EP1832340B1 - Process and device for partial surface treatment of a component by low pressure plasma generated in a vacuum chamber - Google Patents

Abstract

The process involves coupling at least one process bell (12) which contains the reaction chamber (16) with the opening of a portable self-sufficient miniaturised ND-plasma reactor (1) movable through a flexible supply line (14) to the vacuum chamber (4) of the reactor and sealingly closing the opening of the reaction chamber through the part of the component surface which is to be treated so that the reaction chamber is evacuated and ionised particles of the process gas can be continuously directed out of the vacuum chamber into the reaction chamber of the process bell by energy excitation through microwaves, radio frequency excitation or other HF excitation. The ionized particles can then be brought to act in the process bell on the part of the component surface which is to be treated. An independent claim is included for the partial treatment of a surface with low pressure plasma having a process bell coupled by a flexible supply line (14) to a vacuum chamber to form a portable self-sufficient miniaturized ND plasma reactor. The opening of the bell is sealed closed through the part of the component surface to be treated and a continuous supply of ionized process gas particles can be fed into reaction chamber of bell to act on the component surface.

Description

The invention relates to a method for partially treating the surface of at least one component with low-pressure plasma, which is to be generated in at least one reactor chamber provided with an opening, wherein the opening of the reactor chamber is closed and the reactor chamber is then evacuated and filled with a process gas, the through Energy input into the reactor chamber in this is ionized to form the low-pressure plasma and brought to act on the part of the component surface to be treated.

The invention furthermore relates to a device for partially treating the surface of a component with low-pressure plasma, which has at least one closable reaction chamber provided with an opening, which is connected to a vacuum pump and a process gas container via lines each having a valve device, from or to the reaction chamber to be evacuated or to be filled with the process gas, and on the outside of a plasma generator is provided by means of which is filled in the evacuated reaction chamber process gas to form the low pressure plasma in the reaction chamber to ionize, so that the ionized process gas to a part to be treated Component surface can act

From the DE 103 32 921 A1 are known a method and an apparatus for treating the surface of components with low-pressure plasma in a filled with process gas, having an opening vacuum chamber, wherein the opening of the vacuum chamber before evacuation and the introduction and the ionization of the process gas by means arranged in the vacuum chamber and at a plasma generator connected electrode is sealed from the part of the component surface to be treated This known Vierfahren For use with large-scale components with reasonable investment costs For this purpose, a device or the vacuum chamber moving device is used, with a relative movement between the component surface and the opening of the vacuum chamber is carried out until the entire surface to be treated of the component has been subjected to a treatment Component during the treatment of the part of the component surface, which closes the opening of the vacuum chamber, is held on a surrounding the opening of the vacuum chamber sealing element because of prevailing in the vacuum chamber vacuum, is before a new relative movement of the component and moving device after the treatment of the part Component surface of the negative pressure in the vacuum chamber to pick up.

The use of a plasma reactor chamber ( EP 0492 511 B1 ; DE 691 13 231 T2 A vacuum seal provided on the wall of the reactor chamber surrounds the opening. In order to generate a plasma within the chamber, an RF electrode provided on the inner surface of the chamber wall is used, the plasma within For a good maneuverability of the reactor chamber, a vacuum pump, an RF generator and a plasma source are arranged in a control console, which are connected via respective supply lines to the reactor chamber, which manually or by means of a Robot can be placed at various points of the component surface for the treatment of the opening of the chamber each occluding part of the component surface Again, however, a reversal of the negative pressure in the reactor chamber prior to their displacement on the component surface is required

In the field of low-temperature plasma technology nowadays, the low-pressure plasma technology taking place under vacuum is used extensively thus always a batch process If an inline integration into a production line is desired, this is only possible with sophisticated lock systems

Also known is a method and an apparatus for partially treating the surface of a component with a low-pressure plasma (US Pat. JP 02 267290A ), wherein the interior of a treatment device is evacuated, a process gas is introduced into the treatment device and ionized by energy input therein to form the low pressure plasma and the ionized process gas is applied to a part of the surface of the device to be positioned at the vacuum treatment device a process bell comprising an opening is movably coupled via a flexible supply line to a chamber under vacuum. The opening of the process bell is sealingly closed by the part of the surface of the component to be treated, whereupon the process bell is evacuated and the ionized particles of the process gas are evacuated from the vacuum chamber With this communicating flexible supply line led into the process bell and brought in this on the treating part of the component surface to act after completion of the treatment of the corresponding part of Bauateiloberf The task is to cancel the evacuation of the process bell before the process bell can be moved to another position of the component surface for its further local treatment, which is relatively time-consuming.

