EP1903131A2 - System for galvanic deposition of a conducting coating on a non-conducting carrier material - Google Patents

Abstract

The electrical contact application unit (1) is in the form of a roll or cylinder. It applies an electrically conductive layer to a starter (galvanizable) layer on a substrate. The contact unit can be switched between anode and cathode. Contact with the substrate can be made in the contact region (2), which has at least two segments (3a, 3c) through which current can flow independently.

Description

The present invention relates to a contacting unit for the electrodeposition of an electrically conductive layer on a starter layer or galvanisable layer on a substrate, wherein the contacting unit is cathodically and / or anodically switchable. The invention further relates to a galvanizing apparatus and a galvanizing system for electrodepositing a conductive layer on a non-conductive substrate.

Such electroplating or electroplating systems are used for free galvanic deposition of a structured or full-surface layer or activatable substrate made of a non-conductive substrate, for. B. for the production of conductor structures or full-surface conductor layers. For example, antenna coils, printed circuit boards, smart card modules or the like are manufactured with such devices. In a known application, a metal cylinder connected continuously as a cathode is at least partially immersed in an electrolyte bath and rotated. In the electrolyte bath is a Anode assembly. At the slowly rotating cathode, a metal layer is deposited, which is laminated outside of the electrolyte on a film by the metal foil is peeled off from the cathode. After the metal layer has been laminated, a resist is applied, which is then photolithographically exposed. With a subsequent etching step, those areas of the whole-area metal layer are etched away, which are no longer needed for a Leiterzugstrukturierung. After removing the remaining on the patterned metal layer Ätzresistlackes the desired conductor pattern is completed.

This method, on the one hand, has the disadvantage that only low throughput rates can be achieved and high material costs and disposal costs are generated due to the use of toxic and expensive chemicals and of unused raw materials due to the subtractive process. On the other hand, the thickness of the metal layer is limited by the necessary further processing to a certain minimum thickness, so that the resulting resulting arrangement, for example, is not used in the high frequency range, in which just a layer thickness of about 2 microns is desirable. Another disadvantage is that anodic or mechanical cleaning of the cylindrical cathode must be carried out at regular intervals, which further reduces the production and throughput times. Another disadvantage is that only a one-sided metal layer can be deposited on the carrier substrate.

An improved method is used in the DE 102 347 05 A1 described in which the material to be plated is contacted directly in the active Galvanobad by a rotating, for continuous cleaning alternately cathodic / anodic collector roller. The collector roller has individual conductive areas which are separated from each other by insulating areas. The individual conductive regions extend substantially parallel to an axis of rotation of the collector roller. In other words, the electrically conductive regions are electrically insulated from each other in the circumferential direction of the collector roller. By the collector roller, which is both cathodically and anodically switchable, results in a Self-regeneration, so that a system with such collector rollers has no or only small downtime for anodic cleaning.

However, it is disadvantageous in the operation of such a collector roller that no homogeneously thick, electrically conductive layer can be deposited on the substrate over the width of the collector roller.

It is therefore an object of the present invention to provide a contacting unit, a galvanizing device and a galvanization system, which allow an improved production of an electrically conductive layer on a support with a homogeneous layer thickness as possible, regardless of which area of the contacting unit the support is in contact.

These objects are achieved according to the invention with the features of the independent claims. Advantageous embodiments will be apparent from the dependent claims.

A cylindrical or cylindrical contacting unit according to the invention for the electrodeposition of an electrically conductive layer on a starter layer or electroplated layer on a substrate in which the contacting unit is cathodically and / or anodically switchable, and in which an electrical contact region of the contacting unit is rectilinearly parallel a rotation axis between base surfaces of the contacting unit, wherein in the contact region, a contact with the substrate to be plated can be produced when the contacting is arranged in an electrolyte, comprises a contact region having at least two independently electrically contactable / energizable segments.

The invention is based on the finding that in contacting units with widths of more than 30 cm, which have only a single contactable / energizable segment which contacted at the edges of the contacting and galvanic coated carriers have a smaller thickness of the electrodeposited layer, as such carriers, which are contacted in an inner or central portion of the contacting. This circumstance can be counteracted by dividing the over the entire width extending contact region of the contacting, for example, a usable width of 30, 60 or 120 cm, is divided into a plurality of independently contactable / bestrombare segments.

