EP1586221A1 - Systeme d'accelerateur d'ions - Google Patents

Systeme d'accelerateur d'ions

Info

Publication number
EP1586221A1
EP1586221A1 EP03782395A EP03782395A EP1586221A1 EP 1586221 A1 EP1586221 A1 EP 1586221A1 EP 03782395 A EP03782395 A EP 03782395A EP 03782395 A EP03782395 A EP 03782395A EP 1586221 A1 EP1586221 A1 EP 1586221A1
Authority
EP
European Patent Office
Prior art keywords
type
ionization chamber
longitudinal
arrangement
longitudinal section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP03782395A
Other languages
German (de)
English (en)
Other versions
EP1586221B8 (fr
EP1586221B1 (fr
Inventor
Günter KORNFELD
Gregory Coustou
Norbert Koch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales Air Systems and Electron Devices GmbH
Original Assignee
Thales Electron Devices GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thales Electron Devices GmbH filed Critical Thales Electron Devices GmbH
Publication of EP1586221A1 publication Critical patent/EP1586221A1/fr
Application granted granted Critical
Publication of EP1586221B1 publication Critical patent/EP1586221B1/fr
Publication of EP1586221B8 publication Critical patent/EP1586221B8/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H1/00—Using plasma to produce a reactive propulsive thrust
    • F03H1/0037—Electrostatic ion thrusters
    • F03H1/0062—Electrostatic ion thrusters grid-less with an applied magnetic field
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/54—Plasma accelerators

