EP1603749A2 - Verbesserung der entwicklung von strahlungsempfindlichen elementen - Google Patents

Verbesserung der entwicklung von strahlungsempfindlichen elementen

Info

Publication number
EP1603749A2
EP1603749A2 EP04719888A EP04719888A EP1603749A2 EP 1603749 A2 EP1603749 A2 EP 1603749A2 EP 04719888 A EP04719888 A EP 04719888A EP 04719888 A EP04719888 A EP 04719888A EP 1603749 A2 EP1603749 A2 EP 1603749A2
Authority
EP
European Patent Office
Prior art keywords
acid
composition
compound
mole
substituted aromatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04719888A
Other languages
English (en)
French (fr)
Inventor
Livia T. Memetea
Juana G. Jaramillo
Nicholas Bradford
Jonathan W. Goodin
Cheng Yang
Moshe Levanon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphic Communications Canada Co
Original Assignee
Creo Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/CA2003/000373 external-priority patent/WO2003079113A1/en
Application filed by Creo Inc filed Critical Creo Inc
Publication of EP1603749A2 publication Critical patent/EP1603749A2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • B41M5/368Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02Positive working, i.e. the exposed (imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers

Definitions

  • cyclic compound examples include benzotriazoles, 5-phenyl-1 H-tetrazole and
  • a radiation-to-heat converting compound(C) capable of absorbing incident radiation, preferably infrared radiation, and converting it to heat, is preferably incorporated in the coating composition.
  • the radiation-to-heat converting compounds suitable for the invented heat-sensitive compositions may be chosen from a wide range of organic and inorganic pigments such as carbon blacks, phthalocyanines or metal oxides.
  • Acetalization of the polyvinyl alcohols takes place according to known standard methods as described, for example, in U.S. Pat. No. 4,665,124; U.S. 4,940,646; U.S. 5,169,898; U.S. 5,700,619; U.S. 5,792,823; JP 09,328,519 etc.
  • Levanon et al. provide detailed synthesis examples for the acetal polymers used in the present invention.
  • a coating was made with the composition:
  • Two plates were cast manually, one with the above solution containing Zelec 8172 as a development-enhancer and one with the reference solution in Example 28 without development-enhancer.
  • the plates had a coating weight of 1.7-1.8 g/m 2 .
  • the plates were dried at 125°C, 2min and imaged with 12 W an energy series between 80- 300mJ/cm 2 .
  • the plates were developed in 60% Goldstar at 23°C, 30 s.
  • the clearing point and % weight loss in developer were 140 mJ/cm 2 and ⁇ 50, respectively for the plate containing Zelec 8172 while the reference plate without developability-enhancing compound did not clear up to 300 mJ/cm 2 .
  • the coating solution in this example and the reference coating (as in Example 28) were made in acetone: Dowanol PM, 75:25 at 10% solids.
  • the solutions were cast with a rod on anodized aluminum substrate.
  • the resulting plates were baked at 130°C for 3 min.
  • the coating weight was 1.7 g/m 2 .
  • the plates were exposed to a 830 nm IR laser radiation at a power of 8W and an energy density series of 90-400 mJ/cm 2 .
  • the plates were developed in a DuPont-Howson processor in a developer containing 7% sodium metasilicate of conductivity 71 mS/cm in the following conditions: 23°C and 30 s residence time.
  • the plate with resorcinol developability-enhancing compound had a clearing point of 15QmJ/em 2 and a non-irradiated % coating weight loss of ⁇ 50 as compared to 350 rnJ/cm 2 and a non-irradiated % coating weight loss of ⁇ 50 for the reference plate.