Due to the possibility of contacting and energizing the segments of the contact area differently, the current of the contacting unit in each segment can be set in such a way that an approximately equal current is established across the width of the contacting unit, resulting in a total width of the contacting unit results in the same high electrically conductive layer on the substrate to be plated. For example, segments at the opposite ends of the contacting unit may be operated at a higher current than those segments that are more associated with the interior (center) of the contacting unit. It is thus possible to produce carriers with an applied conductive structure which, regardless of which region of a segment of the contact roller they were in contact, have an equal thickness.

The invention also has the advantage that it allows the different power supply of the segments, not to apply power to some of the segments, so that, for example, a substrate having a substantially smaller width than the contacting unit can be processed within the scope of the invention. As a result, the attachment of electrically conductive particles is prevented at the non-energized segments. For example, the width of the substrate to be plated may be the width of one segment or the width of two adjacent segments or the width of the contacting unit, i. the width of all segments.

In one embodiment of the invention, each of the segments each has at least one conductive region. It can be provided that various of electrically conductive regions of each of the segments are simultaneously cathodically or anodically switchable. It can further be provided that each of the electrically conductive regions of a segment is switchable as a cathode or anode. Since the conductive particles attaching to a cathodically connected electrically conductive region can be used only partially for the galvanic reinforcement of the conductive particles on the substrate, contamination of the electrically conductive regions occurs over time. After each of the electrically conductive areas after the cathodic circuit is switched at least once anodic at a full revolution of the contacting unit, a self-cleaning of the contacting takes place. The auxiliary cathode used here is the substrate to be electroplated. The anodic cleaning of the contacting unit in the hitherto known manner can thus be dispensed with, since each electrically conductive region of a contacting device can be switched both as a cathode and as an anode. The conductive areas of each of the segments are switched cathodically or anodically depending on their position. In particular, different electrically conductive regions are simultaneously cathodically or anodically switchable. Since there is always at least one electrically conductive region per segment, which is in each case connected cathodically or anodically, the electroplating device can run continuously.

The conductive regions are in a further embodiment in the circumferential direction of the contacting electrically isolated from each other. This means that the electrically conductive regions extend from one base surface in the direction of the other base surface of the preferably cylindrical or roller-shaped contacting unit. The electrically conductive regions are preferably spaced apart from each other and designed to extend in a straight line.

In order to enable a continuous operation in the electrodeposition of the electrically conductive layer on the substrate, it is expedient if the contacting unit has a cylindrical or cylindrical shape.

It is also expedient if the contacting unit comprises a hollow base body made of an insulating material, in which at least one rail of an electrically conductive material is embedded, wherein a contact side of the at least one rail forms one of the conductive areas on the surface of the base body. The hollow base body can be assembled in one piece or from several parts. The lateral surface of the main body and the rails embedded therein gives the shape of a circle which is as ideal as possible in order to obtain the most uniform possible contact with the substrate, irrespective of the operating position of the contacting unit and during the rotation. The rails of the electrically conductive material may be embedded in grooves which extend from the outside of the hollow base body in the direction of a central axis. Preferably, the rails embedded in the hollow base body extend parallel to the central axis of the main body or the contacting unit.

The hollow body may be made of a plastic, e.g. an epoxy resin, or a resin. The production can be done by a casting process, which already takes into account the grooves for the rails. Alternatively, the base body can be milled. The grooves for receiving the rails extend over the entire circumference, in order to ensure a continuous deposition of the electrically conductive layer on the substrate.

The electrically conductive regions are formed from an electrically conductive material, which has a lower conductivity than the material to be electrodeposited on the carrier. The embedded in the hollow body rails can be formed for this purpose, at least two parts of different conductive materials. At the contact side of the rail, which is located on the surface of the hollow base body and forms one of the electrically conductive regions, titanium is preferably used. Generally, a material is used on which the electrodeposited material, in particular copper, can not be deposited. The part of the rail which does not come into contact with the substrate to be electroplated can be formed, for example, from copper.

An electrical contacting of the segments or the electrically conductive regions of a segment is expediently carried out in each case at least one current injection point from the interior of the main body. The energization of the contacting unit from the inside of the contacting unit has the advantage that the sealing measures when introducing the contacting unit into a galvanizing device can be made much simpler in comparison with the prior art and a power supply can take place outside the electrolyte bath. For this purpose, the rails have hook-shaped or step-shaped and conductive projections which extend in the direction of the central axis of the hollow main body or of the contacting unit and form the current infeed points. In particular, the contacting of the interior of the contacting unit makes it possible to divide the contacting unit into segments extending along the central axis.

