EP2246677B1 - Bolometric detector of electromagnetic radiation from the infrared to the terahertz spectral domain and detector array device comprising said detectors. - Google Patents

Bolometric detector of electromagnetic radiation from the infrared to the terahertz spectral domain and detector array device comprising said detectors. Download PDF

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Publication number
EP2246677B1
EP2246677B1 EP10305323A EP10305323A EP2246677B1 EP 2246677 B1 EP2246677 B1 EP 2246677B1 EP 10305323 A EP10305323 A EP 10305323A EP 10305323 A EP10305323 A EP 10305323A EP 2246677 B1 EP2246677 B1 EP 2246677B1
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EP
European Patent Office
Prior art keywords
antenna
detector
bolometric
resistive load
metal film
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EP10305323A
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German (de)
French (fr)
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EP2246677A1 (en
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Jean-Louis Ouvrier-Buffet
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Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02Constructional details
    • G01J5/08Optical arrangements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02Constructional details
    • G01J5/08Optical arrangements
    • G01J5/0837Microantennas, e.g. bow-tie
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/20Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices

Definitions

  • the present invention relates to the field of bolometric antenna detectors, and more particularly to cross-butterfly antenna detectors for the detection of electromagnetic radiation in the range extending from the infrared, and in particular in the bands 3 - 5 microns and 8 - 14 ⁇ m, with terahertz.
  • a resistive bolometric detector measures the power of incident radiation in the infrared range and comprises for this purpose an absorbing resistive bolometric element which converts the luminous flux into a heat flow, which produces a temperature rise of said element with respect to a reference temperature. This increase in temperature then induces a variation of the electrical resistance of the absorbing element, causing voltage or current variations across it. These electrical variations constitute the signal delivered by the sensor.
  • the temperature of the absorbent element is usually largely dependent on the environment thereof, and in particular that of the substrate which comprises the electronic reading circuit.
  • the absorbent element is generally thermally isolated from the substrate.
  • the figure 1 is a schematic perspective view of an elementary resistive bolometric detector 10 of the state of the art illustrating this principle of thermal insulation.
  • This elementary detector here in the form of a suspended membrane, is conventionally part of a matrix of elementary detectors with one or two dimensions.
  • the detector 10 comprises a thin membrane 12 absorbing the incident radiation, suspended above a support substrate 14 by means of two conductive anchoring nails 16 to which it is fixed by two heat-insulating arms 18.
  • the membrane 12 usually comprises a layer of electrical insulator, such as for example SiO 2 , SiO, SiN, ZnS or others, which provides the mechanical rigidity of the membrane 12, as well as a metal electrical interconnection layer deposited on the insulation layer.
  • a thin layer 20 of resistive material thermometric is also deposited in the center of the membrane 12 of the metal interconnect layer including a layer of a semiconductor material such as polycrystalline or amorphous silicon p-type or n weakly or strongly resistive, or a vanadium oxide (V 2 O 5 , VO 2 ) developed in a semiconductor phase.
  • a semiconductor material such as polycrystalline or amorphous silicon p-type or n weakly or strongly resistive, or a vanadium oxide (V 2 O 5 , VO 2 ) developed in a semiconductor phase.
  • the support substrate 14 comprises an electronic circuit integrated on a silicon wafer, usually known as the "reading circuit".
  • the reading circuit comprises on the one hand the stimulus and reading elements of the thermometric element 20, and on the other hand the multiplexing components which make it possible to serialize the signals coming from the different thermometric elements present in the matrix detector.
  • the membrane 12 heats up under the effect of incident electromagnetic radiation and the heating power produced is transmitted to the layer 20 of thermometric material.
  • the reading circuit arranged in the substrate 14 polarizes the membrane 12 by subjecting the nails 16 to a bias voltage and collects the current flowing in the thermometric element 20 to deduce a variation of its resistance and therefore the radiation incident to the origin of said variation.
  • the membrane 12 fulfills, in addition to the thermal insulation function, three main functions: that of antenna for the reception of the radiation, that of conversion of the electromagnetic power received into heating power and that of thermometric measurement of the heat output produced. Filling the role of antenna, the dimensions of the membrane 12 are therefore selected to be of the same order of magnitude as the wavelength of the radiation to be measured.
  • the wavelengths can reach the millimeter, which therefore requires a membrane of the same order of magnitude.
  • the heat mass, the mechanical strength and the radiation losses of the membrane are so problematic that they ultimately harm the efficiency of the detector.
  • the radiation reception function is decoupled from other functions.
  • the reception function is thus provided by a planar antenna and the function of converting the electromagnetic power into heating power is provided by the resistive load of the antenna.
  • the dimensions of the load typically satisfy the impedance matching conditions which depend on the geometry of the antenna and the nature of the layers supporting it in order to obtain an optimal conversion.
  • the resistive load is also in thermal contact with a thermometric element for measuring the heat output produced. The set then constitutes an antenna bolometer.
  • thermometric element is independent of the antenna and its size no longer depends on the incident wavelength but factors determining the intrinsic performance of the detector (sensitivity, signal-to-noise ratio, etc ... ), in line with the requirements of the intended application, for example active imaging or passive imaging.
  • the incident electromagnetic radiation is not polarized, so that its reception by a single antenna does not capture all of the electromagnetic power.
  • a non-polarized radiation can be considered as the superposition of two components linearly polarized in two orthogonal directions, each of these components carrying half of the energy of the wave.
  • an effective way of capturing incident electromagnetic radiation is to use two crossed butterfly antennas.
  • the butterfly antenna is better known under the Anglo-Saxon " bow-tie ", and is explained for example on the thesis of R. PEREZ, available on the following website: http://www.unilim.fr/theses /2005/sciences/2005limo0053/perez_r.pdf.
  • the document US 6,329,655 describes an antenna bolometer 30, operating in the millimeter range and provided with two crossed butterfly antennas 32, 34, whose schematic views from above and in section are shown in FIGS. figures 2 and 3 respectively.
  • the principle of the bolometer 30 is based on the capacitive coupling produced between the antennas 32, 34, arranged on a support substrate 36, and a resistive load 38, arranged in a suspended membrane 40 and on which a thermometric element 42 is disposed ( figure 3 ).
  • the resistive load 38 which takes the form of a square layer arranged in the center of the antennas 32, 34, has indeed a surface facing them and thus forms with the antennas a capacitance.
  • the radiation picked up by the antennas 32, 34 is thus transmitted to the load 38 by capacitive coupling.
  • the resistive load 38 must be weakly resistive, ie a square resistance of 50 ⁇ to 200 ⁇ , so as to ensure optimum coupling with terahertz radiation. This then results in construction of an undesired coupling, almost optimum, with the infrared radiation emitted by bodies at 300 ° K and very difficult to eliminate effectively without degrading the quality of the signal in the terahertz frequency range.
  • the two antennas 32, 34 are both arranged on the substrate 36, they are coupled via it. It is thus observed that the gain of the detector is substantially reduced, leading to an unsatisfactory use thereof.
  • the substrate usually has a thickness as small as possible.
  • the object of the present invention is to provide a resistive bolometric detector with double crossed butterfly antennas not having any coupling between the antennas.
  • the first antenna is arranged outside the microbridge and in capacitive coupling with the resistive load
  • the second antenna is arranged in the microbond in resistive coupling with the load.
  • microbridge is meant here the structure suspended above the substrate and which therefore comprises in particular the bolometric membrane and the second antenna.
  • the antennas are separated from each other by the vacuum between the microbridge and the substrate so that there is a reduced coupling between them, in particular via a material.
  • the resistive load comprises a metal film
  • the microbridge comprises fins arranged opposite the first antenna on this metal film so as to achieve an impedance matching between the first antenna and the metallic film.
  • the fins take a shape similar to the central parts of the first antenna.
  • the fins are covered with an electrical insulator and the bolometric element is at least partially arranged on said insulator and at least partially in contact with the metal film.
  • the fins are designed in size, shape and material to achieve optimum impedance matching with the first antenna, and this independently of the second antenna.
  • the resistive load of an antenna performs both the impedance matching and the conversion of the electromagnetic power, and this for both antennas, it is provided according to the invention of additional elements dedicated to impedance matching of the first antenna. Having thus at least partially decoupled the impedance matching function of the conversion function, there is an additional degree of freedom to choose the resistive element plated against the fins also in charge of the conversion of the electromagnetic power, which is for example the metal film usually present in the microbridge for the electrical connection of the thermometric element on which the second antenna for example rests.
  • the resistive load comprises a metal layer and the second antenna is arranged at least partially on the metal film or metal layer, for example, that usually present for the electrical connection of the thermometric element with the reading circuit.
  • the resistive film here fulfills the conversion function for the electromagnetic power received by the second antenna, independently of the fins and the first antenna.
  • the first antenna is arranged on the substrate.
  • the first antenna is formed at least partially above the microbridge.
  • the first antenna thus forms a screen for the thermometric element, which limits the absorption of parasitic radiation.
  • the subject of the invention is also a device for the matrix detection of an electromagnetic radiation in the range extending from the infrared to the terahertz, which, according to the invention, comprises a matrix with one or two dimensions of bolometric detectors of the type above.
  • an elementary bolometric detector 50 according to a first embodiment of the invention, constituting a matrix of elementary detectors.
  • the bolometer 50 comprises an insulating substrate 52 on which is deposited a first plane butterfly antenna 54 made of conductive material, and a micropont 56, suspended above the substrate 52 by two conductive anchoring nails 58.
  • the microbridge 56 is formed of a central portion 60 and two heat-insulating arms 62 connecting the central portion 60 to the anchoring nails 58 and perpendicular to the main axis (VV) of the first antenna 54.