Definitions

  • the invention relates to an ion accelerator arrangement of the type specified in the preamble of claim 1.
  • Ion accelerator arrangements are used, for example, for surface treatment, in particular in semiconductor technology, or as a drive for spacecraft. Ions are typically generated and accelerated from a neutral working gas for propulsion purposes, in particular an inert gas. In particular, two construction principles have become established for the generation and acceleration of ions.
  • the positively charged ions are converted from a plasma by means of a lattice arrangement in which a first lattice adjacent to the plasma chamber is at an anode potential and a second lattice which is offset in the beam exit direction is at a more negative cathode potential.
  • a lattice arrangement in which a first lattice adjacent to the plasma chamber is at an anode potential and a second lattice which is offset in the beam exit direction is at a more negative cathode potential.
  • a lattice arrangement in which a first lattice adjacent to the plasma chamber is at an anode potential and a second lattice which is offset in the beam exit direction is at a more negative cathode potential.
  • Another design provides a plasma chamber which is penetrated on the one hand by an electric field for accelerating positively charged ions in the direction of a beam outlet opening and on the other hand by a magnetic field for guiding electrons which serve to ionize a neutral working gas.
  • Accelerator arrangements with an annular plasma chamber, in which the magnetic field is predominantly radial and electrons under the influence of the - electrical and magnetic fields are on closed drift paths, have been in use for a long time. electric and magnetic fields move on closed drift tracks.
  • Such an accelerator arrangement is known, for example, from US Pat. No. 5,847,493.
  • the magnetic field shows a special structure with a field course predominantly parallel to the longitudinal direction in longitudinal sections of the second type and predominantly perpendicular to the longitudinal direction, in particular radial course in longitudinal sections of the first type, which in particular show a course of the magnetic field, also referred to as cusp.
  • the arrangement is preferably constructed in several stages with alternating successive longitudinal sections of the first and second type.
  • Such ion accelerator arrangements are known, for example, from DE 100 14 033 A1 or DE 198 28 704 A1.
  • electrodes protruding radially inwards are provided on the inner wall.
  • JP 61 066 868 A shows an RF ion generator with an excitation coil arranged on the side walls of a plasma chamber.
  • a permanent magnet arrangement generates a magnetic field with field lines curved around the coil turns in order to keep plasma away from the coil turns.
  • US Pat. No. 6,060,836 A describes a plasma generator with a waveguide projecting axially into a plasma chamber, to which HF power from a magnetron is fed and the inner conductor of which carries a permanent magnet arrangement at one end projecting into the chamber.
  • the object of the present invention is to further improve the efficiency of an ion accelerator arrangement.
  • the invention is described in claim 1.
  • the dependent claims contain advantageous refinements and developments of the invention.
  • the invention is based on the magnetic field structure known per se from DE 100 14 033 A1, which in the ionization (or plasma) chamber in the longitudinal direction of the arrangement in a section of the second type has a predominantly parallel field direction to the longitudinal direction and in a section of the first type in contrast, has a stronger, in particular predominant, field component perpendicular to the longitudinal direction.
  • the magnetic field merges continuously and monotonously from a section of the first type into a section of this type adjacent to it and vice versa, the adjacent sections of the first and second type being spaced apart in the longitudinal direction or being able to adjoin one another directly.
  • the longitudinal direction of an ion accelerator arrangement essentially coincides with the mean direction of movement of the accelerated ions or an axis of symmetry of the ionization chamber.
  • the volume available to the working gas in this section is reduced compared to an embodiment with a constant wall distance and at the same time the working gas in the middle between the opposite ones Concentrated wall surfaces.
  • the distance between opposing wall surfaces in the section of the second type is preferably not only with respect to one another but also with respect to an center line or center surface parallel to the longitudinal direction in particular is reduced compared to the wall distance in an adjacent longitudinal section of the first type.
  • the minimum wall distance in a section of the second type is advantageously at least 15%, preferably at least 20%, in particular at least 25% less than the maximum wall distance in an adjacent section of the first type.
  • at least one, preferably both, of the opposing wall surfaces is in a section of the second type offset towards the ionization chamber, in particular in the form of a curvature with a wall surface that runs continuously in the longitudinal direction, preferably monotonously curved.
  • the mutually opposing wall surfaces can consist of dielectric material or be metallic or partially metallic, in particular in such a way that in the section or sections of the second type there is a metallic wall surface which forms an intermediate electrode at a fixed or sliding potential and in the longitudinal direction is delimited by insulating wall sections, and the wall surfaces in the sections of the first type are electrically insulating.
