EP1518004B1 - Trenngaseinsatz bei der kontinuierlichen schmelztauchveredelung - Google Patents
Trenngaseinsatz bei der kontinuierlichen schmelztauchveredelung Download PDFInfo
- Publication number
- EP1518004B1 EP1518004B1 EP03714895A EP03714895A EP1518004B1 EP 1518004 B1 EP1518004 B1 EP 1518004B1 EP 03714895 A EP03714895 A EP 03714895A EP 03714895 A EP03714895 A EP 03714895A EP 1518004 B1 EP1518004 B1 EP 1518004B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- zinc
- gas
- nitrogen
- hot dip
- sulphur
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 30
- 239000002184 metal Substances 0.000 title claims abstract description 30
- 238000000926 separation method Methods 0.000 title abstract description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 28
- 239000011701 zinc Substances 0.000 claims abstract description 28
- 239000007789 gas Substances 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910001297 Zn alloy Inorganic materials 0.000 claims abstract description 7
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 6
- 239000010959 steel Substances 0.000 claims abstract description 6
- 229910052786 argon Inorganic materials 0.000 claims abstract description 4
- 239000001273 butane Substances 0.000 claims abstract description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims abstract description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000001294 propane Substances 0.000 claims abstract description 3
- 238000003618 dip coating Methods 0.000 claims description 5
- 238000009834 vaporization Methods 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 230000008020 evaporation Effects 0.000 abstract description 6
- 238000001704 evaporation Methods 0.000 abstract description 6
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 abstract description 3
- 229960000909 sulfur hexafluoride Drugs 0.000 abstract description 3
- 229910052724 xenon Inorganic materials 0.000 abstract description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052743 krypton Inorganic materials 0.000 abstract description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 abstract description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 abstract 3
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 abstract 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 abstract 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 abstract 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 abstract 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 abstract 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 abstract 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 abstract 1
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 abstract 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 abstract 1
- 229910015900 BF3 Inorganic materials 0.000 abstract 1
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 abstract 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 abstract 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 abstract 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 abstract 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 abstract 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 abstract 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 abstract 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 abstract 1
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 abstract 1
- 239000001282 iso-butane Substances 0.000 abstract 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 abstract 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 abstract 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 abstract 1
- 229910000077 silane Inorganic materials 0.000 abstract 1
- 239000005049 silicon tetrachloride Substances 0.000 abstract 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 abstract 1
- QHMQWEPBXSHHLH-UHFFFAOYSA-N sulfur tetrafluoride Chemical compound FS(F)(F)F QHMQWEPBXSHHLH-UHFFFAOYSA-N 0.000 abstract 1
- 239000004291 sulphur dioxide Substances 0.000 abstract 1
- 235000010269 sulphur dioxide Nutrition 0.000 abstract 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 abstract 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 abstract 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 abstract 1
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000011261 inert gas Substances 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000000859 sublimation Methods 0.000 description 4
- 230000008022 sublimation Effects 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 238000005246 galvanizing Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910018503 SF6 Inorganic materials 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000004913 activation Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 229910052704 radon Inorganic materials 0.000 description 1
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0034—Details related to elements immersed in bath
- C23C2/00342—Moving elements, e.g. pumps or mixers
- C23C2/00344—Means for moving substrates, e.g. immersed rollers or immersed bearings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0038—Apparatus characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process
- C23C2/004—Snouts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
Definitions
- the invention relates to a method for suppressing the zinc evaporation in the hot dip coating of a steel strip with zinc or zinc alloys.
- the document DE 44 00 886 C2 describes a method for suppressing the zinc evaporation in the hot dip coating of a steel strip with zinc or zinc alloys, wherein the steel strip is in an inlet region under a protective gas atmosphere of a mixture of an inert gas with hydrogen and / or carbon monoxide as reducing gases and additionally carbon dioxide.
- the protective gas atmosphere should contain up to 20 percent by volume of hydrogen and up to 10 percent by volume of carbon monoxide, or it should be added to the inert gas atmosphere 0.05 to 8 percent by volume of Co 2 .
- EP 0 172 681 B1 discloses a method for suppressing the development of zinc fumes in a continuous process for hot dip coating an iron-based metal strip with zinc or zinc alloys, in which the strip is enclosed in an inlet region. Water vapor is introduced into this inlet region to maintain an atmosphere which oxidizes the zinc vapors but does not oxidize the iron band and which contains at least 264 ppm of water vapor and at least 1% by volume of hydrogen.
