EP2408947A1 - Appareil et procédé pour le dépôt de revêtements fonctionnels - Google Patents

Appareil et procédé pour le dépôt de revêtements fonctionnels

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Publication number
EP2408947A1
EP2408947A1 EP20100709700 EP10709700A EP2408947A1 EP 2408947 A1 EP2408947 A1 EP 2408947A1 EP 20100709700 EP20100709700 EP 20100709700 EP 10709700 A EP10709700 A EP 10709700A EP 2408947 A1 EP2408947 A1 EP 2408947A1
Authority
EP
European Patent Office
Prior art keywords
plasma
monomer
substrate
cursor
specific energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP20100709700
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German (de)
English (en)
Inventor
Anthony Herbert
Liam O'neill
Justyna Jaroszynska-Wolinska
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
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Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of EP2408947A1 publication Critical patent/EP2408947A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
    • Y10T428/139—Open-ended, self-supporting conduit, cylinder, or tube-type article
    • Y10T428/1393—Multilayer [continuous layer]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31971—Of carbohydrate

Definitions

  • the present invention relates to an apparatus and method for deposition of functional coatings.
  • Thermal equilibrium plasmas are typically hot with temperatures —10,000 K and are used in industry as plasma torches, jets and arcs for welding, metallurgy, spray coating, etc.
  • Non-isothermal plasmas are generally cool and can be employed in manufacturing processes including surface cleaning (removal of unwanted contaminants), etching (removal of bulk substrate material), activation (changing surface energies) and deposition of functional thin film coatings onto surfaces. They used in a multiplicity of industry segments from microelectronics to medical.
  • Non-isothermal plasmas can be used to deposit, at low temperatures, functional coatings, which conform and adhere well to a substrate surface. The process leaves the bulk of the substrate unchanged.
  • Such coatings allow the surface to have a different set of properties from those of the bulk material of the substrate and, thus, allow the bulk material to have one set of characteristics, e.g. rigidity, while surface may have another independent set of characteristics, e.g. low friction.
  • Non-isothermal equilibrium plasma polymerization is known in the field of surface functionalization and has applications in diverse areas such as biotechnology, adhesion, electronics and textiles.
  • Plasma polymerization was initially developed under vacuum conditions and used low pressure plasma technology to polymerise gas vapours and produce polymeric coatings in a technique referred to as plasma enhanced chemical vapour deposition (PECVD).
  • PECVD plasma enhanced chemical vapour deposition
  • the vapour phase precursors were bombarded with aggressive plasma species which produced fragmentation and re-arrangement of the precursor monomers.
  • a wide variety of random fragments were created which could deposit on to a substrate to produce a thin film layer which contained many of the atoms present in the starting monomer.
  • PECVD became well established, the coating functionality remained limited to simple materials such as SiO x , SiN or TiO 2 and complex chemistry could not be deposited using such systems.
  • SPP soft plasma polymerization
  • plasma polymerization processes were generally regarded as processes in which small molecules could be polymerized to produce thin films with an unspecified chemical structure, consisting predominantly of carbon, hydrogen, fluorine and oxygen- and nitrogen-based functional groups depending on the chemistry of the monomer.
  • pulsed vacuum PECVD systems allow the power coupled to the plasma to be pulsed in a manner that still creates the active species in the plasma, but does not contain enough energy to fragment all of the bonds within a monomer.
  • the resulting active species interacted with gas phase monomers and produced a soft polymerization reaction which deposits coatings with complex functional chemistry, see M.E. Ryan, A.M. Hynes, J.P.S. Badyal, Chem. Mater., 1996, 8, 37-42 ; and S. Schiller, J. Hu, A.T.A. Jenkins, R.B. Timmons, F.S. Sanchez-Estrada, W. Knoll, R. Forch, Chem. Mater., 2002, 14, 235.
  • these systems are still limited to vacuum processing and this has hindered commercial exploitation of the technology.
  • Pin-to-plane refers to the electrode configuration used to generate the plasma, as opposed to, for example, a wire-to-plate or two opposing parallel plates configurations, while the term corona describes the plasma type.
  • a corona discharge is a non-arcing, non-uniform plasma discharge which appears as a luminous glow localized in space around a point tip or wire electrode under high applied voltage.
  • the discharge can be filamentary or more homogeneous depending upon the polarity of the electrode.
  • the true corona is generated in the strong electric fields near sharp points or .fine wires.
  • the visible portion of the true corona occurs in the region within the critical radius, at which the electric field is equal to the breakdown electric field of the surrounding gas.
  • the true corona does not occur between two parallel smooth plates, nor in the presence of an insulating coating over the conductor giving rise to it.
