EP2526563A1 - Method for producing an electrode for a high-pressure discharge lamp and high-pressure discharge lamp comprising at least one electrode thus produced - Google Patents

Method for producing an electrode for a high-pressure discharge lamp and high-pressure discharge lamp comprising at least one electrode thus produced

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Publication number
EP2526563A1
EP2526563A1 EP11778853A EP11778853A EP2526563A1 EP 2526563 A1 EP2526563 A1 EP 2526563A1 EP 11778853 A EP11778853 A EP 11778853A EP 11778853 A EP11778853 A EP 11778853A EP 2526563 A1 EP2526563 A1 EP 2526563A1
Authority
EP
European Patent Office
Prior art keywords
electrode
discharge lamp
oxide layer
pressure discharge
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP11778853A
Other languages
German (de)
French (fr)
Other versions
EP2526563B1 (en
Inventor
Wolfgang Seitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osram GmbH
Original Assignee
Osram GmbH
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Filing date
Publication date
Application filed by Osram GmbH filed Critical Osram GmbH
Publication of EP2526563A1 publication Critical patent/EP2526563A1/en
Application granted granted Critical
Publication of EP2526563B1 publication Critical patent/EP2526563B1/en
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
    • H01J9/042—Manufacture, activation of the emissive part
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0732—Main electrodes for high-pressure discharge lamps characterised by the construction of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/19—Thermionic cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/02—Manufacture of cathodes

Definitions

  • the present invention relates to a method for producing an electrode for a high-pressure discharge lamp. It also relates to a high-pressure discharge lamp having at least one electrode produced in this way.
  • the emissivity of electrodes of discharge lamps has a decisive influence on the performance and the geometric design of such discharge lamps.
  • the prior art is the pasting with metal powders or mixtures by means of an organic binder and the subsequent sintering or baking to the electrode body.
  • the pasted and sintered layer is mechanically less stable, which can lead to partial crumbling on contact.
  • a method for processing an electrode of a discharge lamp is known.
  • the electrode is oxidized in the region in which it is pinched gas-tight in the neck of a discharge space formed of glass.
  • the oxidation is carried out by chemical routes in normal air atmosphere and ambient air pressure at a temperature between 700 and 1300 K.
  • the oxide layer is then sublimed in a vacuum environment, the temperature during the sublimation between see 1450 K and 1900 K amounts to.
  • ⁇ receives the electrode in said region, a surface with fine roughness, whereby the adhesion of the surface of this electrode portion on Entladungsge- fäßmaterial is reduced. This reduces the risk of cracking in the sealed area of the discharge vessel.
  • the oxide layer also removes any contaminants from the surface of the electrode portion, thereby also reducing adhesion.
  • a discharge lamp in which a rod-shaped tungsten electrode ⁇ range, in a neck of a discharge vessel by a gas tight pinch is introduced and by area, in a discharge space of the discharge vessel extends.
  • the surface of the electrode will bear ⁇ beitet.
  • an oxide layer on the surface In this case, for example, a tungsten trioxide layer can be produced.
  • the oxidized electrode is then heated at about 1200 ° C in egg ⁇ nem hydrogen furnace, springing up in the hydrogen in the water.
  • EP 1 251 548 A1 teaches a method of improving the thermal radiation characteristics of electrodes in a high-pressure discharge lamp of the short arc type.
  • gutters are inserted into the surface of the introduced electrodes.
  • the grooves have a depth that is less than or equal to 12% of the electrode diameter, with the ratio of the depth and spacing of the grooves being greater than or equal to two.
  • a laser device can be used for introducing the grooves.
  • the grooves may be angular or curved, wherein the surface is ground to produce curved grooves and then electrolytically polished in a 10% sodium hydroxide solution. Curved channels can however also be produced by heating to a high temperature in a vacuum, for example by heating the surface at 2000 ° C. for 120 minutes.
  • the object of the present invention is to provide a method for producing an electrode for a high-pressure discharge lamp, with which the highest possible emissivity for the electrodes can be achieved.
  • the surface of the electrode should be as resistant as possible to me ⁇ chanically.
  • the object further consists provide a high pressure discharge lamp with min- least one electrode thus prepared panoramic ⁇ .
  • the present invention is based on the finding that a high emissivity can basically be achieved if the electrode has an improved thermal conductivity. has beautiful emission behavior.
  • the thermal Ab ⁇ radiation behavior can be improved by increasing the surface of the electrode. However, it must be si ⁇ chergues that despite increased surface area of the electrode, the conductivity of the electrode be ⁇ is not impaired.
  • the electrode surface for generating an oxide layer is first coated with a high-energy beam suitable for this purpose, for example an electromagnetic beam, in particular a laser beam or an electron or ion beam.
  • a high-energy beam suitable for this purpose for example an electromagnetic beam, in particular a laser beam or an electron or ion beam.
  • the sweep is carried out in step a) at ⁇ least on a part of the electrode which is not embedded by the assembly of the electrode in the glass bulb of the high pressure discharge lamp in the glass of the glass bulb.
  • the processing on the part of the electrode can be ⁇ be limited, which is for the emission of importance results in a time saving and thus a reductive ⁇ tion of the manufacturing cost.
  • step a) is carried out on the atmosphere, in particular the oxygen-enriched atmosphere. Since the electrode usually consists predominantly of tungsten, ie in particular of doped tungsten, and tungsten is very reactive towards oxygen, it is thus possible to produce tungsten oxide in a simple manner.
  • step b) is carried out at the same time as step a).
  • step c) is preferably carried out in a hydrogen-containing atmosphere, in particular in an argon-hydrogen mixture.
