EP1550195A1 - Anordnung für n verbraucher elektrischer energie, von denen m verbraucher gleichzeitig mit energie versorgt werden - Google Patents
Anordnung für n verbraucher elektrischer energie, von denen m verbraucher gleichzeitig mit energie versorgt werdenInfo
- Publication number
- EP1550195A1 EP1550195A1 EP03776843A EP03776843A EP1550195A1 EP 1550195 A1 EP1550195 A1 EP 1550195A1 EP 03776843 A EP03776843 A EP 03776843A EP 03776843 A EP03776843 A EP 03776843A EP 1550195 A1 EP1550195 A1 EP 1550195A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- consumers
- energy
- arrangement according
- systems
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—ELECTRIC POWER NETWORKS; CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J1/00—Circuit arrangements for DC mains or DC distribution networks
- H02J1/10—Parallel operation of DC sources
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—ELECTRIC POWER NETWORKS; CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J4/00—Circuit arrangements for mains or distribution networks not specified as AC or DC; Circuit arrangements for mains or distribution networks combining AC and DC sections or sub-networks
Definitions
- the invention relates to an arrangement according to the preamble of patent claim 1.
- Coating systems often consist of several sputtering devices, which are provided with different sputtering cathodes in order to apply different coatings to glass, for example.
- Each sputtering device has its own energy supply, which can be a direct current (DC) or alternating current (AC) energy supply.
- DC direct current
- AC alternating current
- the electrical powers with which the sputtering devices work are different. They can be 15 kW, but also 180 kW. For example, if you take fifteen sputtering devices with the outputs 180 kW (AC), 30 kW (DC), 75 kW (DC), 30 kW (DC), 30 kW (DC), 120 kW (DC), 120 kW (AC) , 120 kW (AC), 75 kW (DC), 120 kW (DC), 30 kW (DC), 30 kW (DC), 120 kW (DC), 120 kW (AC), 120 kW (AC) off, this results in a total AC power of 660 kW and a total DC power of 660 kW, which must be provided.
- An electrical power supply currently costs around € 700.00 per kilowatt, which results in a total electricity supply cost of € 924,000.00.
- the object of the invention is therefore to provide only as much electrical power as is actually required.
- the invention thus relates to an arrangement for several consumers of electrical energy, these consumers either having the same electrical power or different electrical powers. Since usually not all consumers have to be supplied with electrical energy at the same time, e.g. B. if some are out of service due to maintenance, a modular power supply system is provided that is off consists of several interconnectable modules. As a result, each consumer can be supplied with the power that he needs from small units.
- FIG. 1 shows a schematic diagram of a modular energy supply
- Fig. 2 shows a two-pole connection of energy supply sources to supply lines.
- sputtering systems 1 to 15 are shown schematically as boxes, which are arranged one behind the other, for example in a hall. Glass panes to be coated, which are provided with one or more layers, run through these sputtering systems 1 to 15.
- the respective electrical connected load of these sputtering systems 1 to 15 is shown within a box; likewise the material of a target to be split.
- the layer that is produced with the sputtered material on a substrate is shown to the right of sputtering systems 1 to 15.
- each system has its own power supply, which can provide the required performance.
- a controller 36 which links several individual energy supplies 16 to 35 to one another by means of a control line and switches 37 to 67.
- the sputtering system 5 requires 30 kW, so that the interconnection of the individual energy supplies 19 and 23 or 18 and 19 etc. is sufficient.
- the sputtering system 5 If the sputtering system 5 is switched on, feedback can take place via a line 70 to the controller 36, which then knows that thirty kW must be provided for the sputtering arrangement 5. You then linked z. B. by means of a control command via a line 71 and the switch 43, the two individual power supplies 19 and 23rd together. If the line 71 is designed as a control and power line, the interconnected power can be looped through the controller 36 and fed to the sputtering system 5 via the line 70.
- each sputtering system has its own regulation, which u. a. is responsible for preventing flashovers.