  • the microbridge 56 comprises a first layer of electrical insulator 64, as well as a conductive layer 66, and more particularly a metal film, deposited on the insulating layer 64.
  • the second throttle antenna 68 is thus in resistive coupling with the conductive layer 66.
  • the fins 70, 72, 74 made of the same material as the antennas 54, 68, are also provided on the conductive layer 66 with facing surfaces of the first butterfly antenna 54.
  • the fins 70, 72, 74 are thus in position. capacitive coupling with the antenna 54 and are further selected to perform impedance matching therewith in a manner to be explained in more detail later.
  • the fins 70, 72, 74, as well as the portion of the second butterfly antenna 68 arranged in the central portion 60, are covered with an insulating layer 76 to electrically isolate them, a portion of the conductive layer 66 being left free .
  • thermometric material 78 is also deposited on the insulating layer 76 in contact with the conductive layer 66 at the portion of the latter left free by the insulating layer 76.
  • the substrate 52 comprises an insulating layer 80, having a low absorption coefficient in the range of operating wavelengths of the detector, and a reflector 82, the layer 80 and the reflector 82 forming a resonant cavity for the antennas 54, 68 in the frequency range of interest.
  • a functional layer 84 comprising the detector reading circuits is finally provided under the reflector 82.
  • the figures 7 and 8 are schematic views in perspective and in section of a second embodiment according to the invention.
  • This second embodiment differs from the first embodiment by the location of the first antenna 54. This is arranged above the microbond 56 by means of a support structure 92, rather than disposed on the substrate 52. allows in particular to form a screen for the thermometric element 78, limiting the absorption of parasitic radiation.
  • the first antenna 54 forms a screen above the heat-insulating arms 62, anchoring nails 58 and contacts between the thermometric element 78 and the conductive layer 66, which is particularly advantageous in measuring where these elements usually have resistance characteristics sensitive to infrared radiation located in the 8 ⁇ m-14 ⁇ m frequency band.
  • the resistive load of the antennas 54, 68 is defined by this conducting layer 66, and in particular by the exposed zones of this layer.
  • electromagnetic radiation is picked up by the butterfly antennas 54, 68.
  • the electromagnetic power picked up by the first antenna 54 is then transmitted to the fins 70, 72, 74 by capacitive coupling.
  • the electromagnetic power transmitted to the fins 70, 72, 74 is then converted into heat by the conductive layer 66 on which the fins are formed.
  • the electromagnetic power picked up by the second antenna 68 is itself directly converted by this conductive layer 66 on which it rests.
  • the thermometric element 78 which is in contact with the conductive layer 66, then undergoes because of said contact, a heating and thus sees its modified resistance.
  • the conducting layer 66 which also fulfills the function of polarization electrode of the thermometric element 78, is then regularly biased to subject the thermometric element 78 to a bias voltage and thereby circulate a current therein. to know its variation of resistance, as is known per se.
  • the figure 9 schematically illustrates in a view from above the first and second butterfly antennas 54, 68, as well as the fins 70, 72, 74.
  • a first central wing 72 of rectangular shape, straddles the two wings 100, 102 of the butterfly antenna 54, and two lateral wings 70, 74 are respectively facing portions 100, 102 of the first antenna 54.
  • the lateral wings 70, 74 are substantially of shape and size identical to a part of the antenna 54.
  • the fins have a trapezoidal shape equivalent to the trapezoidal part of the antenna located opposite. Its surface advantageously corresponds to the capacitance C necessary for impedance matching. Thus, an optimal impedance match is obtained.
  • the resistive load of the antennas defined by the portions of the conductive layer 66 located between the fins 70, 72, 74 and between the parts of the second antenna 68, is of reduced surface area. This area being reduced, the coupling of the detector according to the invention with the infrared radiation, which is in first approximation proportional to the size of the resistive load, is also reduced.
  • the length of the antennas 54, 68 and fins, as well as their opening angle ⁇ are chosen so as to increase or reduce the bandwidth of the detector.
  • the cavity 80, 82 of the detector is formed of a reflector 82 disposed on the reading circuit 84, such as for example an aluminum layer, and a layer 80 of insulating material, having a coefficient of absorption of lowest possible in the range of operating wavelengths of the detector.
  • layer 80 consists of SiO, SiO 2 , SiN, Ta 2 O 5 , Ta 2 O 5 -TiO 2 , HfO 2 , SrTiO 3 , Ba 1-x Sr x TiO 3 or a mixture of these.
  • a resonant cavity is thus obtained for the terahertz radiation object of the detection.
  • the layer 80 is also traversed by electrical connections 110, for example in the extension of the anchoring nails 58, so as to electrically connect the read circuit 84 and the thermometric element 78.
  • electrical connections 110 for example in the extension of the anchoring nails 58, so as to electrically connect the read circuit 84 and the thermometric element 78.
  • vias are made in layer 80 according to a conventional technique, and the vias thus produced are filled with a metal such as tungsten, aluminum or copper using a damascene technology associated with a planarization technique.
  • the first antenna 54 made of conducting material such as aluminum, tungsten silicide, titanium or the like, is formed on the layer 80 by a conventional photolithography technique and has a thickness of between 0.1 .mu.m and 0. 5 .mu.m.
  • a sacrificial layer 112 ( figure 11 ), for example made of polyimide, with a thickness of between 0.5 ⁇ m and 5 ⁇ m, is formed on the antenna 54 and the layer 80.
  • the thickness of the sacrificial layer is chosen to achieve a high performance capacitive coupling between the first antenna 54 deposited on the substrate 52 and the fins 70, 72, 74 which will be subsequently formed. This thickness is chosen as low as possible while being compatible with the mechanical strength of the microbridge (electrostatic bonding).
  • An insulating layer 64 is then deposited on the sacrificial layer 112, then a thin metal film 66, for example made of Ti, TiN, Pt, NiCr or others, is deposited on the insulating layer 64.
  • the metal film 66 performs the function of supplying electricity and reading the thermometric element 78 via the heat-insulating arms 62 and the resistive charging function from its surface in contact with the fins 70, 72 , 74 and the second throttle antenna 68.
  • the insulating layer 64 and the thin film 66 are preferably deposited by PECVD (for the English expression " Plasma Enhanced Chemical Vapor Deposition ”) or cathodic sputtering, then etched chemically or plasma to form the insulating arms 62.
  • the metal film 66 is also etched chemically or plasma to form a central portion 114, on which will be formed the fins 70 , 72, 74 and the second antenna 68, and side portions 116, which will be in contact with the thermometric element 78 for its power supply and its reading.
  • the square resistance of the metal film 66 is advantageously chosen so as to provide effective thermal insulation of the microbridge 56 with respect to the reading circuit 84.
  • the square resistance of the metal film 66 is between 100 ⁇ / square and 500 ⁇ / square, because it is the value of the access resistors of the materials used to improve the thermal resistances (bolometer arm).
  • the metal film 66 is connected to the reading circuit 84 by means of the conductive anchoring nails 58, produced through the sacrificial layer 112 in a similar manner to the connections 110, and electrical connections 110.
  • the second antenna 68 and the fins 70, 72, 74 are made of a conductive material such as aluminum, tungsten silicide, titanium or others.
  • a layer of the conductive material is deposited on the central portion 114 of the metal film 66 by cathodic sputtering or by thermal decomposition (LPCVD for the English expression. Saxon “ Low Pressure Chemical Vapor Deposition ”) or plasma decomposition (PECVD), then the second antenna and the fins are formed by chemical etching, plasma etching or by a technique of "lift off" type of said layer.
  • the antenna and the fins consist of metal multilayers.
  • the antenna 68 and fins 70, 72, 74 thus formed define regions that convert the electromagnetic radiation into electrical current and define exposed areas of the metal film 66 that convert the electric current into thermal energy.
  • the second antenna 68 and the fins 70, 72, 74 are then covered with a layer of insulating material 76, such as SiN, SiO, ZnS or others.
  • the layer 76 having a thickness of between 0.005 ⁇ m and 0.1 ⁇ m, is made in order to avoid any short circuit between the fins 70, 72, 74 and the thermometric element 78.
  • the layer 76 is for example made to using a low temperature deposition technique such as sputtering or plasma decomposition (PECVD).
  • PECVD plasma decomposition
  • the layer 76 is then etched, for example chemically or by plasma, to reveal the lateral portions 116 of the metal film 66 to which the thermometric element 78 will be connected , as well as the heat-insulating arms 62.
  • thermometric element 78 is then deposited on the layer 76 and the side portions 116 using, for example, a low temperature deposition technique such as spraying.
  • the constituent material of the thermometric element 78 is, for example, an amorphous or polycrystalline semiconductor, such as Si, Ge, SiC, a-Si: H, a-SiGe: H, a metallic material or a vanadium oxide or a magnetite oxide. This material must have a non-zero temperature coefficient resistance (TCR). In other words, it has a resistance that varies with temperature.
  • the sacrificial layer 112 is removed, the nature of which determines the release technique, and preferably by chemical etching or plasma.
  • the etching of the constituent materials of the detector according to the invention is carried out predominantly or exclusively, by etching techniques, possibly assisted by plasma, these techniques for obtaining accurate and reproducible etchings.
  • a sacrificial layer 130 ( figure 13 ) is deposited on the entire microbridge 56 and the first sacrificial layer 112 used to develop it.
  • the sacrificial layers 112, 130 are then etched to produce the supports 92 of the antenna 54.
  • the supports 92 may for example be made of a material different from that of the antenna 54, for example an insulating material deposited by thermal decomposition (LPCVD).
  • LPCVD thermal decomposition

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Light Receiving Elements (AREA)

Abstract

The detector has a resistive load coupled to crossed bow-tie antennas (54, 68) to convert electromagnetic power into calorific power. A bolometric micro bridge (56) is suspended above a substrate (52) by support and thermal isolation arms (62). The micro bridge has a thermometric element coupled to the load so that temperature of the element is raised due to the effect of the calorific power. One of the antennas is located outside the micro bridge and capacitively coupled with the load. The other antenna is located in the micro bridge and resistively coupled with the load.

Description

DOMAINE DE L'INVENTIONFIELD OF THE INVENTION

La présente invention a trait au domaine des détecteurs bolométriques à antenne, et plus particulièrement aux détecteurs à antennes papillons croisées destinés à la détection d'un rayonnement électromagnétique dans la gamme s'étendant de l'infrarouge, et notamment dans les bandes 3 - 5 µm et 8 - 14 µm, au térahertz.The present invention relates to the field of bolometric antenna detectors, and more particularly to cross-butterfly antenna detectors for the detection of electromagnetic radiation in the range extending from the infrared, and in particular in the bands 3 - 5 microns and 8 - 14 μm, with terahertz.

