EP1518004A1 - Utilisation de gaz de separation lors de la finition en continue de metaux par immersion a chaud - Google Patents
Utilisation de gaz de separation lors de la finition en continue de metaux par immersion a chaudInfo
- Publication number
- EP1518004A1 EP1518004A1 EP03714895A EP03714895A EP1518004A1 EP 1518004 A1 EP1518004 A1 EP 1518004A1 EP 03714895 A EP03714895 A EP 03714895A EP 03714895 A EP03714895 A EP 03714895A EP 1518004 A1 EP1518004 A1 EP 1518004A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- gas
- nitrogen
- zinc
- argon
- hot dip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 22
- 239000002184 metal Substances 0.000 title claims abstract description 22
- 238000000926 separation method Methods 0.000 title claims abstract description 7
- 239000007789 gas Substances 0.000 claims abstract description 44
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 18
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 13
- 239000011701 zinc Substances 0.000 claims abstract description 13
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 claims abstract description 10
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052786 argon Inorganic materials 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims abstract description 6
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims abstract description 6
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 5
- 229910001297 Zn alloy Inorganic materials 0.000 claims abstract description 5
- 239000010959 steel Substances 0.000 claims abstract description 5
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims abstract description 4
- 230000008020 evaporation Effects 0.000 claims abstract description 4
- 238000001704 evaporation Methods 0.000 claims abstract description 4
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 claims abstract description 3
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 claims abstract description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910015900 BF3 Inorganic materials 0.000 claims abstract description 3
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 claims abstract description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims abstract description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims abstract description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims abstract description 3
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000001273 butane Substances 0.000 claims abstract description 3
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 claims abstract description 3
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims abstract description 3
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims abstract description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims abstract description 3
- 239000001282 iso-butane Substances 0.000 claims abstract description 3
- 229910052743 krypton Inorganic materials 0.000 claims abstract description 3
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims abstract description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims abstract description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims abstract description 3
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000001294 propane Substances 0.000 claims abstract description 3
- 229910000077 silane Inorganic materials 0.000 claims abstract description 3
- 239000005049 silicon tetrachloride Substances 0.000 claims abstract description 3
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims abstract description 3
- QHMQWEPBXSHHLH-UHFFFAOYSA-N sulfur tetrafluoride Chemical compound FS(F)(F)F QHMQWEPBXSHHLH-UHFFFAOYSA-N 0.000 claims abstract description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims abstract description 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims abstract description 3
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims abstract description 3
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 claims abstract description 3
- 229910052724 xenon Inorganic materials 0.000 claims abstract description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims abstract description 3
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 238000003618 dip coating Methods 0.000 claims description 7
- 229910000037 hydrogen sulfide Inorganic materials 0.000 claims description 2
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 2
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 2
- -1 phoshpin Natural products 0.000 claims description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- RGNPBRKPHBKNKX-UHFFFAOYSA-N hexaflumuron Chemical compound C1=C(Cl)C(OC(F)(F)C(F)F)=C(Cl)C=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F RGNPBRKPHBKNKX-UHFFFAOYSA-N 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 5
- 238000000576 coating method Methods 0.000 abstract description 5
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 abstract description 2
- 229960000909 sulfur hexafluoride Drugs 0.000 abstract description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 abstract 2
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 abstract 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 abstract 1
- 239000004291 sulphur dioxide Substances 0.000 abstract 1
- 235000010269 sulphur dioxide Nutrition 0.000 abstract 1
- 238000000859 sublimation Methods 0.000 description 7
- 230000008022 sublimation Effects 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910018503 SF6 Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0034—Details related to elements immersed in bath
- C23C2/00342—Moving elements, e.g. pumps or mixers
- C23C2/00344—Means for moving substrates, e.g. immersed rollers or immersed bearings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0038—Apparatus characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process
- C23C2/004—Snouts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
Definitions
- the invention relates to a method for suppressing zinc evaporation during hot dip coating of a steel strip with zinc or zinc alloys.
- the effect of sublimation of the coating metal occurs with continuous hot-dip coating and especially hot-dip galvanizing of metal strips. This is particularly critical since sublimation also takes place in the furnace area of the upstream strip annealing and surface activation. A hydrogen / nitrogen atmosphere is usually present in this unit. The sublimate pushes back against the belt run and is deposited in colder places in the oven. This effect is promoted by the presence of hydrogen. This effect is known and leads to surface defects on the metal strip to be coated with increasing sublimation.
- Document DE 44 00 886 C2 describes a method for suppressing zinc evaporation during hot dip coating of a steel strip with zinc or zinc alloys, the steel strip being formed in a feed area under a protective gas atmosphere from a mixture of an inert gas with hydrogen and / or carbon monoxide as reducing gases and additionally Carbon dioxide located.
- the protective gas atmosphere should contain up to 20 volume percent hydrogen and up to 10 volume percent carbon monoxide, or 0.05 to 8 volume percent Co 2 should be added to the protective gas atmosphere.
