EP2510133A1 - Procédé de préparation d'un substrat en polymère métallisé - Google Patents
Procédé de préparation d'un substrat en polymère métalliséInfo
- Publication number
- EP2510133A1 EP2510133A1 EP10787795A EP10787795A EP2510133A1 EP 2510133 A1 EP2510133 A1 EP 2510133A1 EP 10787795 A EP10787795 A EP 10787795A EP 10787795 A EP10787795 A EP 10787795A EP 2510133 A1 EP2510133 A1 EP 2510133A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- substrate
- treatment
- metallic material
- group
- precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 56
- 229920000307 polymer substrate Polymers 0.000 title description 4
- 239000007769 metal material Substances 0.000 claims abstract description 60
- 238000011282 treatment Methods 0.000 claims abstract description 56
- 229920001577 copolymer Polymers 0.000 claims abstract description 52
- 239000002243 precursor Substances 0.000 claims abstract description 43
- 230000001590 oxidative effect Effects 0.000 claims abstract description 18
- 238000006243 chemical reaction Methods 0.000 claims abstract description 16
- 238000000576 coating method Methods 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 82
- 239000000243 solution Substances 0.000 claims description 52
- 239000010949 copper Substances 0.000 claims description 46
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 39
- 229910052802 copper Inorganic materials 0.000 claims description 39
- 230000008569 process Effects 0.000 claims description 36
- 150000002500 ions Chemical class 0.000 claims description 32
- 239000000203 mixture Substances 0.000 claims description 27
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 claims description 23
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 claims description 20
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 claims description 19
- 239000004417 polycarbonate Substances 0.000 claims description 17
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 16
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 16
- -1 polyethylene terephthalate Polymers 0.000 claims description 16
- 239000004952 Polyamide Substances 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 229920002647 polyamide Polymers 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 229910052763 palladium Inorganic materials 0.000 claims description 7
- 238000009832 plasma treatment Methods 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 238000003851 corona treatment Methods 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- 238000005554 pickling Methods 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 229920000515 polycarbonate Polymers 0.000 claims description 6
- 150000007522 mineralic acids Chemical class 0.000 claims description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 5
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 229920002125 Sokalan® Polymers 0.000 claims description 3
- 238000005299 abrasion Methods 0.000 claims description 3
- 230000002378 acidificating effect Effects 0.000 claims description 3
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims description 3
- 239000002537 cosmetic Substances 0.000 claims description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229920000767 polyaniline Polymers 0.000 claims description 3
- 238000005488 sandblasting Methods 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 239000003929 acidic solution Substances 0.000 claims description 2
- 125000002252 acyl group Chemical group 0.000 claims description 2
- 125000003435 aroyl group Chemical group 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 2
- 239000011859 microparticle Substances 0.000 claims description 2
- 239000002105 nanoparticle Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229920000768 polyamine Polymers 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 239000010948 rhodium Substances 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 239000004584 polyacrylic acid Substances 0.000 claims 1
- 230000001131 transforming effect Effects 0.000 abstract description 2
- 238000001465 metallisation Methods 0.000 description 42
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 36
- 229920000642 polymer Polymers 0.000 description 34
- 229910052751 metal Inorganic materials 0.000 description 23
- 239000002184 metal Substances 0.000 description 23
- 230000003647 oxidation Effects 0.000 description 20
- 238000007254 oxidation reaction Methods 0.000 description 20
- 238000004458 analytical method Methods 0.000 description 19
- 238000006722 reduction reaction Methods 0.000 description 18
- 230000009467 reduction Effects 0.000 description 17
- 210000002381 plasma Anatomy 0.000 description 16
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 14
- 238000002604 ultrasonography Methods 0.000 description 14
- 239000003638 chemical reducing agent Substances 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 10
- 239000002253 acid Substances 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 229920003023 plastic Polymers 0.000 description 8
- 239000004033 plastic Substances 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000005498 polishing Methods 0.000 description 7
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 6
- 238000010301 surface-oxidation reaction Methods 0.000 description 6
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 5
- 150000001768 cations Chemical class 0.000 description 5
- 238000002484 cyclic voltammetry Methods 0.000 description 5
- 238000006731 degradation reaction Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910001448 ferrous ion Inorganic materials 0.000 description 5
- 238000002329 infrared spectrum Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 4
- 239000002390 adhesive tape Substances 0.000 description 4
- 230000003321 amplification Effects 0.000 description 4
- 239000008139 complexing agent Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000008034 disappearance Effects 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- 239000012279 sodium borohydride Substances 0.000 description 4
- 229910000033 sodium borohydride Inorganic materials 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- 229910014033 C-OH Inorganic materials 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- 229910014570 C—OH Inorganic materials 0.000 description 3
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229940075397 calomel Drugs 0.000 description 3
- 238000012790 confirmation Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical compound Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 3
- 230000005518 electrochemistry Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 229910001447 ferric ion Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 3
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000004321 preservation Methods 0.000 description 3
- 238000002203 pretreatment Methods 0.000 description 3
- 239000012487 rinsing solution Substances 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 239000008149 soap solution Substances 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 238000004832 voltammetry Methods 0.000 description 3
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- 239000004693 Polybenzimidazole Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 235000013339 cereals Nutrition 0.000 description 2
- 230000009920 chelation Effects 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000013626 chemical specie Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000009996 mechanical pre-treatment Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920002239 polyacrylonitrile Polymers 0.000 description 2
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- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 229910021653 sulphate ion Inorganic materials 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
- OMIHGPLIXGGMJB-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]hepta-1,3,5-triene Chemical compound C1=CC=C2OC2=C1 OMIHGPLIXGGMJB-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
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- 239000004801 Chlorinated PVC Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
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- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical group CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- NSOXQYCFHDMMGV-UHFFFAOYSA-N Tetrakis(2-hydroxypropyl)ethylenediamine Chemical compound CC(O)CN(CC(C)O)CCN(CC(C)O)CC(C)O NSOXQYCFHDMMGV-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 238000000026 X-ray photoelectron spectrum Methods 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical group 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
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- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000000746 allylic group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
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- 230000001580 bacterial effect Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
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- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
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- 229920002678 cellulose Polymers 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229920000457 chlorinated polyvinyl chloride Polymers 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
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- 238000010668 complexation reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
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- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
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- 238000004090 dissolution Methods 0.000 description 1
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- 150000002148 esters Chemical class 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- IVJISJACKSSFGE-UHFFFAOYSA-N formaldehyde;1,3,5-triazine-2,4,6-triamine Chemical compound O=C.NC1=NC(N)=NC(N)=N1 IVJISJACKSSFGE-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 230000002538 fungal effect Effects 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 150000002390 heteroarenes Chemical class 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
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- 239000012535 impurity Substances 0.000 description 1
- QZUPTXGVPYNUIT-UHFFFAOYSA-N isophthalamide Chemical compound NC(=O)C1=CC=CC(C(N)=O)=C1 QZUPTXGVPYNUIT-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
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- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
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- 125000002560 nitrile group Chemical group 0.000 description 1
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- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
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- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
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- 235000005985 organic acids Nutrition 0.000 description 1
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- 125000006353 oxyethylene group Chemical group 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000012994 photoredox catalyst Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000090 poly(aryl ether) Polymers 0.000 description 1
- 229920013654 poly(arylene sulfone) Polymers 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920001652 poly(etherketoneketone) Polymers 0.000 description 1
- 229920000747 poly(lactic acid) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000582 polyisocyanurate Polymers 0.000 description 1
- 239000011495 polyisocyanurate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- ODGAOXROABLFNM-UHFFFAOYSA-N polynoxylin Chemical compound O=C.NC(N)=O ODGAOXROABLFNM-UHFFFAOYSA-N 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
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- 239000001294 propane Substances 0.000 description 1
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- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
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- 239000002904 solvent Substances 0.000 description 1
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- 239000003381 stabilizer Substances 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
- C23C18/405—Formaldehyde
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
- C23C18/1641—Organic substrates, e.g. resin, plastic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
- C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
Definitions
- the invention belongs to the technical field of surface coatings and, more particularly, to the technical field of metallization of surfaces.