  • the true corona should be distinguished from the plasma type generated by what are loosely called industrial "corona treaters". Such systems do not have the electrode geometry needed to generate true coronas and, generally, have at least one electrode coated with dielectric. These systems generate a different plasma type known as a dielectric barrier discharge (DBD), so that there is often confusion between the true corona and a dielectric barrier discharge.
  • DBD dielectric barrier discharge
  • the pin-to-plane electrode corona generation configuration can be reduced by removal of the plane electrode to create a single pin electrode system, depending upon correct configuration of other system variables.
  • This single electrode system sees the surrounding ambient as the counter-electrode and will discharge freely from the point of the pin or the thin wire into the surrounding ambient without the need for a solid counter-electrode. In the present specification, this is referred to as "pin corona".
  • pin corona The absence of a solid counter-electrode has advantages in simplification of the equipment configuration and the ability to treat surfaces without regard to their geometry in the z-direction, i.e. along the main axis of the pin or needle.
  • Pin coronas have not been seen as viable vehicles for deposition of functional coatings at least partly because they are intrinsically small area and highly spatially inhomogeneous and so would tend to deliver small area coatings comprising films of greatly varying thickness and, possibly, chemical composition, across substrate surfaces.
  • this system incorporated a nebuliser to inject the monomer precursor into the plasma region in the liquid state as atomized droplets.
  • the introduction of the liquid as an aerosol was thought to protect the bulk of the liquid precursor from the aggressive plasma species by encapsulating it within a droplet of several microns in diameter, thereby minimising fragmentation of the precursor monomers.
  • aerosol delivery systems produces a number of complexities related to the stability of the spray, control of droplet size, generation of an even precursor distribution over wide areas, the requirement to accurately dispense low volumes of liquid at a constant rate and rapid build-up of unwanted deposits on reactor surfaces.
  • a method for deposition of functional coatings comprising: igniting a non-thermal equilibrium plasma within an ambient pressure plasma chamber having a gas supply inlet and a plasma outlet; providing a substrate to be coated adjacent to said plasma outlet; providing a gas phase pre-cursor monomer to the plasma chamber through the gas inlet; and coupling a specific energy into said plasma during the flow of said pre-cursor through said chamber sufficient to disassociate at least the weakest intra-molecular bond required to allow polymerisation of said pre-cursor when deposited on a surface of said substrate adjacent said plasma outlet, said coupled specific energy not exceeding a specific energy required break intra-moiecular bonds required for the functionality of the monomer molecule.
  • said plasma comprises a pin corona plasma.
  • said polymerisation comprises cross-linking said monomers.
  • said plasma operates at approximately room temperature so preventing thermal molecular damage to said pre-cursor.
  • said method provides pumping a carrier gas through a liquid phase monomer, or solution thereof, to vaporise at least a portion of said monomer and providing said vaporised monomer to said plasma chamber.
  • said carrier gas comprises one or more of: helium, argon or nitrogen.
  • Embodiments of the invention provide soft plasma polymerization from gas state precursor using a cool, atmospheric pressure, highly non-isothermal equilibrium, corona discharge from a single, needle/pin geometry electrode.
  • the corona plasma type is particularly suited to delivering low specific energy into a reaction zone and, hence, to provide SPP, even using gas precursors.
  • the discharge is not a large area coating source, it is perfectly applicable to substrates ⁇ 1 m 2 where sophisticated functionality is required for a surface coating.
  • the pin corona plasma configuration is further suited to ambient pressure operation. This enables industry migration from vacuum batch to continuous processing. This in turn facilitates much simpler and lower cost equipment designs with reduced maintenance requirements due to the lack of vacuum pumps, seals, etc.
  • precursor as gas/vapour rather than liquid allows for standard PECVD equipment (bubblers, mass flow controllers) to be used to generate an easily controlled, even flux of precursor into a system and onto a substrate avoiding many of the problems of the prior art.
  • PECVD equipment bubblers, mass flow controllers
  • Figure 1 is a schematic diagram of a Pin-to-Plane Corona Plasma Discharge Configuration
  • Figure 2 is a schematic of 2-pin Electrode Head of a Pin Corona Discharge Coating System
  • FIG. 3 shows the chemical structure of HDFDA
  • Figure 4 is an FTIR spectrum of HDFDA coating deposited for 180 seconds on an NaCl disk using the apparatus of Figure 2;
  • Figure 5 is an XPS spectrum of HDFDA deposited on a Si wafer for 3 minutes using the apparatus of Figure 2;
  • Figure 6 shows V app vs. t (Channel 1) and Ia vs. t (Channel 2) Corona Discharge characteristics for the apparatus of Figure 2.
  • the invention uses a pin corona plasma at atmospheric pressure to achieve soft polymerization with gas state precursors.
