EP3307551B1 - Étiquette de sécurité à effet d'image latente - Google Patents

Étiquette de sécurité à effet d'image latente Download PDF

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Publication number
EP3307551B1
EP3307551B1 EP16729563.3A EP16729563A EP3307551B1 EP 3307551 B1 EP3307551 B1 EP 3307551B1 EP 16729563 A EP16729563 A EP 16729563A EP 3307551 B1 EP3307551 B1 EP 3307551B1
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EP
European Patent Office
Prior art keywords
individual
motif
individual motif
motifs
optical security
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Active
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EP16729563.3A
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German (de)
English (en)
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EP3307551A1 (fr
Inventor
Stefan BORGSMÜLLER
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Scribos GmbH
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Tesa Scribos GmbH
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Publication of EP3307551A1 publication Critical patent/EP3307551A1/fr
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/425—Marking by deformation, e.g. embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/435—Marking by removal of material using electromagnetic radiation, e.g. laser

Definitions

  • the invention relates to a tamper-proof carrier with a series of optical security elements.
  • the invention also relates to a method for producing a counterfeit-proof carrier with a series of optical security elements.
  • Optical security elements contain very high-resolution structures that produce special optical effects. Such structures are difficult to copy and usually can not be displayed with normal printing technology.
  • Optical security elements may include structures that are visible and verifiable to the naked eye, as well as structures that are verifiable with either simple or special readers.
  • Optical security elements are widely known and used in a variety of ways.
  • the optical security elements include z. Holograms, kinegrams and lithographs.
  • optically variable elements may be holograms, specifically rainbow holograms, transmission holograms, reflection holograms, 2D holograms, 3D holograms, Fourier holograms, Fresnel holograms, volume holograms, and kinoforms.
  • holograms can either be generated optically directly or calculated in the computer.
  • diffractive structures may be included, in particular diffraction gratings.
  • Refractive structures such as Fresnel lenses or blazed gratings may be included. It may contain scattering elements, such as diffusers. Numerous other structures are described in the literature which may be contained in optically variable elements.
  • the various structures may be partially superimposed to accommodate two or more effects in the same region of the optically variable element.
  • the various structures can be used to design graphical elements such as guilloches, logos, images, lines, surfaces, etc.
  • textual elements can be designed, such as lettering, numeric or alphanumeric serial numbers, micro-typefaces.
  • functional elements can be designed, such as barcodes or other machine-readable structures.
  • Optical security elements can be manufactured in a replication process.
  • a master stamp with a special overall design is created in a complex manner.
  • Such master embossing dies can be produced in an electron beam lithography method or in a dot matrix method, wherein high resolutions can be achieved. In the case of electron beam lithography, resolutions of down to a few nanometers can be achieved. In the case of the dot matrix method or other interference methods, diffraction gratings with a lattice constant of down to a few 100 nanometers can be produced. From the master stamp can in turn daughter stamping be generated and of these more daughter stamping. The embossing dies are then used in an embossing process to emboss a larger amount of optically variable elements. In such an embossing process, the generated optically variable elements are substantially all the same.
  • WO 2014/127403 A1 discloses a method in which a carrier layer is provided with a continuous grid layer.
  • openings are introduced, which have a deeper and wider groove structure than the grid layer.
  • the grid layer and the openings are covered with a liquid crystal.
  • the molecules of the liquid crystal align themselves in the narrow grooves of the lattice layer while remaining unoriented in the openings.
  • Light falling on the surface is reflected polarized in the areas where the molecules are aligned and unpolarized in the other areas.
  • the different reflection behavior can be detected by means of a polarizer or polarized glasses.
  • the closest prior art is the font WO 2013/127650 A1 in which an anti-counterfeiting carrier with at least one metallized layer is disclosed, in which at least one optically variable element is introduced, wherein the at least one optically variable element has a non-individual embossed structure and the at least one optically variable element has an individual laser lithographic structure with a resolution of less than 20 ⁇ m.
  • the invention has for its object to make carriers with a series of optical security elements even more secure against counterfeiting and to provide a method for their preparation.