La détection dans la gamme infrarouge présentent de nombreuses applications, largement connues à ce jour. S'agissant du térahertz, c'est-à-dire dans la gamme de fréquences comprise entre 100 gigahertz et 10 térahertz, les applications envisagées de façon non limitative, concernent.

  • ■ le diagnostic médical, pour lequel la détection dans le térahertz autorise l'accès à des détails de structures anatomiques et les réactions chimiques qui s'y produisent, que ne fournissent ni les rayons X ni les ultra-sons ;
  • ■ le domaine militaire et la sécurité aérienne, avec par exemple la réalisation de radars anti-furtivité ou de radars haute résolution permettant de faire de la discrimination ;
  • ■ l'étude et la détection de la pollution atmosphérique, l'observation en ondes submillimétriques fournissant en effet des informations importantes sur la chimie atmosphérique et permettant ainsi un suivi inégalé des polluants atmosphériques comme par exemple le trioxyde d'azote qui est difficilement détectable par les techniques classiques car présentant de fortes raies d'absorption dans l'infrarouge lointain ;
  • ■ l'identification d'espèces chimiques, de nombreux composés chimiques complexes ayant une signature dans la gamme terahertz suffisamment univoque pour permettre leur détection de manière certaine, comme par exemple certains explosifs et produits toxiques, certains composés issus de la maturation des fruits ou encore certains composés issus de la combustion industrielle ;
  • ■ l'analyse de phénomènes moléculaires ou atomiques, la spectroscopie térahertz permettant d'obtenir de nouvelles informations sur des mécanismes comme la photoexcitation, la photodissociation et la solvatation. Il en va de même pour l'analyse d'interactions moléculaires (états vibratoires des molécules ou des liaisons hydrogènes par exemple), de systèmes à phase condensée, de processus dynamiques dans des grosses molécules telles que les peptides et les protéines ou encore l'observation de l'orientation des polymères avec une technique basée sur le rayonnement térahertz ;
  • ■ l'étude des propriétés des matériaux, comme les semi-conducteurs, pour déterminer de manière non destructive par exemple leur mobilité, la dynamique de porteurs ultra-rapides et les interactions porteurs-phonons, les supraconducteurs, les polymères, les céramiques, les matériaux organiques et les matériaux poreux. De plus, dans la gamme térahertz, des matériaux tels que les plastiques, le papier et les textiles sont transparents, les métaux sont de parfaits réflecteurs et l'eau possède un grand pouvoir absorbant. Ainsi, la détection dans cette gamme est particulièrement adaptée à l'inspection de produits emballés ou au contrôle de procédés de fabrication in situ et en temps réel par exemple ; et
  • ■ la télécommunication large bande, la course à des débits d'information toujours plus élevés, autant sur terre qu'entres satellites, poussant les industriels à développer des systèmes fonctionnant à des fréquences qui atteignent aujourd'hui plusieurs centaines de gigahertz et demain plusieurs térahertz.
The detection in the infrared range have many applications, widely known to date. With regard to the terahertz, that is to say in the frequency range between 100 gigahertz and 10 terahertz, the applications envisaged in a nonlimiting manner concern.
  • ■ the medical diagnosis, for which the detection in the terahertz allows the access to details of anatomical structures and the chemical reactions which take place there, that do not provide the X-rays nor the ultrasounds;
  • ■ the military and aviation safety, for example the creation of anti-stealth radars or high-resolution radar to discriminate;
  • ■ the study and detection of atmospheric pollution, submillimetric wave observation providing important information on atmospheric chemistry and thus allowing unparalleled monitoring of atmospheric pollutants such as nitrogen trioxide which is difficult to detect by classical techniques because they have strong absorption lines in the far infrared;
  • ■ the identification of chemical species, many complex chemical compounds with a signature in the range terahertz sufficiently unambiguous to allow their detection in a certain way, such as certain explosives and toxic products, certain compounds from the fruit ripening or else certain compounds resulting from industrial combustion;
  • ■ the analysis of molecular or atomic phenomena, terahertz spectroscopy to obtain new information on mechanisms such as photoexcitation, photodissociation and solvation. The same goes for the analysis of molecular interactions (vibratory states of molecules or hydrogen bonds, for example), condensed-phase systems, dynamic processes in large molecules such as peptides and proteins, and the like. observation of the orientation of the polymers with a technique based on terahertz radiation;
  • ■ the study of the properties of materials, such as semiconductors, to non-destructively determine, for example, their mobility, the dynamics of high-speed carriers and carrier-phonon interactions, superconductors, polymers, ceramics, organic materials and porous materials. Moreover, in the terahertz range, materials such as plastics, paper and textiles are transparent, metals are perfect reflectors and the water has a great absorbency. Thus, the detection in this range is particularly suitable for the inspection of packaged products or the control of manufacturing processes in situ and in real time, for example; and
  • ■ broadband telecommunication, the race for ever higher information rates, both on land and between satellites, pushing industrialists to develop systems operating at frequencies that today reach several hundred gigahertz and tomorrow several terahertz .

ETAT DE LA TECHNIQUESTATE OF THE ART

Usuellement, un détecteur bolométrique résistif mesure la puissance d'un rayonnement incident dans la gamme infrarouge et comprend à cet effet un élément bolométrique résistif absorbant qui convertit le flux lumineux en flux calorifique, ce qui produit une élévation de température dudit élément par rapport à une température de référence. Cette augmentation de température induit alors une variation de la résistance électrique de l'élément absorbant, provoquant des variations de tension ou de courant aux bornes de celui-ci. Ces variations électriques constituent le signal délivré par le capteur.Usually, a resistive bolometric detector measures the power of incident radiation in the infrared range and comprises for this purpose an absorbing resistive bolometric element which converts the luminous flux into a heat flow, which produces a temperature rise of said element with respect to a reference temperature. This increase in temperature then induces a variation of the electrical resistance of the absorbing element, causing voltage or current variations across it. These electrical variations constitute the signal delivered by the sensor.

Toutefois, la température de l'élément absorbant est usuellement dépendante en grande partie de l'environnement de celui-ci, et notamment celle du substrat qui comprend le circuit électronique de lecture. Afin d'insensibiliser au maximum l'élément absorbant de son environnement, et ainsi augmenter la sensibilité du détecteur, l'élément absorbant est généralement isolé thermiquement du substrat.However, the temperature of the absorbent element is usually largely dependent on the environment thereof, and in particular that of the substrate which comprises the electronic reading circuit. In order to insensitize the absorbent element as much as possible from its environment, and thus to increase the sensitivity of the detector, the absorbent element is generally thermally isolated from the substrate.

La figure 1 est une vue schématique en perspective d'un détecteur bolométrique résistif élémentaire 10 de l'état de la technique illustrant ce principe d'isolation thermique. Ce détecteur élémentaire, ici sous la forme d'une membrane suspendue, fait classiquement partie d'une matrice de détecteurs élémentaires à une ou deux dimensions.The figure 1 is a schematic perspective view of an elementary resistive bolometric detector 10 of the state of the art illustrating this principle of thermal insulation. This elementary detector, here in the form of a suspended membrane, is conventionally part of a matrix of elementary detectors with one or two dimensions.

Le détecteur 10 comporte une fine membrane 12 absorbant le rayonnement incident, suspendue au dessus d'un substrat - support 14 par l'intermédiaire de deux clous d'ancrage conducteurs 16 auxquels elle est fixée par deux bras d'isolation thermique 18. La membrane 12 comprend usuellement une couche d'isolant électrique, comme par exemple du SiO2, du SiO, du SiN, du ZnS ou autres, qui assure la rigidité mécanique de la membrane 12, ainsi qu'une couche métallique d'interconnexion électrique déposée sur la couche d'isolant.The detector 10 comprises a thin membrane 12 absorbing the incident radiation, suspended above a support substrate 14 by means of two conductive anchoring nails 16 to which it is fixed by two heat-insulating arms 18. The membrane 12 usually comprises a layer of electrical insulator, such as for example SiO 2 , SiO, SiN, ZnS or others, which provides the mechanical rigidity of the membrane 12, as well as a metal electrical interconnection layer deposited on the insulation layer.

Une couche 20 mince de matériau thermométrique résistif est par ailleurs déposée au centre de la membrane 12 sur la couche métallique d'interconnexion, notamment une couche en un matériau semi-conducteur, tel que du silicium polycristallin ou amorphe de type p ou n faiblement ou fortement résistif, ou bien un oxyde de vanadium (V2O5, VO2) élaboré dans une phase semi-conductrice.A thin layer 20 of resistive material thermometric is also deposited in the center of the membrane 12 of the metal interconnect layer including a layer of a semiconductor material such as polycrystalline or amorphous silicon p-type or n weakly or strongly resistive, or a vanadium oxide (V 2 O 5 , VO 2 ) developed in a semiconductor phase.

Enfin, le substrat - support 14 comprend un circuit électronique intégré sur une plaquette de silicium, usuellement connu sous l'expression « circuit de lecture ». Le circuit de lecture comporte d'une part les éléments de stimuli et de lecture de l'élément thermométrique 20, et d'autre part les composants de multiplexage qui permettent de sérialiser les signaux issus des différents éléments thermométriques présents dans le détecteur matriciel.Finally, the support substrate 14 comprises an electronic circuit integrated on a silicon wafer, usually known as the "reading circuit". The reading circuit comprises on the one hand the stimulus and reading elements of the thermometric element 20, and on the other hand the multiplexing components which make it possible to serialize the signals coming from the different thermometric elements present in the matrix detector.

En fonctionnement, la membrane 12 s'échauffe sous l'effet d'un rayonnement électromagnétique incident et la puissance calorifique produite est transmise à la couche 20 de matériau thermométrique. Périodiquement, le circuit de lecture agencé dans le substrat 14 polarise la membrane 12 en soumettant les clous 16 à une tension de polarisation et recueille le courant circulant dans l'élément thermométrique 20 pour en déduire une variation de sa résistance et donc le rayonnement incident à l'origine de ladite variation.In operation, the membrane 12 heats up under the effect of incident electromagnetic radiation and the heating power produced is transmitted to the layer 20 of thermometric material. Periodically, the reading circuit arranged in the substrate 14 polarizes the membrane 12 by subjecting the nails 16 to a bias voltage and collects the current flowing in the thermometric element 20 to deduce a variation of its resistance and therefore the radiation incident to the origin of said variation.

