EP1618056A1

EP1618056A1 - Device for transporting a flat substrate in a vacuum chamber

Info

Publication number: EP1618056A1
Application number: EP04718265A
Authority: EP
Inventors: Stefan Bangert; Frank Fuchs; Uwe Schüssler; Ralph Lindenberg; Tobias Stolley
Original assignee: Applied Materials GmbH and Co KG; Applied Films GmbH and Co KG
Current assignee: Applied Materials GmbH and Co KG
Priority date: 2003-04-30
Filing date: 2004-03-08
Publication date: 2006-01-25
Also published as: WO2004096678A1; US20050199493A1; JP2006513117A; TW200422423A; KR100664602B1; DE10319379A1; KR20050024436A; CN1697767A; US7837799B2; TWI248981B

Abstract

The invention relates to a device for transporting a flat substrate through a coating plant consisting, for example of a plurality of different sputtering cathodes to which flat substrates, for example glass plates, are successively transported in vacuum. The aim of said invention is to avoid abrasion between said glass plates and a support. For this purpose, a glass plate is distanced from the support by a compressed gas coming through relatively few-numbered and small-sized orifices arranged in a gas channel. As far as small sizes of said orifices prevent any rapid pressure compensation between the gas channel and the rest of said coating plant when it is at atmospheric pressure on in vacuum, said gas channel is separated from the rest of the plant and provided with an individual gas pipe which makes it possible to introduce into the gas channel or pumped out therefrom.

Description

DEVICE FOR TRANSPORTING A FLAT SUBSTRATE IN

A VACUUM CHAMBER

description

The invention relates to a device according to the preamble of patent claim 1.

In inline vacuum coating systems, the substrates to be coated are transported to several coating sources and coated by these sources. For example, glass plates are transported in a horizontal position on conveyor belts or transport rollers. Since the substrates only rest on individual rolls, very thin glass panes can sag in the sections between the rolls. As a result, the reliable transportation of the disks on such a system cannot be guaranteed. The substrates can also be transported in a vertical or almost vertical position. In order to be able to hold them reliably in this position, they must be guided along their upper and lower edges. However, particles can be generated on the guide rails of the transport system which, depending on the quality requirements for the coating, lead to rejects when they reach a substrate. This danger arises in particular from the upper guide rails of the transport system, since the particles are likely to fall onto the substrate from there.

It is known to hold or clamp workpieces under atmospheric pressure by arranging them on a porous sintered metal plate, on the back of which vacuum is generated. The workpieces are sucked in and held in place by the porous vacuum plates (catalog "Vacuum Clamping Technology" / Horst Witte Gerätebau). In a known transport system, flat substrates are placed on porous sintered metal plates of this type and compressed air is blown through the porous plate from below, whereby the air flows through the fine pores of the sintered metal plate. As a result, the substrate hovers on an air cushion (device from MANZ Automation).

Such transport systems cannot be used in a vacuum. The enormous surface, which results from the porosity of the vacuum plate or the sintered metal plate, adsorbs gas or water from the air when the vacuum system is flooded. The adsorbed material desorbs again in the vacuum subsequently created, which introduces an additional and uncontrollable amount of gas. This amount of gas alone would be able to have a glass pane lifted off in a vacuum. In addition, such a gas load also affects reactive sputtering processes, since the additional, uncontrolled amount of gas flowing in changes the ratio of reactive gas to inert gas, and non-reactive coatings are contaminated by foreign atoms. Furthermore, a transport system is known in which the substrates, for. B. CDs, floating on a gas cushion (CD production system of Leybold AG, around 1990). In this system, which is used under atmospheric pressure, the gas cushion is generated by blowing compressed air against the CDs from below through holes in an approx. 120 mm wide and approx. 1 m long flat metal plate. These holes are about 5 cm apart and are arranged in series with about 5 cm apart. Some holes are not vertical, but at an angle to the metal surface, which gives the blown air a component in the direction of transport and moves the CDs forward. The holes have a diameter of a little less than 1 mm. To reduce the consumption of cleaned compressed air, individual sections of the transport route are continuously connected to a compressed air supply. The compressed air behind the CD is then switched off again in order to ensure that on the one hand the CD is moved without touching the metal surface, but on the other hand that unnecessary sections of the transport route are not wasted unnecessarily on compressed air. This system, too, cannot be used in a vacuum, since the number and cross-section of the holes would result in excessive gas throughput. It has been shown that, in contrast to the transport systems operated under atmospheric pressure, the gas flow in a transport system in a vacuum must be chosen very carefully depending on the chamber pressure, since otherwise the glass pane can be excited to vibrate.

