EP1728897B1 - Electrocast tube producing method and electrocast tube - Google Patents
Electrocast tube producing method and electrocast tube Download PDFInfo
- Publication number
- EP1728897B1 EP1728897B1 EP04722441.5A EP04722441A EP1728897B1 EP 1728897 B1 EP1728897 B1 EP 1728897B1 EP 04722441 A EP04722441 A EP 04722441A EP 1728897 B1 EP1728897 B1 EP 1728897B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- thin wire
- tube
- electroforming
- wire material
- conductive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 43
- 239000000463 material Substances 0.000 claims description 492
- 238000005323 electroforming Methods 0.000 claims description 181
- 239000002659 electrodeposit Substances 0.000 claims description 102
- 239000007788 liquid Substances 0.000 claims description 53
- 238000005192 partition Methods 0.000 claims description 27
- 238000007747 plating Methods 0.000 claims description 19
- 230000005611 electricity Effects 0.000 claims description 13
- 238000007664 blowing Methods 0.000 claims description 8
- 239000011810 insulating material Substances 0.000 claims description 8
- 230000000873 masking effect Effects 0.000 claims description 4
- 239000010935 stainless steel Substances 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 description 41
- 239000002184 metal Substances 0.000 description 41
- 239000003792 electrolyte Substances 0.000 description 32
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 27
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 22
- 229910052737 gold Inorganic materials 0.000 description 22
- 239000010931 gold Substances 0.000 description 22
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 18
- 229910052802 copper Inorganic materials 0.000 description 18
- 239000010949 copper Substances 0.000 description 18
- 239000000523 sample Substances 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 13
- 229910052759 nickel Inorganic materials 0.000 description 13
- 239000004020 conductor Substances 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 8
- -1 plating Inorganic materials 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000001771 impaired effect Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 229920003002 synthetic resin Polymers 0.000 description 4
- 239000000057 synthetic resin Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000000615 nonconductor Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920002994 synthetic fiber Polymers 0.000 description 2
- 239000012209 synthetic fiber Substances 0.000 description 2
- QNRATNLHPGXHMA-XZHTYLCXSA-N (r)-(6-ethoxyquinolin-4-yl)-[(2s,4s,5r)-5-ethyl-1-azabicyclo[2.2.2]octan-2-yl]methanol;hydrochloride Chemical compound Cl.C([C@H]([C@H](C1)CC)C2)CN1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OCC)C=C21 QNRATNLHPGXHMA-XZHTYLCXSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004693 Polybenzimidazole Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229920002334 Spandex Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- DDTRKTSYUPRJGP-UHFFFAOYSA-H [F-].[F-].[F-].[F-].[F-].[F-].[Ti+4].[Cu++] Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[Ti+4].[Cu++] DDTRKTSYUPRJGP-UHFFFAOYSA-H 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- ZHOLKSYCHRKNCU-UHFFFAOYSA-H copper;silicon(4+);hexafluoride Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[Si+4].[Cu+2] ZHOLKSYCHRKNCU-UHFFFAOYSA-H 0.000 description 1
- 229920003020 cross-linked polyethylene Polymers 0.000 description 1
- 239000004703 cross-linked polyethylene Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000011295 pitch Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 1
- 239000004759 spandex Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920006027 ternary co-polymer Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/02—Tubes; Rings; Hollow bodies
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Micromachines (AREA)
Description
- The present invention relates to an electrically cast (referred to as "electroforming" in the present description) tube producing method, a tube by electroforming, and a thin wire material for production of tubes by electroforming, more particularly to a method of producing a tube by electroforming having a fine inner diameter, and a tube by electroforming. The present invention also relates to a thin wire material for production of a tube by electroforming having a fine inner diameter.
- Heretofore, in a case where an integrated circuit such as an LSI is manufactured, inspection is performed to judge whether or not a semiconductor pattern is finished as designed, and electric conduction is satisfactory. This inspection is performed using a device (referred to as the "probe device" in the present description) including a large number of contact probes, and the device is brought into contact with electrodes having contact probe pins formed thereon. The contact probe has a structure in which a spring is disposed in a very thin tube having a desired length, and the pin is disposed movably forwards or backwards in the tube.
- In addition, in recent years, there has been a remarkable progress in a semiconductor manufacturing technology, and an integration degree tends to increasingly indicate a high density. With this tendency, also in the probe device which inspects the electric conduction of the electrode, so as to match with the latest integrated circuit, there is a demand for increasing of the number of the contact probes (multiple pins), reducing of a wire diameter (thin wires) and narrowing of an interval between the contact probes (reduced pitches). As to the tube for the existing contact probe, it is assumed that a tube having an outer diameter of 110 µm and an inner diameter of 88 µm is the minimum in the world (see, e.g., Non-Patent Document 1).
EP 1 394 290 A2 discloses a formation of small tubes by electroforming. A core wire material is coated at a coating temperature which is higher than a forming temperature at which the core is removed.
Prior art documentsEP 1,253,221 A1 andUS 6,419,810 B1 relate to methods for manufacturing optical fiber connectors by means of electroforming. Methods for manufacturing a metal tube in which electroforming is performed using a metal wire as a mandrel and for improving the ratio of extraction of the wire are described inJP 2003-082490
Very fine copper alloy wires with high tensile strength are described inJP 2002-129262 - However, since the semiconductor manufacturing technology has increasingly progressed as described above, the contact probe also needs to be further miniaturized.
- Moreover, a necessity for the tube having the fine inner diameter also enhances in a field other than a semiconductor industrial field, such as biotechnology or a medical field.
- That is, there is a strong demand for development of such tube having the fine inner diameter in the whole industrial world.
- The present inventor has conducted researches concerning electroforming, and has succeeded in producing a micro tube by the electroforming before. At this time, the tube by electroforming includes a hollow portion having a circular sectional shape, and has an inner diameter of 126 µm (see, e.g., Patent Document 1). Therefore, the present inventor has obtained an idea that when an electroforming technology is used, a tube having a fine inner diameter (hollow portion) for the contact probe might be produced.
- Furthermore, after conducting further researches, the present inventor has succeeded in using a thin wire material having a diameter of 10 µm to 85 µm, and attaching a metal film having a minimum size of 5 µm to an outer surface of this thin wire material. Moreover, it has been found that when the above thin wire material can be removed from this metal, a tube having a fine inner diameter (hollow portion) can be made.
- However, it has not been easy to remove the thin wire material from the electrodeposited (deposited) metal, because the electrodeposited metal is brought into close contact with the outer surface of the thin wire material.
