EP1967363A2 - Dispositif de sérigraphie et son procédé de fabrication - Google Patents
Dispositif de sérigraphie et son procédé de fabrication Download PDFInfo
- Publication number
- EP1967363A2 EP1967363A2 EP07023414A EP07023414A EP1967363A2 EP 1967363 A2 EP1967363 A2 EP 1967363A2 EP 07023414 A EP07023414 A EP 07023414A EP 07023414 A EP07023414 A EP 07023414A EP 1967363 A2 EP1967363 A2 EP 1967363A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- coating
- fabric
- screen printing
- stencil
- template
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007650 screen-printing Methods 0.000 title claims abstract description 49
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 238000000034 method Methods 0.000 title claims description 24
- 239000004744 fabric Substances 0.000 claims abstract description 57
- 238000000576 coating method Methods 0.000 claims abstract description 45
- 239000011248 coating agent Substances 0.000 claims abstract description 43
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims abstract description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 claims abstract description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 5
- 150000001722 carbon compounds Chemical class 0.000 claims abstract description 5
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 239000013078 crystal Substances 0.000 claims abstract description 5
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 5
- 239000011737 fluorine Substances 0.000 claims abstract description 5
- 239000002210 silicon-based material Substances 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 8
- 230000002209 hydrophobic effect Effects 0.000 claims description 4
- -1 polytetrafluoroethylene Polymers 0.000 abstract description 2
- 239000004753 textile Substances 0.000 abstract description 2
- 238000012216 screening Methods 0.000 abstract 2
- 238000007639 printing Methods 0.000 description 22
- 230000008569 process Effects 0.000 description 14
- 238000005516 engineering process Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 238000005253 cladding Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 235000019589 hardness Nutrition 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- 206010063493 Premature ageing Diseases 0.000 description 1
- 208000032038 Premature aging Diseases 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F15/00—Screen printers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/24—Stencils; Stencil materials; Carriers therefor
- B41N1/247—Meshes, gauzes, woven or similar screen materials; Preparation thereof, e.g. by plasma treatment
Definitions
- the present invention relates to a screen printing device with a fabric and arranged in the fabric template in the form of a photolithographically structured emulsion.
- the invention further relates to a method for producing such a screen printing device.
- Screen printing is a printing process in which an ink or print paste is printed through a fine mesh fabric onto the material to be printed with a knife-like tool, the rubber squeegee. Screen printing is therefore also referred to as a through-printing process.
- the mesh apertures of the fabric are impermeable to the ink or printing paste by a stencil (e.g., photolithographically structured emulsion) disposed on the fabric.
- LTCC Low Temperature Cofired Ceramics
- vias involve represents.
- the circuit elements are screen printed on the green sheets of the later ceramic support, which are then stacked and sintered.
- thin-film process is itself a costly process.
- thin-film structures can only be realized coplanar on the substrate surface. The use of multi-layer technology with fine-line structures could bring a significant cost reduction compared to thin-film technology and also offer the advantage of using several levels, including for screen layers.
- the screen frames are usually made of aluminum and are covered with a steel mesh, which can be achieved during the printing process elastic deflection of the screen.
- An elastic deflection of the screen during the printing process is required for the so-called bounce, d. H. for the realizable between tissue and substrate to be printed distance. For example, too little jump may lead to cloud formation in the print, since the fabric behind the squeegee does not immediately detach from the printed paste film - it remains "stuck" in the printed paste.
- Too much bounce on the other hand, increases tissue tension which, on the one hand, leads to exceeding the elastic yield strength of the tissue and thus leading to premature aging of the fabric and, on the other, impure printouts due to paste spatters, so that the template edge can no longer draw a clean print image ,
- the wire thickness of the fabrics used today is approximately between 30 micrometers and 16 micrometers.
- the permeability of the fabric is described by its mesh size, which is indicated by the so-called mesh number.
- 325 mesh means that there are 325 stitches per square inch (square inches).
- the stencil is often made as a direct stencil by a photographic process.
- the fabric is coated with photosensitive polymers, which with be exposed to the desired structures. Subsequently, the exposed structures are developed and the unexposed areas are washed out.
- the fabric, stencil (emulsion) and printing frame together form the screen printing screen.
