EP1378322A1 - Procédé et dispositif de polissage par abrasion des surfaces "au tonneau" avec deux mouvements oscillatories - Google Patents
Procédé et dispositif de polissage par abrasion des surfaces "au tonneau" avec deux mouvements oscillatories Download PDFInfo
- Publication number
- EP1378322A1 EP1378322A1 EP02405561A EP02405561A EP1378322A1 EP 1378322 A1 EP1378322 A1 EP 1378322A1 EP 02405561 A EP02405561 A EP 02405561A EP 02405561 A EP02405561 A EP 02405561A EP 1378322 A1 EP1378322 A1 EP 1378322A1
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- EP
- European Patent Office
- Prior art keywords
- polishing
- workpiece
- support
- movement
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/02—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving rotary barrels
- B24B31/027—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving rotary barrels with additional oscillating movement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/06—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving oscillating or vibrating containers
- B24B31/064—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving oscillating or vibrating containers the workpieces being fitted on a support
Definitions
- the present invention relates to a method of polishing parts more particularly but not exclusively metal, and a device polishing device capable of implementing this method.
- VSM standards 10230 and 10231 define twelve degrees of roughness ranging from N1 to N12, the degree N1 corresponding to polishing the finest while N12 corresponds to a coarse surface condition.
- the current polishing machines allow to reach the N4 or N3 degree, the degrees N2 or N1 can only be achieved by recovery of the surface to be polished with a metal layer, for example by chromium plating.
- Such an overlay polishing process has several disadvantages. Especially after a mechanical polishing of the piece, it is necessary to take back this part by carrying out a subsequent operation of soaking in a chrome bath. This way of proceeding increases the costs of production and, in addition, the thickness of chromium as low as it is, changes the mechanical dimensions of the piece that it is virtually impossible to retouch by machining.
- a first object of the invention is therefore to propose a method of polishing to obtain, by mechanical means that can be automated, a high degree of polishing, for example at least the degree N1, this for a metal part of any shape, all surfaces to be polished which can be finished to the same degree of polishing and without being necessary to take back the part for a subsequent operation of covering such a chromium recovery operation.
- Another object of the invention is to propose a polishing device which makes it possible to carry out the preceding method, said device being able to understand ways to achieve fully automated driving a polishing cycle.
- the subject of the invention is a polishing method of minus one piece with a polishing product contained in a tank, at least one surface of the part being exposed to contact with said product of polishing.
- the invention also relates to a device for the implementation of process.
- the invention relates to a method of polishing at least one piece 2 with a polishing product 10 content in a tank 1, at least one surface of the part 2 being exposed to contact said polishing product 10.
- the product of polishing 10 comprises polishing particles and a liquid in which these particles bathe.
- polishing product is not the subject of the invention, the composition of this product will not be detailed.
- At least one induced movement B is induced, C, of substantially circular nature.
- a polishing product which generates a mechanical action and a chemical action.
- a vessel 1 having a wall is selected substantially vertical lateral and a substantially plane and horizontal bottom.
- it constitutes the part support in using the wall of the vessel 1 in an area exposed to contact with the polishing product 10 and is imposed on said tank 1 at least a first oscillatory movement A so that the workpiece 2 is moved into the polishing product 10.
- the piece support using a member 100 separate from the vessel 1 and, it is to this organ 100 that is imposed at least said first oscillatory movement A, however, this member 100 keeps the piece 2 in contact with said product of polishing 10.
- the part support is constituted, using a member 100 separate from the wall of the vessel 1 and is imposed on the vessel 1 at least a first oscillatory movement A.
- the invention also relates to a polishing device 3 for carrying out the method.
- This polishing device 3 comprises at least a first means functional 50 to impose on at least one of the two elements that are said part support 2, 100 and said polishing product 10, at least a first oscillatory motion A whose orientation, amplitude and frequency are predetermined in order to cause in said polishing product 10 to least an induced motion B, C which causes its movement in contact with room 2.
- a polishing tank 1 from minus one piece 2 by means of a fluid polishing product The tank of polishing 1 is subjected to the action of a displacement device 3 said device 3.