In this case, at least some of the segments or at least some of the electrically conductive regions may have a plurality of current injection points. The number of current injection points can be determined, for example, by the width of a respective segment, which also defines the width of the electrically conductive regions.

Further homogenization of the layer to be deposited on the substrate can be effected by arranging the current injection point or points asymmetrically on a segment or one of the electrically conductive regions. As a result, for example, the power distribution within the rail can be taken into account, in particular evened out.

In particular, it is provided that each of the segments is assigned its own power supply. The current feed of the contacting is expediently arranged outside the electrolyte bath when the contacting is arranged in the electrolyte bath. The power supply of the contacting can according to a further embodiment comprise a contact ring for each segment. Each of the contact rings has a number of contact ring contacts corresponding to the number of conductive regions of the segment, wherein at least one contact ring contact is electrically connected to an electrically conductive region and wherein the contact ring contacts can be supplied with current by means of a sliding contact. The contact ring contacts can be arranged peripherally on the outside of the contacting unit (outside of the electrolyte bath). These may be formed, for example, in the form of metal plates bolted to the contacting unit, which are electrically conductively connected to the conductive rails of the contacting unit. The connection can be made, for example, via cables or metal rails in the interior of the contacting unit.

A galvanizing device according to the invention for depositing an electrically conductive layer on a starter layer or electroplatable layer on a substrate comprises an electrolyte bath in which at least one anode device and at least one contacting unit are arranged. The galvanizing device according to the invention is characterized in that the at least one contacting device is designed as described above. This has the same advantages as already explained above.

In one embodiment, the anode device of the electroplating device has a number of anode sections corresponding to the number of segments. The anode sections may be formed, for example, by a number of baskets. In order to obtain the most uniform possible flow of current through the electrolyte bath from the anode sections to the respective associated segment of the contacting unit, it is expedient if each of the anode sections is contacted electrically independently of one another and can be supplied with current. In the anode sections each anode material is arranged. This may be formed for example in the form of spherical copper. In this projects for electrical contacting a rod-shaped electrode made of a non-soluble, conductive material. The material used is preferably titanium. It is particularly preferred if the rod-shaped electrode and the current feed of the relevant segment or of an electrically conductive region of the segment are arranged asymmetrically with respect to one another, since the result is the best possible uniform deposition of the electrically conductive material on the substrate due to the resulting current path.

It is also expedient if the anode sections consist of a non-conductive material, in particular a plastic. The prior art typically uses a single section of titanium called an anode basket. However, this has a poor controllable current distribution curve in relation to the cathode current. Anode departments made of a non-conductive material have the advantage that they can steer more targeted and uniform in the current distribution curve between the anode and cathode and thus bring a more uniform deposition over the width of the contacting with it.

The anode means may be formed by an anode basket divided by partitions, the partitions being provided with a plurality of apertures to ensure circulation of electrolyte. This ensures a uniform electrolyte distribution in the electrolyte bath, which contributes to a uniform deposition of the conductive layer on the substrate. Alternatively, the anode device may also be formed from a plurality of adjacently arranged anode baskets.

For the supportive cleaning of the contacting unit, a mechanically acting cleaning agent can be provided, which can be brought into mechanical contact with it during a cleaning cycle of the at least one contacting unit. The mechanically acting cleaning agent can be carried out in addition to the anodic cleaning by appropriate polarity of the segment or a conductive region of the segment. In this case, it is preferable for the mechanically acting cleaning agent to be in contact with the electrically conductive area which is just connected anodically. The mechanically acting cleaning agent may be formed, for example, in the form of a cleaning brush, which is in continuous or temporary contact with the contacting unit.

For selectively influencing the electrodeposition on the substrate, a device for determining the working position, in particular the rotational position, of the at least one contacting unit can furthermore be provided in order to adjust the amount of the current with which the electroplating device is operated as a function of the detected working position. For example, it is possible to operate individual conductive regions of a segment during a full rotation of the contacting unit with a different current than the other conductive regions of the segment.