  • a preferred argon-hydrogen mixture is known by the name VARIGON®. This makes it particularly easy to provide the possibility that the oxygen from the tungsten oxide with the hydrogen from the atmosphere in which step c) is performed, connects to water. On the electric ⁇ surfaces are designed the pure metal remains.
  • the electrode comprises preferably tungsten,) tungsten oxide is reduced to pure Wolf ⁇ ram in step c.
  • the coating is preferably carried out in step a) by means of a laser beam device.
  • a laser beam device precisely that part of the electrode surface which is important for the emissivity can be processed with particular precision. Unlike a chemical processing different areas of the electrode surface can be swept under ⁇ different.
  • a further optimization with regard to a high emissivity can be carried out. Scanning with a laser beam device allows a precise setting of a desired emissivity with regard to the adjustable parameters such as energy density, line spacing, focus, and the like.
  • the laser beam device is designed, in particular, to release an energy density which makes it possible to melt, oxidize and sublime at least part of the electrode surface.
  • step a) the laser beam device with a frequency between 1 kHz and 100 kHz, in particular 10 kHz, are clocked.
  • step a) preferably rows with a line spacing between two adjacent lines are preferably interposed on the electrode surface 0.01 and 0.2 mm, in particular 0.1 mm generated.
  • the laser beam device is preferably operated with a laser beam focus between 0.01 and 0.1 mm, in particular 0.02 mm. In this way, the electrode surface can be maximized, whereby at the same time the emissivity of the electrode becomes maximum.
  • the sweep can also be performed with other suitable beam devices such as electron beam or ion beam devices according to a preferred disclosed embodiment of the inventive method step), Runaway ⁇ leads c at a temperature between 700 ° C and 2500 ° C, in particular 2200 ° C.
  • Step a) is preferably carried out at ambient ⁇ temperature, in particular a temperature between 15 ° C and 30 ° C, and ambient pressure.
  • FIG. 1 shows a schematic representation of a high-pressure discharge lamp according to the invention
  • FIG. 2 shows a signal flow graph for an exemplary embodiment of a method according to the invention
  • FIG. 3 shows a section of the anode of the high-pressure discharge lamp illustrated in FIG. 1;
  • FIG. 3 shows a section of the anode of the high-pressure discharge lamp illustrated in FIG. 1;
  • Fig. 4 is a first enlarged view of a first
  • FIG. 5 is a first enlarged view of a second
  • FIG. 6 is an enlarged view of Darge ⁇ presented in Figure 5 Clipping; and FIG. 7 is an enlarged view of the detail shown in FIG.
  • the high-pressure discharge lamp 10 includes a discharge vessel 12 with a dis- charges space 14.
  • a first electrode 16 anode
  • a second electrode 18 extend (cathode).
  • the electrode 16 is melted in the neck 22, the electrode 18 in the neck 20th
  • the electrodes 16, 18 are located on bars 24, 26 which are ge ⁇ preferably forms of tungsten or a tungsten alloy.
  • the electrodes 16, 18 themselves consist of doped tungsten.
  • step 100 at least a part of the surface of the electrode 16 by means of a laser beam coated with ⁇ device.
  • the energy density is so high is that a part of the electric ⁇ surfaces are designed to melt, oxidized and sublimated. This means that a part of the resulting tungsten oxide goes into the gaseous state, another part of the tungsten oxide remains on the electrode surface.
  • Step 120 is preferably carried out in a Sauerstoffangerei ⁇ cherten atmosphere.
  • the laser beam device can be clocked with a frequency between 1 kHz and 100 kHz, in particular 10 kHz.
  • lines with a line spacing between two adjacent lines between 0.01 and 0.2 mm, in particular 0.1 mm are produced on the electrode surface.
  • a TEN OF PREFERRED guiding the laser beam device is operated with a laser beam focus between 0.01 and 0.1 mm, in particular 0.02 mm ⁇ sondere, form.
  • the laser beam device for example, a power between 50 W and 200 W, preferably about 120 W, leave.
  • the sweeping can, for example, at a speed between 10 mm / s and 100 mm / s, in particular 30 mm / s, take place.
  • the temperature temperature can be ambient temperature; the pressure is preferably ambient pressure.
  • a preferred laser beam device is known under the name rofin rsmarker and is operated with Galvo head.
  • the power is in this embodiment ⁇ example about 120 W, whereby a current of about 38 A flows.
  • the sweeping speed is approx. 30 mm / s.
  • the electrode 16 is rotatably mounted, so that the entire circumference can be structured by the laser beam device.
  • the step 120 creates a very rough oxidic surface. This is not defined geometrically, as will be explained in more detail below with reference to the further figures.
  • the electrode 16 is preferably inductively heated in a VARIGON atmosphere.
  • the oxidized parts of the surface are reduced by the existing hydrogen to metallic tungsten and water.
  • the surface is impurity ⁇ free because unlike the prior art, no binder must be used in a Bepastungspens.
  • the E- lektrode has a very good coupling characteristic in the inductive heating, and is mechanically stable, i.e., the electrode surface shows no tendency to crumble ⁇ ERS.
  • Step 140 is preferably carried out at a temperature between 700 ° C and 2500 ° C, in particular 2200 ° C, performed. The method according to the invention ends in step 160.
  • FIG. 3 shows an enlarged view of the area of the surface of the electrode 16 of FIG. 1, in which the shape changes from cylindrical to conical.
  • the magnification is 10: 1.
  • Fig. 4 shows an enlarged view of an off ⁇ section of Fig. 3 in the transition region cylindrical cone -shaped.
  • the magnification is 1: 30.
  • Fig. 5 shows a detail of Fig. 3 in the cylindrical region.
  • FIG. 6 shows an enlarged detail of the illustration in FIG. 5.
  • Ribs can be clearly recognized, the irregularity of the surface falling into the eye. By the irregularity results in a clear increase of the electrode surface, which can be achieved high Emissionsgra ⁇ de.
  • FIG. 7 shows the detail of a rib in the illustration of FIG. 6.
  • the magnification is 1: 1000. This illustration emphasizes the high roughness of the tungsten surface of the electrode.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Discharge Lamp (AREA)