A workpiece carrier for a disk-shaped workpiece is already known and is subjected to a surface treatment, in particular in a vacuum system (DE 39 43 482). This workpiece carrier has a workpiece support surface with a large number of outlet openings which communicate with a distribution space. A gas supply is connected to this distribution space, which supplies a gas in order to form a heat-transferring gas cushion between the support surface and the workpiece. The distribution space is formed by a groove which is worked into a plate and covered by a cover plate. In addition to the outlet openings, a large number of suction openings are provided in the support surface, each of which runs through the plate and cover plate next to the groove and communicates with a gas suction space to which a gas discharge line is connected. The gas striking the workpiece is not used to keep the workpiece away from a support.

The invention has for its object to provide a transport system for substrates to be coated, which can also be used in a vacuum and wherein there is no abrasion on the substrates.

This object is achieved according to the features of claim 1. The invention thus relates to a device for transporting a flat substrate through a coating system. This coating system has, for. B. several and different sputter cathodes, to which the flat substrate, for example a glass sheet, is successively transported in a vacuum. To prevent abrasion between the glass pane and the support, the glass pane is kept away from the support by means of gas pressure. The gas pressure is built up through relatively few and small holes in a gas channel. Since rapid pressure equalization between the gas channel and the rest of the coating system is not possible when flooding the coating system to atmospheric pressure or during evacuation due to the small holes, the gas channel is decoupled in terms of gas from the rest of the coating system and provided with a separate gas line via which gas is introduced into the gas channel or can be pumped out of it.

The advantage achieved with the invention is, in particular, that particle-free coating, for example of a glass pane, is possible in a vacuum. It also prevents substrates from being sucked in and blown away when they are introduced and removed.

An embodiment of the invention is shown in the drawings and is described in more detail below. Show it:

Figure 1 is a sectional side view of a process chamber with a gas system.

2 shows a plan view of a process chamber and two lock chambers; 3 shows a front view of the process chamber and lock chamber;

4 shows two separate gas channels opposite a glass pane;

5 shows two segmented gas channels which form a full surface;

Fig. 6 two one-piece gas channels;

7 shows a gas channel with a baffle plate; 8 shows an inline system with a linearly movable and rotatable bearing;

FIG. 8 a is an enlarged illustration of the inline system according to FIG. 8;

9 is a perspective view of a lock chamber of a gas system;

10 is a perspective view of a process chamber;

11 shows an alternative gas decoupling in the open state; 11a shows the alternative gas decoupling of FIG. 11 in the closed state.

A vacuum process chamber 1 is shown in longitudinal section in FIG. 1. In a housing 2 there is a sputter cathode 3, which is connected to the housing 2 via a holder 4.

At a distance from the sputtering cathode 3 is a glass pane 5 to be coated, which is at an angle of approximately 85 degrees to the horizontal. At its lower edge, the glass pane 5 rests on transport rollers 6 which move the glass pane 5 into the plane of the drawing, for example to a second sputter cathode. A gas system 7 is arranged behind the glass pane 5 and keeps the glass pane 5 in suspension at a distance from the gas system 7 during transport. This gas system 7 is held in a slightly inclined position by means of a holder 8 connected to the housing 2. In the gas system 7, a gas channel 9 is provided opposite the glass pane 5 and is connected to a gas source via supply lines, not shown. Electric heating cartridges 10, 11 can be integrated in the gas system 7. There is a gap 12 between the gas system 7 and the glass pane 5, which is to a certain extent an air cushion on which the glass pane 5 rests.