- the present invention relates to a simplified metallization process using polymer substrates.
- the metallization consists in coating the surface of a part with a thin layer of metal.
- the metallization of a plastic part is particularly used in areas such as the automobile and boats where certain accessories in (co) polymer are coated with chromium; the electronics industry, household appliances and lighting fixtures; cosmetics and fashion accessories; optics and watchmaking; etc. There is therefore a great interest in the development of a metallization process of a plastic surface and, more generally, polymers.
- the metallization of polymers is a process developed for more than fifty years. She involves alternative techniques to those used for conductive substrates.
- the metallization of the polymers is generally carried out in 3 steps.
- the l st step is a surface modification step which provides, firstly, a surface roughness in order to improve the adhesion of the metal layer by mechanical anchoring.
- This modification also makes it possible to increase the wettability of the polymer surface, in particular by adding hydrophilic groups generally incorporating oxygen or nitrogen in order to facilitate activation of the surface. Indeed, it is necessary that the polymer has groups promoting the adsorption of the activating metal agent.
- the metal agent is palladium, chemisorption thereof is only possible on nitrogen elements [1].
- the pretreatment roughness and contribution of C-O and / or C-N bonds to the surface of the polymer to be metallized are mandatory.
- the 2 nd step is a step of surface activation of depositing metal particles on the surface of the modified polymer. These particles subsequently play the role of catalyst for the metallization. Thus, it is necessary to maintain on the surface of the polymer metal cations which will subsequently be reduced.
- the last step uses a metallization bath in which the activated polymers are immersed. In this bath, metal growth is catalyzed by the metal particles deposited in the previous step.
- the metallization bath is a stable solution containing at least one metal cation and its complexing agent, a reducing agent and a stabilizer, generally in an alkaline medium.
- Processes used in particular at the industrial level consist of oxidizing the surface to be metallized and then adsorbing palladium on the latter via the tin / palladium colloid, which corresponds to the activation step. Following the latter, an acceleration step is implemented, to remove the tin and thus promote the activity of the precursor of the metal layer which is, in this case, palladium. Traces of tin can, in fact, induce metal growth in unwanted places.
- the acceleration step is followed by a step in the presence of a metallization bath as previously defined.
- the present invention makes it possible to meet this expectation and to solve the technical problems of metallization processes of the state of the art.
- the work of the inventors has made it possible to develop a metallization process in which several steps of the conventional metallization processes of the polymers are eliminated since the process of the invention consists in depositing and maintaining metal cations on the surface of the metal. a polymer at the same time as its surface oxidation.
- the present invention relates to a method of coating a surface of a (co) polymer substrate with a metallic material comprising the successive steps of:
- the term "metal-material coating” means a substrate coated on the surface with a thin layer, typically from a few nanometers to several microns, of a metal and / or a metal oxide. This thin layer may cover all or part of the surface of the substrate.
- the thus coated substrate may be called a "metallized substrate".
- the metallized substrates it is possible to distinguish the substrates metallized only by a metal or only by a metal oxide, substrates metallized by the two types of metal entities.
- the substrate according to the present invention can have any size and shape. Indeed, the size of the substrate used in the context of the present invention may be nanometric, micrometric, millimetric or metric. Thus, the present invention applies, as non-limiting examples, to a substrate that can be chosen from the group consisting of a nanoparticle, a microparticle, a button, a cosmetic product cap, an electronic element, a handle door, an electrical appliance, glasses, a decorative object such as a luminaire, a bodywork element, etc.
- surface of a substrate (co) polymer means not only a substrate (co) polymer but also a substrate of which only the surface is in (co) polymer, the rest of the substrate can be in any material .
- (co) polymer is meant in the context of the present invention a substrate or a surface consisting essentially of a single (co) polymer or several (co) polymers.
- essentially constituted is meant in the context of the present invention a substrate or a surface of which at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, at least less 95% and / or at least 98% of the constituents expressed by weight are one (or more) (co) polymer (s).
- the substrate or the surface of the substrate consists solely of one (or more) (co) polymer (s).
- the substrate or substrate surface comprises, in addition to one (or more) (co) polymer (s), at least one member selected from the group consisting of fillers, plasticizers and additives.
- This (or these) element (s) additional (s) is (are) advantageously incorporated (s) and / or dispersed (s) in the polymeric material.
- a plastic or plastic material is formed (e) of at least one (co) polymer advantageously having a degree of polymerization greater than 3000 and at least one additive. Therefore, the substrate or surface of the polymer substrate used in the context of the present invention comprises substrates or substrate surfaces of plastic or plastic.
- Mineral fillers such as silica, talc, glass or organic fibers or beads such as cereal flour or cellulose pulp are generally used to reduce the cost and improve certain properties such as the mechanical properties of the polymeric material.
- the additives are mainly used to improve a specific property of the polymeric material, said property being able to be crosslinking, slipping, resistance to degradation, fire and / or bacterial and fungal attacks.
- Any natural, artificial, synthetic, thermoplastic, thermosetting, thermostable, elastomeric, linear (ie one-dimensional, linear or branched) and / or three-dimensional polymer is usable in the context of the present invention.