Abstract

The invention relates to a method for producing an electrode (16) for a high-pressure discharge lamp (10), comprising the following steps: a) passing over at least a portion of the electrode surface for generating an oxide layer (step 120), preferably using a laser beam; b) at least partially sublimating the oxide layer created in step a) (step 120); and c) reducing the remaining oxide layer (140). The invention further relates to a high-pressure discharge lamp (10) comprising at least one electrode thus produced.

Description

Beschreibung  description
Verfahren zum Herstellen einer Elektrode für eine Hochdruckentladungslampe und Hochdruckentladungslampe mit mindestens einer derart hergestellten Elektrode Method for producing an electrode for a high-pressure discharge lamp and high-pressure discharge lamp with at least one electrode produced in this way
Technisches Gebiet Technical area
Die vorliegende Erfindung betrifft ein Verfahren zum Her- stellen einer Elektrode für eine Hochdruckentladungslampe. Sie betrifft überdies eine Hochdruckentladungslampe mit mindestens einer derart hergestellten Elektrode. The present invention relates to a method for producing an electrode for a high-pressure discharge lamp. It also relates to a high-pressure discharge lamp having at least one electrode produced in this way.
Stand der Technik State of the art
Der Emissionsgrad von Elektroden von Entladungslampen hat auf die Performance und die geometrische Auslegung derar- tiger Entladungslampen einen entscheidenden Einfluss. The emissivity of electrodes of discharge lamps has a decisive influence on the performance and the geometric design of such discharge lamps.
Stand der Technik ist das Bepasten mit Metallpulvern oder Stoffgemengen mittels eines organischen Binders und das darauf folgende Einsintern beziehungsweise Anbacken an den Elektrodenkörper. Allerdings ist die bepastete und eingesinterte Schicht mechanisch wenig beständig, was zu einem teilweisen Abbröckeln bei Berührung führen kann. The prior art is the pasting with metal powders or mixtures by means of an organic binder and the subsequent sintering or baking to the electrode body. However, the pasted and sintered layer is mechanically less stable, which can lead to partial crumbling on contact.
Aus der WO 2008/090030 AI ist ein Verfahren zum Bearbeiten einer Elektrode einer Entladungslampe bekannt. Dabei wird die Elektrode in dem Bereich oxidiert, in dem sie im Hals eines aus Glas gebildeten Entladungsraums gasdicht eingequetscht ist. Die Oxidation erfolgt auf chemischen Wege bei normaler Luftatmosphäre und Umgebungsluftdruck bei einer Temperatur zwischen 700 und 1300 K. Die Oxidschicht wird anschließend in einer Vakuumumgebung subli- miert, wobei die Temperatur während des Sublimierens zwi- sehen 1450 K und 1900 K beträgt. Durch diese Vorgehens¬ weise erhält die Elektrode in dem genannten Bereich eine Oberfläche mit feiner Rauigkeit, wodurch die Haftung der Oberfläche dieses Elektrodenabschnitts am Entladungsge- fäßmaterial reduziert wird. Dadurch reduziert sich die Gefahr der Rissbildung im abgedichteten Bereich des Entladungsgefäßes. Während des Sublimationsschritts werden mit der Oxidschicht auch etwaige Verunreinigungen von der Oberfläche des Elektrodenabschnitts entfernt, wodurch die Haftung ebenfalls reduziert wird. From WO 2008/090030 Al a method for processing an electrode of a discharge lamp is known. In this case, the electrode is oxidized in the region in which it is pinched gas-tight in the neck of a discharge space formed of glass. The oxidation is carried out by chemical routes in normal air atmosphere and ambient air pressure at a temperature between 700 and 1300 K. The oxide layer is then sublimed in a vacuum environment, the temperature during the sublimation between see 1450 K and 1900 K amounts to. By this approach as ¬ receives the electrode in said region, a surface with fine roughness, whereby the adhesion of the surface of this electrode portion on Entladungsge- fäßmaterial is reduced. This reduces the risk of cracking in the sealed area of the discharge vessel. During the sublimation step, the oxide layer also removes any contaminants from the surface of the electrode portion, thereby also reducing adhesion.
Aus der US 6,626,725 Bl ist eine Entladungslampe bekannt, bei der eine stabförmige Elektrode aus Wolfram bereichs¬ weise in einen Hals eines Entladungsgefäßes durch eine gasdichte Quetschung eingebracht ist und sich bereichs- weise in einen Entladungsraum des Entladungsgefäßes erstreckt. Um eine Rissbildung des Entladungsgefäßes im Quetschungsbereich im Betrieb der Entladungslampe verhindern zu können, wird die Oberfläche der Elektrode bear¬ beitet. Zur Erzeugung einer elementaren Wolframschicht an der Oberfläche der Elektrode in dem Längenbereich, in dem die Elektrode im Quetschbereich angeordnet ist, wird zu¬ nächst eine Oxidschicht auf der Oberfläche erzeugt. Dabei kann beispielsweise eine Wolframtrioxidschicht erzeugt werden. Um die elementare Wolframschicht zu erzeugen, wird dann die oxidierte Elektrode bei etwa 1200°C in ei¬ nem Wasserstoffofen, in dem Wasserstoff in Wasser aufsprudelt, erhitzt. From US 6,626,725 Bl, a discharge lamp is known in which a rod-shaped tungsten electrode ¬ range, in a neck of a discharge vessel by a gas tight pinch is introduced and by area, in a discharge space of the discharge vessel extends. In order to prevent cracking of the discharge vessel in the pinch seal area during operation of the discharge lamp, the surface of the electrode will bear ¬ beitet. In order to produce an elemental tungsten layer on the surface of the electrode in the length area in which the electrode is arranged at the nip to the next is generated ¬ an oxide layer on the surface. In this case, for example, a tungsten trioxide layer can be produced. In order to produce the elemental tungsten layer, the oxidized electrode is then heated at about 1200 ° C in egg ¬ nem hydrogen furnace, springing up in the hydrogen in the water.