The gas channel 9 is closed to the glass plate 5 with a plate 13 in which there are several bores of z. B. 0.2 mm diameter. If the gas system 7 has a width of approximately 200 mm and the gas channel 9 has a cross-sectional area of a few cm, then a bore of 0.2 mm in diameter, which are arranged in the middle of the plate 13 at a distance of 60 mm from each other, can be a glass pane of 1100 mm in length, 700 mm in width and 0.7 mm in thickness with a gas throughput of approx. 20 sccm at a distance from the gas system 7. The cross section of the gas channel 9 must be matched to the overall length of the gas system 7 such that the gas flow required to transport the glass panes 5 has the same flow conditions at all outlet openings so that the distance between the glass panes 5 and the gas system 7 is not subject to fluctuations. In a vacuum, the glass pane 5 can easily be excited to vibrate because the damping effect of the atmospheric pressure is absent.

The pressure difference between the front and the back of the glass pane 5 is calculated from the flow resistance or the conductance for the gas flowing through the holes in the plate 13. This flow resistance strongly depends on the width of the gap 12. A very narrow gap 12 causes a high resistance, while the flow resistance decreases with increasing width of the gap 12. Since the glass pane 5 rests on the plate 13 in the idle state and lifts off with increasing gas flow, the flow resistance is initially high and then drops sharply. The very fine bores in the plate 13, on the other hand, have an unchangeable flow conductance, which is calculated from their cross section.

When the gas flow is switched on, the flow resistance of the gap 12 predominates initially, and the gas flow causes the glass pane 5 to lift off. With increasing distance, the flow resistance in the gap drops sharply, and the gas flow is limited only by the flow resistance of the holes in the plate 13. If more gas can escape through the gap 12 than gas can be supplied through the holes, the glass pane 5 falls back onto the plate 13 and the flow resistance in the gap 12 increases again. The gas cushion builds up again and the gap 12 increases again. There If this process is repeated periodically, the glass pane 5 can be set in vibration.

The distance of the substrate 5 to the gas channel 9 thus regulates itself, i. H. it is a kind of cantilever regulation. Of course, one could also carry out a conventional regulation in which the distance between the substrate 5 and the gas channel 9 is measured and kept constant by varying the gas flow.

Experiments have shown that the ambient pressure in process chamber 1 is a damping variable. If the gas flowed at an ambient pressure of 10 ^"4 mbar 17 sccm, the glass plate 5 started to vibrate. Even at a pressure of 10 ^{" 2} mbar, the glass plate 5 could not be excited to oscillate with the same settings. In order to adapt the gas flow for the transport system to the special conditions in a vacuum system, this must be regulated with a high-precision gas flow controller and cannot be operated in a simple manner with a gas bottle or compressor that is roughly regulated in the gas flow. The aforementioned vibration behavior cannot be observed in the atmosphere, since the flow resistance in the gap 12 increases drastically with increasing ambient pressure. In the atmosphere, the flow resistance of the gas flow in the gap 12 is always higher than that caused by the bores. Not the conductance of the holes, but that of the gap 12 limits the gas flow in the atmosphere. The preconditions for being able to vibrate the glass pane 5 in the atmosphere are therefore lacking.

In order to ensure trouble-free operation in a vacuum, the gas channel 9 must have a small volume in order to ensure short reaction times when the pressure changes. On the other hand, the cross section must not be chosen too small so that the gas flows out of the bores over the entire length of the gas channel 9 with the same gas throughput. 2 shows the process chamber 1 with its housing 2 in a sectional view from above. The sputter cathode 3 with its holder 4 and the support 14 for the roller drive 6 can be seen here. The glass pane 5 and the gas system 7 can also be seen.