  • the term carrier is to be understood very generally here. These may be deformable strips, in particular a strip-like multilayer film, an adhesive tape or even rigid strips.
  • the wearers have in common that their length and width are significantly larger than their thickness.
  • the tamper-resistant carrier according to the invention can take various forms, in particular be multi-part, ie comprise a plurality of individual carrier units. In particular, they can be designed as self-adhesive labels or heat-sealing material.
  • the shape of the label or the form of a heat seal stamp can be arbitrary, for example circular, oval, polygonal with rounded corners, etc.
  • the overall design can also be designed as a long strip which is sealed to the substrate for an overall longer period. Such strips are known from tickets, tickets or banknotes ago.
  • the security against forgery of carriers of a series of optical security elements can be increased by adding an optical tilting effect to at least two, a plurality or each of the optical security elements.
  • This can be done according to the invention by a combination or combination of an embossed structure with a lithographic structure.
  • a series of optical security elements is arranged. Under a series at least two optical security elements are understood, it may also be three four or any higher number of security elements. These can all differ among themselves or some of them may be different.
  • the carrier is separable between the optical security elements, so that each individual optical security element can be used as a stickable or heat-sealable label, Holospot®, Priospot®, VeoMark® or the like. is reusable. In the case of a heat-sealing film for further processing in a sealing process, the separability is not necessary.
  • the carrier has at least one metallized layer, which may be a metallized foil or metallized lacquer. Other forms of the metallized layer are also conceivable.
  • the carrier can first be embossed and then metallized or vice versa.
  • the relief of the embossing is impressed into the metal layer.
  • the metal layer is not destroyed by the embossing and serves as a reflection layer. That of the embossed structure diffracted light is reflected back into the room.
  • the embossing of the metallized layer takes place by embossing a series of non-individual motifs, preferably of mutually identical or at least substantially identical motifs.
  • Each of the non-individual motifs forms part of each of the optical security elements.
  • a different component of the optical security element is the individual motif.
  • the individual motif is different for each security element of the series.
  • a series is understood here as an arrangement.
  • the series may be an array of security elements arranged side by side along the support.
  • the series has two, three or even more security elements or motifs.
  • the security elements of the series need not be arranged directly next to each other, other security elements may be arranged within the series.
  • the security elements may be linear or circular or otherwise juxtaposed.
  • a motif is considered to be individual if it differs in the series of optical security elements according to the invention from all the motifs of the other security elements or at least differs from most.
  • the individual motifs are different, preferably in pairs.
  • Such an individual motif may be a serial number or a barcode containing, inter alia, a serial number.
  • a non-individual motif is understood to mean the part of the optical security element which is stamped from a single master stamp in the production of a series of optical security elements of the non-individual motif. So the non-individual motif in each optical security element is the same or identical.
  • the non-individual motif of the embossed structure is destroyed or rendered invisible by the individual motif of the lithographic structure, since the diffracted light is not reflected back in the parts of the material demetallized in the lithographic processes. This creates the appearance that the non-individual motive of the Embossed structure is masked or overprinted by the individual motif of the laser lithographic structure.
  • the metallized layer is provided with a diffractive surface structure where the non-individual motif is embossed.
  • diffractive is to be understood here that the non-individual motif is occupied along its metallized surface with one or more diffraction gratings, so that depending on the viewing angle and lighting the non-individual motif is visible through an iridescence.
  • the diffraction gratings typically have lattice constants of 400 nm to several ⁇ m to efficiently diffract visible light.
  • the diffractive surface structure therefore makes use of the principle of diffraction of the incident light, wherein the light has diffraction maxima of different order at different reflection angles, so that when obliquely viewing the diffractive surface structure a rainbow-like iridescent effect coincides with the diffraction angles, but not all Viewing angles occurs.
  • the non-individual motif is superposed with an individual motif in the same metallized layer.
  • an individual motif is laser-lithographed and the individual motif has recesses, which are preferably not processed by laser lithography.
  • the recesses form at least a partial motif, but possibly also the entire non-individual motif, and the recesses are arranged in register on the individual motif.
  • a structure to be exposed is transferred into a substrate by means of a laser beam.
