EP3416001B1 - Herstellungsverfahren eines oszillators mit flexiblem zapfen - Google Patents

Herstellungsverfahren eines oszillators mit flexiblem zapfen Download PDF

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Publication number
EP3416001B1
EP3416001B1 EP17175750.3A EP17175750A EP3416001B1 EP 3416001 B1 EP3416001 B1 EP 3416001B1 EP 17175750 A EP17175750 A EP 17175750A EP 3416001 B1 EP3416001 B1 EP 3416001B1
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EP
European Patent Office
Prior art keywords
oscillator
flexible pivot
pivot
flexible
felloe
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EP17175750.3A
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English (en)
French (fr)
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EP3416001A1 (de
Inventor
Frédéric Maier
Jean-Luc Bucaille
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Patek Philippe SA Geneve
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Patek Philippe SA Geneve
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    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D7/00—Measuring, counting, calibrating, testing or regulating apparatus
    • G04D7/08—Measuring, counting, calibrating, testing or regulating apparatus for balance wheels
    • G04D7/082—Measuring, counting, calibrating, testing or regulating apparatus for balance wheels for balancing
    • G04D7/088—Measuring, counting, calibrating, testing or regulating apparatus for balance wheels for balancing by loading the balance wheel itself with material
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/045—Oscillators acting by spring tension with oscillating blade springs
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D7/00—Measuring, counting, calibrating, testing or regulating apparatus
    • G04D7/08—Measuring, counting, calibrating, testing or regulating apparatus for balance wheels
    • G04D7/082—Measuring, counting, calibrating, testing or regulating apparatus for balance wheels for balancing
    • G04D7/085—Measuring, counting, calibrating, testing or regulating apparatus for balance wheels for balancing by removing material from the balance wheel itself

