JP2003193282A - Electrodeposition drum for producing metallic foil and method of producing metallic foil using the same - Google Patents

Electrodeposition drum for producing metallic foil and method of producing metallic foil using the same

Info

Publication number
JP2003193282A
JP2003193282A JP2001395702A JP2001395702A JP2003193282A JP 2003193282 A JP2003193282 A JP 2003193282A JP 2001395702 A JP2001395702 A JP 2001395702A JP 2001395702 A JP2001395702 A JP 2001395702A JP 2003193282 A JP2003193282 A JP 2003193282A
Authority
JP
Japan
Prior art keywords
insulating material
metal foil
foil
drum
electrodeposition drum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001395702A
Other languages
Japanese (ja)
Inventor
Satoru Suenaga
哲 末永
Tadayuki Tamaoki
忠之 玉置
Hirohisa Seto
宏久 瀬戸
Kunihiro Fukui
国博 福井
Masaya Kimoto
雅也 木本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Steel Products Inc
Original Assignee
Sumitomo Metal Steel Products Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Steel Products Inc filed Critical Sumitomo Metal Steel Products Inc
Priority to JP2001395702A priority Critical patent/JP2003193282A/en
Publication of JP2003193282A publication Critical patent/JP2003193282A/en
Pending legal-status Critical Current

Links

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electrodeposition drum by which metallic foil free from edge builds can be produced, and also, metallic foil of a plurality of strips can be produced, and to provide a method or producing metallic foil using the same. <P>SOLUTION: In the electrodeposition drum 1-1 for producing metallic foil, metal is precipitated over the surface by electrolysis, and is thereafter peeled to produce foil. Two or more insulating materials 6 with a width of ≤2 mm are buried so as to be surrounded at positions far from insulating materials 7 at the edge parts. In the method, two edge foil, and electrolytic metal foil of one strip or the plurality of strips are obtained. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、金属箔を電解方式
で製造するための電着ドラムおよびそれを用いる金属箔
の製造方法に関し、特にエッジビルドのない金属箔が製
造でき、またそのような金属箔を切断することなく複数
条製造することができる電着ドラムおよびそのドラムを
用いた金属箔の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrodeposition drum for producing a metal foil by an electrolytic method and a method for producing a metal foil using the same, and in particular, a metal foil without edge build can be produced, and The present invention relates to an electrodeposition drum capable of producing a plurality of strips without cutting the metal foil, and a method for producing a metal foil using the drum.

【0002】[0002]

【従来の技術】電解金属箔は、ステンレス鋼、クロムめ
っきを施した鋼またはチタンなどのめっき付着性のよく
ない材料からなる電着ドラムを用い、ドラム表面に電解
によってめっきを行い、形成されためっき層を連続的に
剥離することで製造される。
2. Description of the Related Art Electrolytic metal foils are formed by electrolytically plating the drum surface using an electrodeposition drum made of a material with poor plating adhesion such as stainless steel, chrome-plated steel or titanium. It is manufactured by continuously peeling off the plating layer.

【0003】図1(a)は電解析出法の原理を説明する模
式図であり、(b)は電着ドラムの一部断面図、(c)は電解
金属箔の端部断面模式図である。
FIG. 1A is a schematic view for explaining the principle of the electrolytic deposition method, FIG. 1B is a partial sectional view of an electrodeposition drum, and FIG. 1C is a schematic end sectional view of an electrolytic metal foil. is there.

【0004】電解金属箔4(以下、これを単に「金属
箔」という)は、回転する電着ドラム1と固定の陽極2と
の間に電解液3と電流とを流し、電着ドラム表面に金属
を析出させ、それを連続的に剥離回収して製造される。
The electrolytic metal foil 4 (hereinafter, simply referred to as "metal foil") causes an electrolytic solution 3 and an electric current to flow between a rotating electrodeposition drum 1 and a fixed anode 2 to form a layer on the surface of the electrodeposition drum. It is manufactured by depositing metal and continuously peeling and recovering it.