- natural polymers mention may be made of sugars.
- the polymer used in the context of the present invention is a thermoplastic (co) polymer selected from the group consisting of
- a polyolefin such as polyethylene, polypropylene, an ethylene / propylene copolymer, a polybutylene, a polymethylpentene, an ethylene / vinyl acetate copolymer, an ethylene / vinyl alcohol copolymer, a copolymer thereof, a mixture thereof and a their combinations;
- polyester such as polyethylene terephthalate optionally modified with glycol, a polybutylene terephthalate, a polylactide, a polycarbonate, a copolymer thereof, mixtures thereof and combinations thereof;
- polyether such as poly (oxymethylene), poly (oxyethylene), poly (oxypropylene), poly (phenylene ether), a copolymer thereof, mixtures thereof and combinations thereof;
- a vinyl polymer such as optionally chlorinated polyvinyl chloride, polyvinyl alcohol, polyvinyl acetate, polyvinyl acetal, polyvinyl form, poly ( vinyl fluoride), a poly (chloride of vinyl / vinyl acetate), one of their copolymers, blends and combinations;
- a vinylidene polymer such as a polyvinylidene chloride, a polyvinylidene fluoride, a copolymer thereof, mixtures thereof and combinations thereof;
- styrenic polymer such as polystyrene, poly (styrene / butadiene), poly (acrylonitrile /
- butadiene / styrene a poly (acrylonitrile / styrene), a poly (acrylonitrile / ethylene / propylene / styrene), a poly (acrylonitrile / styrene / acrylate), a copolymer thereof, a mixture thereof and a combination thereof ;
- a (meth) acrylic polymer such as a polyacrylonitrile, a poly (methyl acrylate), a poly (methyl methacrylate), a copolymer thereof, mixtures thereof and combinations thereof;
- a polyamide such as a poly (caprolactam), a poly (hexamethylene adipamide), a poly (lauroamide), a polyether-block-amide, a poly (metaxylylene adipamide), a poly (metaphenylene isophthalamide), a (poly) their copolymers, blends and combinations;
- a fluorinated polymer such as polytetrafluoroethylene, polychlorotrifluoroethylene, perfluoro poly (ethylene / propylene), polyvinylidene fluoride, a copolymer thereof, mixtures thereof and combinations thereof
- a cellulosic polymer such as cellulose acetate, cellulose nitrate, methylcellulose, carboxymethylcellulose, a copolymer thereof, mixtures thereof and combinations thereof;
- poly (arylenesulfone) such as polysulfone, polyethersulfone, polyarylsulfone, a copolymer thereof, mixtures thereof and combinations thereof;
- polysulfide such as polyphenylene sulphide
- a poly (aryl ether) ketone such as a poly (ether ketone), a poly (ether ether ketone), a poly (ether ketone ketone), a copolymer thereof, mixtures thereof and combinations thereof;
- the (co) polymer used in the context of the present invention is a thermosetting (co) polymer chosen from the group consisting of an aminoplast such as urea-formaldehyde, melamine-formaldehyde, melanin-formaldehyde / polyesters, one of their copolymers, blends and combinations thereof; polyurethane; unsaturated polyester; a polysiloxane; a resin formophenolic, epoxy, allylic or vinylester; an alkyd; polyurea; a polyisocyanurate; a poly (bismaleimide); a polybenzimidazole; polydicyclopentadiene; one of their copolymers, one of their mixtures and one of their combinations.
- an aminoplast such as urea-formaldehyde, melamine-formaldehyde, melanin-formaldehyde / polyesters, one of their copolymers, blends and combinations thereof
- polyurethane unsatur
- Co polymer used in the context of the present invention include acrylonitrile butadiene styrene (ABS), acrylonitrile butadiene styrene / polycarbonate (ABS / PC), a polyamide (PA) such as nylon, a polyamine poly (acrylic acid), polyaniline and polyethylene terephthalate (PET).
- ABS acrylonitrile butadiene styrene
- PA acrylonitrile butadiene styrene / polycarbonate
- PA polyamide
- PET polyethylene terephthalate
- the substrate to be metallized Prior to step (a) of the process according to the invention, the substrate to be metallized has no precursor of the metallic material adsorbed on the surface.
- oxidizing treatment is meant in the context of the present invention a treatment for oxidizing the surface of the substrate used.
- Such an oxidative treatment is also susceptible to increase the hydrophilicity of the surface of the substrate used.
- This treatment relies on the use of various reagents to create on the surface of the (co) polymer constituting the surface of the substrate and / or the substrate, a surface oxidation allowing a better grip and / or a better maintenance on the surface of the substrate precursor of a metallic material present during the oxidizing treatment.
- This hooking and / or holding implements a chelation (or complexation) between the precursor of a metallic material and groups present on the oxidized surface. All or part of the precursor of the metallic material remains in particular on the surface of the (co) polymer and can be reduced thereafter.
- step (a) of the process according to the present invention is carried out at a temperature below 60 ° C., in particular between 5 ° C. and 50 ° C. and, in particular, between 10 ° C. and 40 ° C. vs.
- Step (a) according to the invention is carried out, in a more specific embodiment, at ambient temperature.
- ambient temperature is meant a temperature of 20 ° C ⁇ 5 ° C.
- the oxidizing treatment implemented during step (a) is based on the chemical reaction of Fenton (1894). This oxidizing treatment can therefore be designated oxidative treatment by Fenton-type chemical reaction.
- the chemical reaction of Fenton consists of an acidic oxidation of hydrogen peroxide by ferrous ions represented by the following reaction scheme: Fe 2+ + H 2 0 2 ⁇ > Fe 3+ + " OH + OH "
- This reaction generates hydroxyl radicals ( ⁇ ) which are very reactive in particular towards the plastic surfaces, the ferrous ions acting as a precursor of the metallic material.
- the generalized Fenton chemical reaction applied to the oxidizing treatment of step (a) of the process of the present invention comprises contacting said surface of the substrate with a solution containing at least one precursor of the metallic material and a compound of formula ROOR wherein R represents a hydrogen, an alkyl group comprising from 1 to 15 carbon atoms, an acyl group -COR 'with R' representing an alkyl group comprising from 1 to 15 carbon atoms or an aroyl group -COAr with Ar representing a aromatic group comprising from 6 to 15 carbon atoms.
- R represents a hydrogen, an alkyl group comprising from 1 to 15 carbon atoms, an acyl group -COR 'with R' representing an alkyl group comprising from 1 to 15 carbon atoms or an aroyl group -COAr with Ar representing a aromatic group comprising from 6 to 15 carbon atoms.