  • the electrode can comprise a single sharp pin as shown in Figure 1 or two or more pins.
  • Figure 2 shows a schematic of a two pin electrode head of a pin corona coating system which could be used for the present invention.
  • the dimensions provided in Figure 2 are by way of illustration only and can differ depending upon the details of the system and application.
  • the electrode head comprises a tubular dielectric housing (hatched in Figure 2) mounting two tungsten needle pointed electrodes to which are applied in parallel an alternating current high voltage to generate the corona discharge from the needle tips.
  • a space around each electrode allows a mixture of carrier gas and precursor vapour to enter the device.
  • the carrier gas can be, in principle, any gas but it has been found that relatively chemically inert gases such as helium, argon or nitrogen provide the best degree of control over the plasma chemistry and, hence, the coating composition and process.
  • the precursor monomer to be polymerized if already a gas, is introduced into the corona plasma region of Figure 2 by controlled pre-mixing in a manifold with the carrier gas. In some processes no carrier gas is necessary.
  • carrier gas can bubbled through a volume of precursor held at a controlled temperature in a standard bubbler set up.
  • the precursor is, thus, introduced into the corona discharge region as a vapour.
  • the flow rate of monomer can be controlled including ensuring that the monomer is provided in primarily vapour rather than liquid phase to the plasma chamber.
  • the dielectric housing improves process control by minimising the presence of unwanted impurities such as ambient air in the reaction volume generally contained within the housing.
  • a substrate to be coated is placed downstream, preferably of the order of millimetres, from the outlet of the tubular housing and either the housing or the substrate can then be moved or rastered/scanned in the horizontal plane to enable complete and uniform coating of the substrate surface.
  • relative movement of the head and substrate is programmed to compensate for the otherwise non-uniform coating provided by the pin corona plasma.
  • the stream of carrier gas and/or precursor gas/vapour is blown into the tubular housing so that the electrodes come in contact with the gas. Due to the high electric field near the electrode sharp points, any gas ionizes to generate a corona plasma and a mixture of electrons, ions, photons, metastables and other excited states, radicals and molecular fragments can be created in the plasma region, the specific microscopic species being controlled by the gas mix, gas flow rate (i.e. residence time in the plasma) and the applied power coupled into the plasma.
  • the mix of microscopic plasma species is blown by the gas flow towards the open face of the tubular housing and the plasma survives for some distance outside the housing, until the oxygen contained in the ambient air quenches the plasma.
  • a substrate placed adjacent to the tube opening or mouth receives a flux of such species which react to form a deposit or coating conformal with and well adhered to the surface.
  • Embodiments of the invention achieve SPP of monomer precursors due to the inherently low specific energy [J/cm 3 ] of the pin corona discharge coupled into the plasma volume. It is the inherently low specific energy of the pin corona, in contrast to other plasma types, that makes it predisposed to SPP and, thus, a valuable tool for the fabrication of thin film coatings comprising complex, high molecular weight but sensitive molecules.
  • very low frequency electrical power is delivered in parallel to two pins in an electrode head from a modified PTI IOOW power supply from Plasma Technics Inc at a frequency of about 19 kHz and a peak-to-peak voltage of about 23 kV.
  • Figure 6 shows the V app vs. time and I d vs. time characteristics of the discharge. It is seen that the peak-to-peak voltage was 23.2 kV and the peak current about 8 mA. The curves show that most of the current is displacement with current about 90 degrees out of phase with voltage.
  • the actual discharge power was calculated as the average over 10 periods of the current- voltage product and was found to be 6.8 W with a +1-6% variation over 5 runs.
  • Helium - monomer vapour mixtures exited the system through a 75 mm long x 15 mm diameter fluoropolymer tubular housing in which the corona plasma was struck. Coatings were deposited onto substrates placed adjacent to the plasma outlet.
  • the temperature within the plasma was taken at a point 15 mm below the electrodes inside the fluoropolymer tube and within the helium gas flow and any corona discharge.
  • a gas baseline temperature of 8°C was recorded after 5 minutes of helium gas flow at 14 L/minute in the absence of plasma. Once the plasma was struck and after 10 minutes of discharge, the temperature recorded by the thermometer was found to stabilize at 18°C, clearly indicating the non-thermal equilibrium and low power nature of the discharge.
  • IH, IH, 2H, 2H-Heptadecafluorodecyl acrylate (HDFDA) was chosen as a precursor monomer as it contains a polymerisable vinyl group and a long perfluoro chain which is easily characterized, Figure 3.
  • HDFDA high-density polyethylene glycol dimethacrylate