- the tank is animated movements intended to induce movements of the product of polishing 10.
- Figure 1 to better illustrate the movements of the product of polishing 10 inside the tank 1, no mechanical polishing piece was represented.
- the tank 1 is animated by a first oscillatory movement A realized in a substantially horizontal plane.
- This first movement can be illustrated by the path of each of the constituent points of the vessel 1, by example the four corners, on a circle, in a direction represented by the arrows A, in a plane parallel to the plane of the drawing, a given face of the vessel remaining always parallel to itself during this movement.
- a other position of the tank 1 during this first movement was represented in 1A.
- This first oscillatory movement A is completed by a second movement made in a direction perpendicular to the horizontal, that is to say in a substantially vertical direction. The way are products these movements will be described later.
- a main displacement B is distinguished substantially central, and displacements C secondary, substantially peripheral.
- the principle of the process consists in imposing a movement oscillatory compound to vessel 1 such that displacements are created in the polishing product 10. It is understood that if we fix a metal part 2 in the tank 1, - see Figure 2 - it is covered with the polishing product 10 and we print the movement described further to the tank, it will create a plurality of displacements around the part 2, these displacements coming from the movement imposed on the vessel 1 in cooperation with the irregularities of form of the piece opposite irregularities of shape of the tank. Preferably the piece 2 will not be arranged in the center of the tank, first to create a unbalance, thereby increasing the amplitude of the translational motion by rotation, then to increase the substantially circular effect. Travel B and C shown in FIG.
- the polishing product 10 polishing under the action of displacements described may be any known polishing product, presenting in liquid or pasty form.
- polishing device 3 consists of a frame 30 resting with dampers 31 known to the technique on the ground, this in order to limit the transmission of vibrations to the environment.
- a motor 32 preferably a electric motor, drives in rotation a vertical axis 33, via two pulleys and a belt according to the embodiment shown.
- the axis vertical 33 is composed of two portions, a lower portion 33A and a upper portion 33B, the lower portion 33A rotating in the upper portion 33B, but this upper portion being slidable axially with respect to the lower portion 33A.
- the part upper portion 33A consists of a tube, in which the lower part of the upper portion 33B is engaged so sliding, a key ensuring the transmission of the rotational movement between the two axis portions without preventing axial relative sliding of the two portions of axes.
- the lower part of the lower portion 33A of the axis 33 is held by a first bearing 34 whose outer cage is rigidly supported by a support fixed to the frame 30.
- the upper part of the upper portion 33B of the axis 33 protrudes out of frame 30 by an opening of its upper face and is held in a second bearing 35 whose outer cage is held on a swash plate 36.
- the swash plate 36 is fixed to the frame 30 by means of spring means, for example a a plurality of relatively rigid coil springs 37 disposed on the periphery of the swash plate 36, so as to keep it in a plane substantially horizontal.
- spring means for example a a plurality of relatively rigid coil springs 37 disposed on the periphery of the swash plate 36, so as to keep it in a plane substantially horizontal.
- An imbalance weight 38 is attached to the portion upper axis 33B.
- the tank 1 is fixed to the upper face of the tray oscillating 36 by removable fixing means 11.
- the axis of rotation 33 pivots between the two bearings 34 and 35. Since only one of these bearings, and precisely that of the lower referenced 34 is fixed to the frame and that the other, that referenced 35 is attached to the swash plate 36, meanwhile connected only by the springs 37 to the frame 30, the axis 33 will tend to take a rotation movement oscillating around the vertical direction, the component oscillation being transmitted to said oscillating plate 36. The presence of the weight 38 near the upper end of the axis 33 tends to increase this swing movement.
- the rotation period of the movement translation in rotation corresponds to the speed of rotation of the axis 33 then that its amplitude depends on the masses in motion and in particular the unbalance that they represent in relation to the vertical axis.
- the springs 37 are chosen with sufficient rigidity to limit the range of motion.
- the frequency and amplitude of this second movement Oscillatory D depend essentially on moving masses, characteristics of the springs, as well as the amplitude and frequency of the first oscillatory movement A of the tank.