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
EP04719888A 2003-03-14 2004-03-12 Verbesserung der entwicklung von strahlungsempfindlichen elementen Withdrawn EP1603749A2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US647910 1991-01-30
WOPCT/CA03/00373 2003-03-14
PCT/CA2003/000373 WO2003079113A1 (en) 2002-03-15 2003-03-14 Sensitivity enhancement of radiation-sensitive elements
US64791003A 2003-08-25 2003-08-25
PCT/CA2004/000381 WO2004081662A2 (en) 2003-03-14 2004-03-12 Development enhancement of radiation-sensitive elements

Publications (1)

Publication Number Publication Date
EP1603749A2 true EP1603749A2 (de) 2005-12-14

Family

ID=35311042

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04719888A Withdrawn EP1603749A2 (de) 2003-03-14 2004-03-12 Verbesserung der entwicklung von strahlungsempfindlichen elementen

Country Status (3)

Country Link
EP (1) EP1603749A2 (de)
JP (2) JP4473262B2 (de)
WO (1) WO2004081662A2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011051112A1 (en) 2009-10-27 2011-05-05 Agfa Graphics Nv Novel cyanine dyes and lithographic printing plate precursors comprising such dyes

Families Citing this family (43)

* Cited by examiner, † Cited by third party
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DE602004006378T2 (de) * 2004-04-21 2008-01-10 Agfa Graphics N.V. Verfahren zur genauen Belichtung von kleinen Punkten auf eine Wärmeempfindliche positiv arbeitende Flachdruckplatte
JP4762604B2 (ja) * 2004-06-09 2011-08-31 富士フイルム株式会社 平版印刷版原版
US7279263B2 (en) 2004-06-24 2007-10-09 Kodak Graphic Communications Canada Company Dual-wavelength positive-working radiation-sensitive elements
WO2007099053A1 (en) 2006-02-28 2007-09-07 Agfa Graphics Nv Method for making a lithographic printing plate
US7910768B2 (en) * 2006-05-17 2011-03-22 American Dye Source, Inc. Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
US7544462B2 (en) * 2007-02-22 2009-06-09 Eastman Kodak Company Radiation-sensitive composition and elements with basic development enhancers
US7399576B1 (en) 2007-02-28 2008-07-15 Eastman Kodak Company Positive-working radiation-sensitive composition and elements
US7723012B2 (en) * 2007-06-28 2010-05-25 Eastman Kodak Company Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s
US8198011B2 (en) * 2008-02-04 2012-06-12 Eastman Kodak Company Method of imaging and developing positive-working imageable elements
US8084189B2 (en) 2008-05-22 2011-12-27 Eastman Kodak Company Method of imaging and developing positive-working imageable elements
US8187792B2 (en) 2008-08-21 2012-05-29 Eastman Kodak Company Processing of positive-working lithographic printing plate precursor
EP2194429A1 (de) 2008-12-02 2010-06-09 Eastman Kodak Company Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten
US8048609B2 (en) 2008-12-19 2011-11-01 Eastman Kodak Company Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
EP2284005B1 (de) 2009-08-10 2012-05-02 Eastman Kodak Company Lithografische Druckplattenvorläufer mit Betahydroxy-Alkylamid-Vernetzern
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
EP2293144B1 (de) 2009-09-04 2012-11-07 Eastman Kodak Company Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung
US8298750B2 (en) 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US20110097666A1 (en) 2009-10-27 2011-04-28 Celin Savariar-Hauck Lithographic printing plate precursors
ES2395993T3 (es) 2010-03-19 2013-02-18 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
US8939080B2 (en) 2010-11-18 2015-01-27 Eastman Kodak Company Methods of processing using silicate-free developer compositions
US8530143B2 (en) 2010-11-18 2013-09-10 Eastman Kodak Company Silicate-free developer compositions
US20120129093A1 (en) 2010-11-18 2012-05-24 Moshe Levanon Silicate-free developer compositions
US20120192741A1 (en) 2011-01-31 2012-08-02 Moshe Nakash Method for preparing lithographic printing plates
US8771920B2 (en) 2011-03-31 2014-07-08 Fujifilm Corporation Lithographic printing plate precursor and method of preparing the same
EP2796929B1 (de) 2011-03-31 2015-12-30 Fujifilm Corporation Lithographiedruckplattenvorläufer und Verfahren zur Herstellung davon
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
JP5705675B2 (ja) * 2011-07-25 2015-04-22 富士フイルム株式会社 平版印刷版原版、平版印刷版及び平版印刷版の作製方法
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
JP6094271B2 (ja) * 2012-03-05 2017-03-15 味の素株式会社 感光性樹脂組成物
US20130255515A1 (en) 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors
EP2941349B1 (de) 2013-01-01 2017-07-19 AGFA Graphics NV (ethylen-,vinylacetal-)copolymere und ihre verwendung in lithographiedruckplattenvorläufern
EP2933278B1 (de) 2014-04-17 2018-08-22 Agfa Nv (Ethylen-,Vinylacetal-)Copolymere und ihre Verwendung in Lithographiedruckplattenvorläufern
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2955198B8 (de) 2014-06-13 2018-01-03 Agfa Nv Ethylenvinylacetal-Copolymere und deren Verwendung in lithographischen Druckplattenvorläufer
EP2963496B1 (de) 2014-06-30 2017-04-05 Agfa Graphics NV Lithografiedruckplattenvorläufer mit (Ethylen-, Vinylacetal-) Copolymeren
EP3032334B1 (de) 2014-12-08 2017-10-18 Agfa Graphics Nv System zur Reduzierung von Ablationsrückständen
EP3130465B1 (de) 2015-08-12 2020-05-13 Agfa Nv Wärmeempfindlicher lithografiedruckplattenvorläufer
CN108778744A (zh) 2016-03-16 2018-11-09 爱克发有限公司 加工平版印刷版的方法和设备
JP2020064082A (ja) 2017-02-17 2020-04-23 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法
EP3637188A1 (de) 2018-10-08 2020-04-15 Agfa Nv Sprudelnder entwicklervorläufer zur verarbeitung eines lithografischen druckplattenvorläufers
EP3778253A1 (de) 2019-08-13 2021-02-17 Agfa Nv Verfahren zur verarbeitung einer lithografiedruckplatte
EP4382306A1 (de) 2022-12-08 2024-06-12 Eco3 Bv Make-ready-verfahren für eine lithographische druckmaschine