- Patent Document 1
Jpn. Pat. Appln. KOKAI Publication No.2002-48947 - Non-Patent Document 1
Nikkei Mechanical ON LINE, April 2001, Nikkei BP Co., internet <URL:http://dm.nikkeibp.co.jp/free/nmc/kiji/h559/t559g.html > - Objects of the present invention are:
- (1) to provide a method of producing a tube by electroforming having a fine inner diameter, a tube by electroforming, and a thin wire material for production of the tube by electroforming;
- (2) to provide a tube electroforming method in which a jig, a tool or the like can be caught by an electrodeposit material or a surrounding material in a case where a thin wire material is removed from the electrodeposit material or the surrounding material, whereby the thin wire material is easily removed;
- (3) to provide a tube electroforming method in which a conductive layer plated with gold or the like is disposed on an inner surface of a tube by electroforming so that an electric conductivity is more satisfactory than that at a time when an electrodeposit material or a surrounding material only is disposed, a tube by electroforming, and a thin wire material for production of this tube by electroforming;
- (4) to provide a tube electroforming method in which at least two conductive layers constituted of different materials are disposed on an inner surface of a tube by electroforming so as to improve a close contact property between the conductive layers or between the conductive layer and an electrodeposit material or a surrounding material, a tube by electroforming, and a thin wire material for production of the tube by electroforming;
- (5) to provide a method of producing a tube by electroforming including a plurality of hollow portions, and a tube by electroforming;
- (6) to provide a method of producing a tube by electroforming including a plurality of hollow portions so that each portion forming a periphery of each hollow portion can independently conduct electricity, and a tube by electroforming; and
- (7) to provide a tube electroforming method in which a tensile force is not easily applied to a conductive layer disposed on an inner surface of a tube by electroforming in a case where a thin wire material is removed, whereby the conductive layer is easily separated from a base wire material, and a close contact property between the conductive layer and an electrodeposit material or a surrounding material is not easily impaired.
- Means of the present invention developed in order to achieve the above objects are as follows.
The present invention provides a tube electroforming method according to claim 1 and a tube produced by electroforming according toclaim 8. The dependent claims relate to preferred embodiments. - As to the thin wire material, there can be used a material such as a metal wire material entirely formed of a conductive material, or a material formed by disposing the conductive layer (e.g., a metal such as plating, carbon or the like) around the conductive material. Alternatively, there can be used a material formed by using a thin wire material formed of an insulating material, such as a synthetic resin wire material, and disposing a conductive layer (e.g., a metal such as electroless plating, carbon or the like) around this material.
- Furthermore, in a case where a separate conductor is disposed in the vicinity of the thin wire material, and a metal is electrodeposited (deposited) on the conductor, in addition to the above thin wire material, there can further be used a material entirely formed of an insulating material (any conductive material is not disposed), such as the synthetic resin wire material.
- There is not any special restriction on a material of a place where the metal is electrodeposited by the electroforming as long as the material has conductivity, but it is preferable to use a material having a satisfactory electric conductivity in order to easily electrodeposit the metal. It is possible to use, for example, iron, stainless steel, copper, gold, silver, brass, nickel, aluminum, carbon or the like.
- Moreover, as the thin wire material or an insulating material constituting an insulator of the partition wall member, there can be used a nonconductor (insulating material) through which electricity does not remarkably easily flow or a semiconductor which changes to a conductor or a nonconductor in accordance with a temperature or the like. As to the insulating material, it is possible to use a material made of, for example, a thermosetting resin, a thermoplastic resin, an engineering plastic, a chemical fiber (synthetic fiber, semi-synthetic fiber, regenerated fiber or inorganic fiber) or the like. Examples of the material include: a phenol resin; urea resin; melamine resin; diallyl phthalate rein; unsaturated polyester resin; silicone resin; epoxy resin; polyethylene; crosslinked polyethylene; chlorinated polyethylene; ethylene/vinyl acetate copolymer; polypropylene; polyisobutylene; polyvinylchloride; polyvinylidene chloride; polyvinyl alcohol; polyvinyl acetal; acrylic resin; polyvinyl acetate; polyacrylonitrile; modacryl; polystyrene; styrene/acrylonitrile copolymer; acrylonitrile/butadiene/styrene ternary copolymer; acetate; triacetate; fluorine resin; polytetrafluoroethylene; polybutylene terephthalate; polyarylate; polyacetal; polycarbonate; polyphenylene sulfide; polysulfone; total aromatic polyimide; polyamide imide; polyether imide; polyether ether ketone; polybenzimidazole; polyester; polyethylene terephthalate; polyamide; nylon; aramid; polyurethane; spandex; polyalkylene paraoxybenzoate; benzoate; polyfluoroethylene; promix; rayon; cupra; and glass fiber.
- Furthermore, as the insulating material, it is possible to use a so-called filament yarn which is not intertwisted or spun, or a spun yarn.
- The term "circular sectional shape" indicated by the inner shape of the tube by electroforming or the outer shape of the thin wire material does not strictly mean that the sectional shape is a circular shape, and is used as an idea including a substantially circular shape or an elliptic shape.
- The term "polygonal sectional shape" indicated by the inner shape of the tube by electroforming or the outer shape of the thin wire material does not strictly mean that the sectional shape is a polygonal shape, and is used as an idea including a substantially polygonal shape. There is not any special restriction on the polygonal shape, and typical examples of the polygonal shape include a substantially triangular shape, a substantially quadrangular shape (including a rectangular shape, a square shape, a rhombic shape and a parallelogram shape), a substantially pentagonal shape and a hexagonal shape.
- Examples of the solvent which dissolves and removes the thin wire material include an alkaline solution and an acidic solution.
- There is not special restriction on an application of the tube by electroforming, but examples of the application include a tube (casing which contains a spring) for a contact probe.
- The "portion forming the periphery of the hollow portion" indicates the electrodeposit material or the surrounding material formed by the electroforming in some case, or a conductive layer (including the conductive layer of the partition wall member) having the material different from that of the electrodeposit material or the surrounding material and disposed on the inner surface of the hollow portion in other cases.
- According to the present invention, a thin wire material can be removed from an electrodeposit material or a surrounding material formed by electroforming. The thin wire material is removed using any of methods of: (1) heating and thermally expanding the electrodeposit material or the surrounding material, or cooling and contracting the thin wire material to thereby form a clearance between the electrodeposit material or the surrounding material and the thin wire material; (2) submerging the material into a liquid or applying the liquid to the material, whereby a place with which the thin wire material and the electrodeposit material or the surrounding material are brought into contact is formed so as to easily slip; or (3) pulling the material from one end or both ends, deforming the material so as to reduce a sectional area thereof, and forming the clearance between the thin wire material and the electrodeposit material or the surrounding material, followed by gripping and pulling the material, sucking the material, physically pushing away the material, or blowing a gas or a liquid to push away the material. The material can also be removed by (4) melting the material with heat or a solvent.
- When such method is used in removing the thin wire material, and, for example, a thin wire material having a diameter of 10 µm to 85 µm is used, the thin wire material can be removed even from the electrodeposit material or the surrounding material formed on the outer surface of this thin wire material so as to have a thickness of 5 µm or more and 50 µm or less. Therefore, when this thin wire material removing method is used, it is possible to produce, for example, a tube by electroforming usable as a tube for a contact probe or the like and having a fine inner diameter.
- According to a method of increasing an amount of an end-portion-side electrodeposit or surrounding material to be formed on the thin wire material to produce the tube by electroforming, for example, in a case where the thin wire material is extracted or pushed away and removed from the electrodeposit material or the surrounding material, a jig, a tool or the like can be caught by an end surface of the portion in which the amount of the electrodeposit material or the surrounding material is increased. Therefore, in this case, the thin wire material can be removed in a state in which the electrodeposit material or the surrounding material is fixed, and therefore the thin wire material is easily removed.
- According to a tube electroforming method in which a deformation amount of a lateral distortion is set to 5% or more of the sectional area at a time when the thin wire material is pulled and extended outwards, since a clearance sufficient for removing the thin wire material can be formed between the thin wire material and the electrodeposit material or the surrounding material, there is a high possibility that the thin wire material can be removed from the electrodeposit material or the surrounding material without any trouble. If the deformation amount of the lateral distortion is only less than 5% of the sectional area, the clearance is not sufficient. Therefore, the trouble sometimes occurs during the removing.
