L/min], the specific resistance value increased. However, this increase degree was very small as compared with an increase degree of the specific resistance value when the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed from 15 [L/min] to 1 [L/min] in Comparative Examples 4 to 6. Further, the specific resistance value was stabilized in a short time after the flow rate of the ultrapure water supplied to the liquid supply pipe 4 was changed from 1 [L/min] to 15 [L/min].

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Claims (10)

  1. Vorrichtung (1) zur Einstellung des spezifischen Widerstandswerts, die Folgendes umfasst:
    ein Hohlfasermembranmodul (2) mit einer Konfiguration, bei der ein reinstwasserphasenseitiger Bereich, dem ein Reinstwasser (L) zugeführt wird, und ein gasphasenseitiger Bereich, dem ein Einstellgas (G) zur Einstellung eines spezifischen Widerstandswerts des Reinstwassers (L) zugeführt wird, durch eine Hohlfasermembran (21) geteilt ist und das die Hohlfasermembran (21) durchdringende Einstellgas (G) in dem Reinstwasser (L) gelöst ist, um eine Einstellgaszugabeflüssigkeit (L1) zu erzeugen, in der das Einstellgas (G) in dem Reinstwasser (L) gelöst ist;
    ein Gaszufuhrrohr (3), das dem Hohlfasermembranmodul (2) das Einstellgas (G) zuführt;
    ein Flüssigkeitszufuhrrohr (4), dem das Reinstwasser (L) zugeführt wird;
    ein Moduldurchgangsrohr (5), das mit dem Flüssigkeitszufuhrrohr (4) über einen Verzweigungsabschnitt (13), der das Flüssigkeitszufuhrrohr (4) abzweigt, in Verbindung steht und durch das Hohlfasermembranmodul (2) verläuft;
    ein Bypassrohr (6), das mit dem Flüssigkeitszufuhrrohr (4) durch den Verzweigungsabschnitt (13) verbunden ist und das Hohlfasermembranmodul (2) umgeht;
    ein Flüssigkeitsabflussrohr (7), das mit dem Moduldurchgangsrohr (5) und dem Bypassrohr (6) über einen Verbindungsabschnitt (14) in Verbindung steht, in dem das Moduldurchgangsrohr (5) und das Bypassrohr (6) an einer stromabwärtigen Seite des Hohlfasermembranmoduls (2) miteinander verbunden sind; und
    ein Steuerventil (9), das das Moduldurchgangsrohr (5) öffnet und schließt;
    wobei das Moduldurchgangsrohr (5) ein zufuhrseitiges Moduldurchgangsrohr (5A), das an einer stromaufwärtigen Seite des Hohlfasermembranmoduls (2) angeordnet ist und dem Hohlfasermembranmodul (2) das Reinstwasser (L) zuführt, und ein abfuhrseitiges Moduldurchgangsrohr (5B), das an einer stromabwärtigen Seite des Hohlfasermembranmoduls (2) angeordnet ist und die Einstellgaszugabeflüssigkeit (L1) aus dem Hohlfasermembranmodul (2) abführt, umfasst,
    wobei das Steuerventil (9) an dem abfuhrseitigen Moduldurchgangsrohr (5B) angebracht ist und das abfuhrseitige Moduldurchgangsrohr (5B) öffnet und schließt, und
    dadurch gekennzeichnet, dass die Vorrichtung (1) zur Einstellung des spezifischen Widerstandswerts weiterhin umfasst:
    eine Steuereinheit (10), die so konfiguriert ist, dass sie einen Öffnungsgrad des Steuerventils (9) in Reaktion auf eine erste Durchflussrate einstellt, die von einer ersten Durchflussraten-Erfassungseinheit (8) erfasst wird;
    wobei die erste Durchflussraten-Erfassungseinheit (8) eine Durchflussrate des durch das Flüssigkeitsabflussrohr (7) fließenden Reinstwassers (L) erfasst.
  2. Vorrichtung (1) zur Einstellung des spezifischen Widerstandswerts nach Anspruch 1, die ferner umfasst:
    eine zweite Durchflussraten-Erfassungseinheit (8A), die eine zweite Durchflussrate des durch das Moduldurchgangsrohr (5) fließenden Reinstwassers (L) erfasst,
    wobei die Steuereinheit (10) so konfiguriert ist, dass sie den Öffnungsgrad in Reaktion auf die zweite Durchflussrate korrigiert, die von der zweiten Durchflussraten-Erfassungseinheit (8A) erfasst wird.
  3. Vorrichtung (1) zur Einstellung des spezifischen Widerstandswerts nach einem der Ansprüche 1 oder 2,
    wobei die Vorrichtung (1) so konfiguriert ist, dass, wenn die erste Durchflussrate gleich oder kleiner als eine eingestellte Durchflussrate ist, die Steuereinheit (10) den Öffnungsgrad im Vergleich zu einem Fall erhöht, in dem die erste Durchflussrate größer als die eingestellte Durchflussrate ist.
  4. Vorrichtung (1) zur Einstellung des spezifischen Widerstandswerts nach Anspruch 3,
    wobei die Vorrichtung (1) so konfiguriert ist, dass, wenn die erste Durchflussrate gleich oder kleiner als die eingestellte Durchflussrate ist, die Steuereinheit (10) den Öffnungsgrad erhöht, wenn die erste Durchflussrate abnimmt.
