EP3329033B1 - Appareil d'application de revêtement - Google Patents
Appareil d'application de revêtement Download PDFInfo
- Publication number
- EP3329033B1 EP3329033B1 EP16747606.8A EP16747606A EP3329033B1 EP 3329033 B1 EP3329033 B1 EP 3329033B1 EP 16747606 A EP16747606 A EP 16747606A EP 3329033 B1 EP3329033 B1 EP 3329033B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- tunnel
- nozzles
- articles
- coating
- array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000576 coating method Methods 0.000 title claims description 99
- 239000011248 coating agent Substances 0.000 title claims description 83
- 239000011521 glass Substances 0.000 claims description 26
- 239000007789 gas Substances 0.000 claims description 20
- 238000010438 heat treatment Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 9
- 238000011144 upstream manufacturing Methods 0.000 claims description 8
- 238000003491 array Methods 0.000 claims description 6
- 238000000605 extraction Methods 0.000 claims description 5
- 230000009471 action Effects 0.000 claims description 3
- 230000032258 transport Effects 0.000 claims description 3
- 239000012707 chemical precursor Substances 0.000 claims description 2
- 239000002243 precursor Substances 0.000 description 21
- 239000012159 carrier gas Substances 0.000 description 15
- 239000003570 air Substances 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 238000005229 chemical vapour deposition Methods 0.000 description 10
- 238000000151 deposition Methods 0.000 description 8
- 239000000376 reactant Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 230000008569 process Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- OPARTXXEFXPWJL-UHFFFAOYSA-N [acetyloxy-bis[(2-methylpropan-2-yl)oxy]silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)(C)C)OC(C)(C)C OPARTXXEFXPWJL-UHFFFAOYSA-N 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000006750 UV protection Effects 0.000 description 2
- 239000012080 ambient air Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000014171 carbonated beverage Nutrition 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000004224 protection Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/005—Coating the outside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
Definitions
- the invention is concerned with methods and apparatus for deposition of coatings on glass articles, particularly glass vessels such as bottles and jars, during a continuous manufacturing process.
- the coating reduces the degree of 'scuffing' (i.e. visible surface damage having an adverse aesthetic effect) during subsequent process steps.
- the coating also provides good adhesion for a subsequent polymer coating that is deposited at the 'cold end' of the process for additional lubrication.
- the coating also improves the strength of the bottle.
- WO2006/009872 describes deposition by direct injection Chemical Vapour Deposition (CVD) wherein CVD precursors are dissolved in a solvent comprising an ionic liquid which is then injected into a packed vaporiser having a counter current carrier gas flow.
- the carrier gas strips the precursors from the solvent and transports them in the vapour phase to a deposition chamber where the coating is formed by conventional CVD methods.
- WO2013/163 005 describes a coating apparatus in which a compound to be deposited (a metal oxide) is injected into an air stream which is directed over the article to be coated.
- the precursors may be brought to their reaction site separately, i.e. each precursor is brought to the surface of the glass via its own dedicated conduit, only to mix with other precursors on reaching the vicinity of the glass surface but there are certain advantages to 'pre-mixing' systems (in terms of the relative simplicity of the apparatus) in which the precursors are mixed before delivery to the reaction site.
- the sidewalls of the tunnel include apertures, typically slots or nozzles through which coating materials are delivered, typically in a carrier gas. Exhaust apertures are also typically included.
- manufacturers choose to avoid coating of a particular region of an article. For example, where a coating is applied to bottles for beer or carbonated drinks, manufacturers may choose to avoid coating of the lip of the bottle as some coatings may provide a surface roughness or nucleation points which cause unwanted effervescence as the liquid is poured.
- EP0519597 describes glass coating apparatus and methods of the type referred to above. In this case a non-turbulent air supply is directed downwards across the coating material stream in order to prevent coating in the top region (particularly the lip) of the bottle.
- WO02066389 describes a bottle coating apparatus comprising a coating tunnel in which slots are provided for supplying and exhausting coating materials in gas mixture.
- the slots are horizontal and spaced apart so that only strips of the bottle, corresponding to the areas which contact their neighbours during processing, are coated.
- This patent also describes dual coating of the bottles by applying a first coating (e.g. tin oxide) whose deposition is assisted by residual heat in the bottles after casting from the molten state (a so called 'hot end' coating) and a second coating (e.g. a polymer spray coating) which is applied at a point in the production process where the bottles have significantly cooled (a 'cold end' coating).
- a first coating e.g. tin oxide
- a second coating e.g. a polymer spray coating
- a coating apparatus is further described in US4425868 .