In another embodiment, the plating apparatus is operable to apply greater current to segments near the edge of the electrolyte bath (i.e., segments adjacent the edges of the contacting unit) than segments in a central portion of the contacting unit. This results in a particularly homogeneous deposition of the conductive layer on a starter layer or galvanisable layer on a substrate over the entire width of the contacting.

A galvanizing system according to the invention comprises at least one feeding device which feeds the substrate to at least one galvanizing device and at least one receiving device which receives the galvanized substrate. The plating apparatus is formed as described above. In particular, a galvanizing system according to the invention can have at least two electroplating devices, wherein the electroplating devices can be operated in the same electrolyte bath.

Fig. 1

einen Längsschnitt durch eine erfindungsgemäße Galvanisiervorrichtung mit einer Kontaktiereinheit,

Fig. 2

einen Querschnitt durch die erfindungsgemäße Galvanisiervorrichtung aus Fig. 1 mit einer einzelnen Kontaktiereinheit,

Fig. 3a

eine Draufsicht auf ein erstes Teilstück eines hohlen Grundkörpers einer Kontaktiereinheit,

Fig. 3b

einen Schnitt längs der Linie A-A gemäß Fig. 3a,

Fig. 4a

eine Seitenansicht auf ein weiteres Teilstück des hohlen Grundkörpers einer Kontaktiereinheit,

Fig. 4b

einen Schnitt durch den hohlen Grundkörper aus Fig. 4a gemäß der Linie A-A,

Fig. 5

eine perspektivische Ansicht einer teilweise fertig gestellten Kontaktiereinheit,

Fig. 6

eine Draufsicht sowie einen Schnitt durch eine in der erfindungsgemäßen Kontaktiereinheit eingesetzte elektrisch leitfähige Schiene,

Fig. 7

eine teilweise Ansicht einer erfindungsgemäßen Kontaktiereinheit, wobei ein Kontaktring zur elektrischen Kontaktierung von elektrisch leitfähigen Bereichen der Kontaktiereinheit dargestellt ist,

Fig. 8

eine teilweise Schnittansicht einer in einer Wanne eines Elektrolytbads eingesetzten Kontaktiereinheit, wobei insbesondere die elektrische Kontaktierung des Kontaktrings zu erkennen ist,

Fig. 9

ein Modul mit einer Kontaktiereinheit und einem mit der Kontaktiereinheit in Verbindung stehenden mechanischen Reinigungsmittel im Querschnitt,

Fig. 10

eine teilweise und vergrößerte Schnittansicht der elektrischen Kontaktierung von in der Kontaktiereinheit angeordneten Schienen, und

Fig. 11

eine weitere Ausführungsform einer erfindungsgemäßen Kontaktiereinheit in einer schematischen Darstellung.

The invention will be explained in more detail with reference to FIGS. Show it:

Fig. 1

a longitudinal section through a galvanizing device according to the invention with a contacting unit,

Fig. 2

1 shows a cross section through the galvanizing device according to the invention from FIG. 1 with a single contacting unit;

Fig. 3a

a plan view of a first portion of a hollow body of a contacting,

Fig. 3b

a section along the line AA of FIG. 3a,

Fig. 4a

a side view of another portion of the hollow body of a contacting,

Fig. 4b

a section through the hollow body of Fig. 4a along the line AA,

Fig. 5

a perspective view of a partially finished contacting,

Fig. 6

a top view and a section through an electrically conductive rail used in the contacting unit according to the invention,

Fig. 7

a partial view of a contacting unit according to the invention, wherein a contact ring for electrical contacting of electrically conductive regions of the contacting unit is shown,

Fig. 8

a partial sectional view of a contact unit used in a tub of an electrolyte bath, wherein in particular the electrical contact of the contact ring can be seen,

Fig. 9

a module having a contacting unit and a mechanical cleaning agent in communication with the contacting unit,

Fig. 10

a partial and enlarged sectional view of the electrical contacting of arranged in the contacting unit rails, and

Fig. 11

a further embodiment of a contacting according to the invention in a schematic representation.

