EP1922426A1 - Procede de fabrication et d'utilisation d'un demi-produit a base de nickel presentant une texture cubique de recristallisation - Google Patents

Procede de fabrication et d'utilisation d'un demi-produit a base de nickel presentant une texture cubique de recristallisation

Info

Publication number
EP1922426A1
EP1922426A1 EP06725088A EP06725088A EP1922426A1 EP 1922426 A1 EP1922426 A1 EP 1922426A1 EP 06725088 A EP06725088 A EP 06725088A EP 06725088 A EP06725088 A EP 06725088A EP 1922426 A1 EP1922426 A1 EP 1922426A1
Authority
EP
European Patent Office
Prior art keywords
semi
finished product
nickel
producing
strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP06725088A
Other languages
German (de)
English (en)
Other versions
EP1922426B1 (fr
Inventor
Jörg EICKEMEYER
Dietmar Selbmann
Horst Wendrock
Bernhard Holzapfel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leibniz Institut fuer Festkorper und Werkstofforschung Dresden eV
Original Assignee
Leibniz Institut fuer Festkorper und Werkstofforschung Dresden eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leibniz Institut fuer Festkorper und Werkstofforschung Dresden eV filed Critical Leibniz Institut fuer Festkorper und Werkstofforschung Dresden eV
Publication of EP1922426A1 publication Critical patent/EP1922426A1/fr
Application granted granted Critical
Publication of EP1922426B1 publication Critical patent/EP1922426B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • B22F2003/248—Thermal after-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy

Definitions

  • the invention relates to a process for the production of nickel-based semi-finished products in strip or flat wire form with a recrystallization cube texture and the use of the semifinished product produced.
  • the semifinished product can be used in particular as a substrate for physico-chemical coatings with a high degree of microstructural alignment.
  • Such supports are suitable, for example, as substrates for ceramic coatings as used in the field of high temperature superconductivity. In this case, they are used in superconducting magnets, transformers, motors, tomographs or superconducting current paths.
  • Ni alloys with Mo and W (DE 100 05 861 C1). It has also been proposed to add such Ni alloys up to a maximum of 0.3 atom% Ag (DE 103 42 965.4).
  • Recrystallization is formed, have a structure with equiaxed grains, that is, based on the band level, they are about the same length and width.
  • grain extension in the longitudinal direction should be advantageous for current transport in superconductivity and result in higher transmittable currents (Hammerl, H. et al., Eur. Phys. Journal B (2002) 299-301).
  • Recrystallized nickel or its cubic texture alloys have grains which are approximately the same lengthwise in the longitudinal direction as in the transverse direction,
  • Nickel after cold working and recrystallization annealing, tends strongly to form a coarse grain structure, which is detrimental to obtaining the high grade cube texture.
  • Ni-tapes tend in the recrystallization heat treatment, especially at higher temperatures (800 to 115o C 0) strongly to the formation of grain boundaries trenches,
  • Grain boundary trench substrate material is poorly suited as a substrate for epitaxial layer depositions, for example for buffer layers and
  • the semi-finished product should have an elongated grain shape with stable cube texture, and the expanded grain should remain intact even after further thermal treatment at high temperatures for the purpose of oxide layer growth.
  • the method according to the invention is characterized in that initially a starting semi-finished product is produced by fusion metallurgy or powder metallurgy involving mechanical alloying, which consists of technically pure Ni or a Ni alloy, wherein an Ag addition in the microalloying range of at least 10 atomic ppm and a maximum of 1000 atomic ppm is contained.
  • This starting semifinished product is processed by means of a hot forming with subsequent cold working of> 50% thickness reduction to tape or flat wire with an intermediate dimension.
  • the semifinished product is annealed in the temperature range between 500 0 C and 85O 0 C annealed, the higher temperatures are used for the higher Ag contents, and then quenched. Subsequently, this intermediate is highly> 80% cold formed. Finally, a recrystallizing annealing treatment to achieve a complete cube texture is performed.
  • the final recrystallization annealing treatment is carried out depending on the alloy content in the nickel at temperatures of 500 0 C to 1200 0 C, preferably at 85O 0 C.
  • the semifinished product may advantageously be heat treated after or during the recrystallizing annealing for the purpose of growing a cube-textured NiO layer having a texture content of> 90% in an oxidizing atmosphere.
  • Ni alloy is used for the starting semi-finished product, which still contains Mo and / or W as alloying elements in addition to the Ag addition.
  • the formation of a high-grade cube texture is favored.
  • the expanded metal strip allows the growth of a highly cube textured NiO layer, which also has elongated grains.
  • the semifinished product can be used as a substrate for physico-chemical coatings with a high degree of microstructural orientation, in particular for producing wire-shaped or ribbon-shaped high-temperature superconductors.
  • Fig. 1 shows the stretched structure of nickel with 0.01 atom% of silver after hot rolling at 85O 0 C and then cold rolling with a thickness reduction of 85% and a tempering treatment with partial recrystallization at 55O 0 C for 30 min (longitudinal grinding, etched) ,
  • Fig. 2 shows elongated grains on the surface of a 80 micron thick band of nickel with 0.025 atom% of silver, which was subjected to an intermediate annealing at 65O 0 C for 30 minutes at 3 mm thickness, then was strongly cold formed at 80 microns thick and was finally annealed at 55O 0 C for 30 min (scanning electron micrograph).
  • Fig. 3 shows elongated grains with dice layer on the surface of an 80 micron thick band of nickel with 0.025 atom% of silver after a
  • Fig. 4 shows elongated grains with cube layer of nickel oxide on the surface of a 80 micron thick strip of nickel with 0.025 atom% of silver after an intermediate annealing at 65O 0 C over 30 min at 3 mm thickness, followed by strong cold forming at 80 microns thickness, the Texture annealing at 55O 0 C over 30 min and the oxidation in oxygen at
  • Example 1 Technically pure nickel, for example having a purity of 99.9 atomic percent nickel, is poured into a mold while 0.025 atomic percent silver is added. The ingot is rolled at 85O 0 C to the square dimension (22 x 22) mm 2 , homogenizing annealed and quenched. Subsequently, the square material is machined to obtain a defect-free surface for subsequent cold working by rolling. The cold rolling is first carried out with a rolling degree of over 50 percent thickness reduction of 20 mm to 3 mm thickness, in this case, 85% thickness reduction. The subsequent tempering at 65O 0 C for 30 min causes recrystallization with a proportion of elongated grains.
  • Fig. 1 shows a typical microstructure (nickel with 0.01 atomic percent silver). This structure with elongated grains serves as
  • Example 2 Technically pure nickel, for example having a purity of 99.9 atomic percent nickel, is melted by adding 0.01 atomic percent silver in a vacuum induction furnace and poured into a mold. The ingot is rolled at 900 ° C. to the square dimension (22 ⁇ 22) mm 2 , homogenized and quenched. Subsequently, the square material is machined to obtain a defect-free surface for subsequent cold working by rolling. Cold rolling is carried out with a rolling degree of over 50 percent thickness reduction, in this case 85%. The resulting nickel strip has a thickness of 3 mm. It is subsequently annealed min at 65O 0 C for 30 and quenched in water. The recrystallization produces a proportion of elongated grains.
  • the resulting nickel oxide layer has a structure with elongated grains, with a share of the cube layer of 97% (FIG. 4). The proportion of small-angle grain boundaries is 96%. This texture is rotated 45 ° from the texture of the nickel strip.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Conductive Materials (AREA)
  • Metal Rolling (AREA)
  • Powder Metallurgy (AREA)

Abstract

L'invention concerne un procédé de fabrication et d'utilisation d'un demi-produit à base de nickel se présentant sous la forme d'une bande ou d'un fil plat. L'invention vise à mettre en oeuvre un procédé de fabrication d'un demi-produit à base de nickel présentant de meilleures propriétés pour l'utilisation en tant que support de revêtements physico-chimiques à orientation microstructurelle de grande qualité. Ledit demi-produit doit notamment présenter une meilleure forme granulaire à texture cubique stable. A cet effet, un demi-produit de départ est fabriqué par métallurgie de fusion ou métallurgie des poudres par alliage mécanique, ledit demi-produit étant composé de Ni pur ou d'un alliage de Ni contenant un additif de Ag dans le domaine du microalliage d'au moins 10 ppm atomiques et de 1000 ppm atomiques au plus. Ce demi-produit de départ est formé en tant que bande ou fil plat par formage à chaud puis formage à froid avec réduction d'épaisseur > 50 % et mesure intermédiaire. Lors de la mesure intermédiaire, le demi-produit est recuit entre 500 °C et 850 °C de manière à être adouci, les températures supérieures étant employées pour les teneurs élevées en Ag, puis trempé. Le demi-produit est ensuite formé à froid à plus de 80 %. Puis, un traitement de recuit de recristallisation est réalisé de manière à obtenir une texture cubique complète. Le demi-produit selon l'invention sert de support de revêtements physico-chimiques à orientation microstructurelle de grande qualité, et à la fabrication de supraconducteurs haute température en forme de fil ou de bande.
EP06725088.6A 2005-03-16 2006-03-15 Procede de fabrication et d'utilisation d'un demi-produit a base de nickel presentant une texture cubique de recristallisation Not-in-force EP1922426B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005013368A DE102005013368B3 (de) 2005-03-16 2005-03-16 Verfahren zur Herstellung und Verwendung von Halbzeug auf Nickelbasis mit Rekristallisationswürfeltextur
PCT/EP2006/060774 WO2006097501A1 (fr) 2005-03-16 2006-03-15 Procede de fabrication et d'utilisation d'un demi-produit a base de nickel presentant une texture cubique de recristallisation

