Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S5/00—Semiconductor lasers
  • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S5/00—Semiconductor lasers
  • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
  • H01S5/042—Electrical excitation ; Circuits therefor
  • H01S5/0425—Electrodes, e.g. characterised by the structure
  • H01S5/04254—Electrodes, e.g. characterised by the structure characterised by the shape
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S2301/00—Functional characteristics
  • H01S2301/18—Semiconductor lasers with special structural design for influencing the near- or far-field
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S5/00—Semiconductor lasers
  • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
  • H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
  • H01S5/0612—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by temperature
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S5/00—Semiconductor lasers
  • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
  • H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S5/00—Semiconductor lasers
  • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
  • H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
  • H01S5/106—Comprising an active region having a varying composition or cross-section in a specific direction varying thickness along the optical axis
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S5/00—Semiconductor lasers
  • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
  • H01S5/204—Strongly index guided structures

Definitions

• the subject matter disclosed generally relates to the field of semiconductor lasers.
• laser diodes are commonly used as a light source in fiber optic communication systems. It is sometimes desirable to use very high powered laser diodes.
• Erbium-doped fiber optic amplifiers and Raman fiberoptic amplifiers require pumping by a high powered laser. The pumping laser must emit a beam of high optical quality in order to be efficiently coupled to the fiber core. Because of efficiency, compactness and other factors it is desirable to pump the amplifier with a laser diode.
• laser diodes with high quality beams typically have an upper power limit of approximately 0.5 watt, whereas fiber optic amplifiers may require 2 watts or more.
• the power of a laser diode 1 can be increased by widening the pumped stripe 2 of the diode 1. Widening the pumped stripe 2 reduces the optical power density and resultant heat within the diode 1. It has been found that at high power densities, the light generated in a widened laser diode will "self-focus" into filaments across the length of stripe 2. This self-focus effect creates an output beam with intensity spikes as shown in Fig. 1. The quality of such an output is unacceptable for most photonic applications. It would be desirable to provide a high powered laser diode that emits a high quality laser beam.
• a laser diode that has a pumped stripe section with a varying index of refraction.
• FIG. 1 is an illustration of a laser diode of the prior art
• Figure 2 is an illustration showing a laser diode
• Figure 3 is an illustration showing an embodiment of different layers of the laser diode
• Figure 4 is an illustration of an alternate embodiment of the laser diode
• FIG. 5 is an illustration of an alternate embodiment of the laser diode
• Figure 6 is an illustration of an alternate embodiment of the laser diode.
• a high powered laser diode that includes a pumped stripe section with index of refraction that varies monotonically in the direction perpendicular to the direction of emission.
• the varying index of refraction can reduce the self-focusing phenomenon found in high powered laser diodes in the prior art, thereby providing a high quality output beam.
• the index of refraction can vary from one side of the amplifier section to the other side of the amplifier section.
• the index can be varied by varying a structural characteristic of the amplifier section such as the composition, doping, or thickness of the layers within the laser diode.
• a thermal gradient can be created across the amplifier section to vary the index of refraction.
• the thermal gradient can be created by integrating a heating element along one side of the amplifier section or by creating unequal current flow through the amplifier section.
• Figure 2 shows a laser diode 10.
• the laser diode 10 includes a pumped stripe section 12.
• the pumped stripe section 12 has a first side 14 and a second side 16 that are separated by a width W.
• the pumped stripe section 12 is constructed to generate stimulated light emission that is emitted from the diode 10 along an optical axis O p .
• the laser diode 10 may be constructed with a relatively wide pumped stripe section 12 that can emit a high quality light beam with up to 5 watts of power.
• the laser diode 10 may have reflective surfaces 18 that create feedback for the stimulated light.
• the laser diode 10 may contain a separate distributed feedback section (not shown) that is coupled to the pumped stripe section 12. Stimulated light emission may be generated in the feedback section and further amplified in the pumped stripe section 12.
• the laser diode 10 may further have non-pumped sections 20 outside of the pumped stripe section 12.
• the index of refraction n may vary across the stripe 12 from the first side 14 to the second side 16.
• the index of refraction can be varied by varying a structural characteristic of the pumped stripe section 12.