The aim of the invention is therefore a location-flexible time and cost-effective treatment of local areas of component surfaces with low-pressure plasma, in particular for the continuous targeted activation, cleaning and / or coating automotive attachments, wherein a Inhne integration of the local treatment of component surfaces by constantly maintaining the low-pressure plasma of Interest is.

The invention is therefore based on the object to provide a method and apparatus for the partial treatment of the surface of at least one component with low pressure plasma according to the type mentioned above such that the disadvantages of the prior art are overcome and an uninterrupted targeted treatment of at least one Component or simultaneously several local areas of the component is also guaranteed with different desired results while allowing an inlinefähigen local surface treatment

• mindestens ein portabler autarker miniaturisierter offener ND-Plasma-Reaktor verwendet wird,
• wobei die Öffnung der Reaktionskammer vor Aufnahme der Oberflächenbehandlung durch eine in eine Schliessstellung zu bewegende Verschlusseinrichtung dicht verschlossen gehalten wird, worauf
• das Prozessgas in die von der Verschlusseinrichtung verschlossene Reaktionskammern gefüllt und in dieser mittels Mikrowellenanregung ionisiert wird,
• die Verschlusseinrichtung dann in eine die Öffnung der Reaktionskammer freigebende Stellung bewegt wird, in der die Öffnung der Reaktionskammer nunmehr fortgesetzt von dem zu behandelnden Teil der Oberfläche des Bauteils dicht verschlossen gehalten wird und das ionisierte Prozessgas auf dem zu behandelnden Teil der Bauteiloberfläche zur Einwirkung kommt,
• die Verschlusseinrichtung nach erfolgter Behandlung des die Öffnung der Reaktionskammer verschliessenden Teils der Bauteiloberfläche in ihre Schliessstellung zurückbewegt wird und
• dann der miniaturisierte ND-Plasma-Reaktor ohne Abschattung des in der Reaktionskammer erzeugten Niederdruckplasmas zur unmittelbar fortgesetzten partiellen Behandlung der Bauteiloberfläche an anderer Stelle in Position gebracht wird

This object is procedurally achieved according to the invention in that

• at least one portable autarkic miniaturized open ND plasma reactor is used,
• wherein the opening of the reaction chamber is held tightly closed before receiving the surface treatment by a closure device to be moved to a closed position, whereupon
• the process gas is filled into the reaction chambers closed by the closure device and ionized therein by means of microwave excitation,
• the closure device is then moved into a position releasing the opening of the reaction chamber, in which the opening of the reaction chamber is now kept tightly closed by the part of the surface of the component to be treated and the ionized process gas is applied to the part of the component surface to be treated,
• the closure device is moved back into its closed position after treatment of the opening of the reaction chamber closing part of the component surface and
• then the miniaturized LP plasma reactor without shading of the low pressure plasma generated in the reaction chamber for immediate continued partial treatment of the component surface is placed elsewhere in position

The dimensions of the reaction chamber of the miniaturized LP plasma reactor are preferred in terms of their length, width and height in the range of 10 mm to 100 mm or 10 mm to 100 mm or 10 mm to 100 mm and the feed pressure in the reaction chamber of the miniaturized LP plasma reactor in the range of 1 Pa to 1000 Pa selected

The miniaturized LP plasma reactor can be moved robotically, whereby the closure device of the opening of the reaction chamber of the miniaturized LP plasma reactor can also be moved to the closed and the release position in a robot-controlled manner. It is also possible that the miniaturized ND plasma reactor is moved over the surface of the component by means of air cushions before or after closing the opening of the reaction chamber. Furthermore, a plurality of miniaturized ND plasma reactors can be used be moved simultaneously on the surface of the component to their partial treatment.