- the atmosphere within the inlet region should contain 1 to 8 percent by volume of hydrogen and 300-4500 percent by volume of water vapor, the adjustment being carried out with an inert gas, for example nitrogen.
- the US 6,224,692 B1 discloses a method and apparatus for electroplating a metal strip.
- the metal strip is passed into a bath of liquid zinc or a liquid zinc alloy after it has previously been exposed to a hydrogen or inert gas atmosphere to remove any residual oxides present on the surface of the metal strip.
- the document US 4,862,825 describes a stripping process for a metal strip after it has passed through a zinc bath. After leaving the zinc bath, the metal strip is blown with a non-oxidizing gas intended to prevent the oxidation of the still fresh zinc coating on the metal strip.
- the gas used is preferably sulfur hexafluoride SF 6 .
- the Japanese publication JP 07180014 discloses a method for suppressing evaporation of zinc on the surface of a zinc dipping bath for galvanizing a metal strip.
- the surface is provided of the immersion bath by applying gaseous nitrogen to 420 ° C to 440 ° C to cool. This advantageously leads to the fact that the zinc no longer evaporates on the surface of the immersion bath and that the metal strip after passing through the zinc bath has a zinc coating with a very good surface.
- Japanese pamphlet JP-A-279 730 a process for hot-dip galvanizing a metal strip with suppressed zinc bath oxidation in the area of Badeintritts.
- the zinc oxidation is suppressed by introducing inert gas having a density> 2 kg / m 2 into a furnace trunk through which the metal strip is introduced into the zinc bath.
- the inert gas is one or at least two of the following inert gases xenon, krypton, radon or sulfur hexafluoride. These inert gases are mainly used to prevent zinc oxidation.
- the reduction of zinc evaporation is only a side effect.
- Xenon is a very expensive gas and therefore can not be used for industrial mass production.
- the present invention seeks to provide an alternative separation gas for suppressing zinc evaporation in the hot dip coating of a metal strip with zinc or with a zinc alloy.
- the invention is shown schematically in a figure 1. It can be seen from the drawing that the claimed gas mixture is used in such a way that during normal operation no large amounts of gas are required for injection into the furnace trunk 1.
- the furnace trunk 1 Into the metal bath 2 located in the container 6, the furnace trunk 1, through which the metal strip 3 to be coated is inserted, emerges obliquely.
- the metal strip 3 dips into the metal or coating bath 2, is deflected by the deflection roller 7 and exits at 8 from the metal bath. Above the exit point scraper nozzles 9 are arranged.
- a separating gas layer of the claimed gas mixture between the surface of the metal bath 2 and a gas mixture 5 commonly used in the furnace trunk, consisting of nitrogen and hydrogen. With the use of a separating gas, the zinc sublimation in the continuous hot dipping refinement is at least largely reduced or completely avoided.
Description
- Die Erfindung betrifft ein Verfahren zur Unterdrückung der Zinkverdampfung beim Schmelztauchbeschichten eines Stahlbandes mit Zink oder Zinklegierungen.
- Bei der kontinuierlichen Schmelztauchveredelung und speziell der Feuerverzinkung von Metallbändern tritt der Effekt der Sublimation des Beschichtungsmetalls auf. Dies ist besonders kritisch, da die Sublimation auch im Ofenraum der vorgelagerten Bandglühung und Oberflächenaktivierung stattfindet. In diesem Aggregat liegt üblicherweise eine Wasserstoff-/Stickstoffatmosphäre vor. Das Sublimat dringt gegen den Bandlauf zurück und lagert sich an kälteren Stellen im Ofen ab. Dieser Effekt wird durch die Anwesenheit von Wasserstoff gefördert. Dieser Effekt ist bekannt und führt mit zunehmender Sublimatbildung zu Oberflächenfehler auf dem zu beschichtenden Metallband.
- Aus dem Stand der Technik ist bekannt, dass durch eine Zugabe von Feuchte bzw. von Kohlenmonoxid/-dioxid der Sublimationseffekt nachhaltig gehemmt und sogar unterdrückt werden kann.