1 shows a longitudinal section through a galvanizing device 31 according to the invention. A contacting unit 1 is rotatably mounted in a trough 32 for receiving an electrolyte (so-called electrolyte bath). The contacting unit 1 is rotatably mounted with its one end in the interior of the trough 32 and guided at its other end through a passage opening 34 to the outside. A drive which sets the contacting unit 1 in rotation is not shown in the figure. As can readily be seen from FIG. 1, the contacting unit 1 extends with a contact region 2 arranged at the top in the direction of the sheet, almost over the entire width of the trough 32. In the contact region 2, a mechanical and electrical contact to a substrate to be electroplated can be produced , The contact region 2 is divided by way of example into three separately contactable or energizable segments 3a, 3b and 3c. By way of example, the central segment 3b is approximately twice as wide as the outer segments 3a and 3c. The individual segments 3a, 3b and 3c are separated by an insulation 4, e.g. in the form of an annular part, electrically isolated from each other.

The contacting unit 1 has a cylindrical cross-section in shape, as better apparent from the cross-sectional view of FIG. Since the contacting unit 1 is hollow in the interior, electrical contacting of the individual segments 3a, 3b and 3c takes place from the interior of the contacting unit 1, as hereinafter will be described in more detail. The power supply takes place from outside the tub 32 ago.

Each of the segments 3a, 3b and 3c may comprise only a single electrically conductive region or a plurality of electrically conductive regions. Preferred and illustrated in the embodiments is a variant in which each segment has a plurality of electrically conductive regions, wherein the electrically conductive regions extend substantially parallel to a central or rotational axis of the contacting. The provision of a plurality of electrically conductive regions per segment has the advantage that different of the electrically conductive regions of each of the segments can be switched cathodically or anodically simultaneously. Thereby, a continuous operation of the electroplating apparatus becomes possible, since the electrodeposition of an electrically conductive layer on a starter layer or electroplated layer on a substrate takes place by cathodically switching the region which is in contact with the substrate, and at the same time the anodically connected electrically conductive layer Is cleaned area of it deposited metal particles. Conveniently, the number of electrically conductive regions of each segment is the same. Likewise, the arrangement of the electrically conductive regions per segment is identical.

The structural design of the contacting unit 1 is better seen in FIGS. 3 to 6. The contacting unit 1 comprises a main body 5 of insulating material, for example plastic, which may be constructed in several parts. By way of example, in FIGS. 3a and 4b, a section of the two-part basic body 5 is shown in different views. As can be seen from the cross-sectional view of Fig. 3b and the side view of Fig. 4a, the base body 5 is provided with a number of rectangular grooves 6. In the grooves 6 a trained according to FIG. 6 rail 7 is inserted in each case. If a rail 7 is arranged in each of the grooves 6, then a cylindrical jacket of the contact-making unit results, with electrically conductive surfaces, which are formed by a contact side 8 of the rail 7, alternating with insulating regions of the main body 5 (see FIG ).

The rail 7 is formed at least in two parts and comprises in the exemplary embodiment an outer rail part 9 made of titanium and an inner rail part 10 made of copper. The outer rail part 9 is generally made of a material which has a poorer physical bond to the deposited metal from the electrolysis and thus can easily be detached both chemically and mechanically again. The outer rail part 9 and the inner rail part 10 may be screwed together or, as shown in Fig. 6, be connected to each other in the manner of a dovetail joint. For this purpose, grooves 12 are provided with inclined walls at the bottom of a recess 11 of the rail part 9, engage in the correspondingly formed prongs of the inner rail part 10. The assembly of the two-part rail 7 takes place, as is readily apparent from the figure, prior to insertion into a groove of the base body fifth

For electrical contacting of the rail 7 in the installed state in the main body 5, the rail 7 on the inner rail part 10, which faces the central axis of the base body, a metal part 14 on. This forms a Stromeinspeisepunkt 13 of the rail 7. The metal part 14 is hook-shaped or stepped and has a metal portion 15 as an extension, which is to facilitate the electrical contact in the installed state of the rail 7 in the main body 5 parallel to the central axis of the body and thus extending parallel to the course of the rail.

The length of the rail shown in FIG. 6 is preferably dimensioned such that it corresponds to the length of the assembled sections of the main body according to FIG. 3 a and according to FIG. 4 b. In order to fix the rails 7 introduced into the grooves 6 of the main body 5, a clamping ring 39 introduced from the bases of the main body 5 can be provided. This is shown by way of example in the perspective view of FIG. 5.