- the relative sliding of the two axis portions 33A and 33B is intended to absorb the second movement oscillation D as well as to compensate for the sagging of the springs 37 when the Swash plate 36 is loaded with the vessel 1 containing the parts to be polished as well that the polishing product 10.
- the device 3 is advantageously completed with a part 39A, possibly programmable, controlling the motor 32, as well as a control panel 39B diagrammatically with a keyboard and two push buttons.
- the tank 1 can be closed by a cover (not shown on the figure).
- the member 100 consists of an arm connected to a frame.
- the second functional means 60 for imposing at least the first oscillating motion on the arm 100 is advantageously likewise nature as the first functional means 50.
- the device for polishing includes two independent 32 motors.
- the polishing device 3 comprises a means 101 controlled multi-directional displacement of at least the part arm 100 which supports at least one piece 2, so as to constitute a means for handling at least one such part 2.
- This technical feature allows the mechanical manipulation of minus one piece 2 for loading and unloading it in the tank 1, namely, at the beginning and end of the cycle.
- This mechanization of loading and unloading can advantageously be automated.
- the polishing device 3 comprises a frame 30 and at least one of said first and second functional means 50, 60, at least one of these functional means 50, 60 comprising drive means in rotation 32 of a substantially vertical axis 33, an end portion 33A of said axis being held by a first rolling device 34 whose cage is attached to the frame 30, the other end 33B of said axis protruding by an opening of the upper face of the frame and supporting a swash plate 36, arranged horizontally, via a second device to bearing 35 whose outer cage is fixed to said plate, said plate being on the other hand connected to the frame by spring means 37 and provided with means of fixing a support of part 2 such as the tank 1 or the support member 100.
- a complete cycle of polishing comprising a step of preparation of the tank 1.
- one or several pieces to be polished 2 so that they are not directly contact with each other or with the walls of the tank.
- the pieces are fixed at the inside of the tank, by any suitable means 12, so that that they are rigidly fixed and that their fixation is not destroyed under the effect of vibrations.
- the fasteners will support the parts to be polished by surfaces of said parts that do not require polishing; if this proves not possible, it will be necessary later, after polishing a first part of the part, dismantling the assembly, modify the attachment of this piece so that it presses on an already polished portion and resume polishing to polish surface portions before masked by the fixation.
- the tank is filled with the polishing product 10, so as to cover the parts to be polished.
- the tank 1 is then arranged on the swash plate 36, which is fixed thereto by the fixing means 11, and then the polishing cycle is controlled via the control panel 39B.
- This control panel 39B can be very simple, controlling only the starting or stopping the engine and its speed and direction of rotation. Other parameters can also be introduced by this control panel or by other means for example taking into account the mass of parts to polishing and starting surface condition, one can determine the cycle time of polishing and order one or more changes of direction of rotation and engine speed during the cycle.
- the tank 1 is removed from the plate 36, the polishing product is removed from the tank, the polished pieces are also removed from the vat and are then thoroughly washed.
- the liquid components of the polish are removed from the mixture and are then regenerated or destroyed if they can not be recovered.
- the particles are also washed and recovered for future use.
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Spinning Or Twisting Of Yarns (AREA)
Abstract
Description
- on fixe chaque pièce destinée à être polie à un support de pièce qui maintient cette pièce au contact du produit de polissage, et
- on impose à au moins l'un des deux éléments que sont ledit support de pièce et ledit produit de polissage, au moins un premier mouvement oscillatoire dont on choisit préalablement l'orientation, l'amplitude et la fréquence de manière à provoquer dans ledit produit de polissage au moins un mouvement induit qui engendre son déplacement au contact de la pièce.
- on fixe chaque pièce 2 destinée à être polie à un support de pièce 1, 100 qui maintient cette pièce 2 au contact du produit de polissage 10, et
- on impose à au moins l'un des deux éléments que sont ledit support de pièce 1, 100 et ledit produit de polissage 10, au moins un premier mouvement oscillatoire A dont on choisit préalablement l'orientation, l'amplitude et la fréquence de manière à provoquer dans ledit produit de polissage 10 au moins un mouvement induit B, C qui engendre son déplacement au contact de la pièce 2.