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0429955A2 (de) * 1989-11-23 1991-06-05 Hoechst Aktiengesellschaft Verfahren zur Herstellung einer negativ arbeitenden lichtempfindlichen Druckform
JPH0585054A (ja) * 1991-09-27 1993-04-06 Dainippon Ink & Chem Inc 感熱記録体
WO2001009682A2 (en) * 1999-07-30 2001-02-08 Creo, Ltd. Positive acting photoresist composition and imageable element
WO2004057421A2 (en) * 2002-12-19 2004-07-08 Kodak Polychrome Graphics Gmbh Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin

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JP2646241B2 (ja) * 1988-07-20 1997-08-27 富士写真フイルム株式会社 フォトレジスト組成物
JPH11288093A (ja) * 1998-04-06 1999-10-19 Fuji Photo Film Co Ltd 赤外線レーザ用ポジ型感光性組成物
GB9928506D0 (en) * 1999-12-02 2000-02-02 Agfa Gevaert Ltd Sensitised heat sensitive printing plate precursors
JP2002080821A (ja) * 2000-09-05 2002-03-22 Mitsui Chemicals Inc 光増感剤および該光増感剤を用いる可視光硬化性樹脂組成物およびその用途
JP3856298B2 (ja) * 2001-02-08 2006-12-13 富士フイルムホールディングス株式会社 平版印刷版原版
JP4141120B2 (ja) * 2001-08-16 2008-08-27 富士フイルム株式会社 平版印刷版用原版
DE10239505B4 (de) * 2002-08-28 2005-05-04 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0429955A2 (de) * 1989-11-23 1991-06-05 Hoechst Aktiengesellschaft Verfahren zur Herstellung einer negativ arbeitenden lichtempfindlichen Druckform
JPH0585054A (ja) * 1991-09-27 1993-04-06 Dainippon Ink & Chem Inc 感熱記録体
WO2001009682A2 (en) * 1999-07-30 2001-02-08 Creo, Ltd. Positive acting photoresist composition and imageable element
WO2004057421A2 (en) * 2002-12-19 2004-07-08 Kodak Polychrome Graphics Gmbh Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011051112A1 (en) 2009-10-27 2011-05-05 Agfa Graphics Nv Novel cyanine dyes and lithographic printing plate precursors comprising such dyes

Also Published As

Publication number Publication date
JP4473262B2 (ja) 2010-06-02
WO2004081662A3 (en) 2004-12-02
WO2004081662A2 (en) 2004-09-23
JP2010146013A (ja) 2010-07-01
JP2006520485A (ja) 2006-09-07

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