  • the structure to be exposed is specified or calculated by means of a computer and is available in the form of image or vector data.
  • the image or vector data is used by the laser lithograph to control the position of the laser beam relative to the substrate and to control the intensity and duration of the laser beam impinging on the substrate.
  • a writing beam can stand firmly in the room and the substrate can be moved relative to it. It can also be the substrate fixed in space and the writing beam are moved relative to this. Furthermore, both substrate and laser beam can be moved. It is also possible to modulate the writing beam by means of a surface light modulator and thus to expose a larger area of the substrate at once. Even with this principle, writing beam and substrate can be moved.
  • wavelengths are in the range of 0.2 .mu.m to 10 .mu.m, preferably in the range of 0.2 .mu.m to 1 .mu.m. Smaller wavelengths are also possible. At these wavelengths structures can be generated that are effective in the range of visible light (wavelength about 0.4 microns to 0.7 microns). Thus, diffraction gratings with lattice constants on the order of the visible light can be generated, which have large diffraction angles and therefore can be perceived particularly well.
  • Optical security elements produced by laser lithography can be fully customized in terms of design due to the production process. All structures can be designed individually. This can be done using numeric or alphanumeric serial numbers, or by individual graphic elements such as images or guilloches.
  • the wavelength, intensity, pulse duration, shape and writing energy of the laser beam can be adjusted so that the substrate material is demetallised at certain predefined locations and thus becomes transparent or semitransparent. This is done either by ablation of the metal layer, by shifting the metal layer towards the edges of the exposed area or by converting the metal layer into a transparent or semi-transparent oxide layer. There may also be a mixture of the three mentioned effects.
  • the demetallization can be aligned in register with the other structures that can be generated by laser lithography, since it can be introduced in the same exposure process.
  • gray values can be generated by suitable halftoning in a halftone process, wherein only a certain portion of the surface is demetallized in an area screened. In the case of gray value wedges, the demetallised surface area gradually increases due to the adaptation of the screening in the area.
  • laser lithography also makes it possible to reduce the thickness of the metal layer by precisely adjusting the introduced laser energy during the writing process. By reducing the thickness of the metal layer, the light transmission of the metal layer increases. This also allows gray values and gray wedges to be generated.
  • optical security elements with high-resolution laser lithography is subject to certain limitations.
  • the basic resolution is limited by the wavelength of the write laser used and by the optics used. Since high write speeds and thus high throughput are to be achieved in a mass production, it is desirable to further reduce the resolution, since then larger areas can be exposed in a shorter time.
  • Typical base resolutions used here are 0.5 ⁇ m to 5 ⁇ m. So it is to be assumed in the laser lithography of a limited resolution.
  • diffractive structures such. As grids or holograms, not all diffraction angles can be achieved by the limited resolution.
  • the phase or amplitude modulation to be achieved with laser lithography is not ideal in the material, so that the theoretically maximum possible diffraction efficiency of the diffractive structures is not achieved.
  • the individual motif is, for example, produced in such a way that the areas which make up the individual motif are processed by laser lithography so that the metallized layer is demetallised.
  • the motif is transparent, and it can under the metal layer dark or otherwise colored surfaces visually stand out, so that when viewing the optical security element, the individual motif is basically recognizable.
  • the individual motif has recesses. These are areas that are not treated by laser lithography, ie continue to be metallized and thus reflect the incident light. The idea is that the recesses occupy exactly the areas used by the non-individual motif of the embossed structure. This forms the at least one optical security element by superimposing the non-individual with the individual motif.
  • the non-individual motif has fine lines.
  • fine is meant here that the width of the line is less than 250 ⁇ m, preferably between 50 ⁇ m and 100 ⁇ m.
  • the line width is chosen so that the lines are still sufficiently wide to accommodate a diffractive structure and also to produce a diffraction effect.
  • the area occupation of the non-individual motif should be low, preferably below 25%.
  • the diffractive surface structure of the metallized layer preferably remains completely unchanged even by the individual motif applied by laser lithography.
  • the non-individual motif may be a pattern of fine lines, such as: As concentric rings or a check pattern there are.