- the printing paste is applied to the screen and distributed evenly on the structured screen by means of a so-called flood doctor blade. Subsequently, the actual printing takes place, wherein the squeegee is pulled over the wire with a suitably adjusted hardness.
- the screen is in this printing at a certain distance from the substrate to be printed, for example, an LTCC film.
- the screen is pressed by means of the printing doctor down elastically in the direction of the substrate to be printed.
- a shear of the printing paste which reduces its viscosity due to their thixotropic property during the shear and thereby can be pressed through the openings of the screen printing screen. After completion of the shear stress, the printing paste again has the initial viscosity.
- d. H If smaller resolutions of the printed structures (fine-line structures) are to be achieved, d. H. For example, if the resolution is less than 50 microns or even less than 30 microns, there is a problem that the fabric and the template must have correspondingly fine structures with small openings and these fine structures and small openings in the template and the fabric through the flow of colors or pastes inhibit the screen printing screen.
- the plastic filaments of the fabric are coated with a vapor-deposited or sputtered cladding layer, which in turn is covered by a metal coating which bears the emulsion of the stencil and which has been produced by electroplating.
- the cladding layer is produced by a sputtering or sputtering process with a layer thickness of about 5 nanometers to over 200 nanometers.
- the application of the cladding layer by means of electrodeposition. For example, a copper or nickel layer is applied.
- the metallised plastic fabric results in a highly reproducible stencil quality with excellent edge definition and exact ink dosage, as it ensures minimum elongation with sufficient basic strength.
- that solves Tissue known from this document does not address the above problem, especially as it relates to a plastic fabric and not to a steel fabric used for printing circuit elements.
- this is in the document DE 197 38 873 A1 specified production method for a screen printing device very expensive and costly.
- the publication DE 10 2004 055 113 A1 discloses a method of hydrophilizing screen-printed stencil media which substantially improves the wetting of the stencil stencil sheet with stencil material.
- the screen printing stencil carrier ie the screen printing fabric
- this is provided with very finely divided oxide particles, such as nanometer particles of metal oxide, for example. Titanium oxide, alumina or zirconium oxide, and a wetting agent.
- a wetting agent for example, a surfactant can be used.
- the hydrophilizing agent may also be employed in the removal of stencil material from the screen-printed fabrics, preferably by adding it to the decoating liquid.
- the screen stencil carrier is not only freed from the stencil material, but at the same time hydrophilized for the next coating process. Consequently, the coating of the screen-printed fabric indicated in this publication does not solve the above-indicated problem of producing finer structures.
- the object of the present invention is therefore to provide a screen printing apparatus which enables the printing of finer structures.
- the object of the present invention is to provide a method for producing a screen printing device, which allows easy and cost-effective the printing of finer structures, in particular for a steel fabric.
- the object is achieved by a screen printing apparatus in which the fabric and / or the stencil has a coating which reduces the adhesion of a screen printing paste or a screen printing ink to the fabric and / or the stencil on the surface.
- the inhibition of the flow or passage of the screen printing paste or the screen printing ink through the fabric stitches or reduces the openings in the template, so that a fabric with a smaller mesh size or a stencil with smaller openings can be used and thereby finer structures can be produced.
- the effect of reduced adhesion of the screen printing paste or the screen printing ink to the fabric or stencil is also referred to as the lotus effect.
- the non-stick coating is achieved particularly simply by means of a nanocrystalline coating, which preferably has crystals with a diameter of less than 10 nanometers, or an amorphous coating.
- a nanocrystalline coating which preferably has crystals with a diameter of less than 10 nanometers, or an amorphous coating.
- Such a coating also has the advantage that it can be applied very thin so that it does not cause any significant additional change in the mesh size or the opening width of the template.
- a carbon compound having a diamond-like structure (DLC) and / or a fluoride and / or a fluorine-based compound, preferably Teflon (polytetrafluoroethylene, PTFE), and / or a silicon-based compound can be used.
- the screen printing device has a coating of a layer thickness between about 100 nm and about a few micrometers.
- these layer thicknesses are sufficiently thick to ensure with a high degree of stability the easier passage of the screen printing ink or the screen printing paste through the fabric stitches or the stencil openings, and on the other hand permit the printing of fine-line structures.