- According to a tube electroforming method in which the thin wire material having a conductive layer disposed on the outer surface thereof is used, and the thin wire material is removed so that the conductive layer remains on the inner surface of the tube by electroforming, it is possible to produce the tube by electroforming having gold plating or the like disposed on the inner surface thereof. In accordance with, for example, a material of the conductive layer disposed on the inner surface of the tube, such tube by electroforming can have an electric conductivity which is more satisfactory than that of a case where the electrodeposit material or the surrounding material only is disposed. Therefore, in this case, the tube is usable as a component suitable for conducting electricity.
- It is to be noted that even as to the tube by electroforming having the inner surface provided with a conductive layer constituted of a material different from that of the electrodeposit material or the surrounding material, or the thin wire material having the outer surface provided with the conductive layer constituted of the material different from that of.the electrodeposit material or the surrounding material, it is similarly possible to form the tube by electroforming having an electric conductivity which is more satisfactory than that of the case where the electrodeposit material or the surrounding material only is disposed.
- According to a tube electroforming method in which there is used a thin wire material having the outer surface provided with at least two or more conductive layers constituted of different materials, for example, the outer conductive layer is made of copper, the inner conductive layer brought into contact with copper is made of gold, and nickel is formed as the electrodeposit material or the surrounding material by the electroforming. In this case, nickel has a satisfactory close contact property with respect to copper rather than gold, copper also has a satisfactory close contact property with respect to gold, and it is therefore possible to produce the tube by electroforming having a satisfactory close contact property.
- It is to be noted that as to a tube by electroforming in which the conductive layer constituted of the material different from that of the electrodeposit material or the surrounding material is disposed on the inner surface of the tube and in which a further conductive layer constituted of the material different from that of the conductive layer is disposed between the electrodeposit material or the surrounding material and the above conductive layer, or as to a thin wire material in which the conductive layer constituted of the material different from that of the electrodeposit material or the surrounding material is disposed on the outer surface of the material and in which the further conductive layer constituted of the material different from that of the conductive layer is disposed between a thin wire material base member and the above conductive layer, it is similarly possible to form the tube by electroforming having the satisfactory close contact property between the electrodeposit material or the surrounding material and the conductive layer.
- A component including a plurality of hollow portions formed by removing the thin wire material may replace, for example, a component produced by arranging a plurality of tubes each having only one hollow portion, and may be used. According to the tube by electroforming, it is possible to eliminate an operation of arranging the individual tubes. An interval between the hollow portions does not deviate because the portions are fixed with the electrodeposit material or the surrounding material.
- In a case where a partition wall member formed by disposing the conductive layer on the outer surface of an insulator is disposed between the hollow portions, and each portion forming the periphery of each hollow portion can independently conduct electricity, each hollow portion can independently conduct electricity.
- As to a thin wire material having, on opposite ends, portions on which any conductive layer is not disposed, in a case where the portion on which any conductive layer is not disposed is pulled outwards, a tensile force is not directly or easily applied to the conductive layer, the conductive layer is easily separated from a base wire material, and the close contact property between the conductive layer and the electrodeposit material or the surrounding material is not easily impaired.
-
-
FIG. 1 is a sectional explanatory view showing one example of an electroforming device for producing a tube by electroforming of the present invention; -
FIG. 2 is an explanatory view showing a state in which an enlarged diameter portion is formed on one end of an electrodeposit material; -
FIG. 3 is a sectional explanatory view showing a state in which an electrodeposit material is formed around a thin wire material having a substantially quadrangular sectional shape; -
FIG. 4 is a sectional explanatory view showing a state in which an electrodeposit material is formed around a thin wire material having a conductive layer disposed on an outer peripheral surface thereof; -
FIG. 5 is a sectional explanatory view showing a state in which an electrodeposit material is formed around a thin wire material having an outer peripheral surface provided with two conductive layers constituted of different materials; -
FIG. 6 is an explanatory view showing a state in which an electrodeposit material is formed around a thin wire material having, on opposite ends, portions where any conductive layer is not disposed; -
FIG. 7 is a sectional explanatory view showing another example of the electroforming device for producing the tube by electroforming of the present invention; -
FIG. 8 is an exploded perspective explanatory view showing a jig for the production to be used in the electroforming device shown inFIG. 7 ; and -
FIG. 9 is an enlarged sectional explanatory view showing a tube by electroforming produced using the jig for production shown inFIG. 8 . - An embodiment of the present invention will be described in more detail with reference to the drawings.
-
FIG. 1 is a sectional explanatory view showing one example of an electroforming device for producing a tube by electroforming of the present invention. - First, there will be described the electroforming device which produces the tube by electroforming.
- An
electroforming device 100 includes anelectroforming tank 10 and anouter.tank 11 which contains therein thiselectroforming tank 10. Theelectroforming tank 10 and theouter tank 11 have opened upper portions, and an electrolyte liquid (electroforming liquid) 20 is supplied into theelectroforming tank 10 during operation. In this manner, theelectrolyte liquid 20 overflows from the upper portion of theelectrolyte liquid 20, and flows into theouter tank 11. In the present embodiment, as theelectrolyte liquid 20, there is used, for example, a nickel sulfamate liquid to which a brightener or a bit preventive agent is applied. - The
electrolyte liquid 20 which overflows from theelectroforming tank 10 to flow into theouter tank 11 is filtered by a filtering device (not shown), and supplied into theelectroforming tank 10 again. That is, theelectrolyte liquid 20 constantly circulates between theelectroforming tank 10 and theouter tank 11 during the operation. It is to be noted that as supplying means for supplying theelectrolyte liquid 20 to theelectroforming tank 10, known means is usable (not shown). - In the present embodiment, a portion of the
electrolyte liquid 20 which overflows from the upper portion of theelectroforming tank 10 is referred to as anoverflow portion 12 for convenience. In theelectroforming device 100, the electroforming is performed in thisoverflow portion 12. An electroforming procedure will be described later. - A
horizontal adjuster unit 13 is disposed under theelectroforming tank 10. Thishorizontal adjuster unit 13 substantially horizontally holds theelectroforming tank 10, whereby the substantiallyhorizontal overflow portion 12 is formed in the whole upper portion of theelectroforming tank 10, and theelectrolyte liquid 20 can uniformly be distributed into each place of theoverflow portion 12. -
Reference numeral 4 denotes a holding jig to hold athin wire material 30 which is a mold member (mother material) for electroforming. The holdingjig 4 includes ahorizontal member 40 and a pair of hangingmembers horizontal member 40. The holdingjig 4 is disposed so that the hangingmembers electroforming tank 10. - From the hanging
members material fixing members material fixing members members electrode 44 is disposed on an end portion of one wirematerial fixing member 42 on the side of theelectroforming tank 10. An end portion of the other wirematerial fixing member 43 on theelectroforming tank 10 side is provided with atension unit 45 which pulls thethin wire material 30, and anelectrode 44. One end and the other end of thethin wire material 30 are fixed to the wirematerial fixing members tension unit 45. - A
rotary shaft 46 is rotatably disposed between the hangingmembers Reference numeral 47 denotes a driving motor which drives therotary shaft 46. Therotary shaft 46 extends through the hangingmembers - The above wire
material fixing members members gear 482 is fixed to the wirematerial fixing member 42 which extends through the hangingmember 41. Similarly, agear 483 is fixed to the wirematerial fixing member 43 which extends through the hangingmember 41. In this manner, thegear 480 engages with thegear 482, and thegear 481 engages with thegear 483. Therefore, when the drivingmotor 47 is operated to rotate thegears rotary shaft 46, thegears material fixing members thin wire material 30 can rotate. There is not any special restriction on a rotation speed of thethin wire material 30. For example, the speed is controlled to 15 r.p.m. or less. - Outer end portions of the wire
