EP1526407A3 - An assembly, a lithographic apparatus, and a device manufacturing method - Google Patents

An assembly, a lithographic apparatus, and a device manufacturing method Download PDF

Info

Publication number
EP1526407A3
EP1526407A3 EP04077856A EP04077856A EP1526407A3 EP 1526407 A3 EP1526407 A3 EP 1526407A3 EP 04077856 A EP04077856 A EP 04077856A EP 04077856 A EP04077856 A EP 04077856A EP 1526407 A3 EP1526407 A3 EP 1526407A3
Authority
EP
European Patent Office
Prior art keywords
lithographic apparatus
respect
support frame
assembly
device manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04077856A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1526407A2 (en
Inventor
Dominicus Jacobus Petrus Adrianus Franken
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Priority to EP04077856A priority Critical patent/EP1526407A3/en
Publication of EP1526407A2 publication Critical patent/EP1526407A2/en
Publication of EP1526407A3 publication Critical patent/EP1526407A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP04077856A 2003-10-21 2004-10-15 An assembly, a lithographic apparatus, and a device manufacturing method Withdrawn EP1526407A3 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP04077856A EP1526407A3 (en) 2003-10-21 2004-10-15 An assembly, a lithographic apparatus, and a device manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03078325 2003-10-21
EP03078325 2003-10-21
EP04077856A EP1526407A3 (en) 2003-10-21 2004-10-15 An assembly, a lithographic apparatus, and a device manufacturing method

Publications (2)

Publication Number Publication Date
EP1526407A2 EP1526407A2 (en) 2005-04-27
EP1526407A3 true EP1526407A3 (en) 2009-04-22

Family

ID=34639287

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04077856A Withdrawn EP1526407A3 (en) 2003-10-21 2004-10-15 An assembly, a lithographic apparatus, and a device manufacturing method

Country Status (6)

Country Link
US (2) US7474378B2 (zh)
EP (1) EP1526407A3 (zh)
JP (2) JP2005129940A (zh)
KR (1) KR100660502B1 (zh)
CN (1) CN100461001C (zh)
TW (1) TWI262363B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI262363B (en) 2003-10-21 2006-09-21 Asml Netherlands Bv An assembly, a lithographic apparatus, and a device manufacturing method
DE102009029673A1 (de) * 2009-09-22 2010-11-25 Carl Zeiss Smt Ag Manipulator zur Positionierung eines optischen Elementes in mehreren räumlichen Freiheitsgraden

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6147818A (en) * 1998-12-21 2000-11-14 The Regents Of The University Of California Projection optics box
US20030010902A1 (en) * 2001-07-14 2003-01-16 Carl-Zeiss Semiconductor Manufacturing Technologies Ag Optical system with a plurality of optical elements

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2983749B2 (ja) 1992-01-31 1999-11-29 京セラ株式会社 光学部品の位置決め保持体およびその製造方法
JPH1068902A (ja) 1996-08-26 1998-03-10 Sankyo Seiki Mfg Co Ltd 光走査装置における光学レンズの固定構造
JPH10144602A (ja) 1996-11-14 1998-05-29 Nikon Corp 反射ミラー保持装置及び投影露光装置
JPH10253872A (ja) 1997-03-13 1998-09-25 Nikon Corp 反射光学部材の保持装置及び露光装置
US6473205B1 (en) * 1998-06-03 2002-10-29 Agfa Corporation Image sensor module adjustable in six degrees of freedom for use with an image acquisition device
EP1293831A1 (en) 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
JP2000040651A (ja) 1998-07-23 2000-02-08 Canon Inc 光学装置、露光装置ならびにデバイス製造方法
JP2001319873A (ja) * 2000-02-28 2001-11-16 Nikon Corp 投影露光装置、並びにその製造方法及び調整方法
US6538720B2 (en) * 2001-02-28 2003-03-25 Silicon Valley Group, Inc. Lithographic tool with dual isolation system and method for configuring the same
JP2003092477A (ja) * 2001-09-18 2003-03-28 Iwata Seisakusho:Kk ブラケット
DE60219871T2 (de) * 2001-11-07 2008-01-17 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP1321822A1 (en) * 2001-12-21 2003-06-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
DE10212547A1 (de) 2002-03-21 2003-10-02 Zeiss Carl Smt Ag Vorrichtung zur Manipulation der Winkellage eines Gegenstands gegenüber einer festen Struktur
TWI262363B (en) * 2003-10-21 2006-09-21 Asml Netherlands Bv An assembly, a lithographic apparatus, and a device manufacturing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6147818A (en) * 1998-12-21 2000-11-14 The Regents Of The University Of California Projection optics box
US20030010902A1 (en) * 2001-07-14 2003-01-16 Carl-Zeiss Semiconductor Manufacturing Technologies Ag Optical system with a plurality of optical elements

Also Published As

Publication number Publication date
JP2005129940A (ja) 2005-05-19
TWI262363B (en) 2006-09-21
EP1526407A2 (en) 2005-04-27
CN100461001C (zh) 2009-02-11
KR100660502B1 (ko) 2006-12-26
US7474378B2 (en) 2009-01-06
TW200517793A (en) 2005-06-01
US20080158534A1 (en) 2008-07-03
US20050134821A1 (en) 2005-06-23
CN1609714A (zh) 2005-04-27
JP2008252149A (ja) 2008-10-16
US7525637B2 (en) 2009-04-28
KR20050038560A (ko) 2005-04-27

Similar Documents

Publication Publication Date Title
EP1783555A3 (en) Lithographic apparatus and device manufacturing method
EP1610183A3 (en) Lithographic apparatus and device manufacturing method
EP1847877A3 (en) Lithographic apparatus and device manufacturing method
EP1628161A3 (en) Lithographic apparatus and device manufacturing method
EP1659451A3 (en) Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus
EP1669809A3 (en) Radiation exposure apparatus comprising a gas flushing system
EP3432073A8 (en) Exposure apparatus, exposure method, and method for producing device
EP2515159A3 (en) A device having a light-absorbing mask and a method for fabricating same.
EP3118890A3 (en) Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method
EP2090929A3 (en) Mold, pattern forming method, and pattern forming apparatus
EP1975722A3 (en) Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
EP2469605A3 (en) Substrate for photoelectric conversion device, photoelectric conversion device, and stacked photoelectric conversion device
EP1612607A3 (en) Lithographic apparatus and device manufacturing method
EP1531364A3 (en) Lithographic apparatus and device manufacturing method
EP1513012A3 (en) Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
EP1630613A3 (en) Patterned mask holding device and method using two holding systems
EP2995997A3 (en) Exposure apparatus, exposure method, and device fabricating method
EP1482375A3 (en) Lithographic apparatus and device manufacturing method
EP2998983A3 (en) Stage apparatus, exposure apparatus and device fabricating method
EP1542076A3 (en) Lithographic apparatus and device manufacturing method
WO2004011984A3 (en) Retainer, exposure apparatus, and semiconductor device fabrication method
EP1487026A3 (en) Optical part and its manufacturing method
TW200622507A (en) Lithographic apparatus and device manufacturing method
EP1260847A3 (en) Optical element, scanning optical system having the same, and image forming apparatus
EP1744376A3 (en) Semiconductor device and manufacturing method thereof

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL HR LT LV MK

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL HR LT LV MK

AKX Designation fees paid
REG Reference to a national code

Ref country code: DE

Ref legal event code: 8566

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20090920