EP2599896A3 - Verfahren zur galvanischen Abscheidung wenigstens eines Metalls oder Halbleiters - Google Patents

Verfahren zur galvanischen Abscheidung wenigstens eines Metalls oder Halbleiters Download PDF

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Publication number
EP2599896A3
EP2599896A3 EP12191555.7A EP12191555A EP2599896A3 EP 2599896 A3 EP2599896 A3 EP 2599896A3 EP 12191555 A EP12191555 A EP 12191555A EP 2599896 A3 EP2599896 A3 EP 2599896A3
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EP
European Patent Office
Prior art keywords
metal
semiconductor
electrolyte
substrate
galvanic deposition
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Granted
Application number
EP12191555.7A
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English (en)
French (fr)
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EP2599896A2 (de
EP2599896B1 (de
Inventor
Volkmar Neubert
Ashraf Bakkar
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Publication of EP2599896A3 publication Critical patent/EP2599896A3/de
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Publication of EP2599896B1 publication Critical patent/EP2599896B1/de
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/11—Use of protective surface layers on electrolytic baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/42—Electroplating: Baths therefor from solutions of light metals
    • C25D3/44—Aluminium

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Paints Or Removers (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

Die vorliegenden Erfindung betrifft ein Verfahren zur galvanischen Abscheidung wenigstens eines Metalls oder Halbleiters auf einem zu beschichtenden Substrat in einer galvanischen Zelle mit einer Anode, einer Kathode sowie gewünschtenfalls eine Bezugselektrode, die in einen Elektrolyten eingetaucht sind, wobei das zur Beschichtung verwendete Metall oder Halbleiter dem Elektrolyten zugesetzt und/oder in Form der Anode eingesetzt wird, das zu beschichtende Substrat als Kathode geschaltet und der Elektrolyt aus ionischen Flüssigkeiten ausgewählt ist und wobei ein Potential in einer solchen Höhe angelegt wird, dass durch den dabei induzierten Strom das Metall oder der Halbleiter auf der Substratoberfläche galvanisch abgeschieden wird, wobei der Elektrolyt mit einer organischen Flüssigkeit überschichtet ist, wobei die Schichtdicke der organischen Flüssigkeit wenigstens 2 mm beträgt.
EP12191555.7A 2011-12-01 2012-11-07 Verfahren zur galvanischen Abscheidung wenigstens eines Metalls oder Halbleiters und Vorrichtung dafür Active EP2599896B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102011055911A DE102011055911B3 (de) 2011-12-01 2011-12-01 Verfahren zur galvanischen Abscheidung wenigstens eines Metalls oder Halbleiters

Publications (3)

Publication Number Publication Date
EP2599896A2 EP2599896A2 (de) 2013-06-05
EP2599896A3 true EP2599896A3 (de) 2014-01-22
EP2599896B1 EP2599896B1 (de) 2021-05-26

Family

ID=47140634

Family Applications (1)

Application Number Title Priority Date Filing Date
EP12191555.7A Active EP2599896B1 (de) 2011-12-01 2012-11-07 Verfahren zur galvanischen Abscheidung wenigstens eines Metalls oder Halbleiters und Vorrichtung dafür

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EP (1) EP2599896B1 (de)
DE (1) DE102011055911B3 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014033890A1 (ja) * 2012-08-31 2014-03-06 株式会社日立製作所 非水系電気めっき方法および非水系電気めっき装置
US20160024637A1 (en) * 2013-03-07 2016-01-28 Hitachi, Ltd. Method for Forming Aluminide Coating Film on Base Material
EP2971267B1 (de) * 2013-03-15 2020-10-14 United Technologies Corporation Bimetallische verzinkungsverarbeitung zur verbesserten haftung von aluminium auf aluminiumlegierungen

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2849349A (en) * 1955-06-13 1958-08-26 Ziegler Process for the electrolytic deposition of aluminium
US3972784A (en) * 1972-12-08 1976-08-03 Siemens Aktiengesellschaft Method for pretreating surfaces of electrically conductive materials prior to electroplating
US4265726A (en) * 1979-01-17 1981-05-05 Montblanc-Simplo Gmbh Aluminum plating cell
WO2010106072A2 (de) * 2009-03-18 2010-09-23 Basf Se Elektrolyt und oberflächenaktive additive für die galvanische abscheidung glatter, dichter aluminium-schichten aus ionischen flüssigkeiten
WO2011064556A2 (en) * 2009-11-25 2011-06-03 University Of Leicester New ionic liquids
DE102011007559A1 (de) * 2010-04-19 2011-10-20 Basf Se Verfahren zur Herstellung von Elektrolyten für die Aluminiumabscheidung

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2662635B2 (ja) * 1988-04-26 1997-10-15 日新製鋼株式会社 電気アルミニウムめっき浴およびその浴によるめっき方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2849349A (en) * 1955-06-13 1958-08-26 Ziegler Process for the electrolytic deposition of aluminium
US3972784A (en) * 1972-12-08 1976-08-03 Siemens Aktiengesellschaft Method for pretreating surfaces of electrically conductive materials prior to electroplating
US4265726A (en) * 1979-01-17 1981-05-05 Montblanc-Simplo Gmbh Aluminum plating cell
WO2010106072A2 (de) * 2009-03-18 2010-09-23 Basf Se Elektrolyt und oberflächenaktive additive für die galvanische abscheidung glatter, dichter aluminium-schichten aus ionischen flüssigkeiten
WO2011064556A2 (en) * 2009-11-25 2011-06-03 University Of Leicester New ionic liquids
DE102011007559A1 (de) * 2010-04-19 2011-10-20 Basf Se Verfahren zur Herstellung von Elektrolyten für die Aluminiumabscheidung

Also Published As

Publication number Publication date
EP2599896A2 (de) 2013-06-05
DE102011055911B3 (de) 2012-11-29
EP2599896B1 (de) 2021-05-26

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