  • the non-individual motif can be a letter, a word, a logo or a symbol. If the motif contains larger areas, only the outlines of these areas should form the motif so that the motif is composed entirely of fine lines.
  • the invention is based on the fact that both the non-individual and the individual motif remain recognizable in at least one optical security element.
  • the arrangement described above surprisingly produces a kind of tilting effect for the viewer of the optical security element.
  • the individual motif of the laser lithographic structure comes to the fore and is almost trouble-free readable for a human observer, as if the recesses were not present , This is because the recesses are virtually unnoticeable by the small line width of the non-individual motif to the viewer.
  • the non-individual motif of the embossment structure comes to the fore and seems to be above the individual motif of the laser lithographic structure for the human observer .
  • the two views change when the optical security element is tilted.
  • a resolution of a laser-lithographic one Method necessary to apply the recesses in the order of less than 250 microns on the other hand, a very good registration between the non-individual motifs and the individual motifs is necessary.
  • the position of the non-individual motif must be recorded during the manufacturing process, for. B. by means of a registration mark, and the individual motif must be introduced by means of the laser-lithographic process according to the recorded position registration into the metallized layer.
  • the non-individual motif is partially destroyed or made invisible by the individual motif of the laser lithographic process, and the tilting effect is not or at least not fully effective.
  • production tolerances can occur, ie slight register errors between the non-individual motif of the embossed structure and the individual motif of the laser lithographic structure destroy the tilting effect.
  • Such production tolerances are preferably taken into account in the design of the security elements.
  • the maximum registration error of the production process between the two motifs is known, then the maximum registration deviation of the line width of the non-individual motif of the embossed structure can be opened.
  • the line width is increased by the amount of the maximum deviation.
  • the recesses of the laser lithographic structure retain their original width and are thus designed as if the lines of the non-individual motif of the embossed structure had not been broadened at all.
  • the recesses still have the line of the non-individual motif of the embossed structure.
  • the tilt effect remains effective.
  • the disadvantage of this is, of course, that the lines are widened. However, this method and the line broadening can still compensate for smaller register deviations.
  • the register deviations should be in the range of +/- 100 ⁇ m, preferably +/- 50 ⁇ m.
  • the register deviation is added to the width of the recesses of the laser lithographic structure.
  • the larger recesses still have the non-individual line Motive of the embossed structure available. Again, the tipping effect remains effective.
  • the object is achieved by a method for producing a tamper-resistant carrier with at least one optical security element in that the optical security element generates a tilting optical effect by embossing a non-individual motif into a metallized layer and thereby forming a diffractive surface structure on the non-individual motif is generated and an individual motif is laser lithographically introduced into the metallized layer and thereby recesses are generated in the individual motif, which form at least a partial motif of the non-individual motif.
  • the recesses are arranged in registration on the non-individual motif.
  • a non-individual motif for example in the form of concentric rings, another mathematical pattern or a logo, is first embossed in the metallized layer.
  • a stamp preferably a master embossing die is used, which permanently imprints non-individual motifs in the metallized layer, for example along an elongate support at specific intervals.
  • the stamp is worked so accurately that in the metallized layer, a surface structure is introduced, which generates a diffraction grating in visible light or generates a superposition of multiple diffraction gratings in the visible light.
  • the diffraction grating results in a dazzling effect and the visibility of the non-individual subject at certain viewing angles corresponding to the diffraction angle of different order.
  • a further, but individual motif is then laser-lithographed in the same metallized layer.
  • the metallized layer is laser-lithographically treated so as to preserve the surface structure of the non-individual motif and, as it were, to laser-lithograph only the spaces between the concentric lines or other lines of the non-individual motif.
  • the lines of the individual motif and the areas of the individual motif, which are laser-lithographically treated, are significantly larger in their dimensions, ie in the millimeter range and thus when viewing the optical security element outside the diffraction angle is visibly visible.
  • FIGS. 1a to 1d show various successive incorporated in a metallized layer motifs 1, 2.
  • the metallized layer and a support for the metallized layer are not shown in the figures.