【0005】ドラム1の両端部には、図1(b)に示すよう
に端部絶縁材7が被覆されている。このため、電着ドラ
ム表面に析出する金属箔4は、電着ドラム表面と絶縁材
との境界部7-1で電解電流の集中が生じ、図1(c)に示す
ように、端部4-1の厚さが大きくなる。この現象は「エ
ッジビルド」と称され、エッジビルドが生じた箔を巻き
取ると、巻き取り形状が鼓形となり、箔の端部から亀裂
が生じることがある。
Both ends of the drum 1 are covered with an end insulating material 7 as shown in FIG. 1 (b). Therefore, in the metal foil 4 deposited on the surface of the electrodeposition drum, concentration of electrolytic current occurs at the boundary portion 7-1 between the surface of the electrodeposition drum and the insulating material, and as shown in FIG. -1 increases the thickness. This phenomenon is called "edge build", and when the foil with the edge build is wound up, the winding shape becomes a drum shape, and a crack may occur from the end of the foil.

【0006】このエッジビルドの発生を防止するには、
陽極の幅を電着ドラムの電解部の幅よりも狭くしたり、
電解部の両端部の陽極と陰極との間に遮蔽板を設ける方
法がある。しかし、これらの対策を講じても、エッジビ
ルドを完全に防止することは困難であり、巻き取り前に
スリッターなどで機械的に切断している。
To prevent the occurrence of this edge build,
Make the width of the anode narrower than the width of the electrolysis section of the electrodeposition drum,
There is a method of providing a shielding plate between the anode and the cathode at both ends of the electrolysis section. However, even if these measures are taken, it is difficult to completely prevent the edge build, and mechanical cutting is performed by a slitter or the like before winding.

【0007】金属箔の製造面では、生産効率を上げるた
め広幅の電着ドラム(たとえば、1mを超えるもの)が用
いられている。しかし、金属箔を使用する場合のハンド
リング面では、狭幅(たとえば、数mmから500mmまで)
のものが好まれる。このためには、製造された広幅の金
属箔を別ラインのスリッターなどで切断する必要があ
る。しかし、機械的に切断すると、金属箔の切断部には
変形(カエリ、バリ、耳伸びなど)を生じることがあ
り、金属箔の厚さが薄くなるほど顕著になる。
In terms of manufacturing metal foil, a wide electrodeposition drum (for example, one having a length of more than 1 m) is used in order to improve production efficiency. However, the handling surface when using metal foil is narrow (for example, from several mm to 500 mm).
Things are preferred. For this purpose, it is necessary to cut the produced wide metal foil with a slitter or the like in another line. However, when cut mechanically, the cut portion of the metal foil may be deformed (burrs, burrs, ear extensions, etc.), which becomes more remarkable as the thickness of the metal foil becomes thinner.

【0008】これを解消する方法として、電着ドラムの
上方に複数個のプーリを設け、電着ドラムとそれぞれの
プーリとの間に絶縁性のベルト(帯状体)を掛けること
によって、金属箔のエッジ部のバリ、き裂などの発生を
防止し、さらに金属箔の幅を自由に調整可能とした金属
箔の製造方法およびその装置(特開昭53-146230号公
報、参照)が提案されている。これは、電着ドラム表面
の幅(軸)方向に導電部と絶縁部とを交互に設けること
によって、導電部に金属箔を析出させて導電部の幅と同
じ幅の金属箔を得るものである。
As a method of solving this, a plurality of pulleys are provided above the electrodeposition drum, and an insulating belt (belt) is hung between the electrodeposition drum and the respective pulleys to form a metal foil. A method of manufacturing a metal foil and an apparatus thereof (see Japanese Patent Laid-Open No. 53-146230, which prevents the occurrence of burrs and cracks at the edge portion and allows the width of the metal foil to be freely adjusted, have been proposed. There is. This is to obtain a metal foil having the same width as the conductive portion by depositing a metal foil on the conductive portion by alternately providing the conductive portion and the insulating portion in the width (axis) direction of the surface of the electrodeposition drum. is there.