- the so-called are management thus remains assigned to each individual sputtering system 1 to 15 or its cathodes.
- an adaptation network must be assigned to each cathode during AC operation. If the sputter cathodes are operated with pulsed direct current, each cathode is connected to a pulse generator in addition to its own are management. If double cathodes are used, a polarity reversal unit is assigned to two cathodes.
- Fig. 2 the connection of two individual power supplies 19, 23 is shown again two-pole.
- the two individual energy supplies 19, 23 are connected to the supply lines 84, 85 via switches 80, 81 and 82, 83.
- the control lines 86 to 89 and supply lines 84, 85 can be guided to the controller 36 in a single cable. However, it is also possible to run both types of cable separately.
- the are management, the adaptation networks and the circuits necessary for the pulse operation can be arranged directly at the cathodes or in their vicinity.
- the sputtering systems 1 to 15 can of course also all have the same performance data. For example, there are many coating systems in a production hall of the same type and are some systems such. B. not in operation due to maintenance or revision, so that the actual utilization is around 80%, you can switch the required power to the systems in operation with the modular power supply 100. The systems that are at a standstill would then not be connected to the power supply.
- the invention has been described on the basis of an exemplary embodiment which relates to sputtering systems. However, it is applicable to all coating systems and, more generally, to all power consumers.
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Supply And Distribution Of Alternating Current (AREA)
- Direct Current Feeding And Distribution (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2003141717 DE10341717A1 (de) | 2003-09-10 | 2003-09-10 | Anordnung für n Verbraucher elektrischer Energie, von denen m Verbraucher gleichzeitig mit Energie versorgt werden |
| DE10341717 | 2003-09-10 | ||
| PCT/DE2003/003714 WO2005027299A1 (de) | 2003-09-10 | 2003-11-10 | Anordnung für n verbraucher elektrischer energie, von denen m verbraucher gleichzeitig mit energie versorgt werden |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1550195A1 true EP1550195A1 (de) | 2005-07-06 |
Family
ID=34223521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP03776843A Withdrawn EP1550195A1 (de) | 2003-09-10 | 2003-11-10 | Anordnung für n verbraucher elektrischer energie, von denen m verbraucher gleichzeitig mit energie versorgt werden |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7479712B2 (de) |
| EP (1) | EP1550195A1 (de) |
| JP (1) | JP2006514527A (de) |
| KR (1) | KR100679618B1 (de) |
| CN (1) | CN100349350C (de) |
| AU (1) | AU2003286122A1 (de) |
| DE (1) | DE10341717A1 (de) |
| PL (1) | PL377149A1 (de) |
| TW (1) | TWI265665B (de) |
| WO (1) | WO2005027299A1 (de) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2010083334A1 (en) * | 2009-01-14 | 2010-07-22 | Integral Analytics, Inc. | Optimization of microgrid energy use and distribution |
| US8706650B2 (en) * | 2009-01-14 | 2014-04-22 | Integral Analytics, Inc. | Optimization of microgrid energy use and distribution |
| JP5722875B2 (ja) * | 2009-04-10 | 2015-05-27 | ザ リージェンツ オブ ザ ユニバーシティ オブ ミシガン | 大規模バッテリシステムのための動的に再構成可能な構造 |
| US9118213B2 (en) | 2010-11-24 | 2015-08-25 | Kohler Co. | Portal for harvesting energy from distributed electrical power sources |
| JP5701730B2 (ja) * | 2011-09-30 | 2015-04-15 | 株式会社東芝 | 充放電判定装置、充放電判定方法、及び充放電判定プログラム |