Die EP 1 251 548 AI lehrt ein Verfahren, um die thermischen Strahlungseigenschaften von Elektroden in einer Hochdruckentladungslampe vom Kurzbogentyp zu verbessern. Zu diesem Zweck werden Rinnen in die Oberfläche der E- lektroden eingebracht. Die Rinnen weisen eine Tiefe auf, die kleiner gleich 12 % des Elektrodendurchmessers ist, wobei das Verhältnis aus Tiefe und Abstand der Rinnen größer gleich zwei ist. Zum Einbringen der Rinnen kann eine Laservorrichtung Verwendung finden. Die Rinnen können eckig oder gebogen ausgebildet sein, wobei zur Erzeugung von gebogenen Rinnen die Oberfläche geschliffen wird und anschließend elektrolytisch poliert wird in einer 10- %igen Natriumhydroxidlösung. Gebogene Rinnen können je- doch auch durch Erhitzen auf eine hohe Temperatur in einem Vakuum erzeugt werden, beispielsweise indem die Oberfläche über 120 min bei 2000°C erhitzt wird. EP 1 251 548 A1 teaches a method of improving the thermal radiation characteristics of electrodes in a high-pressure discharge lamp of the short arc type. For this purpose, gutters are inserted into the surface of the introduced electrodes. The grooves have a depth that is less than or equal to 12% of the electrode diameter, with the ratio of the depth and spacing of the grooves being greater than or equal to two. For introducing the grooves, a laser device can be used. The grooves may be angular or curved, wherein the surface is ground to produce curved grooves and then electrolytically polished in a 10% sodium hydroxide solution. Curved channels can however also be produced by heating to a high temperature in a vacuum, for example by heating the surface at 2000 ° C. for 120 minutes.
Darstellung der Erfindung Presentation of the invention
Der vorliegenden Erfindung liegt die Aufgabe zugrunde, ein Verfahren zum Herstellen einer Elektrode für eine Hochdruckentladungslampe bereitzustellen, mit dem sich ein möglichst hoher Emissionsgrad für die Elektroden er¬ zielen lässt. Dabei soll die Oberfläche der Elektrode me¬ chanisch möglichst beständig sein. Die Aufgabe besteht weiterhin darin, eine Hochdruckentladungslampe mit min- destens einer derart hergestellten Elektrode bereitzu¬ stellen. The object of the present invention is to provide a method for producing an electrode for a high-pressure discharge lamp, with which the highest possible emissivity for the electrodes can be achieved. The surface of the electrode should be as resistant as possible to me ¬ chanically. The object further consists provide a high pressure discharge lamp with min- least one electrode thus prepared bereitzu ¬.
Diese Aufgaben werden gelöst durch ein Verfahren mit den Merkmalen von Patentanspruch 1 sowie durch eine Hochdruckentladungslampe mit den Merkmalen von Patentan- spruch 14. These objects are achieved by a method having the features of patent claim 1 and by a high-pressure discharge lamp having the features of patent claim 14.
Der vorliegenden Erfindung liegt die Erkenntnis zugrunde, dass ein hoher Emissionsgrad grundsätzlich dann realisierbar ist, wenn die Elektrode ein verbessertes thermi- sches Abstrahlverhalten aufweist. Das thermische Ab¬ strahlverhalten lässt sich durch Vergrößerung der Oberfläche der Elektrode verbessern. Dabei muss jedoch si¬ chergestellt werden, dass trotz vergrößerter Oberfläche der Elektrode die Leitfähigkeit der Elektrode nicht be¬ einträchtigt wird. The present invention is based on the finding that a high emissivity can basically be achieved if the electrode has an improved thermal conductivity. has beautiful emission behavior. The thermal Ab ¬ radiation behavior can be improved by increasing the surface of the electrode. However, it must be si ¬ chergestellt that despite increased surface area of the electrode, the conductivity of the electrode be ¬ is not impaired.
Erfindungsgemäß wird deshalb zunächst zumindest ein Teil der Elektrodenoberfläche zur Erzeugung einer Oxidschicht mit einem hierfür geeigneten, energiereichen Strahl, bei- spielsweise einem elektromagnetischen Strahl, insbesondere einem Laserstrahl, oder einem Elektronen- oder Ionenstrahl, überstrichen. Durch entsprechende Wahl der Energiedichte wird dabei zumindest ein Teil der entstehenden Oxidschicht bereits sublimiert. Als Zwischenergebnis er- hält man eine Elektrodenoberfläche, die zwar bereits ex¬ trem rau ist, jedoch oxidisch ist, das heißt eine redu¬ zierte Leitfähigkeit aufweist. Aus diesem Grund wird in einem Folgeschritt die nicht sublimierte Oxidschicht zum Metall reduziert. Im Ergebnis entsteht eine extrem raue Oberfläche mit einem hohen Emissionsgrad, wobei der Emis¬ sionsgrad abhängig von der Strukturierung und Oxidation einstellbar ist. Die entstehende Oberfläche ist mecha¬ nisch sehr fest und sehr beständig. Überdies wird im Ge¬ gensatz zur aus dem Stand der Technik bekannten Be- pastungsvariante keine zusätzliche Verunreinigung einge¬ bracht . According to the invention, therefore, at least a part of the electrode surface for generating an oxide layer is first coated with a high-energy beam suitable for this purpose, for example an electromagnetic beam, in particular a laser beam or an electron or ion beam. By appropriate choice of the energy density while at least a portion of the resulting oxide layer is already sublimated. As an interim result ER keeping an electrode surface which may already be ex ¬ tremely rough, but is oxidic, that is, has a redu ¬ ed conductivity. For this reason, in a subsequent step, the non-sublimated oxide layer is reduced to the metal. The result is an extremely rough surface with a high emissivity, wherein the Emis ¬ sion level is adjustable depending on the structuring and oxidation. The resulting surface is mecha nically ¬ very strong and very stable. Moreover pastungsvariante is no additional impurity is introduced in the Ge ¬ ¬ contrast to the known prior art loading.
Im Gegensatz zur Erzeugung einer Oxidschicht auf chemischem Wege können bei dem erfindungsgemäßen Verfahren auch nur Teilbereiche oxidiert werden. Dies ist insbeson- dere vorteilhaft zum Definieren unterschiedlicher Funktionsbereiche an der Elektrode. Im Vergleich zur definierten Einbringung von Rillen gemäß der Lehre der oben erwähnten EP 1 251 548 AI lässt sich durch das erfindungsgemäße Verfahren eine sehr viel grö¬ ßere Oberfläche erzeugen und damit ein deutlich höherer Emissionsgrad realisieren. In contrast to the production of an oxide layer by chemical means, only partial areas can be oxidized in the method according to the invention. This is particularly advantageous for defining different functional areas on the electrode. In comparison to the defined introduction of grooves in accordance with the teachings of the above-mentioned EP 1,251,548 AI can generate a much RESIZE ¬ ßere surface by the inventive method and to realize a considerably higher degree of emission.