  • Fig. 1a shows an individual motif 1 in the form of the letter "A", which is to be introduced in a conventional laser lithographic process in the metallized layer.
  • Fig. 1b shows a non-individual motif 2 in the form of five concentric rings, each having a line width of 220 microns, in a conventional embossing process in the same metallized layer are formed.
  • a diffractive surface 3 is produced on the metallized layer, which is not shown.
  • This diffractive surface 3 is characterized in that one or more diffraction gratings for visible light are formed on the surface of the metallized layer in the region of the non-individual motif 2.
  • the diffraction gratings typically have lattice constants of 400 nm to several ⁇ m to efficiently diffract visible light.
  • the recesses of the diffraction gratings are usually several 100 nm deep.
  • Fig. 1c shows the individual motif 1 with recesses 4 introduced into the metallized layer.
  • the recesses 4 are formed in the form of sections or parts of the five concentric rings, and the sub-motif of the five concentric rings corresponds exactly to a sub-motif of the five concentric rings of the non-individual motif 2, the in Fig. 1b are shown.
  • Fig. 1c the dark marked areas of the letter “A” are laserlithographically treated, the recesses 4 and the area around the letter “A” and the inner triangle of the letter “A” are not laser lithographically treated, ie the untreated areas of the individual motif 1 metallized further, and the laser lithographically treated dark areas are demetallized and do not reflect the incident light. They are in Fig. 1c shown in white.
  • the metallized layer is viewed by a viewer from the outside, the demetallized areas of the individual subject 1 appear in the color of the background of the layer because the metal layer becomes transparent in this area.
  • a contrasting, dark background is used. Since the demetallized surfaces are significantly larger than the metallized remaining recesses 4, the letter "A" remains clearly visible.
  • Fig. 1d shows the superposition of the two motifs 1, 2 in the same metallized layer.
  • the non-individual motif 2 of the embossed structure with the five concentric rings and the individual motif 1 of the lithographic structure with the letter "A" and the recesses 4 are matched in registration, so that the recesses 4 exactly from the corresponding sections of the five concentric rings fill out.
  • the superimposed non-individual and the individual motive 2, 1 according to Fig. 1d are incorporated together as an optical security element 6 in the carrier.
  • the letter "A” can be varied as an individual motif 1 for each other optical security element 6 of a sequence, while the non-individual motifs 2, the five concentric rings, remain the same for each of the optical security elements 6 of the sequence.
  • the laser-lithograph individual motif 1 appears in the foreground since it is significantly more contrastive and prominent than the non-individual motif 2 which does not dazzle outside of the diffraction angle
  • the interruptions and / or recesses 4 of the laser-lithographic individual motif 1 are not noticeable, since the recesses 4 are very fine and are less than 250 ⁇ m in width, preferably each width, along their radial circumference. Since the iridescence of the non-individual motif 2 depends on the illumination and viewing angle, a tilting effect between the two motifs 1, 2 can be achieved by tilting the optical security element 6.
  • FIGS. 2a to 2d show an arrangement as in the FIGS. 1a to 1d , with the difference that the individual motif 1 is designed as a data matrix code.
  • the non-individual motif 2 is again an arrangement of five concentric rings.
  • the tilt effect and the manufacturing process correspond to those of FIGS. 1 to 1d , Otherwise, the same reference numerals correspond to the same features.
  • the Fig. 3 schematically shows the principal problem of tolerances of the embossing and lithography process.
  • the embossed structure is usually firstly pressed into the metallized layer at a distance, for example, along the carrier, and thus a series of identical non-individual motifs 2 is produced. Thereafter, an individual motif 1 with the corresponding recesses 4 is laserlithographically applied to the non-individual motifs 2 in the carriers already processed.
  • the laser lithographic process must be carried out with register accuracy on the non-individual motifs 2. Exact registration accuracy, however, is virtually impossible to produce, so that after the implementation of the laser lithographic process, as a rule, the optical security element 6 according to FIG Fig. 3 arises, in which an offset between the individual motif 1 and the non-individual motif 2 occurs, ie the five concentric rings are not exactly in the recesses 4 of the individual motif 1 arranged, but somewhat offset. The tilt effect does not work anymore.