material fixing members electrode contact members jig 4 is disposed above theelectroforming tank 10, theelectrode contact members electrode portions electroforming tank 10 and theouter tank 11. Theelectrode portions electrode contact members electrode portions -
Reference numeral 15 denotes an electrode portion electrically connected to a plus pole of the power source. Theelectrode portion 15 is disposed in a bottom portion of theelectroforming tank 10. As theelectrode portion 15, there is usable a constitution or the like in which electroforming metal pellets (e.g., nickel pellets) are stored in a meshed or holed case made of, for example, titanium steel. - There will be described a tube electroforming method in which the
electroforming device 100 is used. - First, one end portion and the other end portion of the
thin wire material 30 are fixed to the wirematerial fixing members thin wire material 30 between the wirematerial fixing members electrolyte liquid 20 is supplied to theelectroforming tank 10, overflows from the upper portion of the electroforming tank 10 (to form the.overflow portion 12), and flows into theouter tank 11. Theelectroforming tank 10 is set to be substantially horizontal by thehorizontal adjuster unit 13, and theoverflow portion 12 is adjusted so that theelectrolyte liquid 20 is uniformly distributed to each place. - In the present embodiment, as the
thin wire material 30, there was used a material which was made of stainless steel having a substantially circular sectional shape with a diameter of 50 µm and in which a deformation amount of a lateral distortion at a time when a tensile force of approximately 1500 N/mm2 was applied to pull the material outwards was 10% of a sectional area. - Next, the driving
motor 47 is operated to rotate thegears rotary shaft 46. Accordingly, thegears material fixing members thin wire material 30 rotates. - The
electrode contact members electrode portions members electroforming tank 10, and the onlythin wire material 30 is submerged into theoverflow portion 12. When theelectrode contact members electrode portions electrode portion 15 is electrically connected to the plus pole of the power source. Therefore, thethin wire material 30 is electrically connected to the minus.pole of the power source to start the electroforming. In this manner, a metal (nickel deposited by theelectrolyte liquid 20 described in the present embodiment) is electrodeposited (deposited) around thethin wire material 30. The metal electrodeposited around thethin wire material 30 is an electrodeposit material (or a surrounding material). - The
thin wire material 30 is submerged into theoverflow portion 12 for a predetermined time, and the electroforming is performed until an outer diameter of the electrodeposited metal reaches approximately 70 µm over the whole length. When a target outer diameter is reached, thethin wire material 30 is taken out of theoverflow portion 12 to stop the electroforming. An electrodeposit amount (deposit amount) of the metal, that is, a thickness of the metal to be electrodeposited on the thin wire material can be controlled beforehand in accordance with a current, a voltage, an electroforming time or the like. - In the
electroforming device 100, theoverflow portion 12 is adjusted so that theelectrolyte liquid 20 is uniformly distributed to each place. Additionally, thethin wire material 30 is rotated. Therefore, even if a non-uniform place is generated in a current density of theelectrolyte liquid 20, a fluctuation is not easily generated in an electrodeposit state (deposit state) of the metal in thethin wire material 30. Consequently, the metal is electrodeposited around thethin wire material 30 so as to have a substantially uniform thickness over the whole length. In consequence, when thethin wire material 30 is only removed, it is possible to produce the tube by electroforming with a high precision. - Moreover, the
electroforming device 100 performs the electroforming in theoverflow portion 12, and theelectrolyte liquid 20 which has overflowed returns to theelectroforming tank 10 to circulate again. That is, during the electroforming, theoverflow portion 12 is preferably formed. Therefore, it is possible to perform the electroforming even with a small amount ofelectrolyte liquid 20. - In the
electroforming device 100, since the wirematerial fixing members thin wire material 30 are arranged outwardly from theoverflow portion 12, the wirematerial fixing members electrolyte liquid 20. Therefore, the wirematerial fixing members electrolyte liquid 20, and any impurity is not generated. Anyelectrolyte liquid 20 is not attached to or carried by the wirematerial fixing members electrolyte liquid 20 in theelectroforming tank 10 is not wasted. - Moreover, the
thin wire material 30 around which the metal has been electrodeposited is detached from the wirematerial fixing members thin wire material 30 is removed from the finally formed electrodeposit material (surrounding material). - The electrodeposit material is brought into close contact with the outer surface of the
thin wire material 30. Therefore, when thethin wire material 30 is simply gripped and pulled, sucked, physically pushed away, or pushed away with a blown gas or liquid, it is difficult to remove the material. Therefore, thethin wire material 30 is removed using any of the following methods (1) to (4). - (1) The electrodeposit material is heated and thermally expanded, or the
thin wire material 30 is cooled and contracted, and a clearance is formed between the electrodeposit material and thethin wire material 30. Thethin wire material 30 is removed using any of methods of gripping and pulling the thin wire material, sucking the material, physically pushing away the material, and blowing the gas or the liquid to push away the material. - (2) The
thin wire material 30 is submerged into a liquid in which a detergent is dissolved, or this liquid is applied to the material, whereby a place where the material is brought into contact with the electrodeposit material is set to easily slip. Moreover, thethin wire material 30 is removed using any of the methods of gripping and pulling the thin wire material, sucking the material, physically pushing away the material, and blowing the gas or the liquid to push away the material. - (3) The
thin wire material 30 is pulled from one end or both ends thereof, and deformed so as to reduce a sectional area thereof. Moreover, the clearance is formed between the electrodeposit material and thethin wire material 30, and thethin wire material 30 is removed using any of the methods of gripping and pulling the thin wire material, sucking the material, physically pushing away the material, and blowing the gas or the liquid to push away the material. - (4) The
thin wire material 30 is melted by heat, or melted by a solvent such as an alkaline solution or an acidic solution and removed. - When the
thin wire material 30 is removed in this manner, the tube by electroforming having a fine inner diameter (hollow portion) is formed the remaining electrodeposit material. The tube by electroforming is usable as the tube for the contact probe or the like. - In the present embodiment, the thin wire material is removed from the electrodeposit material having a substantially uniform thickness over the whole length, but this is not restrictive. For example, as shown in
FIG. 2 , anenlarged diameter portion 500 having a large outer diameter is formed on one end of anelectrodeposit material 50, and thethin wire material 30 is removed using any of the methods of pulling the thin wire material, sucking the material, physically pushing away the material, and blowing the gas or the liquid to push away the material. Since theenlarged diameter portion 500 is formed in this manner, the jig or the tool can be caught by an end surface of theenlarged diameter portion 500, in a.case where the material is extracted or pushed away. Therefore, in this case, thethin wire material 30 can be removed in a state in which the electrodeposit material is fixed, and therefore the thin wire material is easily removed. It is to be noted that an operation of increasing an electrodeposit amount of a part in this manner is sometimes performed, after the electrodeposit material is transferred to another electroforming device. - Moreover, in the above embodiment, as the
thin wire material 30, there was used a material having a substantially circular sectional shape with a diameter of 50 µm. However, a thickness or a sectional shape of the thin wire material is not limited to this. For example, as shown inFIG. 3 , there may be used a thin wire material 31 (including a material having a substantially polygonal shape in which corner portions are rounded) having a polygonal sectional shape such as a quadrangular shape.Reference numeral 51 denotes an electrodeposit material. - It is seen from an experiment conducted by the present inventor that it is possible to use the above thin wire material having an outer diameter of 10 µm or more and 85 µm or less, when the sectional shape has a substantially circular shape, or having an inscribed circle diameter of 10 µm or more and 85 µm or less, when the outer shape has a polygonal sectional shape, in a case where the tube by electroforming having a fine inner diameter is produced.