  • the ion accelerator arrangement in the longitudinal course of the plasma chamber is constructed in several stages in such a way that a plurality of sections of the first type alternate with sections of the second type, the longitudinal components preferably being alternately opposed in sections of the second type separated by a section of the first type. the longitudinal component of the magnetic field thus reverses when passing through a section of the first type.
  • a multi-stage magnetic field structure is known per se from the prior art.
  • the reduction in wall distance that is essential to the invention can then be carried out in only one, several or all sections of the second type. If there is a reduction in the wall distance in several or all sections of the second type compared to adjacent sections of the first type, the quantitative extent of the relative reduction can also vary from section to section. There is preferably a reduction in the wall distance at least in the section of the second type closest in the longitudinal direction of the anode and / or the reduction in this section is greatest in the case of quantitative variation over several sections.
  • the anode is preferably arranged at the end of the ionization chamber opposite the longitudinal direction of the ion exit opening.
  • the cathode is advantageously designed as a primary electron source, from which primary electrons are guided through the ion outlet opening into the plasma chamber and / or which electrons are used to neutralize an ion or plasma beam emerging from the ionization chamber, and preferably offset laterally outside the ionization chamber and towards the outlet opening arranged.
  • the ion accelerator arrangement according to the invention can serve both to emit a positively charged ion beam and, in particular in the preferred application in the drive of a spacecraft, to emit a neutral plasma beam.
  • the accelerated ions can be used in particular for the treatment of solid surfaces and layers close to the surface.
  • FIG. 1 shows a magnetic field profile in an ionization chamber
  • Fig. 2 shows a multi-stage arrangement.
  • the magnetic field profile in an ionization chamber IK which is required for the present invention, is schematically sketched.
  • the ionization chamber is assumed to be annular, rotationally symmetrical about a central longitudinal axis SA, which lies in the longitudinal direction LR of the arrangement.
  • a magnet arrangement MGi lying radially inside with respect to the ionization chamber and a magnet arrangement MGe lying radially outside generate a magnetic field in the ionisation chamber IK which has at least one longitudinal section MA1N of the first type and at least one longitudinal section MA2N of the same type in the longitudinal direction.
  • the magnetic field in the ionization chamber preferably has a plurality of longitudinal sections of the first and second type, alternating in succession in the longitudinal direction, as in the example outlined in FIG. 2 and as indicated in FIG. 1 by a further longitudinal section MA2N + I.
  • the magnetic field shows a predominantly parallel to the longitudinal axis SA field direction
  • the magnetic field has a contrast greater radial, that is oriented perpendicular to the longitudinal axis component.
  • the longitudinal section MA1 N of the first type is selected in the example so that the radial field component clearly predominates.
  • Longitudinal sections of the first and second types can be defined directly one after the other, but are spaced apart in the sketched example for a clear demarcation with a predominant longitudinal component in the section MA2 N and a predominant radial component in the longitudinal section MA1 N by an unspecified transition section.
  • the magnitude of the magnetic flux decreases from the lateral chamber walls towards the center, just as in the longitudinal section of the first type magnetic flux on the chamber walls is greater than in the middle between opposite wall surfaces.
  • the magnetic field structure described so far is in itself, for. B. from DE 10014033 A1, as well as magnet arrangements for generating such a magnetic field structure.
  • the field distribution of the magnetic field in FIG. 1 is only to be understood schematically and not quantitatively.
  • the radial distance of the wall surfaces WF2JN, WF2 ⁇ N opposite each other perpendicular to the longitudinal axis SA is less than the radial wall distance of wall surfaces WF1 ' IN, WF1 ⁇ N in the longitudinal section MA1 N of the first type
  • the clear radial width of the ionization chamber is thus reduced in the longitudinal section MA2N of the second type compared to the longitudinal section MA1N of the first type.
  • the two opposing wall surfaces WF2JN, WF2 ⁇ are preferably displaced radially towards the center of the ionization chamber in relation to the wall surfaces WF1.N, WF1 and N adjacent in the longitudinal direction.
  • a concentration of the working gas, in particular also of the non-ionized atoms is forced in the radial inner area in section MA2N, where there is a higher electron density and therefore a higher ionization probability due to the lower magnetic flux ,
  • the course of the wall surfaces in the longitudinal direction can in both sections be parallel to the longitudinal axis SA with a step or ramp as a transition.
  • the wall surface WF2i N and / or WF2 ⁇ N can be curved with a toward the radial center of the ionization chamber minimum wall distance D2L, which increases in the longitudinal direction towards the adjacent section MA1 N of the first type.
  • the course of the wall surface WF2i N and / or WF2e can in particular be continuously monotonously curved or of such a shape, e.g. B. be approximated with several straight partial courses.