  • a Bergoz Instrumentation, France CT-E5.0-B toroidal current transformer with a sensitivity of 5 V/A and 40 mm internal, 72 mm external diameters was used to measure the plasma current (Id); and a North Star PVM-5 high voltage probe with a 1000/1 sensitivity was used to determine the applied voltage (V app ).
  • the Bergoz current transformer toroid was positioned around the fluoropolymer tube of Figure 2 and 10 mm along the tube from the needle tips to capture the plasma discharge while the high voltage probe was applied at the output of the power supply. The outputs of both probes were captured on a Tektronix TDS 2024 four channel digital storage oscilloscope with a 200 MHz bandwidth.
  • Fourier Transform Infra-Red (FTIR) data was collected on a Perkin Elmer Spectrum One FTIR. Coatings were deposited directly onto NaCl disks and spectra were collected using 32 scans at 1 cm '1 resolution.
  • X-ray photoelectron spectroscopy was carried out on a VSW spectrometer consisting of an hemispherical analyser and a 3 channeltron detector. All spectra were recorded using an Al Ka X-ray source at 150 W, a pass energy of 100 eV, step size of 0.7 eV, dwell time of 0.1 s with each spectrum representing an average of 30 scans.
  • Film thickness and thickness profile/mapping of the coatings was determined by a Woollam M2000 variable angle ellipsometer.
  • HDFDA was introduced into the plasma as a vapour from a standard bubbler set up.
  • the bubbler temperature was set to 56°C and the helium flow to 14 slm. This produced a series of cured dry coatings which were deposited for times of 10, 30 and 180 seconds. Gravimetric measurements indicate an average flow rate of 0.07674 g/min or 126 ⁇ L/min of monomer into the device at 56°C.
  • Table 1 XPS, contact angle and thickness data for HDFDA on Silicon
  • XPS analysis of the coatings was also undertaken to determine their elemental content. XPS analysis of the 10 second sample revealed significant levels of silicon. This suggests that the coating is either patchy or else the coating thickness may be below 10 nm which would result in concurrent analysis of the substrate and coating occurring during the analysis. High levels of oxygen were also detected. These may be derived from oxidation of the coating or from the native silicon oxide present on the wafer surface. The presence of a patchy coating coupled to significant oxidation of the deposit may help to explain the relatively low water contact angle value produced by the 10 second coating.
  • the elemental composition of the coating is very similar to that of the un-reacted monomer (41% C, 53% F and 6% O).
  • the spectra from these samples are almost completely devoid of Si, indicating complete coverage of the substrate with a thick polymer layer.
  • a slight increase in oxygen content was detected in the coatings which can be attributed to some minor oxidation of the deposited material by the plasma.
  • the results for these two samples are largely similar to results previously seen in soft plasma polymerization reactions and agree with the FTIR data in suggesting that the functionality of the monomer has been largely retained in the coating.
  • Ellipsometry data was collected from the 10 second and 30 second samples. These coatings were found to have thickness values of 10 and 50 nm respectively, indicating that the deposition rate was in the region of 60 - 100 nm/min. This is significantly higher than the deposition rates quoted for vacuum plasma coatings produced from HDFDA and is similar to the deposition rates seen in aerosol assisted atmospheric pressure plasma deposition of a range of precursors. Thickness mapping of the coated wafers indicates that the coating occupies a circular region of approximately 3 - 4 cm in diameter on the wafer surface. Attempts to extract thickness data from the 180 second sample were unsuccessful due to the rough nature of the deposited coating. However, extrapolating coating thickness from the peak heights in the FTIR spectrum would suggest that the 180 second coating is approximately 3 times thicker than the 30 second coating.
  • the helium is only an inert background gas and the plasma directly or indirectly, e.g. via, helium metastables, eventually imparts all energy to the HDFDA;
  • this particular plasma type running this process appears to deliver the right specific energy to the plasma region sufficient to break the weakest monomer bond enabling the molecule to react and polymerise but insufficient to break higher energy bonds, in particular those of functional sites.
  • the monomer is not fragmented and the process delivers soft polymerization.
  • bonds that could be disassociated to assist in polymerization include: alkyne, diene, aromatic, acrylate or methacrylate bonds.
  • HMDSO hexamethyldisiloxane
  • Plasma power 6.8 W ⁇
  • Specific plasma power 0.5129 W/cm 3
  • the Si-C bond has the lowest dissassociative energy.
  • the above settings provide a specific energy indicated sufficient to break this bond and to provide soft plasma polymerization.
  • a non-thermal equilibrium, atmospheric pressure plasma of the dielectric barrier discharge (DBD) type is used with a view to depositing soft polymerized coatings containing bio-molecules such as enzymes using the lowest possible plasma power.
  • DBD dielectric barrier discharge
  • Heyse started with the lowest possible power at which they could successfully generate a plasma and incremented this power until they could get a coating from the chosen precursor.
  • Table 1 column 5 the results for 22 precursors including HMDSO are shown.