L'agencement et le fonctionnement d'un tel détecteur étant classique, il ne sera pas expliqué plus en détail pour des raisons de concision. Il doit cependant être noté que la membrane 12 remplit, outre la fonction d'isolation thermique, trois fonctions principales : celle d'antenne pour la réception du rayonnement, celle de conversion de la puissance électromagnétique réceptionnée en puissance calorifique et celle de mesure thermométrique de la puissance calorifique produite. Remplissant le rôle d'antenne, les dimensions de la membrane 12 sont en conséquence sélectionnées pour être du même ordre de grandeur que la longueur d'onde du rayonnement destiné à être mesuré.The arrangement and operation of such a detector being conventional, it will not be explained in more detail for the sake of brevity. It should however be noted that the membrane 12 fulfills, in addition to the thermal insulation function, three main functions: that of antenna for the reception of the radiation, that of conversion of the electromagnetic power received into heating power and that of thermometric measurement of the heat output produced. Filling the role of antenna, the dimensions of the membrane 12 are therefore selected to be of the same order of magnitude as the wavelength of the radiation to be measured.

Or, dans le domaine du térahertz, les longueurs d'onde peuvent atteindre le millimètre, ce qui nécessite donc une membrane du même ordre de grandeur. Toutefois, pour de telles dimensions, la masse calorifique, la tenue mécanique et les pertes par rayonnement de la membrane sont si problématiques qu'elles nuisent in fine à l'efficacité du détecteur.However, in the terahertz field, the wavelengths can reach the millimeter, which therefore requires a membrane of the same order of magnitude. However, for such dimensions, the heat mass, the mechanical strength and the radiation losses of the membrane are so problematic that they ultimately harm the efficiency of the detector.

C'est pourquoi, pour une telle gamme de fréquences, la fonction de réception du rayonnement est découplée des autres fonctions. La fonction de réception est ainsi assurée par une antenne plane et la fonction de conversion de la puissance électromagnétique en puissance calorifique est quant à elle assurée par la charge résistive de l'antenne. Les dimensions de la charge satisfont classiquement aux conditions d'adaptation d'impédance qui dépendent de la géométrie de l'antenne et de la nature des couches la supportant afin d'obtenir une conversion optimale. La charge résistive est par ailleurs en contact thermique avec un élément thermométrique pour la mesure de la puissance calorifique produite. L'ensemble constitue alors un bolomètre à antenne.Therefore, for such a range of frequencies, the radiation reception function is decoupled from other functions. The reception function is thus provided by a planar antenna and the function of converting the electromagnetic power into heating power is provided by the resistive load of the antenna. The dimensions of the load typically satisfy the impedance matching conditions which depend on the geometry of the antenna and the nature of the layers supporting it in order to obtain an optimal conversion. The resistive load is also in thermal contact with a thermometric element for measuring the heat output produced. The set then constitutes an antenna bolometer.

Dans une telle configuration, l'élément thermométrique est indépendant de l'antenne et sa taille ne dépend plus alors de la longueur d'onde incidente mais de facteurs déterminant les performances intrinsèques du détecteur (sensibilité, rapport signal sur bruit, etc...), en adéquation avec les exigences de l'application visée, par exemple de l'imagerie active ou de l'imagerie passive.In such a configuration, the thermometric element is independent of the antenna and its size no longer depends on the incident wavelength but factors determining the intrinsic performance of the detector (sensitivity, signal-to-noise ratio, etc ... ), in line with the requirements of the intended application, for example active imaging or passive imaging.

Par ailleurs, dans la plupart des cas, le rayonnement électromagnétique incident n'est pas polarisé, de sorte que sa réception par une seule antenne ne permet pas de capter la totalité de la puissance électromagnétique. Toutefois, un rayonnement non polarisé peut être considéré comme la superposition de deux composantes polarisées linéairement dans deux directions orthogonales, chacune de ces composantes transportant la moitié de l'énergie de l'onde. Comme cela est connu en soi, une manière efficace de capter un rayonnement électromagnétique incident est d'utiliser deux antennes papillons croisées. L'antenne papillon est mieux connue sous l'expression anglo-saxonne « bow-tie », et est explicitée par exemple sur la thèse de R. PEREZ, consultable sur le site suivant : http://www.unilim.fr/theses/2005/sciences/2005limo0053/perez_r.pdf.Moreover, in most cases, the incident electromagnetic radiation is not polarized, so that its reception by a single antenna does not capture all of the electromagnetic power. However, a non-polarized radiation can be considered as the superposition of two components linearly polarized in two orthogonal directions, each of these components carrying half of the energy of the wave. As is known per se, an effective way of capturing incident electromagnetic radiation is to use two crossed butterfly antennas. The butterfly antenna is better known under the Anglo-Saxon " bow-tie ", and is explained for example on the thesis of R. PEREZ, available on the following website: http://www.unilim.fr/theses /2005/sciences/2005limo0053/perez_r.pdf.

Le document US 6 329 655 décrit un bolomètre à antenne 30, fonctionnant dans la gamme millimétrique et muni de deux antennes papillons croisées 32, 34, dont des vues schématiques de dessus et en section sont représentées aux figures 2 et 3 respectivement. Le principe du bolomètre 30 repose sur le couplage capacitif réalisé entre les antennes 32, 34, disposées sur un substrat - support 36, et une charge résistive 38, agencée dans une membrane suspendue 40 et sur laquelle est disposée un élément thermométrique 42 (figure 3).The document US 6,329,655 describes an antenna bolometer 30, operating in the millimeter range and provided with two crossed butterfly antennas 32, 34, whose schematic views from above and in section are shown in FIGS. figures 2 and 3 respectively. The principle of the bolometer 30 is based on the capacitive coupling produced between the antennas 32, 34, arranged on a support substrate 36, and a resistive load 38, arranged in a suspended membrane 40 and on which a thermometric element 42 is disposed ( figure 3 ).

La charge résistive 38, qui prend la forme d'une couche carrée agencée au centre des antennes 32, 34, présente en effet une surface en regard de celles-ci et forme donc avec les antennes une capacité. Le rayonnement capté par les antennes 32, 34 est ainsi transmis à la charge 38 par couplage capacitif.The resistive load 38, which takes the form of a square layer arranged in the center of the antennas 32, 34, has indeed a surface facing them and thus forms with the antennas a capacitance. The radiation picked up by the antennas 32, 34 is thus transmitted to the load 38 by capacitive coupling.

Toutefois la forme de la charge résistive pose des problèmes d'adaptation d'impédance.However, the shape of the resistive load poses problems of impedance matching.

On estime en effet que l'adaptation d'impédance, et donc le couplage capacitif, est optimale pour cette charge lorsque la relation suivante est satisfaite : 1 π . f . C 2 + R . C 2 100 Ω

Figure imgb0001

où f est la fréquence du rayonnement, C est la valeur de la capacité formée entre les antennes 32, 34 et la charge résistive 38, et R est la valeur de la résistance de la charge résistive 38. It is estimated that the impedance matching, and therefore the capacitive coupling, is optimal for this load when the following relation is satisfied: 1 π . f . VS 2 + R . VS 2 100 Ω
Figure imgb0001

where f is the frequency of the radiation, C is the value of the capacitance formed between the antennas 32, 34 and the resistive load 38, and R is the value of the resistance of the resistive load 38.

Augmenter la valeur de la capacité C pour réaliser une adaptation d'impédance ou un couplage optimum est inadapté puisque cela suppose soit un espace submicronique entre les antennes 32, 34 et la charge 38, soit une grande surface de recouvrement entre celles-ci.Increasing the value of the capacitor C to achieve impedance matching or optimum coupling is unsuitable since it assumes either a submicron space between the antennas 32, 34 and the load 38, a large overlap surface therebetween.

Réduire la distance entre les antennes et la charge à une valeur comprise entre 100 et 200 nanomètres présente cependant des difficultés liées autant aux phénomènes physiques (effet Casimir pour la stabilité mécanique, échange radiatif important conduisant à une dégradation des l'isolation thermique de l'élément thermométrique et donc à une baisse de la sensibilité du détecteur) qu'aux techniques actuelles de fabrication (maîtrise des contraintes résiduelles des couches pour éviter les contacts non désirés ou encore maîtrise des couches sacrificielles utilisées pour former l'espace entre les antennes et la charge résistive).However, reducing the distance between the antennas and the load to a value between 100 and 200 nanometers presents difficulties linked to both physical phenomena (Casimir effect for mechanical stability, important radiative exchange leading to a degradation of the thermal insulation of the thermometric element and thus to a decrease of the sensitivity of the detector) than to current manufacturing techniques (control of the residual stresses of the layers to avoid unwanted contacts or control of sacrificial layers used to form the space between the antennas and the resistive load).

Par ailleurs, augmenter la taille de la charge résistive pour augmenter les surfaces en regard présente les mêmes problèmes que ceux ayant menés au découplage entre la fonction de réception et les fonctions de conversion et de thermométrie précédemment évoqués. Par conséquent, pour une adaptation au térahertz, la valeur de la capacité C n'est pas libre.Moreover, increasing the size of the resistive load to increase the facing surfaces presents the same problems that led to the decoupling between the reception function and the conversion and thermometry functions previously mentioned. Therefore, for a terahertz adaptation, the value of the capacitance C is not free.

Dans une telle configuration, la charge résistive 38 doit être faiblement résistive, à savoir une résistance carrée de 50Ω à 200Ω, de manière à assurer un couplage optimum avec un rayonnement térahertz. Il en résulte alors par construction un couplage non désiré, quasiment optimum, avec le rayonnement infrarouge émis par des corps à 300°K et très difficile à éliminer efficacement sans dégrader la qualité du signal dans la gamme des fréquences térahertz.In such a configuration, the resistive load 38 must be weakly resistive, ie a square resistance of 50Ω to 200Ω, so as to ensure optimum coupling with terahertz radiation. This then results in construction of an undesired coupling, almost optimum, with the infrared radiation emitted by bodies at 300 ° K and very difficult to eliminate effectively without degrading the quality of the signal in the terahertz frequency range.