The process chamber 1 is divided into two areas 27, 28 by means of a chamber separation 26. A sputter cathode 3 'with a holder 4' is also provided in the region 28. With the second sputtering cathode 3 ', for example, a different coating than with the first can be carried out.

The transport of the glass pane 5 in the state lifted from the plate 13 takes place between the two sputtering cathodes 3, 3 '. The volume of the gas channel 9 must be gas-decoupled from the process chamber 1 during flooding or evacuation. If only process chamber 1 were evacuated, this would Channel 9 located gas flow slowly and for a long time through the small holes in the plate 13. An analogous effect would occur with herding. The gaseous decoupling can take place in that the holes are closed during the flooding or evacuation or in that the gas channel 9 has its own gas supply line, via which evacuation can also be carried out. The flooding or evacuation of the gas channel 9 takes place spatially separately from the flooding and evacuation of the process chamber 1, but it should take place synchronously, so that the process chamber 1 and the gas channel 9 are completely evacuated or flooded at the same time. This prevents the aforementioned vibration behavior of the glass pane 5, as well as suction against the transport system or an uncontrollable lifting of the glass pane.

As a rule, the glass pane 5 is only suspended during transport, not during the actual coating process. The transport takes place in a vacuum, from one sputter cathode to the next. However, it is also possible to move the glass pane 5 continuously. However, the transport in the suspended state can also take place when the glass pane 5 is in and out.

Furthermore, by installing an additional, valve-controlled gas outlet opening on the gas system 7 in an area outside the support surface of the substrate 5, for example on the top or bottom, it is also possible to supply the transport gas to the process chamber as a process gas without the substrate being removed from it Transport system takes off. It is also possible to use the transport gas to condition the process gas atmosphere. For this purpose, the lock chamber 15, 107 is evacuated to a vacuum pressure which is below that of the process chamber. With the supply of the transport gas, which is selected to be identical to the process gas, the lock chamber 15, 107 is filled to the pressure level of the process chambers. In this way, it is prevented that gas components of the air atmosphere are introduced into the process chamber in a disruptive manner by the introduction process.

As can be seen from FIG. 2, the gas system 7 extends beyond the process chamber 1 to lock chambers 15, 16. The section of the gas system 7 located in the lock chamber 15, 16 is subject to the pressure fluctuations caused by the flooding and evacuation of the lock chambers 15, 16 are caused. Lock doors 29, 30 are located between the process chamber 1 and the lock chambers 15, 16. Holders 31, 32 for the gas system 7 are likewise provided in the lock chambers 15, 16. The process chamber 1 and the lock chambers 15, 16 each have separate connections 33, 34, 35 for flooding and separate pump connections 36, 37, 38, 60 for pumping and separate flood valves 39, 53, 54. Via a valve system (not shown), the connections 33, 34, 35 can optionally be connected both to the flood valves 39, 53, 54 and to the pumps 36, 37, 38, 60. Two different types of plant can be realized with the device according to FIG. 2. One type of system is an inline system with dynamic coating of the substrates. Here, the glass sheet 5 continuously moves past the sputtering cathodes 3, 3 'during the coating. The other type of system allows static coating. The glass pane 5 moves from the lock chamber 15 into the process chamber 1 and is stopped in front of the sputtering cathode 3. After coating, the glass pane 5 is either moved into the next section 28 or into the lock chamber 16.

The glass pane 5 can be sucked in when the removal lock chamber 16 is flooded, but there is a much lower pressure in the gas channel 9. The pressure compensation via the fine bores is too slow, so that the gas channel 9 has to be flooded via the separate connections 33, 34, 35 with a larger cross-section in order to be able to remove the glass pane without delay.

The reverse effect is obtained when the glass pane 5 has been inserted into the loading lock 15 and this lock chamber 15 is evacuated. The gas channel 9 is still under atmospheric pressure, so that the gas in it would flow out into the process chamber 1 in an uncontrolled manner. The result would be that the glass sheet 5 would uncontrollably lift off or start to vibrate. This could damage the glass pane 5. To avoid this, the gas channel 9 is evacuated and flooded separately according to the invention, but at the same time with the lock chambers 15, 16.