【0009】[0009]

【発明が解決しようとする課題】絶縁性ベルトを用いる
方法では、金属箔の剥離回収時のエッジ部のバリからの
き裂発生を防止することができるが、エッジビルドの発
生を防止することができない。このため、金属箔をコイ
ル状に巻き取ったとき鼓状になって破断することがあ
る。これを防ぐためには、金属箔のエッジ部を電着ドラ
ムから剥離した直後に機械的に切断する(スリットす
る)必要がある。
In the method using the insulating belt, it is possible to prevent the occurrence of cracks from burrs at the edge portion when the metal foil is peeled and recovered, but it is possible to prevent the occurrence of edge build. Can not. For this reason, when the metal foil is wound into a coil, it may be broken like a drum. In order to prevent this, it is necessary to mechanically cut (slit) the edge portion of the metal foil immediately after peeling it from the electrodeposition drum.

【0010】本発明の目的は、エッジビルドのない金属
箔を製造することができ、また複数条の金属箔を製造す
ることができる電着ドラムおよびそれを用いて金属箔を
製造する方法を提供することにある。
An object of the present invention is to provide an electrodeposition drum capable of producing a metal foil having no edge build and capable of producing a plurality of strips of metal foil, and a method for producing a metal foil using the same. To do.

【0011】[0011]

【課題を解決するための手段】本発明者らは、金属箔の
エッジビルドの生成および端部から破断する原因を調べ
るため、電着ドラムに絶縁テープなどを巻き付け、絶縁
部と導電部との境界(図1(b)の符号7-1、参照)に生成
する金属箔の断面を調査した。その結果、下記の知見が
得られた。
In order to investigate the cause of the edge build-up of metal foil and the breakage from the end, the inventors of the present invention wound an electrodeposition drum with an insulating tape or the like to separate the insulating part from the conductive part. The cross section of the metal foil formed at the boundary (see reference numeral 7-1 in FIG. 1 (b)) was investigated. As a result, the following findings were obtained.

【0012】(1)長期間使用すると絶縁材の接着力が低
下し、めっき液の浸透で電解が生じ、図1(c)に示すよ
うに、端部絶縁材7と電着ドラム1の表面との間に電解液
が侵入すると、この部分にも金属がめっきされるので、
箔の端部には隙間めっき部4-2が生じることがある。こ
のような金属箔を電着ドラムから剥離すると、隙間めっ
き部4-2が端部絶縁材に押さえられているため、金属箔
の端部に亀裂が生じる。
(1) When it is used for a long period of time, the adhesive strength of the insulating material decreases, and electrolysis occurs due to the penetration of the plating solution. As shown in FIG. 1 (c), the end insulating material 7 and the surface of the electrodeposition drum 1 are When the electrolytic solution enters between and, the metal is also plated on this part, so
A gap plating portion 4-2 may occur at the edge of the foil. When such a metal foil is peeled off from the electrodeposition drum, the gap plated portion 4-2 is pressed by the end insulating material, so that a crack is generated at the end of the metal foil.

【0013】(2)複数条の金属箔を得るために電解ドラ
ムの中央部に絶縁テープを設けた場合には、絶縁テープ
の幅を小さくすれば金属箔のエッジビルドを低減でき
る。
(2) When an insulating tape is provided at the center of the electrolytic drum in order to obtain a plurality of strips of metal foil, the edge buildup of the metal foil can be reduced by reducing the width of the insulating tape.

【0014】(3)絶縁材を電着ドラムに埋め込み、その
幅を小さくすることによって、さらに金属箔のエッジビ
ルドの発生を低減できる。
(3) By embedding the insulating material in the electrodeposition drum and reducing its width, the occurrence of edge buildup of the metal foil can be further reduced.

【0015】(4)端部絶縁材7から離れた位置に幅2mm以
下の絶縁材を周設すれば、絶縁材の両端に生成する金属
箔にはエッジビルドが生成しない。
(4) If an insulating material having a width of 2 mm or less is provided around the end insulating material 7, edge build-up does not occur in the metal foil formed at both ends of the insulating material.

【0016】これらの知見から、上記(1)の現象は防止
できないと考えたので、本発明ではこの部分をエッジ箔
として除去することにした。その除去の方法は、周回す
る絶縁材を電着ドラム表面に埋め込み、その幅を小さく
することとした。
From these findings, it was considered that the above phenomenon (1) could not be prevented, so in the present invention, this portion was removed as an edge foil. As a method of removing the insulating material, a circulating insulating material was embedded in the surface of the electrodeposition drum to reduce its width.