A portable autarkic miniaturized LP plasma reactor can also be used simultaneously on the opposite surfaces of a relatively thin polyethylene opaque plate for the treatment thereof, wherein air as the carrier medium in the reaction chamber communicating with the vacuum pump and the process gas container of the respective self-sufficient miniaturized portable autonomous The detection is carried out on the one hand by the optical detectability of the plasma boundary through the thin opaque polyethylene plate and on the other hand by the representation of the changed wettability of the treated surface by a test ink. Etching and cleaning processes possible

• mindestens ein autarker portabler miniaturisierter ND-Plasma-Reaktor verfügbar ist, bei dem
• an der Reaktionskammer eine Verschlusseinrichtung vorgesehen ist, die in eine die Reaktionskammer dicht verschliessende Verschlussstellung zu bewegen ist, in der die Reaktionskammer zu evakuieren und mit Prozessgas zu füllen ist,
• der Plasmagenerator ein Mikrowellen- oder Radiofrequenzgenerator ist, von dem das Prozessgas in der von der Verschlusseinrichtung dicht verschlossenen Reaktionskammer zu ionisieren ist, und
• die Verschlusseinrichtung in eine die Öffnung der Reaktionskammer freigebende Stellung zu bewegen ist, in der die Öffnung der Reaktionskammer fortgesetzt durch das zu behandelnde Teil der Bauteiloberfläche dicht verschlossen gehalten und das zu behandelnde Teil zugleich der Wirkung der ionisierten Prozessgasteilchen ausgesetzt ist und
• aus der die Verschlusseinrichtung nach erfolgter Behandlung des die Öffnung dicht verschliessenden Teils der Bauteiloberfläche in die ihrerseits die Reaktionskammer wieder abdichtend verschliessende Stellung zurückzubewegen ist, in der der miniaturisierte ND-Plasma-Reaktor ohne Abschaltung des in der Reaktionskammer erzeugten Niedruckplasmas zur unmittelbar fortgesetzten partiellen Behandlung der Bauteiloberfläche an anderer Stelle in Position zu bringen ist.

The object of the invention is further achieved by the aforementioned device for the partial treatment of the surface of at least one component with low-pressure plasma, which is characterized in that

• at least one self-contained portable miniaturized LP plasma reactor is available, in which
• a closure device is provided on the reaction chamber, which device is to be moved into a closure position sealing the reaction chamber in which the reaction chamber is to be evacuated and filled with process gas,
• the plasma generator is a microwave or radio-frequency generator from which the process gas is to be ionized in the reaction chamber sealed by the closure device, and
• the closure device is to be moved into a position releasing the opening of the reaction chamber in which the opening of the reaction chamber continues to be kept tightly closed by the part of the component surface to be treated and the part to be treated is simultaneously exposed to the action of the ionized process gas particles and
• from which the closure device after treatment of the opening tightly closing part of the component surface in the turn the reaction chamber again sealingly closing position is to be moved back, in which the miniaturized LP plasma reactor without switching off the low pressure plasma generated in the reaction chamber for immediate continued partial treatment Component surface is to be positioned elsewhere.

Advantageous developments of the device according to the invention will become apparent from the claims 11 to 19

The invention enables in an effective and cost-saving manner, the continuous simultaneous treatment of various local areas, in particular automotive attachments for activation, cleaning and / or coating by means of low-pressure plasma. The possibility of maintaining the ND plasma permanently ensures inline-capable local treatment of various component surfaces. The size and configuration of the reaction chamber of the portable, self-sufficient, miniaturized ND plasma reactor is dependent on the size of the part of the component surface to be treated and of the latter Radius of curvature or to select the size of the component. The seals of the reaction chamber of the miniaturized LP plasma reactor are to be adapted to the roughness of the component surface to be treated. Accordingly, the roughness of the component surface must be taken into account when designing the reaction chamber such as the vacuum pump. Advantageously, it turns out that due to the small volume of the reaction chamber of the miniaturized LP plasma reactor, the pumping times are extremely low in comparison to conventional low-pressure plasma.

• Fig. 1 eine schematische Darstellung eine ersten Ausführungsform der erfindungsgemäßen Vorrichtung in Form eines portablen autarken miniaturisierten ND-Plasma-Reaktors bei Positionierung der Verschlußeinrichtung für die Öffnung der Reaktionskammer des miniaturisierten ND-Plasma-Reaktors in der Freigabestellung,
• Fig. 2 eine der in Fig. 1 dargestellten Ausführungsform entsprechende zweite Ausführungsform der Vorrichtung bei Positionierung der Verschlußeinrichtung für die Öffnung der Reaktionskammer des miniaturisierten ND-Plasma-Reaktors in der Freigabestellung, wobei Druckluftdüsen an der Außenwand der Reaktionskammer zur Erzeugung eines Luftkissens vorgesehen sind,
• Fig. 3 eine Darstellung der Ausführungsform gemäß Fig. 2 bei Positionierung der Verschlußeinrichtung für die Öffnung der Reaktionskammer des miniaturisierten ND-Plasma-Reaktors in der Verschlußstellung, wobei der miniaturisierte ND-Plasma-Reaktor in einem Behandlungsort A und in einem Behandlungsort B gezeigt ist, in den der ND-Plasma-Reaktor durch Relativbewegung zur Bauteiloberfläche mittels des Luftkissens versetzt worden ist, und
• Fig. 4 eine der Darstellung nach Fig 1 entsprechende dritte Ausführungsform in Form des portablen autarken miniaturisierten ND-Plasma-Reaktors, jedoch mit zwei Reaktionskammern, die jeweils über eine Vakuumkammer mit der Vakuumpumpe und dem Prozessgasbehälter verbunden sind und mit denen jeweils die einander gegenüberliegenden Oberflächen des in Fig 1 gezeigten plattenförmigen Bauteils zu behandeln sind.