Fig. 3 shows a section I-I (see. Fig. 1) through the vacuum chamber 1 and the lock chambers 15, 16, which shows a preferred embodiment.

In this embodiment, a full-surface gas system 7 with three gas channels 61, 62, 63, which have a plurality of through-holes 64 to 69, is provided in the process chamber 1, while three bar-shaped gas systems 20 to 22 and 23 to 25, respectively, are provided in the lock chambers 15, 16 with open areas between them. However, the proposed transport system is not limited to this number of gas systems 20 to 22 or 23 to 25, rather their number can be adapted to the dimensions of the glass panes to be transported. The through holes 64 to 69 are shown in FIG. 3 much larger than they are in reality. Each of these gas systems 20 to 22 or 23 to 25 has a gas channel. In the lock chambers 15, 16 there are three gas systems 20 to 22; 23 to 25 each provided with a gas channel so that, for example, the grippers or suction devices of any loading device or unloading device can grip between the gas systems 20 to 22 or 23 to 25. Likewise, however, is a movable atmosphere transport system of the type described in the introduction can be used, which in turn reaches into the described open areas with beam-shaped gas systems and to which the substrate is transferred.

In the case of partial support by the separate gas systems, the pressure required for levitation on a flat substrate of certain dimensions is calculated as follows: area support in strip form 10%

Number of strips 3

Length 1 m

Width 1 m

0.7 mm thick

Density 2760 kg / m3

Area 1 m2

Volume 7.00E-04 m3

Mass 1.932 kg g 9.81 m / (s2)

Weight 18.9529 N Weight per strip 6.3176 N Pressure behind strip 189.5292 N / m2 (Pa)

1.8953 mbar

Inclined plane

Pitch angle 85 degrees

Normal force 1.652 8.72%

Slope downforce 18.881 99.62%

Pressure required to compensate for the normal force

16.519 N / m2 (Pa) 1.65E-01 mbar

Virtual gap

Circumference 6 m width 0.033 m

Depth (Ann. 10%) 0.0033 m

Lift gas flow 1400 sccm

23.33 mbarl / s

Max. Guide value for horizontal levitation 12.31 1 / s flight height 0.125 mm inclined plane 141.26 1 / s flight height 0.5 mm Lift gas flow 1000 sccm

16.67 mbarl / s

Max. Guide value for horizontal levitation 8.79 1 / s flight height 0.1 mm inclined plane 100.90 1 / s flight height 0.4 mm

Lift gas flow 500 sccm -

8.33 mbarl / s

Max. Guide value for horizontal levitation 4.401 / s flight height 0.07 mm inclined plane 50.45 1 / s flight height 0.3 mm

In the process chamber 1, the support surface of the transport system is continuously extended over the entire surface of the glass pane 5, since it is supposed to fulfill two tasks. On the one hand, it represents the surface that protects the glass pane from behind via the gas cushion. This is also necessary because the glass panes for TFT production are very thin, about 0.7 mm and can bend in areas with only partial support, which leads to uneven coating. On the other hand, the full surface of the transport system should serve as a heating surface and heat the glass pane 5 evenly. The heating takes place here by means of the electrical heating cartridges 10, 11. With a full-surface support of the glass pane apply to a very specific one

Disk about the following values:

Length 1 m

Width 1 m

Thickness 0.7 mm density 2760 kg / m3

Area 1 m2

Volume 7.00E-04 m3

Mass 1.932 kg g 9.81 m / (s2)

Weight 18.9529 N pressure 18.9529 N / m2 (Pa) 0.1895 mbar

Inclined plane

Pitch angle 85 degrees

Normal force 1.652 8.72%

Slope downforce 18.881 99.62% Pressure required to compensate for the normal force