  • FIGS. 4a to 4d is a first way listed to compensate for the registration error by the described production tolerances.
  • register marks are arranged at the edge of the carrier structure during the embossing process, and the register marks are read in during the subsequent laser lithographic process and the laser lithographic process is exactly aligned on the basis of the register marks, nevertheless production tolerances arise, as in US Pat Fig. 3 shown.
  • the lines of the non-individual motif 2 are evenly widened by a register deviation along their entire circumference.
  • the lines broadened by the register deviation are in Fig. 4b shown.
  • the laser lithographic individual motif 1 according to Fig. 1a and Fig. 1c is in the aforementioned laser lithographic process produced with an ideal width of the recesses 4. If the two motifs 1, 2 are arranged one above the other, appear in the recesses 4 of the individual motif 1 despite the registration error still completely the diffractive surfaces 3 of non-individual motifs 2 according to Fig. 4d , The different line strengths inside and outside the laser-lithograph individual motif 1 are not noticeable to the viewer.
  • FIG. 5a to 5d an alternative embodiment of the optical security element 6 according to the invention is shown, in which also the registration error of the laser lithographic process is taken into account by the embossing process.
  • the registration error of the laser lithographic process is taken into account by the embossing process.
  • the recesses 4 of the laser-lithographically produced individual motif 1 in Fig. 5c are widened by the registration error, so that according to Fig. 5d Even with a deviation or an offset of the motifs 1, 2, the five concentric rings and thus the diffractive surface 3 are still completely contained in the recesses 4 and remain visible and thus produce the desired tilting effect.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • General Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Credit Cards Or The Like (AREA)

Claims (14)

  1. Support infalsifiable présentant une série d'éléments de sécurité optiques (6) et une couche métallisée dans laquelle, pour au moins deux des éléments de sécurité optiques (6), un motif non individuel (2) respectif pourvu d'une surface diffractante (3) est imprimé par gaufrage
    et dans laquelle un motif individuel (1) respectif est introduit par lithographie laser,
    caractérisé en ce que le motif individuel (1) présente des évidements (4) qui forment au moins un motif partiel du motif non individuel (2) et qui sont placés avec précision sur le motif non individuel (2), et lesdits au moins deux éléments de sécurité optiques (6) présentent chacun un effet optique d'image latente entre le motif individuel (1) et le motif non individuel (2).
  2. Support infalsifiable selon la revendication 1, caractérisé en ce que le motif individuel (1) se détache au premier plan par effet d'image latente sous des angles de vue déterminés et, sous d'autres angles de vue, le motif non individuel (2) se détache au premier plan et apparaît superposé au motif individuel (1).
  3. Support infalsifiable selon la revendication 1 ou 2, caractérisé en ce que le motif non individuel (2) présente des lignes fines.
  4. Support infalsifiable selon la revendication 3, caractérisé en ce que la largeur des lignes fines est inférieure à 250 µm.
  5. Support infalsifiable selon l'une des revendications précédentes, caractérisé en ce que les évidements (4) sont élargis d'une valeur d'un écart d'alignement.
  6. Support infalsifiable selon l'une des revendications 1 à 4, caractérisé en ce que les lignes du motif non individuel (2) sont élargies de la valeur de l'écart d'alignement.
  7. Support infalsifiable selon l'une des revendications précédentes, caractérisé en ce que le motif non individuel (2) comprend un logo, un dessin, une écriture, un symbole ou un motif régulier.
  8. Support infalsifiable selon l'une des revendications précédentes, caractérisé en ce que le motif individuel (1) est un texte, en particulier un numéro de série ou la partie d'un numéro de série.
  9. Support infalsifiable selon l'une des revendications précédentes, caractérisé en ce que le motif individuel (1) est un code à barres, en particulier un code Datamatrix ou un code QR.
  10. Support infalsifiable selon l'une des revendications précédentes, caractérisé en ce que les motifs non individuels (2) de la série sont identiques et les motifs individuels (1) de la série sont différents les uns des autres.