- Das Dokument
DE 44 00 886 C2 beschreibt hierzu ein Verfahren zur Unterdrückung der Zinkverdampfung beim Schmelztauchbeschichten eines Stahlbandes mit Zink oder Zinklegierungen, wobei sich das Stahlband in einem Einlaufbereich unter einer Schutzgasatmosphäre aus einem Gemisch eines Inertgases mit Wasserstoff und/oder Kohlenmonoxid als reduzierenden Gasen und zusätzlich Kohlendioxid befindet. Die Schutzgasatmosphäre soll bis 20 Volumenprozent Wasserstoff und bis 10 Volumenprozent Kohlenmonoxid enthalten oder es soll der Schutzgasatmosphäre 0,05 bis 8 Volumenprozent Co2 zugemischt werden. - In dem Dokument
EP 0 172 681 B1 wird ein Verfahren zur Unterdrückung der Entwicklung von Zinkdämpfen in einem kontinuierlichen Verfahren zur Heißtauchbeschichtung eines auf Eisen basierenden Metallbandes mit Zink- oder Zinklegierungen beschrieben, bei welchem das Band in einem Einlassbereich eingeschlossen ist. Dabei wird Wasserdampf in diesen Einlassbereich eingeleitet, um eine Atmosphäre aufrechtzuerhalten, die die Zinkdämpfe oxidiert, jedoch das Eisenband nicht oxidiert und die mindestens 264 ppm Wasserdampf und mindestens 1 Volumenprozent Wasserstoff enthält. Bevorzugt soll die Atmosphäre innerhalb des Einlaufbereichs 1 bis 8 Volumenprozent Wasserstoff und 300 - 4500 Volumen-ppm Wasserdampf enthalten, wobei der Abgleich mit einem inerten Gas bspw. Stickstoff erfolgt. - Die im Stand der Technik verwendeten Gase oder Gasgemische führen aber auch zu einer Oxidation der Metallbandoberfläche, die eine fehlerfreie Beschichtung erschwert. Auch diese Problematik, insbesondere bei der Feuchte, ist bei der Produktion von feuerverzinkten Metallbändern hinlänglich bekannt.
- Die
US 6,224,692 B1 offenbart ein Verfahren und eine Vorrichtung zum Galvanisieren eines Metallbandes. Dabei wird das Metallband in ein Bad aus flüssigem Zink oder einer flüssigen Zinklegierung geführt, nachdem es zuvor einer Wasserstoff oder Inertgas-Atmosphäre ausgesetzt wurde, um eventuell auf der Oberfläche des Metallbandes vorhandene Restoxide zu entfernen. - Das Dokument
US 4,862,825 beschreibt einen Abstreifprozess für ein Metallband, nachdem dieses ein Zinkbad durchlaufen hat. Nach dem Verlassen des Zinkbades wird das Metallband mit einem nicht oxidierenden Gas angeblasen, welches die Oxidation der noch frischen Zinkbeschichtung auf dem Metallband verhindern soll. Als Gas wird vorzugsweise Schwefelhexafluorid SF6 verwendet. - Die japanische Druckschrift
JP 07180014 - Und schließlich betrifft japanische Druckschrift
JP-A-279 730 - Xenon ist ein sehr teures Gas und deshalb für einen industriellen Massenbetrieb nicht einsetzbar.
- Ausgehend von diesem Stand der Technik liegt der Erfindung die Aufgabe zugrunde, ein alternatives Trenngas zum Unterdrücken einer Zinkverdampfung beim Schmelztauchbeschichten eines Metallbandes mit Zink oder mit einer Zinklegierung bereitzustellen.
- Diese Aufgabe wird durch das in dem Patentanspruch 1 beanspruchte Verfahren gelöst.
- Die Verwendung von einem Gasgemisch bestehend aus Argon mit Beimischungen von Butan und/oder Propan als Trenngas bewirken vorteilhafterweise eine Unterdrückung der Zinksublimatbildung mit im Vergleich zu anderen bekannten Trenngasen geringen Kosten und ohne radioaktive Strahlung.