【0017】本発明の要旨は、図2に示す下記の電着
ドラムおよび下記に示すそれを用いた金属箔の製造方
法にある。
The gist of the present invention resides in the following electrodeposition drum shown in FIG. 2 and the method for producing a metal foil using the following electrodeposition drum.

【0018】電解によって金属を表面に析出させた
後、それを剥離して箔を製造する電着ドラムであって、
端部の絶縁材7から離れた位置に幅が2mm以下である絶縁
材6が二つ以上周回して埋め込まれている金属箔製造用
電着ドラム1-1。
An electrodeposition drum for producing a foil by depositing a metal on a surface by electrolysis and then peeling it off,
Electrodeposited drum 1-1 for metal foil production, in which two or more insulating materials 6 each having a width of 2 mm or less are embedded by being wound around at least two positions away from the insulating material 7.

【0019】電解によって金属を電着ドラムの表面に
析出させた後、それを剥離して箔を製造する方法であっ
て、陰極として端部の絶縁材7から離れた位置に幅が2mm
以下である絶縁材6が二つ以上周回して埋め込まれた電
着ドラム1-1を用い、二つのエッジ箔および一条または
複数条の電解金属箔を得る方法。
A method for producing a foil by depositing a metal on the surface of an electrodeposition drum by electrolysis and then peeling it off, wherein the width is 2 mm at a position away from the insulating material 7 at the end as a cathode.
A method of obtaining two edge foils and one or a plurality of strips of electrolytic metal foil by using an electrodeposition drum 1-1 in which two or more insulating materials 6 are embedded by being wound around the following.

【0020】[0020]

【発明の実施の形態】本発明の電着ドラムは、絶縁材が
ドラム両端部の絶縁材から少なくとも5mm以上離れた位
置に設けられ、さらに必要とする金属箔の幅に応じた位
置に設けられる。
BEST MODE FOR CARRYING OUT THE INVENTION In the electrodeposition drum of the present invention, the insulating material is provided at a position separated from the insulating material at both ends of the drum by at least 5 mm or more, and further provided at a position corresponding to the required width of the metal foil. .

【0021】図2は、本発明の電着ドラムとそれを製造
する工程を示す概念図であり、(a)はドラム表面に絶縁
材を埋め込むための溝を形成した状態を示す図、(b)は
溝に絶縁材を埋め込んだ状態を示す図、(c)は図(b)の斜
視図である。
FIG. 2 is a conceptual diagram showing the electrodeposition drum of the present invention and a process for manufacturing the same, and FIG. 2A is a diagram showing a state in which grooves for embedding an insulating material are formed on the drum surface, and FIG. ) Is a view showing a state where an insulating material is embedded in the groove, and (c) is a perspective view of FIG. (B).

【0022】電着ドラム1-1は、ステンレス鋼、クロム
めっきされた鋳鉄、クロムめっきされた鋼、チタン、チ
タンをライニングした材料などから製作される。
The electrodeposition drum 1-1 is made of stainless steel, chrome-plated cast iron, chrome-plated steel, titanium, titanium-lined material, or the like.

【0023】絶縁材6を埋め込むための溝5は、図2(a)
に示すように、ドラム外周部を周回させ、断面がU形ま
たはV形などで旋盤加工によって形成される。絶縁材6
(絶縁性樹脂)は、図2(b)に示すように、溝の中に埋
め込まれる。絶縁材6の表面は、導電部と同じレベル、
または僅かに窪ますのが望ましい。
The groove 5 for embedding the insulating material 6 is shown in FIG.
As shown in, the outer peripheral portion of the drum is circulated, and the cross section is U-shaped or V-shaped and is formed by lathe processing. Insulation 6
The (insulating resin) is embedded in the groove as shown in FIG. The surface of the insulating material 6 has the same level as the conductive part,
Or it is desirable to make a slight depression.

【0024】絶縁材6をドラム両端の絶縁材7からA(5mm
以上)だけ離した位置に設けるのは、金属箔に発生する
エッジビルドを防止するためである。図3は、エッジビ
ルドの発生と絶縁材の幅との関係を説明するための模式
図であり、(a)は絶縁材の幅を2mmとした場合、(b)は絶
縁材の幅を3mmとした場合である。
Insulating material 6 from insulating material 7 on both ends of the drum to A (5 mm
The reason for providing them at positions separated by (above) is to prevent edge build-up that occurs in the metal foil. FIG. 3 is a schematic diagram for explaining the relationship between the occurrence of edge build and the width of the insulating material, where (a) is the width of the insulating material is 2 mm, and (b) is the width of the insulating material is 3 mm. That is the case.