Definitions

  • the present invention relates to the manufacture of an oscillator with a flexible pivot, in particular an oscillator intended to serve as a time base in a watch movement.
  • Flexible pivot oscillators for watchmaking have been described in documents EP 2911012 , EP 2998800 , EP 3037893 , EP 3035127 , EP 2990885 , WO 2012/010408 , WO 2016/096677 and WO 2017/055983 . They include a support, making it possible to fix the oscillator on a fixed or mobile frame, a flexible pivot and a serge suspended from the support by the flexible pivot.
  • the flexible pivot consists of elastic blades arranged to guide the rim in rotation with respect to the support and elastically return the rim to a rest position.
  • an adjustment of the oscillation frequency can be carried out at the level of the elastic blades by heat treatment or ablation of material using a laser beam, and at the level of the inertia of the serge by ablation material also with a laser.
  • the object of the present invention is to remedy or at least attenuate this drawback by proposing a method of manufacturing an oscillator with a flexible pivot whose dimensions are sufficiently precise not to require reworking.
  • the invention relates to an oscillator 1 with a flexible pivot.
  • the oscillator 1 comprises a support or fixing part 2, making it possible to fix the oscillator 1 to a fixed or mobile frame of a watch movement.
  • the support 2 can be in one part, as shown, or in two separate parts as described in the patent application WO 2017/055983 .
  • Oscillator 1 also includes a rim 3 suspended from support 2 by a flexible pivot 4.
  • the flexible pivot 4 consists of elastic blades 4a, 4b, two in number in the example shown. Each elastic blade 4a, 4b connects the support 2 to the rim 3. In the example shown, the elastic blades 4a, 4b intersect at a point O. They can intersect without contact, the two blades 4a, 4b extending then in two different parallel planes, or intersect with contact, the two blades 4a, 4b then extending in the same plane.
  • the first case, corresponding to a flexible pivot of the “separate crossed blades” type is preferred to the second (“non-separated crossed blades”) because it allows a greater angular travel of the rim 3 with respect to the support 2.
  • the flexible pivot 4 could be of the type with a remote center of rotation called “RCC” (Remote Center Compliance).
  • the flexible pivot 4 defines a virtual axis of rotation typically passing through the center of the rim 3 and around which the rim 3 pivots relative to the support 2.
  • the flexible pivot 4 thus guides the oscillations of the rim 3 by report to support 2. It also produces an elastic return torque as soon as rim 3 deviates from a rest position.
  • Serge 3 is typically in the form of a continuous ring, as shown, but it can alternatively be interrupted.
  • I m . r 2
  • the oscillator 1 is formed but in dimensions which are different from the dimensions necessary to obtain a predetermined oscillation frequency of the rim 3 with respect to the support 2.
  • step E1 either all the dimensions (in particular height h, thickness e and length L of the strips 4a, 4b, height and thickness of the serge 3) are different from the dimensions making it possible to obtain the predetermined oscillation frequency, or only part of these dimensions are different from the dimensions making it possible to obtain the predetermined oscillation frequency.
  • Step E1 is preferably carried out by etching a wafer of material. Several oscillators can be made simultaneously on the same wafer. Etching can be deep reactive ion etching (DRIE), chemical etching, focused ion beam (FIB) etching or laser etching, for example. According to the invention, the material is based on silicon.
  • DRIE deep reactive ion etching
  • FIB focused ion beam
  • laser etching for example.
  • the material is based on silicon.
  • the silicon-based material is monocrystalline silicon whatever its crystalline orientation, doped monocrystalline silicon whatever its crystalline orientation, amorphous silicon, porous silicon, polycrystalline silicon, silicon nitride, silicon, quartz regardless of its crystalline orientation or silicon oxide.
  • Oscillator 1 formed in step E1 is typically one-piece. It can nevertheless be in several superposed and assembled parts, as described in the patent application EP 2998800 .
  • step E2 the frequency of the oscillator formed in step E1 is measured by measurement means conventionally used in watchmaking. The measurement can be performed while the oscillator is still attached to its etching wafer or on the oscillator previously detached from the wafer, on all or on a sample of the oscillators still attached to the wafer or previously detached from the wafer .
  • Step E2 may consist in determining an average frequency of a representative sample or of all the oscillators formed on the same wafer.
  • the frequency f can be increased by increasing the stiffness K of the flexible pivot 4 and/or by reducing the moment of inertia I of the serge 3, and conversely that one can reduce the frequency f by decreasing the stiffness K of the flexible pivot 4 and/or by increasing the moment of inertia I of the rim 3.
  • the stiffness K of the flexible pivot 4 can be increased by increasing the section (height h and/or thickness e) slats 4a, 4b and/or by decreasing the length L of the slats 4a, 4b, and can be reduced by reducing the section (height h and/or thickness e) of the slats 4a, 4b and/or by increasing the length L of the blades 4a, 4b.
  • the moment of inertia I of the rim 3 can be increased by increasing the mass m and/or the radius of gyration r of the rim 3, and can be decreased by decreasing said mass m and/or said radius of gyration r.
  • step E3 a thickness of material to be added or removed is calculated which makes it possible to reduce the frequency f so that it reaches the predetermined frequency.
  • step E3 a thickness of material to be added or removed is calculated which makes it possible to increase the frequency f so that it reaches the predetermined frequency.
  • the calculated material thickness can be a thickness to be added or removed in a homogeneous manner over the entire external surface of the oscillator, a thickness to be added or removed in a non-homogeneous manner over the entire external surface of the oscillator, a thickness to adding or removing homogeneously only on a part of the outer surface of the oscillator or a thickness to add or remove in a non-homogeneous way only on a part of the outer surface of the oscillator.
  • the addition or removal of material can be provided to vary only the height h of the blades 4a, 4b of the flexible pivot 4, only the thickness e of the blades 4a, 4b or both the height h and the thickness e.
  • the thickness of material calculated at step E3 is, depending on the case, added to or removed from the oscillator formed at step E1.
  • step E3 a thickness of material to be added to the flexible pivot 4 and a thickness of material to be removed from the serge 3 to obtain the predetermined frequency are calculated, or conversely a thickness of material to be removed from the flexible pivot 4 and a thickness of material to be added to the serge 3 are calculated, and these thicknesses are, depending on the case, added or removed in the zones of the oscillator concerned in step E4.
  • Step E4 in the invention comprises a first step consisting in oxidizing the oscillator 1 in order to transform the thickness of silicon-based material to be removed into silicon dioxide, and a second step consisting in removing the layer of oxide of silicon thus formed.
  • the oscillator present after oxidation ( figure 4 ) a core 5 of material with silicon base whose dimensions are smaller than the corresponding dimensions h, e of the oscillator before oxidation ( picture 3 ), this core 5 being covered with a layer 6 of silicon oxide. After removal of layer 6 ( figure 5 ), we therefore obtain an oscillator of reduced dimensions.
  • the oxidation can be carried out thermally, for example between 800 and 1200° C. in an oxidizing atmosphere using steam or oxygen gas. It can be performed locally on the oscillator, for example only on the flexible pivot 4 or on the edge 3, by means of masks such as nitride masks.
  • the oxide formed on the silicon-based material can be removed by a chemical bath comprising, for example, hydrofluoric acid.
  • Step E4 can end the method according to the invention. However, after step E4, steps E2, E3 and E4 can be repeated one or more times to refine the dimensional quality of the oscillator.
  • the present invention makes it possible to obtain a very high dimensional precision for the oscillator and therefore to guarantee a more precise oscillation frequency.
  • the oscillator can also be processed to improve some of its properties and characteristics. It can for example be treated to make it less sensitive to thermal variations, that is to say so that the stiffness of its flexible pivot 4 or even its frequency does not vary or varies little depending on the temperature.
  • a layer of a material having a thermal coefficient of the modulus of elasticity of opposite sign to that of silicon can be formed over the entire silicon oscillator or at least over its flexible pivot 4. This layer is typically made of silicon oxide. It can be formed by thermal oxidation.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Micromachines (AREA)

