EP1964204A1 - Boitier avec fonction accordable en frequence - Google Patents
Boitier avec fonction accordable en frequenceInfo
- Publication number
- EP1964204A1 EP1964204A1 EP06830197A EP06830197A EP1964204A1 EP 1964204 A1 EP1964204 A1 EP 1964204A1 EP 06830197 A EP06830197 A EP 06830197A EP 06830197 A EP06830197 A EP 06830197A EP 1964204 A1 EP1964204 A1 EP 1964204A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- function
- electronic box
- box according
- membrane
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000012528 membrane Substances 0.000 claims abstract description 26
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 23
- 230000005284 excitation Effects 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 19
- 239000003989 dielectric material Substances 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims description 2
- 230000005684 electric field Effects 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 230000006870 function Effects 0.000 description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000010354 integration Effects 0.000 description 4
- 230000006978 adaptation Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005459 micromachining Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/18—Phase-shifters
Definitions
- the field of the invention is that of electronic components, integrated in micro-machined structures, particularly interesting especially for microwave component applications for which low losses are required.
- Micromachining technology allows the realization of active or passive structures whose dimensions and weight are greatly reduced compared to more conventional technologies, such as printed circuits, while reducing the cost and significantly improving the performance at millimeter frequencies.
- the ability of this technique to integrate functionalities in 3 dimensions makes it possible to increase the integration density of the circuits. It also offers the possibility of integrating, within these micro-machined structures, multi-function systems of high level in a single planar technology. For example, the integration of active components flip-chip or wired is quite possible with this type of technology.
- MEMS Micro Electronic Memory System
- Micro-machined circuits do not require special encapsulation, that is to say that they do not need external housings or supports, since the protection of the circuits is carried out naturally by the shielding of the structures.
- Micro-machining technology makes it possible to etch conductors on a very thin membrane (approximately 10 ⁇ m) and to encapsulate the entire structure in a solid substrate. It can be applied to any type of semiconductor substrate, but the use of silicon makes it possible to reduce the manufacturing costs more significantly, this substrate being widely used in the semiconductor industry.
- modules having micro-machined structures comprising frequency-tunable functions such as that illustrated in FIG. 1 have already been proposed.
- An engraved signal line L s and an associated ground plane PM S are defined on the surface of a substrate 1 and encapsulated in a micromachined structure defined by the substrate and a support 2, typically obtained by machining a silicon part.
- the presence of the mass substrate represents a disadvantage in this type of structure, on the one hand because of the high permittivity of the materials conventionally used as substrate and on the other hand by the non-tunability of their dielectric properties in frequency.
- the present invention proposes a new electronic box comprising a substrate, a frequency-tunable function, a dielectric material with variable permittivity with a electrical excitation in contact with said function and a support secured to the substrate so as to define the housing, characterized in that the substrate comprises a membrane supporting the tunable function, said membrane being between an upper cavity and a lower cavity of the housing, least one cavity being filled with the dielectric material.
- the dielectric material with variable permittivity may comprise a liquid crystal. It may be a homogeneous material or a composite material comprising a polymer and liquid crystal dispersed in the polymer.
- the substrate comprises a first part made of semiconductor material having a locally machined surface, a second part comprising a membrane supported by a semiconductor material having a locally machined surface, said first part and second part being assembled, the machined surfaces facing each other, the lower cavity being defined between these machined surfaces and the membrane.
- the support comprises a third portion of locally machined semiconductor material, the upper cavity being defined between said machined surface and the membrane.
- one or both cavities are filled with at least one material comprising liquid crystal.
- the function can be of filter type, delay line, phase shifter, ...
- the function comprises a signal line and an associated ground plane.
- the lower face of the upper cavity and the upper face of the lower cavity each comprise a ground plane for the signal, to ensure the electromagnetic shielding of the housing with respect to the frequency tunable function.
- ground plane in the present case is relative to the frequency band of the useful signal, the mass for the DC voltages being able to be different.
- the machined surfaces of the semiconductor substrates are metallized to form ground planes.
- the means for frequency tuning the function consist of an electric field applied either between the structure etched on the membrane on the one hand and at least one of the ground planes on the other hand, either between the two ground planes which are in this case isolated from a continuous signal point of view.
- the housing may be silicon, the membrane being made of silica or silicon nitride material or a combination of both, or else benzocyclobutene.
- the function and / or the ground planes are made of metal. It can especially be gold
- the invention also relates to a method of manufacturing an electronic box according to the invention further comprising the following steps:
- the filling of at least one cavity with a fluid material comprising a dielectric material with variable permittivity with electrical excitation.