- this type of apparatus allows ambient air to enter the tunnel via the ends and this air contains a certain level of contaminants such as moisture which can affect the coating process. Moisture may also be introduced to the interior of the tunnel via a finishing gas stream used to purge the top region of the bottles as described previously. While these prior art coating apparatuses serve many purposes, where uniformity, surface texture etc of coatings may not be crucial, new applications for coatings are frequently emerging which require greater control over thickness, uniformity surface texture and other qualities.
- apparatus for coating three dimensional glass articles comprises the features set out in claim 1 attached hereto.
- a preferred embodiment comprises a pair of arrays of inlet nozzles arranged with one array on each sidewall, substantially opposite each other in the tunnel.
- a more preferred embodiment comprises a pair of exhaust apertures, arranged with one aperture on each sidewall, substantially opposite each other in the tunnel.
- a further preferred embodiment comprises a damper plate, moveable to vary the effective size of an exhaust aperture.
- a further preferred embodiment comprises at least one reflective plate, arranged to direct heat radiating from the glass articles on to a linear array of nozzles.
- the exhaust apertures are defined by a substantially vertical conduit comprising walls and a baffle plate extending from the tunnel and away from the downstream end to a wall of the conduit.
- the cross-sectional area of the tunnel is between 1.5 and 2.5 times greater than the cross-sectional area of an exhaust aperture.
- At least one array of nozzles is arranged such that the velocity of gases exiting the nozzles includes a component that is substantially parallel with the general direction of articles conveyed through the tunnel.
- Another preferred embodiment comprises at least one array of nozzles located at a first distance from the ends of the tunnel and at least one array of nozzles located at a second distance from the ends of the tunnel.
- Another preferred embodiment comprises means for heating at least one array of nozzles.
- the means for heating at least one array of nozzles may comprise an enclosure in which the array is located, and means for heating the interior of the enclosure.
- the means for heating the interior of the enclosure may comprise an electrical heating element.
- a method for coating three dimensional glass articles comprises the steps set out in claim 13 attached hereto.
- apparatus for coating glass articles comprises a hood 11 having a top 12 and sidewalls 13 defining a tunnel 14 through which articles to be coated are conveyed by a conveyor belt (not shown).
- At least one pair of linear arrays of inlet nozzles 15 is provided, one array 15 from the pair being located on each sidewall 13.
- each of the pair are located at substantially the same distance along the path of the articles (i.e. they are located substantially opposite each other). (N.B. while a pair of nozzle arrays is illustrated in this embodiment, a single array is adequate for some chemistries).
- At least one pair of exhaust apertures 16 is provided, again one from the pair on each sidewall 13 and preferably substantially opposite each other.
- inlet nozzles 15 and exhaust apertures 16 provide for a more effective exposure of the articles to CVD reactants during transit through the hood. Exposure is enhanced as the gaseous CVD reactants and bottles travel in the same direction through the tunnel.
- the minimum distance between inlet nozzles 15 and exhaust apertures 16 varies according to the particular chemistry being practiced and ranges from 500mm to 1000mm.
- the effective length of exhaust apertures 16 may be varied by adjusting the height of damper 19.
- Damper 19 comprises a plate arranged to block a part of the slot forming the exhaust apertures
- CVD reactants may be delivered to the nozzles 15 via heated delivery lines (not shown) in order to prevent condensation of vapour before it enters the hood.
- formation of liquid can occur at the nozzles and the hood described here includes reflective plates 20, arranged to direct thermal radiation from the articles on to the nozzles in order to provide heating thereof.
- the exhaust arrangement is shown in plan view.
- Walls 21a - 21d define substantially box-section conduits with baffle plate 22 defining a slot type aperture 16 with wall 21d.
- Walls 21a are coincident with the interior of the tunnel and walls 21d are furthest upstream, having regard to the general direction 23 of gases and articles passing through the tunnel.
- baffle plates 22 are arranged to extend from the interior of the tunnel to define a slot 16 between baffle plate 22 and the wall 21d which is furthest upstream.
- a negative pressure is applied to the top of the conduit by an extractor fan (not shown).
- This arrangement especially effective in drawing exhaust gases from the hood.
- This arrangement not only draws exhaust gases and any excess reactant but ambient air is also drawn from the exit of the tunnel as illustrated by arrows 24.
- This air, entering the tunnel in the direction of arrows 24 provides a barrier to exhaust gases or excess reactants that might otherwise leak from the apparatus to the surroundings.