Bevorzugt erfolgt in Schritt a) das Überstreichen zumin¬ dest auf einem Teil der Elektrode, der nach der Montage der Elektrode im Glaskolben der Hochdruckentladungslampe nicht im Glas des Glaskolbens eingebettet ist. Dadurch, dass die Bearbeitung auf den Teil der Elektrode be¬ schränkt werden kann, der für die Emission von Bedeutung ist, ergibt sich eine Zeitersparnis und damit eine Reduk¬ tion der Herstellungskosten. Bevorzugt wird Schritt a) an Atmosphäre, insbesondere Sauerstoffangereicherter Atmo- sphäre, durchgeführt. Da die Elektrode üblicherweise überwiegend aus Wolfram besteht, d.h. insbesondere aus dotiertem Wolfram, und Wolfram sehr reaktionsfreudig gegenüber Sauerstoff ist, lässt sich so auf einfache Weise Wolframoxid erzeugen. Weiterhin bevorzugt wird Schritt b) zeitgleich mit Schritt a) ausgeführt. Beim Überstreichen geht daher ein Teil des Wolframoxids durch Sublimation bereits in den gasförmigen Zustand über, während ein anderer Teil des Wolframoxids auf der Oberfläche der Elektrode verbleibt. Schritt c) wird bevorzugt in einer wasserstoffhaltigen Atmosphäre, insbesondere in einem Argon-Wasserstoff- Gemisch, ausgeführt. Ein bevorzugtes Argon-Wasserstoff- Gemisch ist unter der Bezeichnung VARIGON® bekannt. Dadurch wird besonders einfach die Möglichkeit bereitge- stellt, dass sich der Sauerstoff aus dem Wolframoxid mit dem Wasserstoff aus der Atmosphäre, in der Schritt c) durchgeführt wird, zu Wasser verbindet. Auf der Elektro¬ denoberfläche bleibt das reine Metall übrig. Preferably, the sweep is carried out in step a) at ¬ least on a part of the electrode which is not embedded by the assembly of the electrode in the glass bulb of the high pressure discharge lamp in the glass of the glass bulb. Characterized in that the processing on the part of the electrode can be ¬ be limited, which is for the emission of importance results in a time saving and thus a reductive ¬ tion of the manufacturing cost. Preferably, step a) is carried out on the atmosphere, in particular the oxygen-enriched atmosphere. Since the electrode usually consists predominantly of tungsten, ie in particular of doped tungsten, and tungsten is very reactive towards oxygen, it is thus possible to produce tungsten oxide in a simple manner. Further preferably, step b) is carried out at the same time as step a). When overcoating, therefore, a part of the tungsten oxide already passes through the sublimation in the gaseous state, while another part of the tungsten oxide remains on the surface of the electrode. Step c) is preferably carried out in a hydrogen-containing atmosphere, in particular in an argon-hydrogen mixture. A preferred argon-hydrogen mixture is known by the name VARIGON®. This makes it particularly easy to provide the possibility that the oxygen from the tungsten oxide with the hydrogen from the atmosphere in which step c) is performed, connects to water. On the electric ¬ surfaces are designed the pure metal remains.
Wie bereits ausgeführt, umfasst die Elektrode bevorzugt Wolfram, wobei in Schritt c) Wolframoxid zu reinem Wolf¬ ram reduziert wird. As already stated, the electrode comprises preferably tungsten,) tungsten oxide is reduced to pure Wolf ¬ ram in step c.
Bevorzugt erfolgt das Überstreichen in Schritt a) mittels einer Laserstrahlvorrichtung. Dadurch kann besonders präzise genau der Teil der Elektrodenoberfläche bearbeitet werden, der für den Emissionsgrad von Bedeutung ist. Im Gegensatz zu einer chemischen Bearbeitung können unterschiedliche Bereiche der Elektrodenoberfläche unter¬ schiedlich überstrichen werden. Durch Variation der auf der Elektrodenoberfläche mittels der Laserstrahlvorrich- tung verursachten Modifikationen kann eine weitere Optimierung im Hinblick auf einen hohen Emissionsgrad vorgenommen werden. Ein Überstreichen mittels Laserstrahlvorrichtung erlaubt im Hinblick auf die einstellbaren Parameter wie Energiedichte, Zeilenabstand, Focus, und der- gleichen, eine präzise Einstellung eines gewünschten Emissionsgrads . The coating is preferably carried out in step a) by means of a laser beam device. As a result, precisely that part of the electrode surface which is important for the emissivity can be processed with particular precision. Unlike a chemical processing different areas of the electrode surface can be swept under ¬ different. By varying the modifications effected on the electrode surface by means of the laser beam device, a further optimization with regard to a high emissivity can be carried out. Scanning with a laser beam device allows a precise setting of a desired emissivity with regard to the adjustable parameters such as energy density, line spacing, focus, and the like.
Die Laserstrahlvorrichtung ist in diesem Zusammenhang insbesondere ausgelegt, eine Energiedichte freizusetzen, die ein Schmelzen, Oxidieren sowie Sublimieren zumindest eines Teils der Elektrodenoberfläche ermöglicht. In this context, the laser beam device is designed, in particular, to release an energy density which makes it possible to melt, oxidize and sublime at least part of the electrode surface.
Dabei kann in Schritt a) die Laserstrahlvorrichtung mit einer Frequenz zwischen 1 kHz und 100 kHz, insbesondere 10 kHz, getaktet werden. In Schritt a) werden bevorzugt auf der Elektrodenoberfläche bevorzugt Zeilen mit einem Zeilenabstand zwischen zwei benachbarten Zeilen zwischen 0,01 und 0,2 mm, insbesondere 0,1 mm, erzeugt. Bevorzugt wird die Laserstrahlvorrichtung mit einem Laserstrahlfokus zwischen 0,01 und 0,1 mm, insbesondere 0,02 mm, betrieben. Auf diese Weise lässt sich die Elektrodenober- fläche maximieren, wodurch gleichzeitig der Emissionsgrad der Elektrode maximal wird. In this case, in step a), the laser beam device with a frequency between 1 kHz and 100 kHz, in particular 10 kHz, are clocked. In step a), preferably rows with a line spacing between two adjacent lines are preferably interposed on the electrode surface 0.01 and 0.2 mm, in particular 0.1 mm generated. The laser beam device is preferably operated with a laser beam focus between 0.01 and 0.1 mm, in particular 0.02 mm. In this way, the electrode surface can be maximized, whereby at the same time the emissivity of the electrode becomes maximum.
