EP3465182A4 - Verfahren und vorrichtung zur röntgenmikroskopie - Google Patents

Verfahren und vorrichtung zur röntgenmikroskopie Download PDF

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Publication number
EP3465182A4
EP3465182A4 EP17810765.2A EP17810765A EP3465182A4 EP 3465182 A4 EP3465182 A4 EP 3465182A4 EP 17810765 A EP17810765 A EP 17810765A EP 3465182 A4 EP3465182 A4 EP 3465182A4
Authority
EP
European Patent Office
Prior art keywords
ray microscopy
microscopy
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP17810765.2A
Other languages
English (en)
French (fr)
Other versions
EP3465182A1 (de
Inventor
Wenbing Yun
Sylvia Jia Yun Lewis
Janos KIRZ
Srivatsan Seshadri
Alan Francis Lyon
David Vine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sigray Inc
Original Assignee
Sigray Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US15/173,711 external-priority patent/US10401309B2/en
Priority claimed from US15/605,957 external-priority patent/US10352880B2/en
Application filed by Sigray Inc filed Critical Sigray Inc
Publication of EP3465182A1 publication Critical patent/EP3465182A1/de
Publication of EP3465182A4 publication Critical patent/EP3465182A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/041—Phase-contrast imaging, e.g. using grating interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
    • G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/044—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using laminography or tomosynthesis
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
    • G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
EP17810765.2A 2016-06-05 2017-06-02 Verfahren und vorrichtung zur röntgenmikroskopie Withdrawn EP3465182A4 (de)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US15/173,711 US10401309B2 (en) 2014-05-15 2016-06-05 X-ray techniques using structured illumination
US201662401164P 2016-09-28 2016-09-28
US201662429587P 2016-12-02 2016-12-02
US201662429760P 2016-12-03 2016-12-03
US201762485916P 2017-04-15 2017-04-15
US15/605,957 US10352880B2 (en) 2015-04-29 2017-05-26 Method and apparatus for x-ray microscopy
PCT/US2017/035800 WO2017213996A1 (en) 2016-06-05 2017-06-02 Method and apparatus for x-ray microscopy

Publications (2)

Publication Number Publication Date
EP3465182A1 EP3465182A1 (de) 2019-04-10
EP3465182A4 true EP3465182A4 (de) 2020-03-18

Family

ID=60578901

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17810765.2A Withdrawn EP3465182A4 (de) 2016-06-05 2017-06-02 Verfahren und vorrichtung zur röntgenmikroskopie

Country Status (5)

Country Link
EP (1) EP3465182A4 (de)
JP (1) JP6775035B2 (de)
KR (1) KR20190015531A (de)
CN (1) CN109564176A (de)
WO (1) WO2017213996A1 (de)