- un premier mouvement oscillatoire A réalisé dans un premier plan d'orientation déterminée par rapport à un plan horizontal et
- un deuxième mouvement oscillatoire D réalisé au moins dans une direction d'orientation déterminée par rapport audit premier plan.
- d'une part, on choisit une cuve 1 de forme telle que, lorsqu'elle est en situation d'être utilisée pour le polissage, elle présente dans différents plans horizontaux, une section transversale de forme polygonale ou sensiblement circulaire et,
- d'autre part, on impose à au moins l'un des deux éléments que sont ledit support 1, 100 et ledit produit de polissage 10, au moins ledit premier mouvement oscillatoire A desdits premier et deuxième mouvements oscillatoires.
- d'une part, on impose à la cuve 1 au moins un premier mouvement oscillatoire A et,
- d'autre part, on impose également à l'organe 100 qui constitue le support de pièce au moins un autre premier mouvement oscillatoire A choisi de manière telle que ce mouvement de l'organe 100 se combine au mouvement de la cuve 1, en vue de renforcer l'action de polissage.
- un premier mouvement oscillatoire A réalisé dans un premier plan d'orientation déterminée par rapport à un plan horizontal,
- un deuxième mouvement oscillatoire D réalisé au moins dans une direction d'orientation déterminée par rapport audit premier plan, et
- un organe 100 qui, distinct de la cuve 1, constitue le support de pièce, et,
- un premier moyen fonctionnel 50 pour imposer à la cuve 1 au moins le premier mouvement oscillatoire A.
- un organe 100 qui, distinct de la cuve 1, constitue le support de pièce, et,
- un deuxième moyen fonctionnel 60 pour imposer à cet organe 100 au moins ledit premier mouvement oscillatoire A, cependant que ledit organe 100 maintient la pièce 2 au contact du produit de polissage 10.
- un organe 100 qui, distinct de la cuve 1, constitue le support de pièce, et,
- un premier moyen fonctionnel 50 pour imposer à la cuve 1 au moins le premier mouvement oscillatoire A et,
- un deuxième moyen fonctionnel 60 pour imposer à l'organe 100 qui constitue le support de pièce au moins un autre premier mouvement oscillatoire A choisi de manière telle que ce mouvement de l'organe 100 se combine au mouvement de la cuve 1, en vue de renforcer l'action de polissage.
Claims (23)
- Procédé de polissage d'au moins une pièce (2) avec un produit de polissage (10) contenu dans une cuve (1), au moins une surface de la pièce (2) étant exposée au contact dudit produit de polissage (10), ce procédé étant caractérisé en ce que :on fixe chaque pièce (2) destinée à être polie à un support de pièce (1, 100) qui maintient cette pièce (2) au contact du produit de polissage (10), eton impose à au moins l'un des deux éléments que sont ledit support de pièce (1, 100) et ledit produit de polissage (10), au moins un premier mouvement oscillatoire (A) dont on choisit préalablement l'orientation, l'amplitude et la fréquence de manière à provoquer dans ledit produit de polissage (10) au moins un mouvement induit (B, C) qui engendre son déplacement au contact de la pièce (2).
- Procédé de polissage selon la revendication 1, caractérisé en ce qu'on provoque au moins un mouvement induit (B, C) de nature sensiblement circulaire (B, C).
- Procédé de polissage selon la revendication 1, caractérisé en ce que lors de la fixation de la pièce (2) sur le support de pièce (1, 100), on supprime tous les degrés de liberté de la pièce (2) par rapport audit support (1, 100).
- Procédé de polissage selon la revendication 1, caractérisé en ce que lors de la fixation de la pièce (2) sur le support de pièce (1, 100), on supprime tous les degrés de liberté de la pièce (2) par rapport audit support (1, 100), à l'exception d'un degré de liberté en rotation autour d'un axe d'orientation prédéterminée.