  • the wall surfaces WF1i N and / or WF1e can have a straight or curved course in the longitudinal direction, with a straight course parallel to the longitudinal axis typically being favorable for these surfaces for the sake of simplified production.
  • the wall surfaces of the chamber wall can consist of electrically insulating material or of electrically conductive material or also partially of electrically conductive material, in particular non-magnetizable metal.
  • the wall surfaces are WF2. N , WF2 ⁇ N metallic and the wall surfaces WF1N, WF1 ⁇ N insulating.
  • the metallic wall surfaces can then advantageously form part of the electrode arrangement as intermediate electrodes at intermediate electrical potentials between the potentials of an anode and a cathode, it being possible for the intermediate potentials to be predeterminable or, in the case of insulated, non-contacted intermediate electrodes, to set up smoothly during operation.
  • metallic Electrodes are placed or fixed on an essentially cylindrical insulating chamber shell and form the wall surfaces WF2i N or WF2e N through their surfaces facing away from the chamber shell and facing the ionization chamber and the opposite wall surface.
  • a longitudinally multi-stage arrangement is outlined, in which in itself, for. B. from DE 100 14033 A1, as is known in the longitudinal direction, a plurality of longitudinal sections of the first and second type alternate in succession, with two sections of the second type (MA2N, MA2N + I in FIG. 1) adjacent to an intermediate section of the first type (MA1 N 1 ⁇ FIG. 1) ) show opposite longitudinal components of the magnetic field. While an annular chamber geometry around a central central longitudinal axis SA and an inner and an outer magnet arrangement Mgi, Mge are provided in FIG. 1, the sketch according to FIG.
  • the ionization chamber shows a beam exit opening, from which a generally slightly divergent ion or plasma beam PB with medium ion movement in the longitudinal direction LR emerges.
  • a cathode KA which is at cathode potential and emits electrons, is arranged as part of the electrode arrangement outside the ionization chamber at the outlet opening AU and laterally offset therefrom.
  • a part IE of these electrons is conducted through the electrical field of the electrode arrangement into the ionization chamber and is used there in known manner for ionizing the working gas and in particular also the generation of secondary electrons.
  • Another part NE of the electrons emitted by the cathode can serve to neutralize a positively charged particle stream PB.
  • no external electron source is provided for generating primary electrons for gas ionization and / or for the neutralization of a plasma jet with excess positive charge.
  • the cathode can then in particular be provided by a housing part surrounding the outlet opening of the ionization chamber and lying at cathode potential.
  • An anode A0 as part of the electrode arrangement is arranged at the end of the ionization chamber opposite the outlet opening AU in the longitudinal direction LR and is at anode potential.
  • a neutral working gas preferably a heavy noble gas such as xenon (Xe) for drive purposes, can be introduced into the ionization chamber, for which purpose an anode-side central supply line is entered in the sketch.
  • Xe xenon
  • a typical distribution of a plasma consisting of electrons and positive gas ions is shown in crossed hatching in the ionization chamber.
  • the magnet arrangement forms a magnetic field in the ionization chamber IKZ, which has longitudinal sections MA11, MA12 of the first type and longitudinal sections MA21, MA22, MA23 of the second type alternately in the longitudinal direction. It is assumed that, as outlined, in this case the distance of opposite wall surfaces to the diameter of the ionization chamber is constant in all longitudinal sections of the first type and in any transition sections that may be present, it is constantly equal to DZ.
  • the ionization chamber in the longitudinal section MA21 is narrowed to a minimum diameter D21L by a curvature surrounding the central longitudinal axis with a wall surface WF21.
  • the wall surface WF21 is assumed to be electrically insulating.
  • the diameter of the ionization chamber is reduced to a value D22L, whereby the larger dimensioning of D22L compared to D21L can take into account any expansion of the plasma that may occur in the second compared to the first stage, and wall losses that impair electrical efficiency can be kept low .
  • the wall surface WF22 or the entire narrowing of the diameter at this distance is metallic and forms a first intermediate electrode A1 at a fixed intermediate potential.
  • an electrode A2 of small radial thickness is provided, which in this section does not reduce the diameter D23L, or does not significantly reduce it, compared to DZ, and which, in an uncontacted manner, assumes an intermediate potential in operation.
  • the electrode arrangement can also differ in the division in the longitudinal direction from the division of the magnetic field into longitudinal sections of the first and second types.
  • the wall surfaces in the sections of the second type can be shaped in various other ways and can be insulating, electrically conductive or even only partially conductive in themselves.
  • the dimensions of the individual longitudinal sections and / or the intermediate electrodes can vary from stage to stage.
  • Male known ion accelerator arrangements can be combined with the features essential to the invention.
  • the cross section of the ionization chamber can also deviate from the rotationally symmetrical shape and assume an elongated shape.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