| JP5731941B2 (ja) * | 2011-09-30 | 2015-06-10 | 株式会社東芝 | 充放電指示装置、充放電指示方法、及び充放電指示プログラム |
| US10510575B2 (en) | 2017-09-20 | 2019-12-17 | Applied Materials, Inc. | Substrate support with multiple embedded electrodes |
| US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
| US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
| CN118315254A (zh) | 2019-01-22 | 2024-07-09 | 应用材料公司 | 用于控制脉冲电压波形的反馈回路 |
| US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
| US11848176B2 (en) | 2020-07-31 | 2023-12-19 | Applied Materials, Inc. | Plasma processing using pulsed-voltage and radio-frequency power |
| US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
| US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
| US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
| US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
| US12148595B2 (en) | 2021-06-09 | 2024-11-19 | Applied Materials, Inc. | Plasma uniformity control in pulsed DC plasma chamber |
| US20220399186A1 (en) | 2021-06-09 | 2022-12-15 | Applied Materials, Inc. | Method and apparatus to reduce feature charging in plasma processing chamber |
| US12525441B2 (en) | 2021-06-09 | 2026-01-13 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
| US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
| US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US11776788B2 (en) | 2021-06-28 | 2023-10-03 | Applied Materials, Inc. | Pulsed voltage boost for substrate processing |
| US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
| US12106938B2 (en) | 2021-09-14 | 2024-10-01 | Applied Materials, Inc. | Distortion current mitigation in a radio frequency plasma processing chamber |
| US11694876B2 (en) | 2021-12-08 | 2023-07-04 | Applied Materials, Inc. | Apparatus and method for delivering a plurality of waveform signals during plasma processing |
| US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US12315732B2 (en) | 2022-06-10 | 2025-05-27 | Applied Materials, Inc. | Method and apparatus for etching a semiconductor substrate in a plasma etch chamber |
| US12586768B2 (en) | 2022-08-10 | 2026-03-24 | Applied Materials, Inc. | Pulsed voltage compensation for plasma processing applications |
| US12272524B2 (en) | 2022-09-19 | 2025-04-08 | Applied Materials, Inc. | Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics |
| US12111341B2 (en) | 2022-10-05 | 2024-10-08 | Applied Materials, Inc. | In-situ electric field detection method and apparatus |
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| DE2811942C2 (de) | 1977-03-23 | 1986-09-18 | Vide et Traitement S.A., Neuilly-en-Thelle | Ofen zur ionischen Nitrierbehandlung von metallischen Werkstücken |
| JPS583976A (ja) | 1981-06-29 | 1983-01-10 | Hitachi Ltd | スパツタリングによる成膜方法及びその装置 |
| JPS62158863A (ja) | 1985-12-30 | 1987-07-14 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 被膜形成装置 |
| JP2613201B2 (ja) | 1987-01-23 | 1997-05-21 | 株式会社日立製作所 | スパツタリング方法 |
| US4788449A (en) * | 1987-04-24 | 1988-11-29 | The Foxboro Company | Redundant power distribution |
| DE4305748A1 (de) * | 1993-02-25 | 1994-09-01 | Leybold Ag | Vorrichtung zum Beschichten und/oder Ätzen von Substraten in einer Vakuumkammer |
| US5444333A (en) * | 1993-05-26 | 1995-08-22 | Lights Of America, Inc. | Electronic ballast circuit for a fluorescent light |
| DE59502398D1 (de) | 1994-09-21 | 1998-07-09 | Inventio Ag | Verfahren und Einrichtung zur variablen Zuteilung von in Betrieb stehenden Umrichtern auf mindestens eine Last |
| AUPN422295A0 (en) * | 1995-07-18 | 1995-08-10 | Bytecraft Research Pty. Ltd. | Control system |