Alternativ kann das Überstreichen auch mit anderen geeignete Strahlvorrichtungen erfolgen, wie z.B. Elektronenoder Ionenstrahlvorrichtungen Gemäß einer bevorzugten Aus führungs form des erfindungsgemäßen Verfahrens wird Schritt c) bei einer Temperatur zwischen 700°C und 2500°C, insbesondere 2200°C, durchge¬ führt. Schritt a) hingegen wird bevorzugt bei Umgebungs¬ temperatur, insbesondere einer Temperatur zwischen 15°C und 30 °C, und Umgebungsdruck durchgeführt. Alternatively, the sweep can also be performed with other suitable beam devices such as electron beam or ion beam devices according to a preferred disclosed embodiment of the inventive method step), Runaway ¬ leads c at a temperature between 700 ° C and 2500 ° C, in particular 2200 ° C. Step a), however, is preferably carried out at ambient ¬ temperature, in particular a temperature between 15 ° C and 30 ° C, and ambient pressure.
Weitere bevorzugte Aus führungs formen ergeben sich aus den Unteransprüchen . Further preferred embodiments of the invention will become apparent from the dependent claims.
Die mit Bezug auf das erfindungsgemäße Verfahren vorge¬ stellten bevorzugten Aus führungs formen und deren Vorteile gelten entsprechend, soweit anwendbar, für die erfindungsgemäße Hochdruckentladungslampe mit mindestens einer derart hergestellten Elektrode. Guiding the pre-form with respect to the inventive method presented ¬ PREFERRED and the advantages thereof apply mutatis mutandis, as applicable, for the inventive high-pressure discharge lamp having at least one electrode produced in this manner.
Kurze Beschreibung der Zeichnungen Brief description of the drawings
Im Nachfolgenden werden Ausführungsbeispiele der vorlie- genden Erfindung unter Bezugnahme auf die beigefügten Zeichnungen näher beschrieben. Es zeigen: Fig. 1 in schematischer Darstellung eine erfindungsgemäße Hochdruckentladungslampe ; Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. Show it: 1 shows a schematic representation of a high-pressure discharge lamp according to the invention;
Fig. 2 einen Signalflussgraphen für ein Ausführungsbeispiel eines erfindungsgemäßen Verfahrens; Fig. 3 einen Ausschnitt der Anode der in Fig. 1 dargestellten Hochdruckentladungslampe ; 2 shows a signal flow graph for an exemplary embodiment of a method according to the invention; FIG. 3 shows a section of the anode of the high-pressure discharge lamp illustrated in FIG. 1; FIG.
Fig. 4 eine erste vergrößerte Darstellung eines ersten Fig. 4 is a first enlarged view of a first
Ausschnitts der in Fig. 3 dargestellten Elektrodenoberfläche ; Fig. 5 eine erste vergrößerte Darstellung eines zweiten  Section of the electrode surface shown in Figure 3; Fig. 5 is a first enlarged view of a second
Ausschnitts der in Fig. 3 dargestellten Elektrodenoberfläche ;  Section of the electrode surface shown in Figure 3;
Fig. 6 eine vergrößerte Darstellung des in Fig. 5 darge¬ stellten Ausschnitts; und Fig. 7 eine vergrößerte Darstellung des in Fig. 6 dargestellten Ausschnitts. . Fig. 6 is an enlarged view of Darge ¬ presented in Figure 5 Clipping; and FIG. 7 is an enlarged view of the detail shown in FIG.
Bevorzugte Ausführung der Erfindung Preferred embodiment of the invention
In Fig. 1 ist schematisch ein Ausschnitt einer Hochdruckentladungslampe 10 dargestellt. Die Hochdruckentladungs¬ lampe 10 umfasst ein Entladungsgefäß 12 mit einem Entla- dungsraum 14. In den Entladungsraums 14 erstrecken sich eine erste Elektrode 16 (Anode) und eine zweite Elektrode 18 (Kathode) . An den im Querschnitt oval ausgebildeten Mittelteil des Entladungsgefäßes 12 schließen zwei dia¬ metral gegenüberliegende Hälse 20, 22 an. Die Elektrode 16 ist im Hals 22 eingeschmolzen, die Elektrode 18 im Hals 20. Die Elektroden 16, 18 sind auf Stäben 24, 26 angeordnet, die bevorzugt aus Wolfram oder einer Wolframlegierung ge¬ bildet sind. Die Elektroden 16, 18 selbst bestehen aus dotiertem Wolfram. Das erfindungsgemäße Verfahren wird am Beispiel der E- lektrode 16, das heißt der Anode, näher dargestellt. Selbstverständlich sind Aus führungs formen denkbar, in denen überdies die Kathode entsprechend dem erfindungsgemä¬ ßen Verfahren bearbeitet wird. Das Verfahren beginnt im Schritt 100. Im Schritt 120 wird zumindest ein Teil der Oberfläche der Elektrode 16 mit¬ tels einer Laserstrahlvorrichtung überstrichen. Die Energiedichte ist dabei so hoch, dass ein Teil der Elektro¬ denoberfläche schmilzt, oxidiert sowie sublimiert. Das bedeutet, dass eine Teil des entstehenden Wolframoxids in den gasförmigen Zustand übergeht, ein anderer Teil des Wolframoxids auf der Elektrodenoberfläche verbleibt. Schritt 120 wird bevorzugt in einer Sauerstoffangerei¬ cherten Atmosphäre durchgeführt. Die Laserstrahlvorrich- tung kann mit einer Frequenz zwischen 1 kHz und 100 kHz, insbesondere 10 kHz getaktet werden. Bevorzugt werden auf der Elektrodenoberfläche Zeilen mit einem Zeilenabstand zwischen zwei benachbarten Zeilen zwischen 0,01 und 0,2 mm, insbesondere 0,1 mm erzeugt. Bei einer bevorzug- ten Aus führungs form wird die Laserstrahlvorrichtung mit einem Laserstrahlfokus zwischen 0,01 und 0,1 mm, insbe¬ sondere 0,02 mm, betrieben. Die Laserstrahlvorrichtung kann beispielsweise eine Leistung zwischen 50 W und 200 W, bevorzugt ca. 120 W, abgeben. Das Überstreichen kann beispielsweise mit einer Geschwindigkeit zwischen 10 mm/s und 100 mm/s, insbesondere 30 mm/s, erfolgen. Die Tempe- ratur kann Umgebungstemperatur sein; der Druck ist bevorzugt Umgebungsdruck. In Fig. 1, a section of a high-pressure discharge lamp 10 is shown schematically. The high-pressure discharge lamp 10 includes a discharge vessel 12 with a dis- charges space 14. In the discharge space 14, a first electrode 16 (anode) and a second electrode 18 extend (cathode). To the oval-shaped in cross-section central portion of the discharge vessel 12 connect to two dia ¬ diametrically opposed throats 20, the 22nd The electrode 16 is melted in the neck 22, the electrode 18 in the neck 20th The electrodes 16, 18 are located on bars 24, 26 which are ge ¬ preferably forms of tungsten or a tungsten alloy. The electrodes 16, 18 themselves consist of doped tungsten. The process according to the invention is illustrated in more detail using the example of the electrode 16, that is to say the anode. Of course, from guiding shapes are conceivable, in which furthermore the cathode is processed in accordance with the invention shown SEN method. The method begins in step 100. In step 120, at least a part of the surface of the electrode 16 by means of a laser beam coated with ¬ device. The energy density is so high is that a part of the electric ¬ surfaces are designed to melt, oxidized and sublimated. This means that a part of the resulting tungsten oxide goes into the gaseous state, another part of the tungsten oxide remains on the electrode surface. Step 120 is preferably carried out in a Sauerstoffangerei ¬ cherten atmosphere. The laser beam device can be clocked with a frequency between 1 kHz and 100 kHz, in particular 10 kHz. Preferably, lines with a line spacing between two adjacent lines between 0.01 and 0.2 mm, in particular 0.1 mm, are produced on the electrode surface. In a TEN OF PREFERRED guiding the laser beam device is operated with a laser beam focus between 0.01 and 0.1 mm, in particular 0.02 mm ¬ sondere, form. The laser beam device, for example, a power between 50 W and 200 W, preferably about 120 W, leave. The sweeping can, for example, at a speed between 10 mm / s and 100 mm / s, in particular 30 mm / s, take place. The temperature temperature can be ambient temperature; the pressure is preferably ambient pressure.