- the total area of the slot 16 should be small, compared with the cross-sectional area of the conduit defined by walls 21a-21d and 22 to ensure uniform flow. However the smaller the area, the greater the suction that must be applied to the conduit for effective extraction and the final design choice represents a compromise between these two conflicting factors.
- a tunnel cross-sectional area to slot area ratio of between 1.5 and 2.5 is found to serve well (an area ratio of 1.6 represents about 10% variation in flow velocity when comparing the flow velocity at the top of the slot and the bottom).
- the linear velocity of the CVD reactants exiting the nozzles 15 is an important factor in the achievement of effective coatings.
- the articles enter the coating hood with a known velocity (typically 0.3m/s to 1.5m/s, or ⁇ 90 to 700 articles per minute).
- a jet of coating precursor is preferably blown into the flow path, in one embodiment, perpendicular to the direction of the articles 23 during transit through the hood.
- the jet must have sufficient momentum so that a concentrated plume of coating gases is directed onto the centre line of the articles' motion. The process becomes inefficient if the highly concentrated plume of coating gases is instead directed to either wall 13 of the coating hood 11.
- the choice of jet velocity is optimally identified by fluid flow modelling, but an approximate measure can be found by considering a fluid "kinetic energy ratio".
- the inlet jet is slower than given by this ratio, the jet is not thrown far enough and the precursor is wasted on the wall adjoining the inlet nozzle.
- the jet velocity must increase to throw the jet far enough and so the jet velocity would be increased to maintain the target kinetic-energy ratio.
- the velocity of the inlet jet is tuned during coating trials to give the thickest and most evenly distributed coating possible for the given chemistry and bottle velocity.
- an inlet jet of 8m/s was found to be adequate with 0.5m/s conveyor speed.
- the coating chamber was 165mm wide, 285mm tall and 1000mm long.
- the coating chamber dimensions are chosen to give just enough room for the glass article to move through without causing crashes at the entrance. If the chamber is too small, then misalignment of glass containers on the conveyor can cause them to collide with the entrance to the coating hood.
- a mask (not shown) is fitted to the entrance to the coating hood of approximately the same shape as the outline of the glass articles. This mask restricts the air drawn into the coating hood by the bottles and so gives a higher concentration of coating precursor inside the reaction chamber.
- the mask is designed to block as much air entering the start of the hood as possible without causing crashes of the glass containers on the conveyor.
- the inlet nozzles are positioned at least 100mm downstream of the entrance and preferably 300mm. If the nozzles are close to the entrance, then coating gases escape from the entrance to the hood due to occasional backward travelling eddies in the coating plume.
- the length of the coating hood is chosen so that the chemical reaction has had sufficient time and distance to complete.
- the inlet nozzle height is chosen so that coating gases are directed at the heel and shoulder of the glass container only, a total of 180mm height in one example application.
- a flow rate of vaporized precursor with carrier gas of 100 standard litres per minute (slm) is commercially viable. From this inlet flow rate, and using the target inlet jet velocity and total coating height the inlet nozzles width was calculated as 1mm wide. Thinner nozzles are not desirable as they become increasingly prone to blockage. Wider nozzles require more carrier gases to be used to achieve the require inlet velocity and this leads to dilution of the coating precursors and so reduced coating efficiency. If more coating precursor flow can be afforded, then a wider nozzle would be chosen to maintain the target inlet velocity.
- a pair of opposing vertical inlet nozzles are used in one embodiment as this helps to position the coating plume at the centre line of the coating hood. Using a nozzle on only one side of the hood may give a good enough coating uniformity for some applications.
- the two exhaust ports at the end of the coating hood are specified to just prevent leakage from the end of the coater.
- the negative pressure on the exhaust slots is determined by fluid simulations.
- the exhaust port has a 12mm wide flow restriction which runs the full height of the exhaust port (285mm). At least 100Pa of suction behind the 12mm flow restriction was found necessary to prevent gas leakage from the ends of the hood.
- the coater described in figures 1a - 1d , 2 was used to produce a series of bottles having a silica and titanium dioxide (titania) coatings.
- Titanium (IV) isopropoxide (TTIP) served as the titanium source and Di-t-butoxydiacetoxysilane (DBDAS) served for silicon. These were delivered to the coating hood via an evaporator of the type known in the art. Essentially this comprises a heated metal tube within which the reactant is dropped into a stream of carrier gas.
- Titania coatings were successfully deposited using the following parameter ranges:
- the silica provides protection of the UV protection coating from damage by sodium ions leaching from the glass.
- coating thicknesses were measured at the heel 24, body 25 and shoulder 26 of the bottles.