- Document EP 0 172 681 B1 describes a process for suppressing the development of zinc vapors in a continuous process for hot-dip coating an iron-based metal strip with zinc or zinc alloys, in which the strip is enclosed in an inlet area.
- Water vapor is introduced into this inlet area to maintain an atmosphere that oxidizes the zinc vapors but does not oxidize the iron strip and that contains at least 264 ppm water vapor and at least 1 volume percent hydrogen.
- the atmosphere within the inlet area should preferably contain 1 to 8 volume percent hydrogen and 300-4500 volume ppm water vapor, the adjustment being carried out with an inert gas, for example nitrogen.
- the invention is based on the knowledge that the turbulence of the gas above the surface of the metal bath and its thermal conductivity are included in the amount of sublimation formation. It is therefore important to find a gas that collects above the metal bath and thus prevents turbulence and has poor conductivity.
- the present invention has set itself the task of suppressing the formation of sublimate and of ensuring that the coating is flawless, regardless of the amount of gas which avoids sublimate.
- a gas or a gas mixture as separation gas be located above the metal bath, which has poor thermal conductivity and includes the property of turbulence of the gas or gas mixture over the surface of the metal bath reduce or prevent.
- gases such as carbon dioxide and water vapor (moisture)
- a noble gas for example argon
- the advantage of argon is that it has both a high density (low turbulence) and a poorer thermal conductivity than the otherwise used nitrogen.
- an inert gas it does not have an oxidizing effect.
- the following gases are also conceivable as separation gases: butane, krypton, propane, sulfur dioxide, hydrogen sulfide, xenon and other gases such as acetylene, arsine, boron trichloride, boron trifluoride, butene, dichlorosilane, disilane, ethylene oxide, tetrafluoromethane, monochlorodifluoromethane, trifluoromethane, trifluoromethane, trifluoromethane , Tetrafluoroethylene, isobutane, nitrogen dioxide, nitrogen trifluoride, nitrogen oxide, phoshpin, propylene, silane, silicon tetrafluoride, silicon tetrachloride, sulfur hexafluoride, sulfur tetrafluoride, tungsten hexafluoride. Any composition of the aforementioned gases to a gas mixture with or without argon can also be used as the separation gas as soon as this gas mixture meets the conditions of
- the invention is shown schematically in FIG. 1. It can be seen from the drawing that one of the gases mentioned above, for example argon, is used in such a way that, during normal operation, no large amounts of gas are required to be injected into the furnace trunk 1.
- the furnace trunk 1 through which the metal strip 3 to be coated is guided, dips obliquely into the metal bath 2 in the container 6.
- the metal strip 3 dips into the metal bath or coating bath 2, is deflected by the deflection roller 7 and emerges from the metal bath at 8.
- Scraper nozzles 9 are arranged above the exit point.
- a separating gas layer above the metal bath for example argon 4 as a separating gas between the surface of the metal bath 2 and the gas mixture 5 usually used, consisting of nitrogen and hydrogen.
- argon 4 as a separating gas between the surface of the metal bath 2 and the gas mixture 5 usually used, consisting of nitrogen and hydrogen.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating With Molten Metal (AREA)
- Materials For Medical Uses (AREA)
- Detergent Compositions (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SI200331126T SI1518004T1 (sl) | 2002-06-28 | 2003-03-28 | Uporaba locevalnega plina pri kontinuiranem oplemenitenju kovin z vrocim omakanjem |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10229203 | 2002-06-28 | ||
DE10229203 | 2002-06-28 | ||
DE10233343 | 2002-07-23 | ||
DE10233343A DE10233343A1 (de) | 2002-06-28 | 2002-07-23 | Trenngaseinsatz bei der kontinuierlichen Schmelztauchveredelung |
PCT/EP2003/003219 WO2004003250A1 (fr) | 2002-06-28 | 2003-03-28 | Utilisation de gaz de separation lors de la finition en continue de metaux par immersion a chaud |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1518004A1 true EP1518004A1 (fr) | 2005-03-30 |
EP1518004B1 EP1518004B1 (fr) | 2007-12-26 |
Family
