EP2013897A4 - Byproduct collecting apparatus of semiconductor apparatus - Google Patents

Byproduct collecting apparatus of semiconductor apparatus

Info

Publication number
EP2013897A4
EP2013897A4 EP07746169A EP07746169A EP2013897A4 EP 2013897 A4 EP2013897 A4 EP 2013897A4 EP 07746169 A EP07746169 A EP 07746169A EP 07746169 A EP07746169 A EP 07746169A EP 2013897 A4 EP2013897 A4 EP 2013897A4
Authority
EP
European Patent Office
Prior art keywords
semiconductor
byproduct collecting
byproduct
collecting apparatus
semiconductor apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP07746169A
Other languages
German (de)
French (fr)
Other versions
EP2013897A1 (en
Inventor
Che-Hoo Cho
Jung-Eui Hong
Tae-Woo Kim
In-Mun Hwang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Milaebo Co Ltd
Original Assignee
Milaebo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020060040700A external-priority patent/KR100676927B1/en
Priority claimed from KR1020060041531A external-priority patent/KR100647725B1/en
Application filed by Milaebo Co Ltd filed Critical Milaebo Co Ltd
Publication of EP2013897A1 publication Critical patent/EP2013897A1/en
Publication of EP2013897A4 publication Critical patent/EP2013897A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S55/00—Gas separation
    • Y10S55/15—Cold traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treating Waste Gases (AREA)
  • Separating Particles In Gases By Inertia (AREA)
  • Drying Of Semiconductors (AREA)
EP07746169A 2006-05-04 2007-04-25 Byproduct collecting apparatus of semiconductor apparatus Withdrawn EP2013897A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020060040700A KR100676927B1 (en) 2006-05-04 2006-05-04 Apparatus for caching products in semiconductor apparatus
KR1020060041531A KR100647725B1 (en) 2006-05-09 2006-05-09 Apparatus for caching by-products in semiconductor apparatus
PCT/KR2007/002008 WO2007129820A1 (en) 2006-05-04 2007-04-25 Byproduct collecting apparatus of semiconductor apparatus

Publications (2)

Publication Number Publication Date
EP2013897A1 EP2013897A1 (en) 2009-01-14
EP2013897A4 true EP2013897A4 (en) 2012-07-25

Family

ID=38667899

Family Applications (1)

Application Number Title Priority Date Filing Date
EP07746169A Withdrawn EP2013897A4 (en) 2006-05-04 2007-04-25 Byproduct collecting apparatus of semiconductor apparatus

Country Status (5)