- the measured thicknesses for the two samples are shown in table 3, where the four values for each position (height) represent four measurements taken around the circumference of the bottle.
- Thicknesses are given in CTU (coating thickness unit), an optical unit which is well known and frequently used in the glass industry for defining the thickness of coatings. This unit is based on measurements of the reflection of incident light. Table 3: Coating thicknesses measured after on-line deposition of titania on bottles. Sample 1 Sample 2 Heel 42 42 32 31 23 24 24 30 Body 48 44 43 51 52 51 31 41 Shoulder 39 50 45 58 55 68 44 42
- the inlet nozzles 15 are arranged non-perpendicular to the general direction 23 of articles and gasses passing through the tunnel 11, such that the velocity of gases (coating precursors and any carrier gas) exiting the nozzles (generally indicated by arrows 26) includes a component that is parallel with the direction 23.
- the nozzles 15 point 'downstream' to some extent. This arrangement reduces the likelihood of reactants or carrier gases being blown upstream upon exiting the nozzles 15 and, in some cases exiting the upstream end of the tunnel.
- the terms 'upstream' and 'downstream' refer to the direction 23 of articles and gasses passing through the tunnel 11.
- the upstream end 24 of the tunnel is the end where articles enter and the downstream end 25 is the end where articles exit).
- a further embodiment of the invention may include a first linear array of nozzles 15 on a sidewall 13 and a further array of nozzles 15b located downstream (i.e. closer to the downstream end) of the first array of nozzles.
- the further array of nozzles 15b may be located on the same sidewall 13 as the first array of nozzles; it may be located on the opposite sidewall 13 of the first array 15 or, as illustrated in figure 5 , the nozzles may be arranged in pairs such that each array 15 or 15b of a pair is located on the opposite sidewall of the other array of the pair, at a substantially similar distance from the ends of the tunnel.
- the same coating precursors may be provided to the nozzles 15 and 15b to provide for a thicker coating of a given material, or different coating precursors may be provided to nozzles 15 and 15b to provide for two (or multiple) layers of different materials.
- Apparatus according to the invention may also include means for heating the nozzle array 15.
- such means comprises an enclosure 27 in which the nozzle array is located along with heating elements 28 for heating and controlling the internal temperature of the enclosure 27.
- the temperature of the enclosure should be low enough to prevent pre-reaction of the coating precursors, but high enough to prevent unwanted condensation or other precipitation on the nozzles 15.
- Heating elements 28 could comprise electrically powered (resistive) heating element such as are commonly realised as tapes or plates.
- the enclosure 27 may open into the tunnel so that heat radiated by the articles to be coated can contribute to the heating of the nozzles 15.
- reflector plates 20 may serve to enhance this heating effect.
- figure 5 illustrates certain further preferred features in conjunction with nozzles 15, 15b that are arranged to deliver precursors having a velocity that is substantially perpendicular to the general direction of articles conveyed through the tunnel.
- these features could also be used in conjunction with nozzles 15, 15b, of which at least some are arranged to deliver precursors having a velocity having a component that is substantially parallel to the general direction of articles conveyed through the tunnel.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
Claims (13)
- Appareil pour revêtir des articles en verre tridimensionnels comprenant :un tunnel, ayant un sommet et des première et seconde parois latérales, approprié pour être disposé sur une bande transporteuse de sorte que la bande transporteuse transporte les articles d'une extrémité amont, au niveau de laquelle les articles entrent dans le tunnel, à une extrémité aval, au niveau de laquelle les articles sortent du tunnel,comprenant en outreune rangée linéaire de buses, disposées sur au moins une paroi latérale pour fournir un jet de gaz, lequel jet traverse le trajet des articles transportés dans le tunnel ;au moins une ouverture d'évacuation disposée sur une paroi latérale, l'ouverture d'évacuation étant située plus près de l'extrémité aval que la rangée linéaire de buses ;caractérisé par des moyens pour appliquer une pression d'extraction négative à l'ouverture d'évacuation, et une distance entre la rangée de buses d'entrée et l'ouverture d'évacuation entre 500 et 1000 mm.
- Appareil selon la revendication 1, comprenant une paire de rangées de buses d'entrée disposées avec une rangée sur chaque paroi latérale, sensiblement opposées l'une à l'autre dans le tunnel.
- Appareil selon la revendication 2, comprenant une paire d'ouvertures d'évacuation, disposées avec une ouverture sur chaque paroi latérale, sensiblement opposées l'une à l'autre dans le tunnel.
- Appareil selon l'une quelconque des revendications précédentes, comprenant en outre une plaque amortisseur, mobile pour faire varier la taille effective d'une ouverture d'évacuation.