1.652 N / m2 (Pa) l, 65E-02 mbar

Virtual gap

Circumference 4 m wide

Depth (Ann. 10%) 0.1 m

Lift gas flow 100 sccm

1.67 mbarl / s

Max. Guide value for horizontal levitation 8.79 1 / s flight height 0.6 mm inclined plane 100.90 1 / s flight height 2.4 mm

Lift gas flow 30 sccm

0.50 mbarl / s

Max. Guide value for horizontal levitation 2.64 1 / s flight height 0.3 mm inclined plane 30.27 1 / s flight height 1.2 mm

Lift gas flow 10 sccm

0.17 mbarl / s

Max. Guide value for horizontal levitation 0.88 1 / s flight height 0.165 mm inclined plane 10.09 1 / s flight height 0.65 mm

The virtual gap mentioned above is a computing model for computationally capturing the flow conditions of the gas flow between the disk and the support. The real conductance results from a flat gap that is delimited on the inside by a circular line and on the outside by a rectangular line. Since this real situation is not easy to grasp mathematically, it was assumed that the entire flow resistance lies in a rectangular gap, which is formed by the circumferential line of the glass pane and the distance between the pane and the base.

Behind the expression "the necessary maximum conductance for horizontal levitation" stands the fact that the substrate lies horizontally on the transport system and therefore the entire weight G must be applied by the gas pressure p in order to lift the disc. The physical relationships here are: Pressure p = force G per area A. If the substrate were arranged with an angle of attack α to the horizontal, the force component that would have to be applied by the gas pressure would decrease with the cosine of the angle of attack, because then F = G ^• cosα would apply. In the vertical position, ie α = 90 °, the force component acting on the transport system is zero, ie the weight of the disc is only on the transport rollers. In the gas transport system, the pressure p is the pressure difference Δp between the pressure on the underside of the pane _j and the ambient pressure p ₂ : Δp = _! - p ₂ . The pressure difference Δp is related to the gas flow Φ and the conductance L: Φ = L ^• Δp or Δp = Φ / L. The maximum conductance indicates the minimum pressure difference Δp _m that is just required to lift the disc (Δp _m = G / A), and thus represents the limit conductance.

The height of the support surface of the transport system can be provided in sections with separate gas connections in order to be able to adapt it to glasses of different heights. Gas channels that are not required are then evacuated to system pressure to avoid unnecessary gas ballast.

FIG. 4 shows a first variant of a gas system in which two gas systems 40, 41 are arranged one above the other, each of which gas system 40, 41 has a gas channel 42, 43. Bores of approximately 0.2 mm in diameter are provided in the wall 44 or 45 of these gas channels, through which gas can flow against the glass plate 5. There is a gap 12 between the glass plate 5 and the gas systems 40, 41.

Another variant of a gas system is shown in FIG. 5. In this case, there is no gap between the gas systems 47, 48, but the two gas systems 47, 48 form a full-surface plate, which is, however, segmented. The bores in the walls 49, 50 of the gas channels 51, 52 also have a diameter of 0.2 mm. The embodiment of FIG. 6 differs from the embodiment of FIG. 5 only in that the gas systems 47, 48 are not segmented.

7 shows a gas system 55 with a baffle plate 56 with larger gas distribution bores 57, 58. The bores 57, 58 have a diameter of approximately 2 to 3 mm. The version of FIG. 7 can of course otherwise be arranged in the same way as the versions of FIGS. 4 to 6, that is to say as individual gas channels, as a full surface which is composed of several gas channels, or as a one-piece version.

FIG. 8 shows a preferred embodiment of a coating system with four stations. In this system, the substrate 100 to be coated is brought into a sluice chamber 107 and moved to a transfer chamber 103. The gas system 110 is movably mounted and is in position 101 so that the substrate 100 can be received. If the substrate 100 has reached the correct position on the gas system, the gas system is brought into a position 102. Now a rotatable frame, which carries the movable gas system, can be rotated around the axis looking out of the drawing plane. During these processes, the substrate 100 does not move on the gas system 110, it remains in its position. In this way, substrates can be are fed in, transported to the process chamber 104 ', 104 and coated before they reach the transfer chamber 103 again and are discharged via the discharge chamber 106.

