EP3307551B1 - Security label with tilt effect - Google Patents

Description

The invention relates to a tamper-proof carrier with a series of optical security elements. The invention also relates to a method for producing a counterfeit-proof carrier with a series of optical security elements.

As counterfeit protection for products, documents and passes optically variable elements are used. Optical security elements contain very high-resolution structures that produce special optical effects. Such structures are difficult to copy and usually can not be displayed with normal printing technology. Optical security elements may include structures that are visible and verifiable to the naked eye, as well as structures that are verifiable with either simple or special readers. Optical security elements are widely known and used in a variety of ways. The optical security elements include z. Holograms, kinegrams and lithographs. The structures contained in optically variable elements may be holograms, specifically rainbow holograms, transmission holograms, reflection holograms, 2D holograms, 3D holograms, Fourier holograms, Fresnel holograms, volume holograms, and kinoforms. Such holograms can either be generated optically directly or calculated in the computer. Furthermore, diffractive structures may be included, in particular diffraction gratings. Refractive structures such as Fresnel lenses or blazed gratings may be included. It may contain scattering elements, such as diffusers. Numerous other structures are described in the literature which may be contained in optically variable elements. The various structures may be partially superimposed to accommodate two or more effects in the same region of the optically variable element. The various structures can be used to design graphical elements such as guilloches, logos, images, lines, surfaces, etc. Furthermore, textual elements can be designed, such as lettering, numeric or alphanumeric serial numbers, micro-typefaces. Furthermore, functional elements can be designed, such as barcodes or other machine-readable structures. The various structures and elements are skilfully combined to form an overall optical security element design which, if possible, meets all the safety, functionality and aesthetic appeal requirements of the optical security element.

Optical security elements can be manufactured in a replication process. For this purpose, a master stamp with a special overall design is created in a complex manner. Such master embossing dies can be produced in an electron beam lithography method or in a dot matrix method, wherein high resolutions can be achieved. In the case of electron beam lithography, resolutions of down to a few nanometers can be achieved. In the case of the dot matrix method or other interference methods, diffraction gratings with a lattice constant of down to a few 100 nanometers can be produced. From the master stamp can in turn daughter stamping be generated and of these more daughter stamping. The embossing dies are then used in an embossing process to emboss a larger amount of optically variable elements. In such an embossing process, the generated optically variable elements are substantially all the same.

In the WO 2014/127403 A1 discloses a method in which a carrier layer is provided with a continuous grid layer. In the grid layer openings are introduced, which have a deeper and wider groove structure than the grid layer. Subsequently, the grid layer and the openings are covered with a liquid crystal. The molecules of the liquid crystal align themselves in the narrow grooves of the lattice layer while remaining unoriented in the openings. Light falling on the surface is reflected polarized in the areas where the molecules are aligned and unpolarized in the other areas. The different reflection behavior can be detected by means of a polarizer or polarized glasses.

The closest prior art is the font WO 2013/127650 A1 in which an anti-counterfeiting carrier with at least one metallized layer is disclosed, in which at least one optically variable element is introduced, wherein the at least one optically variable element has a non-individual embossed structure and the at least one optically variable element has an individual laser lithographic structure with a resolution of less than 20 μm.

The invention has for its object to make carriers with a series of optical security elements even more secure against counterfeiting and to provide a method for their preparation.

The object is achieved with respect to the carrier by a tamper-proof carrier with the features of claim 1. Preferred developments are the subject of the dependent product claims.

The term carrier is to be understood very generally here. These may be deformable strips, in particular a strip-like multilayer film, an adhesive tape or even rigid strips. The wearers have in common that their length and width are significantly larger than their thickness. The tamper-resistant carrier according to the invention can take various forms, in particular be multi-part, ie comprise a plurality of individual carrier units. In particular, they can be designed as self-adhesive labels or heat-sealing material. The shape of the label or the form of a heat seal stamp can be arbitrary, for example circular, oval, polygonal with rounded corners, etc. In the case of the heat seal material, the overall design can also be designed as a long strip which is sealed to the substrate for an overall longer period. Such strips are known from tickets, tickets or banknotes ago.