  • HMDSO a power of 1.20 W/cm 2 was required.
  • the corona type plasma used in the illustrated example of the present invention has an energy density a factor of x 13 lower than that of the DBD type plasma. It will also be appreciated that apart from Helium used in the above described examples, other gases including H 2 , N 2 , Ar, and O 2 or mixtures thereof could be used as carrier gasses depending on the coating to be deposited.
  • biologically active coatings onto substrate surfaces.
  • These coatings could include: DNA oligonucleotides, mRNA transcripts including viral plasmids, a functional biologically active protein with an NH 3 terminal, polysaccharide, a catalytic enzyme including arginase, a monoclonal or polyclonal antibody in either complete or Fab fragment form, a hormone including: human chorionic gonadotropin or a steroid, a primary cell, a cell derived from a tumour, a surface receptor, a core receptor, animal or human tissue, a bacterial/viral or pryon microorganism, or human or animal anti-IgG/M to specific protein antigens.
  • the functional monomers for such coatings typically polymerise through disassociation of a hydroxyl group, a relatively weak bond capable of being disassociated with the level of specific energies disclosed above without damaging the functional remainder of the molecule.
  • Other reactive bonds found within these molecules include thiols, amines and carboxylic acids which can readily participate in plasma polymerisation reactions.
  • Other polymerisable functionalities include cyclic, alicyclic or aromatic rings.
  • biological material does not readily polymerise, it could be encapsulated within polymers formed from an evaporated solvent.
  • active DNA or RNA could be mixed into say HMDSO and sprayed into an ante-chamber where the HMDSO evaporates. The vapour could then be introduced into the plasma where a reaction ensues causing the HMDSO to polymerise and thereby physically surround and bind the biologically active material to the surface, with minimal chemical reactions involving the biologically active material.
  • Examples of surfaces which could be coated include stents to treat artery disease, bio-sensors for medical diagnostics, environmental monitoring and industrial process control, assay plates, lab-on-a-chip and biochips, micro-fluidic devices, implanted medical devices with coatings to encourage or inhibit tissue growth, proteomics/genomics, etc.
  • a feature of virtually all bioactive coatings is that they comprise as the active component large, relatively high molecular weight molecules up to and including proteins, macromolecules (including biopolymers) and living cells. Such molecules are typically difficult to handle, to process and to deposit as a coating without causing damage to or denaturing the molecule and, thus, destroying its functionality and the value of the device or product.
  • bio-functional coatings are currently deposited using wet chemical techniques and employ multiple deposition stages. This involves the use of unwanted solvents, binders, linkers and other chemical entities that are expensive, hazardous and not production friendly.
  • a typical conventional bio-molecule immobilization technique can involve more than 20 wet processing steps using 10 chemicals/solutions and a total process time of hours.
  • wet processing is inherently isotropic so that patterning of the bio- functional coating to enable new devices or improved performance is generally not possible or only possible with great difficulty.
  • the use of wet processing in the manufacture of devices and products based upon bioactive coatings therefore results in problems for the bio- manufacturing industry including extended processing times, multiple step process complexity, process optimisation, control and reproducibility difficulties, difficulty in patterning of coatings and cost.
  • this wet bio-coating can be replaced with a single step, dry process namely plasma depositing bio-active coatings. This can provide better process control with reduced processing time and cost, as well as providing a directional process highly suited to patterning of the bio-coating.
  • the material in question can be dissolved in a highly volatile solvent, sprayed into a heated chamber in which the solvent evaporates and the molecule is then carried into the plasma in a vapour phase.
  • techniques such as electrospray ionisation have been developed to deliver large molecules as charged particles into mass spectrometers and similar techniques can be used to deliver the bioactive molecules in the gas state into the plasma zone.
  • Additional monomers may also be added to the plasma to provide additional features. Such features may include a requirement such as the formation of a thicker coating, or to increase the cross-linking of the coating. Such features are well known to a person skilled in the art.
  • the pin corona plasma may be pulsed (as in the prior art for low pressure) by repetitive switching on and off of the applied power generating the plasma.
  • coating densifi cation or degree of cross-linking In order to further enhance control of the properties of the functional coating such as adhesion to the substrate, coating densifi cation or degree of cross-linking, additional plasma, ultraviolet, electron beam, ion beam or other energetic processes may be applied to the surface either before or after deposition of the functional coating.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