L'invention concerne un système d'accélérateur d'ions à structure de champ magnétique spéciale, présentant alternativement essentiellement une allure longitudinale et transversale du champ magnétique. Il est prévu pour ce système d'accélérateur d'ions, une géométrie de la chambre d'ionisation de forme non cylindrique de la paroi de la chambre, adaptée à l'allure du champ magnétique.
EP03782395A 2003-01-11 2003-12-13 Systeme accelerateur d´ions Expired - Lifetime EP1586221B8 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10300776 2003-01-11
DE10300776A DE10300776B3 (de) 2003-01-11 2003-01-11 Ionenbeschleuniger-Anordnung
PCT/EP2003/014210 WO2004064461A1 (fr) 2003-01-11 2003-12-13 Systeme d'accelerateur d'ions

Publications (3)

Publication Number Publication Date
EP1586221A1 true EP1586221A1 (fr) 2005-10-19
EP1586221B1 EP1586221B1 (fr) 2012-09-12
EP1586221B8 EP1586221B8 (fr) 2012-10-24

Family

ID=32694882

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03782395A Expired - Lifetime EP1586221B8 (fr) 2003-01-11 2003-12-13 Systeme accelerateur d´ions

Country Status (8)

Country Link
US (1) US7247992B2 (fr)
EP (1) EP1586221B8 (fr)
JP (1) JP4741245B2 (fr)
CN (1) CN100369529C (fr)
AU (1) AU2003290039A1 (fr)
DE (1) DE10300776B3 (fr)
RU (1) RU2278484C2 (fr)
WO (1) WO2004064461A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE529058C2 (sv) * 2005-07-08 2007-04-17 Plasma Surgical Invest Ltd Plasmaalstrande anordning, plasmakirurgisk anordning, användning av en plasmakirurgisk anordning och förfarande för att bilda ett plasma
KR101094919B1 (ko) * 2005-09-27 2011-12-16 삼성전자주식회사 플라즈마 가속기
US8006939B2 (en) 2006-11-22 2011-08-30 Lockheed Martin Corporation Over-wing traveling-wave axial flow plasma accelerator
US7870720B2 (en) * 2006-11-29 2011-01-18 Lockheed Martin Corporation Inlet electromagnetic flow control
DE102006059264A1 (de) * 2006-12-15 2008-06-19 Thales Electron Devices Gmbh Plasmabeschleunigeranordnung
GB2480997A (en) * 2010-06-01 2011-12-14 Astrium Ltd Plasma thruster
CN102767496B (zh) * 2012-05-22 2014-12-03 北京卫星环境工程研究所 化学-电磁混合可变比冲的推进器
CN102767497B (zh) 2012-05-22 2014-06-18 北京卫星环境工程研究所 基于空间原子氧的无燃料航天器推进系统及推进方法
CN103835905B (zh) * 2014-03-03 2016-06-15 哈尔滨工业大学 多级会切磁场等离子体推动器的变截面通道
US9253868B1 (en) * 2014-11-21 2016-02-02 Applied Materials, Inc. Neutral beam source with plasma sheath-shaping neutralization grid
US9480140B2 (en) 2014-11-21 2016-10-25 Applied Materials, Inc. Material modification by neutral beam source with selected collision angle
DE102016206039A1 (de) 2016-04-12 2017-10-12 Airbus Ds Gmbh Entladungskammer eines Ionenantriebs, Ionenantrieb mit einer Entladungskammer und eine Blende zur Anbringung in einer Entladungskammer eines Ionenantriebs
CN105756875B (zh) * 2016-05-12 2018-06-19 哈尔滨工业大学 电离加速一体化空间碎片等离子体推进器
RU2651578C1 (ru) * 2017-01-16 2018-04-23 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" (Госкорпорация "Росатом") Высоковольтная система электропитания сверхвысокочастотного генератора
DE102017204590B3 (de) 2017-03-20 2018-08-02 Airbus Defence and Space GmbH Cusp-Feld-Triebwerk
RU2764823C1 (ru) * 2020-11-16 2022-01-21 Общество С Ограниченной Отвественностью «Эдвансд Пропалшн Системс» Двунаправленный волновой плазменный двигатель для космического аппарата