Eine bevorzugte Laserstrahlvorrichtung ist unter der Bezeichnung rofin rsmarker bekannt und wird mit Galvokopf betrieben. Die Leistung beträgt bei diesem Ausführungs¬ beispiel ca. 120 W, wodurch ein Strom von ca. 38 A fließt. Die Überstreichgeschwindigkeit beträgt ca. 30 mm/s. A preferred laser beam device is known under the name rofin rsmarker and is operated with Galvo head. The power is in this embodiment ¬ example about 120 W, whereby a current of about 38 A flows. The sweeping speed is approx. 30 mm / s.
Bevorzugt ist die Elektrode 16 drehbar gelagert, so dass durch die Laserstrahlvorrichtung der gesamte Umfang strukturiert werden kann. Preferably, the electrode 16 is rotatably mounted, so that the entire circumference can be structured by the laser beam device.
Durch den Schritt 120 entsteht eine sehr raue oxidische Oberfläche. Diese ist geometrisch nicht definiert, wie weiter unten mit Bezug auf die weiteren Figuren noch nä- her erläutert werden wird. The step 120 creates a very rough oxidic surface. This is not defined geometrically, as will be explained in more detail below with reference to the further figures.
In Schritt 140 wird die Elektrode 16 in einer VARIGON- Atmosphäre bevorzugt induktiv erhitzt. Dadurch werden die oxidierten Teile der Oberfläche durch den vorhandenen Wasserstoff zu metallischem Wolfram und Wasser reduziert. Im Ergebnis erhält man eine metallische, sehr raue Elekt¬ rodenoberfläche mit über den Behandlungsgrad einstellba¬ rem Emissionsgrad. Die Oberfläche ist verunreinigungs¬ frei, da im Gegensatz zum Stand der Technik kein Binder in einem Bepastungsprozess verwendet werden muss. Die E- lektrode weist ein sehr gutes Einkoppelverhalten beim induktiven Erwärmen auf und ist mechanisch stabil, das heißt die Elektrodenoberfläche zeigt keine Tendenz abzu¬ bröckeln. Schritt 140 wird bevorzugt bei einer Temperatur zwischen 700°C und 2500°C, insbesondere 2200°C, durchge- führt. Das erfindungsgemäße Verfahren endet im Schritt 160. In step 140, the electrode 16 is preferably inductively heated in a VARIGON atmosphere. As a result, the oxidized parts of the surface are reduced by the existing hydrogen to metallic tungsten and water. As a result, we obtain a metallic, very rough Elect ¬ clear surface with about the treatment level einstellba ¬ rem emissivity. The surface is impurity ¬ free because unlike the prior art, no binder must be used in a Bepastungsprozess. The E- lektrode has a very good coupling characteristic in the inductive heating, and is mechanically stable, i.e., the electrode surface shows no tendency to crumble ¬ ERS. Step 140 is preferably carried out at a temperature between 700 ° C and 2500 ° C, in particular 2200 ° C, performed. The method according to the invention ends in step 160.
Durch das erfindungsgemäße Verfahren lassen sich Elektro¬ den mit einem Emissionsgrad der erzeugten Oberfläche von bis 0,6 erzeugen. Damit wird der Bereich, der im Stand der Technik mit Bepastung erreicht werden konnte, sogar geringfügig übertroffen. By means of the method according to the invention, it is possible to produce electrodes with an emissivity of the surface generated of up to 0.6. Thus, the range that could be achieved in the state of the art with paste, even slightly exceeded.
Fig. 3 zeigt eine vergrößerte Aufnahme des Bereichs der Oberfläche der Elektrode 16 von Fig. 1, bei dem die Form von zylindrisch in kegelförmig übergeht. Die Vergrößerung beträgt 10 : 1. Man erkennt deutlich die Spuren der Laserbearbeitung, insbesondere auch die Überlappungsberei¬ che der Laserstruktur, die dadurch entstanden sind, dass der Strahl beim Aufbringen der parallelen Linien in dem kegeligen Bereich der Elektrode 16 ausgelaufen ist. Fig. 4 zeigt eine vergrößerte Darstellung eines Aus¬ schnitts von Fig. 3 im Übergangsbereich zylindrischkegelförmig. Die Vergrößerung beträgt 1 : 30. Bei derselben Vergrößerung zeigt Fig. 5 einen Ausschnitt von Fig. 3 im zylindrischen Bereich. Bei weiterer Vergrößerung auf den Faktor 1 : 200 zeigt Fig. 6 einen vergrößerten Ausschnitt der Darstellung in Fig. 5. Es sind deutlich Rippen zu erkennen, wobei die Unregelmäßigkeit der Oberfläche ins Auge fällt. Durch die Unregelmäßigkeit ergibt sich eine deutlich Vergrößerung der Elektrodenoberfläche, wodurch sich hohe Emissionsgra¬ de erzielen lassen. FIG. 3 shows an enlarged view of the area of the surface of the electrode 16 of FIG. 1, in which the shape changes from cylindrical to conical. The magnification is 10: 1. One can clearly see the traces of the laser processing, in particular the overlap preparation ¬ surface of the laser structure, which are caused by the fact that the beam during the application of the parallel lines in the tapered portion of the electrode has expired sixteenth Fig. 4 shows an enlarged view of an off ¬ section of Fig. 3 in the transition region cylindrical cone -shaped. The magnification is 1: 30. At the same magnification, Fig. 5 shows a detail of Fig. 3 in the cylindrical region. With a further enlargement to the factor 1: 200, FIG. 6 shows an enlarged detail of the illustration in FIG. 5. Ribs can be clearly recognized, the irregularity of the surface falling into the eye. By the irregularity results in a clear increase of the electrode surface, which can be achieved high Emissionsgra ¬ de.
Fig. 7 schließlich zeigt das Detail einer Rippe der Darstellung von Fig. 6. Die Vergrößerung beträgt 1 : 1000. Diese Darstellung unterstreicht die hohe Rauigkeit der Wolframoberflache der Elektrode. Finally, FIG. 7 shows the detail of a rib in the illustration of FIG. 6. The magnification is 1: 1000. This illustration emphasizes the high roughness of the tungsten surface of the electrode.