The energization of the electrically conductive regions, i. The rails 7, takes place from the interior of the main body 5 of the contacting unit 1, wherein the power supply takes place in the region of a contact ring 16, which comes to lie outside of the trough 32 when the contacting unit 1 is mounted in the trough 32. The structural design of the contact ring 16 and the electrical contacting of the individual rails are better apparent from FIGS. 7 and 8. For clarity, only a single contact ring 16 is shown, which takes over the energization of the rails 7 of a single segment. In principle, a separate contact ring 16 is provided for each segment of the contacting unit 1.

A contact ring 16 includes a number of contact ring contacts 17 formed in the form of metal plates. These are circumferentially connected in each case via a screw 19 or another fastening means with a portion of the base body 5. In addition, in FIG. 7, the bearing of the contacting unit 1 in a bearing section 38 protrudes in a wall of the trough 32. In the process, a sealing lip 25 presses against the wall of the trough from the interior of the wall of the trough 32 in order to achieve a sealing closure.

As can be seen better from the sectional view of FIG. 8, the main body 5 also has a hollow shape in the region of the contact ring 16. The metal plate 17 attached to the main body 5 screw 19 penetrates the base body 5 and further engages in a mounting portion 20 with a extending in the direction of the central axis and the tub extension. With the attachment portion 20 or its extension, an electrical conductor 21, for example a cable or a correspondingly shaped metal rod with the metal part 14 of a rail 7 are connected (shown in Figs. 9 and 10). For feeding an electric current into the contact ring 16 or a rail connected to this, a sliding contact is provided, which is arranged stationary. Reference numeral 22 denotes a first sliding contact, which is switched cathodically during operation of the galvanizing device. The reference numeral 23 denotes a second sliding contact, which is the first sliding contact 22 is opposite and connected anodically in operation of the galvanizing. The remaining contact ring contacts 17, which are currently not in contact with one of the two sliding contacts 22, 23, are thus not subjected to current during the operation of the galvanizing device. According to the arrangement of the sliding contacts 22, 23 to the contact ring 16 of the contactor 1 results in an embodiment that the contact region 2 of the contactor 1 above and the anodically connected segments are located below because a conductive area associated contact ring contact with this is in one axis ,

In addition, various features are shown in FIG. 8, which effect a sealing of the contacting unit made of the tub (in particular reference numeral 24, which identifies a wall).

In the following, reference is again made to FIGS. 1 and 2. The structural design of the contacting unit 1 described is readily apparent from FIG. It can be clearly seen that the base body 5 made of insulating material comprises a multiplicity of rails 7, which extend parallel to an axis of rotation of the contacting unit 1. Also visible are the electrical conductors 21 marked with the reference numeral 21 for the respective electrical contacting of the rails 7. From FIG. 2 it can also be clearly seen that two pressure rollers 36, 37 are provided, which are a substrate to be electroplated in the trough 32 Press 35 in a determined by the arrangement of the pressure rollers 36, 37 circular section of the contacting unit 1. Reference numeral 7k denotes that of the rails 7, which is connected cathodically during the operation of the galvanizing device and forms the contact region 2. For example only, the 180 ° opposite rail (indicated by reference numeral 7a) is anodically connected during operation of the plating apparatus. In principle, several, eg adjacent, of the rails 7 can be connected cathodically or anodically at the same time. Likewise, it is not absolutely necessary that the cathodic and the anodically connected rails 7 are arranged opposite one another in the trough 32.

At the bottom of the tray 32 shown in FIGS. 1 and 2 of the plating device 31 according to the invention, an anode device 27 is provided. As best seen in the illustration of FIG. 1, the anode device 27 has a number of anode sections 28 corresponding to the number of segments. The anode sections 28 are in this case adapted to the width of the respective segments 3a, 3b and 3c. The anode sections 28a, 28b, 28c can be designed as baskets formed separately. It is also conceivable to provide a common anode basket with corresponding partitions for all anode departments. The anode device 27 is preferably made of a non-conductive material. In the exemplary embodiment, the anode device 27 comprises three anode sections 28a, 28b, 28c separated by spacers 29 in the form of baskets. The spacers and the walls of the anode sections are preferably designed such that they can be flowed through well by the electrolyte. In the anode compartments 28a, 28b, 28c are each anode material, e.g. Copper in the form of spheres.