Country Link
US (1) US7988755B2 (en)
EP (1) EP2013897A4 (en)
JP (1) JP2009535194A (en)
TW (1) TWI337551B (en)
WO (1) WO2007129820A1 (en)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011103788A1 (en) * 2011-06-01 2012-12-06 Leybold Optics Gmbh Device for surface treatment with a process steam
US9057388B2 (en) 2012-03-21 2015-06-16 International Business Machines Corporation Vacuum trap
JP6007715B2 (en) * 2012-03-29 2016-10-12 東京エレクトロン株式会社 Trap mechanism, exhaust system, and film forming apparatus
US20140190354A1 (en) * 2013-01-04 2014-07-10 Cheng Uei Precision Industry Co., Ltd. Debinder trap
US8999028B2 (en) * 2013-03-15 2015-04-07 Macronix International Co., Ltd. Apparatus and method for collecting powder generated during film deposition process
DE202015101792U1 (en) * 2015-04-13 2015-04-28 Aixtron Se cold trap
TWI584864B (en) * 2016-03-03 2017-06-01 Mao-Sui Guo Gas recovery and purification method
TWI602610B (en) * 2016-03-03 2017-10-21 Mao-Sui Guo Gas recovery and purification device
JP2019514222A (en) * 2016-04-13 2019-05-30 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Exhaust cooling device
KR101673368B1 (en) * 2016-07-14 2016-11-08 김기혁 cold trap device for reactant of processing gas
KR102036273B1 (en) * 2017-12-27 2019-10-24 주식회사 미래보 Semiconductor process by-product collecting device
US11221182B2 (en) * 2018-07-31 2022-01-11 Applied Materials, Inc. Apparatus with multistaged cooling
KR102154196B1 (en) * 2018-11-27 2020-09-09 주식회사 미래보 Apparatus for collecting by-product of semiconductor manufacturing process
KR102188604B1 (en) * 2019-04-02 2020-12-09 주식회사 미래보 Apparatus for collecting by-product of semiconductor manufacturing process
KR102226528B1 (en) * 2019-08-08 2021-03-11 주식회사 미래보 Apparatus for collecting by-product of semiconductor manufacturing process
KR102209205B1 (en) * 2019-08-21 2021-02-01 주식회사 미래보 Flow path switching type collecting apparatus of by-product for semiconductor manufacturing process
CN112546798B (en) * 2019-09-25 2023-01-13 未来宝株式会社 Semiconductor engineering reaction byproduct collecting device with cooling flow path
TWI721594B (en) * 2019-10-09 2021-03-11 南韓商未來寶股份有限公司 Apparatus for collecting by-product having cooling line of semiconductor manufacturing process
JP6928052B2 (en) * 2019-10-11 2021-09-01 ミラエボ カンパニー リミテッド Reaction by-product collector for semiconductor processes with cooling channels
JP6804611B1 (en) * 2019-10-11 2020-12-23 ミラエボ カンパニー リミテッド Reaction by-product collector for semiconductor processes with cooling channels
US11462422B2 (en) * 2019-10-30 2022-10-04 Milaebo Co., Ltd. Apparatus having cooling line for collecting by-product in semiconductor manufacturing process
KR102274459B1 (en) 2019-12-27 2021-07-07 한국기계연구원 Plasma cleaning apparatus and semiconductor process equipment with the same
KR20220063799A (en) * 2020-11-09 2022-05-18 삼성전자주식회사 Apparatus for collecting by-product and method for collecting by-product
TWI777373B (en) * 2021-01-18 2022-09-11 南韓商贊解股份有限公司 Cobalt-carbon gas trapping device and method thereof
CN114797360A (en) * 2021-01-18 2022-07-29 赞解株式会社 Cobalt-carbon gas trapping device
KR102228180B1 (en) 2021-01-21 2021-03-16 주식회사 미래보 Apparatus for trapping reaction by-product of organic-film deposition process
KR102311939B1 (en) * 2021-04-28 2021-10-13 주식회사 미래보 Apparatus for multi trapping of reaction by-product for semiconductor process
KR102508977B1 (en) * 2021-06-24 2023-03-14 주식회사 미래보 Apparatus for trapping of reaction by-product for etching process
KR20230130785A (en) * 2022-03-04 2023-09-12 주식회사 미래보 Apparatus for trapping of reaction by-product capable of expanding the area for collection by inducing gas flow
KR102439402B1 (en) 2022-03-29 2022-09-02 주식회사 미래보 Apparatus for trapping of reaction by-product with extended available collection area

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000334235A (en) * 1999-06-01 2000-12-05 Nippon Edowards Kk Trapping device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5453674A (en) * 1977-10-07 1979-04-27 Hitachi Ltd Cold trap
JP3547799B2 (en) 1994-07-19 2004-07-28 富士通株式会社 Cold trap and semiconductor device manufacturing apparatus
JPH09225230A (en) * 1996-02-20 1997-09-02 Kokusai Electric Co Ltd Cooling and collecting device and semiconductor producing device
JP3871429B2 (en) * 1998-02-17 2007-01-24 Ｂｏｃエドワーズ株式会社 Exhaust system
TW363205B (en) 1998-03-02 1999-07-01 Vanguard Int Semiconduct Corp Changeable disposal apparatus for purifier of semiconductor gas-cleaning facilities
JP2000114185A (en) * 1998-10-05 2000-04-21 Mitsubishi Electric Corp Trapping apparatus for unreacted sublimation gas, and its cleaning method
KR100435585B1 (en) * 2001-08-22 2004-06-10 주식회사 두레엔지니어링 Exhaust gas processing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000334235A (en) * 1999-06-01 2000-12-05 Nippon Edowards Kk Trapping device

Also Published As

Publication number Publication date
TWI337551B (en) 2011-02-21
WO2007129820A1 (en) 2007-11-15
TW200800364A (en) 2008-01-01
JP2009535194A (en) 2009-10-01
US20090107091A1 (en) 2009-04-30
EP2013897A1 (en) 2009-01-14
US7988755B2 (en) 2011-08-02

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Effective date: 20120621

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