- alkyl group comprising 1 to 15 carbon atoms is meant an optionally substituted linear, branched or cyclic alkyl group comprising from 1 to 15 carbon atoms, especially from 1 to 10 carbon atoms, and in particular , from 2 to 6 carbon atoms and optionally a heteroatom such as N, O, F, Cl, P, Si, Br or S.
- aromatic group comprising from 6 to 15 carbon atoms
- aromatic or heteroaromatic group consisting of one or more aromatic rings or heteroaromatic compounds each containing from 3 to 10 atoms, the heteroatom (s) possibly being N, O, P or S.
- substituted is meant, in the context of the present invention, an alkyl or aromatic group, mono- or poly-substituted, with a linear or branched alkyl group comprising from 1 to 4 carbon atoms, by a group amine, with a carboxylic group and / or with a nitro group.
- step (a) of the process of the present invention can be represented by the following reaction scheme:
- the integer n is advantageously chosen from the group consisting of 1, 2, 3, 4 and 5.
- the precursor (s) of the metallic material used during step (a) of the process according to the invention plays (s) a role of catalyst (s) for the metal growth and therefore the metallization of the surface of the substrate.
- the precursor (s) of the metallic material is (are) advantageously one (or more) metal cation (s), in particular chosen from the noble metals of group IB or group VIII. More particularly, the precursor (s) of the metallic material is (are) chosen from the group formed by the ions of copper, silver, gold, iron, ruthenium, osmium, cobalt, rhodium, iridium, nickel, palladium and platinum.
- the precursors of the metallic material are present in the solution comprising at least one precursor of the metallic material and a compound of formula ROOR at a concentration of between 0.05 and 5 M, in particular between 0.1 and 3 M and, in particular, between 0.5 and 2.5 M.
- the solution comprising at least one precursor of the metallic material and a compound of formula ROOR furthermore comprises counterions such as tetrafluoroborate, sulphate, bromide, fluoride, iodide, nitrate, phosphate or chloride. .
- the compound of formula ROOR is present in the solution comprising at least one precursor of the metallic material and a compound of formula ROOR at a concentration of between 5 ⁇ 10 -4 M and 5 M, in particular between 0.1 and 3 M, and in particular, between 0.5 and 2.5 M.
- the solution comprising at least one precursor of the metallic material and a compound of formula ROOR is advantageously an acidic solution.
- acid solution is meant a solution whose pH is less than 7, especially between 2 and 4 and, in particular, of the order of 3 (i.e. 3 ⁇ 0.5).
- This solution also comprises sulfuric acid and in particular at a concentration of between 0.05 and 50 mM, in particular between 0.1 and 10 mM and, more particularly, of the order of 1 mM (ie 1 ⁇ 0.25 mM).
- the duration of the Fenton-type chemical reaction treatment may be variable. As examples non-limiting, this duration is advantageously between 5 min and 5 h, in particular between 10 min and 3 h, in particular between 15 min and 2 h and, more particularly, of the order of 25 min (ie 25 ⁇ 5 min ).
- the precursors of the metallic material are only provided by the solution used during the Fenton reaction i.e. the solution implemented during step (a) of the process of the invention.
- the Fenton reaction is used to oxidize the surface of the substrate to be metallized but also to adsorb the metal cations acting thereafter as precursors of the metal layer deposited by Electroless.
- Step (b) of the process according to the present invention is a step well known to those skilled in the field of metallization of materials since it consists in transforming the precursor of the metallic material into said metallic material.
- this transformation step has the successive sub-steps of
- step (b2) contacting said precursor possibly reduced following step (bi) in a solution containing at least one ion of the metallic material.
- step (b) of the process according to the present invention Any technique for reducing the precursor of the metallic material can be used in the context of step (b) of the process according to the present invention.
- this reduction step is a chemical reduction in a single step.
- This preferred variant consists in bringing into contact the surface of the substrate on which the precursor (s) of the metallic material is (are) with a reducing solution S R.
- the reducing solution S R is basic.
- the reducing solution S R comprises a reducing agent, in particular chosen from the group consisting of sodium borohydride (NaBH 4 ), dimethylamine borane (DMAB-H (CH 3 ) 2 NBH 3 ) and hydrazine (N 2 H 4 ) .
- the pH of the reducing solution S R is neutral or basic, whereas for DMAB the pH of the solution S R is basic.
- a solvent advantageously used is NaOH and in particular at a concentration between 10 4 M and 5 M, especially between 0.05 and 1 M and, in particular, of the order of 0.1 M (i.e. 0, 1 M ⁇ 0.01 M).
- the reducing agent is present in the reducing solution S R at a concentration of between 10 -4 and 5 M, in particular between 0.01 and 1 M and, in particular, of the order of 0.3 M (ie 0, 3 M ⁇ 0.05 M).
- the reduction step (bi) can be carried out at a temperature of between 20 ° C. and 100 ° C., in particular between 30 ° C. and 70 ° C. and, in particular, of the order of 50 ° C. (ie 50 ° C.). ° C ⁇ 5 ° C).
- the reduction step (bi) can last between 30 sec and 1 h, in particular between 1 and 30 min and, in particular, between 2 and 20 min.
- the precursors of the metallic material reduced following step (b) of the process according to the invention predominantly have an oxidation degree of 0.
- the metallization can then take place by immersion in a plating bath and growth on the particles. precursors at an oxidation degree of 0.
- this reduction step may be optional. Indeed, in some cases, the precursor of the metallic material can be reduced during contacting with the solution containing at least one ion of the metallic material during step (b 2 ) without a prior reduction step be necessary. Indeed, if the precursor of the metallic material has a higher oxidation-reduction potential than the metal deposited by Electroless, the precursor of the metallic material can be, initially, reduced upon contact with the ion of the metallic material before the metal growth is initiated.
- Step (b 2 ) therefore consists in contacting said reduced precursor following step (bi) in a solution containing at least one ion of the metallic material.
- the solution containing an ion of the metal material hereinafter designated S M corresponds to a metallization bath well known to those skilled in the art, just like its components.
- the solution containing at least one ion of the metallic material SM implemented in step (b 2 ) comprises ions of the metallic material, a complexing agent for the ions of the metallic material, a reducing agent and a regulator. pH.
- said solution S M is an aqueous solution.
- several metallization solutions are commercially available.
- the ion (s) of the metallic material used in the context of the present invention may be any ion of a metallic material.
- the present invention relates more particularly to the ions of a transition metal.