Each of the anode sections 28a, 28b, 28c is contacted separately, wherein the contacting can be formed, for example, by titanium rods (not shown) projecting into the interior of the anode compartment. The number and arrangement of the Kontaktierstäbe is preferably such that they are arranged asymmetrically to the Stromeinspeisepunkten the rails of the respective associated segments 3a, 3b, 3c (not shown in FIGS. 1 and 2). This results in a particularly advantageous current flow during operation of the galvanizing, so that a very uniform and homogeneous electrodeposition results on the substrate. The power supply to the titanium rods can be done for example by below the anode device 27 and out of the electrolyte guided electrical conductor.

The configuration of the contacting unit 1 allows a variety of different modes of operation. So can the cathodically switched rails of the individual Segments are supplied with a same current, whereby an operation is possible, as he, for example, from the DE 102 34 705 A1 is known. Only individual ones of the segments can also be supplied with current, so that, for example, substrates with a smaller width (compared to the width of the contact-making unit 1 or the contact region 2) can be processed. As a result, power losses and in particular the effort to clean the not coming into contact with the substrate sections can be avoided. In particular, however, an operation is provided in which the substrate comes into contact with all of the segments 3a, 3b, 3c of the contacting unit 1, wherein the centrally arranged segment 3b in FIG. 1 is subjected to a lower current than the segments lying on the outer edge 3a and 3c. This makes it possible to deposit a galvanic layer on the substrate, which over the entire width of the contacting unit 1 has a homogeneous and uniform layer thickness.

Furthermore, an operation is possible in which the current depends on the angle of rotation of the contacting unit 1. The angle of rotation can be determined by providing known rotation angle detecting means in the plating apparatus 31 and used as a control amount of the current.

For ease of maintenance, the contacting unit 1 may optionally be designed as a module together with the pressure rollers 36, 37. This is exemplified in Fig. 9. This module as a whole, e.g. be inserted through a corresponding passage opening of a side wall of the trough 32 in the trough 32. In addition, FIG. 9 shows a mechanical cleaning agent 26 in the form of a roller-shaped brush, which assists cleaning of the contact side of the rails 7. The cleaning agent 26 is preferably arranged in the immediate vicinity of the anodically connected rail.

Moreover, the profile of the electrical conductors 21 for the electrical connection of the metal part 14 at the current infeed point goes from the sectional representation of FIG. 9 13 and the contact ring 16. Also clearly visible is the concern of the sealing lip 25 on a wall portion of the module.

In Fig. 10, the detail indicated in Fig. 9 by the reference B is shown enlarged, in particular, the connection of the electrical conductor 21 with the metal portion 15 of the metal part 14 of the Stromeinspeisepunkts 13 goes well. In addition, it can be seen that the base body 5 is constructed in two parts and adjacent to each other in the region of the current feed points 13. Good to see is also the mechanical contact of the trained as a brush cleaning agent 26 with the bottom rail 7 of the contacting unit. 1

11 shows in a schematic representation a further exemplary embodiment of a segmented contacting unit 1. As in the preceding exemplary embodiment, the contacting unit 1 comprises three segments 3a, 3b, 3c. The individual segments are formed as a continuous electrically conductive lateral surfaces or as an insulating base body with a plurality of conductive regions. In this case, two axes 40a, 40c are arranged on the central segment 3b, over which the segments 3a and 3c designed as base bodies are guided. There is provided a mechanism, not shown, which ensures that in a rotational movement all segments 3a, 3b, 3c move uniformly. The individual segments 3a, 3b, 3c are separated by insulation 4 from each other. The electrical contact can be made from the interior of the contacting unit 1, wherein this can be realized in a similar manner, as has been explained in the preceding embodiments.

Claims (25)