De fait, il est difficile d'obtenir avec une charge résistive, associée aux deux antennes et présentant une forme carrée au centre du détecteur, une adaptation d'impédance et un couplage capacitif optimaux, à moins de rendre également optimal le couplage du détecteur avec le rayonnement infrarouge.In fact, it is difficult to obtain, with a resistive load, associated with the two antennas and having a square shape in the center of the detector, optimum impedance matching and capacitive coupling, unless also optimal coupling of the detector with infrared radiation.

Par ailleurs, les deux antennes 32, 34 étant toutes deux disposées sur le substrat 36, elles sont couplées via celui-ci. On observe ainsi que le gain du détecteur est sensiblement réduit, conduisant à une utilisation peu satisfaisante de celui-ci. Pour des raisons de connexion électrique, notamment de facilité de fabrication des reprises de contact entre le circuit de lecture agencé dans le substrat et l'élément thermométrique de la membrane, le substrat présente usuellement une épaisseur la plus faible possible. Cependant, comme cette épaisseur e doit vérifier la relation e = λ/4n avec n = ε ,

Figure imgb0002
la permittivité ε sera très élevée, ce qui augmentera le couplage des deux antennes croisées. Ainsi, il n'est pas possible de réduire le découplage entre les antennes en choisissant le substrat en conséquence, sans par ailleurs modifier de manière importante l'agencement et le fonctionnement des éléments électroniques intégrés dans celui-ci.Moreover, the two antennas 32, 34 are both arranged on the substrate 36, they are coupled via it. It is thus observed that the gain of the detector is substantially reduced, leading to an unsatisfactory use thereof. For reasons of electrical connection, particularly ease of manufacture of the contact resumption between the read circuit arranged in the substrate and the thermometric element of the membrane, the substrate usually has a thickness as small as possible. However, since this thickness e must verify the relation e = λ / 4n with not = ε ,
Figure imgb0002
the permittivity ε will be very high, which will increase the coupling of the two crossed antennas. Thus, it is not possible to reduce the decoupling between the antennas by choosing the substrate accordingly, without otherwise significantly alter the arrangement and operation of the electronic elements integrated therein.

Les documents US 6329649 et Peytavit et al, The Joint 30th International Conference on Infrared and Milimeter Waves & 13th Intl. Conf. on Terahertz Electronics, Vol. 1, 19 Sep. 2005, pages 257-258 divulguent, des détecteurs bolométriques à antenne.The documents US 6329649 and Peytavit et al, The Joint 30th International Conference on Infrared and Milimeter Waves & 13th Intl. Conf. on Terahertz Electronics, Vol. 1, 19 Sep. 2005, pages 257-258 disclose bolometric antenna detectors.

EXPOSE DE L'INVENTIONSUMMARY OF THE INVENTION

Le but de la présente invention est de proposer un détecteur bolométrique résistif à double antennes papillon croisées ne présentant pas de couplage entre les antennes.The object of the present invention is to provide a resistive bolometric detector with double crossed butterfly antennas not having any coupling between the antennas.

A cet effet, l'invention a pour objet un détecteur bolométrique d'un rayonnement électromagnétique dans le domaine s'étendant de l'infrarouge au térahertz, comportant :

  • ■ une première et une seconde antennes papillon croisées, destinées à collecter le rayonnement électromagnétique ;
  • ■ une charge résistive couplée auxdites antennes pour convertir la puissance électromagnétique collectée en puissance calorifique ;
  • ■ un micropont bolométrique suspendu au dessus d'un substrat par des bras de soutien et d'isolation thermique, le micropont comprenant :
    • o la charge résistive ;
    • o un élément bolométrique ou thermométrique couplé à la charge résistive pour s'échauffer sous l'effet de la puissance calorifique produite.
To this end, the subject of the invention is a bolometric detector of an electromagnetic radiation in the range extending from infrared to terahertz, comprising:
  • ■ first and second crossed butterfly antennas for collecting electromagnetic radiation;
  • A resistive load coupled to said antennas for converting the collected electromagnetic power into heating power;
  • A bolometric microbridge suspended above a substrate by support and thermal insulation arms, the microbridge comprising:
    • o the resistive load;
    • a bolometric or thermometric element coupled to the resistive load to heat up under the effect of the heating power produced.

Selon l'invention, la première antenne est agencée hors du micropont et en couplage capacitif avec la charge résistive, et la seconde antenne est agencée dans le micropont en couplage résistif avec la charge.According to the invention, the first antenna is arranged outside the microbridge and in capacitive coupling with the resistive load, and the second antenna is arranged in the microbond in resistive coupling with the load.

Par « micropont », on entend ici la structure suspendue au dessus du substrat et qui comprend donc notamment la membrane bolométrique et la seconde antenne.By "microbridge" is meant here the structure suspended above the substrate and which therefore comprises in particular the bolometric membrane and the second antenna.

En d'autres termes, les antennes sont séparées l'une de l'autre par le vide entre le micropont et le substrat de sorte qu'il existe un couplage réduit entre elles, notamment via un matériau.In other words, the antennas are separated from each other by the vacuum between the microbridge and the substrate so that there is a reduced coupling between them, in particular via a material.

Selon un mode de réalisation privilégié de l'invention, la charge résistive comporte un film métallique, et le micropont comprend des ailettes agencées en regard de la première antenne sur ce film métallique de façon à réaliser une adaptation d'impédance entre la première antenne et le film métallique. De préférence, les ailettes prennent une forme analogue aux parties centrales de la première antenne. Notamment, les ailettes sont recouvertes d'un isolant électrique et l'élément bolométrique est au moins partiellement agencé sur ledit isolant et au moins partiellement au contact du film métallique.According to a preferred embodiment of the invention, the resistive load comprises a metal film, and the microbridge comprises fins arranged opposite the first antenna on this metal film so as to achieve an impedance matching between the first antenna and the metallic film. Preferably, the fins take a shape similar to the central parts of the first antenna. In particular, the fins are covered with an electrical insulator and the bolometric element is at least partially arranged on said insulator and at least partially in contact with the metal film.

En d'autres termes, les ailettes sont conçues en dimension, forme et matériau pour réaliser une adaptation d'impédance, optimale avec la première antenne, et cela indépendamment de la seconde antenne.In other words, the fins are designed in size, shape and material to achieve optimum impedance matching with the first antenna, and this independently of the second antenna.

Ainsi, au contraire de l'état de la technique où la charge résistive d'une antenne réalise à la fois l'adaptation d'impédance et la conversion de la puissance électromagnétique, et cela pour les deux antennes, il est prévu selon l'invention des éléments supplémentaires dédiés à l'adaptation d'impédance de la première antenne. Ayant découplé ainsi au moins partiellement la fonction d'adaptation d'impédance de la fonction de conversion, il existe un degré de liberté supplémentaire pour choisir l'élément résistif plaqué contre les ailettes également en charge de la conversion de la puissance électromagnétique, qui est par exemple le film métallique usuellement présent dans le micropont pour la connexion électrique de l'élément thermométrique sur lequel repose par exemple la seconde antenne.Thus, unlike the state of the art where the resistive load of an antenna performs both the impedance matching and the conversion of the electromagnetic power, and this for both antennas, it is provided according to the invention of additional elements dedicated to impedance matching of the first antenna. Having thus at least partially decoupled the impedance matching function of the conversion function, there is an additional degree of freedom to choose the resistive element plated against the fins also in charge of the conversion of the electromagnetic power, which is for example the metal film usually present in the microbridge for the electrical connection of the thermometric element on which the second antenna for example rests.

Selon un mode de réalisation selon l'invention, la charge résistive comporte une couche métallique et la seconde antenne est agencée au moins partiellement sur ce film métallique ou couche métallique, par exemple, celui usuellement présent pour la connexion électrique de l'élément thermométrique avec le circuit de lecture.According to one embodiment of the invention, the resistive load comprises a metal layer and the second antenna is arranged at least partially on the metal film or metal layer, for example, that usually present for the electrical connection of the thermometric element with the reading circuit.

En d'autres termes, le film résistif remplit ici la fonction de conversion pour la puissance électromagnétique reçue par la seconde antenne, et cela indépendamment des ailettes et de la première antenne.In other words, the resistive film here fulfills the conversion function for the electromagnetic power received by the second antenna, independently of the fins and the first antenna.

Selon un mode de réalisation de l'invention, la première antenne est agencée sur le substrat.According to one embodiment of the invention, the first antenna is arranged on the substrate.

Selon un mode de réalisation de l'invention, la première antenne est formée au moins partiellement au dessus du micropont. La première antenne forme ainsi un écran pour l'élément thermométrique, ce qui limite l'absorption des rayonnements parasites.According to one embodiment of the invention, the first antenna is formed at least partially above the microbridge. The first antenna thus forms a screen for the thermometric element, which limits the absorption of parasitic radiation.

L'invention a également pour objet un dispositif de détection matriciel d'un rayonnement électromagnétique dans le domaine s'étendant de l'infrarouge au térahertz, qui, selon l'invention, comporte une matrice à une ou deux dimensions de détecteurs bolométriques du type susmentionné.The subject of the invention is also a device for the matrix detection of an electromagnetic radiation in the range extending from the infrared to the terahertz, which, according to the invention, comprises a matrix with one or two dimensions of bolometric detectors of the type above.