Surprisingly, it has been found that the security against forgery of carriers of a series of optical security elements can be increased by adding an optical tilting effect to at least two, a plurality or each of the optical security elements. This can be done according to the invention by a combination or combination of an embossed structure with a lithographic structure. Along the carrier a series of optical security elements is arranged. Under a series at least two optical security elements are understood, it may also be three four or any higher number of security elements. These can all differ among themselves or some of them may be different. Preferably, the carrier is separable between the optical security elements, so that each individual optical security element can be used as a stickable or heat-sealable label, Holospot®, Priospot®, VeoMark® or the like. is reusable. In the case of a heat-sealing film for further processing in a sealing process, the separability is not necessary.

The carrier has at least one metallized layer, which may be a metallized foil or metallized lacquer. Other forms of the metallized layer are also conceivable.

The carrier can first be embossed and then metallized or vice versa. The relief of the embossing is impressed into the metal layer. The metal layer is not destroyed by the embossing and serves as a reflection layer. That of the embossed structure diffracted light is reflected back into the room. The embossing of the metallized layer takes place by embossing a series of non-individual motifs, preferably of mutually identical or at least substantially identical motifs. Each of the non-individual motifs forms part of each of the optical security elements. A different component of the optical security element is the individual motif. The individual motif is different for each security element of the series.

A series is understood here as an arrangement. The series may be an array of security elements arranged side by side along the support. The series has two, three or even more security elements or motifs. However, the security elements of the series need not be arranged directly next to each other, other security elements may be arranged within the series. The security elements may be linear or circular or otherwise juxtaposed.

The tilting effect between the non-individual and the individual motif of each security element is reflected in the fact that under certain viewing angles the individual motif comes to the fore for the viewer and at other viewing angles the non-individual motif comes to the fore and the individual Motif overlaid appears.

A motif is considered to be individual if it differs in the series of optical security elements according to the invention from all the motifs of the other security elements or at least differs from most. The individual motifs are different, preferably in pairs. Such an individual motif may be a serial number or a barcode containing, inter alia, a serial number. A non-individual motif is understood to mean the part of the optical security element which is stamped from a single master stamp in the production of a series of optical security elements of the non-individual motif. So the non-individual motif in each optical security element is the same or identical. According to the prior art, the non-individual motif of the embossed structure is destroyed or rendered invisible by the individual motif of the lithographic structure, since the diffracted light is not reflected back in the parts of the material demetallized in the lithographic processes. This creates the appearance that the non-individual motive of the Embossed structure is masked or overprinted by the individual motif of the laser lithographic structure.

According to the invention, the metallized layer is provided with a diffractive surface structure where the non-individual motif is embossed. By diffractive is to be understood here that the non-individual motif is occupied along its metallized surface with one or more diffraction gratings, so that depending on the viewing angle and lighting the non-individual motif is visible through an iridescence. The diffraction gratings typically have lattice constants of 400 nm to several μm to efficiently diffract visible light. The diffractive surface structure therefore makes use of the principle of diffraction of the incident light, wherein the light has diffraction maxima of different order at different reflection angles, so that when obliquely viewing the diffractive surface structure a rainbow-like iridescent effect coincides with the diffraction angles, but not all Viewing angles occurs.

According to the invention, the non-individual motif is superposed with an individual motif in the same metallized layer. In the metallized layer, an individual motif is laser-lithographed and the individual motif has recesses, which are preferably not processed by laser lithography. The recesses form at least a partial motif, but possibly also the entire non-individual motif, and the recesses are arranged in register on the individual motif.

Under precise register is understood here that the individual and the non-individual motives of a security element are arranged exactly or even to passer deviations exactly to each other. The motifs can be shifted from security element to security element at most by the registration error relative to each other. The size of the registration error, which is also called register offset, will be discussed below.