ID=30001492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03714895A Expired - Lifetime EP1518004B1 (fr) | 2002-06-28 | 2003-03-28 | Utilisation de gaz de separation lors de la finition en continue de metaux par immersion a chaud |
Country Status (13)
Country | Link |
---|---|
US (1) | US20050233088A1 (fr) |
EP (1) | EP1518004B1 (fr) |
JP (1) | JP2005539136A (fr) |
CN (1) | CN100422378C (fr) |
AT (1) | ATE382104T1 (fr) |
AU (1) | AU2003219109B2 (fr) |
BR (1) | BR0311470A (fr) |
DE (1) | DE50308889D1 (fr) |
ES (1) | ES2297143T3 (fr) |
MX (1) | MXPA04012328A (fr) |
PL (1) | PL206283B1 (fr) |
RU (1) | RU2319786C2 (fr) |
WO (1) | WO2004003250A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013101131A1 (de) * | 2013-02-05 | 2014-08-07 | Thyssenkrupp Steel Europe Ag | Vorrichtung zum Schmelztauchbeschichten von Metallband |
US9956576B2 (en) * | 2014-04-22 | 2018-05-01 | Metokote Corporation | Zinc rich coating process |
CN110639233B (zh) * | 2019-08-20 | 2021-12-07 | 中船重工(邯郸)派瑞特种气体有限公司 | 一种去除三氟化氮中二氟二氮、四氟二氮的方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE617024C (de) * | 1929-06-12 | 1935-08-10 | Karl Daeves Dr Ing | Verfahren zur Verhinderung der Bildung weissen Rostes bei verzinkten Waren |
AU421751B2 (en) * | 1968-03-08 | 1972-02-25 | Australian Wire Industries Pty, Ltd | Improved method of and apparatus for wiping galvanised wire or strip |
NZ188953A (en) * | 1977-12-15 | 1982-12-21 | Australian Wire Ind Pty | Coating control of wire emerging from metal bath |
GB2050432B (en) * | 1979-05-09 | 1983-12-21 | Boc Ltd | Use of liquefied gas in hot dip metal coating |
US4339480A (en) * | 1980-04-11 | 1982-07-13 | Bethlehem Steel Corporation | Gas wiping apparatus and method of using |
US4557953A (en) * | 1984-07-30 | 1985-12-10 | Armco Inc. | Process for controlling snout zinc vapor in a hot dip zinc based coating on a ferrous base metal strip |
DE3631893A1 (de) * | 1986-09-19 | 1988-03-31 | Paul Fontaine | Verfahren und vorrichtung zum abstreifen von mit schmelzfluessigem material beschichtetem blech |
CN1054622A (zh) * | 1991-04-24 | 1991-09-18 | 文联煜 | 氮基保护气氛制气剂 |
JPH07180014A (ja) * | 1993-12-22 | 1995-07-18 | Nippon Steel Corp | 溶融金属めっきのスナウト内浴面からのZn蒸発抑制方法 |
JPH11279730A (ja) * | 1998-03-27 | 1999-10-12 | Nisshin Steel Co Ltd | Znの酸化を抑制した溶融めっき方法 |
FR2782326B1 (fr) * | 1998-08-13 | 2000-09-15 | Air Liquide | Procede de galvanisation d'une bande metallique |
US7129311B2 (en) * | 2002-09-18 | 2006-10-31 | Arch Specialty Chemicals, Inc. | Additives to prevent degradation of alkyl-hydrogen siloxanes |
JP4243209B2 (ja) * | 2003-03-28 | 2009-03-25 | 富士フイルム株式会社 | 絶縁膜形成材料及びそれを用いた絶縁膜 |
-
2003
- 2003-03-28 US US10/519,579 patent/US20050233088A1/en not_active Abandoned
- 2003-03-28 MX MXPA04012328A patent/MXPA04012328A/es active IP Right Grant
- 2003-03-28 RU RU2005102086/02A patent/RU2319786C2/ru not_active IP Right Cessation
- 2003-03-28 EP EP03714895A patent/EP1518004B1/fr not_active Expired - Lifetime
- 2003-03-28 AU AU2003219109A patent/AU2003219109B2/en not_active Ceased
- 2003-03-28 DE DE50308889T patent/DE50308889D1/de not_active Expired - Lifetime
- 2003-03-28 JP JP2004516548A patent/JP2005539136A/ja active Pending
- 2003-03-28 WO PCT/EP2003/003219 patent/WO2004003250A1/fr active IP Right Grant
- 2003-03-28 PL PL372068A patent/PL206283B1/pl not_active IP Right Cessation
- 2003-03-28 ES ES03714895T patent/ES2297143T3/es not_active Expired - Lifetime
- 2003-03-28 BR BR0311470-8A patent/BR0311470A/pt not_active Application Discontinuation
- 2003-03-28 AT AT03714895T patent/ATE382104T1/de not_active IP Right Cessation
- 2003-03-28 CN CNB038153661A patent/CN100422378C/zh not_active Expired - Fee Related
Non-Patent Citations (1)
Title |
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See references of WO2004003250A1 * |
Also Published As
Publication number | Publication date |
---|---|
ATE382104T1 (de) | 2008-01-15 |
US20050233088A1 (en) | 2005-10-20 |
AU2003219109B2 (en) | 2009-01-22 |
CN1665954A (zh) | 2005-09-07 |
RU2319786C2 (ru) | 2008-03-20 |
DE50308889D1 (de) | 2008-02-07 |
EP1518004B1 (fr) | 2007-12-26 |
MXPA04012328A (es) | 2005-04-08 |
RU2005102086A (ru) | 2005-07-20 |
PL206283B1 (pl) | 2010-07-30 |
AU2003219109A1 (en) | 2004-01-19 |
ES2297143T3 (es) | 2008-05-01 |
BR0311470A (pt) | 2005-03-15 |
JP2005539136A (ja) | 2005-12-22 |
PL372068A1 (en) | 2005-07-11 |
CN100422378C (zh) | 2008-10-01 |
WO2004003250A1 (fr) | 2004-01-08 |
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