The invention will now be explained with reference to the drawings In these are

• Fig. 1 a schematic representation of a first embodiment of the device according to the invention in the form of a portable autarkic miniaturized LP plasma reactor in positioning the closure device for the opening of the reaction chamber of the miniaturized LP plasma reactor in the release position,
• Fig. 2 one of the in Fig. 1 in a second embodiment of the device according to the second embodiment of the invention when positioning the closure device for the opening of the reaction chamber of the miniaturized LP plasma reactor in the release position, compressed-air nozzles being provided on the outer wall of the reaction chamber for producing an air cushion;
• Fig. 3 a representation of the embodiment according to Fig. 2 positioning the closure means for opening the reaction chamber of the miniaturized LP plasma reactor in the closed position, wherein the miniaturized LP plasma reactor is shown in a treatment location A and in a treatment location B, in which the LP plasma reactor by relative movement has been added to the component surface by means of the air cushion, and
• Fig. 4 one of the representation after Fig. 1 corresponding third embodiment in the form of the portable self-sufficient miniaturized LP plasma reactor, but with two reaction chambers, which are each connected via a vacuum chamber with the vacuum pump and the process gas container and with which in each case the opposing surfaces of the in Fig. 1 to be treated plate-shaped component shown.

Out Fig. 1 is a schematic representation of a first embodiment of the inventive device for partially treating the surface 2 of a component 3 with low-pressure plasma in the form of a portable self-sufficient miniaturized LP plasma reactor 1, which has a provided with an opening 15 reaction chamber 16 at which a closure device 21 is provided in the form of a slide or shutter for the opening 15 of the reaction chamber 16. The closure device 21 is, for example, to move manually or robotically into its opening 15 closing or releasing position. In the closed position of the closure device 21, the reaction chamber 16 is to be evacuated by a vacuum pump 9, which is connected to the reaction chamber 16 via a line 7 having a valve 5. The evacuated reaction chamber 16 is then filled with process gas from a process gas tank 10 via a valve 6 filling line 8, which is connected to the reaction chamber 16. For local treatment of the component surface 2 of the miniaturized ND Plsma reactor I is placed on the part to be treated 19, wherein the opening 15 of the reaction chamber 16 comprehensive seal 20 for a secure seal between the mounted on the component surface 2 end edges 22 of the reaction chamber sixteenth and the part 19 of the component surface 2 to be treated. To treat the part 19 of the component surface 2, the closure means 21 for the opening 15 of the reaction chamber 16 is then moved into its release position, the opening 15 continuing through the part 19 of the component surface 2 to be treated sealed, which then immediately exposed to the action of the low-pressure plasma in the reaction chamber 16 of the miniaturized ND plasma reactor 1 for the treatment is. After the treatment of the part 19 of the component surface 2, the opening 15 of the reaction chamber 16 is again closed by the closure device 20 by their movement into their closed position, so that the miniaturized LP plasma reactor 1 without shutdown of the low-pressure plasma in the reaction chamber 16 to continuously Continued partial treatment of a different part of the component surface 2 is a corresponding treatment of component geometries other than those of Fig. 1 shown plate-shaped component 1 is of course possible

From the Fig. 2 and 3 go one of the Fig. 1 corresponding second embodiment of the inventive device in the form of the portable autarkic miniaturized ND plasma reactor 1, in which on the outer wall 23 of the reaction chamber 16 in the vicinity of their aufzusetzenden on the component surface 2 end edges 22 compressed air nozzles 24 are provided by means of an air cushion With this air cushion can for gentle treatment of the component surface 2 for a relative movement between the latter and the LP plasma reactor 1 after treatment of the part 19 of the component surface 2 and closing the opening 15 of the reaction chamber 16 from position A in Fig. 3 be ensured so that a displacement of the miniaturized LP plasma reactor, for example, in the position B according to Fig. 3 without switching off the low-pressure plasma is possible to continue a corresponding partial treatment of the component surface 2

In the embodiments of the inventive device according to the Fig. 1 to 3 In addition, because of the plasma excitation by means of microwaves, it is necessary to ensure suitable metal grating of either the entire miniaturized ND plasma reactor or the sealing region of the reaction chamber at the component surface.