Claims

Ansprüche claims
Verfahren zum Herstellen einer Elektrode (16) für eine Hochdruckentladungslampe (10), folgende Schritte um¬ fassend: A method of manufacturing an electrode (16) for a high pressure discharge lamp (10) comprising the steps of collectively ¬:
a) Überstreichen zumindest eines Teils der Elektro¬ denoberfläche zur Erzeugung einer Oxidschicht (Schritt 120) ; a) sweeping over at least part of the electric ¬ surfaces are designed to produce an oxide layer (step 120);
b) Zumindest teilweises Sublimieren der in Schritt a) entstehenden Oxidschicht (Schritt 120) ; und  b) at least partial sublimation of the oxide layer formed in step a) (step 120); and
c) Reduzieren der restlichen Oxidschicht (140) . 2. Verfahren nach Anspruch 1,  c) reducing the remaining oxide layer (140). 2. The method according to claim 1,
dadurch gekennzeichnet,  characterized,
dass in Schritt a) das Überstreichen zumindest auf einem Teil der Elektrode erfolgt, der nach der Montage der Elektrode im Glaskolben der Hochdruckentladungs- lampe nicht im Glas des Glaskolbens eingebettet ist that in step a) the coating is carried out at least on a part of the electrode, which is not embedded in the glass of the glass bulb after mounting the electrode in the glass bulb of the high-pressure discharge lamp
(Schritt 120) . (Step 120).
3. Verfahren nach einem der Ansprüche 1 oder 2, 3. The method according to any one of claims 1 or 2,
dadurch gekennzeichnet,  characterized,
dass Schritt a) an Atmosphäre, insbesondere sauer- stoffangereicherter Atmosphäre, durchgeführt wird that step a) is carried out on the atmosphere, in particular oxygen-enriched atmosphere
(Schritt 120) . (Step 120).
Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, Method according to one of the preceding claims, characterized
dass Schritt b) zeitgleich mit Schritt a) ausgefüh wird (Schritt 120) .  that step b) is carried out at the same time as step a) (step 120).
5. Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, 5. Method according to one of the preceding claims, characterized,
dass Schritt c) in einer wasserstoffhaltigen Atmosphäre, insbesondere in einem Argon-Wasserstoff-Gemisch, ausgeführt wird (Schritt 140) .  that step c) is carried out in a hydrogen-containing atmosphere, in particular in an argon-hydrogen mixture (step 140).
Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, Method according to one of the preceding claims, characterized
dass die Elektrode (16) Wolfram umfasst, wobei Schritt c) Wolframoxid zu reinem Wolfram reduz wird (Schritt 140) .  the electrode (16) comprises tungsten, wherein step c) reduces tungsten oxide to pure tungsten (step 140).
Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, Method according to one of the preceding claims, characterized
dass das Überstreichen in Schritt a) mittels einer Laserstrahl-, Elektronenstrahl- oder Ionenstrahlvor- richtung erfolgt (Schritt 120) . 8. Verfahren nach Anspruch 7,  in that the sweeping in step a) takes place by means of a laser beam, electron beam or ion beam device (step 120). 8. The method according to claim 7,
dadurch gekennzeichnet,  characterized,
dass die Laserstrahl-, Elektronenstrahl- bzw. Ionen- strahlvorrichtung ausgelegt ist, eine Energiedichte freizusetzen, die ein Schmelzen, Oxidieren sowie Sub- limieren zumindest eines Teils der Elektrodenoberflä¬ che ermöglicht. that the laser beam, electron beam or ion beam device is designed to release an energy density which limieren melting, oxidizing and sub- at least a portion of the Elektrodenoberflä ¬ che possible.
9. Verfahren nach einem der Ansprüche 7 oder 8, 9. The method according to any one of claims 7 or 8,
dadurch gekennzeichnet,  characterized,
dass in Schritt a) die Laserstrahlvorrichtung mit ei- ner Frequenz zwischen 1 kHz und 100 kHz, insbesondere in step a), the laser beam device has a frequency between 1 kHz and 100 kHz, in particular
10 kHz, getaktet wird (Schritt 120) . Verfahren nach einem der Ansprüche 7 bis 9, 10 kHz, is clocked (step 120). Method according to one of claims 7 to 9,
dadurch gekennzeichnet,  characterized,
dass in Schritt a) auf der Elektrodenoberfläche Zeilen mit einem Zeilenabstand zwischen zwei benachbarten Zeilen zwischen 0,01 und 0,2 mm, insbesondere 0,1 mm, erzeugt werden (Schritt 120) .  that in step a) lines with a line spacing between two adjacent lines between 0.01 and 0.2 mm, in particular 0.1 mm, are produced on the electrode surface (step 120).
11. Verfahren nach einem der Ansprüche 7 bis 10, 11. The method according to any one of claims 7 to 10,
dadurch gekennzeichnet,  characterized,
dass die Laserstrahlvorrichtung mit einem Laserstrahl- fokus zwischen 0,01 und 0,1 mm, insbesondere 0,02 mm, betrieben wird.  the laser beam device is operated with a laser beam focus between 0.01 and 0.1 mm, in particular 0.02 mm.
12. Verfahren nach einem der vorhergehenden Ansprüche, 12. The method according to any one of the preceding claims,
dadurch gekennzeichnet,  characterized,
dass Schritt c) bei einer Temperatur zwischen 700°C und 2500°C, insbesondere 2200°C, durchgeführt wird that step c) at a temperature between 700 ° C and 2500 ° C, in particular 2200 ° C, is performed
(Schritt 140) . (Step 140).
13. Verfahren nach einem der vorhergehenden Ansprüche, 13. The method according to any one of the preceding claims,
dadurch gekennzeichnet,  characterized,
dass Schritt a) bei Umgebungstemperatur, insbesondere einer Temperatur zwischen 15°C und 30°C, und Umgebungsdruck durchgeführt wird (Schritt 120) .  that step a) is carried out at ambient temperature, in particular a temperature between 15 ° C and 30 ° C, and ambient pressure (step 120).
Hochdruckentladungslampe (10) mit mindestens einer E- lektrode (16), die durch folgende Schritte hergestellt wurde : High-pressure discharge lamp (10) with at least one electrode (16), which was produced by the following steps:
a) Überstreichen zumindest eines Teils der Elek¬ trodenoberfläche zur Erzeugung einer Oxidschicht (Schritt 120) ; b) Zumindest teilweises Sublimieren der in Schritt a) entstehenden Oxidschicht (Schritt 120) ; und a) sweeping over at least a portion of Elek ¬ trodenoberfläche to produce an oxide layer (step 120); b) at least partial sublimation of the oxide layer formed in step a) (step 120); and
c) Reduzieren der restlichen Oxidschicht (Schritt 140) . c) reducing the residual oxide layer (step 140).
EP11778853.9A 2010-11-05 2011-10-28 Method for producing an electrode for a high-pressure discharge lamp and high-pressure discharge lamp comprising at least one electrode thus produced Not-in-force EP2526563B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010043463A DE102010043463A1 (en) 2010-11-05 2010-11-05 Method for producing an electrode for a high-pressure discharge lamp and high-pressure discharge lamp with at least one electrode produced in this way
PCT/EP2011/069030 WO2012059435A1 (en) 2010-11-05 2011-10-28 Method for producing an electrode for a high-pressure discharge lamp and high-pressure discharge lamp comprising at least one electrode thus produced

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EP2526563A1 true EP2526563A1 (en) 2012-11-28
EP2526563B1 EP2526563B1 (en) 2014-10-08

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US (1) US8876570B2 (en)
EP (1) EP2526563B1 (en)
JP (1) JP5693740B2 (en)
CN (1) CN103189958B (en)
DE (1) DE102010043463A1 (en)
WO (1) WO2012059435A1 (en)

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DE69822058D1 (en) * 1997-09-19 2004-04-08 Matsushita Electric Ind Co Ltd High-pressure discharge lamp and method for producing the same
US6626725B1 (en) 2000-05-08 2003-09-30 Welch Allyn, Inc Electrode treatment surface process for reduction of a seal cracks in quartz
JP4512968B2 (en) * 2000-08-03 2010-07-28 ウシオ電機株式会社 Short arc type high pressure discharge lamp
AT5322U1 (en) * 2001-05-11 2002-05-27 Plansee Ag METHOD FOR PRODUCING A HIGH PRESSURE DISCHARGE LAMP
JP3648184B2 (en) * 2001-09-07 2005-05-18 株式会社小糸製作所 Discharge lamp arc tube and method of manufacturing the same
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Also Published As

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US20130221842A1 (en) 2013-08-29
WO2012059435A1 (en) 2012-05-10
EP2526563B1 (en) 2014-10-08
JP5693740B2 (en) 2015-04-01
CN103189958B (en) 2016-08-03
DE102010043463A1 (en) 2012-05-10
JP2014500585A (en) 2014-01-09
US8876570B2 (en) 2014-11-04
CN103189958A (en) 2013-07-03

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