- Moreover, as the
thin wire material 30 described in the present embodiment, there was used a material in which a deformation amount of a lateral distortion was 10% of a sectional area at a time when a tensile force of 1500 N/mm2 was applied to pull the material outwards. However, there is not any special restriction on the deformation amount of the lateral distortion of the thin wire material. According to the experiment conducted by the present inventor, the deformation amount may be at least 5% or more of the sectional area. - In the present embodiment, the metal is electrodeposited into a thickness of approximately 10 µm around the
thin wire material 30 having a substantially circular shape with a diameter of 50 µm, and the tube by electroforming is formed so that an outer diameter is approximately 70 µm as a whole, but there is not any special restriction on the thickness of the metal to be electrodeposited. According to the experiment conducted by the present inventor, it is seen that in a case where the metal can be electrodeposited around thethin wire material 30 so as to have a thickness of at least approximately 5 µm, even after thethin wire material 30 is removed, the tube by electroforming can be formed. - In the present embodiment, the
thin wire material 30 made of stainless steel is used, and the metal is directly electrodeposited around thisthin wire material 30. However, there is not any special restriction on the thin wire material usable in theelectroforming device 100 as long as the material has the conductivity. For example, a material may be used in which a core portion is made of a metal, a synthetic resin or the like, and a conductive layer (plating (metal layer (film)), carbon or the like) is disposed on the outer surface of the core portion. When such thin wire material is used, for example, as shown inFIG. 4 , in a case where anelectrodeposit material 52 is formed on athin wire material 32 having gold plating 321 disposed on an outer peripheral surface of the material, thegold plating 321 is left on an inner peripheral surface of theelectrodeposit material 52, and abase wire material 320 only can be removed. In this case, it is possible to form the tube by electroforming having the gold plating 321 disposed on the inner peripheral surface of the tube. - In the tube by electroforming having the gold plating 321 disposed on the inner peripheral surface of the tube, the electric conductivity can be set to be more satisfactory than that in a case where any
gold plating 321 is not disposed. Therefore, the tube is usable as a tube for the contact probe or the like, which is a component suitable for conducting electricity. - Furthermore, as the thin wire material, for example, a material is usable in which on an outer periphery of the above conductive layer formed by the plating or the like, another conductive layer constituted of a material different from that of the above layer is further disposed. For example, in a case where the metal to be electrodeposited by the electroforming is nickel, and an
electrodeposit material 53 is formed around athin wire material 33 having copper plating 332 disposed on an outer periphery of gold plating 331 (seeFIG. 5 ), nickel has a satisfactory close contact property with respect to copper rather than gold, and copper also has a satisfactory close contact property with respect to gold. Therefore, when abase wire material 330 only is removed, it is possible to form a tube by electroforming in which nickel, copper and gold are bonded with the satisfactory close contact property. Thegold plating 331 is exposed on the inner peripheral surface of the tube by electroforming. - In a case where the thin wire material having the conductive layer (e.g., the gold plating) disposed on an outer peripheral portion of the material is deformed so as to reduce the sectional area of the material, and removed from the deposited metal, it is preferable that, as shown in
FIG. 6 , on opposite ends of athin wire material 34, there are formed portions (maskingportions 341, 341) in which any conductive layer (e.g., the gold plating 340) is not disposed, and the portion which is not provided with the conductive layer is pulled. In this case, any tensile force is not easily or directly applied to the conductive layer, the conductive layer is easily separated from the base wire material, and the close contact property between the conductive layer and anelectrodeposit material 54 is not easily impaired. -
FIG. 7 is a sectional explanatory view showing another example of the electroforming device for producing the tube by electroforming of the present invention;
FIG. 8 is an exploded perspective explanatory view showing a jig for the production to be used in the electroforming device shown inFIG. 7 ; and
FIG. 9 is an enlarged sectional explanatory view showing a tube by electroforming produced using the jig for the production shown inFIG. 8 . - An
electroforming device 101 of such a type that a thin wire material is disposed in a state in which tension is given to the material in a vertical direction (perpendicular direction inFIG. 7 ). - The
electroforming device 101 includes anelectroforming tank 60. Theelectroforming tank 60 is formed into a box shape having therein atank portion 61 and having an upper portion opened. On an upper edge of theelectroforming tank 60, alid laying portion 62 expanding outwards is disposed over the whole periphery, and thelid laying portion 62 is covered with alid member 64 so as to close an opening of theelectroforming tank 60. -
Hook portions 63 are disposed in an upper portion of thetank portion 61. To thehook portions 63,anode portions 66 are attached which are electrically connected to a plus pole of a power source. To theanode portions 66,housing members 660 are attached, and thehousing members 660 are packed with a large.number of nickel balls.Reference numeral 65 denotes a cathode portion electrically connected to thehousing members 660. In thecathode portion 65, acathode wire 650 to be connected to producingjigs 8 described later is disposed to hang downwards. - In the present embodiment, the
housing member 660 is packed with the nickel balls, but members with which thehousing member 660 is to be packed are not limited to them, and they are selected in accordance with a type of the metal to be deposited. There may be used, for example, nickel, iron, copper, cobalt or the like. There is not any special restriction on a shape or a structure. - A jig fixing
frame member 7 is contained in thetank portion 61. In the jig fixingframe member 7, the producingjigs 8 are stacked in five stages. - The
tank portion 61 of theelectroforming tank 60 is filled with anelectrolyte liquid 21. Theelectrolyte liquid 21 is disposed so that theanode portions 66 and the jig fixingframe member 7 are completely submerged. In the present embodiment, as theelectrolyte liquid 21, there is used a liquid containing nickel sulfamate as a main component. -
FIG. 8 is referred to. In the producingjig 8, a plurality ofthin wire materials 35 can be extended for producing a tube by electroforming having a plurality of hollow portions. It is to be noted that as thethin wire material 35 described in the present embodiment, the same material as that used in theelectroforming device 100 is used, and therefore description thereof is omitted. - The producing
jig 8 includes a plate-like jigmain body 80 having a required length. Substantially in the center of the jigmain body 80, anopening 81 extending through the body is formed. InFIG. 8 , on opposite ends (short side) of the jigmain body 80, which are upper and lower ends, a plurality of fixingmembers thin wire materials 35 are disposed at required intervals in a width direction (specifically, every eight places). In the present embodiment, as the fixingmembers - Moreover, further inwardly from the fixing
members members - Furthermore, in the vicinity of the
opening 81 which is an inner portion from the guide pins 84, there are arranged positioningmembers thin wire materials 35 to be extended. Each of thepositioning members main body 80, and V-shaped grooves (not seen in the drawing because they are covered with a detachment preventing member 850 (described later)) into which thethin wire materials 35 are to be fitted are formed substantially in the center of the member. This groove ranges over the whole width (vertical direction inFIG. 8 ) of the positioningmember 85, and a plurality of grooves (specifically in eight places) are arranged in a length direction (left to right direction inFIG. 8 ). - On the top of each positioning