In laser lithography, a structure to be exposed is transferred into a substrate by means of a laser beam. The structure to be exposed is specified or calculated by means of a computer and is available in the form of image or vector data. The image or vector data is used by the laser lithograph to control the position of the laser beam relative to the substrate and to control the intensity and duration of the laser beam impinging on the substrate. In laser lithography Several methods have been established. Thus, a writing beam can stand firmly in the room and the substrate can be moved relative to it. It can also be the substrate fixed in space and the writing beam are moved relative to this. Furthermore, both substrate and laser beam can be moved. It is also possible to modulate the writing beam by means of a surface light modulator and thus to expose a larger area of the substrate at once. Even with this principle, writing beam and substrate can be moved.

In laser lithography, the resolution is limited by the wavelength used and the optics used. In order to be able to generate as high-resolution structures as possible, therefore, preferably small wavelengths are used. Suitable wavelengths are in the range of 0.2 .mu.m to 10 .mu.m, preferably in the range of 0.2 .mu.m to 1 .mu.m. Smaller wavelengths are also possible. At these wavelengths structures can be generated that are effective in the range of visible light (wavelength about 0.4 microns to 0.7 microns). Thus, diffraction gratings with lattice constants on the order of the visible light can be generated, which have large diffraction angles and therefore can be perceived particularly well.

Optical security elements produced by laser lithography can be fully customized in terms of design due to the production process. All structures can be designed individually. This can be done using numeric or alphanumeric serial numbers, or by individual graphic elements such as images or guilloches.

As the substrate material for the laser lithography, as with the embossed optical security elements, metallized films or metallized paints are used inter alia. In this case, the wavelength, intensity, pulse duration, shape and writing energy of the laser beam can be adjusted so that the substrate material is demetallised at certain predefined locations and thus becomes transparent or semitransparent. This is done either by ablation of the metal layer, by shifting the metal layer towards the edges of the exposed area or by converting the metal layer into a transparent or semi-transparent oxide layer. There may also be a mixture of the three mentioned effects. The demetallization can be aligned in register with the other structures that can be generated by laser lithography, since it can be introduced in the same exposure process. Since the demetallization in laser lithography in principle with the high resolution of the laser lithographic Process takes place, so that high-resolution demetallized structures can be generated. These include micro-typefaces, scattering structures, gray values or gray value wedges. Such gray values can be generated by suitable halftoning in a halftone process, wherein only a certain portion of the surface is demetallized in an area screened. In the case of gray value wedges, the demetallised surface area gradually increases due to the adaptation of the screening in the area.

In addition to complete demetallization, laser lithography also makes it possible to reduce the thickness of the metal layer by precisely adjusting the introduced laser energy during the writing process. By reducing the thickness of the metal layer, the light transmission of the metal layer increases. This also allows gray values and gray wedges to be generated.

The production of optical security elements with high-resolution laser lithography is subject to certain limitations. Thus, the basic resolution is limited by the wavelength of the write laser used and by the optics used. Since high write speeds and thus high throughput are to be achieved in a mass production, it is desirable to further reduce the resolution, since then larger areas can be exposed in a shorter time. Typical base resolutions used here are 0.5 μm to 5 μm. So it is to be assumed in the laser lithography of a limited resolution. In the production of diffractive structures, such. As grids or holograms, not all diffraction angles can be achieved by the limited resolution. Furthermore, the phase or amplitude modulation to be achieved with laser lithography is not ideal in the material, so that the theoretically maximum possible diffraction efficiency of the diffractive structures is not achieved.

The individual motif is, for example, produced in such a way that the areas which make up the individual motif are processed by laser lithography so that the metallized layer is demetallised. As a result, the motif is transparent, and it can under the metal layer dark or otherwise colored surfaces visually stand out, so that when viewing the optical security element, the individual motif is basically recognizable. According to the invention, however, the individual motif has recesses. These are areas that are not treated by laser lithography, ie continue to be metallized and thus reflect the incident light. The idea is that the recesses occupy exactly the areas used by the non-individual motif of the embossed structure. This forms the at least one optical security element by superimposing the non-individual with the individual motif.