- the ion (s) of the metallic material according to the invention is (are) chosen from the group consisting of Ag + , Ag 2+ , Ag 3+ , Au + , Au 3+ , Co 2+ , Cu + , Cu 2+ , Fe 2+ , Ni 2+ , Pd + , and Pt + .
- the ion (s) of the metallic material is (are) associated with a counter anionic ion.
- anionic counterions that may be used, mention may be made of a chloride, a bromide, a fluoride, an iodide, a sulphate, a nitrate, a phosphate, an acetate and any organic or inorganic acid salt.
- the complexing agent ions of the metallic material is necessary to compensate for the loss of solubility of these ions under the basic conditions used and avoid their precipitation.
- a complexing agent is in particular chosen from organic acids and their salts such as tartaric acid, EDTA or EDTP.
- the reducing agent advantageously used may especially be formaldehyde, DMAB or H 2 PO 2 .
- DMAB formaldehyde
- H 2 PO 2 a group consisting of reducing agents used in the context of the present invention.
- Those skilled in the art know different ion pairs of the metallic material / reducing agent used in the context of the present invention. Similarly, depending on the particular couple chosen, those skilled in the art the pH and temperature conditions of the solution S M to implement.
- the reducing agent advantageously used under basic conditions is formaldehyde in an amount of between 0.1 and 5% (v / v) with respect to total volume of the SM solution.
- basic conditions is meant a solution whose pH is between 10 and 14 and especially between 12 and 13, such a pH is reached by using NaOH as a pH regulator.
- the metallization step (b 2 ) can be carried out at a temperature of between 20 ° C. and 80 ° C., in particular between 30 ° C. and 60 ° C. and, in particular, of the order of 40 ° C. (ie 40 ° C. ⁇ 5 ° C.). ° C).
- the metallization step (b 2 ) can last between 1 min and 1 h, in particular between 5 and 45 min and, in particular, between 10 and 30 min.
- the metallization of the surface of the substrate i.e. the presence of a thin layer of metallic material on the surface of the substrate is easily verifiable, typically, visually and in particular with the naked eye.
- the surface of the substrate to be metallized may possibly undergo different pre-treatments.
- These pretreatments may be conventional treatments in the field of metallization of surfaces such as degreasing or polishing.
- the surface of the substrate may optionally be subjected, prior to step (a) of the process according to the invention, to a treatment capable of increasing its hydrophilicity and / or roughness, said treatment being chosen from the group consisting of a sandblasting, abrasion, chemical treatment with pickling bath, flame treatment, corona treatment and plasma treatment and combinations thereof.
- step (a) does not bring any additional roughness to the surface of the substrate which can be verified by AFM measurement. Also, according to the initial roughness of the (Co) polymer constituting the surface of the substrate or the substrate, a pretreatment preceding step (a) to bring a surface roughness must be performed.
- the hydrophilicity of the (co) polymer constituting the surface of the substrate or the substrate to be treated may be necessary to increase the hydrophilicity of the (co) polymer constituting the surface of the substrate or the substrate to be treated.
- Some (co) polymers already have nitrogen or oxygen groups such as poly (acrylic acid), polyanilines and polyamides. If these oxygens or nitrogens are accessible on the surface of the substrate to be metallized, the step providing hydrophilicity is not mandatory.
- the surface roughness with or without hydrophilic function can be provided by mechanical pretreatment, chemical or dry and will, in some cases, accompanied by surface oxidation.
- Mechanical pretreatment of the surface to be treated consists of sandblasting or abrasion with grains of larger or smaller size. It does not modify in any way the chemical composition of the surface and therefore does not oxidize the surface of the (co) polymer constituting the surface of the substrate or the substrate to be treated. In addition, it is not always effective and remains possible only in the case of substrates of adequate size such as substrates in the form of large flat parts.
- a chemical pretreatment (acid / base) (or chemical treatment with pickling bath) is based on contacting the surface to be treated with a bath acid or basic pickling and is specific to the (co) polymers to be metallized. It brings surface roughness and very generally surface oxidation. In each case, etching, also called “satin”, will degrade the surface (co) polymer constituting the surface of the substrate or the substrate to be treated by etching. This stripping follows the laws of the chemical reactivity of the polymer chains.
- this degradation causes a rupture of chains of (co) polymers on the surface, thereby causing their solubilization in order to reveal a roughness on the surface of the (co) polymer.
- an acid attack on polyamide-type polymers allows degradation of the organic material.
- a basic attack allows the degradation and the dissolution of the polycarbonate contained in the surface in the ABS-PC increasing the surface roughness.
- an acidic aqueous solution comprising at least one inorganic acid.
- Said inorganic acid is especially selected from the group consisting of chromic acid, sulfuric acid, nitric acid, hypochlorous acid and mixtures thereof.
- mixture is meant a mixture of at least two different inorganic acids such as a mixture of chromic acid and sulfuric acid or a mixture of at least three different inorganic acids such as an acid mixture nitric acid, hypochlorous acid and sulfuric acid.
- the chemical pre-treatment is advantageously carried out for a period of between 1 and 60 min, in particular between 2 and 30 min and, in particular, between 5 and 20 min and at a temperature of between 20 and 120 ° C, in particular between 40 and 110 ° C and, in particular, between 60 and 100 ° C
- the surface to be treated may also be subjected to a dry pretreatment.
- physicochemical treatments comprising a flame treatment, a corona treatment and a plasma treatment also have a double effect: i) the oxidation of chemical bonds on the surface and ii) the increase in roughness.
- “Flaming” is to expose the surface of the substrate and / or the substrate to the action of a flame and in particular to the action of a stable flame and slightly oxidizing.
- the high temperatures of this treatment generate active species that can correspond to radicals, ions or excited molecules.
- the (co) polymer constituting the surface of the substrate and / or the substrate is oxidized to a thickness of about 4 to 9 mm.
- a diffusion phenomenon is observed inside the polymer of chemical species resulting from its degradation. There is a real restructuring of the surface. These changes are result in an improvement of the wettability and roughness of the surface to be coated.
- the flame is in particular disposed at a distance from the surface of the substrate and / or the substrate of between 0.1 and 20 cm, in particular between 0.3 and 10 cm and more particularly between 0.5 and 5 cm.
- This flame is advantageously generated by a mixture of at least two gases, the first and second gases being respectively chosen from the group consisting of hydrogen, methane, ethane and propane and the group consisting of air , ozone and oxygen.
- the temperature of the flame thus obtained is between 500 and 1600 ° C, especially between 800 and 1400 ° C and, in particular, of the order of 1200 ° C (i.e. 1200 ⁇ 100 ° C).