Fig. 4 schematically shows one of Fig. 1 corresponding third embodiment of the portable autarkic miniaturized LP plasma reactor 1, wherein via a vacuum chamber 4 two Reaction chambers 16 are each connected via a flexible supply line 14 to the process gas container 10 and the vacuum pump 9. Of the two reaction chambers 16, the opposing surfaces of the plate-shaped member in accordance with in connection with Fig. 1 be treated simultaneously and continuously partially with low pressure plasma. Accordingly, the portable autarkic miniaturized LP plasma reactor 1 can be equipped with more than two reaction chambers 16, so that the surfaces 2 of different components 3 are to be treated simultaneously and continuously locally

List of reference numbers:

1

LP plasma reactor

2

Surface of the component

3

component

4

vacuum chamber

5

Valve

6

Valve

7

management

8th

management

9

vacuum pump

10

Process gas containers

11

Microwave Generator Electrode for Radio Frequency Excitation

13

Valve

14

allocation

1 5

opening

16

reaction chamber

17

Valve

18

management

19

Part of the surface

20

poetry

21

closure device

22

End edges of the reaction chamber

23

Outer wall of the reaction chamber

24

Compressed air nozzles

A, B

Position of the LP plasma reactor

Claims (19)

1. A method for the partial treatment of the surface at least of one component with low pressure plasma, which is to be produced in at least one reaction chamber provided with an opening, wherein the opening of the reaction chamber is closed and the reaction chamber is then evacuated and filled with a process gas which through application of energy into the reaction chamber is ionized therein with the formation of the low pressure plasma and is brought into effect on the part of the surface of the component which is to be treated,
   characterized in that

   - at least one portable self-sufficient miniaturized open LP-plasma reactor is used,

   - wherein the opening of the reaction chamber of the LP-plasma reactor is held tightly closed by a closure arrangement, to be moved into a closed position, before the start of the surface treatment, whereupon

   - the process gas is filled into the reaction chamber, which is closed by the closure arrangement, and is ionized therein by means of microwave stimulation,

   - the closure arrangement is then moved into a position exposing the opening of the reaction chamber, in which the opening of the reaction chamber is now continued to be tightly closed by the part of the component surface which is to be treated, and the ionized process gas comes to act on the part of the component surface which is to be treated,

   - the closure arrangement, after completed treatment of the part of the component surface closing the opening of the reaction chamber, is moved back into its closed position and

   - then the miniaturized LP-plasma reactor, without disconnection of the low pressure plasma produced in the reaction chamber, is brought into the corresponding position for the immediately continued partial treatment of another part of the component surface.
2. The method according to Claim 1, characterized in that the dimensions of the reaction chamber of the portable self-sufficient miniaturized LP-plasma reactor are selected with regard to its length, width and height in the range of 10 mm to 100 mm or respectively 10 mm to 100 mm or respectively 10 mm to 100 mm.
3. The method according to Claim 1 and 2, characterized in that the operation pressure in the reaction chamber of the portable self-sufficient miniaturized LP-plasma reactor is selected in the range of 1 Pa to 1000 Pa.
4. The method according to Claim 1 to 3, characterized in that the portable self-sufficient miniaturized LP-plasma reactor is moved in a robot-controlled manner.
5. The method according to Claim 4, characterized in that the closure arrangement for the opening of the reaction chamber of the portable self-sufficient miniaturized LP-plasma reactor is moved in a robot-controlled manner into the closed and the exposure position.
6. The method according to one of the preceding claims, characterized in that a sliding door or a shutter is used as closure arrangement.
7. The method according to one of Claims 1 to 6, characterized in that the portable self-sufficient LP-plasma reactor is moved by means of air cushions relative to the surface of the component before or after closure of the opening of the reaction chamber.
8. The method according to one of Claims 1 to 7, characterized in that the reaction chambers of several portable self-sufficient miniaturized LP-plasma reactors are moved simultaneously on the surface of the component or of various components for their partial treatment.
9. The method according to one of the preceding claims, characterized in that respectively a portable self-sufficient miniaturized LP-plasma reactor is used simultaneously on the opposite surfaces of a relatively thin opaque sheet of polyethylene for its treatment, wherein air is used as carrier medium in the reaction chamber, communicating with the vacuum pump and the process gas container, of the respective portable self-sufficient miniaturized LP-plasma reactor.
10. A device for the partial treatment of the surface (2) of a component (3) with low pressure plasma, which has at least one closable reaction chamber (16), provided with an opening (15), which chamber is connected via ducts (7, 8), respectively having a valve arrangement (5, 6), with a vacuum pump (9) and with a process gas container (10), from which the reaction chamber (16) is to be evacuated or respectively is to be filled with process gas, and on which a plasma generator (11) is provided externally, by means of which the process gas, filled into the evacuated reaction chamber (16), is to be ionized with the formation of the low pressure plasma in the reaction chamber (16), so that the ionized process gas can act on a part (19) of the component surface (2) which is to be treated,
    characterized in that