  5. Vorrichtung (1) zur Einstellung des spezifischen Widerstandswerts nach Anspruch 4,
    wobei die Vorrichtung (1) so konfiguriert ist, dass, wenn die erste Durchflussrate größer als die eingestellte Durchflussrate ist, die Steuereinheit (10) den Öffnungsgrad erhöht, wenn die erste Durchflussrate abnimmt.
  6. Vorrichtung (1) zur Einstellung des spezifischen Widerstandswerts nach Anspruch 5,
    wobei die Vorrichtung (1) so konfiguriert ist, dass, wenn die erste Durchflussrate gleich oder kleiner als die eingestellte Durchflussrate ist, die Steuereinheit (10) ein Verhältnis einer Änderungsrate des Öffnungsgrads in Bezug auf eine Änderungsrate der ersten Durchflussrate im Vergleich zu einem Fall erhöht, in dem die erste Durchflussrate größer als die eingestellte Durchflussrate ist.
  7. Verfahren zur Einstellung des spezifischen Widerstandswerts unter Verwendung der Vorrichtung (1) zur Einstellung des spezifischen Widerstandswerts nach Anspruch 1, umfassend:
    Zuführung des Reinstwassers (L) zu einem Flüssigkeitszufuhrrohr (4);
    Verteilen des Reinstwassers (L), das dem Flüssigkeitszufuhrrohr (4) zugeführt wird, auf ein Moduldurchgangsrohr (5), das durch das Hohlfasermembranmodul (2) führt, und ein Bypassrohr (6), das das Hohlfasermembranmodul (2) umgeht;
    Herstellen der Einstellgaszugabeflüssigkeit (L1), in der das Einstellgas (G) in dem Reinstwasser (L) in einem gesättigten Zustand in dem Hohlfasermembranmodul (2) gelöst ist, durch Zuführen des Einstellgases (G) zu dem Hohlfasermembranmodul (2); und
    Verbinden der vom Hohlfasermembranmodul (2) erzeugten Einstellgaszugabeflüssigkeit (L1) mit dem Reinstwasser (L), das am Hohlfasermembranmodul (2) vorbeifließt, und Abführen einer resultierenden Flüssigkeit (L2) zu einem Flüssigkeitsabflussrohr (7);
    dadurch gekennzeichnet, dass das Verfahren zur Einstellung des spezifischen Widerstandswerts ferner Folgendes umfasst:
    Einstellen eines Öffnungsgrades eines Steuerventils (9), das das Moduldurchgangsrohr (5) in Abhängigkeit von einer ersten Durchflussrate des durch das Flüssigkeitsabflussrohr (7) fließenden Reinstwassers (L) öffnet und schließt.
  8. Verfahren zur Einstellung des spezifischen Widerstandswerts nach Anspruch 7,
    wobei, wenn die erste Durchflussrate gleich oder kleiner als eine eingestellte Durchflussrate ist, der Öffnungsgrad im Vergleich zu einem Fall, in dem die erste Durchflussrate größer als die eingestellte Durchflussrate ist, erhöht wird.
  9. Verfahren zur Einstellung des spezifischen Widerstandswerts nach Anspruch 7 oder 8,
    wobei eine zweite Durchflussrate des durch das Moduldurchgangsrohr (5) fließenden Reinstwassers (L) erfasst wird und der Öffnungsgrad in Abhängigkeit von der zweiten Durchflussrate korrigiert wird.
  10. Verfahren zur Einstellung des spezifischen Widerstandswerts nach einem der Ansprüche 7 bis 9,
    wobei, wenn die erste Durchflussrate gleich oder kleiner als die eingestellte Durchflussrate ist, der Öffnungsgrad im Vergleich zu einem Fall, in dem die erste Durchflussrate größer als die eingestellte Durchflussrate ist, erhöht wird, der Öffnungsgrad erhöht wird, wenn die erste Durchflussrate abnimmt, und ein Verhältnis einer Änderungsrate des Öffnungsgrads in Bezug auf eine Änderungsrate der ersten Durchflussrate im Vergleich zu einem Fall, in dem die erste Durchflussrate größer als die eingestellte Durchflussrate ist, erhöht wird, und
    wobei, wenn die erste Durchflussrate größer als die eingestellte Durchflussrate ist, der Öffnungsgrad erhöht wird, wenn die erste Durchflussrate abnimmt.
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CN110095169A (zh) * 2019-04-21 2019-08-06 优艾特仪表科技成都有限公司 一种超声波水表校验装置及校验方法
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TW202302215A (zh) * 2021-07-01 2023-01-16 日商Ｄｉｃ股份有限公司 比電阻值調整裝置以及比電阻值調整方法
CN118541333A (zh) * 2021-12-14 2024-08-23 Mks仪器公司 溶解氨输送系统及使用方法
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KR102367698B1 (ko) 2022-02-28
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EP3498366A4 (de) 2020-01-15
US20190224633A1 (en) 2019-07-25
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US11542185B2 (en) 2023-01-03
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EP3498366A1 (de) 2019-06-19
KR20190028474A (ko) 2019-03-18

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