- Appareil selon l'une quelconque des revendications précédentes, comprenant en outre au moins une plaque réfléchissante, disposée pour diriger la chaleur rayonnant des articles en verre sur une rangée linéaire de buses.
- Appareil selon l'une quelconque des revendications précédentes, dans lequel les ouvertures d'évacuation sont définies par un conduit sensiblement vertical comprenant des parois et un déflecteur s'étendant du tunnel et en s'éloignant de l'extrémité aval à une paroi du conduit.
- Appareil selon l'une quelconque des revendications précédentes, dans lequel l'aire en section transversale du tunnel est entre 1,5 et 2,5 fois supérieure à l'aire en section transversale d'une ouverture d'évacuation.
- Appareil selon l'une quelconque des revendications précédentes, dans lequel au moins une rangée de buses est disposée de sorte que la vitesse des gaz sortant des buses inclut une composante qui est sensiblement parallèle au sens général des articles transportés dans le tunnel.
- Appareil selon l'une quelconque des revendications précédentes, comprenant au moins une rangée de buses située à une première distance des extrémités du tunnel et au moins une rangée de buses située à une seconde distance des extrémités du tunnel.
- Appareil selon l'une quelconque des revendications précédentes, incluant en outre des moyens pour chauffer au moins une rangée de buses.
- Appareil selon la revendication 10, dans lequel les moyens pour chauffer au moins une rangée de buses comprennent une enceinte dans laquelle la rangée est située, et des moyens pour chauffer l'intérieur de l'enceinte.
- Appareil selon la revendication 11, dans lequel les moyens pour chauffer l'intérieur de l'enceinte comprennent un élément chauffant électrique.
- Procédé pour revêtir des articles en verre tridimensionnels comprenant :la fourniture d'un appareil selon l'une quelconque des revendications précédentes etle transport d'au moins l'un desdits articles dans le tunnel de l'extrémité amont à l'extrémité aval, dans lequel un écoulement d'air dans le tunnel est produit par l'action de l'ouverture d'évacuation et l'action des articles passant dans le tunnel,la fourniture de précurseurs chimiques du revêtement destiné à être déposé aux buses tandis que les articles passent dans le tunnel, pour fournir ainsi le jet de gaz qui traverse le trajet des articles,caractérisé en ce que le rapport des densités d'énergie cinétique de l'air s'écoulant dans le tunnel est entre 0,1 et 3 fois supérieur au rapport des densités d'énergie cinétique du gaz sortant d'une buse.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PL16747606T PL3329033T3 (pl) | 2015-07-29 | 2016-07-29 | Urządzenie do powlekania |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB1513339.0A GB201513339D0 (en) | 2015-07-29 | 2015-07-29 | Coating apparatus |
PCT/GB2016/052359 WO2017017478A1 (fr) | 2015-07-29 | 2016-07-29 | Appareil d'application de revêtement |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3329033A1 EP3329033A1 (fr) | 2018-06-06 |
EP3329033B1 true EP3329033B1 (fr) | 2021-05-05 |
Family
ID=54106779
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP16747606.8A Active EP3329033B1 (fr) | 2015-07-29 | 2016-07-29 | Appareil d'application de revêtement |
Country Status (13)
Country | Link |
---|---|
US (2) | US20180216231A1 (fr) |
EP (1) | EP3329033B1 (fr) |
JP (1) | JP6882257B2 (fr) |
CN (1) | CN108026641B (fr) |
AU (1) | AU2016299411B2 (fr) |
BR (1) | BR112018001828B1 (fr) |
CA (1) | CA2993411C (fr) |
ES (1) | ES2886108T3 (fr) |
GB (1) | GB201513339D0 (fr) |
MX (1) | MX2018001088A (fr) |
PL (1) | PL3329033T3 (fr) |
PT (1) | PT3329033T (fr) |
WO (1) | WO2017017478A1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB201513339D0 (en) * | 2015-07-29 | 2015-09-09 | Pilkington Group Ltd | Coating apparatus |
Family Cites Families (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1951950A (en) * | 1933-05-29 | 1934-03-20 | Corning Glass Works | Method and apparatus for cooling glass articles |
US2222327A (en) * | 1939-07-28 | 1940-11-19 | Walkup Samuel Thomas | Electric smoothing iron device |