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3613370A (en) * 1969-11-26 1971-10-19 Nasa Ion thruster
DE3264478D1 (en) * 1981-02-16 1985-08-08 Comp Generale Electricite Capacitor discharge excited gas laser
FR2500220B1 (fr) * 1981-02-16 1986-01-10 Comp Generale Electricite Laser a gaz excite par decharge de condensateurs
JPS6166868A (ja) * 1984-09-11 1986-04-05 Toshiba Corp Ｒｆ型イオン・エンジン
JPH0817116B2 (ja) * 1992-12-24 1996-02-21 核融合科学研究所長 プラズマ電磁加速器
RU2092982C1 (ru) * 1995-05-23 1997-10-10 Саратовский государственный университет им.Н.Г.Чернышевского Способ получения быстрых потоков плазмы
US5599745A (en) * 1995-06-07 1997-02-04 Micron Technology, Inc. Method to provide a void between adjacent conducting lines in a semiconductor device
RU2092983C1 (ru) * 1996-04-01 1997-10-10 Исследовательский центр им.М.В.Келдыша Плазменный ускоритель
JP2959508B2 (ja) * 1997-02-14 1999-10-06 日新電機株式会社 プラズマ発生装置
DE19828704A1 (de) 1998-06-26 1999-12-30 Thomson Tubes Electroniques Gm Plasmabeschleuniger-Anordnung
DE10014033C2 (de) * 2000-03-22 2002-01-24 Thomson Tubes Electroniques Gm Plasma-Beschleuniger-Anordnung
DE10130464B4 (de) * 2001-06-23 2010-09-16 Thales Electron Devices Gmbh Plasmabeschleuniger-Anordnung

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2004064461A1 *

Also Published As

Publication number Publication date
EP1586221B8 (fr) 2012-10-24
RU2278484C2 (ru) 2006-06-20
CN100369529C (zh) 2008-02-13
US7247992B2 (en) 2007-07-24
AU2003290039A1 (en) 2004-08-10
EP1586221B1 (fr) 2012-09-12
US20050212442A1 (en) 2005-09-29
CN1736131A (zh) 2006-02-15
JP2006513537A (ja) 2006-04-20
WO2004064461A1 (fr) 2004-07-29
RU2004123675A (ru) 2006-01-27
DE10300776B3 (de) 2004-09-02
JP4741245B2 (ja) 2011-08-03

Similar Documents

Publication Publication Date Title
DE10300776B3 (de) Ionenbeschleuniger-Anordnung
EP1401708B1 (fr) Dispositif pour accelerateur a plasma
DE602004013401T2 (de) Plasmabeschleuniger mit geschlossener Elektronenbahn
EP1269020B1 (fr) Dispositif accelerateur de plasma
DE3689349T2 (de) Ionenquelle.
DE68926962T2 (de) Plasma elektronengewehr fur ionen aus einer entfernten quelle
DE3429591A1 (de) Ionenquelle mit wenigstens zwei ionisationskammern, insbesondere zur bildung von chemisch aktiven ionenstrahlen
DE10014034C2 (de) Plasma-Beschleuniger-Anordnung
DE3328423A1 (de) Negative ionenquelle
DE3615361C2 (de) Vorrichtung zur Oberflächenbehandlung von Werkstücken
EP2540143A2 (fr) Accélérateur de particules chargées
GB2412493A (en) RF quadrupole systems with potential gradients
EP0810628A2 (fr) Source pour la génération de faisceaux d'ions et d'électrons pulsés à grande surface
DE3603356C2 (fr)
DE3881579T2 (de) Ionenquelle.
DE10300728B3 (de) Ionenbeschleuniger-Anordnung
DE1179309B (de) Hochfrequenz-Ionenquelle
DE2527609C3 (de) Ionenquelle
EP2103198B1 (fr) Dispositif accelerateur de plasma
DE2228117A1 (de) Hohlkathoden-duoplasmatron-ionenquelle
CH650104A5 (de) Mit bombardierung durch elektronen arbeitende ionenquelle.
DE2409327A1 (de) Magnetisch isolierter kondensator und verfahren zur elektrostatischen energiespeicherung und deren anwendung
DE1102302B (de) Vorrichtung mit magnetischen Spiegeln zur Erzeugung hoher Plasmatemperaturen
WO2026033021A1 (fr) Système d'ionisation pour gaz ionisants, unité de propulsion pour vol spatial associée, procédé et utilisation
DE1277941B (de) Gasentladungseinrichtung zur Erzeugung eines Hoechstfrequenzrauschspektrums