Claims (8)

  1. Verfahren zur Herstellung eines Oszillators (1) mit flexiblem Zapfen mit einer vorbestimmten Frequenz, wobei der Oszillator (1) mit flexiblem Zapfen eine Stütze (2), einen flexiblen Zapfen (4) und einen Fußkreis (3) umfasst, der durch den flexiblen Zapfen (4) an der Stütze (2) aufgehängt ist, wobei der flexible Zapfen (4) dazu gestaltet ist, den Fußkreis (3) drehbar in Bezug auf die Stütze (2) zu führen und den Fußkreis (3) elastisch in eine Ruheposition zurückzuziehen, wobei das Verfahren die folgenden Schritte umfasst:
    a) Bilden, aus einem Material auf Siliziumbasis, eines Oszillators mit flexiblem Zapfen, der die Stütze (2), den flexiblen Zapfen (4) und den Fußkreis (3) umfasst, aber Abmessungen aufweist, die sich von den Abmessungen unterscheiden, die erforderlich sind, um den Oszillator mit flexiblem Zapfen mit einer vorbestimmten Frequenz zu erhalten,
    b) Messen der Frequenz des im Schritt a) gebildeten Oszillators,
    c) ausgehend von der im Schritt b) vorgenommenen Messung, Berechnen mindestens einer Materialdicke, die von dem im Schritt a) gebildeten Oszillator zu entfernen ist, um den Oszillator mit flexiblem Zapfen mit einer vorbestimmten Frequenz zu erhalten,
    d) ausgehend von der im Schritt c) vorgenommenen Berechnung, Abwandeln des im Schritt a) gebildeten Oszillators, um den Oszillator mit flexiblem Zapfen mit einer vorbestimmten Frequenz zu erhalten, wobei dieser Schritt d) die folgenden Schritte umfasst:
    - Oxidieren der gesamten Außenfläche des im Schritt a) gebildeten Oszillators oder eines Teils davon, um die zu entfernende Materialdicke in Siliziumoxid umzuwandeln, und
    - Entfernen des Siliziumoxids.
  2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass im Schritt d) einzig der flexible Zapfen (4) abgewandelt wird.
  3. Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass im Schritt d) einzig der Fußkreis (3) abgewandelt wird.
  4. Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass im Schritt d) der flexible Zapfen (4) und der Fußkreis (3) abgewandelt werden.
  5. Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der Schritt a) einen Ätzschritt, zum Beispiel reaktives Ionentiefenätzen, chemisches Ätzen, fokussiertes Ionenstrahlätzen oder Laserätzen, umfasst.
  6. Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Schritte b), c) und d) ein oder mehrere Male wiederholt werden, um die Abmessungsqualität des im Schritt d) erhaltenen Oszillators zu verfeinern.
  7. Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der flexible Zapfen (4) vom Typ mit getrennten gekreuzten Klingen, mit nicht getrennten gekreuzten Klingen oder mit versetztem Drehmittelpunkt ist.
  8. Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der im Schritt a) gebildete Oszillator einteilig ist.
EP17175750.3A 2017-06-13 2017-06-13 Herstellungsverfahren eines oszillators mit flexiblem zapfen Active EP3416001B1 (de)

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EP3416001B1 true EP3416001B1 (de) 2022-04-13