US2314812A (en) * | 1940-03-07 | 1943-03-23 | Corning Glass Works | Method of making glass articles |
US3658304A (en) * | 1970-05-11 | 1972-04-25 | Anchor Hocking Corp | Means for vapor coating |
US3736728A (en) * | 1970-08-03 | 1973-06-05 | Kleissler Co G | Waste material separator and collector |
US3934063A (en) * | 1974-05-31 | 1976-01-20 | Anchor Hocking Corporation | Flame masking of glass articles for metal oxide film deposition |
US3989004A (en) * | 1974-08-15 | 1976-11-02 | Ball Corporation | Apparatus for applying durable lubricous coatings to newly formed vitreous surfaces |
US4150964A (en) * | 1977-01-31 | 1979-04-24 | Owens-Illinois, Inc. | Apparatus for coating glassware |
US4431692A (en) * | 1980-02-15 | 1984-02-14 | Owens-Illinois, Inc. | Process for making glass surfaces abrasion-resistant and article produced thereby |
US4425868A (en) * | 1981-12-28 | 1984-01-17 | Thatcher Glass Corporation | Coating hood |
US4389234A (en) * | 1982-03-18 | 1983-06-21 | M&T Chemicals Inc. | Glass coating hood and method of spray coating glassware |
DE3226900C2 (de) * | 1982-07-17 | 1985-11-28 | Veba-Glas Ag, 4300 Essen | Verfahren und Vorrichtung zum Beschichten von Glasbehältern mit Titanoxid als Vergütungsmittel |
US4615916A (en) * | 1984-06-25 | 1986-10-07 | Owens-Illinois, Inc. | Surface treatment of glass containers |
US4668268A (en) * | 1984-12-20 | 1987-05-26 | M&T Chemicals Inc. | Coating hood with air flow guide for minimizing deposition of coating compound on finish of containers |
US4689749A (en) * | 1985-02-15 | 1987-08-25 | Omni Engineering | Automatic tack-off machine |
GB8531424D0 (en) * | 1985-12-20 | 1986-02-05 | Glaverbel | Coating glass |
US4879970A (en) * | 1987-04-21 | 1989-11-14 | M&T Chemicals Inc. | Coating hood for applying coating compound on containers |
JP2927857B2 (ja) * | 1990-01-19 | 1999-07-28 | 株式会社東芝 | 基板加熱装置 |
US5454873A (en) * | 1994-05-20 | 1995-10-03 | Scholes; Addison B. | Cold end glassware coating apparatus |
US5498758A (en) * | 1994-05-20 | 1996-03-12 | Alltrista Corporation | Method for the cold end coating of glassware using a vaporizer having an internal flow path from a reservoir of liquid coating material to a vapor deposition chamber |
US5846332A (en) * | 1996-07-12 | 1998-12-08 | Applied Materials, Inc. | Thermally floating pedestal collar in a chemical vapor deposition chamber |
US6189482B1 (en) * | 1997-02-12 | 2001-02-20 | Applied Materials, Inc. | High temperature, high flow rate chemical vapor deposition apparatus and related methods |
FI120437B (fi) * | 1999-03-01 | 2009-10-30 | Eko Tekniikka Turku Oy | Laite ja menetelmä kiinteiden aineiden vaahtoerotuksessa |
DE10007059A1 (de) * | 2000-02-16 | 2001-08-23 | Aixtron Ag | Verfahren und Vorrichtung zur Herstellung von beschichteten Substraten mittels Kondensationsbeschichtung |
KR100406174B1 (ko) * | 2000-06-15 | 2003-11-19 | 주식회사 하이닉스반도체 | 화학적 강화 화학 기상 증착 장비에 사용되는 샤워 헤드 |
US8877000B2 (en) * | 2001-03-02 | 2014-11-04 | Tokyo Electron Limited | Shower head gas injection apparatus with secondary high pressure pulsed gas injection |
US7217336B2 (en) * | 2002-06-20 | 2007-05-15 | Tokyo Electron Limited | Directed gas injection apparatus for semiconductor processing |
KR101153161B1 (ko) * | 2005-04-01 | 2012-06-18 | 주성엔지니어링(주) | 가스분사장치 및 이를 포함하는 액정표시소자의 제조장치 |
KR100700493B1 (ko) * | 2005-05-24 | 2007-03-28 | 삼성에스디아이 주식회사 | 효율적인 필라멘트 배열 구조를 갖는 촉매 강화 화학 기상증착 장치 |
JP4344949B2 (ja) * | 2005-12-27 | 2009-10-14 | セイコーエプソン株式会社 | シャワーヘッド、シャワーヘッドを含む成膜装置、ならびに強誘電体膜の製造方法 |
FI121669B (fi) * | 2006-04-19 | 2011-02-28 | Beneq Oy | Menetelmä ja laitteisto lasin pinnoittamiseksi |
KR100849929B1 (ko) * | 2006-09-16 | 2008-08-26 | 주식회사 피에조닉스 | 반응 기체의 분사 속도를 적극적으로 조절하는 샤워헤드를구비한 화학기상 증착 방법 및 장치 |
DE102007048564A1 (de) * | 2007-10-09 | 2009-04-23 | Heraeus Noblelight Gmbh | Vorrichtung für eine Bestrahlungseinheit |
TW201142066A (en) * | 2010-05-18 | 2011-12-01 | Hon Hai Prec Ind Co Ltd | Coating device |
JP5677563B2 (ja) * | 2011-02-24 | 2015-02-25 | 株式会社日立国際電気 | 基板処理装置、基板の製造方法及び半導体装置の製造方法 |