Preferably, the non-individual motif has fine lines. By fine is meant here that the width of the line is less than 250 μm, preferably between 50 μm and 100 μm. The line width is chosen so that the lines are still sufficiently wide to accommodate a diffractive structure and also to produce a diffraction effect. The area occupation of the non-individual motif should be low, preferably below 25%. The diffractive surface structure of the metallized layer preferably remains completely unchanged even by the individual motif applied by laser lithography.

The non-individual motif may be a pattern of fine lines, such as: As concentric rings or a check pattern there are. The non-individual motif can be a letter, a word, a logo or a symbol. If the motif contains larger areas, only the outlines of these areas should form the motif so that the motif is composed entirely of fine lines.

The invention is based on the fact that both the non-individual and the individual motif remain recognizable in at least one optical security element. The arrangement described above surprisingly produces a kind of tilting effect for the viewer of the optical security element. In a viewing angle and in an illumination in which the non-individual motif of the embossed structure does not dazzle, the individual motif of the laser lithographic structure comes to the fore and is almost trouble-free readable for a human observer, as if the recesses were not present , This is because the recesses are virtually unnoticeable by the small line width of the non-individual motif to the viewer.

However, at a viewing angle and with illumination in which the non-individual motif of the embossment pattern dazzles, the non-individual motif of the embossment structure comes to the fore and seems to be above the individual motif of the laser lithographic structure for the human observer , The two views change when the optical security element is tilted.

In order to produce the counterfeit-proof carrier according to the invention with at least one optical security element, on the one hand a resolution of a laser-lithographic one Method necessary to apply the recesses in the order of less than 250 microns, on the other hand, a very good registration between the non-individual motifs and the individual motifs is necessary. For this purpose, the position of the non-individual motif must be recorded during the manufacturing process, for. B. by means of a registration mark, and the individual motif must be introduced by means of the laser-lithographic process according to the recorded position registration into the metallized layer.

If the register accuracy is not given in the production, the non-individual motif is partially destroyed or made invisible by the individual motif of the laser lithographic process, and the tilting effect is not or at least not fully effective. During production, production tolerances can occur, ie slight register errors between the non-individual motif of the embossed structure and the individual motif of the laser lithographic structure destroy the tilting effect. Such production tolerances are preferably taken into account in the design of the security elements.

If the maximum registration error of the production process between the two motifs is known, then the maximum registration deviation of the line width of the non-individual motif of the embossed structure can be opened. The line width is increased by the amount of the maximum deviation. However, the recesses of the laser lithographic structure retain their original width and are thus designed as if the lines of the non-individual motif of the embossed structure had not been broadened at all. In the manufacturing process, if the position of the individual motif of the laser lithographic structure deviates from the position of the non-individual motif of the embossed structure, the recesses still have the line of the non-individual motif of the embossed structure. The tilt effect remains effective. The disadvantage of this is, of course, that the lines are widened. However, this method and the line broadening can still compensate for smaller register deviations. The register deviations should be in the range of +/- 100 μm, preferably +/- 50 μm.

In order to take account of the manufacturing tolerances in the design of the motifs, alternatively the register deviation is added to the width of the recesses of the laser lithographic structure. In the manufacturing process, if the position of the individual motif of the laser lithographic structure deviates from the position of the non-individual motif of the embossed structure, the larger recesses still have the non-individual line Motive of the embossed structure available. Again, the tipping effect remains effective.

The high resolution of the laser lithography process and the high demands on the register accuracy represent a major obstacle to the forgery of the optical security elements.

With regard to the method, the object is achieved by a method having the features of claim 11.