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20050811

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL LT LV MK

DAX Request for extension of the european patent (deleted)
RBV Designated contracting states (corrected)

Designated state(s): DE FR GB

RIN1 Information on inventor provided before grant (corrected)

Inventor name: KORNFELD, GUENTER

Inventor name: COUSTOU, GREGORY

Inventor name: KOCH, NORBERT

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

RAP2 Party data changed (patent owner data changed or rights of a patent transferred)

Owner name: THALES AIR SYSTEMS & ELECTRON DEVICES GMBH

REG Reference to a national code

Ref country code: DE

Ref legal event code: R082

Ref document number: 50314493

Country of ref document: DE

Representative=s name: BAUR & WEBER PATENTANWAELTE, DE

Ref country code: DE

Ref legal event code: R082

Ref document number: 50314493

Country of ref document: DE

Representative=s name: GERHARD WEBER, DE

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 50314493

Country of ref document: DE

Effective date: 20121108

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20130613

REG Reference to a national code

Ref country code: DE

Ref legal event code: R082

Ref document number: 50314493

Country of ref document: DE

Representative=s name: BAUR & WEBER PATENTANWAELTE, DE

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 50314493

Country of ref document: DE

Effective date: 20130613

REG Reference to a national code

Ref country code: DE

Ref legal event code: R082

Ref document number: 50314493

Country of ref document: DE

Representative=s name: BAUR & WEBER PATENTANWAELTE PARTG MBB, DE

Effective date: 20130911

Ref country code: DE

Ref legal event code: R082

Ref document number: 50314493

Country of ref document: DE

Representative=s name: BAUR & WEBER PATENTANWAELTE PARTG MBB, DE

Effective date: 20121010

Ref country code: DE

Ref legal event code: R081

Ref document number: 50314493

Country of ref document: DE

Owner name: THALES ELECTRONIC SYSTEMS GMBH, DE

Free format text: FORMER OWNER: THALES ELECTRON DEVICES GMBH, 89077 ULM, DE

Effective date: 20121010

Ref country code: DE

Ref legal event code: R081

Ref document number: 50314493

Country of ref document: DE

Owner name: THALES ELECTRONIC SYSTEMS GMBH, DE

Free format text: FORMER OWNER: THALES AIR SYSTEMS & ELECTRON DEVICES GMBH, 89077 ULM, DE

Effective date: 20130911

Ref country code: DE

Ref legal event code: R082

Ref document number: 50314493

Country of ref document: DE

Representative=s name: BAUR & WEBER PATENTANWAELTE, DE

Effective date: 20130911

Ref country code: DE

Ref legal event code: R081

Ref document number: 50314493

Country of ref document: DE

Owner name: THALES ELECTRONIC SYSTEMS GMBH, DE

Free format text: FORMER OWNER: THALES ELECTRON DEVICES GMBH, 89077 ULM, DE

Effective date: 20120912

Ref country code: DE

Ref legal event code: R082

Ref document number: 50314493

Country of ref document: DE

Representative=s name: BAUR & WEBER PATENTANWAELTE, DE

Effective date: 20121010

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 13

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 14

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 15

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20181219

Year of fee payment: 16

Ref country code: FR

Payment date: 20181218

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20181231

Year of fee payment: 16

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 50314493

Country of ref document: DE

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20191213

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20191213

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200701

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20191231