FIG. 8a shows the device of FIG. 8 with several coating stations once again on an enlarged scale and with more detailed information. The functioning of the device is described on the basis of this FIG. 8a.

First, the substrate is brought into a lock chamber 107 with the lock door 108 open and the lock door 108 'closed at atmospheric pressure. Then, after closing the lock door 108, the lock chamber 107 is pumped out, that is to say evacuated. After the sluice chamber 107 has been pumped out, the lock door 108 'is opened and the substrate 100 is transported into the transfer chamber 103, in which the movable transport system is in a first position 101. During the transport in vacuum from the insertion chamber 107 to the transfer chamber 103, the substrate 100 is moved in the manner according to the invention, i. H. it does not rest on an object through which particles can be rubbed off. The transfer chamber 103 looks similar to the chamber depicted further below in FIG. 10, but one has to imagine the cathode 3 aside, and the glass pane 5 and the transport system 7 are arranged mirror-inverted. The lock door 108 'is then closed again, and the substrate now rests on the transport system in the first position 101. The transport system is now moved to a second position 102. The translational movement takes place simultaneously at all four process stations 104, 104 ', 104 ". While the substrate is taken over by the extended transport system in the transfer chamber 103, further substrates are treated at the process stations 104, 104' and 104". During the coating processes in the process stations 104, 104 ', 104 ", one substrate each is conveyed into the discharge chamber 106 in the transfer chamber 103, and then another substrate is moved from the introduction chamber onto the transport system into the first position 101, the transport system Once all coating processes and the removal and introduction of substrates have been completed, the transport systems with the substrates are moved in from the first positions 101, 101 ', 101 "and 101'" and reach the second positions 102, 102 ' , 102 "and 102 '". Now a rotating device 105 can rotate all substrates on its transport systems by 90 °, and the process steps start again.

A coated substrate is removed in the same way as the infeed.

The lock doors 108 "and 108 '" are closed, the discharge chamber 106 is evacuated. The lock door 108 "is then opened and the substrate is moved from the evacuated transfer chamber 103 into the evacuated discharge chamber 106. The lock door 108" is then closed and after the discharge chamber 106 is flooded the lock door 108 '"is opened. The transport from the transfer chamber 103 into the evacuated discharge chamber 106 takes place again in the manner according to the invention, ie the coated glass pane is not in contact with the transport system.

The time required for the overall process is roughly as follows: 3 seconds to bring the rotating device 105 into the starting position; 4 seconds to turn the rotating device 105 by 90 °; 3 seconds to bring the rotating device 105 into the process position; 50 seconds for the sputtering process; 2 seconds to open the inner valve, 6 seconds to transport the substrates; 2 seconds for closing the inner valve; 10 seconds to vent; 2 seconds to open the outer valve; 6 seconds for the transport of the substrates; 2 seconds to close the outer valve; 30 seconds to pump.

9 shows the lock chamber 15 in a perspective view. The lock chamber 16 is constructed accordingly. Suckers 83 to 85 can be seen there, which hold the glass pane 5 on the back for loading or unloading. These suction cups 83 to 85 are fastened to a gripping arm, which is composed of the elements 80 to 82 and belongs to an atmosphere-side transport system, not shown.

10 shows the process chamber 1 in a perspective view. A gas system consisting of the parts 90, 92, 93 can be seen here, each part being provided with a gas channel 91, 93, 95. 11 shows a further possibility for the gas separation of a gas channel 121 from a vacuum chamber 122 or another room. In this case, two walls 123, 124 which can be displaced relative to one another are provided and have holes 125 to 127 and 128 to 130, respectively.

In Fig. 11 the holes 125 to 127 and 128 to 130 are one above the other so that gas can pass through the walls 123, 124.