- Die Erfindung wird in einer Figur 1 schematisch dargestellt. Anhand der Zeichnung ist erkennbar, dass das beanspruchte Gasgemisch in der Weise verwendet wird, dass beim normalen Betrieb keine hohen Gasmengen zur Eindüsung in den Ofenrüssel 1 erforderlich sind. In das im Behälter 6 befindliche Metallbad 2 taucht schräg der Ofenrüssel 1 ein, durch den das zu beschichtende Metallband 3 geführt ist. Das Metallband 3 taucht in das Metallbad bzw. Beschichtungsbad 2 ein, wird von der Umlenkrolle 7 umgelenkt und tritt bei 8 aus dem Metallbad aus. Oberhalb der Austrittsstelle sind Abstreifdüsen 9 angeordnet. In dem Ofenrüssel 1 befindet sich eine Trenngasschicht aus dem beanspruchten Gasgemisch zwischen der Oberfläche des Metallbades 2 und einem in dem Ofenrüssel üblicherweise verwendeten Gasgemisch 5, bestehend aus Stickstoff und Wasserstoff. Mit dem Einsatz eines Trenngases wird die Zinksublimation bei der kontinuierlichen Schmelztauchveredelung zumindest weitgehend reduziert bzw. ganz vermieden.
Claims (1)
- Verfahren zur Unterdrückung der Zinkverdampfung beim Schmelztauchbeschichten eines Stahlbandes (3) mit Zink oder einer Zinklegierungen, wobei das Stahlband (3) durch einen in das Metallband (2) eingetauchten Ofenrüssel (1) hindurchgeführt und in dem Metallbad (2) von einer Umlenkrolle (7) umgelenkt wird und anschließend aus dem Metallbad (2) nach oben austritt,
wobei sich in dem Ofenrüssel (1) oberhalb des Metallbades (2) ein Gasgemisch als Trenngas (4) befindet;
dadurch gekennzeichnet,
dass als Gasgemisch Argon mit Beimischungen von Butan und/oder Propan verwendet wird.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SI200331126T SI1518004T1 (sl) | 2002-06-28 | 2003-03-28 | Uporaba locevalnega plina pri kontinuiranem oplemenitenju kovin z vrocim omakanjem |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10229203 | 2002-06-28 | ||
DE10229203 | 2002-06-28 | ||
DE10233343 | 2002-07-23 | ||
DE10233343A DE10233343A1 (de) | 2002-06-28 | 2002-07-23 | Trenngaseinsatz bei der kontinuierlichen Schmelztauchveredelung |
PCT/EP2003/003219 WO2004003250A1 (de) | 2002-06-28 | 2003-03-28 | Trenngaseinsatz bei der kontinuierlichen schmelztauchveredelung |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1518004A1 EP1518004A1 (de) | 2005-03-30 |
EP1518004B1 true EP1518004B1 (de) | 2007-12-26 |
Family
ID=30001492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03714895A Expired - Lifetime EP1518004B1 (de) | 2002-06-28 | 2003-03-28 | Trenngaseinsatz bei der kontinuierlichen schmelztauchveredelung |
Country Status (13)
Country | Link |
---|---|
US (1) | US20050233088A1 (de) |
EP (1) | EP1518004B1 (de) |
JP (1) | JP2005539136A (de) |
CN (1) | CN100422378C (de) |
AT (1) | ATE382104T1 (de) |
AU (1) | AU2003219109B2 (de) |
BR (1) | BR0311470A (de) |
DE (1) | DE50308889D1 (de) |
ES (1) | ES2297143T3 (de) |
MX (1) | MXPA04012328A (de) |
PL (1) | PL206283B1 (de) |
RU (1) | RU2319786C2 (de) |
WO (1) | WO2004003250A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013101131A1 (de) * | 2013-02-05 | 2014-08-07 | Thyssenkrupp Steel Europe Ag | Vorrichtung zum Schmelztauchbeschichten von Metallband |
US9956576B2 (en) | 2014-04-22 | 2018-05-01 | Metokote Corporation | Zinc rich coating process |