EP2662148A1 (fr) * | 2012-05-09 | 2013-11-13 | Arkema Vlissingen B.V. | Procédé amélioré pour appliquer un revêtement à extrémité froide intégrée dans un procédé de fabrication de récipients en verre |
US9322097B2 (en) * | 2013-03-13 | 2016-04-26 | Applied Materials, Inc. | EPI base ring |
JP5386046B1 (ja) * | 2013-03-27 | 2014-01-15 | エピクルー株式会社 | サセプタ支持部およびこのサセプタ支持部を備えるエピタキシャル成長装置 |
US9683745B2 (en) * | 2013-03-29 | 2017-06-20 | Roger Lehet | Small, high efficient wood stove |
GB201320521D0 (en) * | 2013-11-20 | 2014-01-01 | Pilkington Group Ltd | Coating apparatus |
US20150280051A1 (en) * | 2014-04-01 | 2015-10-01 | Tsmc Solar Ltd. | Diffuser head apparatus and method of gas distribution |
KR102260572B1 (ko) * | 2014-07-07 | 2021-06-07 | (주)선익시스템 | 복수의 증발원을 갖는 박막 증착장치 |
DE102014116991A1 (de) * | 2014-11-20 | 2016-05-25 | Aixtron Se | CVD- oder PVD-Reaktor zum Beschichten großflächiger Substrate |
CN104451601B (zh) * | 2014-12-02 | 2017-02-22 | 浙江大学 | 一种常压化学气相沉积镀膜反应器 |
US9499906B2 (en) * | 2015-02-13 | 2016-11-22 | Eastman Kodak Company | Coating substrate using bernoulli atomic-layer deposition |
GB201513339D0 (en) * | 2015-07-29 | 2015-09-09 | Pilkington Group Ltd | Coating apparatus |
GB201523156D0 (en) * | 2015-12-31 | 2016-02-17 | Pilkington Group Ltd | High strength glass containers |
JP6700156B2 (ja) * | 2016-11-16 | 2020-05-27 | 株式会社ニューフレアテクノロジー | 成膜装置 |
EP3593042A4 (fr) * | 2017-03-10 | 2020-12-02 | Beckett Gas, Inc. | Restricteur réglable pour brûleur |
-
2015
- 2015-07-29 GB GBGB1513339.0A patent/GB201513339D0/en not_active Ceased
-
2016
- 2016-07-29 BR BR112018001828-7A patent/BR112018001828B1/pt active IP Right Grant
- 2016-07-29 PT PT167476068T patent/PT3329033T/pt unknown
- 2016-07-29 AU AU2016299411A patent/AU2016299411B2/en active Active
- 2016-07-29 PL PL16747606T patent/PL3329033T3/pl unknown
- 2016-07-29 US US15/748,206 patent/US20180216231A1/en not_active Abandoned
- 2016-07-29 WO PCT/GB2016/052359 patent/WO2017017478A1/fr active Application Filing
- 2016-07-29 MX MX2018001088A patent/MX2018001088A/es unknown
- 2016-07-29 CA CA2993411A patent/CA2993411C/fr active Active
- 2016-07-29 CN CN201680051966.5A patent/CN108026641B/zh active Active
- 2016-07-29 JP JP2018504242A patent/JP6882257B2/ja active Active
- 2016-07-29 EP EP16747606.8A patent/EP3329033B1/fr active Active
- 2016-07-29 ES ES16747606T patent/ES2886108T3/es active Active
-
2023
- 2023-01-26 US US18/101,749 patent/US20230167556A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
MX2018001088A (es) | 2018-09-05 |
CN108026641A (zh) | 2018-05-11 |
GB201513339D0 (en) | 2015-09-09 |
BR112018001828B1 (pt) | 2022-05-31 |
BR112018001828A2 (pt) | 2018-09-18 |
AU2016299411A1 (en) | 2018-02-15 |
US20230167556A1 (en) | 2023-06-01 |
PL3329033T3 (pl) | 2021-11-15 |
AU2016299411B2 (en) | 2022-05-12 |
CN108026641B (zh) | 2021-07-16 |
US20180216231A1 (en) | 2018-08-02 |
JP6882257B2 (ja) | 2021-06-02 |
CA2993411C (fr) | 2023-09-05 |
ES2886108T3 (es) | 2021-12-16 |
CA2993411A1 (fr) | 2017-02-02 |
JP2018521227A (ja) | 2018-08-02 |
WO2017017478A1 (fr) | 2017-02-02 |
PT3329033T (pt) | 2021-08-06 |
EP3329033A1 (fr) | 2018-06-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8557328B2 (en) | Non-orthogonal coater geometry for improved coatings on a substrate | |
US20180291506A1 (en) | Coating apparatus and method of using | |
US20120240627A1 (en) | Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus | |
US20230167556A1 (en) | Coating apparatus | |
KR20100017761A (ko) | 공통 플라즈마 코팅 구역에서 복수의 코팅 재료를 침착시키기 위한 장치 및 방법 | |
EP3397598B1 (fr) | Procédé d'amélioration de la résistance à la pression interne d'un récipient en verre | |
TWI766859B (zh) | 用於容器之塗佈裝置、塗佈裝置的用途、在玻璃容器之表面上施加塗佈物之方法及玻璃容器 | |
EP3397599A1 (fr) | Récipients en verre très résistants | |
US20020127343A1 (en) | Methods and apparatus for forming a graded fade zone on a substrate and articles produced thereby | |
US3920433A (en) | Apparatus and method for improved glassware coating |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
17P | Request for examination filed |