- Procédé de polissage selon la revendication 1, caractérisé en ce qu'on met en oeuvre un produit de polissage qui génère une action mécanique et une action chimique.
- Procédé de polissage selon l'une quelconque des revendications 1 à 5 caractérisé en ce qu'on impose à au moins l'un des deux éléments que sont ledit support (1, 100) et ledit produit de polissage (10), deux mouvements oscillatoires dont :un premier mouvement oscillatoire (A) réalisé dans un premier plan d'orientation déterminée par rapport à un plan horizontal etun deuxième mouvement oscillatoire (D) réalisé au moins dans une direction d'orientation déterminée par rapport audit premier plan.
- Procédé de polissage selon l'une quelconque des revendications 1 à 6 caractérisé en ce que :d'une part, on choisit une cuve (1) de forme telle que, lorsqu'elle est en situation d'être utilisée pour le polissage, elle présente dans différents plans horizontaux, une section transversale de forme polygonale ou sensiblement circulaire et,d'autre part, on impose à au moins l'un des deux éléments que sont ledit support (1, 100) et ledit produit de polissage (10), au moins ledit premier mouvement oscillatoire (A) desdits premier et deuxième mouvements oscillatoires.
- Procédé de polissage selon la revendication 7 caractérisé en ce qu'on choisit une cuve (1) présentant une paroi latérale sensiblement verticale et un fond sensiblement plan et horizontal.
- Procédé de polissage selon l'une quelconque des revendications 1 à 8 caractérisé en ce qu'on constitue le support de pièce en utilisant la paroi de la cuve (1) dans une zone qui est exposée au contact du produit de polissage (10) et on impose à ladite cuve (1) au moins un premier mouvement oscillatoire (A) de manière telle que la pièce (2) soit déplacée dans le produit de polissage (10).
- Procédé de polissage selon l'une quelconque des revendications 1 à 8 caractérisé en ce qu'on constitue le support de pièce en utilisant un organe (100) distinct de la cuve (1) et, c'est à cet organe (100) qu'on impose au moins ledit premier mouvement oscillatoire (A), cependant que cet organe (100) maintient la pièce (2) au contact dudit produit de polissage (10).
- Procédé de polissage selon l'une quelconque des revendications 1 à 8 caractérisé en ce qu'on constitue le support de pièce en utilisant un organe (100) distinct de la paroi de la cuve (1) et :d'une part, on impose à la cuve (1) au moins un premier mouvement oscillatoire (A) et,d'autre part, on impose également à l'organe (100) qui constitue le support de pièce au moins un autre premier mouvement oscillatoire (A) choisi de manière telle que ce mouvement de l'organe (100) se combine au mouvement de la cuve (1), en vue de renforcer l'action de polissage.
- Procédé de polissage selon l'une quelconque des revendications 1 à 8 caractérisé en ce qu'on constitue le support de pièce, en utilisant un organe (100) distinct de la paroi de la cuve (1) et on impose à la cuve (1) au moins un premier mouvement oscillatoire (A).
- Dispositif de polissage pour la mise en oeuvre du procédé selon l'une quelconque des revendications 1 à 12 caractérisé en ce qu'il comprend au moins un premier moyen fonctionnel (50) pour imposer à au moins l'un des deux éléments que sont ledit support de pièce (1, 100) et ledit produit de polissage (10), au moins un premier mouvement oscillatoire (A) dont l'orientation, l'amplitude et la fréquence sont prédéterminées de manière à provoquer dans ledit produit de polissage (10) au moins un mouvement induit (B, C) qui engendre son déplacement au contact de la pièce (2).