【0025】絶縁材6をドラム両端の端部絶縁材7からA
だけ離れた位置に設けると、A部にはエッジ箔4-3が生じ
る。エッジ箔4-3には、図3(a)および(b)に示すよう
に、エッジビルド4-1が生じる。しかし、端部絶縁材7か
らAだけ離れた位置に2mmの絶縁材6を設けると、図3(a)
に示すように、金属箔4にはエッジビルドが発生しな
い。また、エッジ箔4-3が絶縁材6に接する位置にもエッ
ジビルドの発生が認められない。
Insulating material 6 from end insulating material 7 at both ends of the drum to A
Edge foil 4-3 is generated in the A portion if provided at a position apart from each other. Edge build-up 4-1 occurs on the edge foil 4-3 as shown in FIGS. 3 (a) and 3 (b). However, if the insulating material 6 of 2 mm is provided at a position separated from the end insulating material 7 by A, as shown in FIG.
As shown in, no edge build occurs on the metal foil 4. In addition, no edge build is observed at the position where the edge foil 4-3 contacts the insulating material 6.

【0026】絶縁材6の幅を3mmとすれば、図3(b)に示
すように、金属箔4-4およびエッジ箔4-6が絶縁材6-1に
接する位置にエッジビルド4-5および4-7が発生する。
If the width of the insulating material 6 is 3 mm, as shown in FIG. 3 (b), the edge build 4-5 is located at the position where the metal foil 4-4 and the edge foil 4-6 are in contact with the insulating material 6-1. And 4-7 occur.

【0027】以上、説明したように絶縁材6の幅を2mm以
下にすれば、エッジビルドの発生を防止できるので、図
2(c)に示すように、電着ドラム1-1の長手方向の中央部
に幅2mm以下の絶縁材6-2を設ければ、エッジビルドのな
い金属箔が二条得られる。
As described above, if the width of the insulating material 6 is 2 mm or less, the occurrence of edge build can be prevented. Therefore, as shown in FIG. If the insulating material 6-2 having a width of 2 mm or less is provided in the central portion, two metal foils without edge build can be obtained.

【0028】絶縁材6の幅は、2mm以下であれば小さいほ
ど金属箔端面の形状は良くなり、また金属箔の製造歩留
まりが高くなる。しかし、溝の加工上および絶縁材を埋
め込むためには、その下限を0.05mm程度とするのが望ま
しい。
If the width of the insulating material 6 is 2 mm or less, the shape of the end face of the metal foil becomes better and the manufacturing yield of the metal foil becomes higher. However, it is desirable to set the lower limit to about 0.05 mm in order to process the groove and fill the insulating material.

【0029】絶縁材6には、電解液に侵されない性質を
有する材料、例えばエポキシ樹脂、珪素樹脂、ポリエチ
レン、ゴムなどが使用できる。また、電解液に侵されな
ければ、無機材料(たとえば、アルミナ、シリカなど)
であってもよい。
As the insulating material 6, a material having a property not to be attacked by the electrolytic solution, for example, epoxy resin, silicon resin, polyethylene, rubber or the like can be used. Inorganic materials (for example, alumina, silica, etc.) if not attacked by the electrolyte
May be

【0030】本発明の電着ドラムを用いて製造した金属
箔は、エッジビルドがないので機械的な切断を行う必要
がない。また、平坦に巻き取ることができるので、端部
から破断することもない。
The metal foil manufactured by using the electrodeposition drum of the present invention does not have edge build, so that it is not necessary to perform mechanical cutting. Further, since it can be wound up flat, it does not break from the end.

【0031】[0031]

【実施例】金属箔の製造実験は、図1に示すような電着
ドラム式金属箔製造装置を用い、厚さが15μmおよび30
μmのニッケル箔を製造した。
EXAMPLE A metal foil manufacturing experiment was performed using an electrodeposition drum type metal foil manufacturing apparatus as shown in FIG.
A μm nickel foil was produced.