In the arrangement according to FIG. 11 a, the holes 125 to 127 and 128 to 130 no longer lie one above the other, so that no gas can escape from the gas channel 121 into the vacuum chamber 122 or vice versa. This results in a decoupling between gas channel 121 and vacuum chamber. In order to quickly fill or evacuate the gas duct with gas, it must be provided with a separate gas line.

In a further embodiment of the transport system 7, which is not shown, the various bores 64 to 69 are opened or closed by simultaneously controlled valves.

Claims

claims

1. Device for transporting a flat substrate in a vacuum chamber, characterized in that opposite to one side of the flat substrate (5) a gas channel (9) with holes in the direction of the flat substrate (5) is provided and that the gas channel (9) can be gas-decoupled from the vacuum chamber.

2. Device according to claim 1, characterized in that the gas channel (9) for the decoupling has at least one dedicated flooding line (34) via which gas can be input into the gas channel (9) and suctioned off.

3. Device according to claim 1, characterized in that the bores in the wall of the gas channel (9) facing the substrate are to be opened or closed simultaneously.

4. The device according to claim 1, characterized in that the vacuum chamber has its own flood line.

5. The device according to claim 4, characterized in that the vacuum chamber is a process chamber.

6. The device according to claim 4, characterized in that the vacuum chamber is a feed-in or feed-out chamber.

7. The device according to claim 1, characterized in that the substrate (5) is aligned horizontally.

8. The device according to claim 1, characterized in that the substrate (5) is oriented at an angle of 85 degrees to the horizontal.

9. The device according to claim 1, characterized in that a plurality of gas channels (61 to 63) are provided over the height of the substrate.

10. The device according to claim 7, characterized in that the substrate (5) is arranged at an angle of 4 degrees to the horizontal.

11. The device according to claim 9, characterized in that three gas channels (61 to 63) are provided.

12. The device according to claim 1, characterized in that the gas is applied over the entire surface.

13. The apparatus according to claim 1, characterized in that an already existing gas inlet is used for introducing the transport gas.

14. The apparatus according to claim 1, characterized in that the flat substrate (5) is opposite a sputtering cathode (3).

15. The apparatus according to claim 1, characterized in that the flat substrate (5) rests with an edge on transport rollers (6). 16. The apparatus according to claim 14, characterized in that the sputtering cathode (3) is in a process chamber (1) to which there are lock chambers (15,

16) connect.

17. The apparatus according to claim 1, characterized in that in a process chamber (1) a plurality of gas channels (61 to 63) integrated in a full-surface wall are provided.

18. The apparatus according to claim 1, characterized in that a plurality of gas channels (20 to 22; 23 to 25) spaced apart from one another are provided in lock chambers (15, 16).

19. Device according to claims 17 or 18, characterized in that the gas channels (61 to 63; 20 to 22; 23 to 25) each have their own flood lines (33, 34, 35).

20. Device according to claims 17 or 18, characterized in that the process chamber (1) and the lock chambers (15, 16) have pump connections (36, 37, 38, 40) which can be connected to pumps.

21. The apparatus according to claim 16, characterized in that a feed chamber (107) and a discharge chamber (106) are provided and that both lock chambers (107, 106) through two lock doors (108, 108 'and 108 ", 108 respectively '") can be closed vacuum-tight.

22. The apparatus according to claim 1, characterized in that a plurality of substrates can be transported simultaneously.

23. The device according to claim 1, characterized in that the gas flow through the gas channels (9) is precisely controlled.

24. The device according to claim 1, characterized in that the transport gas is also used as a process gas.

25. The device according to claim 1, characterized in that the transport gas is used with the introduction of the substrate from the introduction chamber (15, 107) into the transfer chamber (107) or the process chamber (27) for conditioning the process gas atmosphere.

26. A method of operating a device according to claim 1, characterized in that the gas channel (9) is evacuated and flooded separately, but simultaneously with the lock chamber (15, 16).

27. The method for operating a device according to claim 1, characterized in that all bores (64 to 69) are closed or opened simultaneously.