- Dispositif de polissage selon la revendication 13 pour la mise en oeuvre du procédé selon l'une quelconque des revendications 1 à 12 caractérisé en ce qu'il comprend un premier moyen fonctionnel (50) pour imposer à au moins l'un des deux éléments que sont ledit support et le produit de polissage, deux mouvements oscillatoires dont :un premier mouvement oscillatoire (A) réalisé dans un premier plan d'orientation déterminée par rapport à un plan horizontal,un deuxième mouvement oscillatoire (D) réalisé au moins dans une direction d'orientation déterminée par rapport audit premier plan, et
- Dispositif pour la mise en oeuvre du procédé selon l'une des revendications 10 ou 11 caractérisé en ce qu'il comprend :un organe (100) qui, distinct de la cuve (1), constitue le support de pièce, et,un deuxième moyen fonctionnel (60) pour imposer à cet organe (100) au moins ledit premier mouvement oscillatoire (A), cependant que ledit organe (100) maintient la pièce (2) au contact du produit de polissage (10).
- Dispositif pour la mise en oeuvre du procédé selon la revendication 11 caractérisé en ce qu'il comprend :un organe (100) qui, distinct de la cuve (1), constitue le support de pièce, et,un premier moyen fonctionnel (50) pour imposer à la cuve (1) au moins le premier mouvement oscillatoire (A) et,un deuxième moyen fonctionnel (60) pour imposer à l'organe (100) qui constitue le support de pièce au moins un autre premier mouvement oscillatoire (A) choisi de manière telle que ce mouvement de l'organe (100) se combine au mouvement de la cuve (1), en vue de renforcer l'action de polissage.
- Dispositif pour la mise en oeuvre du procédé selon la revendication 12 caractérisé en ce qu'il comprend :un organe (100) qui, distinct de la cuve (1), constitue le support de pièce, et,un premier moyen fonctionnel (50) pour imposer à la cuve (1) au moins le premier mouvement oscillatoire (A).
- Dispositif de polissage selon l'une quelconque des revendications 13 à 17, caractérisé en ce qu'il comprend un bâti (30) et au moins l'un desdits premier et deuxième moyens fonctionnels (50, 60), au moins l'un de ces moyens fonctionnels (50, 60) comportant des moyens d'entraínement en rotation (32) d'un axe sensiblement vertical (33), une portion d'extrémité (33A) dudit axe étant maintenue par un premier dispositif à roulement (34) dont la cage extérieure est fixée au bâti (30), l'autre extrémité (33B) dudit axe faisant saillie par une ouverture de la face supérieure du bâti et supportant un plateau oscillant (36), disposé horizontalement, par l'intermédiaire d'un second dispositif à roulement (35) dont la cage extérieure est fixée audit plateau, ledit plateau étant d'autre part relié au bâti par des moyens à ressort (37) et pourvu de moyen de fixation d'un support de pièce (2) telle la cuve (1) ou l'organe support (100).
- Dispositif de polissage selon la revendication 18, caractérisé en ce que l'axe sensiblement vertical (33) comprend une masse de déséquilibrage (38) disposée à proximité de son extrémité supérieure (33B).
- Dispositif de polissage selon l'une des revendications 18 ou 19 caractérisé en ce que l'axe sensiblement vertical (33) est constitué de deux portions d'axe (33A, 33B) dans le prolongement l'une de l'autre et pouvant coulisser l'une par rapport à l'autre dans la direction axiale.
- Dispositif de polissage selon l'une des revendications 17 à 20, caractérisé en ce que les moyens motorisés (32) sont aptes à entraíner l'axe (33), respectivement le plateau oscillant (36) et la cuve de polissage (1) selon deux sens de rotation.
- Dispositif de polissage selon l'une des revendications 17 à 21, caractérisé en ce qu'il comprend en outre des moyens de commande automatique (39A, 39B) de cycles de polissage.