- the dielectric material may comprise liquid crystal.
- the filling of material comprising liquid crystal is performed by injection.
- the machined surfaces of the first, second and third substrates are metallized.
- FIG. 1 illustrates an example of an electronic box comprising a frequency-tunable function according to the known art
- FIG. 2 illustrates an exemplary housing of the invention, comprising two cavities delimited by a membrane
- FIGS. 3a to 3c illustrate the steps of a method of manufacturing the case according to the invention
- FIGS. 4a and 4b illustrate two examples of addressing of the frequency tunable function
- FIG. 5 illustrates an example of a 3-pole filter produced on the surface of the membrane in a housing according to the invention
- FIG. 6 illustrates the changes in adaptation and transmission as a function of frequency for different values of permittivities adjusted by modification of the DC voltage applied to a liquid crystal used in a housing according to the invention
- the electronic unit proposed in the present invention generally comprises two cavities delimited by a membrane on which is made at least one component, also called a function that is sought to make frequency-tunable, as illustrated in FIG. section of an exemplary housing according to the invention.
- the housing is defined by a first portion or support 11 and a second portion 12 also called substrate, separated by a membrane 13 on which the function is performed, in the case shown a microstrip line Ls.
- Two upper and lower cavities 14 and 14 are thus defined on either side of the membrane 13. At least one of these two cavities is filled with dielectric material with permittivity tunable in frequency, advantageously the 2 can be, as represented in the present case by hatching relative to the dielectric material.
- the structure thus produced comprises three levels of ground plane: PMs, PM 11 and PM 12 .
- a first silicon Si substrate is used, on which a mask is made by photolithography so as to define a zone intended for etching. After etching, the entire surface is metallized, the machined substrate is obtained as shown in FIG. 3a and comprising the ground plane PMn
- a second substrate S 2 is used corresponding to a silicon substrate covered with an oxide layer on the upper face, as represented in FIG. 3b.
- oxide In place of oxide, other materials may be used as mentioned above for the membrane.
- This part is machined on the lower face until etching stops on the oxide layer thus forming the membrane intended to receive the tunable function.
- a microstrip line Ls intended to constitute the frequency-tunable function and an associated ground plane PMs is deposited on the upper oxide layer, and another metallization PM 2O -
- a third silicon substrate S 3 machined and covered with a metal layer illustrated in FIG. 3c is used so as to produce a substrate similar to that illustrated in FIG. 3a and comprising the ground plane PM 21 .
- the three substrates Si, S 2 and S 3 are then assembled by brazing, gluing or thermo-compression. This defines the case with its two cavities and its ground planes allowing the shielding: PM 11 and PM 12 defined by the metallizations PM 20 and PM 21
- filling is carried out by a fluid liquid crystal material. This filling operation can be performed by injection using openings in the cover and which allow the passage of hyper-frequency access to connect the frequency tunable function.
- FIG. 4a illustrates a configuration in which an RF radio-frequency voltage and a DC voltage Vdc are applied to the structure etched on the membrane at the microstrip line Ls.
- FIG. 4b illustrates another possible configuration in which the control DC voltage of the liquid crystal is applied between the ground plane elements PMn and PMi 2 surrounding the microstrip line.
- Example of embodiment of the housing according to the invention comprising a 3-pole filter and two cavities filled with liquid crystal
- the function is a 3-pole filter as illustrated in FIG. 5 which illustrates a view from above showing the constituent metallizations of the Li and L 2 output lines, Ri, R resonators. 2 and R 3 , associated signal ground planes PM S.
- Other functions such as delay lines, phase shifters or the like can also be realized.
- the cavities are filled with the commercial nematic liquid crystal K15 from Merck whose relative permittivity can vary between 2.9 and 3.1.
- the performances illustrated in FIG. 6 are obtained, corresponding to the evolution of the adaptation (downward curves) and of the transmission (upward curves) as a function of the operating frequency for different permittivities.
- the permittivity is adjusted by changing the DC voltage applied.
- the relative variation of the central frequency obtained is equal to - ⁇ e 12 / ⁇ ,, ie here 1 GHz to 30 GHz. And as shown by the curves in Figure 6, the level of adaptation, around -3OdB, is perfectly preserved.
- the performance in terms of amplitude of variation in operating frequency of the 3-pole filter in a case according to the known art and according to the invention were compared.