member 85, there is disposed thedetachment preventing member 850 having a width substantially equal to that of the positioningmember 85 but formed of a short plate-like member, and the fittedthin wire materials 35 are prevented from being detached from the grooves. In the present embodiment, the grooves of the positioningmember 85 are formed so as to dispose a clearance of 10 µm between thethin wire materials 35 disposed adjacent to each other, but this is not restrictive, and the interval between thethin wire materials 35 can appropriately be set. - A plurality of (specifically, eight)
thin wire materials 35 are attached to the producingjig 8. Eachthin wire material 35 is attached as follows. - First, a
tensile spring 86 is attached to the other end (lower side inFIG. 8 ) of thethin wire material 35. Moreover, one end (upper side inFIG. 8 ) of thethin wire material 35 is fixed with the fixingmember 82. Thethin wire material 35 fixed with the fixingmember 82 is passed between the adjacent guide pins 84 and 84, fitted into the groove formed in each positioningmember 85, and bridged between the positioningmembers - The other end of the
thin wire material 35 fitted into the groove is passed between the adjacent guide pins 84 and 84 in the same manner as in the upper end, and thetensile spring 86 is fixed with the fixingmember 83. Thethin wire material 35 is attached in a state in which tension is given to a portion of thethin wire material 35 corresponding to theopening 81 by the tensile force of thetensile spring 86. - It is to be noted that in the producing
jig 8, thethin wire material 35 is attached with a clearance of 10 µm from the adjacent material, but the above interval is shown inFIG. 8 in an exaggerated manner in order to facilitate understanding. -
Reference numeral 87 denotes a holding member to whichpartition wall members 88 are to be attached. The holdingmember 87 is formed of a rectangular plate-like member having a size which is substantially equal to that of an opening shape of theopening 81. - The
partition wall member 88 has a length which is substantially equal to that of the holdingmember 87 in a vertical direction inFIG. 8 , and has a band-like shape with a small thickness. To be more specific, thepartition wall member 88 has a structure which includes an insulatingbase member 880 having a thickness of approximately 8 µm and in which conductive layers (films) 881 each formed by plating or the like and having a thickness of approximately 2 to 3 µm are disposed on front and.back surfaces of the insulatingbase member 880. There is not any special restriction on a material forming theconductive layer 881 as long as the material has a conductivity. However, it is preferable that the material has a satisfactory close contact property (bonding property) with respect to the electrodeposit material formed by electroforming. - A plurality of (specifically, seven)
partition wall members 88 are arranged at required intervals disposed so that theconductive layers 881 face the members, and detachably attached to substantially the center of the surface of the holdingmember 87 so as to extend along the whole length in the vertical direction ofFIG. 8 . In the present embodiment, since the abovethin wire materials 35 are attached to the jigmain body 80 with a clearance of approximately 10 µm formed therebetween, thepartition wall members 88 are similarly attached with an interval of approximately 10 µm so that the interval corresponds to the clearance. - The holding
member 87 provided with thepartition wall members 88 is attached to the jigmain body 80, when eachpartition wall member 88 is inserted from the side (arrow direction) between thethin wire materials 35 extended vertically along theopening 81, and thepartition wall member 88 is held by the tensile force of thethin wire material 35. That is, thethin wire material 35 comes into contact with the partition wall member 88 (theconductive layer 881 in detail). - After the holding
member 87 is attached to the jigmain body 80 as described above, and the cathode wire 650 (not shown inFIG. 8 ) is connected so that electricity flows through thethin wire materials 35, the producingjig 8 is contained in the jig fixingframe member 7 of thetank portion 61, and submerged into theelectrolyte liquid 21 to perform the electroforming. It is to be noted that specific description is omitted, but a place other than theopening 81 of the producingjig 8 is subject to a masking treatment so as to prevent the place from being submerged into theelectrolyte liquid 21. - According to the
electroforming device 101, energizing is performed to thereby form the electrodeposit material around thethin wire material 35 and on the surface of theconductive layer 881. Moreover, when thethin wire material 35 and thepartition wall member 88 are surrounded with anelectrodeposit material 55 to a required degree, the electroforming is stopped. An electrodeposit amount (deposit amount) of theelectrodeposit material 55 can be controlled beforehand by a current, a voltage, an electroforming time or the like. - The producing
jig 8 in which the electroforming is stopped is taken out of theelectrolyte liquid 21, and disassembled again into the jigmain body 80 and the holdingmember 87. At this time, since thepartition wall member 88 is fixed by the depositedelectrodeposit material 55 between thethin wire materials 35, the partition wall member is separated from the holdingmember 87. Thereafter, thethin wire material 35 and thepartition wall member 88 integrated by theelectrodeposit material 55 are detached from the jigmain body 80. - Moreover, the
electrodeposit material 55 and thepartition wall member 88 are machined and shaped (seeFIG. 9 ), and thethin wire material 35 is removed from theelectrodeposit material 55. It is to be noted that thethin wire material 35 is removed by a method similar to a method of removing the material produced by theabove electroforming device 100, and description thereof is therefore omitted. - In this manner, there is produced the tube by electroforming having a plurality of (specifically, eight) hollow portions.
- In the tube by electroforming, since the
partition wall member 88 is disposed between the hollow portions formed by removing thethin wire material 35 so as to partition the tube, each portion forming the periphery of each hollow portion can independently conduct electricity. - It is to be noted that even in the
electroforming device 101, there may be used a thin wire material in which a core portion is made of a metal, a synthetic resin or the like and in which a conductive layer (plating (metal layer (film)), carbon or the like) is disposed on the outer surface of the core portion. Furthermore, there is not any special restriction on a sectional shape of the thin wire material or the like in the same manner as in the thin wire material shown in theelectroforming device 101. - In the present embodiment, the
partition wall member 88 is disposed between thethin wire materials 35 to perform the electroforming, but this is not restrictive, and it is possible to perform the electroforming in a state in which the only thin wire materials are disposed without disposing any partition wall member. - The tube by electroforming may be produced using an electroforming device other than the
electroforming devices - A numeric value indicating a specific dimension (size, length) described in the present embodiment has been described in order to facilitate the understanding, and there is not any intension to especially restrict the dimension. Examples of the dimension include the diameter of the thin wire material, the thickness of the electrodeposit material, the deformation amount or the tensile force of the thin wire material, the thickness of the conductive layer (film) (plating or the like) and the thickness of the partition wall member. These dimensions can arbitrarily be set within a range, when the range is set.
- In the present embodiment, it has been described that the metal is electrodeposited by the electroforming on the outer surface of the thin wire material to cover the thin wire material, but this is not restrictive, and a tube by electroforming may be produced by disposing an electric conductor (metal or the like) in the vicinity of the thin wire material, and electrodepositing the metal on this conductor by the electroforming, whereby the thin wire material is also covered with the electrodeposited metal.