- Dispositif de polissage selon l'une des revendications 15 à 22, caractérisé en ce qu'il comprend un moyen (101) commandé de déplacement multi-directionnel d'au moins la partie du bras (100) qui supporte au moins une pièce (2), de manière à constituer un moyen de manipulation d'au moins une telle pièce (2) et à autoriser la manipulation mécanique d'au moins une pièce (2) en vue de son chargement et déchargement dans la cuve (1), à savoir, notamment, en début et en fin de cycle de polissage, ainsi qu'en cours de cycle en vue de la réalisation d'un contrôle en cours dudit cycle.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PT02405561T PT1378322E (pt) | 2002-07-04 | 2002-07-04 | Processo e dispositivo de polimento por abrasão de superfícies ''em rotação'' com dois movimentos oscilatórios |
EP02405561A EP1378322B1 (fr) | 2002-07-04 | 2002-07-04 | Procédé et dispositif de polissage par abrasion des surfaces "au tonneau" avec deux mouvements oscillatoires |
AT02405561T ATE338611T1 (de) | 2002-07-04 | 2002-07-04 | Verfahren und bewegte vorrichtung mit zwei schwingungsbewegungen |
ES02405561T ES2272657T3 (es) | 2002-07-04 | 2002-07-04 | Procedimiento y dispositivo de pulido por abrasion de superficies "en tambor" con dos movimientos oscilatorios. |
DE60214528T DE60214528T2 (de) | 2002-07-04 | 2002-07-04 | Verfahren und bewegte Vorrichtung mit zwei Schwingungsbewegungen |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02405561A EP1378322B1 (fr) | 2002-07-04 | 2002-07-04 | Procédé et dispositif de polissage par abrasion des surfaces "au tonneau" avec deux mouvements oscillatoires |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1378322A1 true EP1378322A1 (fr) | 2004-01-07 |
EP1378322B1 EP1378322B1 (fr) | 2006-09-06 |
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02405561A Expired - Lifetime EP1378322B1 (fr) | 2002-07-04 | 2002-07-04 | Procédé et dispositif de polissage par abrasion des surfaces "au tonneau" avec deux mouvements oscillatoires |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1378322B1 (fr) |
AT (1) | ATE338611T1 (fr) |
DE (1) | DE60214528T2 (fr) |
ES (1) | ES2272657T3 (fr) |
PT (1) | PT1378322E (fr) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100991059B1 (ko) * | 2008-06-05 | 2010-10-29 | 김정수 | 다이캐스팅 제품의 표면 연마장치 및 그 방법 |
WO2011045285A1 (fr) * | 2009-10-12 | 2011-04-21 | Walther Trowal Gmbh & Co. Kg | Procédé et dispositif de ponçage de pièces d'usinage |
ITBO20100631A1 (it) * | 2010-10-19 | 2012-04-20 | Roberto Mingot | Apparecchiatura per il trattamento di un prodotto. |
CN103612192A (zh) * | 2013-11-06 | 2014-03-05 | 梧州学院 | 一种超硬材料的表面研磨抛光方法 |
US20140220869A1 (en) * | 2013-02-01 | 2014-08-07 | Southern Taiwan University Of Science And Technology | Subtle vortex polishing apparatus |
CN108044490A (zh) * | 2018-01-09 | 2018-05-18 | 河南共达机械有限公司 | 一种汽车轮毂抛光装置 |
CN115213805A (zh) * | 2022-07-20 | 2022-10-21 | 湖南省东海五金工具制造有限公司 | 一种活动扳手自动化加工设备及其使用方法 |
CN115870872A (zh) * | 2023-01-05 | 2023-03-31 | 苏州思科赛德电子科技有限公司 | 一种振动式接线端子抛光机 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011116562A1 (de) | 2011-10-21 | 2013-04-25 | Otec Präzisionsfinish GmbH | Verfahren und Vorrichtung zur Oberflächenbearbeitung von Werkstücken |
DE102019112665A1 (de) * | 2019-05-15 | 2020-11-19 | Bayerische Motoren Werke Aktiengesellschaft | Verfahren zum Schleifen und/oder Polieren eines Bauteils |