BREVE DESCRIPTION DES FIGURESBRIEF DESCRIPTION OF THE FIGURES

L'invention sera mieux comprise à la lecture de la description qui va suivre, donnée uniquement à titre d'exemple, et réalisée en relation avec les dessins annexés, dans lesquels des références identiques désignent des éléments identiques ou analogues, et dans lesquels :

  • ■ la figure 1 est une vue schématique en perspective d'un détecteur bolométrique élémentaire de l'état de la technique, déjà décrit ci-dessus;
  • ■ les figures 2 et 3 sont des vues schématiques de dessus et en coupe d'un détecteur bolométrique à antennes selon l'état de la technique, déjà décrit ci-dessus ;
  • ■ la figure 4 est une vue schématique en perspective d'un premier mode de réalisation d'un détecteur bolométrique selon l'invention ;
  • ■ les figures 5 et 6 sont des vues en section du détecteur selon le premier mode de réalisation, respectivement selon les plans V-V et VI-VI de la figure 4 ;
  • ■ la figure 7 est une vue schématique en perspective d'un deuxième mode de réalisation d'un détecteur bolométrique selon l'invention ;
  • ■ la figure 8 est une vue schématique en section du détecteur selon le deuxième mode de réalisation selon le plan VIII-VIII de la figure 7 ;
  • ■ la figure 9 est une vue schématique de dessus illustrant les ailettes d'adaptation d'impédance entrant dans la constitution du premier mode de réalisation ;
  • ■ les figures 10 à 13 sont des vues schématiques en coupe illustrant un procédé de fabrication d'un détecteur selon l'invention.
The invention will be better understood on reading the following description, given solely by way of example, and made with reference to the accompanying drawings, in which identical references designate identical or similar elements, and in which:
  • ■ the figure 1 is a schematic perspective view of an elementary bolometric detector of the state of the art, already described above;
  • ■ the figures 2 and 3 are schematic views from above and in section of a bolometric antenna detector according to the state of the art, already described above;
  • ■ the figure 4 is a schematic perspective view of a first embodiment of a bolometric detector according to the invention;
  • ■ the Figures 5 and 6 are sectional views of the detector according to the first embodiment, respectively according to plans VV and VI-VI of the figure 4 ;
  • ■ the figure 7 is a schematic perspective view of a second embodiment of a bolometric detector according to the invention;
  • ■ the figure 8 is a diagrammatic sectional view of the detector according to the second embodiment according to the plan VIII-VIII of the figure 7 ;
  • ■ the figure 9 is a schematic top view illustrating the impedance matching fins forming part of the constitution of the first embodiment;
  • ■ the Figures 10 to 13 are schematic sectional views illustrating a method of manufacturing a detector according to the invention.

DESCRIPTION DETAILLEE DE L'INVENTIONDETAILED DESCRIPTION OF THE INVENTION

Il va à présent être décrit, en relation avec les figures 4 à 7, un détecteur bolométrique élémentaire 50 selon un premier mode de réalisation de l'invention, constitutif d'une matrice de détecteurs élémentaires.It will now be described, in relation to the Figures 4 to 7 , an elementary bolometric detector 50 according to a first embodiment of the invention, constituting a matrix of elementary detectors.

Le bolomètre 50 comporte un substrat isolant 52 sur lequel est déposée une première antenne papillon 54 plane réalisée en matériau conducteur, ainsi qu'un micropont 56, suspendu au dessus du substrat 52 par deux clous d'ancrage conducteurs 58. The bolometer 50 comprises an insulating substrate 52 on which is deposited a first plane butterfly antenna 54 made of conductive material, and a micropont 56, suspended above the substrate 52 by two conductive anchoring nails 58.

Le micropont 56 est formé d'une partie centrale 60 et de deux bras d'isolation thermique 62 raccordant la partie centrale 60 aux clous d'ancrage 58 et perpendiculaires à l'axe principal (V-V) de la première antenne 54. Le micropont 56 comporte une première couche d'isolant électrique 64, ainsi qu'une couche conductrice 66, et plus particulièrement un film métallique, déposée sur la couche d'isolant 64. The microbridge 56 is formed of a central portion 60 and two heat-insulating arms 62 connecting the central portion 60 to the anchoring nails 58 and perpendicular to the main axis (VV) of the first antenna 54. The microbridge 56 comprises a first layer of electrical insulator 64, as well as a conductive layer 66, and more particularly a metal film, deposited on the insulating layer 64.

Une seconde antenne 68 papillon en matériau conducteur, croisée avec la première antenne 54 et d'axe principal (VI-VI) parallèle aux bras d'isolation thermique 62, est par ailleurs formée sur la couche conductrice 66 du micropont 56 et s'étend de part et d'autre de la partie centrale 60. La seconde antenne papillon 68 est ainsi en couplage résistif avec la couche conductrice 66. A second antenna 68 butterfly of conductive material, crossed with the first antenna 54 and main axis (VI-VI) parallel to the heat insulating arms 62, is also formed on the conductive layer 66 of the microbridge 56 and extends on either side of the central portion 60. The second throttle antenna 68 is thus in resistive coupling with the conductive layer 66.

Des ailettes 70, 72, 74, réalisée dans le même matériau que les antennes 54, 68, sont également prévues sur la couche conductrice 66 avec des surfaces en regard de la première antenne papillon 54. Les ailettes 70, 72, 74 sont ainsi en couplage capacitif avec l'antenne 54 et sont par ailleurs choisies pour réaliser une adaptation d'impédance avec celle-ci d'une manière qui sera expliquée plus en détail par la suite.The fins 70, 72, 74, made of the same material as the antennas 54, 68, are also provided on the conductive layer 66 with facing surfaces of the first butterfly antenna 54. The fins 70, 72, 74 are thus in position. capacitive coupling with the antenna 54 and are further selected to perform impedance matching therewith in a manner to be explained in more detail later.

Les ailettes 70, 72, 74, ainsi que la portion de la seconde antenne papillon 68 agencée dans la partie centrale 60, sont recouvertes d'une couche d'isolant 76 pour les isoler électriquement, une partie de la couche conductrice 66 étant laissée libre.The fins 70, 72, 74, as well as the portion of the second butterfly antenna 68 arranged in the central portion 60, are covered with an insulating layer 76 to electrically isolate them, a portion of the conductive layer 66 being left free .

Une couche de matériau thermométrique 78 est par ailleurs déposée sur la couche d'isolant 76 en contact de la couche conductrice 66 au niveau de la partie de celle-ci laissée libre par la couche d'isolant 76. A layer of thermometric material 78 is also deposited on the insulating layer 76 in contact with the conductive layer 66 at the portion of the latter left free by the insulating layer 76.

Enfin, le substrat 52 comporte une couche isolante 80, présentant un faible coefficient d'absorption dans la gamme de longueurs d'onde de fonctionnement du détecteur, et un réflecteur 82, la couche 80 et le réflecteur 82 formant une cavité résonnante pour les antennes 54, 68 dans la gamme de fréquences d'intérêt. Une couche fonctionnelle 84 comprenant les circuits de lecture du détecteur est enfin prévue sous le réflecteur 82. Finally, the substrate 52 comprises an insulating layer 80, having a low absorption coefficient in the range of operating wavelengths of the detector, and a reflector 82, the layer 80 and the reflector 82 forming a resonant cavity for the antennas 54, 68 in the frequency range of interest. A functional layer 84 comprising the detector reading circuits is finally provided under the reflector 82.

Les figures 7 et 8 sont des vues schématiques en perspective et en section d'un second mode de réalisation selon l'invention. Ce second mode de réalisation diffère du premier mode de réalisation par l'emplacement de la première antenne 54. Celle-ci est disposée au dessus du micropont 56 au moyen d'une structure de soutien 92, plutôt que disposée sur le substrat 52. Ceci permet notamment de former un écran pour l'élément thermométrique 78, limitant l'absorption des rayonnements parasites.The figures 7 and 8 are schematic views in perspective and in section of a second embodiment according to the invention. This second embodiment differs from the first embodiment by the location of the first antenna 54. This is arranged above the microbond 56 by means of a support structure 92, rather than disposed on the substrate 52. allows in particular to form a screen for the thermometric element 78, limiting the absorption of parasitic radiation.

Plus particulièrement, la première antenne 54 forme un écran au-dessus des bras d'isolation thermique 62, des clous d'ancrage 58 et des contacts entre l'élément thermométrique 78 et la couche conductrice 66, ce qui est particulièrement avantageux dans la mesure où ces éléments présentent usuellement des caractéristiques de résistance sensibles au rayonnement infrarouge situé dans la bande de fréquences 8µm-14µm.More particularly, the first antenna 54 forms a screen above the heat-insulating arms 62, anchoring nails 58 and contacts between the thermometric element 78 and the conductive layer 66, which is particularly advantageous in measuring where these elements usually have resistance characteristics sensitive to infrared radiation located in the 8μm-14μm frequency band.

On notera que la charge résistive des antennes 54, 68 est définie par cette couche conductrice 66, et en particulier par les zones découvertes de cette couche.It will be noted that the resistive load of the antennas 54, 68 is defined by this conducting layer 66, and in particular by the exposed zones of this layer.

En fonctionnement, un rayonnement électromagnétique est capté par les antennes papillons 54, 68. La puissance électromagnétique captée par la première antenne 54 est alors transmise aux ailettes 70, 72, 74 par couplage capacitif. La puissance électromagnétique transmise aux ailettes 70, 72, 74 est alors convertie en chaleur par la couche conductrice 66 sur laquelle les ailettes sont formées.In operation, electromagnetic radiation is picked up by the butterfly antennas 54, 68. The electromagnetic power picked up by the first antenna 54 is then transmitted to the fins 70, 72, 74 by capacitive coupling. The electromagnetic power transmitted to the fins 70, 72, 74 is then converted into heat by the conductive layer 66 on which the fins are formed.

La puissance électromagnétique captée par la seconde antenne 68 est quant à elle directement convertie par cette couche conductrice 66 sur laquelle elle repose. L'élément thermométrique 78, qui est au contact de la couche conductrice 66, subit alors en raison dudit contact, un échauffement et voit ainsi sa résistance modifiée. La couche conductrice 66, qui remplit également la fonction d'électrode de polarisation de l'élément thermométrique 78, est alors régulièrement polarisée pour soumettre l'élément thermométrique 78 à une tension de polarisation et faire ainsi circuler un courant dans celui-ci de manière à connaître sa variation de résistance, comme cela est connu en soi.The electromagnetic power picked up by the second antenna 68 is itself directly converted by this conductive layer 66 on which it rests. The thermometric element 78, which is in contact with the conductive layer 66, then undergoes because of said contact, a heating and thus sees its modified resistance. The conducting layer 66, which also fulfills the function of polarization electrode of the thermometric element 78, is then regularly biased to subject the thermometric element 78 to a bias voltage and thereby circulate a current therein. to know its variation of resistance, as is known per se.