- the duration of the flame treatment is between 0.01 and 10 sec, in particular between 0.015 and 1 sec, and in particular between 0.02 and 0.1 sec.
- Corona treatment is also referred to as “corona treatment” or “corona discharge treatment” and involves exposing the surface of the substrate and / or the substrate to an ionization field created by passing an alternating current of high voltage between two electrodes distant a few mm and in particular 1 to 2 mm.
- an electrical discharge driven by the ionization of the medium surrounding a conductor occurs when the electric potential exceeds a critical value but the conditions do not allow the formation of an arc.
- the emitted electrons are precipitated in the electric field and transmit their energy to the molecules of the medium surrounding the surface of the substrate and / or the substrate which is advantageously air or an inert gas optionally enriched with oxygen.
- the surface of the (co) polymer constituting the surface of the substrate and / or the substrate is oxidized.
- the density of the corona discharge is advantageously between 10 and 500 W min / m 2, especially between 20 and 400 W min / m 2 and in particular between 30 and 300 W min / m 2.
- the duration of treatment with the corona effect is between 0.1 and 600 sec, especially between 1 and 120 sec, and in particular between 10 to 50 sec.
- Plasma treatment involves exposing the surface of the solid support and / or the solid support to a plasma.
- plasma is a gas in the ionized state, classically considered as a fourth state of matter.
- the energy required for the ionization of a gas is provided by means of an electromagnetic wave (radio frequency or microwave).
- Plasma is composed of neutral molecules, ions, electrons, radical species (chemically very active) and excited species that will react with the surface of materials. If the plasma gas contains oxygen or nitrogen, these atoms will react instantly with the (co) polymer surface and create active sites.
- the modification of the (co) polymers by the plasmas results in the formation of radicals and double bonds, by the crosslinking and the functionalization of the surface.
- Plasma treatment is usually limited to the extreme surface and the surface roughness provided is limited.
- the so-called “cold” plasmas and the so-called “hot” plasmas which are distinguished from each other with respect to the ionization rate of the species contained in the plasma.
- the ionization rate of the reactive species is less than 10 ⁇ 4 whereas for so-called “hot” plasmas, it is greater than 10 ⁇ 4 .
- the terms “hot” and “cold” come from the fact that the so-called “hot” plasma is much more energetic than the so-called “cold” plasma.
- a so-called “cold” plasma is more suitable.
- the plasma is advantageously generated by one (or more) plasma gas (s).
- the first and second gases are respectively selected from the group consisting of inert gases and the group consisting of air and oxygen.
- the duration of the plasma treatment is between 1 sec and 5 min, especially between 10 to 60 sec and, in particular, between 20 and 40 sec. In the context of the process according to the present invention, it may be necessary between two treatment steps; prior to step (a); between steps (a) and (b) or between steps (bi) and (b 2 ) subjecting the surface of the substrate and / or substrate to rinsing or rinsing using identical or different rinsing solutions.
- this rinsing solution is chosen from water, distilled water, deionized water, MilliQ water, an aqueous solution containing a detergent such as TDF4 or sodium hydroxide, especially sodium hydroxide, in a concentration of between 0.01 and 1 M.
- the rinsing solution when it is brought into contact with the surface of the substrate or the substrate, can be agitated, in particular by using a stirrer, a magnetic bar, an ultrasound bath or a homogenizer.
- Each rinsing step can last from 1 to 30 min and in particular from 5 to 20 min.
- the present invention finally relates to a substrate whose surface is coated with a metallic material that can be obtained by the method of the invention as previously defined.
- Figure 1 shows the cyclic voltammetry diagram on an electroless electroless-plated copper ABS plate according to the method of the present invention.
- Figure 2 shows the cyclic voltammetry diagram on a electroless electroless electroless copper-ABS plate according to the method of the present invention.
- Figure 3 shows the cyclic voltammetry diagram on a electroless electroless copper plated PA plate according to the method of the present invention.
- Figure 4 shows the cyclic voltammetry diagram on an electroless electroless-plated copper ABS plate according to the method of the present invention (Example II below).
- Figure 5 shows the cyclic voltammetry diagram on an electroless electroless-plated copper ABS-PC plate according to the method of the present invention (Example III below).
- ABS acrylonitrile butadiene styrene
- ABS ABS / PC
- PA polyamide
- This metallization process is carried out in 3 steps (Fenton Treatment / Reduction / Metallization electroless) and before treating the polymer, it should be prepared, degreased and cleaned.
- the plates are subjected to polishing to minimize edge effects and other defects introduced during the cutting of the plates.
- the plates were rinsed using an industrial soap solution TDF4 mixed with water (1 mL TDF4 4 mL of MilliQ H 2 0) under ultrasound for 10 min. The plates are then rinsed with MilliQ water, under ultrasound for 10 min.
- Iron (II) sulfate (6.961 g, 0.1 mol) was solubilized in 50 mL of 10 ⁇ 3 M sulfuric acid in water. In this solution, the polymer plates were immersed. 10 mL (0.124 mol) of 35% hydrogen peroxide in water was then added dropwise. After 25 min, the samples were rinsed with MilliQ water before being dried. The results obtained for the contact angle measurements of a drop of 2 ⁇ of water deposited on the samples treated according to the treatment of Fenton ("After") or without treatment (“Virgin”) are presented in Table 1 below.
- the contact angle is clearly lowered, the surface has become very hydrophilic by oxidation.
- NaBH 4 sodium borohydride (0.316 g, 0.8 X 10 -2 mol) is dissolved in 25 ml of a 0.1 M sodium hydroxide solution (NaOH). This solution is heated to 80 ° C. at room temperature. using a water bath and the samples are immersed in it. After 12 min, the samples were rinsed with MilliQ water before being dried.
- IR analysis reveals the preservation of the oxidation obtained after Fenton with the bands at 3600-3100 cm -1 and the bands 1700-1640 cm -1 , regardless of the polymer.
- the XPS analysis of the ABS plate before / after reduction shows a slight decrease of all elements except the appearance of bohr. According to the XPS spectra, it is in oxidized form and thus confirms the reduction of Fe 2+ / Fe 3+ ions by borohydride BH 4 ⁇ .
- the iron is, in turn, oxidized in air and water before the XPS analysis and is in oxidized form.
- the atomic ratios with respect to the carbon signal are shown in Table 4 below.
- Table 5 Composition of the copper plating bath After 15 minutes, the samples were rinsed with MilliQ water, under ultrasound for 10 minutes before being dried.
- the copper layer is also visible to the eye.