- the coating is designed to be oleophobic in order to suppress sticking / sticking .
- This design of the screen printing device causes a clean distribution of the screen printing paste or the screen printing ink (flooding of the screen) on the Top and a good detachment of the screen printing paste or the screen printing ink after the elimination of the shear applied by the shear forces on the underside of Siebdrucksiebs.
- the above object is also achieved by a method of manufacturing a screen printing apparatus in which the fabric is adhered to the fabric prior to applying the template to the fabric and / or the fabric and the template is applied to the fabric after application of the template to the fabric a screen printing paste or a screen printing ink to the fabric or stencil-reducing coating is provided.
- the inventive method causes very simple and inexpensive, the tissue can be used with smaller mesh size or templates with smaller openings and thereby allows the pressure of finer structures.
- the method according to the invention involves only a single additional coating step for this purpose.
- the known method for producing a screen printing device is thereby not significantly more expensive or complicated.
- a particularly simple and cost-effective coating option is given by a coating which is nanocrystalline, preferably with a crystal diameter of less than 10 nanometers, or amorphous.
- a coating of a layer thickness of between about 100 nm and about a few micrometers is produced. As already indicated above, these layer thicknesses allow the printing of fine-line structures with a high resistance.
- an inexpensive coating can be achieved by a coating material which contains a carbon compound with a diamond-like structure (DLC) and / or a fluoride and / or a fluorine-based compound, preferably PTFE, and / or a silicon-based compound. Further improvement of the coating properties can be achieved by placing the fabric and / or the stencil on top with an oleophilic (lipophilic / hydrophobic / hydrophobic) coating and / or on the underside of the fabric and / or the stencil and or the interstices of the fabric and / or the template are provided with an oleophobic coating.
- DLC diamond-like structure
- the steel mesh of a screen printing device is coated after a plasma cleaning step by means of a plasma CVD process either with a silicone-like amorphous surface with about 100 nm layer thickness or with a DLC (Diamond Like Carbon) layer of 1 .mu.m (for example, trade name CARBOCER ® from PLASMA ELECTRONIC GmbH).
- the DLC coating is significantly harder than the silicone-type, whereas the latter can be applied at lower process temperatures.
- the coating of the fabric takes place at a temperature of about 80 ° C or correspondingly lower.
- the template is applied to the fabric.
- the stencil can be provided with this coating. The sequence depends on the material of the stencil and its heat resistance.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Textile Engineering (AREA)
- Mechanical Engineering (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Coloring (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007010936A DE102007010936A1 (de) | 2007-03-07 | 2007-03-07 | Siebdruckvorrichtung und Verfahren zur Herstellung derselben |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1967363A2 true EP1967363A2 (fr) | 2008-09-10 |
EP1967363A3 EP1967363A3 (fr) | 2010-11-03 |
EP1967363B1 EP1967363B1 (fr) | 2018-03-07 |
Family
ID=39530384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP07023414.1A Active EP1967363B1 (fr) | 2007-03-07 | 2007-12-04 | Dispositif de sérigraphie et son procédé de fabrication |
Country Status (5)
Country | Link |
---|---|
US (1) | US8122825B2 (fr) |
EP (1) | EP1967363B1 (fr) |
DE (1) | DE102007010936A1 (fr) |
HU (1) | HUE037624T2 (fr) |