| JPH0956064A (ja) | 1995-08-21 | 1997-02-25 | Matsushita Electric Ind Co Ltd | 電源制御装置 |
| US5584974A (en) * | 1995-10-20 | 1996-12-17 | Eni | Arc control and switching element protection for pulsed dc cathode sputtering power supply |
| DE19540255A1 (de) | 1995-10-28 | 1997-04-30 | Leybold Ag | Vorrichtung zum Beschichten eines Substrats |
| JPH09204240A (ja) | 1996-01-24 | 1997-08-05 | Fujitsu Ltd | 電力供給装置 |
| US5914585A (en) * | 1996-02-20 | 1999-06-22 | Norand Corporation | Power sharing in computing systems with a plurality of electronic devices |
| DE19610012B4 (de) * | 1996-03-14 | 2005-02-10 | Unaxis Deutschland Holding Gmbh | Verfahren zur Stabilisierung eines Arbeitspunkts beim reaktiven Zerstäuben in einer Sauerstoff enthaltenden Atmosphäre |
| DE19651811B4 (de) | 1996-12-13 | 2006-08-31 | Unaxis Deutschland Holding Gmbh | Vorrichtung zum Belegen eines Substrats mit dünnen Schichten |
| DE19848636C2 (de) * | 1998-10-22 | 2001-07-26 | Fraunhofer Ges Forschung | Verfahren zur Überwachung einer Wechselspannungs-Entladung an einer Doppelelektrode |
| US6625736B1 (en) * | 1999-07-29 | 2003-09-23 | International Business Machines Corporation | System for automatically determining a number of power supplies are required by managing changes of the power requirements in a power consuming system |
| DE19937859C2 (de) * | 1999-08-13 | 2003-06-18 | Huettinger Elektronik Gmbh | Elektrische Versorgungseinheit für Plasmaanlagen |
| US6448672B1 (en) * | 2000-02-29 | 2002-09-10 | 3Com Corporation | Intelligent power supply control for electronic systems requiring multiple voltages |
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| JP4614578B2 (ja) | 2001-06-01 | 2011-01-19 | キヤノンアネルバ株式会社 | スパッタ成膜応用のためのプラズマ処理装置 |
| EP1263108A1 (de) | 2001-06-01 | 2002-12-04 | Roke Manor Research Limited | Energieverwaltungssystem für eine Gemeinschaft |
| CA2463135C (en) | 2001-10-11 | 2014-10-07 | Denovo Research, Llc | Dynamic battery array controllable to provide individual electrical power busses for different electrical loads |
| US7112896B2 (en) * | 2002-03-07 | 2006-09-26 | Sun Microsystems, Inc. | Power system with load matrix |
-
2003
- 2003-09-10 DE DE2003141717 patent/DE10341717A1/de not_active Ceased
- 2003-10-27 US US10/694,530 patent/US7479712B2/en not_active Expired - Fee Related
- 2003-11-10 AU AU2003286122A patent/AU2003286122A1/en not_active Abandoned
- 2003-11-10 JP JP2005508828A patent/JP2006514527A/ja active Pending
- 2003-11-10 PL PL37714903A patent/PL377149A1/pl unknown
- 2003-11-10 WO PCT/DE2003/003714 patent/WO2005027299A1/de not_active Ceased
- 2003-11-10 CN CNB2003801029401A patent/CN100349350C/zh not_active Expired - Fee Related
- 2003-11-10 KR KR1020057006165A patent/KR100679618B1/ko not_active Expired - Fee Related
- 2003-11-10 EP EP03776843A patent/EP1550195A1/de not_active Withdrawn
-
2004
- 2004-02-02 TW TW93102283A patent/TWI265665B/zh not_active IP Right Cessation
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2005027299A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| PL377149A1 (pl) | 2006-01-23 |
| CN1711666A (zh) | 2005-12-21 |
| CN100349350C (zh) | 2007-11-14 |
| KR100679618B1 (ko) | 2007-02-06 |
| KR20050067176A (ko) | 2005-06-30 |
| WO2005027299A1 (de) | 2005-03-24 |
| US7479712B2 (en) | 2009-01-20 |
| TWI265665B (en) | 2006-11-01 |
| DE10341717A1 (de) | 2005-05-25 |
| AU2003286122A1 (en) | 2005-04-06 |
| US20050052803A1 (en) | 2005-03-10 |
| TW200511684A (en) | 2005-03-16 |
| JP2006514527A (ja) | 2006-04-27 |
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