- the presence of carbon, nitrogen and oxygen after metallization is due to the presence of organic impurities at the extreme surface of the metallized substrate.
- Oxygen can also come from the air oxidation of the copper layer prior to analysis.
- Electrochemical set up consisted of a saturated KC1 calomel reference electrode and a graphite counter electrode.
- the electrodes were soaked in a CUSC solution at 10 g / L, the initial potential was about 0.1 V.
- the confirmation of the copper deposit is also visual. Indeed, the copper layer deposited by electrochemistry has a slightly more homogeneous appearance.
- This metallization process is carried out in 4 steps (Oxidation Pretreatment / Treatment of
- the plates are subjected polishing to minimize edge effects other defects introduced during the cutting of the plates.
- the plates were rinsed using an industrial soap solution TDF4 mixed with water (1 mL TDF4 4 mL of MilliQ H 2 0) under ultrasound for 10 min. The plates are then rinsed with MilliQ water, under ultrasound for 10 min.
- the plates are immersed for 10 min in a 60% nitric acid solution at a temperature of 60 ° C.
- the plates are then rinsed in NaOH solution (0.1M) under ultrasound for 10 min and then in MilliQ water under ultrasound for 10 min.
- Table 7 Measurement of contact angles of a drop The contact angle is lowered. The surface has become more hydrophilic due to its oxidation and the surface roughness has increased.
- the bands at 1570-1530 cm -1 and at 1320-1280 cm -1 are characteristic of carbonyl groups, COO ⁇ carboxylate type. This confirms surface oxidation. II.4.
- Iron (II) sulfate (6.961 g, 0.1 mol) was solubilized in 50 mL of 10 ⁇ 3 M sulfuric acid in water. In this solution, the polymer plates were immersed. 10 mL (0.124 mol) of 35% hydrogen peroxide in water were then added, drip. After 25 min, the samples were rinsed with MilliQ water before being dried.
- the contact angle is clearly lowered.
- the surface has become very hydrophilic because of its oxidation.
- NaBH 4 sodium borohydride (0.316 g, 0.8 ⁇ 10 -2 mol) is dissolved in 25 ml of a 0.1 M sodium hydroxide solution (NaOH). This solution is heated to 80 ° C. using a bain-marie and the samples are immersed in it. After 12 min, the samples were rinsed with MilliQ water before being dried.
- IR analysis reveals the preservation of the oxidation obtained after Fenton with the bands at 3600-3200 cm -1 and the bands 1700-1640 cm -1 .
- the samples are immersed in a commercial Electroless plating bath (M Copper 85, MacDermid) with formaldehyde as reducing agent. At least the plates are immersed for 10 minutes at 48 ° C.
- a commercial Electroless plating bath M Copper 85, MacDermid
- the copper layer is visible to the eye. II.7. Scotch test
- the mechanical strength is considered bad. If the layer remains insensitive to the adhesive, the mechanical strength is considered good.
- the adhesive tape that was used is a high performance invisible adhesive tape, branded PROGRESS.
- the electrochemical system put in place consisted of a saturated KC1 calomel reference electrode and a graphite counter electrode.
- the electrodes were soaked in a CUSC solution at 10 g / L, the initial potential was about 0 V.
- the confirmation of the copper deposit is also visual. Indeed, the copper layer deposited by electrochemistry has a slightly more homogeneous appearance.
- This metallization process is carried out in 4 steps (Oxidation Pretreatment / Treatment of
- the plates are subjected to polishing to minimize edge effects and other defects introduced during the cutting of the plates.
- the plates were rinsed using an industrial soap solution TDF4 mixed with water (1 mL TDF4 4 mL of MilliQ H 2 0) under ultrasound for 10 min. The plates are then rinsed with MilliQ water, under ultrasound for 10 min.
- the plates are immersed for 10 min in a 30 wt% NaOH solution at a temperature of 90 ° C.
- the plates are then rinsed in a 0.5M HCl solution under ultrasound for 10 min and then with MilliQ water under ultrasound for 10 min.
- Table 11 Measuring contact angles of a drop The contact angle is lowered. The surface has become more hydrophilic due to its oxidation and the surface roughness has increased.
- bands at 3600-3200 cm -1 and 1660-1610 cm -1 may be due to the presence of traces of water.
- the bands at 1740-1700 cm -1 and at 1320-1280 cm -1 are characteristic of carbonyl groups, carboxylic type COOH. This confirms surface oxidation.
- the disappearance of the ester band at 1772 cm -1 characteristic of polycarbonate is noted.
- Iron (II) sulfate (6.961 g, 0.1 mol) was solubilized in 50 mL of 10 ⁇ 3 M sulfuric acid in water. In this solution, the polymer plates were immersed. 10 mL (0.124 mol) of 35% hydrogen peroxide in water were then added, drip. After 25 min, the samples were rinsed with MilliQ water before being dried.
- the contact angle is clearly lowered.
- the surface has become very hydrophilic because of its oxidation.
- Table 14 IR Bands Appeared After Fenton Oxidative Treatment on Samples
- the amplification of the band at 3600-3200 cm "after Fenton treatment and the appearance of the band between 1150-1100 cm -1 are typical of the contribution of C-OH bonds.
- the appearance of bands at 1700- 1600 cm -1 and the amplification of the band 1320-1280 cm -1 confirm the presence of carbonyl groups on the surface of ABS-PC plates III.5 Reduction of ferric / ferrous ions
- NaBH 4 sodium borohydride (0.316 g, 0.8 ⁇ 10 -2 mol) is dissolved in 25 ml of a 0.1 M sodium hydroxide solution (NaOH). This solution is heated to 80 ° C. using a bain-marie and the samples are immersed in it. After 12 min, the samples were rinsed with MilliQ water before being dried.
- IR analysis reveals the preservation of the oxidation obtained after Fenton with the bands at 3600-3200 cm -1 and the bands 1700-1640 cm -1 .
- the samples are immersed in a commercial Electroless plating bath (M Copper 85, MacDermid) with formaldehyde as reducing agent.
- the exact composition of the copper bath is not known. At least the plates are immersed for 10 minutes at 48 ° C.
- the copper layer is visible to the eye. III.7. Electroplating copper deposit
- the electrochemical system put in place consisted of a saturated KC1 calomel reference electrode and a graphite counter electrode.
- the electrodes were soaked in a solution of CU S C at 10 g / L, the initial potential was about 0 V.