【0032】電着ドラムは、図2に示すような直径が40
0mm、長さが200mmの純チタン製の中空ロールであり、ド
ラムの両端部には絶縁材7が被覆されており、電解部は
幅が160mm、長さが600mmである。電着ドラムの表面に
は、表1に示す位置に絶縁材6を周設した。
The electrodeposition drum has a diameter of 40 mm as shown in FIG.
It is a hollow roll made of pure titanium with a length of 0 mm and a length of 200 mm, the both ends of the drum are covered with an insulating material 7, and the electrolytic portion has a width of 160 mm and a length of 600 mm. An insulating material 6 was provided around the surface of the electrodeposition drum at the position shown in Table 1.

【0033】[0033]

【表1】 [Table 1]

【0034】絶縁材6には、エポキシ樹脂(二液タイ
プ:神東塗料製ネオゴーセWP-NS)およびシリコーン樹
脂(東レ・ダウコーニング・シリコーン社製SH780)を
用いた。
As the insulating material 6, an epoxy resin (two-component type: Neogose WP-NS manufactured by Shinto Paint Co., Ltd.) and a silicone resin (SH780 manufactured by Toray Dow Corning Silicone Co., Ltd.) were used.

【0035】めっき浴は、硫酸ニッケルを250g/L、塩
化ニッケルを45g/Lおよびほう酸を40g/L混合し、pHが
3.5の溶液とした。
The plating bath was prepared by mixing 250 g / L of nickel sulfate, 45 g / L of nickel chloride and 40 g / L of boric acid, and adjusting the pH.
The solution was 3.5.

【0036】電解条件は、浴温度を50℃、電流密度を20
A/dmとした。
The electrolysis conditions are a bath temperature of 50 ° C. and a current density of 20.
It was set to A / dm 2 .

【0037】表1から明らかなように、発明例の番号1
〜8の金属箔は、絶縁材(図2の符号6、参照)の幅を
2.0mm以下としたので、端部の厚さと端から100mm離れた
位置の厚さとは差がなく、エッジビルドの発生はなかっ
た。
As is apparent from Table 1, the invention example No. 1
~ 8 metal foil, the width of the insulating material (reference numeral 6 in Figure 2)
Since the thickness was 2.0 mm or less, there was no difference between the thickness of the end portion and the thickness 100 mm away from the end, and no edge build occurred.

【0038】これに対して、比較例の番号9〜12の金属
箔は、絶縁材を端部絶縁材と間隔をあけずに設けたの
で、端部の厚さの方が100mm離れた位置の厚さよりも大
きくなり、エッジビルドの発生が認められた。比較例の
番号12〜14の金属箔は、絶縁材料の幅が3.0mmであった
ので、端部の厚さの方が100mm離れた位置の厚さよりも
大きくなり、エッジビルドの発生が認められた。番号15
の金属箔は、絶縁材を設けなかったので、5μmのエッ
ジビルドの発生が認められた。
On the other hand, in the metal foils of Nos. 9 to 12 of the comparative example, since the insulating material was provided without a gap from the end insulating material, the thickness of the end portion was 100 mm apart. It became larger than the thickness, and the occurrence of edge build was observed. In the metal foils of Nos. 12 to 14 of the comparative example, the width of the insulating material was 3.0 mm, so the thickness of the end portion was larger than the thickness at the position 100 mm apart, and the occurrence of edge buildup was recognized. It was Number 15
Since no insulating material was provided for the metal foil of No. 3, the occurrence of edge build-up of 5 μm was observed.

【0039】[0039]

【発明の効果】本発明の電着ドラムは、端部絶縁材から
離れた位置に周回する帯状の絶縁材が埋め込まれている
ので、導電部に析出する金属箔の端部に形成されるエッ
ジビルドの発生をなくすことができる。この電着ドラム
を用いて製造した金属箔は、端部の厚さが大きくならな
いので、端部を切断する必要がない。また、絶縁材は、
電着ドラムの任意の位置に設けることができるので、機
械的にスリットすることなく端部断面形状のよい任意の
幅の金属箔を得ることができる。
In the electrodeposition drum of the present invention, since the belt-shaped insulating material that circulates is embedded at a position away from the end insulating material, the edge formed at the end of the metal foil deposited on the conductive portion. You can eliminate the occurrence of build. Since the metal foil manufactured using this electrodeposition drum does not have a large thickness at the end, it is not necessary to cut the end. Also, the insulating material is
Since it can be provided at any position on the electrodeposition drum, it is possible to obtain a metal foil having an arbitrary width with a good end cross-sectional shape without mechanical slitting.