La figure 9 illustre schématiquement en vue de dessus les première et seconde antennes papillons 54, 68, ainsi que les ailettes 70, 72, 74. Comme cela est visible, une première ailette centrale 72, de forme rectangulaire, est à cheval sur les deux ailes 100, 102 de l'antenne papillon 54, et deux ailettes latérales 70, 74 sont respectivement en regard des parties 100, 102 de la première antenne 54. De préférence, les ailettes latérales 70, 74 sont sensiblement de forme et de dimension identiques à une partie de l'antenne 54. Les ailettes ont une forme trapézoïdale équivalente à la partie trapézoïdale de l'antenne située en regard. Sa surface correspond avantageusement à la capacité C nécessaire à l'adaptation d'impédance. Ainsi, il est obtenu une adaptation d'impédance optimale.The figure 9 schematically illustrates in a view from above the first and second butterfly antennas 54, 68, as well as the fins 70, 72, 74. As can be seen, a first central wing 72, of rectangular shape, straddles the two wings 100, 102 of the butterfly antenna 54, and two lateral wings 70, 74 are respectively facing portions 100, 102 of the first antenna 54. Preferably, the lateral wings 70, 74 are substantially of shape and size identical to a part of the antenna 54. The fins have a trapezoidal shape equivalent to the trapezoidal part of the antenna located opposite. Its surface advantageously corresponds to the capacitance C necessary for impedance matching. Thus, an optimal impedance match is obtained.

En outre, la charge résistive des antennes, définies par les portions de la couche conductrice 66 situées entre les ailettes 70, 72, 74 et entre les parties de la seconde antenne 68, est de surface réduite. Cette surface étant réduite, le couplage du détecteur selon l'invention avec le rayonnement infrarouge, qui est en première approximation proportionnel à la taille de la charge résistive, est donc également réduit.In addition, the resistive load of the antennas, defined by the portions of the conductive layer 66 located between the fins 70, 72, 74 and between the parts of the second antenna 68, is of reduced surface area. This area being reduced, the coupling of the detector according to the invention with the infrared radiation, which is in first approximation proportional to the size of the resistive load, is also reduced.

Par ailleurs, la longueur des antennes 54, 68 et des ailettes, de même que leur angle d'ouverture θ sont choisies de manière à accroitre ou à réduire la bande passante du détecteur.Furthermore, the length of the antennas 54, 68 and fins, as well as their opening angle θ are chosen so as to increase or reduce the bandwidth of the detector.

Il va à présent être décrit en relation avec les figures 10 à 12 un procédé de fabrication du détecteur selon le premier mode de réalisation selon l'invention.It will now be described in relation to the Figures 10 to 12 a method of manufacturing the detector according to the first embodiment according to the invention.

Comme illustré à la figure 10, la cavité 80, 82 du détecteur est formée d'un réflecteur 82, disposé sur le circuit de lecture 84, comme par exemple une couche d'aluminium, et d'une couche 80 de matériau isolant, présentant un coefficient d'absorption le plus faible possible dans la gamme de longueurs d'onde de fonctionnement du détecteur. Par exemple, la couche 80 est constituée de SiO, de SiO2, de SiN, de Ta2O5, de Ta2O5-TiO2, de HfO2, de SrTiO3, de Ba1-xSrxTiO3 ou d'un mélange de ceux-ci.As illustrated in figure 10 , the cavity 80, 82 of the detector is formed of a reflector 82 disposed on the reading circuit 84, such as for example an aluminum layer, and a layer 80 of insulating material, having a coefficient of absorption of lowest possible in the range of operating wavelengths of the detector. For example, layer 80 consists of SiO, SiO 2 , SiN, Ta 2 O 5 , Ta 2 O 5 -TiO 2 , HfO 2 , SrTiO 3 , Ba 1-x Sr x TiO 3 or a mixture of these.

La couche 80 a par ailleurs une épaisseur de 1µm à 500 µm, réglée à la valeur : λ / 4 n

Figure imgb0003

où :

  • ■ λ est une longueur d'onde de la gamme de fonctionnement du détecteur, par exemple la longueur d'onde centrale de cette gamme ; et
  • n = ε ,
    Figure imgb0004
    ε étant la permittivité diélectrique du matériau constitutif de la couche 80.
The layer 80 also has a thickness of 1 .mu.m to 500 .mu.m, set at the value: λ / 4 not
Figure imgb0003

or :
  • ■ λ is a wavelength of the operating range of the detector, for example the central wavelength of this range; and
  • not = ε ,
    Figure imgb0004
    ε being the dielectric permittivity of the material constituting the layer 80.

Une cavité résonnante est ainsi obtenue pour le rayonnement térahertz objet de la détection.A resonant cavity is thus obtained for the terahertz radiation object of the detection.

La couche 80 est par ailleurs traversée par des connexions électriques 110, par exemple dans le prolongement des clous d'ancrage 58, de manière à relier électriquement le circuit de lecture 84 et l'élément thermométrique 78. Par exemple, des vias sont réalisés dans la couche 80 selon une technique usuelle, et les vias ainsi produits sont comblés par un métal comme le tungstène, l'aluminium ou le cuivre au moyen d'une technologie damascène associée à une technique de planarisation.The layer 80 is also traversed by electrical connections 110, for example in the extension of the anchoring nails 58, so as to electrically connect the read circuit 84 and the thermometric element 78. For example, vias are made in layer 80 according to a conventional technique, and the vias thus produced are filled with a metal such as tungsten, aluminum or copper using a damascene technology associated with a planarization technique.

La première antenne 54, en matériau conducteur comme l'aluminium, le siliciure de tungstène, le titane ou autres, est quant à elle formée sur la couche 80 par une technique usuelle de photolithographie et présente une épaisseur comprise entre 0,1µm à 0,5µm.The first antenna 54, made of conducting material such as aluminum, tungsten silicide, titanium or the like, is formed on the layer 80 by a conventional photolithography technique and has a thickness of between 0.1 .mu.m and 0. 5 .mu.m.

Une fois le substrat 52 et la première antenne 54 fabriqués, une couche sacrificielle 112 (figure 11), par exemple en polyimide, d'épaisseur comprise entre 0,5µm et 5µm est formée sur l'antenne 54 et la couche 80. L'épaisseur de la couche sacrificielle est choisie pour réaliser un couplage capacitif performant entre la première antenne 54 déposée sur le substrat 52 et les ailettes 70, 72, 74 qui seront ultérieurement formées. Cette épaisseur est choisie la plus faible possible tout en étant compatible avec la tenue mécanique du micropont (collage électrostatique).Once the substrate 52 and the first antenna 54 have been manufactured, a sacrificial layer 112 ( figure 11 ), for example made of polyimide, with a thickness of between 0.5 μm and 5 μm, is formed on the antenna 54 and the layer 80. The thickness of the sacrificial layer is chosen to achieve a high performance capacitive coupling between the first antenna 54 deposited on the substrate 52 and the fins 70, 72, 74 which will be subsequently formed. This thickness is chosen as low as possible while being compatible with the mechanical strength of the microbridge (electrostatic bonding).

Une couche d'isolant 64 est alors déposée sur la couche sacrificielle 112, puis un film métallique mince 66, par exemple constitué de Ti, de TiN, de Pt, de NiCr ou autres, est déposée sur la couche d'isolant 64. An insulating layer 64 is then deposited on the sacrificial layer 112, then a thin metal film 66, for example made of Ti, TiN, Pt, NiCr or others, is deposited on the insulating layer 64.

Comme décrit précédemment, le film métallique 66 réalise la fonction d'alimentation électrique et de lecture de l'élément thermométrique 78 via les bras d'isolation thermique 62 et la fonction de charge résistive de part sa surface en contact avec les ailettes 70, 72, 74 et la seconde antenne papillon 68. Le couche d'isolant 64 et le film mince 66, chacun d'une épaisseur comprise entre 0,005µm et 0,05µm, sont préférentiellement déposés par PECVD (pour l'expression anglo-saxonne « Plasma Enhanced Chemical Vapor Deposition ») ou pulvérisation cathodique, puis gravés chimiquement ou par plasma pour former les bras d'isolation 62. Le film métallique 66 est également gravé chimiquement ou par plasma pour former une portion centrale 114, sur laquelle seront formées les ailettes 70, 72, 74 et la seconde antenne 68, et des portions latérales 116, qui seront au contact de l'élément thermométrique 78 pour son alimentation et sa lecture.As described above, the metal film 66 performs the function of supplying electricity and reading the thermometric element 78 via the heat-insulating arms 62 and the resistive charging function from its surface in contact with the fins 70, 72 , 74 and the second throttle antenna 68. The insulating layer 64 and the thin film 66, each of a thickness between 0.005 .mu.m and 0.05 .mu.m, are preferably deposited by PECVD (for the English expression " Plasma Enhanced Chemical Vapor Deposition ") or cathodic sputtering, then etched chemically or plasma to form the insulating arms 62. The metal film 66 is also etched chemically or plasma to form a central portion 114, on which will be formed the fins 70 , 72, 74 and the second antenna 68, and side portions 116, which will be in contact with the thermometric element 78 for its power supply and its reading.

La résistance par carré du film métallique 66 est avantageusement choisie de manière à réaliser une isolation thermique efficace du micropont 56 par rapport au circuit de lecture 84. De préférence, la résistance par carré du film métallique 66 est comprise entre 100 Ω/carré et 500 Ω/carré, car c'est la valeur des résistances d'accès des matériaux utilisés pour améliorer les résistances thermiques (bras du bolomètre). Enfin, le film métallique 66 est connecté au circuit de lecture 84 par l'intermédiaire des clous d'ancrage conducteurs 58, élaborés au travers de la couche sacrificielles 112 de manière analogue aux connexions 110, et des connexions électriques 110. The square resistance of the metal film 66 is advantageously chosen so as to provide effective thermal insulation of the microbridge 56 with respect to the reading circuit 84. Preferably, the square resistance of the metal film 66 is between 100 Ω / square and 500 Ω / square, because it is the value of the access resistors of the materials used to improve the thermal resistances (bolometer arm). Finally, the metal film 66 is connected to the reading circuit 84 by means of the conductive anchoring nails 58, produced through the sacrificial layer 112 in a similar manner to the connections 110, and electrical connections 110.