CN110639233B (zh) * | 2019-08-20 | 2021-12-07 | 中船重工(邯郸)派瑞特种气体有限公司 | 一种去除三氟化氮中二氟二氮、四氟二氮的方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE617024C (de) * | 1929-06-12 | 1935-08-10 | Karl Daeves Dr Ing | Verfahren zur Verhinderung der Bildung weissen Rostes bei verzinkten Waren |
AU421751B2 (en) * | 1968-03-08 | 1972-02-25 | Australian Wire Industries Pty, Ltd | Improved method of and apparatus for wiping galvanised wire or strip |
NZ188953A (en) * | 1977-12-15 | 1982-12-21 | Australian Wire Ind Pty | Coating control of wire emerging from metal bath |
GB2050432B (en) * | 1979-05-09 | 1983-12-21 | Boc Ltd | Use of liquefied gas in hot dip metal coating |
US4339480A (en) * | 1980-04-11 | 1982-07-13 | Bethlehem Steel Corporation | Gas wiping apparatus and method of using |
US4557953A (en) * | 1984-07-30 | 1985-12-10 | Armco Inc. | Process for controlling snout zinc vapor in a hot dip zinc based coating on a ferrous base metal strip |
DE3631893A1 (de) * | 1986-09-19 | 1988-03-31 | Paul Fontaine | Verfahren und vorrichtung zum abstreifen von mit schmelzfluessigem material beschichtetem blech |
CN1054622A (zh) * | 1991-04-24 | 1991-09-18 | 文联煜 | 氮基保护气氛制气剂 |
JPH07180014A (ja) * | 1993-12-22 | 1995-07-18 | Nippon Steel Corp | 溶融金属めっきのスナウト内浴面からのZn蒸発抑制方法 |
JPH11279730A (ja) * | 1998-03-27 | 1999-10-12 | Nisshin Steel Co Ltd | Znの酸化を抑制した溶融めっき方法 |
FR2782326B1 (fr) * | 1998-08-13 | 2000-09-15 | Air Liquide | Procede de galvanisation d'une bande metallique |
JP2006516302A (ja) * | 2002-09-18 | 2006-06-29 | フジフィルム・エレクトロニック・マテリアルズ・ユーエスエイ・インコーポレイテッド | アルキル−水素シロキサンの分解を防止する添加剤 |
JP4243209B2 (ja) * | 2003-03-28 | 2009-03-25 | 富士フイルム株式会社 | 絶縁膜形成材料及びそれを用いた絶縁膜 |
-
2003
- 2003-03-28 RU RU2005102086/02A patent/RU2319786C2/ru not_active IP Right Cessation
- 2003-03-28 EP EP03714895A patent/EP1518004B1/de not_active Expired - Lifetime
- 2003-03-28 PL PL372068A patent/PL206283B1/pl not_active IP Right Cessation
- 2003-03-28 ES ES03714895T patent/ES2297143T3/es not_active Expired - Lifetime
- 2003-03-28 DE DE50308889T patent/DE50308889D1/de not_active Expired - Lifetime
- 2003-03-28 WO PCT/EP2003/003219 patent/WO2004003250A1/de active IP Right Grant
- 2003-03-28 US US10/519,579 patent/US20050233088A1/en not_active Abandoned
- 2003-03-28 JP JP2004516548A patent/JP2005539136A/ja active Pending
- 2003-03-28 AU AU2003219109A patent/AU2003219109B2/en not_active Ceased
- 2003-03-28 CN CNB038153661A patent/CN100422378C/zh not_active Expired - Fee Related
- 2003-03-28 MX MXPA04012328A patent/MXPA04012328A/es active IP Right Grant
- 2003-03-28 AT AT03714895T patent/ATE382104T1/de not_active IP Right Cessation
- 2003-03-28 BR BR0311470-8A patent/BR0311470A/pt not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
RU2319786C2 (ru) | 2008-03-20 |
MXPA04012328A (es) | 2005-04-08 |
ES2297143T3 (es) | 2008-05-01 |
JP2005539136A (ja) | 2005-12-22 |
EP1518004A1 (de) | 2005-03-30 |
US20050233088A1 (en) | 2005-10-20 |
PL206283B1 (pl) | 2010-07-30 |
CN1665954A (zh) | 2005-09-07 |
WO2004003250A1 (de) | 2004-01-08 |
PL372068A1 (en) | 2005-07-11 |
AU2003219109A1 (en) | 2004-01-19 |
BR0311470A (pt) | 2005-03-15 |
ATE382104T1 (de) | 2008-01-15 |
DE50308889D1 (de) | 2008-02-07 |
CN100422378C (zh) | 2008-10-01 |
AU2003219109B2 (en) | 2009-01-22 |
RU2005102086A (ru) | 2005-07-20 |
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