【図面の簡単な説明】[Brief description of drawings]

【図1】電解析出法の原理を説明する模式図である。FIG. 1 is a schematic diagram illustrating the principle of an electrolytic deposition method.

【図2】本発明の電着ドラム製造工程を示す概念図であ
り、(a)はドラム表面に絶縁材を埋め込むための溝を形
成した状態を示す図、(b)は溝に絶縁材を埋め込んだ状
態を示す図、(c)は図(b)の斜視図である。
FIG. 2 is a conceptual diagram showing an electrodeposition drum manufacturing process of the present invention, in which (a) shows a state in which a groove for embedding an insulating material is formed on the drum surface, and (b) shows an insulating material in the groove. The figure which shows the state which was embedded, (c) is a perspective view of figure (b).

【図3】エッジビルドの発生と絶縁材の幅との関係を説
明するための模式図であり、(a)は絶縁材の幅を2mmとし
た場合、(b)は絶縁材の幅を3mmとした場合である。
FIG. 3 is a schematic diagram for explaining the relationship between the occurrence of edge build and the width of the insulating material, where (a) is the width of the insulating material is 2 mm, and (b) is the width of the insulating material is 3 mm. That is the case.

【符号の説明】[Explanation of symbols]

1.電着ドラム 2.陽極 3.電解液 4.金属箔 5.溝 6,7.絶縁材 1. Electroplated drum 2. Anode 3. Electrolyte 4. Metal foil 5. Groove 6,7. Insulating material

フロントページの続き (72)発明者 瀬戸 宏久 兵庫県尼崎市扶桑町1番21号住友金属建材 株式会社内 (72)発明者 福井 国博 大阪府大阪市中央区北浜4丁目5番33号住 友金属工業株式会社内 (72)発明者 木本 雅也 大阪府大阪市中央区北浜4丁目5番33号住 友金属工業株式会社内Continued front page    (72) Inventor Hirohisa Seto             Sumitomo Metal Building Materials 1-21 Fuso-cho Amagasaki City Hyogo Prefecture             Within the corporation (72) Inventor Kunihiro Fukui             4-533 Kitahama, Chuo-ku, Osaka-shi, Osaka Prefecture             Tomo Metal Industry Co., Ltd. (72) Inventor Masaya Kimoto             4-533 Kitahama, Chuo-ku, Osaka-shi, Osaka Prefecture             Tomo Metal Industry Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】電解によって金属を表面に析出させた後、
それを剥離して箔を製造する電着ドラムであって、端部
の絶縁材から離れた位置に幅が2mm以下である絶縁材が
二つ以上周回して埋め込まれていることを特徴とする金
属箔製造用電着ドラム。
1. After depositing a metal on a surface by electrolysis,
An electrodeposition drum for peeling it off to produce a foil, characterized in that two or more insulating materials each having a width of 2 mm or less are embedded at a position apart from the insulating material at the end. Electrodeposited drum for metal foil production.
【請求項2】電解によって金属を電着ドラムの表面に析
出させた後、それを剥離して箔を製造する方法であっ
て、陰極として端部の絶縁材から離れた位置に幅が2mm
以下である絶縁材が二つ以上周回して埋め込まれた電着
ドラムを用い、二つのエッジ箔および一条または複数条
の電解金属箔を得ることを特徴とする金属箔の製造方
法。
2. A method for producing a foil by depositing a metal on the surface of an electrodeposition drum by electrolysis and then peeling it off to form a foil having a width of 2 mm at a position away from an insulating material at an end.
A method for producing a metal foil, characterized in that two edge foils and one or a plurality of strips of electrolytic metal foil are obtained by using an electrodeposition drum in which two or more of the following insulating materials are embedded in a circle.
JP2001395702A 2001-12-27 2001-12-27 Electrodeposition drum for producing metallic foil and method of producing metallic foil using the same Pending JP2003193282A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001395702A JP2003193282A (en) 2001-12-27 2001-12-27 Electrodeposition drum for producing metallic foil and method of producing metallic foil using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001395702A JP2003193282A (en) 2001-12-27 2001-12-27 Electrodeposition drum for producing metallic foil and method of producing metallic foil using the same