• the pumped stripe section 12 may be doped in a manner that creates a varying index of refraction.
• the thickness of one or more layers within the pumped stripe section may be varied to vary the index of refraction.
• the varying index reduces the self- focusing effects that may occur in a high powered laser.
• the result is a high powered high quality laser beam.
• a linear gradient of the index is shown, it is to be understood that the index of refraction may have non-linear variation across the pumped stripe section 12.
• FIG. 3 shows the different layers 30, 32, 34, 36, 38, 40, 42, 44 and 46 of an embodiment of the semiconductor laser 10. It is to be understood that the embodiment shown and described is merely exemplary and that other layers, materials and compositions may be used.
• the laser 10 may include a lower cladding 32 formed on a substrate 30.
• the substrate 30 may be an n-doped Indium Phosphide (InP) or Gallium Arsenide (GaAs) material.
• the cladding 32 may be an n-doped InP or GaAs material.
• the laser 10 may further have a multi-quantum well active layer 36 located between confinement layers 34 and 38.
• Confinement layer 34 may be a n — doped InGaAsP or Al y Ga ⁇ y As material.
• Confinement layer 38 may be a p-doped InGaAsP or Al y Ga 1-y As material.
• Layers 40, 42 and 44 may be upper cladding that includes p-doped material.
• layer 40 may be p-doped InGaAsP or Al x Ga ⁇ -x As.
• Layer 42 may be p-doped InGaAsP or Al z Ga 1-z As material.
• Layer 44 may be p-doped InP or Al x Ga ⁇ _ x As material.
• Layer 46 may be an electrical contact layer containing p - doped InGaAs or GaAs material.
• the layers 34, 36 and 38 create a PN junction that will generate stimulated light emission in response to a flow of electrical current.
• Cladding layers 32, 40, 42 and 44 form a waveguide that guides the light.
• Current flows through the pumped stripe section 12 from contact layer 46. The current causes stimulated emission of light within the pumped stripe section 12.
• the semiconductor laser 10 can be constructed by initially forming layers 32, 34, 36 and 38 on the substrate 30. The remaining layers 40, 42, 44 and 46 can then be sequentially formed onto layer 38. All the layers can be formed with known epitaxial semiconductor fabrication processes. Although a laser diode 10 with layers 30, 32, 34, 36, 38, 40, 42, 44 and 46 are shown and described, it is to be understood that this embodiment is exemplary only and that the diode 10 may have a different construction.
• Figure 4 shows a different embodiment of a laser diode with a heating element 50 located adjacent to the first side 14 of the pumped stripe section 12.
• the heating element 50 may be an electrically resistive strip connected to a source of power 52.
• the heating element 50 may generate heat that flows into the pumped stripe section 12. Offsetting the heating element 50 adjacent to one side of the diode will create a thermal gradient across the pumped stripe section 12. The thermal gradient will vary the index of refraction from the first side 14 to the second side 16.
• Figure 5 shows an alternate embodiment wherein the contact layer (not shown) is separated from the remaining layers by a layer of dielectric 54.
• the layer of dielectric 54 has a plurality of offset openings 56. Current only flows through the dielectric openings 56.
• the openings 56 may be located adjacent to the first side 14 of the pumped stripe section 12. The flow of current from the first side 14 will create a resultant thermal gradient across the pumped stripe section 12. The thermal gradient will vary the index of refraction from the first side 14 to the second side 16 of the pumped stripe section 12.
• Figure 6 shows another embodiment wherein the openings 54R located adjacent to the second side 16 have a larger effective area than the openings 54L located adjacent to the first side 14 and openings 54C in the center of the pumped stripe section 12.
• the openings 54C in the center may have an effective area greater than the effective area of the opening 54L.
• the difference in effective areas will create an uneven flow of current through the pumped stripe section 12. This uneven current flow will cause a thermal gradient and varying index of refraction from the second side 16 to the first side 14 of the pumped stripe section 12.

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• Physics & Mathematics (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• General Physics & Mathematics (AREA)
• Electromagnetism (AREA)
• Optics & Photonics (AREA)
• Semiconductor Lasers (AREA)
• Lasers (AREA)

Applications Claiming Priority (5)

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Citations (6)

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• 2003
  • 2003-03-03 US US10/379,027 patent/US7269195B2/en not_active Expired - Lifetime
  • 2003-03-04 CA CA002477987A patent/CA2477987A1/en not_active Abandoned
  • 2003-03-04 KR KR10-2004-7013878A patent/KR20040101270A/ko not_active Application Discontinuation
  • 2003-03-04 AU AU2003222255A patent/AU2003222255A1/en not_active Abandoned
  • 2003-03-04 CN CNB038052482A patent/CN100409512C/zh not_active Expired - Fee Related
  • 2003-03-04 EP EP03717938A patent/EP1481451A4/de not_active Ceased
  • 2003-03-04 JP JP2003575481A patent/JP2005527108A/ja not_active Withdrawn
  • 2003-03-04 WO PCT/US2003/006875 patent/WO2003077387A2/en active Application Filing

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