The object is achieved by a method for producing a tamper-resistant carrier with at least one optical security element in that the optical security element generates a tilting optical effect by embossing a non-individual motif into a metallized layer and thereby forming a diffractive surface structure on the non-individual motif is generated and an individual motif is laser lithographically introduced into the metallized layer and thereby recesses are generated in the individual motif, which form at least a partial motif of the non-individual motif. The recesses are arranged in registration on the non-individual motif. In the process, a non-individual motif, for example in the form of concentric rings, another mathematical pattern or a logo, is first embossed in the metallized layer. For this purpose, a stamp, preferably a master embossing die is used, which permanently imprints non-individual motifs in the metallized layer, for example along an elongate support at specific intervals. The stamp is worked so accurately that in the metallized layer, a surface structure is introduced, which generates a diffraction grating in visible light or generates a superposition of multiple diffraction gratings in the visible light. The diffraction grating results in a dazzling effect and the visibility of the non-individual subject at certain viewing angles corresponding to the diffraction angle of different order.

Preferably, a further, but individual motif is then laser-lithographed in the same metallized layer. However, the metallized layer is laser-lithographically treated so as to preserve the surface structure of the non-individual motif and, as it were, to laser-lithograph only the spaces between the concentric lines or other lines of the non-individual motif. The lines of the individual motif and the areas of the individual motif, which are laser-lithographically treated, are significantly larger in their dimensions, ie in the millimeter range and thus when viewing the optical security element outside the diffraction angle is visibly visible.

Fign. 1a bis 1d

ein Grundprinzip eines Aufbaus eines erfindungsgemäßen fälschungssicheren Trägers mit einem optischen Sicherheitselement,

Fign. 2a bis 2d

ein optisches Sicherheitselement bestehend aus QR-Code und konzentrischen Ringen,

Fig. 3

ein übereinandergelagertes nicht-individuelles und individuelles Motiv mit einem Passerversatz,

Fign. 4a bis 4d

einen Träger mit einem Sicherheitselement mit einem nicht-individuellen Motiv, dessen konzentrische Ringe breiter als die Breite der Aussparungen des individuellen Motivs sind,

Fign. 5a bis 5d

einen Träger mit einem Sicherheitselement mit einem individuellen Motiv, dessen Aussparungen breiter als die konzentrischen Ringe des nicht- individuellen Motivs sind.

The invention will be described with reference to four embodiments in seventeen figures, in which:

FIGS. 1a to 1d

a basic principle of a structure of a tamper resistant carrier according to the invention with an optical security element,

FIGS. 2a to 2d

an optical security element consisting of a QR code and concentric rings,

Fig. 3

a superimposed non-individual and individual motif with a Passerversatz,

FIGS. 4a to 4d

a carrier having a security element with a non-individual motif whose concentric rings are wider than the width of the recesses of the individual motif,

FIGS. 5a to 5d

a carrier with a security element with an individual motif whose recesses are wider than the concentric rings of the non-individual motif.

The FIGS. 1a to 1d show various successive incorporated in a metallized layer motifs 1, 2. The metallized layer and a support for the metallized layer are not shown in the figures.

Fig. 1a shows an individual motif 1 in the form of the letter "A", which is to be introduced in a conventional laser lithographic process in the metallized layer.

Fig. 1b shows a non-individual motif 2 in the form of five concentric rings, each having a line width of 220 microns, in a conventional embossing process in the same metallized layer are formed. In addition, when the non-individual motif 2 is impressed in the metallized layer, a diffractive surface 3 is produced on the metallized layer, which is not shown. This diffractive surface 3 is characterized in that one or more diffraction gratings for visible light are formed on the surface of the metallized layer in the region of the non-individual motif 2. The diffraction gratings typically have lattice constants of 400 nm to several μm to efficiently diffract visible light. The recesses of the diffraction gratings are usually several 100 nm deep.

Fig. 1c shows the individual motif 1 with recesses 4 introduced into the metallized layer. The recesses 4 are formed in the form of sections or parts of the five concentric rings, and the sub-motif of the five concentric rings corresponds exactly to a sub-motif of the five concentric rings of the non-individual motif 2, the in Fig. 1b are shown.