- In the above embodiment, as the electrolyte liquid, there is used a liquid containing nickel sulfamate as a main component, but the electrolyte liquid is not limited to this, and selected in accordance with a type of the metal to be deposited. Examples of the metal to be electrodeposited (deposited) include nickel or an alloy thereof, iron or an alloy thereof, copper or an alloy thereof, cobalt or an alloy thereof, a tungsten alloy and a metal such as a particle dispersed metal. As the electrolyte liquid to deposit the metal, there is used, for example: a liquid containing, as a main component, an aqueous solution of nickel chloride, nickel sulfate, ferrous iron sulfamate, fluoroboric ferrous iron, copper pyrophosphate, copper sulfate, fluoroboric copper, copper borofluoride, copper silicofluoride, copper titanium fluoride, copper alkanolsulfamate, cobalt sulfate, sodium tungstate or the like; or a liquid obtained by dispersing, in the above liquid, fine powder of silicon carbide, tungsten carbide, boron carbide, zirconium oxide, silicon titanate, alumina, diamond or the like,
- Moreover, in the electroforming tank, stirring means for stirring the electrolyte liquid can be disposed. As the stirring means, there is usable, for example: air blowing means; means for sucking the electrolyte liquid and again discharging the liquid into an electrolyte tank; a rotatable stirring blade (propeller); an ultrasonic waves; vibration or the like. However, the stirring means is not limited to them.
- The terms and representations used in the present description are absolutely used for description, and are not restrictive, and there is not any intention to exclude the terms or the representations equivalent to the characteristics described in the present description and a part of the characteristics. Needless to say, various modifications are possible in the scope of the technical idea of the present invention.
- The present invention includes the above constitution, and has the following effects.
- (a) According to the present invention, a thin wire material can be removed from an electrodeposit material or a surrounding material formed by electroforming. The thin wire material is removed using any of methods of: (1) heating and thermally expanding the electrodeposit material or the surrounding material, or cooling and contracting the thin wire material to thereby form a clearance between the electrodeposit material or the surrounding material and the thin wire material; (2) submerging the material into a liquid or applying the liquid to the material, whereby a place with which the thin wire material and the electrodeposit material or the surrounding material are brought into contact is formed so as to easily slip; or (3) pulling the material from one end or both ends, deforming the material so as to reduce a sectional area thereof, and forming the clearance between the thin wire material and the electrodeposit material or the surrounding material, followed by gripping and pulling the material, sucking the material, physically pushing away the material, or blowing a gas or a liquid to push away the material. The material can also be removed by (4) melting the material with heat or a solvent.
When such method is used in removing the thin wire material, and, for example, a thin wire material having a diameter of 10 µm to 85 µm is used, the thin wire material can be removed even from the electrodeposit material or the surrounding material formed on the outer surface of this thin wire material so as to have a thickness of 5 µm or more and 50 µm or less. Therefore, when this thin wire material removing method is used, it is possible to produce, for example, a tube by electroforming usable as a tube for a contact probe or the like and having a fine inner diameter. - (b) According to a method of increasing an amount of an end-portion-side electrodeposit or surrounding material to be formed on the thin wire material to produce the tube by electroforming, for example, in a case where the thin wire material is extracted or pushed away and removed from the electrodeposit material or the surrounding material, a jig, a tool or the like can be caught by an end surface of the portion in which the amount of the electrodeposit material or the surrounding material is increased. Therefore, in this case, the thin wire material can be removed in a state in which the electrodeposit material or the surrounding material is fixed, and therefore the thin wire material is easily removed.
- (c) According to a tube electroforming method in which a deformation amount of a lateral distortion is set to 5% or more of the sectional area at a time when the thin wire material is pulled and extended outwards, since a clearance sufficient for removing the thin wire material can be formed between the thin wire material and the electrodeposit material or the surrounding material, there is a high possibility that the thin wire material can be removed from the electrodeposit material or the surrounding material without any trouble. If the deformation amount of the lateral distortion is only less than 5% of the sectional area, the clearance is not sufficient. Therefore, the trouble sometimes occurs during the removing.
- (d) According to a tube electroforming method in which the thin wire material having a conductive layer disposed on the outer surface thereof is used, and the thin wire material is removed so that the conductive layer remains on the inner surface of the tube by electroforming, it is possible to produce the tube by electroforming having gold plating or the like disposed on the inner surface thereof. In accordance with, for example, a material of the conductive layer disposed on the inner surface of the tube, such tube by electroforming can have an electric conductivity which is more satisfactory than that of a case where the electrodeposit material or the surrounding material only is disposed. Therefore, in this case, the tube is usable as a component suitable for conducting electricity.
It is to be noted that even as to the tube by electroforming having the inner surface provided with a conductive layer constituted of a material different from that of the electrodeposit material or the surrounding material, or the thin wire material having the outer surface provided with the conductive layer constituted of the material different from that of the electrodeposit material or the surrounding material, it is similarly possible to form the tube by electroforming having an electric conductivity which is more satisfactory than that of the case where the electrodeposit material or the surrounding material only is disposed. - (e) According to a tube electroforming method in which there is used a thin wire material having the outer surface provided with at least two or more conductive layers constituted of different materials, for example, the outer conductive layer is made of copper, the inner conductive layer brought into contact with copper is made of gold, and nickel is formed as the electrodeposit material or the surrounding material by the electroforming. In this case, nickel has a satisfactory close contact property with respect to copper rather than gold, copper also has a satisfactory close contact property with respect to gold, and it is therefore possible to produce the tube by electroforming having a satisfactory close contact property.
It is to be noted that as to a tube by electroforming in which the conductive layer constituted of the material different from that of the electrodeposit material or the surrounding material is disposed on the inner surface of the tube and in which a further conductive layer constituted of the material different from that of the conductive layer is disposed between the electrodeposit material or the surrounding material and the above conductive layer, or as to a thin wire material in which the conductive layer constituted of the material different from that of the electrodeposit material or the surrounding material is disposed on the outer surface of the material and in which the further conductive layer constituted of the material different from that of the conductive layer is disposed between a thin wire material base member and the above conductive layer, it is similarly possible to form the tube by electroforming having the satisfactory close contact property between the electrodeposit material or the surrounding material and the conductive layer. - (f) A component including a plurality of hollow portions formed by removing the thin wire material may replace, for example, a component produced by arranging a plurality of tubes each having only one hollow portion, and may be used. According to the tube by electroforming, it is possible to eliminate an operation of arranging the individual tubes. An interval between the hollow portions does not deviate because the portions are fixed with the electrodeposit material or the surrounding material.
- (g) In a case where a partition wall member formed by disposing the conductive layer on the outer surface of an insulator is disposed between the hollow portions, and each portion forming the periphery of each hollow portion can independently conduct electricity, each hollow portion can independently conduct electricity.
- (h) As to a thin wire material having, on opposite ends, portions on which any conductive layer is not disposed, in a case where the portion on which any conductive layer is not disposed is pulled outwards, a tensile force is not directly or easily applied to the conductive layer, the conductive layer is easily separated from a base wire material, and the close contact property between the conductive layer and the electrodeposit material or the surrounding material is not easily impaired.
