EP1680948A2 - Einrichtung zur steuerung der elektronischen temperatur in einem ecr-plasma - Google Patents

Einrichtung zur steuerung der elektronischen temperatur in einem ecr-plasma

Info

Publication number
EP1680948A2
EP1680948A2 EP04805372A EP04805372A EP1680948A2 EP 1680948 A2 EP1680948 A2 EP 1680948A2 EP 04805372 A EP04805372 A EP 04805372A EP 04805372 A EP04805372 A EP 04805372A EP 1680948 A2 EP1680948 A2 EP 1680948A2
Authority
EP
European Patent Office
Prior art keywords
plasma chamber
rce
electrons
moderator
chamber according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04805372A
Other languages
English (en)
French (fr)
Inventor
Denis Hitz
David Cormier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of EP1680948A2 publication Critical patent/EP1680948A2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns

Definitions

  • the general field of the invention is that of producing multicharged ion currents in a plasma chamber, such as an RCE ion source or a plasma machine.
  • the invention relates more particularly to a device intended to control the electronic temperature in an RCE plasma.
  • the function of “ion sources” with Cyclotron Electron Resonance (“RCE”, or “ECR” in English) is to produce, on the one hand, ionic intensities ranging from ⁇ A to mA, and on the other hand a wide range of charge states.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
EP04805372A 2003-11-04 2004-11-03 Einrichtung zur steuerung der elektronischen temperatur in einem ecr-plasma Withdrawn EP1680948A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0312934A FR2861947B1 (fr) 2003-11-04 2003-11-04 Dispositif pour controler la temperature electronique dans un plasma rce
PCT/FR2004/002821 WO2005046296A2 (fr) 2003-11-04 2004-11-03 Dispositif pour controler la temperature electronique dans un plasma rce

Publications (1)

Publication Number Publication Date
EP1680948A2 true EP1680948A2 (de) 2006-07-19

Family

ID=34429886

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04805372A Withdrawn EP1680948A2 (de) 2003-11-04 2004-11-03 Einrichtung zur steuerung der elektronischen temperatur in einem ecr-plasma

Country Status (7)

Country Link
US (1) US20070266948A1 (de)
EP (1) EP1680948A2 (de)
JP (1) JP2007511041A (de)
KR (1) KR20060108650A (de)
CN (1) CN1875668A (de)
FR (1) FR2861947B1 (de)
WO (1) WO2005046296A2 (de)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475798A1 (fr) * 1980-02-13 1981-08-14 Commissariat Energie Atomique Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede
US4447732A (en) * 1982-05-04 1984-05-08 The United States Of America As Represented By The United States Department Of Energy Ion source
FR2556498B1 (fr) * 1983-12-07 1986-09-05 Commissariat Energie Atomique Source d'ions multicharges a plusieurs zones de resonance cyclotronique electronique
US4717178A (en) * 1986-06-03 1988-01-05 Mueller Co. Frangible coupling for barrel sections of a fire hydrant
JPH0270064A (ja) * 1988-09-02 1990-03-08 Nippon Telegr & Teleph Corp <Ntt> プラズマバッチ処理装置
FR2681186B1 (fr) * 1991-09-11 1993-10-29 Commissariat A Energie Atomique Source d'ions a resonance cyclotronique electronique et a injection coaxiale d'ondes electromagnetiques.
US5391962A (en) * 1992-07-13 1995-02-21 The United States Of America As Represented By The Secretary Of The Army Electron beam driven negative ion source
JPH06333523A (ja) * 1993-05-26 1994-12-02 Nichimen Denshi Koken Kk Ｅｃｒ放電イオン源
US5506475A (en) * 1994-03-22 1996-04-09 Martin Marietta Energy Systems, Inc. Microwave electron cyclotron electron resonance (ECR) ion source with a large, uniformly distributed, axially symmetric, ECR plasma volume
JPH1074600A (ja) * 1996-05-02 1998-03-17 Tokyo Electron Ltd プラズマ処理装置
US5703375A (en) * 1996-08-02 1997-12-30 Eaton Corporation Method and apparatus for ion beam neutralization
DE19929278A1 (de) * 1998-06-26 2000-02-17 Nissin Electric Co Ltd Verfahren zum Implantieren negativer Wasserstoffionen und Implantierungseinrichtung

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2005046296A2 *

Also Published As

Publication number Publication date
JP2007511041A (ja) 2007-04-26
FR2861947B1 (fr) 2007-11-09
FR2861947A1 (fr) 2005-05-06
KR20060108650A (ko) 2006-10-18
CN1875668A (zh) 2006-12-06
WO2005046296A2 (fr) 2005-05-19
WO2005046296A3 (fr) 2005-12-15
US20070266948A1 (en) 2007-11-22

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