La présente invention a pour objet un procédé pour le dépôt de revêtements fonctionnels comprenant les étapes consistant à enflammer un plasma à équilibre non thermique au sein d'une chambre à plasma à pression ambiante ayant une entrée d'alimentation en gaz et une sortie de plasma ; et à fournir un substrat à revêtir de manière adjacente à la sortie de plasma. Un monomère précurseur en phase gazeuse est fourni à la chambre à plasma par l'intermédiaire de l'entrée de gaz. Une énergie spécifique est couplée dans le plasma pendant l'écoulement du précurseur à travers la chambre, de manière suffisante pour dissocier au moins la liaison intramoléculaire la plus faible requise pour permettre la polymérisation du précurseur lorsqu'il est déposé sur une surface du substrat adjacent à la sortie de plasma, l'énergie spécifique couplée ne dépassant pas une énergie spécifique requise pour rompre les liaisons intramoléculaires requises pour la fonctionnalité de la molécule monomère.
EP20100709700 2009-03-19 2010-03-18 Appareil et procédé pour le dépôt de revêtements fonctionnels Withdrawn EP2408947A1 (fr)

Applications Claiming Priority (2)

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IE20090213 2009-03-19
PCT/EP2010/001703 WO2010105829A1 (fr) 2009-03-19 2010-03-18 Appareil et procédé pour le dépôt de revêtements fonctionnels

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EP2408947A1 true EP2408947A1 (fr) 2012-01-25