LT (1) | LT1967363T (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103192594A (zh) * | 2012-01-06 | 2013-07-10 | 昆山允升吉光电科技有限公司 | 一种太阳能复合网版 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011083733A1 (de) | 2011-09-29 | 2013-04-04 | Siemens Aktiengesellschaft | Siebdruckschablone und Verfahren zum Beschichten von Siebdruckschablonen |
CN102615932B (zh) * | 2012-04-06 | 2013-12-11 | 深圳光韵达光电科技股份有限公司 | 一种金属印刷模板及其制造方法以及其使用的涂层溶液 |
JP6067846B2 (ja) * | 2013-05-20 | 2017-01-25 | 太陽誘電ケミカルテクノロジー株式会社 | 濡れ性を良くする表面改質処理がなされた構造体及び印刷用孔版、これらを製造する方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19738873A1 (de) | 1996-09-13 | 1998-04-16 | Sefar Ag | Siebdruckform und Vorrichtung dafür |
EP1147887A1 (fr) | 2000-04-19 | 2001-10-24 | Asahi Glass Co., Ltd. | Ecran sérigraphique, procédé pour sa fabrication, et procédé d'impression sérigraphique |
DE102004055113A1 (de) | 2004-11-15 | 2006-05-18 | Kissel & Wolf Gmbh | Verfahren zur Hydrophilierung von Siebdruckschablonenträgern sowie Verfahren zur Entfernung von Schablonenmaterial von einem Siebdruckschablonenträger und Entschichtungsflüssigkeit hierfür |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT30664B (de) | 1906-04-02 | 1907-11-25 | Anton Mattig | Zählwerk. |
US2790726A (en) * | 1953-02-12 | 1957-04-30 | Wilson Arts & Crafts | Silk screen paint materials |
US3008601A (en) * | 1954-12-13 | 1961-11-14 | Collette Gregoire | Polytetrafluoroethylene coated cooking utensils |
US3672934A (en) * | 1970-05-01 | 1972-06-27 | Du Pont | Method of improving line resolution in screen printing |
US4088073A (en) * | 1973-12-27 | 1978-05-09 | Xerox Corporation | Process for preparing ink releasing stencil |
US3951060A (en) * | 1973-12-27 | 1976-04-20 | Xerox Corporation | Process for preparing waterless lithographic masters |
US4718340A (en) * | 1982-08-09 | 1988-01-12 | Milliken Research Corporation | Printing method |
GB9319070D0 (en) * | 1993-09-15 | 1993-11-03 | Ncr Int Inc | Stencil having improved wear-resistance and quality consistency and method of manufacturing the same |
US6669781B2 (en) * | 1997-09-23 | 2003-12-30 | Micron Technology, Inc. | Method and apparatus for improving stencil/screen print quality |
DE10231698A1 (de) * | 2002-03-26 | 2003-10-23 | Fraunhofer Ges Forschung | Verfahren zur Verbesserung des Transfers von Zusatzmaterial mittels einer Schablone auf einen Träger sowie zugehörige Schablone |
US7152530B2 (en) * | 2002-12-19 | 2006-12-26 | Heidelberger Druckmaschinen Ag | Printing form and method for modifying its wetting properties |
DE102005045350B4 (de) | 2005-09-22 | 2009-07-16 | Siemens Ag | Druckschablone eines SMT-Prozesses |
-
2007
- 2007-03-07 DE DE102007010936A patent/DE102007010936A1/de not_active Withdrawn
- 2007-12-04 EP EP07023414.1A patent/EP1967363B1/fr active Active
- 2007-12-04 LT LTEP07023414.1T patent/LT1967363T/lt unknown
- 2007-12-04 HU HUE07023414A patent/HUE037624T2/hu unknown
-
2008
- 2008-03-05 US US12/043,119 patent/US8122825B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19738873A1 (de) | 1996-09-13 | 1998-04-16 | Sefar Ag | Siebdruckform und Vorrichtung dafür |
EP1147887A1 (fr) | 2000-04-19 | 2001-10-24 | Asahi Glass Co., Ltd. | Ecran sérigraphique, procédé pour sa fabrication, et procédé d'impression sérigraphique |
DE102004055113A1 (de) | 2004-11-15 | 2006-05-18 | Kissel & Wolf Gmbh | Verfahren zur Hydrophilierung von Siebdruckschablonenträgern sowie Verfahren zur Entfernung von Schablonenmaterial von einem Siebdruckschablonenträger und Entschichtungsflüssigkeit hierfür |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103192594A (zh) * | 2012-01-06 | 2013-07-10 | 昆山允升吉光电科技有限公司 | 一种太阳能复合网版 |
Also Published As
Publication number | Publication date |
---|---|
EP1967363B1 (fr) | 2018-03-07 |
US8122825B2 (en) | 2012-02-28 |
EP1967363A3 (fr) | 2010-11-03 |
LT1967363T (lt) | 2018-07-10 |
US20080216682A1 (en) | 2008-09-11 |
DE102007010936A1 (de) | 2008-09-11 |
HUE037624T2 (hu) | 2018-09-28 |
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Legal Events
Date | Code | Title | Description |
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