    - at least one portable self-sufficient miniaturized LP-plasma reactor (1) is available, in which

    - a closure arrangement (21) is provided on the reaction chamber (16) which is to be moved into a closure position tightly closing the opening (15) of the reaction chamber (16), in which the reaction chamber (16) is to be evacuated and is to be filled with process gas,

    - the plasma generator (11) is a microwave-, radio frequency wave- or other HF generator, by which the process gas is to be ionized in the reaction chamber (16) which is tightly closed by the closure arrangement (21), and

    - the closure arrangement (21) is to be moved into a position exposing the opening (15) of the reaction chamber (16), in which the opening (15) of the reaction chamber (16) is held tightly closed continuously by the part (19) of the component surface (2) to be treated, and the part (19) to be treated is exposed at the same time to the action of the ionized process gas particles and

    - from which the closure arrangement (21) after completed treatment of the part (19) of the component surface (2) tightly closing the opening (15) is to be moved back into the position in turn again closing the reaction chamber (16) in a sealing manner, in which the portable self-sufficient miniaturized LP-plasma reactor (1), without disconnection of the low pressure plasma produced in the reaction chamber (16) is to be brought into position for the directly continued partial treatment of another part (19) of the component surface (2).
11. The device according to Claim 10, characterized in that the portable self-sufficient miniaturized LP-plasma reactor (1) has several reaction chambers (16) connected via a flexible duct with the process gas container (10) and the vacuum pump (9), which chambers are to be used simultaneously for the partial treatment of the surface (2) of one and/or more components (3).
12. The device according to Claim 10 or 12, characterized in that the closure arrangement (21) for the opening (15) of the reaction chamber (16) is to be moved in a robot-controlled manner into the closed position and into the exposure position.
13. The device according to one of Claims 10 to 12, characterized in that the closure arrangement (21) is a sliding door or a shutter.
14. The device according to one of Claims 10 to 13, characterized in that the portable self-sufficient miniaturized LP-plasma reactor (1) in the closed position and in the exposure position of the closure arrangement (21) for the opening (15) of the reaction chamber (16) is to be moved by means of an air cushion relative to the component surface (2), wherein the air cushion at the same time forms a seal of the reaction chamber (16) with respect to the component surface (2).
15. The device according to one of Claims 10 to 14, characterized in that the portable self-sufficient miniaturized LP-plasma reactor (1) is to be moved by means of a robot.
16. The device according to Claim 15, characterized in that the reaction gas container (10), the vacuum pump (9) and the at least one reaction chamber (16) of the portable self-sufficient miniaturized LP-plasma reactor (1) are secured by means of the robot and are to be moved relative to each other.
17. The device according to one of Claims 10 to 16, characterized in that in the treatment position of the reaction chamber (16), the closure arrangement for the opening (15) of the reaction chamber (16) is arranged in closed position immediately above the part (19) of the component surface (2) which is to be treated, wherein on movement of the closure arrangement (21) into its exposure position, leakage flows of the ionized process gas are negligible.
18. The device according to one of Claims 10 to 17, characterized in that the dimensions of the reaction chamber (16) with regard to its length, width and height lie in the range of 10 mm to 100 mm or respectively 10 mm to 100 mm or respectively 10 mm to 100 mm.
19. The device according to one of Claims 10 to 18, characterized in that the operation pressure in the reaction chamber (16) lies in the range of 1 Pa to 1000 Pa.

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