Publications (2)

Publication Number Publication Date
EP1922426A1 true EP1922426A1 (fr) 2008-05-21
EP1922426B1 EP1922426B1 (fr) 2014-06-11

Family

ID=36089154

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06725088.6A Not-in-force EP1922426B1 (fr) 2005-03-16 2006-03-15 Procede de fabrication et d'utilisation d'un demi-produit a base de nickel presentant une texture cubique de recristallisation

Country Status (7)

Country Link
US (1) US8465605B2 (fr)
EP (1) EP1922426B1 (fr)
JP (1) JP5074375B2 (fr)
KR (1) KR20070112282A (fr)
CN (1) CN100523239C (fr)
DE (1) DE102005013368B3 (fr)
WO (1) WO2006097501A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100400700C (zh) * 2007-03-29 2008-07-09 上海大学 提高690合金材料耐腐蚀性能的工艺方法
JP5330725B2 (ja) * 2008-03-31 2013-10-30 古河電気工業株式会社 超電導線材用基板およびその製造方法
DE102008001005B4 (de) 2008-04-04 2011-06-22 Karlsruher Institut für Technologie, 76131 Verfahren zur Herstellung eines Schichtverbundes mit epitaktisch gewachsenen Schichten aus einem magnetischen Formgedächtnis-Material und Schichtverbund mit epitaktischen Schichten aus einem magnetischen Formgedächtnis-Material sowie dessen Verwendung
DE102010031058A1 (de) * 2010-07-07 2012-01-12 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Metallischer Profildraht mit Rekristallisationswürfeltextur und Verfahren zu dessen Herstellung
KR101804132B1 (ko) 2013-06-07 2017-12-04 파우데엠 메탈스 게엠베하 금속 필름의 제조 방법
EP3004408B1 (fr) 2013-06-07 2017-08-09 VDM Metals International GmbH Procédé de production d'une feuille de métal

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Publication number Priority date Publication date Assignee Title
JPS58177434A (ja) * 1982-04-10 1983-10-18 Tohoku Metal Ind Ltd 耐摩耗性高透磁率磁性合金
US5741377A (en) * 1995-04-10 1998-04-21 Martin Marietta Energy Systems, Inc. Structures having enhanced biaxial texture and method of fabricating same
US5964966A (en) * 1997-09-19 1999-10-12 Lockheed Martin Energy Research Corporation Method of forming biaxially textured alloy substrates and devices thereon
US6458223B1 (en) * 1997-10-01 2002-10-01 American Superconductor Corporation Alloy materials
DK1208244T3 (da) * 1999-04-03 2004-09-20 Leibniz Inst Fuer Festkoerper Metallisk materiale på nikkelbasis og fremgangsmåde til fremstilling deraf
US6617283B2 (en) * 2001-06-22 2003-09-09 Ut-Battelle, Llc Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom
JP2005002408A (ja) * 2003-06-11 2005-01-06 Hitachi Ltd 耐食性皮膜、海水用機器及び耐食性皮膜の形成方法
DE10342965A1 (de) * 2003-09-10 2005-06-02 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Halbzeug auf Nickelbasis mit einer Rekristallisationswürfeltextur und Verfahren zu dessen Herstellung
JP5432863B2 (ja) * 2010-08-25 2014-03-05 住友電気工業株式会社 膜形成用配向基板および超電導線材

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2006097501A1 *

Also Published As

Publication number Publication date
WO2006097501A1 (fr) 2006-09-21
JP5074375B2 (ja) 2012-11-14
KR20070112282A (ko) 2007-11-22
JP2008533301A (ja) 2008-08-21
DE102005013368B3 (de) 2006-04-13
CN100523239C (zh) 2009-08-05
US20090008000A1 (en) 2009-01-08
US8465605B2 (en) 2013-06-18
EP1922426B1 (fr) 2014-06-11
CN101142331A (zh) 2008-03-12

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