Effective date: 20180228 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: GRANT OF PATENT IS INTENDED |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C03C 17/245 20060101ALI20201118BHEP Ipc: C23C 16/54 20060101AFI20201118BHEP Ipc: C03C 17/00 20060101ALI20201118BHEP |
|
INTG | Intention to grant announced |
Effective date: 20201203 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE PATENT HAS BEEN GRANTED |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: REF Ref document number: 1389916 Country of ref document: AT Kind code of ref document: T Effective date: 20210515 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R096 Ref document number: 602016057379 Country of ref document: DE |
|
REG | Reference to a national code |
Ref country code: PT Ref legal event code: SC4A Ref document number: 3329033 Country of ref document: PT Date of ref document: 20210806 Kind code of ref document: T Free format text: AVAILABILITY OF NATIONAL TRANSLATION Effective date: 20210802 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: FP |
|
REG | Reference to a national code |
Ref country code: SE Ref legal event code: TRGR |
|
REG | Reference to a national code |
Ref country code: LT Ref legal event code: MG9D |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: MK05 Ref document number: 1389916 Country of ref document: AT Kind code of ref document: T Effective date: 20210505 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BG Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210805 Ref country code: AT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 Ref country code: HR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 Ref country code: LT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210805 Ref country code: RS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 Ref country code: LV Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 Ref country code: IS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210905 Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210806 |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2886108 Country of ref document: ES Kind code of ref document: T3 Effective date: 20211216 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 Ref country code: SM Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 Ref country code: RO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R097 Ref document number: 602016057379 Country of ref document: DE |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 |
|
REG | Reference to a national code |
Ref country code: BE Ref legal event code: MM Effective date: 20210731 |
|
26N | No opposition filed |
Effective date: 20220208 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210905 Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20210729 Ref country code: AL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20210729 Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20210731 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: HU Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO Effective date: 20160729 |
|
P01 | Opt-out of the competence of the unified patent court (upc) registered |
Effective date: 20230507 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: PT Payment date: 20230629 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20230720 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: TR Payment date: 20230727 Year of fee payment: 8 Ref country code: IT Payment date: 20230731 Year of fee payment: 8 Ref country code: GB Payment date: 20230724 Year of fee payment: 8 Ref country code: ES Payment date: 20230821 Year of fee payment: 8 Ref country code: CZ Payment date: 20230717 Year of fee payment: 8 Ref country code: CH Payment date: 20230801 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 20230724 Year of fee payment: 8 Ref country code: PL Payment date: 20230720 Year of fee payment: 8 Ref country code: FR Payment date: 20230724 Year of fee payment: 8 Ref country code: DE Payment date: 20230720 Year of fee payment: 8 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20210505 |