EP3233728A1 - Procédé de production d'oligosilanes chlorés - Google Patents
Procédé de production d'oligosilanes chlorésInfo
- Publication number
- EP3233728A1 EP3233728A1 EP14815659.9A EP14815659A EP3233728A1 EP 3233728 A1 EP3233728 A1 EP 3233728A1 EP 14815659 A EP14815659 A EP 14815659A EP 3233728 A1 EP3233728 A1 EP 3233728A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- chlorinated
- chlorine
- mixture
- chlorination reaction
- polysilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/009—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping in combination with chemical reactions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10773—Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10778—Purification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
Definitions
- Compounds can be outside the reaction vessel with
- the chlorination reaction will be at least two different in at least two steps
- Reaction mixture advantageous, for example by vigorous stirring.
- gas uptake can take place solely through the liquid surface, in particular if the liquid is vigorously stirred. It is preferable that Chlorine gas in the form of bubbles to flow through the liquid. A large bubble surface and thus fine bubbles improve the contact between gas and liquid and thus the chlorine gas uptake by the reaction solution.
- the chlorosilane mixture is added dropwise within 13.5 h in the upper packed column.
- the upper half of this column slowly heats up to less than 50 ° C.
- the viscosity of the mixture decreases markedly on the way through the upper column and the color intensity of the orange-yellow mixture is also lower. From the top
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Silicon Compounds (AREA)
Abstract
La présente invention concerne un procédé de production d'oligosilanes chlorés. Un polysilane chloré ayant pour formule empirique SiCl]1,0-2,8 et/ou un mélange contenant le polysilane chloré est converti avec du chlore élémentaire ou un mélange contenant du chlore. L'invention concerne en outre les oligosilanes chlorés produits par le procédé et leur utilisation pour la fabrication de semiconducteurs et/ou de revêtements durs.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2014/077814 WO2016095953A1 (fr) | 2014-12-15 | 2014-12-15 | Procédé de production d'oligosilanes chlorés |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3233728A1 true EP3233728A1 (fr) | 2017-10-25 |
Family
ID=56125971
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP14815659.9A Withdrawn EP3233728A1 (fr) | 2014-12-15 | 2014-12-15 | Procédé de production d'oligosilanes chlorés |
Country Status (4)
Country | Link |
---|---|
US (1) | US20170334730A1 (fr) |
EP (1) | EP3233728A1 (fr) |
JP (1) | JP2018502817A (fr) |
WO (1) | WO2016095953A1 (fr) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1245109A (fr) * | 1983-10-31 | 1988-11-22 | Hsien-Kun Chu | Obtention de pellicules d'halogenosilanes polymeriques amorphes; produits qui en sont derives |
DE102006034061A1 (de) * | 2006-07-20 | 2008-01-24 | REV Renewable Energy Ventures, Inc., Aloha | Polysilanverarbeitung und Verwendung |
DE102006043929B4 (de) * | 2006-09-14 | 2016-10-06 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von festen Polysilanmischungen |
DE102009056438B4 (de) * | 2009-12-02 | 2013-05-16 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von Hexachlordisilan |
DE102009056731A1 (de) * | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
DE102011110040A1 (de) * | 2011-04-14 | 2012-10-18 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Chlorsilanen mittels hoch-siedender Chlorsilane oder chlorsilanhaltiger Gemische |
KR20170035981A (ko) * | 2014-07-22 | 2017-03-31 | 모멘티브 퍼포먼스 머티리얼즈 게엠베하 | 모노실란, 폴리실란, 및/또는 올리고실란에서 규소-규소 결합 및/또는 규소-염소 결합의 분해 방법 |
-
2014
- 2014-12-15 EP EP14815659.9A patent/EP3233728A1/fr not_active Withdrawn
- 2014-12-15 JP JP2017549580A patent/JP2018502817A/ja active Pending
- 2014-12-15 WO PCT/EP2014/077814 patent/WO2016095953A1/fr active Application Filing
- 2014-12-15 US US15/535,960 patent/US20170334730A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2018502817A (ja) | 2018-02-01 |
US20170334730A1 (en) | 2017-11-23 |
WO2016095953A1 (fr) | 2016-06-23 |
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Legal Events
Date | Code | Title | Description |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20170713 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
DAX | Request for extension of the european patent (deleted) | ||
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20180222 |