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Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2699097T3 (es) 2009-06-16 2019-02-07 Theradep Tech Inc Dispositivos de cicatrización
DK2457670T3 (en) * 2010-11-30 2017-09-25 Oticon As Method and apparatus for low pressure plasma induced coating
EP3162386B1 (fr) 2010-12-13 2019-10-16 TheraDep Technologies, Inc. Dispositif médical implantable
KR20140037097A (ko) * 2011-04-27 2014-03-26 다우 코닝 프랑스 기판의 플라즈마 처리
GB2489761B (en) * 2011-09-07 2015-03-04 Europlasma Nv Surface coatings
US20130183435A1 (en) * 2012-01-13 2013-07-18 Hongmin Sun Low temperature plasma coating for anti-biofilm formation
GB2494946B (en) * 2012-05-11 2013-10-09 Europlasma Nv Surface coatings
GB201403558D0 (en) 2014-02-28 2014-04-16 P2I Ltd Coating
WO2016198855A1 (fr) * 2015-06-09 2016-12-15 P2I Ltd Procédé pour former un revêtement sur un dispositif électronique ou électrique
US10421876B2 (en) 2015-06-09 2019-09-24 P2I Ltd Coatings
GB2548071B (en) * 2015-12-18 2018-05-02 Thermo Fisher Scient Bremen Gmbh Liquid sample introduction system and method, for analytical plasma spectrometer
JP6974353B2 (ja) * 2016-02-01 2021-12-01 セラデップ テクノロジーズ インコーポレイテッド 治療薬を送達するシステム及び方法
US20190206657A1 (en) * 2016-04-11 2019-07-04 Grinp S.R.L. A machine and a process for the atmospheric plasma treatment of different materials using gaseous mixtures comprising chemicals and/or monomers
DE102016206006A1 (de) * 2016-04-11 2017-10-12 Innovent E.V. Technologieentwicklung Verfahren zur Beschichtung von Oberflächen
US11690998B2 (en) 2017-10-31 2023-07-04 Theradep Technologies, Inc. Methods of treating bacterial infections
KR20210005072A (ko) * 2018-05-04 2021-01-13 지앙수 페이보레드 나노테크놀로지 컴퍼니., 리미티드 전기 디바이스에 대한 나노-코팅 보호 방법
EP3881941A1 (fr) * 2020-03-17 2021-09-22 Molecular Plasma Group SA Procédé de revêtement au plasma et appareil de modification de surface biologique
EP3988686A1 (fr) 2020-10-26 2022-04-27 Nadir S.r.l. Procede de fabrication d'un revêtement catalytique et dispositif de catalyse heterogene
CN115991951B (zh) * 2021-10-20 2024-02-20 江苏菲沃泰纳米科技股份有限公司 一种复合涂层、制备方法及器件

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993012266A1 (fr) * 1991-12-13 1993-06-24 Advanced Technology Materials, Inc. Appareil et procede d'apport de reactifs non volatile
US20030054102A1 (en) * 2001-09-10 2003-03-20 Mitsubishi Denki Kabushiki Kaisha Liquid material for chemical vapor deposition, method of forming film by chemical vapor deposition and chemical vapor deposition apparatus
WO2006046003A1 (fr) * 2004-10-26 2006-05-04 Dow Corning Ireland Limited Procede de revetement d’un substrat par plasma

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6045864A (en) * 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
GB0208203D0 (en) * 2002-04-10 2002-05-22 Dow Corning Protective coating compositions
US6794646B2 (en) * 2002-11-25 2004-09-21 Varian, Inc. Method and apparatus for atmospheric pressure chemical ionization
GB0408351D0 (en) * 2004-04-15 2004-05-19 Plasso Technology Ltd Reversible binding surface
GB0410749D0 (en) * 2004-05-14 2004-06-16 Dow Corning Ireland Ltd Coating apparatus
CA2659298C (fr) * 2006-07-31 2012-03-06 Tekna Plasma Systems Inc. Traitement de surface par plasma au moyen de decharges a barriere dielectrique
US7361207B1 (en) * 2007-02-28 2008-04-22 Corning Incorporated System and method for electrostatically depositing aerosol particles
GB0717430D0 (en) * 2007-09-10 2007-10-24 Dow Corning Ireland Ltd Atmospheric pressure plasma

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993012266A1 (fr) * 1991-12-13 1993-06-24 Advanced Technology Materials, Inc. Appareil et procede d'apport de reactifs non volatile
US20030054102A1 (en) * 2001-09-10 2003-03-20 Mitsubishi Denki Kabushiki Kaisha Liquid material for chemical vapor deposition, method of forming film by chemical vapor deposition and chemical vapor deposition apparatus
WO2006046003A1 (fr) * 2004-10-26 2006-05-04 Dow Corning Ireland Limited Procede de revetement d’un substrat par plasma

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
LENARDIC: "Fabrication of specialty optical fibers using flash vaporization method", SPIE, PO BOX 10 BELLINGHAM WA 98227-0010 USA, vol. 7134, 1 January 2008 (2008-01-01), pages 1 - 11, XP040444631 *

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