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3882710A1 (de) 2020-03-19 2021-09-22 Patek Philippe SA Genève Verfahren zur herstellung einer uhrenkomponente auf siliziumbasis
EP3882714A1 (de) 2020-03-19 2021-09-22 Patek Philippe SA Genève Verfahren zur herstellung einer uhrenkomponente aus silizium
EP3982205A1 (de) 2020-10-06 2022-04-13 Patek Philippe SA Genève Verfahren zur herstellung einer uhrfeder mit einer präzisen steifigkeit

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1213628A1 (de) * 2000-12-07 2002-06-12 Eta SA Fabriques d'Ebauches Verfahren zur Regulierung der Schwingungsfrequenz einer Unruhspiralfeder für eine mechanische Uhr
WO2012010408A1 (fr) * 2010-07-19 2012-01-26 Nivarox-Far S.A. Mecanisme oscillant a pivot elastique et mobile de transmission d'energie
EP2796944A2 (de) * 2010-07-16 2014-10-29 ETA SA Manufacture Horlogère Suisse Verfahren zur Einstellung der Oszillationsfrequenz, der Trägheit oder zum Ausgleich einer beweglichen Komponente eines Uhrwerks oder einer Spiralunruh-Einheit einer Uhr
EP2990885A1 (de) * 2013-12-23 2016-03-02 ETA SA Manufacture Horlogère Suisse Mechanisches Uhrwerk mit magnetischem Hemmungsmechanismus
CH710308A2 (fr) * 2014-10-23 2016-04-29 Richemont Int Sa Résonateur en silicium thermocompensé.
EP3035126A1 (de) * 2014-12-18 2016-06-22 The Swatch Group Research and Development Ltd. Resonator einer Uhr mit sich kreuzenden Blättern

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH701499B1 (fr) * 2009-07-23 2016-09-15 Montres Breguet Sa Procède de fabrication d'une pièce micromécanique en silicium renforcé.
CH704149B1 (fr) * 2010-11-18 2020-10-30 Nivarox Sa Procédé d'appairage des composants d'un sous-ensemble d'horlogerie, et d'ajustement d'inertie et/ou de fréquence d'oscillation desdits composants
CH709291A2 (fr) 2014-02-20 2015-08-28 Suisse Electronique Microtech Oscillateur de pièce d'horlogerie.
EP2937311B1 (de) * 2014-04-25 2019-08-21 Rolex Sa Herstellungsverfahren einer verstärkten uhrkomponente, entsprechende uhrkomponente und entsprechende uhr
EP2998800B1 (de) 2014-09-16 2019-01-16 Patek Philippe SA Genève Uhrkomponente mit flexiblem zapfenlager
EP3035127B1 (de) * 2014-12-18 2017-08-23 The Swatch Group Research and Development Ltd. Stimmgabeloszillator einer stimmgabelgesteuerten Uhr
EP3037893B1 (de) * 2014-12-22 2018-02-28 Patek Philippe SA Genève Mikromechanische Komponente oder Uhr mit flexiblem Führungsdraht
SG11201801765XA (en) 2015-09-29 2018-04-27 Patek Philippe Sa Geneve Flexible-pivot mechanical component and timekeeping device including same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1213628A1 (de) * 2000-12-07 2002-06-12 Eta SA Fabriques d'Ebauches Verfahren zur Regulierung der Schwingungsfrequenz einer Unruhspiralfeder für eine mechanische Uhr
EP2796944A2 (de) * 2010-07-16 2014-10-29 ETA SA Manufacture Horlogère Suisse Verfahren zur Einstellung der Oszillationsfrequenz, der Trägheit oder zum Ausgleich einer beweglichen Komponente eines Uhrwerks oder einer Spiralunruh-Einheit einer Uhr
WO2012010408A1 (fr) * 2010-07-19 2012-01-26 Nivarox-Far S.A. Mecanisme oscillant a pivot elastique et mobile de transmission d'energie
EP2990885A1 (de) * 2013-12-23 2016-03-02 ETA SA Manufacture Horlogère Suisse Mechanisches Uhrwerk mit magnetischem Hemmungsmechanismus
CH710308A2 (fr) * 2014-10-23 2016-04-29 Richemont Int Sa Résonateur en silicium thermocompensé.
EP3035126A1 (de) * 2014-12-18 2016-06-22 The Swatch Group Research and Development Ltd. Resonator einer Uhr mit sich kreuzenden Blättern

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