Roller or cylindrical contacting unit (1) for the electrodeposition of an electrically conductive layer on a starter layer or electroplated layer on a substrate (5), wherein the contacting unit (1) is cathodically and / or anodically switchable and an electrical contact area of the contacting unit extends in a straight line parallel to an axis of rotation between base surfaces of the contacting, wherein in the contact region (2) contact with the substrate to be galvanized (5) can be produced, when the contacting unit (1) is arranged in an electrolyte bath, characterized in that the contact region ( 2) of the contacting unit (1) has at least two segments (3) which can be electrically contacted / energized independently of each other. Contacting unit according to Claim 1, characterized in that each of the segments (3) has at least one conductive region in each case. Contacting unit according to claim 2, characterized in that different of the electrically conductive regions of each of the segments (3) are simultaneously cathodically or anodically switchable. Contacting unit according to claim 2 or 3, characterized in that each of the electrically conductive regions of a segment (3) is switchable as a cathode or anode. Contacting unit according to one of the preceding claims, characterized in that the conductive regions in the circumferential direction of the contacting unit (1) are electrically isolated from each other. Contacting unit according to one of the preceding claims, characterized in that it comprises a hollow base body (5) made of an insulating material comprises, in the at least one rail (7) made of an electrically conductive material is embedded, wherein a contact side (8) of the at least one rail (7) on the surface of the base body (5) forms one of the conductive regions. Contacting unit according to one of the preceding claims, characterized in that the electrically conductive regions are formed from an electrically conductive material which has a lower electrical conductivity than the material to be electrodeposited on the substrate. Contacting unit according to one of the preceding claims, characterized in that an electrical contacting of the segments (3) or the electrically conductive regions of a segment (3) takes place respectively at least one Stromeinspeisepunkt (13) from the interior of the base body (5) ago. Contacting unit according to Claim 8, characterized in that at least some of the segments (3) or at least some of the electrically conductive regions have a plurality of current injection points (13). Contacting unit according to claim 8 or 9, characterized in that the one or more Stromeinspeisepunkte (13) are arranged asymmetrically on a segment or one of the electrically conductive regions. Contacting unit according to one of the preceding claims, characterized in that each segment is associated with a power supply. Contacting unit according to claim 11, characterized in that the power supply of the contacting unit (1) is arranged outside the electrolyte bath when the contacting unit (1) is arranged in the electrolyte bath. Contacting unit according to claim 11 or 12, characterized in that the power supply of the contacting unit (1) comprises a contact ring (16) for each segment. Contacting unit according to Claim 13, characterized in that each contact ring (16) has a number of contact ring contacts corresponding to the number of conductive regions of the segment (3), wherein at least one contact ring contact (17) is electrically connected to an electrically conductive region, the contact ring contacts (17) can be acted upon by means of a sliding contact with electricity. Electroplating device (31) for the electrodeposition of an electrically conductive layer on a starter layer or electroplated layer on a substrate (5) with an electrolyte bath, in which at least one anode device (27) and at least one contact unit (1) are arranged, characterized in that the at least one contacting unit (1) according to one of the preceding claims is configured. Electroplating apparatus according to Claim 15, characterized in that the anode device (27) has a number of anode sections (28a, 28b, 28c), in particular a number of anode sections (28a, 28b, 28c) corresponding to the number of segments (3). Electroplating apparatus according to claim 16, characterized in that each of the anode sections (28a, 28b, 28c) is contacted electrically independently of one another. Electroplating apparatus according to claim 16 or 17, characterized in that as the anode material in the anode sections (28a, 28b, 28c) copper, in particular in the form of balls, is mounted, in which a rod-shaped electrode made of a non-soluble, conductive material, in particular of titanium protrudes. Electroplating apparatus according to one of claims 14 to 18, characterized in that the anode sections (28a, 28b, 28c) consist of a non-conductive material, in particular a plastic. Electroplating apparatus according to one of Claims 14 to 19, characterized in that the anode device (27) is formed by an anode basket divided by dividing walls, wherein the dividing walls are provided with a multiplicity of openings in order to ensure a circulation of electrolyte. Electroplating apparatus according to one of claims 15 to 20, characterized in that a mechanically acting cleaning agent (26) is provided which can be brought into mechanical contact with the at least one contacting unit (1) during a cleaning cycle. Electroplating apparatus according to one of Claims 15 to 21, characterized in that a device for determining the working position, in particular the rotational position, of the at least one contacting unit (1) is provided, in dependence on the detected working position, of the amount of current with which the electroplating apparatus ( 31). Electroplating apparatus according to one of Claims 15 to 22, characterized in that it can be operated in such a way that a larger current is applied to segments (3) near the edge of the electrolyte bath than segments (3) in the interior of the electrolyte bath. Electroplating system with at least one feed device which feeds the substrate (5) to at least one electroplating device (31) and at least one receiving device, which accommodates the galvanized substrate (5), characterized in that the electroplating device (31) according to one of claims 16 to 24 is formed. Electroplating system according to claim 24, characterized in that it comprises at least two electroplating devices, wherein the electroplating devices (31) are operable in the same electrolyte bath.

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