  11. Procédé de fabrication d'un support infalsifiable présentant une série d'éléments de sécurité optiques (6), dont au moins deux produisent chacun un effet optique d'image latente, en imprimant par gaufrage des motifs non individuels (2) dans une couche métallisée et en créant ainsi une surface diffractante (3) sur les motifs non individuels (2), en introduisant des motifs individuels (1) par lithographique laser dans la couche métallisée et en créant des évidements (4) dans les motifs individuels (1), qui forment chacun au moins un motif partiel du motif non individuel (2) et qui sont placés avec précision sur le motif non individuel (2).
  12. Procédé selon la revendication 11, caractérisé en ce que les évidements (4) sont élargis d'une valeur d'un écart d'alignement.
  13. Procédé selon la revendication 11, caractérisé en ce que les lignes du motif non individuel (2) sont élargies de la valeur de l'écart d'alignement.
  14. Procédé selon l'une des revendications 11 à 13, caractérisé en ce que les motifs non individuels (2) sont réalisés lors d'un processus de réplication en masse au moyen d'une matrice.
EP16729563.3A 2015-06-15 2016-06-15 Étiquette de sécurité à effet d'image latente Active EP3307551B1 (fr)

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DE102015210982.8A DE102015210982A1 (de) 2015-06-15 2015-06-15 Sicherheitsetikett mit Kippeffekt
PCT/EP2016/063716 WO2016202840A1 (fr) 2015-06-15 2016-06-15 Étiquette de sécurité à effet d'image latente

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DE102018004062A1 (de) * 2018-05-18 2019-11-21 Giesecke+Devrient Currency Technology Gmbh Sicherheitselement mit Mikroreflektoren

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DE102005003958A1 (de) * 2005-01-27 2006-08-03 Giesecke & Devrient Gmbh Sicherheitselement und Verfahren zu seiner Herstellung
DE102005007749A1 (de) 2005-02-18 2006-08-31 Giesecke & Devrient Gmbh Sicherheitselement und Verfahren zu seiner Herstellung
DE102005028162A1 (de) * 2005-02-18 2006-12-28 Giesecke & Devrient Gmbh Sicherheitselement und Verfahren zu seiner Herstellung
DE102005027380B4 (de) * 2005-06-14 2009-04-30 Ovd Kinegram Ag Sicherheitsdokument
DE102008058397A1 (de) * 2008-11-21 2010-05-27 Giesecke & Devrient Gmbh Wertdokument mit matten und glänzenden Oberflächenbereichen und Verfahren zu seiner Herstellung
CN101905588A (zh) * 2009-06-03 2010-12-08 中国人民银行印制科学技术研究所 具有多重防伪功能的光变防伪元件
DE102009040975A1 (de) * 2009-09-11 2011-03-24 Ovd Kinegram Ag Mehrschichtkörper
AU2011100315B4 (en) 2011-03-22 2011-09-08 Innovia Security Pty Ltd Security element
DE102011117677A1 (de) 2011-11-04 2013-05-08 Giesecke & Devrient Gmbh Optisch variables Sicherheitselement
DE102012203350A1 (de) * 2012-03-02 2013-09-05 Tesa Scribos Gmbh Sicherheitsetikett und ein Verfahren zu seiner Herstellung
DE102012219473A1 (de) 2012-10-24 2014-05-08 Tesa Scribos Gmbh Vorrichtung und Verfahren zur Herstellung von Sicherheitsetiketten und Sicherheitsetiketten
US20150360500A1 (en) * 2013-02-19 2015-12-17 Innovia Security Pty Ltd Security Device with Covert Images
JP2015074190A (ja) 2013-10-10 2015-04-20 大日本印刷株式会社 セキュリティカード用転写原版の製造方法およびセキュリティカードの製造方法

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US20180186168A1 (en) 2018-07-05
WO2016202840A1 (fr) 2016-12-22
CN107771129A (zh) 2018-03-06
US10618341B2 (en) 2020-04-14
DE102015210982A1 (de) 2016-12-15
EP3307551A1 (fr) 2018-04-18
CN107771129B (zh) 2020-02-07

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