In Fig. 1c the dark marked areas of the letter "A" are laserlithographically treated, the recesses 4 and the area around the letter "A" and the inner triangle of the letter "A" are not laser lithographically treated, ie the untreated areas of the individual motif 1 metallized further, and the laser lithographically treated dark areas are demetallized and do not reflect the incident light. They are in Fig. 1c shown in white. When the metallized layer is viewed by a viewer from the outside, the demetallized areas of the individual subject 1 appear in the color of the background of the layer because the metal layer becomes transparent in this area. Preferably, a contrasting, dark background is used. Since the demetallized surfaces are significantly larger than the metallized remaining recesses 4, the letter "A" remains clearly visible.

Fig. 1d shows the superposition of the two motifs 1, 2 in the same metallized layer. The non-individual motif 2 of the embossed structure with the five concentric rings and the individual motif 1 of the lithographic structure with the letter "A" and the recesses 4 are matched in registration, so that the recesses 4 exactly from the corresponding sections of the five concentric rings fill out. The superimposed non-individual and the individual motive 2, 1 according to Fig. 1d are incorporated together as an optical security element 6 in the carrier. The letter "A" can be varied as an individual motif 1 for each other optical security element 6 of a sequence, while the non-individual motifs 2, the five concentric rings, remain the same for each of the optical security elements 6 of the sequence.

When the optical security element 6 according to Fig. 1d Viewed with the naked eye, the non-individual motif 2 of the embossed structure appears dazzling in the foreground when looking at the security element 6 under appropriate illumination at a corresponding angle. The five concentric rings dazzle. If the security element 6 is viewed at an angle which does not correspond to one of the diffraction angles of the diffractive surface 3, the laser-lithograph individual motif 1 appears in the foreground since it is significantly more contrastive and prominent than the non-individual motif 2 which does not dazzle outside of the diffraction angle The interruptions and / or recesses 4 of the laser-lithographic individual motif 1 are not noticeable, since the recesses 4 are very fine and are less than 250 μm in width, preferably each width, along their radial circumference. Since the iridescence of the non-individual motif 2 depends on the illumination and viewing angle, a tilting effect between the two motifs 1, 2 can be achieved by tilting the optical security element 6.

FIGS. 2a to 2d show an arrangement as in the FIGS. 1a to 1d , with the difference that the individual motif 1 is designed as a data matrix code. The non-individual motif 2 is again an arrangement of five concentric rings. The tilt effect and the manufacturing process correspond to those of FIGS. 1 to 1d , Otherwise, the same reference numerals correspond to the same features.

The Fig. 3 schematically shows the principal problem of tolerances of the embossing and lithography process. In order to produce the security element 6, the embossed structure is usually firstly pressed into the metallized layer at a distance, for example, along the carrier, and thus a series of identical non-individual motifs 2 is produced. Thereafter, an individual motif 1 with the corresponding recesses 4 is laserlithographically applied to the non-individual motifs 2 in the carriers already processed. Of course, the laser lithographic process must be carried out with register accuracy on the non-individual motifs 2. Exact registration accuracy, however, is virtually impossible to produce, so that after the implementation of the laser lithographic process, as a rule, the optical security element 6 according to FIG Fig. 3 arises, in which an offset between the individual motif 1 and the non-individual motif 2 occurs, ie the five concentric rings are not exactly in the recesses 4 of the individual motif 1 arranged, but somewhat offset. The tilt effect does not work anymore.

In the FIGS. 4a to 4d is a first way listed to compensate for the registration error by the described production tolerances. Usually register marks are arranged at the edge of the carrier structure during the embossing process, and the register marks are read in during the subsequent laser lithographic process and the laser lithographic process is exactly aligned on the basis of the register marks, nevertheless production tolerances arise, as in US Pat Fig. 3 shown.