- FIG. 1 Housing with a structure of the prior art as illustrated in FIG. 1 comprising an alumina substrate and a cavity filled with the liquid crystal K15:
- FIG. 1 Housing with a structure of the prior art as illustrated in FIG. 1 comprising a substrate made of polymeric material RO 4003 and a cavity filled with the liquid crystal K15: Relative variation of the central frequency: 1.6%
- FIG. 2 Housing with a structure of the invention as illustrated in FIG. 2 comprising a cavity filled with air and a cavity filled with the liquid crystal K15:
Landscapes
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0513122A FR2895390A1 (fr) | 2005-12-22 | 2005-12-22 | Boitier avec fonction accordable en frequence |
| PCT/EP2006/069069 WO2007071533A1 (fr) | 2005-12-22 | 2006-11-29 | Boitier avec fonction accordable en frequence |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1964204A1 true EP1964204A1 (fr) | 2008-09-03 |
| EP1964204B1 EP1964204B1 (fr) | 2012-06-13 |
Family
ID=37056500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP06830197A Not-in-force EP1964204B1 (fr) | 2005-12-22 | 2006-11-29 | Boitier avec fonction accordable en frequence |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20100019865A1 (fr) |
| EP (1) | EP1964204B1 (fr) |
| JP (1) | JP4828611B2 (fr) |
| CN (1) | CN101341626A (fr) |
| FR (1) | FR2895390A1 (fr) |
| WO (1) | WO2007071533A1 (fr) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102544740B (zh) * | 2011-09-28 | 2014-03-12 | 深圳光启高等理工研究院 | 一种基于工作频率可调的超材料及其制备方法 |
| US8884725B2 (en) * | 2012-04-19 | 2014-11-11 | Qualcomm Mems Technologies, Inc. | In-plane resonator structures for evanescent-mode electromagnetic-wave cavity resonators |
| US10339592B2 (en) * | 2015-06-17 | 2019-07-02 | Facebook, Inc. | Configuring a virtual store based on information associated with a user by an online system |
| CN108428973B (zh) * | 2018-02-28 | 2022-08-09 | 京东方科技集团股份有限公司 | 移相器及其制作方法、工作方法 |
| CN108511858B (zh) * | 2018-04-13 | 2020-04-14 | 京东方科技集团股份有限公司 | 一种液晶移相器以及电子设备 |
| CN109066021B (zh) * | 2018-07-27 | 2020-10-23 | 合肥工业大学 | 一种反射式液晶移相单元 |
| CN112002971A (zh) * | 2020-09-01 | 2020-11-27 | 苏州诺泰信通讯有限公司 | 一种含有填充介质的滤波器 |
| CN114142191B (zh) * | 2020-09-04 | 2023-04-14 | 京东方科技集团股份有限公司 | 基片集成波导的滤波器、天线装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5934484A (en) * | 1997-04-18 | 1999-08-10 | Beloit Technologies, Inc. | Channeling dam for centrifugal cleaner |
| JP2003218611A (ja) * | 2002-01-22 | 2003-07-31 | Matsushita Electric Ind Co Ltd | 可変分布定数回路 |
| JP4159378B2 (ja) * | 2002-04-25 | 2008-10-01 | 三菱電機株式会社 | 高周波装置とその製造方法 |
| US7755445B2 (en) * | 2004-08-03 | 2010-07-13 | Banpil Photonics, Inc. | Multi-layered high-speed printed circuit boards comprised of stacked dielectric systems |
| US7561006B2 (en) * | 2006-08-25 | 2009-07-14 | Banpil Photonics, Inc. | Low loss electrical delay line |
| EP2160791A1 (fr) * | 2007-06-28 | 2010-03-10 | BAE Systems PLC | Assemblage de circuit hyperfréquence |
-
2005
- 2005-12-22 FR FR0513122A patent/FR2895390A1/fr active Pending
-
2006
- 2006-11-29 WO PCT/EP2006/069069 patent/WO2007071533A1/fr not_active Ceased
- 2006-11-29 EP EP06830197A patent/EP1964204B1/fr not_active Not-in-force
- 2006-11-29 US US12/086,945 patent/US20100019865A1/en not_active Abandoned
- 2006-11-29 CN CNA2006800480430A patent/CN101341626A/zh active Pending
- 2006-11-29 JP JP2008546340A patent/JP4828611B2/ja not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2007071533A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2895390A1 (fr) | 2007-06-29 |
| JP2009521150A (ja) | 2009-05-28 |
| EP1964204B1 (fr) | 2012-06-13 |
| JP4828611B2 (ja) | 2011-11-30 |
| WO2007071533A1 (fr) | 2007-06-28 |
| US20100019865A1 (en) | 2010-01-28 |
| CN101341626A (zh) | 2009-01-07 |
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