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Abstract
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0958851A FR2953861B1 (fr) | 2009-12-10 | 2009-12-10 | Procede de preparation d'un substrat en polymere metallise. |
| PCT/EP2010/069411 WO2011070167A1 (fr) | 2009-12-10 | 2010-12-10 | Procédé de préparation d'un substrat en polymère métallisé |
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| EP2510133A1 true EP2510133A1 (fr) | 2012-10-17 |
| EP2510133B1 EP2510133B1 (fr) | 2015-09-02 |
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| EP10787795.3A Not-in-force EP2510133B1 (fr) | 2009-12-10 | 2010-12-10 | Procédé de préparation d'un substrat en polymère métallisé |
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| US (1) | US20120282417A1 (fr) |
| EP (1) | EP2510133B1 (fr) |
| JP (1) | JP5878474B2 (fr) |
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| CA2619509C (fr) | 2005-08-12 | 2015-01-06 | Modumetal, Llc. | Materiaux composites a composition modulee et leurs procedes de fabrication |
| BRPI1010877B1 (pt) | 2009-06-08 | 2020-09-15 | Modumetal, Inc | Revestimento de multicamadas resistente à corrosão e método de eletrodeposição |
| FR2973036B1 (fr) | 2011-03-22 | 2013-04-26 | Commissariat Energie Atomique | Procede de preparation d'un film organique a la surface d'un support solide par transfert ou par projection |
| WO2014146117A2 (fr) | 2013-03-15 | 2014-09-18 | Modumetal, Inc. | Procédé et appareil d'application en continu de revêtements métalliques nanostratifiés |
| EA201500948A1 (ru) | 2013-03-15 | 2016-03-31 | Модьюметл, Инк. | Способ изготовления изделия и изделие, изготовленное вышеуказанным способом |
| CA2905548C (fr) | 2013-03-15 | 2022-04-26 | Modumetal, Inc. | Revetements nanostratifies |
| BR112015022020A8 (pt) | 2013-03-15 | 2019-12-10 | Modumetal Inc | objeto ou revestimento e seu processo de fabricação |
| EP3194642A4 (fr) | 2014-09-18 | 2018-07-04 | Modumetal, Inc. | Procédé et appareil d'application en continu de revêtements métalliques nanostratifiés |
| BR112017005534A2 (pt) | 2014-09-18 | 2017-12-05 | Modumetal Inc | métodos de preparação de artigos por processos de eletrodeposição e fabricação aditiva |
| US11365488B2 (en) | 2016-09-08 | 2022-06-21 | Modumetal, Inc. | Processes for providing laminated coatings on workpieces, and articles made therefrom |
| TW201821649A (zh) | 2016-09-09 | 2018-06-16 | 美商馬杜合金股份有限公司 | 層合物與奈米層合物材料於工具及模製方法之應用 |
| WO2018053158A1 (fr) | 2016-09-14 | 2018-03-22 | Modumetal, Inc. | Système de génération de champ électrique complexe, fiable et à haut rendement, et procédé de production de revêtements l'utilisant |
| EP3535118A1 (fr) | 2016-11-02 | 2019-09-11 | Modumetal, Inc. | Structures d'emballage à couches d'interface de haute densité de topologie optimisée |
| CA3057836A1 (fr) | 2017-03-24 | 2018-09-27 | Modumetal, Inc. | Plongeurs de levage dotes de revetements deposes par electrodeposition, et systemes et procedes de production de ceux-ci |
| CA3060619A1 (fr) | 2017-04-21 | 2018-10-25 | Modumetal, Inc. | Articles tubulaires dotes de revetements deposes par electrodeposition et systemes et procedes de production desdits articles |
| JP2019010370A (ja) * | 2017-06-30 | 2019-01-24 | 株式会社いきいき堂 | インソール |
| EP3784823A1 (fr) | 2018-04-27 | 2021-03-03 | Modumetal, Inc. | Appareils, systèmes et procédés de production d'une pluralité d'articles pourvus de revêtements nano-stratifiés à l'aide d'une rotation |
| CN111646615B (zh) * | 2020-06-15 | 2021-02-09 | 北京环球中科水务科技有限公司 | 撬装式光芬顿水处理设备 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| GB1175348A (en) * | 1967-07-13 | 1969-12-23 | Okuno Chemical Industry Compan | Process for Chemically Plating Polyolefins. |
| US3553085A (en) * | 1967-11-28 | 1971-01-05 | Schering Ag | Method of preparing surfaces of plastic for electro-deposition |
| JPS5244541B2 (fr) * | 1973-10-11 | 1977-11-09 | ||
| GB2013722A (en) * | 1978-01-19 | 1979-08-15 | Canning W Materials Ltd | Plating process |
| CA1203720A (fr) * | 1981-12-30 | 1986-04-29 | Warren R. Doty | Agent d'oxydation pour accelerateur acide |
| BR9609594A (pt) * | 1995-06-30 | 1999-02-23 | Commw Scient Ind Res Org | Tratamento melhorado da superfície de polímeros |
| JP2006077289A (ja) * | 2004-09-09 | 2006-03-23 | Ebara Udylite Kk | 無電解めっきの前処理方法及びこれに使用する前処理液 |
| KR100841170B1 (ko) * | 2007-04-26 | 2008-06-24 | 삼성전자주식회사 | 저저항 금속 배선 형성방법, 금속 배선 구조 및 이를이용하는 표시장치 |
| JP5446191B2 (ja) * | 2007-10-02 | 2014-03-19 | 日立化成株式会社 | 無電解めっき樹脂粒子の製造方法 |
| FR2930180B1 (fr) * | 2008-04-22 | 2010-12-17 | Inst Superieur De Plasturgie D Alencon Entpr S | Procede de metallisation d'un substrat non conducteur en matiere plastique |
-
2009
- 2009-12-10 FR FR0958851A patent/FR2953861B1/fr not_active Expired - Fee Related
-
2010
- 2010-12-10 JP JP2012542566A patent/JP5878474B2/ja not_active Expired - Fee Related
- 2010-12-10 US US13/514,963 patent/US20120282417A1/en not_active Abandoned
- 2010-12-10 EP EP10787795.3A patent/EP2510133B1/fr not_active Not-in-force
- 2010-12-10 WO PCT/EP2010/069411 patent/WO2011070167A1/fr not_active Ceased
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2011070167A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011070167A1 (fr) | 2011-06-16 |
| EP2510133B1 (fr) | 2015-09-02 |
| US20120282417A1 (en) | 2012-11-08 |
| FR2953861B1 (fr) | 2015-03-20 |
| JP5878474B2 (ja) | 2016-03-08 |
| JP2013513726A (ja) | 2013-04-22 |
| FR2953861A1 (fr) | 2011-06-17 |
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