Claims (13)
- A tube electroforming method comprising the steps of: forming an electrodeposit material (52,53,54,55) or a surrounding material around a thin wire material (32,33,34,35) by electroforming; and removing the thin wire material from the electrodeposit material (52,53,54,55) or the surrounding material,
wherein the thin wire material (32,33,34,35) is removed by pulling the thin wire material (32,33,34,35) from one end or both ends, deforming the thin wire material (32,33,34,35) so as to reduce a sectional area thereof, and forming a clearance between the thin wire material (32,33,34,35) and the electrodeposit material (52,53,54,55) or the surrounding material, followed by gripping and pulling the thin wire material (32,33,34,35), sucking the thin wire material (32,33,34,35), physically pushing away the thin wire material (32,33,34,35), or blowing a gas or a liquid to push away the thin wire material (32,33,34,35);
wherein the thin wire material (32,33,34,35) includes a conductive layer (321;331,332) disposed on an outer surface thereof,
characterized in that masking portions (341) on which the conductive layer (321; 331, 332) is not disposed are formed on opposite ends of the thin wire material (32, 33, 34, 35) ;
wherein the thin wire material (32,33,34,35) is removed by pulling the masking portions (341) so that the conductive layer (321;331,332) remains on an inner surface of a tube. - The tube electroforming method according to claim 1, wherein the thin wire (32,33,34,35) is made of stainless steel, and wherein the conductive layer (321;331,332) is constituted of a material different from that of the electrodeposit material (52,53,54,55) or the surrounding material; wherein the conductive layer (321;331,332) is formed by plating and has a higher conductivity than that of the electrodeposit material (52,53,54,55) or the surrounding material.
- The tube electroforming method according to claim 1 or 2,
wherein a deformation amount of a lateral distortion at a time when the thin wire material (32,33,34,35) is pulled and extended outwards is 5% or more of the sectional area. - The tube electroforming method according to one of the preceding claims,
wherein a thin wire material (33) is used in which at least two conductive layers (331, 332) constituted of different materials are formed on an outer surface of the thin wire material (33), the electrodeposit material (53) or the surrounding material is brought into close contact with the outer conductive layer (332) of the thin wire material (33), and the thin wire material (33) is removed so that the inner conductive layer (331) remains on an inner surface of the tube by electroforming. - The tube electroforming method according to one of the preceding claims,
wherein an inner shape of a hollow portion formed by removing the thin wire material (32,33,34,35) from the electrodeposit material (52,53,54,55) or the surrounding material has a circular sectional shape or a polygonal sectional shape. - The tube electroforming method according to one of the preceding claims,
wherein a plurality of thin wire materials (35) is employed, and the tube by electroforming includes a plurality of hollow portions formed by removing the plurality of thin wire materials (35). - The tube electroforming method according to claim 6,
wherein a partition wall member (88) formed by disposing a conductive layer (881) on an outer surface of an insulating material (880) is disposed between the hollow portions, whereby each portion forming a periphery of each hollow portion independently conducts electricity. - A tube produced by forming an electrodeposit material (52,53,54,55) or a surrounding material around a thin wire material (32,33,34,35) by electroforming, and removing the thin wire material (32,33,34,35) from the electrodeposit material (52,53,54,55) or the surrounding material,
wherein a hollow portion is formed by removing the thin wire material (32,33,34,35) from the electrodeposit material (52,53,54,55) or the surrounding material, an inner diameter of the hollow portion is 10 µm or more and 85 µm or less, when an inner shape of the hollow portion has a circular sectional shape, and a diameter of an inscribed circle of the hollow portion is 10 µm or more and 85 µm or less, when the inner shape of the hollow portion has a polygonal sectional shape;
characterized in that an inner surface of the hollow portion is provided with a conductive layer (321;331, 332) constituted of a material different from that of the electrodeposit material (52, 53,54,55) or the surrounding material. - The tube of claim 8, wherein
there are a plurality of hollow portions formed by removing a corresponding plurality of thin wire materials (35), and
a partition wall member (88) formed by disposing a conductive layer (881) on an outer surface of an insulating material (880) is disposed between the hollow portions, whereby each portion forming a periphery of each hollow portion independently conducts electricity. - The tube according to claim 9, wherein the conductive layer (881) disposed on the outer surface of the partition wall member (88) is constituted to form a part of the hollow portion.
- The tube according to claim 9 or 10, wherein a portion of the partition wall member (88) disposed between the hollow portions disposed adjacent to each other has a thickness of 5 µm or more and 50 µm or less.
- The tube according to claim 9, having a thickness of 5 µm or more and 50 µm or less.
- The tube according to any of the claims 8 to 12, having an inner surface of the tube provided with a conductive layer (331) constituted of a material different from that of the electrodeposit material (53) or the surrounding material, a further conductive layer (332) constituted of a material different from that of the conductive layer (331) being disposed between the electrodeposit material (53) or the surrounding material and the conductive layer (331).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2004/003895 WO2005090645A1 (en) | 2004-03-22 | 2004-03-22 | Electrocast tube producing method, electrocast tube, and thin wire material for production of electrocast tubes |
Publications (3)
Publication Number | Publication Date |
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EP1728897A1 EP1728897A1 (en) | 2006-12-06 |
EP1728897A4 EP1728897A4 (en) | 2008-06-04 |
EP1728897B1 true EP1728897B1 (en) | 2017-07-12 |
Family
ID=34993733
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Application Number | Title | Priority Date | Filing Date |
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EP04722441.5A Expired - Lifetime EP1728897B1 (en) | 2004-03-22 | 2004-03-22 | Electrocast tube producing method and electrocast tube |
Country Status (3)
Country | Link |
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EP (1) | EP1728897B1 (en) |
CN (1) | CN1926264B (en) |
WO (1) | WO2005090645A1 (en) |
Families Citing this family (1)
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CN116536714A (en) * | 2023-05-22 | 2023-08-04 | 东莞市华铭铭牌有限公司 | Manufacturing method for electroplating thick gold on inner wall of electroformed pipe |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
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US4781799A (en) * | 1986-12-08 | 1988-11-01 | Xerox Corporation | Electroforming apparatus and process |
JPH08262902A (en) * | 1995-03-23 | 1996-10-11 | Nau Chem:Kk | Production of thin pipe for fixing roller |
CA2351326C (en) * | 1998-11-26 | 2004-01-27 | Tetsuo Tanaka | Optical fiber connector and ferrule used for it and production method for ferrule |
ATE354689T1 (en) | 1999-12-28 | 2007-03-15 | Smk Kk | METHOD FOR PRODUCING METAL SLEEVES AND DEVICE THEREFOR |
JP2001249252A (en) * | 2000-03-06 | 2001-09-14 | Inou Kk | Ferrule |
JP4288844B2 (en) | 2000-10-24 | 2009-07-01 | 日立電線株式会社 | Extra fine copper alloy wire |
JP2003082490A (en) | 2001-09-07 | 2003-03-19 | Hikari Tekku Kk | Method for manufacturing metal tube |
DE10240221A1 (en) * | 2002-08-28 | 2004-03-11 | G. Rau Gmbh & Co. Kg | Process for the production of thin precision tubes |
JP3889689B2 (en) * | 2002-09-24 | 2007-03-07 | 株式会社ルス・コム | Electroformed pipe manufacturing method and electroformed pipe |
JP3517232B1 (en) * | 2003-09-10 | 2004-04-12 | 株式会社大館製作所 | Method for producing double metal thin tube |
-
2004
- 2004-03-22 CN CN2004800425400A patent/CN1926264B/en not_active Expired - Lifetime
- 2004-03-22 EP EP04722441.5A patent/EP1728897B1/en not_active Expired - Lifetime
- 2004-03-22 WO PCT/JP2004/003895 patent/WO2005090645A1/en active Application Filing
Also Published As
Publication number | Publication date |
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EP1728897A4 (en) | 2008-06-04 |
CN1926264B (en) | 2010-09-29 |
EP1728897A1 (en) | 2006-12-06 |
CN1926264A (en) | 2007-03-07 |
WO2005090645A1 (en) | 2005-09-29 |
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