In order nevertheless to produce the tilting effect according to the invention, the lines of the non-individual motif 2 are evenly widened by a register deviation along their entire circumference. The lines broadened by the register deviation are in Fig. 4b shown. The laser lithographic individual motif 1 according to Fig. 1a and Fig. 1c is in the aforementioned laser lithographic process produced with an ideal width of the recesses 4. If the two motifs 1, 2 are arranged one above the other, appear in the recesses 4 of the individual motif 1 despite the registration error still completely the diffractive surfaces 3 of non-individual motifs 2 according to Fig. 4d , The different line strengths inside and outside the laser-lithograph individual motif 1 are not noticeable to the viewer.

In the Fig. 5a to 5d an alternative embodiment of the optical security element 6 according to the invention is shown, in which also the registration error of the laser lithographic process is taken into account by the embossing process. Here are in contrast to the FIGS. 4a - d not the lines of the non-individual motif 2 according to Fig. 5b widened, but the recesses 4 of the laser-lithographically produced individual motif 1 in Fig. 5c are widened by the registration error, so that according to Fig. 5d Even with a deviation or an offset of the motifs 1, 2, the five concentric rings and thus the diffractive surface 3 are still completely contained in the recesses 4 and remain visible and thus produce the desired tilting effect.

LIST OF REFERENCE NUMBERS

1

individual motive

2

non-individual motif

3

diffractive surface

4

recesses

6

optical security element

Claims (14)

1. Anti-counterfeit carrier having a series of optical security elements (6) and having a metallized layer, into which in each case a non-individual motif (2) with a diffractive surface (3) is embossed for at least two of the optical security elements (6) and in which in each case an individual motif (1) is introduced by laser lithography,
   characterized in that the individual motif (1) has cutouts (4) that form at least a partial motif of the non-individual motif (2) and are arranged in exact register with respect to the non-individual motif (2),
   and said at least two optical security elements (6) have in each case an optical tilt effect between the individual motif (1) and the non-individual motif (2) .
2. Anti-counterfeit carrier according to Claim 1, characterized in that, due to the tilt effect, the individual motif (1) comes to the foreground at specific viewing angles and the non-individual motif (2) comes in the foreground at other viewing angles and appears to be overlaying the individual motif (1).
3. Anti-counterfeit carrier according to Claim 1 or 2, characterized in that the non-individual motif (2) has fine lines.
4. Anti-counterfeit carrier according to Claim 3, characterized in that a width of the fine lines is less than 250 µm.
5. Anti-counterfeit carrier according to one of the preceding claims,
   characterized in that the cutouts (4) are widened by a value of a register deviation.
6. Anti-counterfeit carrier according to one of Claims 1 to 4,
   characterized in that lines of the non-individual motif (2) are widened by the value of the register deviation.
7. Anti-counterfeit carrier according to one of the preceding claims,
   characterized in that the non-individual motif (2) comprises a logo, a drawing, lettering, a symbol or a regular pattern.
8. Anti-counterfeit carrier according to one of the preceding claims,
   characterized in that the individual motif (1) is text, in particular a serial number or part of a serial number.
9. Anti-counterfeit carrier according to one of the preceding claims,
   characterized in that the individual motif (1) is a barcode, in particular a data matrix code or a QR code.
10. Anti-counterfeit carrier according to one of the preceding claims,
    characterized in that the non-individual motifs (2) in the series are identical and the individual motifs (1) in the series differ from one another.
11. Method for producing an anti-counterfeit carrier having a series of optical security elements (6), of which at least two in each case produce an optical tilt effect, by way of non-individual motifs (2) being embossed into a metallized layer and by a diffractive surface (3) being produced on the non-individual motifs (2) in the process, individual motifs (1) being introduced into the metallized layer by laser lithography and cutouts (4) being produced in the individual motifs (1) in the process that each form at least a partial motif of the non-individual motif (2) and are arranged in exact register on the non-individual motif (2).
12. Method according to Claim 11,
    characterized in that the cutouts (4) are widened by a value of a register deviation.
13. Method according to Claim 11,
    characterized in that lines of the non-individual motif (2) are widened by the value of the register deviation.
14. Method according to one of Claims 11 to 13,
    characterized in that the non-individual motifs (2) are produced in a mass replication method using a master stamp.

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