CN112677029B (zh) * | 2019-11-17 | 2022-03-18 | 东莞市卓宇五金科技有限公司 | 一种滚筒式抛光机 |
CH720230A1 (fr) | 2022-11-16 | 2024-05-31 | Richemont Int Sa | Carrure creuse pour une boîte de pièce d'horlogerie et procédé de fabrication correspondant. |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4012869A (en) * | 1975-05-02 | 1977-03-22 | Roto-Finish Company | Reciprocal finishing apparatus |
US4067147A (en) * | 1976-09-03 | 1978-01-10 | Wheelabrator-Frye, Inc. | Method and apparatus for bowl type vibratory finishing |
EP0922530A2 (fr) * | 1997-12-10 | 1999-06-16 | Shuji Kawasaki | Procédé et dispositif de tribofinition |
WO2000029171A1 (fr) * | 1998-11-14 | 2000-05-25 | MTU MOTOREN- UND TURBINEN-UNION MüNCHEN GMBH | Dispositif pour l'usinage de precision de composants a symetrie de revolution |
-
2002
- 2002-07-04 EP EP02405561A patent/EP1378322B1/fr not_active Expired - Lifetime
- 2002-07-04 PT PT02405561T patent/PT1378322E/pt unknown
- 2002-07-04 ES ES02405561T patent/ES2272657T3/es not_active Expired - Lifetime
- 2002-07-04 AT AT02405561T patent/ATE338611T1/de active
- 2002-07-04 DE DE60214528T patent/DE60214528T2/de not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4012869A (en) * | 1975-05-02 | 1977-03-22 | Roto-Finish Company | Reciprocal finishing apparatus |
US4067147A (en) * | 1976-09-03 | 1978-01-10 | Wheelabrator-Frye, Inc. | Method and apparatus for bowl type vibratory finishing |
EP0922530A2 (fr) * | 1997-12-10 | 1999-06-16 | Shuji Kawasaki | Procédé et dispositif de tribofinition |
WO2000029171A1 (fr) * | 1998-11-14 | 2000-05-25 | MTU MOTOREN- UND TURBINEN-UNION MüNCHEN GMBH | Dispositif pour l'usinage de precision de composants a symetrie de revolution |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100991059B1 (ko) * | 2008-06-05 | 2010-10-29 | 김정수 | 다이캐스팅 제품의 표면 연마장치 및 그 방법 |
WO2011045285A1 (fr) * | 2009-10-12 | 2011-04-21 | Walther Trowal Gmbh & Co. Kg | Procédé et dispositif de ponçage de pièces d'usinage |
EP2629934B1 (fr) | 2010-10-19 | 2014-07-23 | Roberto Mingot | Appareil servant à traiter un produit |
WO2012052873A2 (fr) * | 2010-10-19 | 2012-04-26 | Roberto Mingot | Appareil servant à traiter un produit |
WO2012052873A3 (fr) * | 2010-10-19 | 2012-07-05 | Roberto Mingot | Appareil servant à traiter un produit |
ITBO20100631A1 (it) * | 2010-10-19 | 2012-04-20 | Roberto Mingot | Apparecchiatura per il trattamento di un prodotto. |
US20140235146A1 (en) * | 2010-10-19 | 2014-08-21 | Roberto Mingot | Apparatus for treating a product |
US20140220869A1 (en) * | 2013-02-01 | 2014-08-07 | Southern Taiwan University Of Science And Technology | Subtle vortex polishing apparatus |
CN103612192A (zh) * | 2013-11-06 | 2014-03-05 | 梧州学院 | 一种超硬材料的表面研磨抛光方法 |
CN108044490A (zh) * | 2018-01-09 | 2018-05-18 | 河南共达机械有限公司 | 一种汽车轮毂抛光装置 |
CN115213805A (zh) * | 2022-07-20 | 2022-10-21 | 湖南省东海五金工具制造有限公司 | 一种活动扳手自动化加工设备及其使用方法 |
CN115213805B (zh) * | 2022-07-20 | 2023-12-15 | 邵东市鸿伟工具有限公司 | 一种活动扳手自动化加工设备及其使用方法 |
CN115870872A (zh) * | 2023-01-05 | 2023-03-31 | 苏州思科赛德电子科技有限公司 | 一种振动式接线端子抛光机 |
Also Published As
Publication number | Publication date |
---|---|
ATE338611T1 (de) | 2006-09-15 |
DE60214528D1 (de) | 2006-10-19 |
PT1378322E (pt) | 2007-01-31 |
ES2272657T3 (es) | 2007-05-01 |
DE60214528T2 (de) | 2007-06-06 |
EP1378322B1 (fr) | 2006-09-06 |
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