Publications (1)

Publication Number Publication Date
JP2003193282A true JP2003193282A (en) 2003-07-09

Family

ID=27602007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001395702A Pending JP2003193282A (en) 2001-12-27 2001-12-27 Electrodeposition drum for producing metallic foil and method of producing metallic foil using the same

Country Status (1)

Country Link
JP (1) JP2003193282A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010201485A (en) * 2009-03-05 2010-09-16 Nippon Steel Corp Mold for continuous casting
CN101922025A (en) * 2010-05-20 2010-12-22 西安航天远征流体控制股份有限公司 Foil generating machine lead anode fly knife device
KR101620671B1 (en) 2013-12-24 2016-05-12 주식회사 포스코 Master roll and method for fabricating micro metal wires
KR20160077334A (en) * 2014-12-22 2016-07-04 주식회사 포스코 Master roll for fabricating micro metal wires and method for fabricating micro metal wires using the same
JP2018059191A (en) * 2016-09-30 2018-04-12 日立金属株式会社 Cathode drum for producing metallic foil and production method of metallic foil

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010201485A (en) * 2009-03-05 2010-09-16 Nippon Steel Corp Mold for continuous casting
CN101922025A (en) * 2010-05-20 2010-12-22 西安航天远征流体控制股份有限公司 Foil generating machine lead anode fly knife device
KR101620671B1 (en) 2013-12-24 2016-05-12 주식회사 포스코 Master roll and method for fabricating micro metal wires
KR20160077334A (en) * 2014-12-22 2016-07-04 주식회사 포스코 Master roll for fabricating micro metal wires and method for fabricating micro metal wires using the same
KR101674760B1 (en) * 2014-12-22 2016-11-10 주식회사 포스코 Master roll for fabricating micro metal wires and method for fabricating micro metal wires using the same
JP2018059191A (en) * 2016-09-30 2018-04-12 日立金属株式会社 Cathode drum for producing metallic foil and production method of metallic foil

Similar Documents

Publication Publication Date Title
EP0252139B1 (en) A process and apparatus for electroplating copper foil
JP5684328B2 (en) Method for producing surface roughened copper plate and surface roughened copper plate
US5681443A (en) Method for forming printed circuits
US4490218A (en) Process and apparatus for producing surface treated metal foil
EP3309278B1 (en) Method for manufacturing electrolytic aluminum foil
EP3623502A1 (en) Apparatus for manufacturing electrolytic copper foil
JP2003193282A (en) Electrodeposition drum for producing metallic foil and method of producing metallic foil using the same
US4692221A (en) In-situ dendritic treatment of electrodeposited foil
CA1046446A (en) Production of metallic strands
EP0250195A2 (en) Double matte finish copper foil
GB2320724A (en) Method for producing metal foil by electroforming
JP2015043391A (en) Method for manufacturing wiring substrate
KR102372707B1 (en) Carrier material for forming perforated metal foil and perforated metal foil with carrier material
TW202235689A (en) Metal filled microstructure and manufacturing method for metal filled microstructure
JP3416620B2 (en) Electrolytic copper foil manufacturing apparatus and electrolytic copper foil manufacturing method
JP3288986B2 (en) Electromagnetic wave shield
WO2021153647A1 (en) Metal foil and production method therefor, and method for processing electrodeposition drum to be used for said production method
JP6709498B2 (en) Method for producing aluminum foil and cathode drum for producing aluminum foil
JPH08100288A (en) Production of metallic mesh foil
TWI630856B (en) Method for manufacturing wiring substrate
KR100822092B1 (en) Method and apparatus for manufacturing copper foil using super fine pitch printed circuit board, copper foil manufactured using the method
JP2006274363A (en) Cathode for manufacturing metallic fiber and metallic fiber manufacturing apparatus
JP2002173792A (en) Method for manufacturing metallic product
KR101620671B1 (en) Master roll and method for fabricating micro metal wires
EP0297178A1 (en) Electrodeposition of metals