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US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US10416099B2 (en) 2013-09-19 2019-09-17 Sigray, Inc. Method of performing X-ray spectroscopy and X-ray absorption spectrometer system
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
US11576249B2 (en) 2018-05-25 2023-02-07 Micro-X Limited Device for applying beamforming signal processing to RF modulated X-rays
WO2019236384A1 (en) 2018-06-04 2019-12-12 Sigray, Inc. Wavelength dispersive x-ray spectrometer
JP7117452B2 (ja) 2018-07-26 2022-08-12 シグレイ、インコーポレイテッド 高輝度反射型ｘ線源
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
WO2020051061A1 (en) 2018-09-04 2020-03-12 Sigray, Inc. System and method for x-ray fluorescence with filtering
DE112019004478T5 (de) 2018-09-07 2021-07-08 Sigray, Inc. System und verfahren zur röntgenanalyse mit wählbarer tiefe
JP7225432B2 (ja) * 2019-04-18 2023-02-20 プリズマティック、センサーズ、アクチボラグ 医療用透過ｘ線撮影におけるｘ線の操作に使用されるインラインｘ線集束光学系
US11733182B2 (en) * 2019-12-20 2023-08-22 Varex Imaging Corporation Radiographic inspection system for pipes and other structures using radioisotopes
CN111221025B (zh) * 2020-01-21 2021-08-24 中国工程物理研究院流体物理研究所 一种用丝阵作为阴极的探测器及使用方法及标定方法
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
JP7395775B2 (ja) 2020-05-18 2023-12-11 シグレイ、インコーポレイテッド 結晶解析装置及び複数の検出器素子を使用するｘ線吸収分光法のためのシステム及び方法
DE112021004828T5 (de) 2020-09-17 2023-08-03 Sigray, Inc. System und verfahren unter verwendung von röntgenstrahlen für tiefenauflösende messtechnik und analyse
US11686692B2 (en) 2020-12-07 2023-06-27 Sigray, Inc. High throughput 3D x-ray imaging system using a transmission x-ray source
CN112268914B (zh) * 2020-12-07 2021-04-30 西安稀有金属材料研究院有限公司 一种全尺寸核燃料包壳管元件耐事故涂层的无损检测方法
US11992350B2 (en) 2022-03-15 2024-05-28 Sigray, Inc. System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector
US11885755B2 (en) 2022-05-02 2024-01-30 Sigray, Inc. X-ray sequential array wavelength dispersive spectrometer

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100260315A1 (en) * 2009-04-10 2010-10-14 Canon Kabushiki Kaisha Source grating for talbot-lau-type interferometer
US20150117599A1 (en) * 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
WO2015168473A1 (en) * 2014-05-01 2015-11-05 Sigray, Inc. X-ray interferometric imaging system
WO2015176023A1 (en) * 2014-05-15 2015-11-19 Sigray, Inc. X-ray method for measurement, characterization, and analysis of periodic structures

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US7103138B2 (en) * 2004-08-24 2006-09-05 The Board Of Trustees Of The Leland Stanford Junior University Sampling in volumetric computed tomography
WO2007122770A1 (ja) * 2006-04-13 2007-11-01 Shimadzu Corporation 透過ｘ線を用いた三次元定量方法
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JP6036321B2 (ja) * 2012-03-23 2016-11-30 株式会社リガク Ｘ線複合装置
US9129715B2 (en) * 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope
JP2015072263A (ja) * 2013-09-09 2015-04-16 キヤノン株式会社 Ｘ線撮像システム
US9449781B2 (en) * 2013-12-05 2016-09-20 Sigray, Inc. X-ray illuminators with high flux and high flux density
US9390881B2 (en) * 2013-09-19 2016-07-12 Sigray, Inc. X-ray sources using linear accumulation
US9719947B2 (en) * 2013-10-31 2017-08-01 Sigray, Inc. X-ray interferometric imaging system
US9874531B2 (en) * 2013-10-31 2018-01-23 Sigray, Inc. X-ray method for the measurement, characterization, and analysis of periodic structures
US9594036B2 (en) * 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9632040B2 (en) * 2014-05-09 2017-04-25 The Johns Hopkins University System and method for phase-contrast X-ray imaging using a multi-sector source grating

Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
US20100260315A1 (en) * 2009-04-10 2010-10-14 Canon Kabushiki Kaisha Source grating for talbot-lau-type interferometer
US20150117599A1 (en) * 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
WO2015168473A1 (en) * 2014-05-01 2015-11-05 Sigray, Inc. X-ray interferometric imaging system
WO2015176023A1 (en) * 2014-05-15 2015-11-19 Sigray, Inc. X-ray method for measurement, characterization, and analysis of periodic structures

Non-Patent Citations (1)

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Title
See also references of WO2017213996A1 *

Also Published As

Publication number Publication date
JP6775035B2 (ja) 2020-10-28
JP2019523871A (ja) 2019-08-29
WO2017213996A1 (en) 2017-12-14
EP3465182A1 (de) 2019-04-10
CN109564176A (zh) 2019-04-02
KR20190015531A (ko) 2019-02-13

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