La seconde antenne 68 et les ailettes 70, 72, 74 sont quant à elles constituées d'un matériau conducteur comme l'aluminium, le siliciure de tungstène, le titane ou autres. Pour leur formation, une couche du matériau conducteur, d'une épaisseur comprise entre 0,1µm à 0,5µm, est déposée sur la portion centrale 114 du film métallique 66 par pulvérisation cathodique ou par décomposition thermique (LPCVD pour l'expression anglo-saxonne « Low Pressure Chemical Vapor Deposition ») ou la décomposition plasma (PECVD), puis la seconde antenne et les ailettes sont formées par gravure chimique, gravure par plasma ou par une technique du type « lift off » de ladite couche. En variante, l'antenne et les ailettes sont constituées de multicouches métalliques. L'antenne 68 et les ailettes 70, 72, 74 ainsi formées définissent des régions qui convertissent le rayonnement électromagnétique en courant électrique et définissent des zones découvertes du film métallique 66 qui convertissent le courant électrique en énergie thermique.The second antenna 68 and the fins 70, 72, 74 are made of a conductive material such as aluminum, tungsten silicide, titanium or others. For their formation, a layer of the conductive material, with a thickness of between 0.1 .mu.m and 0.5 .mu.m, is deposited on the central portion 114 of the metal film 66 by cathodic sputtering or by thermal decomposition (LPCVD for the English expression. Saxon " Low Pressure Chemical Vapor Deposition ") or plasma decomposition (PECVD), then the second antenna and the fins are formed by chemical etching, plasma etching or by a technique of "lift off" type of said layer. In a variant, the antenna and the fins consist of metal multilayers. The antenna 68 and fins 70, 72, 74 thus formed define regions that convert the electromagnetic radiation into electrical current and define exposed areas of the metal film 66 that convert the electric current into thermal energy.

La seconde antenne 68 et les ailettes 70, 72, 74 sont ensuite recouvertes d'une couche de matériau isolant 76, tel que du SiN, du SiO, du ZnS ou autres. La couche 76, d'une épaisseur comprise entre 0,005µm et 0,1µm, est réalisée afin d'éviter tout court circuit entre les ailettes 70, 72, 74 et l'élément thermométrique 78. La couche 76 est par exemple réalisée à l'aide d'une technique de dépôt basse température telle que la pulvérisation cathodique ou la décomposition plasma (PECVD). La couche 76 est ensuite gravée, par exemple chimiquement ou par plasma, pour faire apparaître les parties latérales 116 du film métallique 66 auxquelles sera connecté l'élément thermométrique 78, ainsi que les bras d'isolation thermique 62. The second antenna 68 and the fins 70, 72, 74 are then covered with a layer of insulating material 76, such as SiN, SiO, ZnS or others. The layer 76, having a thickness of between 0.005 μm and 0.1 μm, is made in order to avoid any short circuit between the fins 70, 72, 74 and the thermometric element 78. The layer 76 is for example made to using a low temperature deposition technique such as sputtering or plasma decomposition (PECVD). The layer 76 is then etched, for example chemically or by plasma, to reveal the lateral portions 116 of the metal film 66 to which the thermometric element 78 will be connected , as well as the heat-insulating arms 62.

L'élément thermométrique 78 est alors déposé sur la couche 76 et les portions latérales 116 à l'aide par exemple d'une technique de dépôt à basse température telle qu'une pulvérisation. Le matériau constitutif de l'élément thermométrique 78 est par exemple un semi-conducteur amorphe ou polycristallin, tel que du Si, du Ge, du SiC, du a-Si :H, du a-SiGe :H, un matériau métallique ou encore un oxyde de vanadium ou un oxyde de magnétite. Ce matériau doit présenter un coefficient en température (TCR pour « temperature coefficient resistance ») non nul. En d'autres termes, il présente une résistance qui varie en fonction de la température.The thermometric element 78 is then deposited on the layer 76 and the side portions 116 using, for example, a low temperature deposition technique such as spraying. The constituent material of the thermometric element 78 is, for example, an amorphous or polycrystalline semiconductor, such as Si, Ge, SiC, a-Si: H, a-SiGe: H, a metallic material or a vanadium oxide or a magnetite oxide. This material must have a non-zero temperature coefficient resistance (TCR). In other words, it has a resistance that varies with temperature.

Enfin, la couche sacrificielle 112 est retirée, la nature de celle-ci déterminant la technique de libération, et de préférence par gravure chimique ou par plasma.Finally, the sacrificial layer 112 is removed, the nature of which determines the release technique, and preferably by chemical etching or plasma.

Comme on peut le constater, la gravure des matériaux constitutifs du détecteur selon l'invention est réalisée majoritairement ou exclusivement, par des techniques d'attaque chimique, éventuellement assistées par plasma, ces techniques permettant d'obtenir des gravures précises et reproductibles.As can be seen, the etching of the constituent materials of the detector according to the invention is carried out predominantly or exclusively, by etching techniques, possibly assisted by plasma, these techniques for obtaining accurate and reproducible etchings.

Lorsque la première antenne papillon 54 est située au dessus du micropont 56, une couche sacrificielle 130 (figure 13) est déposée sur l'ensemble du micropont 56 et de la première couche sacrificielle 112 utilisée pour élaborer celui-ci. Les couches sacrificielles 112, 130 sont alors gravées afin de réaliser les supports 92 de l'antenne 54. Les supports 92 peuvent par exemple être constitués d'un matériau différent de celui de l'antenne 54, comme par exemple un matériau isolant déposés par décomposition thermique (LPCVD). Enfin l'antenne papillon 54 est formée par dépôt puis gravure d'une couche conductrice, comme cela a été décrit précédemment, puis les couches sacrificielles éliminées.When the first butterfly antenna 54 is located above the microbond 56, a sacrificial layer 130 ( figure 13 ) is deposited on the entire microbridge 56 and the first sacrificial layer 112 used to develop it. The sacrificial layers 112, 130 are then etched to produce the supports 92 of the antenna 54. The supports 92 may for example be made of a material different from that of the antenna 54, for example an insulating material deposited by thermal decomposition (LPCVD). Finally, the butterfly antenna 54 is formed by deposition and etching of a conductive layer, as described above, and the sacrificial layers removed.

Grâce à l'invention, il est ainsi obtenu :

  • ■ un découplage des antennes papillons qui ne sont plus sur le même plan et ne sont plus déposées sur un même support ;
  • ■ une adaptation d'impédance optimale grâce aux ailettes, l'adaptation d'impédance étant en outre réalisée de manière indépendante pour chacune des antennes ;
  • ■ une surface de la charge résistive très faible, réduisant ainsi le couplage du détecteur avec le rayonnement infrarouge qui est en première approximation proportionnel à la surface de charge.
Thanks to the invention, it is thus obtained:
  • Decoupling of the butterfly antennas which are no longer on the same plane and are no longer deposited on the same support;
  • ■ Optimum impedance matching thanks to the fins, the impedance matching being furthermore performed independently for each of the antennas;
  • ■ a very low resistive load surface, thus reducing the coupling of the detector with the infrared radiation which is in first approximation proportional to the load surface.

Claims (7)

  1. A bolometric detector for detecting electromagnetic radiation in the region extending from infrared to terahertz frequencies, comprising:
    ■ a first and a second crossed bow-tie antenna (54, 68) intended to collect electromagnetic radiation;
    ■ a resistive load (66) coupled to said antennas (54, 68) in order to convert the collected electromagnetic power into calorific power;
    ■ a bolometric micro bridge structure (56) suspended above substrate (52) by support and thermal isolation arms (62) with the micro bridge comprising:
    o the resistive load (66);
    o a thermometric element (78) coupled to resistive load (66) so that its temperature can rise due to the effect of the calorific power produced ;
    characterized in that first antenna (54) is located outside the micro bridge (56) and is capacitively coupled with resistive load (66) and in that second antenna (68) is located in micro bridge (56) and is resistively coupled with the resistive load (66).
  2. The bolometric detector as claimed in claim 1, characterized in that the resistive load comprises metal film (66) and in that micro bridge (56) comprises winglets (70, 72, 74) arranged facing first antenna (54) on metal film (66) so as to obtain impedance matching between first antenna (54) and metal film (66).
  3. The bolometric detector as claimed in claim 2, characterized in that winglets (70, 72, 74) are covered in an electrically insulating material (76), thermometric element (78) being placed at least partially on said insulator (76) and being at least partially in contact with metal film (66).
  4. The bolometric detector as claimed in claim 1, 2 or 3, characterized in that the resistive load comprises metal film (66) and in that second antenna (68) is placed at least partially on this metal film (66).
  5. The bolometric detector as claimed in any of the above claims, characterized in that first antenna (54) is placed on substrate (52).
  6. The bolometric detector as claimed in any of claims 1 to 3, characterized in that first antenna (54) is formed at least partially above the micro bridge (56).
  7. An array detector device for detecting electromagnetic radiation in the region extending from infrared to terahertz frequencies, characterized in that it comprises a one or two dimensional array of bolometric detectors in accordance with any of the above claims.
EP10305323A 2009-04-30 2010-03-30 Bolometric detector of electromagnetic radiation from the infrared to the terahertz spectral domain and detector array device comprising said detectors. Active EP2246677B1 (en)

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FR0952862A FR2945119B1 (en) 2009-04-30 2009-04-30 BOLOMETRIC DETECTOR OF ELECTROMAGNETIC RADIATION IN THE DOMAIN OF TERAHERTZ AND MATRIX DETECTION DEVICE COMPRISING SUCH DETECTORS

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US8373123B2 (en) 2013-02-12
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JP5684487B2 (en) 2015-03-11
EP2246677A1 (en) 2010-11-03

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